CN214718671U - PVD support plate dust cleaning device - Google Patents
PVD support plate dust cleaning device Download PDFInfo
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- CN214718671U CN214718671U CN202021482168.8U CN202021482168U CN214718671U CN 214718671 U CN214718671 U CN 214718671U CN 202021482168 U CN202021482168 U CN 202021482168U CN 214718671 U CN214718671 U CN 214718671U
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- round brush
- support plate
- pvd
- dust
- brush
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Abstract
The utility model discloses a PVD support plate dust cleaning device, including frame, the cover that induced drafts, round brush subassembly, the frame both sides are equipped with an adjusting block respectively, connect the round brush subassembly in adjusting block one end, it is provided with round brush chamber, dust absorption mouth in the cover to induced draft, round brush chamber and dust absorption mouth intercommunication, the round brush subassembly can set up in the round brush intracavity with rotating, cleans the support plate under the drive of motor, the round brush subassembly includes roller body and brush strip. The utility model discloses an automation, real-time cleanness of PVD support plate dust, greatly reduced the support plate and the phenomenon that the drive wheel took place the friction and produces the powder that falls, improved silicon chip coating film quality.
Description
Technical Field
The utility model relates to a solar photovoltaic silicon chip technical field especially relates to a PVD support plate dust cleaning device.
Background
The PVD (Physical Vapor Deposition) process is one of the very critical steps in the fabrication of high efficiency heterojunction solar cells. The silicon wafer after chemical vapor deposition is placed on a support plate, and the support plate is used as a silicon wafer bearing tray in the process of entering a vacuum chamber for physical vapor deposition. The carrier plate mainly has the function of conveying the silicon wafer to the sputtering chamber, and a layer of film is plated on the surface of the silicon wafer through the sputtering system, and a layer of film is also plated on the rest parts of the carrier plate. The more the carrier plate is used, the thicker the plated film layer is. In the existing PVD process, a carrier plate is horizontally placed on a coating device and horizontally moved. The carrier plate is conveyed by the transmission roller, namely, the carrier plate is placed on the transmission roller and generates friction between the carrier plate and the transmission roller, so that the transmission of the carrier plate is realized. The carrier plate can rub against the driving wheels to cause powder falling, and the film coating quality of the silicon wafer is directly influenced.
The clean cycle of present PVD support plate dust is long, when reaching certain thickness, just cleans the maintenance to the support plate, can not satisfy the clean requirement of support plate dust.
SUMMERY OF THE UTILITY MODEL
To the problem, the utility model provides a realize automatic, real-time clear PVD support plate dust cleaning device of PVD support plate dust.
In order to solve the technical problem, the utility model discloses the technical scheme who adopts is: the utility model provides a PVD support plate dust cleaning device, includes frame, the cover that induced drafts, round brush subassembly, the frame both sides are equipped with an adjusting block respectively, all connect the round brush subassembly in adjusting block one end, be provided with round brush chamber, dust absorption mouth in the cover that induced drafts, the round brush chamber communicates with the dust absorption mouth, the round brush subassembly can set up in the round brush intracavity with rotating, cleans the support plate under the drive of motor, the round brush subassembly includes roller body and brush hair.
Furthermore, the air suction cover is arranged below the rolling brush component.
Furthermore, the rolling brush cavity faces the rolling brush assembly, the dust suction port is formed in one end of the rolling brush cavity and connected with the dust collector through a pipeline.
Furthermore, the brush strips are arranged around the surface of the roller body and are made of nylon, terylene and polypropylene.
From the above description of the structure of the present invention, compared with the prior art, the present invention has the following advantages:
the utility model discloses an automation, real-time cleanness of PVD support plate dust, greatly reduced the support plate and the phenomenon that the drive wheel took place the friction and produces the powder that falls, improved silicon chip coating film quality.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. In the drawings:
FIG. 1 is a schematic structural view of a PVD carrier dust cleaning device of the present invention;
fig. 2 is the structure diagram of the roller brush assembly of the PVD carrier dust cleaning apparatus of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Examples
Referring to fig. 1 and 2, a PVD support plate dust cleaning device, including frame 1, the cover 2 that induced drafts, round brush subassembly 3, frame 1 both sides are equipped with an adjusting block 4 respectively, all connect round brush subassembly 3 in adjusting block 4 one end, be provided with round brush chamber 5, dust absorption mouth 6 in the cover 2 that induced drafts, round brush chamber 5 and dust absorption mouth 6 intercommunication, round brush subassembly 3 can set up in round brush chamber 6 with rotating, cleans the support plate under the drive of motor, round brush subassembly 5 includes roller body 7 and brush strip 8, brush strip 8 winds roller body 7 surface arrange, brush strip 8 comprises nylon, dacron, polypropylene.
The air suction hood 2 is arranged below the rolling brush component 3.
The rolling brush cavity 5 faces the rolling brush component 3, the dust suction port 6 is arranged below the rolling brush cavity 5, and the dust suction port 6 is connected with a dust collector through a pipeline.
At PVD support plate dust cleaning device during operation, through to frame 1, the cover 2 that induced drafts, the setting of round brush subassembly 3, when the continuity of operation of PVD support plate, round brush subassembly 3 counter-clockwise turning, take the brush strip 8 brush support plate surface that is attached to the brush roll surface, thereby brush down the dust on support plate surface and fall into the cover 2 that induced drafts, pass through dust absorption mouth 6 with the dust in the cover 2 that induced drafts again and inhale in the dust catcher, thereby the automation of PVD support plate dust, real-time cleaning has been realized, greatly reduced support plate and drive wheel take place the friction and produce the phenomenon that falls the powder, improve silicon chip coating quality.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (4)
1. The utility model provides a PVD support plate dust cleaning device which characterized in that: including frame, the cover that induced drafts, round brush subassembly, the frame both sides are equipped with an adjusting block respectively, connect the round brush subassembly in adjusting block one end, be provided with round brush chamber, dust absorption mouth in the cover that induced drafts, the round brush chamber communicates with the dust absorption mouth, the round brush subassembly can set up in the round brush intracavity with rotating, cleans the support plate under the drive of motor, the round brush subassembly includes barrel and brush strip.
2. A PVD carrier dust cleaning device according to claim 1, characterized in that: the air suction cover is arranged below the rolling brush component.
3. A PVD carrier dust cleaning device according to claim 1, characterized in that: the rolling brush cavity faces the rolling brush assembly, the dust suction port is formed in one end of the rolling brush cavity and connected with a dust collector through a pipeline.
4. A PVD carrier dust cleaning device according to claim 1, characterized in that: the brush strips are arranged around the surface of the roller body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021482168.8U CN214718671U (en) | 2020-07-24 | 2020-07-24 | PVD support plate dust cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021482168.8U CN214718671U (en) | 2020-07-24 | 2020-07-24 | PVD support plate dust cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214718671U true CN214718671U (en) | 2021-11-16 |
Family
ID=78573614
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202021482168.8U Active CN214718671U (en) | 2020-07-24 | 2020-07-24 | PVD support plate dust cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214718671U (en) |
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2020
- 2020-07-24 CN CN202021482168.8U patent/CN214718671U/en active Active
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