CN214991835U

CN214991835U - Vapor deposition furnace convenient to it is clean

Info

Publication number: CN214991835U
Application number: CN202121548529.9U
Authority: CN
Inventors: 董家海
Original assignee: Zhejiang Nuohua Ceramic Co ltd
Current assignee: HANGZHOU JINGCHENG AUTOMATIC CONTROL ENGINEERING Co.,Ltd.
Priority date: 2021-07-08
Filing date: 2021-07-08
Publication date: 2021-12-03
Anticipated expiration: 2031-07-08

Abstract

The utility model relates to a vapor deposition stove field, more specifically the vapor deposition stove convenient to it is clean that says so. This vapour deposition stove convenient to it is clean can carry out the separation work with the furnace body automatically to be convenient for clean the structure of depositing stove inside setting. The main function realization parts of the device are an integral structure, a deposition structure and a conveying structure. Wherein deposition structure sets up in overall structure top, deposition structure and overall structure sliding connection, and deposition structure sets up in the below of conveying structure, deposition structure and conveying structure sliding connection, and conveying structure sets up on overall structure, and conveying structure rotates with overall structure to be connected. The whole structure is a main control supporting structure of the device and can bear and support normal operation of other working structures; the deposition structure mainly realizes the reaction process of chemical vapor deposition and obtains a required deposition film; the conveying structure is mainly used for conveying mixed gas required by reaction for the working device and providing a water cooling effect for the working device.

Description

Vapor deposition furnace convenient to it is clean

Technical Field

The utility model relates to a vapor deposition stove field, more specifically the vapor deposition stove convenient to it is clean that says so.

Background

For example, publication No. CN107604340A, the invention relates to a chemical vapor deposition furnace, which comprises a crucible for holding raw materials, a crucible cover used in cooperation with the crucible, a deposition chamber, a material receiving box, and a gas-guide tube assembled from bottom to top; the chemical vapor deposition furnace comprises a crucible cover, a material collecting box and a chemical vapor deposition furnace body, wherein the crucible cover is provided with a plurality of first through holes communicated with the crucible and the deposition chamber, the material collecting box is provided with a second through hole communicated with the deposition chamber and the material collecting box, the chemical vapor deposition furnace body further comprises a first heater for heating the crucible, the material collecting box is internally provided with a dust collecting chamber and a dust collecting chamber cover plate covering the dust collecting chamber, and the dust collecting chamber cover plate is provided with a third through hole communicated with the dust collecting chamber and the material collecting box. The chemical vapor deposition furnace has a reasonable structure, zinc sulfide products are collected in multiple stages, the prepared zinc sulfide does not have the defects of fog spots, fog layers, patterns and the like, the integral thickness deviation of the zinc sulfide products is small, and the product conversion rate is high. But the chemical vapor deposition furnace can not automatically separate the furnace bodies.

Disclosure of Invention

The utility model aims at providing a vapour deposition stove convenient to it is clean can carry out the separation work with the furnace body automatically.

The purpose of the utility model is realized through the following technical scheme:

the main function realization part of the vapor deposition furnace convenient for cleaning comprises an integral structure, a deposition structure and a conveying structure. Wherein deposition structure sets up in overall structure top, deposition structure and overall structure sliding connection, and deposition structure sets up in the below of conveying structure, deposition structure and conveying structure sliding connection, and conveying structure sets up on overall structure, and conveying structure rotates with overall structure to be connected.

The integral structure of the vapor deposition furnace convenient to clean mainly comprises a control device, a transmission shaft body, a microwave generator, a waveguide passage, an upper cover body and a deposition base. Wherein the conveying axis body is arranged above the control device and is rotationally connected with the control device. The microwave generator is arranged above the transmission shaft body and fixedly connected with the transmission shaft body. The waveguide passage is arranged on the microwave generator and fixedly connected with the microwave generator, the waveguide passage is arranged above the upper cover body, and the waveguide passage is fixedly connected with the upper cover body. The deposition base is arranged below the control device and is fixedly connected with the control device. An obvious display screen is arranged on the control device. The mode converter is generally arranged inside the upper side of the upper cover body, the induction coil is generally arranged inside the upper cover body, and a layer of quartz window is arranged at the position of the upper cover body, which is adjacent to the lower side structure.

The deposition structure of the vapor deposition furnace convenient to clean mainly comprises a deposition furnace body, a supporting seat and an observation window. The supporting seat is arranged in the deposition furnace body, the supporting seat is fixedly connected with the deposition furnace body, the deposition furnace body is arranged on the deposition base, and the deposition furnace body is connected with the deposition base in a sliding mode. The observation window is fixedly arranged on the outer wall of the deposition furnace body. The plasma sphere and substrate table are typically positioned below the support base.

The conveying structure of the vapor deposition furnace convenient to clean mainly comprises a water cooling loop, a water cooling pipeline, an air supply pipeline and a conveying support. Wherein the water-cooling pipeline is arranged on the water-cooling loop and fixedly connected with the water-cooling loop, the water-cooling loop is arranged on the upper cover body, and the water-cooling loop is fixedly connected with the upper cover body. The air supply pipeline is arranged on the water cooling loop and is fixedly connected with the water cooling loop. The conveying support is fixedly arranged on the conveying shaft body, and the water cooling pipeline and the air supply pipeline are fixedly arranged on the conveying support.

The utility model relates to a vapor deposition furnace convenient to it is clean's beneficial effect does:

this vapour deposition stove convenient to it is clean can carry out the separation work with the furnace body automatically to be convenient for clean the structure of depositing stove inside setting. The device can fix the separated furnace body position, and is convenient for the loading, unloading and cleaning of the internal working structure. The whole separation and assembly process is automatically carried out by the device, the working efficiency can be improved, and the potential safety hazard of operators is reduced to a certain extent. Meanwhile, the device is reasonable in structural design, and can carry out water-cooling work on the working environment at multiple places, so that the chemical deposition reaction is more reliable. In conclusion, the device has the advantages of simple working principle, practical and reliable integral structure, strong flexibility and good cooling effect, and can be put into practical production and use.

Drawings

The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.

Fig. 1 shows schematically in a perspective view an assembly view of the invention;

fig. 2 shows schematically the overall structure of the invention in a perspective view;

figure 3 shows schematically in perspective view a deposition structure of the invention;

fig. 4 shows schematically in a perspective view a conveying structure of the invention;

fig. 5 shows schematically a side view of the device of the invention in a perspective view;

fig. 6 shows schematically in perspective a rotation of the device of the invention;

fig. 7 shows schematically in perspective view a device sliding schematic according to the invention.

In the figure: a monolithic structure 11; a deposition structure 12; a conveying structure 13; a control device 21; the transfer shaft body 22; a microwave generator 23; a waveguide passage 24; an upper cover 25; a deposition base 26; a deposition furnace body 31; a support base 32; an observation window 33; a water cooling loop 41; a water-cooled pipe 42; an air supply duct 43; the carrier 44 is transferred.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings.

According to the utility model discloses a vapor deposition stove convenient to it is clean, the embodiment combines and shows in fig. 1 to 7, can see among them:

this vapour deposition stove convenient to it is clean can carry out the separation work with the furnace body automatically to be convenient for clean the structure of depositing stove inside setting. The main functional realization parts of the device are a whole structure 11, a deposition structure 12 and a conveying structure 13. Wherein deposition structure 12 sets up above overall structure 11, deposition structure 12 and overall structure 11 sliding connection, and deposition structure 12 sets up the below at transport structure 13, and deposition structure 12 and transport structure 13 sliding connection, transport structure 13 set up on overall structure 11, and transport structure 13 rotates with overall structure 11 and is connected. The whole structure 11 is a main control supporting structure of the device and can bear and support normal processing operation of other working structures; the deposition structure 12 mainly realizes the reaction process of chemical vapor deposition and obtains a desired deposited film; the transfer structure 13 mainly supplies the mixed gas required for the reaction to the working device and provides a water cooling effect to the working device.

The overall structure 11 of the vapor deposition furnace convenient for cleaning mainly comprises a control device 21, a transmission shaft body 22, a microwave generator 23, a waveguide passage 24, an upper cover body 25 and a deposition base 26. Wherein the transmission shaft body 22 is arranged above the control device 21, and the transmission shaft body 22 is rotatably connected with the control device 21. The microwave generator 23 is arranged above the transmission shaft body 22, and the microwave generator 23 is fixedly connected with the transmission shaft body 22. The waveguide passage 24 is arranged on the microwave generator 23, the waveguide passage 24 is fixedly connected with the microwave generator 23, the waveguide passage 24 is arranged above the upper cover body 25, and the waveguide passage 24 is fixedly connected with the upper cover body 25. The deposition base 26 is arranged below the control device 21, and the deposition base 26 is fixedly connected with the control device 21. The control device 21 is mainly responsible for controlling various links of chemical reaction of the device, and related parameters can be changed according to processing requirements. An obvious display screen is arranged on the control device 21, and the real-time progress of the reaction can be displayed on the screen, so that an operator can conveniently observe and monitor the reaction. The transmission shaft 22 can not only transmit the cooling water and the mixed gas required by the reaction, but also rotate relative to the control device 21, thereby realizing the separation of the furnace body. The microwave generator 23 first operates to reach a position above the upper lid 25 via the waveguide 24. The mode converter is generally arranged inside the upper side position of the upper cover body 25, the induction coil is generally arranged inside the upper cover body 25, and a layer of quartz window is arranged at the position of the upper cover body 25 adjacent to the lower side structure, so that the plasma chemical vapor deposition reaction of the device can be realized.

The deposition structure 12 of the vapor deposition furnace convenient for cleaning mainly realizes the reaction process of chemical vapor deposition and obtains a desired deposited film. The deposition structure 12 mainly includes a deposition furnace body 31, a support base 32, and a viewing window 33. Wherein the supporting seat 32 is arranged in the deposition furnace body 31, the supporting seat 32 is fixedly connected with the deposition furnace body 31, the deposition furnace body 31 is arranged on the deposition base 26, and the deposition furnace body 31 is slidably connected with the deposition base 26. The observation window 33 is fixedly arranged on the outer wall of the deposition furnace body 31. The deposition furnace body 31 can move in the vertical direction through the sliding connection with the deposition base 26, so as to be separated from the upper cover 25, thereby facilitating subsequent product acquisition and cleaning work. The support base 32 is mainly assembled with the lower side of the quartz window provided in the upper lid body 25, and the plasma sphere and the substrate stage are normally provided below the support base 32. The observation window 33 is arranged to enable an operator to visually monitor the real-time reaction condition inside the deposition furnace body 31, and when a desired deposition film is formed on the plasma sphere, the reaction is stopped.

This transport structure 13 of vapor deposition stove convenient to it is clean mainly for the equipment transport reaction required mist to for the equipment provides water-cooling effect. The transfer structure 13 mainly comprises a water cooling loop 41 and a water cooling pipe 42, a gas supply pipe 43 and a transfer support 44. The water-cooling pipeline 42 is arranged on the water-cooling loop 41, the water-cooling pipeline 42 is fixedly connected with the water-cooling loop 41, the water-cooling loop 41 is arranged on the upper cover body 25, and the water-cooling loop 41 is fixedly connected with the upper cover body 25. The air supply duct 43 is provided on the water cooling loop 41, and the air supply duct 43 is fixedly connected to the water cooling loop 41. The conveyance holder 44 is fixedly provided on the conveyance shaft body 22, and the water-cooled duct 42 and the air-fed duct 43 are both fixedly provided on the conveyance holder 44. According to different reaction types, the types of gas introduced into different devices are different, and the device mainly adopts the mixed gas of hydrogen, oxygen and methane to enter the reaction environment through a mass flow controller. Except the water cooling loop 41, the upper side of the upper cover body 25 and the contact part of the deposition base 26 and the deposition furnace body 31 are provided with circulating water cooling systems, and cooling water is provided for flowing out of other structures by the control device 21. In the water cooling loop 42, the cooling water mainly moves circularly inside, and then flows back to the control structure 21 through the water cooling pipe 42, and the air supply pipe 43 directly supplies air to the inside of the upper cover 25 through the water cooling loop 42.

Claims

1. A vapor deposition furnace facilitating cleaning, comprising a monolithic structure (11), a deposition structure (12) and a transport structure (13), characterized in that: the deposition structure (12) is arranged above the integrated structure (11), the deposition structure (12) is arranged below the conveying structure (13), and the conveying structure (13) is arranged on the integrated structure (11).

2. A vapor deposition furnace as recited in claim 1, wherein the chamber further comprises: the integral structure (11) comprises a control device (21) and a transmission shaft body (22), and the transmission shaft body (22) is arranged above the control device (21).

3. A vapor deposition furnace as recited in claim 2, wherein the chamber further comprises: the integral structure (11) further comprises a microwave generator (23), and the microwave generator (23) is arranged above the conveying shaft body (22).

4. A vapor deposition furnace as recited in claim 3, wherein the chamber further comprises: the integral structure (11) further comprises a waveguide passage (24) and an upper cover body (25), the waveguide passage (24) is arranged on the microwave generator (23), and the waveguide passage (24) is arranged above the upper cover body (25).

5. A vapor deposition furnace as recited in claim 4, wherein the chamber further comprises: the integral structure (11) further comprises a deposition base (26), and the deposition base (26) is arranged below the control device (21).

6. A vapor deposition furnace as recited in claim 5, wherein the chamber further comprises: the deposition structure (12) comprises a deposition furnace body (31) and a supporting seat (32), the supporting seat (32) is arranged in the deposition furnace body (31), and the deposition furnace body (31) is arranged on a deposition base (26).

7. A vapor deposition furnace as recited in claim 6, wherein the chamber further comprises: the deposition structure (12) further comprises an observation window (33), and the observation window (33) is fixedly arranged on the outer wall of the deposition furnace body (31).

8. A vapor deposition furnace as recited in claim 7, wherein the chamber further comprises: the conveying structure (13) comprises a water cooling loop (41) and a water cooling pipeline (42), the water cooling pipeline (42) is arranged on the water cooling loop (41), and the water cooling loop (41) is arranged on the upper cover body (25).

9. A vapor deposition furnace as recited in claim 8, wherein the chamber further comprises: the conveying structure (13) further comprises an air feeding pipeline (43), and the air feeding pipeline (43) is arranged on the water cooling loop (41).

10. A vapor deposition furnace as recited in claim 9, wherein the chamber further comprises: the conveying structure (13) further comprises a conveying support (44), the conveying support (44) is fixedly arranged on the conveying shaft body (22), and the water cooling pipeline (42) and the air feeding pipeline (43) are fixedly arranged on the conveying support (44).