CN214612760U - Rack and reation kettle - Google Patents
Rack and reation kettle Download PDFInfo
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- CN214612760U CN214612760U CN202120544242.2U CN202120544242U CN214612760U CN 214612760 U CN214612760 U CN 214612760U CN 202120544242 U CN202120544242 U CN 202120544242U CN 214612760 U CN214612760 U CN 214612760U
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Abstract
The utility model provides a rack and reation kettle relates to chemical synthesis reaction equipment's technical field, include: a frame body and a fixing piece; the frame body comprises an installation part, and one end of the installation part is connected with the inner wall of the reaction kettle; fixing piece one end is connected with the installation department, and the other end hangs has conductive substrate, fixes conductive substrate through the mode of hanging, makes conductive substrate unsettled, can make conductive substrate and reaction mother liquor fully contact for the normal position growth reaction takes place more thoroughly, and reaction product grows evenly on the substrate surface, solves the gravity product and piles up the influence that influences the degree of consistency. Meanwhile, the space is utilized to the maximum extent, the conductive substrates can be hung in a hanging manner, and the multiple conductive substrates can be hung at the same time, so that the utilization rate of the reaction mother liquor is maximized, and the cost is saved.
Description
Technical Field
The utility model belongs to the technical field of chemical industry synthesis reaction equipment technique and specifically relates to a rack and reation kettle are related to.
Background
In recent years, electrode materials in the fields of supercapacitors, lithium ion batteries, hydrogen production by electrolysis of water, and the like have been studied more and more, wherein the conductivity and the electrochemically active surface area of the electrode are crucial to the performance of the electrode. Generally, the electrode is prepared by the one-step method through in-situ growth of active substances on a conductive substrate, so that the cost can be greatly reduced, and the influence of using an organic binder to prepare the electrode on the conductivity can be avoided.
The principle of in-situ growth is the connection of valence bonds, in the electrode testing process, active substances are not easy to peel off in the electrode prepared by in-situ growth reaction, and the conductive substrate is used for conducting conductors, so that the overall resistance value of the electrode is reduced, and the utilization rate of electrons is improved. In the prior art, the conductive substrate is generally: copper foam, nickel foam, cobalt foam, silver foam, carbon fiber cloth, copper foil, aluminum foil, nickel foil, iron foil, and the like.
In the prior art, the electrode is generally prepared by directly modifying the inner lining of the reaction kettle into a fixed frame with a conductive substrate lying obliquely at the bottom of the reaction kettle, active substances can grow on the conductive substrate in situ, but the active substances growing on the front and back surfaces of the substrate in situ are not uniform, and the inner lining of the reaction kettle has a single function, can only be used for an experiment of supporting and fixing the conductive substrate, and is a serious waste of resources. And because the area of the reaction kettle is limited, the number of the obtained in-situ substrate electrodes is limited, so that the medicines are seriously wasted and the experiment cost is increased.
SUMMERY OF THE UTILITY MODEL
The utility model discloses (one) the problem that will solve is: reaction products are influenced by gravity and are accumulated at the bottom of the reaction kettle, and meanwhile, medicines are wasted, and the experiment cost is increased.
(II) technical scheme
The utility model provides a pair of, a rack for the normal position growth reaction of electrically conductive basement in the reation kettle, include: a frame body and a fixing piece;
the frame body comprises an installation part, and the installation part is connected with the inner wall of the reaction kettle;
one end of the fixing piece is connected with the mounting part, and a conductive substrate is hung at the other end of the fixing piece.
Further, the installation department includes at least one installed part, every be equipped with at least one on the installed part the mounting part.
Further, the rack body also comprises at least one connecting piece;
one end of the connecting piece is connected with the fixing piece, the other end of the connecting piece is connected with the mounting piece, and the connecting piece corresponds to the fixing piece in a one-to-one mode.
Further, the stand further comprises a support part;
supporting part one end with the installation department is connected, and the other end and reation kettle inner wall are connected.
Further, the supporting part comprises a supporting piece and a supporting frame;
the support frame is connected with the bottom wall of the reaction kettle;
one end of the supporting piece is connected with the supporting frame, and the other end of the supporting piece is connected with the mounting piece.
Further, the mounting part also comprises a mounting frame;
the installed part is rod-shaped structure, the installed part is located in the installing frame, and every the both ends of installed part all with the installing frame is connected.
Further, the support portion includes a plurality of the support members;
the supporting pieces are rod-shaped structures, and one ends of the supporting pieces are connected with the supporting frame; the other end is connected with the mounting frame, and a plurality of the supporting pieces are parallel to each other.
Furthermore, one end of the fixing part is connected with the connecting part, and the other end of the fixing part is provided with a hook used for hanging the conductive substrate.
Furthermore, one end of the conductive substrate is suspended on the fixing piece, and the distance between the other end of the conductive substrate and the bottom wall of the reaction kettle is larger than or equal to one centimeter.
The embodiment of the utility model provides a reaction kettle, which comprises an inner lining and a mounting rack, wherein the mounting rack is the rack of any one of the embodiments;
the inside lining is located in the reation kettle, the rack with the inner wall of inside lining can be dismantled and be connected.
The utility model has the advantages that: the utility model provides a rack for the normal position growth reaction of electrically conductive basement in reation kettle, include: a frame body and a fixing piece; the frame body comprises an installation part, and one end of the installation part is connected with the inner wall of the reaction kettle; one end of the fixing piece is connected with the mounting part, and a conductive substrate is hung at the other end of the fixing piece.
The conductive substrate is fixed in a hanging mode and suspended, so that the conductive substrate can be fully contacted with reaction mother liquor, in-situ growth reaction is more thorough, reaction products grow uniformly on the surface of the substrate, and the influence of gravity product accumulation on uniformity is avoided. Meanwhile, the space is utilized to the maximum extent, the conductive substrates can be hung in a hanging manner, and the multiple conductive substrates can be hung at the same time, so that the utilization rate of the reaction mother liquor is maximized, and the cost is saved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic view of a rack structure provided in an embodiment of the present invention;
fig. 2 is a schematic view of a mounting structure of a conductive substrate according to an embodiment of the present invention;
FIG. 3 is a schematic view of a rack and a lining structure of a reaction kettle according to an embodiment of the present invention;
fig. 4 is another schematic structural diagram of the rack provided by the embodiment of the present invention.
Icon: 1-a frame body; 11-a support; 12-a mounting member; 13-mounting the frame; 14-a connector; 15-a support frame;
2-a fixing piece;
31-inner lining; 32-inner liner cover;
4-conductive substrate.
Detailed Description
The technical solution of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
It should be noted that in the description of the present invention, the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
It should be noted that, in the description of the present invention, the terms "connected" and "mounted" should be interpreted broadly, for example, they may be fixedly connected, detachably connected, or integrally connected; can be directly connected or connected through an intermediate medium; either mechanically or electrically. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.
As shown in fig. 1 to 4, an embodiment of the present invention provides a rack for in-situ growth reaction of a conductive substrate 4 in a reaction vessel, including: a frame body 1 and a fixing piece 2; the frame body 1 comprises an installation part, and the installation part is connected with the inner wall of the reaction kettle; one end of the fixing piece 2 is connected with the mounting part, and a conductive substrate 4 is hung at the other end of the fixing piece.
In this embodiment, the stage is applied to a sealed hydrothermal or solvothermal environment with constant temperature and pressure to perform in-situ growth reaction on the conductive substrate 4. In-situ growth is a new method for preparing composite materials, different elements or compounds are subjected to chemical reaction under certain conditions, and one or more ceramic phase particles are generated in a metal matrix, so that the purpose of improving the performance of a single metal alloy is achieved. The frame body 1 is arranged in the inner liner 31 of the reaction kettle, and then reaction mother liquor is injected into the inner liner 31, so that the in-situ production reaction of the conductive substrate 4 can be carried out under the conditions of high-temperature and high-pressure hydrothermal or solvothermal. There is a reaction chamber that is used for carrying out normal position growth reaction in reation kettle, the installation department can be for the diapire with the interior wall connection of reaction chamber, and this inner wall also can be the lateral wall, in order to avoid reation kettle function singleness, the installation department is connected for dismantling with reation kettle's inner wall, and the rethread connecting portion are connected with mounting 2, locate the reaction intracavity with mounting 2, simultaneously, electrically conductive basement 4 hang in on the mounting 2, keep away from the inner wall of reaction chamber, can make electrically conductive basement 4 fully contact with reaction mother liquor again, can be at utmost utilize the space in the reaction chamber, realize that a plurality of electrically conductive basement 4 carry out normal position growth reaction simultaneously, practice thrift the cost simultaneously. The reaction mother liquor reacts with the conductive substrate 4 to generate precipitates, the precipitates are accumulated at the bottom under the influence of gravity, and a certain interval is required between one end of the conductive substrate 4 far away from the fixing piece 2 and the bottom wall, so that the influence of the accumulation of the products on the surface uniformity of the conductive substrate 4 can be solved.
As shown in fig. 1 and 2, the mounting portion includes at least one mounting portion 12, and each of the mounting portions 12 is provided with at least one fixing member 2.
In this embodiment, in order to save cost, in an experiment, in-situ growth of active materials on different substrate materials is realized, the mounting portion may be provided with a plurality of fixing members 2, and a plurality of fixing members 2 are suspended with conductive substrates 4.
As shown in fig. 1 and 2, the frame body 1 further comprises at least one connecting member 14; one end of the connecting piece 14 is connected with the fixing piece 2, the other end of the connecting piece is connected with the mounting piece 12, and the connecting pieces 14 correspond to the fixing pieces 2 one to one.
In this embodiment, the rack is further provided with a connecting member 14 for connecting the fixing members 2 and the mounting members 12, each fixing member 2 corresponds to one of the connecting members 14, and the fixing members 2 are arranged on the rack body 1 in a hanging manner through the connecting members 14.
As shown in fig. 1 and 2, the stage further includes a support portion; supporting part one end with the installation department is connected, and the other end and reation kettle inner wall are connected.
In this embodiment, for making electrically conductive basement 4 is unsettled in reation kettle's reaction chamber, the rack still is equipped with the supporting part, supporting part one end and reation kettle inner wall butt, and other end installation department is connected, in order to realize with mounting 2 hangs in the reaction chamber, is about to electrically conductive basement 4 hang in the reaction chamber. The inner wall here may be a side wall of the reaction chamber, and may also be a bottom wall of the reaction chamber, which may all achieve the purpose of suspending the conductive substrate 4 in the present embodiment.
As shown in fig. 1 and 2, the supporting portion includes a supporting member 11 and a supporting frame 15; the support frame 15 is connected with the bottom wall of the reaction kettle; one end of the supporting part 11 is connected with the supporting frame 15, and the other end is connected with the mounting part 12.
In this embodiment, preferably, the supporting portion is connected to the bottom wall of the reaction kettle, and the supporting frame 15 is used to improve the stability of the rack.
As shown in fig. 1 and 2, the mounting portion further includes a mounting frame 13; the mounting member 12 is a rod-shaped structure, the mounting member 12 is disposed in the mounting frame 13, and each of the two ends of the mounting member 12 is connected to the mounting frame 13.
In this embodiment, the mounting frame 13 is used to stabilize the structure of the mounting portion and prevent inclination due to different gravity.
In this embodiment, preferably, the connecting member 14 is a connecting rod, the connecting portion includes a plurality of connecting rods, and both ends of each connecting rod are connected to the mounting frame 13, so that the mounting member 12 fixes the conductive base 4 more stably.
As shown in fig. 1 and 2, the support portion includes a plurality of the support members 11; the supporting members 11 are rod-shaped structures, and one ends of the supporting members 11 are connected with the supporting frame 15; the other end is connected with the mounting frame 13, and the plurality of supporting pieces 11 are parallel to each other.
In this embodiment, preferably, the supporting portion includes a plurality of supporting members 11, the supporting members 11 are supporting rods, one end of each of the supporting rods is connected to the supporting frame 15, and the other end of each of the supporting rods is connected to the mounting frame 13, so that the supporting portion can stably support the mounting portion, and the conductive substrate 4 performs an in-situ growth reaction.
In this embodiment, preferably, the plurality of support rods are parallel to each other and perpendicular to the support frame 15, so as to maximize stability.
As shown in fig. 1 and 2, the fixing member 2 is connected to the connecting member 14 at one end and provided with a hook for hanging the conductive base 4 at the other end.
In this embodiment, it is preferred, mounting 2 is the crotch, be equipped with the through-hole on the electrically conductive basement 4, in order to incite somebody to action electrically conductive basement 4 hangs on the crotch, makes electrically conductive basement 4 erect, practices thrift the space, makes the utilization ratio maximize of reaction mother liquor simultaneously, and normal position growth projection product productivity promotes greatly, can also guarantee simultaneously that reation kettle is in the removal in-process, also can not take place to drop under the condition of acutely rocking.
It can be understood that, in this embodiment, the fixing member 2 may also be connected by screws, the fixing member 2 is a plate, a threaded through hole is formed in the plate, a through hole matched with the threaded through hole is formed in the conductive substrate 4, and the conductive substrate 4 is suspended on the fixing member 2 by screws, which can also achieve the purpose of suspending the conductive substrate 4 on the rack.
It is understood that, in this embodiment, the fixing member 2 may also be a fixing clip, and the fixing clip clamps the conductive substrate 4, which also achieves the purpose of suspending the conductive substrate 4 on the rack in this embodiment.
As shown in fig. 1 and fig. 2, in this embodiment, one end of the conductive substrate 4 is suspended from the fixing member 2, and the distance between the other end of the conductive substrate and the bottom wall of the reaction kettle is greater than or equal to one centimeter.
In the embodiment, in the in-situ growth reaction process, the hydrothermal or solvothermal reaction product is influenced by gravity, the product is usually deposited at the bottom of the lining 31, the closer to the bottom, the more the product is accumulated, the more the upper layer is uniform, the lower layer is excessively produced, the uniformity of the in-situ growth conductive substrate 4 is seriously influenced, and the waste is caused, so that the conductive substrate 4 is suspended on the mounting rod, meanwhile, a certain interval is reserved between the lower end of the conductive substrate 4 and the bottom of the lining 31, and the problem that the in-situ growth reaction product is influenced by gravity and accumulated to influence the uniformity is solved.
In this embodiment, the mounting member 12 includes another embodiment, as shown in fig. 4, the frame body 1 includes a plurality of mounting rods; the installation pieces 12 are arranged on the support piece 11 and distributed at intervals from one end of the support piece 11 far away from the bottom wall of the reaction kettle to one end close to the bottom wall of the reaction kettle, and the interval between every two adjacent installation rods is larger than or equal to the sum of the lengths of the conductive substrate 4, the connecting piece 14 and the fixing piece 2.
As shown in fig. 1 to 4, the present invention further provides a reaction kettle, which includes an inner liner 31 and a mounting rack, wherein the mounting rack is the rack described in any of the above embodiments; the inside lining 31 is located in the reation kettle, the rack with the inner wall detachable connection of inside lining 31.
In this embodiment, the mounting form of rack and inside lining 31 is detachable installation, avoids leading to the reation kettle usage single because of rack and inside lining 31 fixed connection, causes serious waste.
The inside lining 31 material is polytetrafluoroethylene usually, in this application, and is preferred, support body 1's material with inside lining 31's material is the same, avoids causing the influence to the normal position growth reaction result because of support body 1's material, support body 1 is through integrative die casting shaping, and simple structure can realize industrial production, and simultaneously, the detachable structure does not influence reation kettle's own usage, need not to do any change to inside lining 31 structure.
In this embodiment, the conductive substrate 4 is hung on the hook, the whole frame body 1 is placed in the inner liner 31 of the reaction kettle, the reaction mother liquor is added into the inner liner 31, and the reaction kettle is covered with the inner liner cover 32, that is, the surface in-situ growth reaction of the electrode material of the conductive substrate 4 is carried out under the conditions of high temperature and high pressure, hydrothermal reaction or solvothermal reaction. The conductive substrate 4 may be made of: copper foam, nickel foam, cobalt foam, silver foam, carbon fiber cloth, copper foil, aluminum foil, nickel foil, iron foil, and the like.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention.
Claims (10)
1. A gantry for in situ growth reaction of a conductive substrate (4) in a reaction vessel, comprising: a frame body (1) and a fixing piece (2);
the frame body (1) comprises an installation part, and the installation part is connected with the inner wall of the reaction kettle;
one end of the fixing piece (2) is connected with the mounting part, and a conductive substrate (4) is hung at the other end of the fixing piece.
2. A gantry according to claim 1, characterized in that the mounting comprises at least one mounting element (12), at least one fixing element (2) being provided on each mounting element (12).
3. A gantry according to claim 2, characterized in that said frame (1) further comprises at least one connector (14);
one end of the connecting piece (14) is connected with the fixing piece (2), the other end of the connecting piece is connected with the mounting piece (12), and the connecting piece (14) corresponds to the fixing piece (2) in a one-to-one mode.
4. A gantry according to claim 2, characterized in that it further comprises a support;
supporting part one end with the installation department is connected, and the other end and reation kettle inner wall are connected.
5. A gantry according to claim 4, characterized in that said support comprises a support (11) and a support frame (15);
the supporting frame (15) is connected with the bottom wall of the reaction kettle;
one end of the supporting piece (11) is connected with the supporting frame (15), and the other end of the supporting piece is connected with the mounting piece (12).
6. A gantry according to claim 5, characterized in that the mounting part further comprises a mounting frame (13);
the installed part is the shaft-like structure, installed part (12) are located in installing frame (13), and every the both ends of installed part (12) all with installing frame (13) are connected.
7. A gantry according to claim 6, characterized in that said support comprises a plurality of said supports (11);
the supporting pieces are rod-shaped structures, and one ends of the supporting pieces (11) are connected with the supporting frame (15); the other end is connected with the mounting frame (13), and the plurality of supporting pieces (11) are parallel.
8. A gantry according to claim 3, characterized in that the fixed part (2) is connected to the connecting piece (14) at one end and provided with a hook at the other end for hanging the conductive base (4).
9. A gantry according to claim 1, characterized in that said electrically conductive base (4) is suspended from said fixed part (2) at one end and is spaced from the bottom wall of the reactor by a distance greater than or equal to one centimetre at the other end.
10. A reactor comprising an inner liner (31) and a mounting frame, characterized in that the mounting frame is a platform according to any one of claims 1 to 9;
the inner liner (31) is arranged in the reaction kettle, and the rack is detachably connected with the inner wall of the inner liner (31).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120544242.2U CN214612760U (en) | 2021-03-16 | 2021-03-16 | Rack and reation kettle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120544242.2U CN214612760U (en) | 2021-03-16 | 2021-03-16 | Rack and reation kettle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214612760U true CN214612760U (en) | 2021-11-05 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120544242.2U Active CN214612760U (en) | 2021-03-16 | 2021-03-16 | Rack and reation kettle |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214612760U (en) |
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2021
- 2021-03-16 CN CN202120544242.2U patent/CN214612760U/en active Active
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