CN214848687U - Two-section type adsorption photomask - Google Patents
Two-section type adsorption photomask Download PDFInfo
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- CN214848687U CN214848687U CN202120223218.9U CN202120223218U CN214848687U CN 214848687 U CN214848687 U CN 214848687U CN 202120223218 U CN202120223218 U CN 202120223218U CN 214848687 U CN214848687 U CN 214848687U
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Abstract
The utility model discloses a two segmentation absorption light covers, including mask frame, first mask slice, second mask slice, base plate and magnetic sheet, wherein, the magnetism that receives of first mask slice is greater than the second mask slice, and second mask slice and first mask slice overlap in proper order successively and fix in the one side of mask frame with hugging closely each other, and the one side that second mask slice was kept away from to first mask slice is equipped with the base plate, and one side that first mask slice was kept away from to the base plate is equipped with the magnetic sheet. The panel area on the first mask plate and the opening on the second mask plate are the same in number and are overlapped in a one-to-one correspondence mode, and the panel area can completely cover the corresponding opening and is only overlapped with one opening. The size of a formed film on the substrate is determined by the first mask plate and the second mask plate together, and the first mask plate and the second mask plate are sequentially adsorbed onto the substrate by the magnetic plate, so that the mask plates are tightly and flatly attached to the substrate in the evaporation process, and the accuracy of the formed film is ensured.
Description
Technical Field
The utility model relates to a OLED makes technical field, in particular to two segmentation absorption light covers.
Background
In the conventional Organic Light Emitting Diode (OLED) manufacturing process, the precision of forming the Light Emitting sub-pixels on the substrate becomes the main technical core. Therefore, whether the high-precision metal mask plate can be closely and flatly attached to the substrate in the evaporation process is very important. The mode that adopts the support bar to support high fine metal mask strip among the prior art can not solve drooping and the fold problem of metal mask strip completely for mask plate can't closely laminate flatly with the base plate in the coating by vaporization process, has influenced the accurate nature of filming.
SUMMERY OF THE UTILITY MODEL
The utility model discloses the technical problem that will solve is: the two-section type adsorption photomask can realize that a metal mask plate can be tightly and flatly attached to a substrate in the evaporation process, and the film forming accuracy is ensured.
In order to solve the technical problem, the utility model discloses a technical scheme be:
a two-section type adsorption photomask comprises a mask frame, a first mask plate, a second mask plate, a substrate and a magnetic plate;
the magnetism of the first mask plate is larger than that of the second mask plate, the second mask plate and the first mask plate are sequentially overlapped and are fixed on one surface of the mask frame in a mutually close-fitting manner, the substrate is arranged on one surface, away from the second mask plate, of the first mask plate, and the magnetic plate is arranged on one side, away from the first mask plate, of the substrate;
the panel area on the first mask plate and the opening on the second mask plate are identical in number and are overlapped in a one-to-one correspondence mode, the panel area can completely cover the corresponding opening and is overlapped with only one opening, and the magnetic plate is used for sequentially adsorbing the first mask plate and the second mask plate to the substrate.
Furthermore, the composition substance of the first mask plate is a strong magnetic material, and the composition substance of the second mask plate is a weak magnetic material;
the area of the second mask plate is larger than that of the first mask plate.
Further, the thickness of the second mask plate is [80 μm,120 μm ], and the thickness of the first mask plate is [20 μm,30 μm ].
Furthermore, a plurality of welding strips are arranged at the edge of the second mask plate, welding grooves corresponding to the welding strips in number and position are arranged on the frame edge of the mask frame, and the welding strips are welded and fixed with the corresponding welding grooves;
the groove depth of the welding groove is equal to the thickness of the second mask plate, and the width of the welding groove is equal to the size of the welding strip;
the upper surface of the second mask plate close to the first mask plate and the upper surface of the mask frame close to the first mask plate are on the same horizontal plane.
Furthermore, the panel area is a net structure formed by arranging more than two open holes, and the area of the open holes is smaller than that of the openings.
Furthermore, the first mask plate is formed by arranging more than two mask strips, and all the panel areas are uniformly distributed on the mask strips.
Further, the first mask plate comprises a first alignment mask strip and a second alignment mask strip;
the two ends of the first alignment mask strip and the two ends of the second alignment mask strip are both provided with alignment holes;
the first and second alignment mask strips are welded and fixed on the mask frame through the alignment holes, and the middle parts of the first and second alignment mask strips are respectively superposed with the side edges and the opposite edges of the second mask plate.
Furthermore, alignment holes are formed in two ends of one side edge of the second mask plate and two ends of the opposite side edge of the second mask plate.
To sum up, the beneficial effects of the utility model reside in that: the utility model provides a two segmentation adsorb light covers, the mask slice with original OLED coating by vaporization in-process falls into the first mask slice and the second mask slice that receive the magnetism difference, make the film formation size on the base plate decide by first mask slice and second mask slice jointly, utilize the magnetic sheet to adsorb first mask slice to its attached on the base plate, adsorb second mask slice again to its attached on first mask slice, eliminated original mask slice at attached base plate in-process because the flagging of self and the influence of factors such as attached pressure to attached effect, realize that metal mask slice can closely laminate with the base plate is flat in the coating by vaporization process, guarantee the accurate nature of film formation.
Drawings
Fig. 1 is a schematic diagram of the overall structure of a two-stage absorption mask according to an embodiment of the present invention;
fig. 2 is a schematic structural view of a two-stage adsorption mask according to an embodiment of the present invention after a first mask plate is adsorbed;
fig. 3 is a schematic structural view of a two-stage adsorption mask according to an embodiment of the present invention after a second mask plate is adsorbed;
fig. 4 is a partial schematic structural view of a two-stage absorption mask according to an embodiment of the present invention;
fig. 5 is an installation diagram of a second mask plate of a two-stage adsorption mask according to an embodiment of the present invention;
fig. 6 is a specific structural diagram of two mask strips of a two-stage absorption mask according to an embodiment of the present invention;
fig. 7 is a schematic view illustrating a first mask plate mounting process of a two-stage adsorption mask according to an embodiment of the present invention;
fig. 8 is a schematic view illustrating an installation process of another first mask plate of a two-stage adsorption mask according to an embodiment of the present invention;
fig. 9 is a schematic structural view of a two-stage absorption mask according to an embodiment of the present invention in an alignment mode;
fig. 10 is a schematic structural view of a two-stage absorption mask according to another alignment method of the embodiment of the present invention;
description of reference numerals:
1. a mask frame; 2. a first mask plate; 3. a second mask plate; 4. a substrate; 5. a magnetic plate; 6. a panel region; 7. an opening; 8. welding the strips; 9. welding a groove; 10. opening a hole; 11. a mask strip; 12. a first alignment mask stripe; 13. a second alignment mask stripe; 14. and aligning holes.
Detailed Description
In order to explain the technical content, the objects and the effects of the present invention in detail, the following description is made with reference to the accompanying drawings in combination with the embodiments.
Referring to fig. 1 to 10, a two-stage type adsorption mask includes a mask frame 1, a first mask plate 2, a second mask plate 3, a substrate 4 and a magnetic plate 5;
the magnetism of the first mask plate 2 is larger than that of the second mask plate 3, the second mask plate 3 and the first mask plate 2 are sequentially overlapped and are mutually and closely fixed on one surface of the mask frame 1, one surface, far away from the second mask plate 3, of the first mask plate 2 is provided with the substrate 4, and one side, far away from the first mask plate 2, of the substrate 4 is provided with the magnetic plate 5;
the panel area 6 on the first mask plate 2 and the opening 7 on the second mask plate 3 are identical in number and are overlapped in position in a one-to-one correspondence mode, the panel area 6 can completely cover the corresponding opening 7 and is overlapped with only one opening 7, and the magnetic plate 5 is used for sequentially adsorbing the first mask plate 2 and the second mask plate 3 to the substrate 4.
From the above description, the beneficial effects of the present invention are: the utility model provides a two segmentation adsorb light covers, the mask plate with original OLED coating by vaporization in-process falls into and receives the first mask plate 2 and the second mask plate 3 of magnetism difference, make the film formation size on the base plate 4 decide by first mask plate 2 and second mask plate 3 jointly, utilize magnetic sheet 5 to adsorb first mask plate 2 to its attached on base plate 4, adsorb second mask plate 3 again to its attached on first mask plate 2, the influence of original mask plate 4 in-process because factors such as self flagging and attached pressure to attached effect has been eliminated, it can closely laminate with base plate 4 at coating by vaporization in-process to realize metal mask plate, guarantee the accurate nature of film formation.
Furthermore, the composition substance of the first mask plate 2 is a strong magnetic material, and the composition substance of the second mask plate 3 is a weak magnetic material;
the second mask plate 3 has a larger area than the first mask plate 2.
As is apparent from the above description, the first mask plate 2 is more magnetic than the second mask plate 3, making it more easily attracted by the magnetic plate 5. The area of the second mask plate 3 is larger than that of the first mask plate 2, so that the second mask plate 3 can support the whole first mask plate 2, and the first mask plate 2 can be well adsorbed. Although the second mask plate 3 has a larger area than the first mask plate 2, the first mask plate 2 is still larger than the second mask plate 3 in terms of overall magnetic properties.
Further, the thickness of the second mask plate 3 is [80 μm,120 μm ], and the thickness of the first mask plate 2 is [20 μm,30 μm ].
As can be seen from the above description, since the second mask plate 3 is used for being fixedly matched with the mask frame 1 and also supports the first mask plate 2, the second mask plate 3 is thicker than the first mask plate 2, so that the structure of the second mask plate 3 is firmer, and the thickness of the first mask plate 2 is as thin as possible, which is beneficial to reducing shadows caused by the thickness during film deposition.
Furthermore, a plurality of welding strips 8 are arranged at the edge of the second mask plate 3, welding grooves 9 corresponding to the welding strips 8 in number and position are arranged on the frame edge of the mask frame 1, and the welding strips 8 are welded and fixed with the corresponding welding grooves 9;
the depth of the welding groove 9 is equal to the thickness of the second mask plate 3, and the width of the welding groove 9 is equal to the size of the welding strip 8;
the upper surface of the second mask plate 3 close to the first mask plate 2 and the upper surface of the mask frame 1 close to the first mask plate 2 are in the same horizontal plane.
As is apparent from the above description, the second mask plate 3 is fixed to the mask frame 1 by solder bonding with the solder grooves 9 by the solder bars 8. Because the upper surface of the second mask plate 3 close to the first mask plate 2 and the upper surface of the mask frame 1 close to the first mask plate 2 are in the same horizontal plane and the groove depth of the welding groove 9 is equal to the thickness of the second mask plate 3, the first mask plate 2 and the mask frame 1 can be tightly attached without generating redundant gaps. And, after magnetic plate 5 pushed down completely, second mask plate 3 also can be sucked up slowly and closely laminate together with attached first metal mask plate 2 on base plate 4, reduces the shade, guarantees the coating film accuracy nature.
Further, the panel region 6 is a net structure formed by arranging more than two openings 10, and the area of the openings 10 is smaller than that of the opening 7.
As can be seen from the above description, the mesh design in the panel area 6 can be used as the filling position of the light-emitting sub-pixels, and the more meshes, the more light-emitting sub-pixels in the area of the opening 7 of the second mask plate 3, and finally the higher the resolution of the screen.
Further, the first mask plate 2 is formed by arranging more than two mask stripes 11, and all the panel regions 6 are uniformly distributed on the mask stripes 11.
As is apparent from the above description, the first mask plate 2 is composed of a plurality of mask stripes 11 arranged.
Further, the first mask plate 2 includes first and second alignment mask stripes 12 and 13;
the two ends of the first aligning mask strip 12 and the two ends of the second aligning mask strip 13 are both provided with aligning holes 14;
the first and second alignment mask strips 12 and 13 are fixed on the mask frame 1 by welding through the alignment holes 14, and the middle parts of the first and second alignment mask strips 12 and 13 are respectively overlapped with the side edges and the opposite edges of the second mask plate 3.
As can be seen from the above description, the above is an alignment manner, and the first alignment mask stripes 12 and the second alignment mask stripes 13 respectively attached to the side edges and the opposite edges of the second mask plate 3 are used as reference axes, so that alignment fixing of the other mask stripes 11 is completed, and finally alignment overlapping of the first mask plate 2 and the second mask plate 3 is completed.
Furthermore, alignment holes 14 are formed at both ends of one side edge of the second mask plate 3 and both ends of the opposite side edge thereof.
As can be seen from the above description, the above is another alignment mode, and the side edge of the second mask plate 3 with the alignment hole 14 is directly used as a reference axis for alignment, so as to complete alignment and fixation of the other mask bars 11 on the second mask plate 3.
Referring to fig. 1 to fig. 3, a first embodiment of the present invention is:
a two-section type adsorption photomask divides a mask plate into a first mask plate 2 and a second mask plate 3 which are different in magnetism, so that the size of a formed film on a substrate 4 is jointly determined by the first mask plate 2 and the second mask plate 3, the magnetic plate 5 is utilized for two-section type adsorption, the influence of adverse factors such as wrinkles and the like in the film forming process is eliminated, and the accuracy of the formed film is ensured. The utility model discloses not only can be used to the film forming process in the OLED coating by vaporization, can also be used to the production process of the panel product of other high pixel density.
A two-stage absorption photomask, as shown in fig. 1, comprises a mask frame 1, a first mask plate 2, a second mask plate 3, a substrate 4 and a magnetic plate 5. The magnetism of the first mask plate 2 is larger than that of the second mask plate 3, the second mask plate 3 and the first mask plate 2 are sequentially overlapped and are mutually and closely fixed on one surface of the mask frame 1, a substrate 4 is arranged on one surface, away from the second mask plate 3, of the first mask plate 2, and a magnetic plate 5 is arranged on one side, away from the first mask plate 2, of the substrate 4. The panel area 6 on the first mask plate 2 and the opening 7 on the second mask plate 3 are the same in number and are overlapped in a one-to-one correspondence mode, the panel area 6 can completely cover the corresponding opening 7 and is only overlapped with one opening 7, and the magnetic plate 5 is used for sequentially adsorbing the first mask plate 2 and the second mask plate 3 to the substrate 4.
In this embodiment, as shown in fig. 2, the first mask plate 2 is attracted to the substrate 4 by the magnetic plate 5, and then as shown in fig. 3, the second mask plate 3 is attracted to the first mask plate 2. Two segmentation adsorbs and has eliminated original mask plate because factors such as flagging and attached pressure of self are to the influence of attached effect at attached 4 in-process on the base plate, realize that metal mask plate can closely laminate flatly with base plate 4 in the coating by vaporization process, guarantee the accurate nature of film forming.
In the present embodiment, the thickness of the second mask plate 3 is [80 μm,120 μm ], and the thickness of the first mask plate 2 is [20 μm,30 μm ]. Not only the thickness but also the area of the second mask plate 3 is larger than that of the first mask plate 2. This is because the second mask plate 3 supports the first mask plate 2 and is also fixed to the mask frame 1. Although the area of the second mask plate 3 is larger than that of the first mask plate 2, the magnetic property is weaker than that of the first mask plate 2, so that the overall magnetic property of the first mask plate 2 is larger than that of the second mask plate 3, and the two-stage adsorption is completed by correspondingly matching the magnetic plate 5. Generally, the second mask plate 3 is made of a cold-worked 304 stainless steel material, has weak magnetism, and has a size in conformity with the mask frame 1. The number and position of the openings 7 of the second mask plate 3 are determined by the circuit design of the coated substrate. In other equivalent embodiments, the second mask plate 3 may also be made of other materials with magnetism.
In the present embodiment, the second mask plate 3 has a lower requirement for film formation accuracy than the first mask plate 2 for attachment to the substrate 4, and is not easily damaged. When the photomask needs to be replaced after being used and cleaned for multiple times, only the first mask plate 2 can be torn off, the second mask plate 3 is reserved, and the first mask plate 2 is manufactured again after the original second mask plate 3 is slightly polished. Therefore, compared with the traditional support method adopting the support bars, the design of the embodiment is more convenient, and the utilization rate of the mask plate is high.
In addition, in the present embodiment, the panel regions 6 can completely cover the corresponding openings 7 and overlap with only one opening 7, so that the light-emitting material and the like passing through any one opening 7 can fall into the same panel region 6 and be completely blocked on the substrate 4 without being divided by a plurality of panel regions 6 in one opening 7, and uniform light emission in each opening 7 can be ensured.
Referring to fig. 4 and 5, a second embodiment of the present invention is:
on the basis of the first embodiment, as shown in fig. 4 and 5, the edge of the second mask plate 3 is provided with a plurality of welding bars 8, the frame edge of the mask frame 1 is provided with welding grooves 9, the number and the positions of the welding grooves 9 correspond to the welding bars 8, and the welding bars 8 are welded and fixed with the corresponding welding grooves 9. The depth of the solder groove 9 is equal to the thickness of the second mask plate 3, and the width of the solder groove 9 is equal to the size of the solder bar 8. The upper surface of the second mask plate 3 close to the first mask plate 2 and the upper surface of the mask frame 1 close to the first mask plate 2 are at the same level. In this embodiment, the second mask plate 3 is welded and fixed on the mask frame 1 as shown in fig. 5, after welding, the second mask plate 3 and the mask frame 1 are in the same plane, so that no excessive gap is generated when the first mask plate 2 is fixed on the mask frame 1. The width of the welding bar 8 is [10 μm,20 μm ], and the length is consistent with the frame width of the mask frame 1. In this embodiment, the welding bar 8 and the welding groove 9 may be fixed by laser welding, and the projection of the welding spot on the welding bar 8 may be reduced by grinding or deepening the welding groove 9.
In this embodiment, the opening 7 on the second mask plate 3 can be formed by laser cutting after the soldering is fixed, or by etching or laser before the soldering. Different modes can be selected according to different specification requirements. Force can be applied to the second mask plate 3 before welding to reduce the sagging amount and ensure that the flatness is good enough, so that the second mask plate can be normally attracted by the magnetic plate 5 in the coating process. If the mode of manufacturing the opening 7 before welding is adopted, the opening 7 needs to be pre-contracted to a certain extent so as to ensure that the size and the position of the opening 7 meet the requirements after the net is expanded.
Referring to fig. 6 to 10, a third embodiment of the present invention is:
on the basis of the first or second embodiment, as shown in fig. 6, the first mask plate 2 is formed by arranging more than two mask stripes 11, and all the panel regions 6 are uniformly distributed on the mask stripes 11. In the present embodiment, the first mask plate 2 is formed by arranging a plurality of mask stripes 11. With reference to fig. 6 and 7, the first arrangement of the panel regions 6 on the mask stripes 11 is a single-row arrangement, and when the mask stripes are overlapped on the second mask plate 3, 8 single-row mask stripes 11 with six panel regions 6 on each row are adopted corresponding to the openings 7 arranged in a matrix of 6 × 8 on the second mask plate 3. Referring to fig. 6 and 8, the second arrangement of the panel regions 6 on the mask stripes 11 is a two-row arrangement, and when the mask stripes are overlapped on the second reticle 3, 4 mask stripes 11 with six panel regions 6 are used in two rows and each row corresponding to the openings 7 arranged in a matrix of 6 × 8 on the second reticle 3. In other equivalent embodiments, other arrangements may also be adopted according to the distribution of the openings 7 on the actual second mask plate 3.
In the present embodiment, the mask stripes 11 are made of an iron-nickel alloy having a very small thermal expansion coefficient, have a ferromagnetic property, and have a thickness of about [20 μm,30 μm ]. The mask strips 11 are made of a thin material as much as possible, so that shadow coverage caused by thickness in the coating process can be reduced. Moreover, the material of the mask frame 1 is generally consistent with that of the mask strips 11, so that the same and small metal appearance deformation caused by thermal expansion of the mask frame and the mask strips can be ensured in the evaporation heating process, the deformation of the panel area 6 is reduced to the greatest extent, and the coating accuracy is ensured.
In the present embodiment, the panel region 6 is a mesh structure formed by arranging more than two openings 10, and the area of the opening 10 is smaller than that of the opening 7, so that the number of light-emitting sub-pixels in the area of the opening 7 can be increased. In other equivalent embodiments, the shape, size and relative position of the panel area 6, the opening 7 or the opening 10 on the mask plate can be changed arbitrarily, provided that they are consistent with the description of the first embodiment.
In the present embodiment, as shown in fig. 9, the first mask plate 2 includes first and second alignment mask stripes 12 and 13. Wherein, both ends of the first aligning mask strip 12 and both ends of the second aligning mask strip 13 are provided with aligning holes 14. The first and second alignment mask strips 12 and 13 are fixed on the mask frame 1 by welding through the alignment holes 14, and the middle parts of the first and second alignment mask strips 12 and 13 are respectively overlapped with the side edges and the opposite edges of the second mask plate 3. The above is a kind of alignment method. The first and second alignment mask stripes 12 and 13 are also located on the plane of the first mask plate 2. When the other mask stripes 11 need to be aligned on the second mask plate 3, the positions of the first alignment mask stripes 12 and the second alignment mask stripes 13 can be used as reference axes, so that accurate alignment is realized.
Referring to fig. 10, a fourth embodiment of the present invention is:
on the basis of the first or second embodiment, as shown in fig. 10, two alignment holes 14 are formed at two ends of one side edge and two ends of the opposite side edge of the second mask plate 3. The above is another alignment method. The above is another alignment method. The side edge of the second mask plate 3 with the alignment holes 14 is used as a reference axis for alignment, and the alignment and fixation of the other mask bars 11 on the second mask plate 3 are completed.
To sum up, the beneficial effects of the utility model reside in that: the two-section type adsorption photomask is characterized in that a mask plate in the original OLED evaporation process is divided into a first mask plate and a second mask plate which are different in magnetism, so that the size of a formed film on a substrate is jointly determined by the first mask plate and the second mask plate, the second mask plate is welded on a mask frame and keeps the same plane with the mask frame, and two alignment modes are further arranged to align and fix the second mask plate. The magnetic plate adsorbs the first mask plate to be attached to the substrate, and then adsorbs the second mask plate to be attached to the first mask plate, so that the influence of the original mask plate on the attaching effect due to self drooping, attaching pressure and other factors in the process of attaching the substrate is eliminated, the metal mask plate can be closely and flatly attached to the substrate in the evaporation process, and the accuracy of film forming is guaranteed. And moreover, a grid design is adopted in a panel area of the first mask plate, so that the resolution of the screen is increased. The second mask plate can be used for multiple times, and the practicability is high.
The above mentioned is only the embodiment of the present invention, and not the limitation of the patent scope of the present invention, all the equivalent transformations made by the contents of the specification and the drawings, or the direct or indirect application in the related technical field, are included in the patent protection scope of the present invention.
Claims (8)
1. A two-section type adsorption photomask is characterized by comprising a mask frame, a first mask plate, a second mask plate, a substrate and a magnetic plate;
the magnetism of the first mask plate is larger than that of the second mask plate, the second mask plate and the first mask plate are sequentially overlapped and are mutually and closely fixed on one surface of the mask frame, the substrate is arranged on one surface, away from the second mask plate, of the first mask plate, and the magnetic plate is arranged on one side, away from the first mask plate, of the substrate;
the panel area on the first mask plate and the opening on the second mask plate are identical in number and are overlapped in a one-to-one correspondence mode, the panel area can completely cover the corresponding opening and is overlapped with only one opening, and the magnetic plate is used for sequentially adsorbing the first mask plate and the second mask plate to the substrate.
2. The two-stage adsorption mask according to claim 1, wherein the component of the first mask is a ferromagnetic material, and the component of the second mask is a weakly magnetic material;
the area of the second mask plate is larger than that of the first mask plate.
3. The two-stage adsorption photomask of claim 1, wherein the thickness of the second mask plate is [80 μm,120 μm ] and the thickness of the first mask plate is [20 μm,30 μm ].
4. The two-stage adsorption mask according to claim 1, wherein the edge of the second mask plate is provided with a plurality of solder bars, the frame edge of the mask frame is provided with a plurality of solder grooves corresponding to the solder bars in number and position, and the solder bars are fixed to the corresponding solder grooves by welding;
the groove depth of the welding groove is equal to the thickness of the second mask plate, and the width of the welding groove is equal to the size of the welding strip;
the upper surface of the second mask plate close to the first mask plate and the upper surface of the mask frame close to the first mask plate are on the same horizontal plane.
5. The two-stage adsorption mask according to claim 1, wherein the panel region is a mesh structure formed by arranging more than two openings, and the area of the openings is smaller than that of the openings.
6. The two-stage adsorption mask of claim 4, wherein the first mask plate is composed of more than two mask strips, and all the panel areas are uniformly distributed on the mask strips.
7. The two-stage adsorption mask of claim 6, wherein the first mask plate comprises first and second alignment mask stripes;
the two ends of the first alignment mask strip and the two ends of the second alignment mask strip are both provided with alignment holes;
the first and second alignment mask strips are welded and fixed on the mask frame through the alignment holes, and the middle parts of the first and second alignment mask strips are respectively superposed with the side edges and the opposite edges of the second mask plate.
8. The two-stage adsorption mask of claim 6, wherein the second mask plate has alignment holes at two ends of a side edge and at two ends of an opposite edge.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202120223218.9U CN214848687U (en) | 2021-01-27 | 2021-01-27 | Two-section type adsorption photomask |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202120223218.9U CN214848687U (en) | 2021-01-27 | 2021-01-27 | Two-section type adsorption photomask |
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| CN214848687U true CN214848687U (en) | 2021-11-23 |
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| CN202120223218.9U Active CN214848687U (en) | 2021-01-27 | 2021-01-27 | Two-section type adsorption photomask |
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