CN214736047U - Linear evaporation source device and evaporation device - Google Patents
Linear evaporation source device and evaporation device Download PDFInfo
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- CN214736047U CN214736047U CN202023104913.8U CN202023104913U CN214736047U CN 214736047 U CN214736047 U CN 214736047U CN 202023104913 U CN202023104913 U CN 202023104913U CN 214736047 U CN214736047 U CN 214736047U
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Abstract
The utility model provides a linear evaporation source device includes at least: the device comprises a first evaporation source, a second evaporation source, a moving mechanism and a control system, wherein evaporation materials of the first evaporation source and the second evaporation source are different; the moving mechanism comprises gears arranged on each evaporation source, and the gears are driven by a motor to drive the evaporation sources to move on the guide rails; and the control system is electrically connected with the moving mechanism and is used for adjusting the moving speed and the relative position of the evaporation source. The utility model discloses a control system adjusts the translation rate and the relative position of evaporation source according to the thick information of the membrane that acquires to but the scope of effective control gradient doping ratio, the effectual adjustable range of having guaranteed the gradient doping device when the volume production, the thickness homogeneity on film layer of ensureing to evaporate. And can flexibly correspond to different device structures and material systems, and the applicability is wide.
Description
Technical Field
The application relates to the technical field of display, in particular to a linear evaporation source device and an evaporation device.
Background
The organic electroluminescent display is a current type semiconductor light emitting device based on organic electroluminescent materials, and mainly applies certain voltage to a film layer by a metal electrode to enable the organic electroluminescent materials in the film layer to emit light, so that image response is realized; it has attracted attention from people with the advantages of low power consumption, high contrast, high color gamut, and the ability to implement flexible displays.
When people manufacture an organic electroluminescent display, a hole injection layer, a film layer and an electron transport layer are coated in a doping mode. And the doping ratio is constant. From the device perspective, however, the graded doping is beneficial to improving the device performance. However, at present, the existing linear evaporation source devices are all evaporated at a constant doping ratio, and flexible gradient doping is difficult to realize.
SUMMERY OF THE UTILITY MODEL
The utility model provides a linear evaporation source device for realize nimble gradient doping coating film.
In order to achieve the above object, the present invention provides a linear evaporation source device, at least comprising: the device comprises a first evaporation source, a second evaporation source, a moving mechanism and a control system, wherein evaporation materials of the first evaporation source and the second evaporation source are different; the moving mechanism comprises gears arranged on each evaporation source, and the gears are driven by a motor to drive the evaporation sources to move on the guide rails; and the control system is electrically connected with the moving mechanism and is used for adjusting the moving speed and the relative position of the evaporation source.
Optionally, the control system comprises a driving module for driving and changing the direction and speed of the moving mechanism; the control module is used for electrically controlling the driving module; the power supply module is used for supplying power to the control module and the driving module; the power supply module is electrically connected with the driving module and the control module.
Optionally, a nozzle group is disposed on the evaporation source, the nozzle group includes a plurality of nozzles disposed at intervals, and the control system includes a plurality of nozzle control units corresponding to the nozzles.
Optionally, the nozzle control unit comprises: any one of the nozzle control units is in one-to-many electrical connection with two or more of the nozzles to adjust the direction of the two or more nozzles by any one of the nozzle control units.
Optionally, Liq evaporation material is placed in the first evaporation source, and ETM evaporation material is placed in the second evaporation source.
Optionally, the control system further includes a monitoring module for acquiring film thickness information of the evaporation material.
Optionally, gears are mounted on both sides of each evaporation source.
Optionally, the motor is a stepper motor or a servo motor.
The utility model also provides an evaporation device, including above-mentioned linear evaporation source device.
The utility model has the advantages that: the control system adjusts the moving speed and the relative position of the evaporation source according to the acquired film thickness information, so that the range of the gradient doping ratio can be effectively controlled, the adjustable range of a gradient doping device in the production process is effectively ensured, and the thickness uniformity of a vapor-deposited film layer is ensured. And can flexibly correspond to different device structures and material systems, and the applicability is wide.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings without creative efforts. Wherein:
fig. 1 is a schematic structural diagram of a linear evaporation source apparatus according to the present invention;
description of reference numerals:
1. a first evaporation source; 2. a second evaporation source; 3. a gear; 4. a guide rail; 5. a substrate.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is apparent that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. All other embodiments that can be obtained by a person skilled in the art without making any inventive step based on the embodiments in the present application belong to the protection scope of the present application.
Based on the defect that the preparation of gradient doping ratio rete is difficult to realize in a flexible way to exist among the prior art, refer to fig. 1 and show, the utility model provides a linear evaporation source device includes at least: the evaporation device comprises a first evaporation source 1, a second evaporation source 2, a moving mechanism and a control system, wherein evaporation materials of the first evaporation source 1 and the second evaporation source 2 are different; the moving mechanism comprises gears 3 arranged on each evaporation source, and the gears 3 are driven by a motor to drive the evaporation sources to move on the guide rails 4; and the control system is electrically connected with the moving mechanism and is used for adjusting the moving speed and the relative position of the evaporation source.
The film formation rate of the organic vapor is not uniform at each angle for one evaporation source, but is generally the highest immediately above the nozzle when the nozzle is directed upward, and the film formation rate becomes smaller as the angle increases. The evaporation process of the organic film layer of the OLED comprises the following steps: the evaporation source device is scanned from left to right. Because the evaporation source device is at the in-process of scanning, two evaporation sources are changing for the angle of base plate 5 always, therefore the two relative speed also is changing, the utility model discloses a moving speed and the relative position of two evaporation sources of control, and then realize the purpose of the scope of effective control gradient doping to compensate the coating by vaporization to the coating by vaporization layer.
The control system of this application still includes monitoring module for obtain evaporating material's thick homogeneity of membrane and carry out real-time supervision, and give control system with its monitoring information transfer, control system in time controls its evaporation source that corresponds after receiving the unusual information that thick homogeneity of membrane surpassed the specification, can select to adjust the moving speed of two evaporation sources or adjust the position of two evaporation sources. In one embodiment, the monitoring unit can also monitor the evaporation state of each evaporation zone, the evaporation state includes the evaporation rate, the evaporation state of each evaporation zone monitored by the monitoring module is transmitted to the control system, the control system judges the compensation mode according to the monitoring information, and the control system adjusts the moving speed of the evaporation source or adjusts the position of the evaporation source. Preferably, the monitoring unit can be a film thickness on-line testing device, and can also be other devices as long as the same purpose can be achieved.
Specifically, the monitoring module comprises a sensitive probe and a display module, and the sensitive probe is used for monitoring the film thickness uniformity. The display module is used for visually displaying whether the film thickness uniformity of the evaporated film on the substrate 5 changes or not, so that the operation personnel can conveniently observe the film thickness uniformity. Furthermore, the on-line film thickness testing equipment carries out data sorting and analysis on the monitored film thickness data and displays the data through the monitoring interface, so that an operator can keep real-time monitoring on the evaporation process and can timely regulate and control the evaporation process.
As one practicable manner, the linear evaporation source apparatus includes a first evaporation source in which the Liq evaporation material is placed and a second evaporation source in which the ETM evaporation material is placed. In this embodiment, the first evaporation source and the second evaporation source are distributed along the X-axis, i.e. the first evaporation source is located on the left side and the second evaporation source is located on the right side. And the leftmost end of the film layer is marked as point A and the rightmost end is marked as point B. And moving the evaporation equipment to an initial position, wherein the evaporation distance from the second evaporation source to the film layer is smaller than the evaporation distance from the first evaporation source to the film layer, wherein the evaporation distance refers to the distance between the center of the evaporation source and the film layer.
Taking the point A on the film layer as an example, the content change of the ETM evaporation material and the Liq evaporation material at the point A is elaborated: and moving the evaporation device from the initial position to the final position, and evaporating the film layer. When the evaporation equipment is at the initial position, the rightmost edge of the evaporation area of the second evaporation source preferentially contacts the point A, the evaporation distance from the center of the second evaporation source to the point A is smaller than that from the center of the first evaporation source to the point A, and then the content of the Liq material at the point A is larger than that of the ETM material. And continuously moving the evaporation equipment until the normal of the second evaporation source just contacts the point A, and evaporating the second evaporation source to the point A until the content of the Liq material reaches the maximum. And continuing moving the evaporation equipment, wherein the evaporation distance from the center of the second evaporation source to the point A is increased, the evaporation distance from the center of the first evaporation source to the point A is decreased, the content of the Liq material at the point A is gradually reduced, and the content of the ETM material at the point A is gradually increased until the rightmost edge of the evaporation area of the first evaporation source contacts the point A. And continuously moving the evaporation equipment until the leftmost edge of the evaporation area of the first evaporation source contacts with the second evaporation source, so that the evaporation process of one layer of film layer is completed.
Specifically, Liq evaporation material is placed in the first evaporation source, and ETM evaporation material is placed in the second evaporation source. Evaporation was performed at rate ratios of 7:3 and 4:6, respectively, and the results were as follows: when the evaporation rate is 7:3, the ratio of two ends of the OLED film layer is about 5:5, and the ratio of the middle of the OLED film layer is about 9: 1; when evaporation is performed at a rate ratio of 4:6, the OLED film has a ratio of about 2:8 at both ends and a ratio of about 6.5:3.5 in the middle.
In this embodiment, it is further verified by geometric model simulation that the vertical distance between the substrate and the evaporation sources is d, the angles between the evaporation paths from the two evaporation sources to the substrate and the horizontal line are θ 1 and θ 2, and the distance between the two evaporation sources is x. Thus, from the geometric operation, the relationship between θ 2 and θ 1 can be obtained as:
let x be md, then
The function of evaporation rate as a function of angle is determined by nozzle orientation and material properties, and we assume the decay function to be Vα＝V0-V0Cos (90 ° - α), V0 is the forward direction velocity, α is the angle between the evaporation direction and the vertical, and V α is the velocity at this angle. Assuming that the two evaporation sources are evaporated at the same monitoring rate and the nozzle direction is upward, the limit doping ratio at different evaporation source spacing can be fitted. Under different initial angles, with the increase of the distance between the two evaporation sources, the material proportion of the first evaporation source is reduced, the proportion of the second evaporation source is increased, and the amplitude can reach 20%. The linear evaporation source device provided by the utility model can effectively ensure the realization of different concentration gradient doping devices.
Wherein, the ETM material can be any one of oxazazole, thiazole, triazole compound, triazine compound, quinoxaline compound, dianthracene compound, silicon-containing heterocyclic compound, quinoline compound, phenanthroline compound, metal chelate and fluorine substituted benzene compound. The Liq material is lithium octahydroxyquinoline.
As an implementation manner, the moving mechanism includes gears 3 installed on both sides of each evaporation source, and the gears 3 are driven by a stepping motor or a servo motor to drive the evaporation sources to move on the gear guide rail. The moving mechanism adopts the combination of the gear 3 and the gear guide rail to realize accurate and stable adjustment, and can also be other realizable moving mechanisms.
The control system comprises a driving module, a control module and a control module, wherein the driving module is used for driving and changing the direction and the speed of the moving mechanism; the control module is used for electrically controlling the driving module; the power supply module is used for supplying power to the control module and the driving module; the power supply module is electrically connected with the driving module and the control module. In particular, the driving module may be a micro motor unit. The control module may be a PLC (Programmable Logic Controller) Controller or a single chip microcomputer. The Power supply module can be a direct current battery, or a 220V alternating current Power supply and an UPS (Uninterruptible Power System) which are connected in parallel, and then are connected in series with a voltage stabilizer to form the Power supply module.
As one practical mode, the evaporation source is provided with a nozzle group, the nozzle group comprises a plurality of nozzles arranged at intervals, and the control system comprises a plurality of nozzle control units corresponding to the nozzles. A single nozzle control unit is used to drive two or more nozzles. Specifically, any one nozzle control unit may drive two adjacent nozzles at the same time, or one nozzle control unit may drive non-adjacent nozzles. For example, in the vapor deposition process, if the film thickness of the vapor deposition films at the left and right ends is generally likely to be different from the film thickness at the center portion, and the film thickness variation at the left and right ends is generally close to each other, it is possible to cause one nozzle control unit to simultaneously control two or more nozzles at the left and right ends.
It should be understood that the nozzle control unit in the present application is used to drive the nozzles to rotate so as to adjust the thickness of the deposition film layer, and therefore, is not limited to one nozzle control unit for several nozzles. The correspondence between the nozzle control unit and the nozzle, which can satisfy the requirement of adjusting the nozzle angle and thus the thickness of the evaporation film, should be understood to be within the protection scope of the present embodiment.
In a preferred embodiment, a single nozzle control unit is connected to and drive-controls a single nozzle.
The application also provides an evaporation device, which comprises the linear evaporation source provided by the technical scheme, and the beneficial effects of the evaporation device are the same as those of the linear evaporation source.
It is to be understood that the above embodiments are merely exemplary embodiments that have been employed to illustrate the principles of the present invention, and that the present invention is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (9)
1. A linear evaporation source apparatus, comprising at least: the device comprises a first evaporation source, a second evaporation source, a moving mechanism and a control system, wherein evaporation materials of the first evaporation source and the second evaporation source are different; the moving mechanism comprises gears arranged on each evaporation source, and the gears are driven by a motor to drive the evaporation sources to move on the guide rails; and the control system is electrically connected with the moving mechanism and is used for adjusting the moving speed and the relative position of the evaporation source.
2. The linear evaporation source apparatus according to claim 1, wherein the control system comprises a driving module for driving and changing the direction and speed of the moving mechanism; the control module is used for electrically controlling the driving module; the power supply module is used for supplying power to the control module and the driving module; the power supply module is electrically connected with the driving module and the control module.
3. The linear evaporation source apparatus according to claim 1, wherein a nozzle group is disposed on the evaporation source, the nozzle group includes a plurality of nozzles disposed at intervals, and the control system includes a plurality of nozzle control units corresponding to the nozzles.
4. The linear evaporation source apparatus according to claim 3, wherein the nozzle control unit comprises: any one of the nozzle control units is in one-to-many electrical connection with two or more of the nozzles to adjust the direction of the two or more nozzles by any one of the nozzle control units.
5. The linear evaporation source apparatus according to claim 1, wherein Liq evaporation material is placed in the first evaporation source, and ETM evaporation material is placed in the second evaporation source.
6. The linear evaporation source apparatus according to claim 1, wherein the control system further comprises a monitoring module for acquiring film thickness information of the evaporation material.
7. The linear evaporation source apparatus according to claim 1, wherein gears are installed on both sides of each evaporation source.
8. The linear evaporation source apparatus according to claim 1, wherein the motor is a stepping motor or a servo motor.
9. An evaporation apparatus comprising the linear evaporation source apparatus according to any one of claims 1 to 8.
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| CN202023104913.8U CN214736047U (en) | 2020-12-21 | 2020-12-21 | Linear evaporation source device and evaporation device |
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| CN202023104913.8U CN214736047U (en) | 2020-12-21 | 2020-12-21 | Linear evaporation source device and evaporation device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115074673A (en) * | 2022-06-20 | 2022-09-20 | 深圳市华星光电半导体显示技术有限公司 | Evaporation device and application method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115074673A (en) * | 2022-06-20 | 2022-09-20 | 深圳市华星光电半导体显示技术有限公司 | Evaporation device and application method thereof |
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