CN214624967U - Waveguide matrix for microwave plasma cleaning machine - Google Patents
Waveguide matrix for microwave plasma cleaning machine Download PDFInfo
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- CN214624967U CN214624967U CN202120901692.2U CN202120901692U CN214624967U CN 214624967 U CN214624967 U CN 214624967U CN 202120901692 U CN202120901692 U CN 202120901692U CN 214624967 U CN214624967 U CN 214624967U
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- cleaning machine
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Abstract
The utility model is suitable for a microwave plasma cleaning machine technical field provides a waveguide matrix that microwave plasma cleaning machine used, including vacuum cavity, first fan housing and second fan housing, the quantity of first fan housing is a plurality of and sets up in the top of vacuum cavity, the quantity of second fan housing is a plurality of and sets up in the front of vacuum cavity; the utility model discloses can make up each other with single tube microwave source, and compensate the not enough of single tube magnetron power, the power density in the extra-large cavity has been improved simultaneously, solved at present because single magnetron microwave power is limited, and customization super high power magnetron is expensive, thereby the problem of super large cavity microwave plasma cleaning machine application has been restricted, solved simultaneously because super large microwave plasma cleaning machine has the defect that microwave field distributes inequality and power density is not enough in the cavity, and then restricted microwave plasma cleaning machine cavity size's problem.
Description
Technical Field
The utility model belongs to the technical field of microwave plasma cleaning machine, especially, relate to a waveguide matrix that microwave plasma cleaning machine was used.
Background
With the improvement of the integration degree of electronic circuits, the characteristic size of chips becomes smaller, and the requirements on surface treatment and cleaning of the chips become higher and higher as well as the research and development and use of novel materials, so that the microwave plasma surface cleaning process becomes an important means for improving the reliability and yield of products and is an indispensable step in the production process. In the vacuum cavity, high-energy anisotropic plasma is generated under a certain pressure by a radio frequency power supply, and the plasma bombards or neutral particles contact the surface of a product to be cleaned so as to achieve the cleaning purpose. The plasma cleaning is a brand-new high-tech technology, can clean electronic products which are difficult to clean by a conventional cleaning method by using the plasma, and can meet the new process requirements of no damage, no pollution and corrosion inhibition.
At present, because a single magnetron has limited microwave power and a customized ultrahigh-power magnetron is expensive, the application of a microwave plasma cleaning machine with an oversized cavity is limited, even if the ultrahigh-power microwave plasma cleaning machine is manufactured, the microwave field in the cavity is not uniformly distributed, the power density is insufficient, and the cavity size of the microwave plasma cleaning machine is further limited.
SUMMERY OF THE UTILITY MODEL
The utility model provides a waveguide matrix that microwave plasma cleaning machine was used aims at solving the problem that proposes in the above-mentioned technical background.
The utility model is realized in such a way, a waveguide matrix for a microwave plasma cleaning machine comprises a vacuum cavity, a first fan cover and a second fan cover, wherein the first fan cover is provided with a plurality of fan covers and arranged above the vacuum cavity, the second fan cover is provided with a plurality of fan covers and arranged on the front side of the vacuum cavity, the top of the first fan cover and the front side of the second fan cover are provided with an air inlet and outlet mechanism, the air inlet and outlet mechanism comprises a first air inlet, a first air outlet pipe, a second air inlet and a second air outlet pipe, the top of the vacuum cavity is provided with a first waveguide fixing surface, the front side of the vacuum cavity is provided with a second waveguide fixing surface, the top of the first waveguide fixing surface is provided with a first arc reflecting surface, the front side of the first arc reflecting surface is provided with a first inclined reflecting surface, the front side of the second waveguide fixing surface is provided with a second arc reflecting surface, and a second inclined reflecting surface is arranged at the bottom of the second arc-shaped reflecting surface.
Preferably, the bottom ends of the first air inlet and the first air outlet pipe are communicated with the first fan housing, and the rear ends of the second air inlet and the second air outlet pipe are communicated with the second fan housing.
Preferably, the bottom of the vacuum cavity is provided with a shock pad, and the shock pad is made of shock-absorbing rubber.
Preferably, the first waveguide fixing surface and the second waveguide fixing surface are fixed to each other through bolts and the vacuum cavity, and the first waveguide fixing surface and the second waveguide fixing surface are the same in size.
Preferably, the first inclined reflective surface has an inclination of 60 to 75 °, and the second inclined reflective surface has an inclination of 30 to 45 °.
Preferably, the openings of the first air inlet and the second air inlet are square, and the inner diameters of the first air outlet pipe and the second air outlet pipe are the same.
Compared with the prior art, the beneficial effects of the utility model are that:
the utility model discloses can make up each other with single tube microwave source, and compensate the not enough of single tube magnetron power, the power density in the extra-large cavity has been improved simultaneously, solved at present because single magnetron microwave power is limited, and customization super high power magnetron is expensive, thereby the problem of super large cavity microwave plasma cleaning machine application has been restricted, solved simultaneously because super large microwave plasma cleaning machine has the defect that microwave field distributes inequality and power density is not enough in the cavity, and then restricted microwave plasma cleaning machine cavity size's problem.
Drawings
Fig. 1 is a front view of the structure of the present invention;
FIG. 2 is a left side view of the structure of the present invention;
FIG. 3 is a perspective view of the present invention;
fig. 4 is a top view of the structure of the present invention.
In the figure: 1. a vacuum chamber; 2. a first fan housing; 3. a second fan housing; 4. an air inlet and outlet mechanism; 41. a first air inlet; 42. a first air outlet pipe; 43. a second air inlet; 44. a second air outlet pipe; 5. a first waveguide fixing surface; 6. a second waveguide fixing surface; 7. a first curved reflective surface; 8. a second curved reflective surface; 9. a first inclined reflective surface; 10. a second inclined reflective surface; 11. a shock-absorbing pad.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Referring to fig. 1-4, the present invention provides a waveguide matrix for a microwave plasma cleaning machine, comprising a vacuum chamber 1, a first fan housing 2 and a second fan housing 3, wherein the number of the first fan housing 2 is several and disposed above the vacuum chamber 1, the number of the second fan housing 3 is several and disposed on the front surface of the vacuum chamber 1, the top of the first fan housing 2 and the front surface of the second fan housing 3 are provided with an air inlet and outlet mechanism 4, the air inlet and outlet mechanism 4 comprises a first air inlet 41, a first air outlet pipe 42, a second air inlet 43 and a second air outlet pipe 44, the top of the vacuum chamber 1 is provided with a first waveguide fixing surface 5, the front surface of the vacuum chamber 1 is provided with a second waveguide fixing surface 6, the top of the first waveguide fixing surface 5 is provided with a first arc reflecting surface 7, the front surface of the first arc reflecting surface 7 is provided with a first inclined reflecting surface 9, the front surface of the second waveguide fixing surface 6 is provided with a second arc reflecting surface 8, the bottom of the second arc-shaped reflecting surface 8 is provided with a second inclined reflecting surface 10.
In this embodiment, the utility model discloses can make up single tube microwave source each other to compensate the not enough of single tube magnetron power, improved the power density in the extra-large cavity simultaneously, solved at present because single magnetron microwave power is limited, and customization super large power magnetron is expensive, thereby restricted the problem that super large cavity microwave plasma cleaning machine used, solved simultaneously because super large microwave plasma cleaning machine has the defect that microwave field distributes inequality and power density is not enough in the cavity, and then restricted the problem of microwave plasma cleaning machine cavity size.
Further, the bottom ends of the first air inlet 41 and the first air outlet pipe 42 are communicated with the first fan housing 2, and the rear ends of the second air inlet 43 and the second air outlet pipe 44 are communicated with the second fan housing 3.
In this embodiment, the first air inlet 41, the first air outlet pipe 42, the second air inlet 43, and the second air outlet pipe 44 are arranged and used in cooperation to achieve the air inlet and outlet effects, so that the fan inside the fan housing cools the magnetron.
Further, the bottom of the vacuum chamber 1 is provided with a shock pad 11, and the shock pad 11 is made of shock-absorbing rubber.
In the embodiment, the shock absorption pad 11 plays a role in shock absorption, and reduces the influence of the shock generated during the operation of the equipment on the surrounding environment.
Further, the first waveguide fixing surface 5 and the second waveguide fixing surface 6 are fixed to the vacuum chamber 1 through bolts, and the size of the first waveguide fixing surface 5 is the same as that of the second waveguide fixing surface 6.
In the present embodiment, this design enables the first waveguide fixing surface 5 and the second waveguide fixing surface 6 to be detached for maintenance or replacement.
Further, the inclination angle of the first inclined reflective surface 9 is 60 to 75 °, and the inclination angle of the second inclined reflective surface 10 is 30 to 45 °.
In the present embodiment, this design enables reflection of a partial component of the microwave and makes the microwave distribution more uniform.
Furthermore, the openings of the first air inlet 41 and the second air inlet 43 are both square, and the inner diameters of the first air outlet pipe 42 and the second air outlet pipe 44 are the same.
In the present embodiment, the air inlet and outlet amount of the first fan housing 2 is the same as the air inlet and outlet amount of the second fan housing 3.
The utility model discloses a theory of operation and use flow: when the vacuum cavity works, the magnetrons in the first arc-shaped reflecting surface 7 and the second arc-shaped reflecting surface 8 are simultaneously started, the magnetron in the first arc-shaped reflecting surface 7 starts to generate microwaves, the transverse component of the microwaves is reflected by the first inclined reflecting surface 9 to enter the vacuum cavity 1, the longitudinal component of the microwaves enters the vacuum cavity 1 through the first arc-shaped reflecting surface 7, the magnetron in the second arc-shaped reflecting surface 8 starts to generate microwaves, the transverse component of the microwaves enters the vacuum cavity 1 through the second arc-shaped reflecting surface 8, the longitudinal component of the microwaves enters the vacuum cavity 1 through the second inclined reflecting surface 10, the transverse component of the upper microwave part is added with the longitudinal component under the reflection effect, and the longitudinal component of the lateral microwave part is added with the transverse component under the reflection effect, the microwave plasma cleaning machine has the advantages that two strands of microwaves are enhanced, the mutual influence of the two strands of microwaves is small, the mutual interference caused by the microwave pair bombing is avoided, the microwave field strength inside the vacuum cavity 1 is enhanced, the microwave field distribution is more uniform, the ultra-large part can be cleaned through a plurality of matrixes formed by the structure combination, and the limitation of the application of the ultra-large cavity microwave plasma cleaning machine due to the insufficient power of the magnetron is avoided.
The above description is only exemplary of the present invention and should not be construed as limiting the present invention, and any modifications, equivalents and improvements made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (6)
1. The utility model provides a waveguide matrix that microwave plasma cleaning machine was used, includes vacuum cavity (1), first fan housing (2) and second fan housing (3), its characterized in that: the number of the first fan covers (2) is a plurality of and is arranged above the vacuum cavity (1), the number of the second fan covers (3) is a plurality of and is arranged in the front of the vacuum cavity (1), the top of the first fan covers (2) and the front of the second fan covers (3) are provided with air inlet and outlet mechanisms (4), each air inlet and outlet mechanism (4) comprises a first air inlet (41), a first air outlet pipe (42), a second air inlet (43) and a second air outlet pipe (44), the top of the vacuum cavity (1) is provided with a first waveguide fixing surface (5), the front of the vacuum cavity (1) is provided with a second waveguide fixing surface (6), the top of the first waveguide fixing surface (5) is provided with a first arc reflecting surface (7), the front of the first arc reflecting surface (7) is provided with a first inclined reflecting surface (9), the front of the second waveguide fixing surface (6) is provided with a second arc reflecting surface (8), and a second inclined reflecting surface (10) is arranged at the bottom of the second arc-shaped reflecting surface (8).
2. A waveguide matrix for a microwave plasma cleaner as defined in claim 1, wherein: the bottom ends of the first air inlet (41) and the first air outlet pipe (42) are communicated with the first fan cover (2), and the rear ends of the second air inlet (43) and the second air outlet pipe (44) are communicated with the second fan cover (3).
3. A waveguide matrix for a microwave plasma cleaner as defined in claim 1, wherein: the vacuum chamber is characterized in that a shock absorption pad (11) is arranged at the bottom of the vacuum chamber (1), and the shock absorption pad (11) is made of shock absorption rubber.
4. A waveguide matrix for a microwave plasma cleaner as defined in claim 1, wherein: the first waveguide fixing surface (5) and the second waveguide fixing surface (6) are fixed with the vacuum cavity (1) through bolts, and the size of the first waveguide fixing surface (5) is the same as that of the second waveguide fixing surface (6).
5. A waveguide matrix for a microwave plasma cleaner as defined in claim 1, wherein: the inclination angle of the first inclined reflecting surface (9) is 60-75 degrees, and the inclination angle of the second inclined reflecting surface (10) is 30-45 degrees.
6. A waveguide matrix for a microwave plasma cleaner as defined in claim 1, wherein: the openings of the first air inlet (41) and the second air inlet (43) are square, and the inner diameters of the first air outlet pipe (42) and the second air outlet pipe (44) are the same.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120901692.2U CN214624967U (en) | 2021-04-28 | 2021-04-28 | Waveguide matrix for microwave plasma cleaning machine |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202120901692.2U CN214624967U (en) | 2021-04-28 | 2021-04-28 | Waveguide matrix for microwave plasma cleaning machine |
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| CN214624967U true CN214624967U (en) | 2021-11-05 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114976549A (en) * | 2022-06-22 | 2022-08-30 | 中科光智(西安)科技有限公司 | Microwave plasma cleaning machine combined waveguide device for improving power density |
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2021
- 2021-04-28 CN CN202120901692.2U patent/CN214624967U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114976549A (en) * | 2022-06-22 | 2022-08-30 | 中科光智(西安)科技有限公司 | Microwave plasma cleaning machine combined waveguide device for improving power density |
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Effective date of registration: 20230829 Address after: No. 688 Xiema Street, Xiema Town, Beibei District, Chongqing, 400700 (Xiema Development Park, Chongqing High tech Zone) Patentee after: Zhongke Guangzhi (Chongqing) Technology Co.,Ltd. Address before: Room 2-1, No. 22, Zone C, venture R & D Park, No. 69, Jinye Road, high tech Zone, Xi'an, Shaanxi 710065 Patentee before: Zhongke Guangzhi (Xi'an) Technology Co.,Ltd. |
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