CN214572669U

CN214572669U - Lace wafer embroidery cloth

Info

Publication number: CN214572669U
Application number: CN202120446752.6U
Authority: CN
Inventors: 周国军
Original assignee: Shaoxing Keqiao Zero Textile Co ltd
Current assignee: Shaoxing Keqiao Zero Textile Co ltd
Priority date: 2021-03-02
Filing date: 2021-03-02
Publication date: 2021-11-02
Anticipated expiration: 2031-03-02

Abstract

The utility model discloses a lace wafer embroidery cloth relates to textile fabric technical field, and its technical scheme main points are: the novel lace-free fabric comprises a base fabric layer, wherein a plurality of lace tissues are arranged on the base fabric layer, reinforcing strips are connected between adjacent lace tissues, each reinforcing strip comprises a connecting belt and a plurality of wafers, the two ends of each connecting belt are respectively connected between the lace tissues on the two sides and the base fabric layer in a sewing mode, and the wafers are sewn on the connecting belts along the length direction of the connecting belts through embroidery threads. The utility model discloses a flower bud silk and wafer complex structure for flower type tissue is more three-dimensional on the surface fabric, and adopts compound connection structure, makes each flower type tissue and decoration part more stable.

Description

Lace wafer embroidery cloth

Technical Field

The utility model relates to a textile fabric technical field, more specifically say, it relates to a flower bud silk wafer embroidery cloth.

Background

The lace embroidery fabric is formed by embroidering lace-like pattern tissues on a yarn mesh cloth through embroidery threads, so that the fabric has a good light transmission effect and can clearly and obviously penetrate through an object on the other side of the fabric, and the fabric has a special decorative effect. When the garment is used specifically, the light-transmitting fabric or the mesh fabric can be adopted according to different base fabrics of the fabric, and the garment is generally suitable for lace dresses, wedding dresses or fashionable dresses and can form a relative decoration effect on the surface of the garment.

The base fabric of the lace fabric is light, thin and transparent, the overall strength of the lace fabric is poor, the lace fabric is prone to being torn by external force, part of the lace fabric is processed in a direct hollowed-out mode, the lace is needed to line the embroidery threads between the lace patterns of adjacent areas, and the embroidery threads are connected only through the embroidery threads, so that the comprehensive strength of the embroidery fabric is low.

Therefore, a new solution is needed to solve this problem.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a lace wafer embroidery cloth in order to solve the above-mentioned problem, this lace embroidery surface fabric has good intensity, has improved the combined effect of lace embroidery surface fabric.

The above technical purpose of the present invention can be achieved by the following technical solutions: the lace wafer embroidered cloth comprises a base cloth layer and is characterized in that a plurality of lace tissues are arranged on the base cloth layer, a reinforcing strip is connected between every two adjacent lace tissues and comprises a connecting strip and a plurality of wafers, two ends of the connecting strip are respectively connected between the lace tissues on two sides and the base cloth layer in a sewing mode, and the wafers are sewn on the connecting strip along the length direction of the connecting strip through embroidery threads.

By adopting the technical scheme, the adjacent lace tissues are connected through the reinforcing strips, so that the strength of the area between the adjacent lace tissues can be increased, and the overall strength performance of the fabric is improved; the connecting band among the reinforcing strip is sewed up between pre-buried and lace tissue and the base cloth layer to can improve the joint strength who strengthens strip and lace tissue, and strengthen the trend of strip more and bond it or sew up with the base cloth layer, can make and strengthen having good laminating degree between strip and the surface fabric surface, and embroider the wafer and strengthen on the strip, thereby can cover the embroidery cloth surface to a certain extent, improve the stereoeffect of surface fabric.

The utility model discloses further set up as, set up the connecting hole that is used for the embroidery line to pass and be used for the breach of embroidery line embedding on the wafer.

By adopting the technical scheme, the embroidery threads can conveniently penetrate through the connecting holes to be connected in a sewing mode, the notches at the edges of the wafers enable the embroidery threads to be embedded, a more stable connecting structure is formed, and the wafers are prevented from deviating.

The utility model discloses further set up as, the breach sets up two and is located the both sides of wafer respectively on the wafer.

By adopting the technical scheme, the two notches are respectively positioned at the two sides of the connecting hole on the wafer, so that the connecting stability of the wafer after being sewn can be further improved.

The utility model discloses further set up as, the one side complex that the wafer faced the base cloth layer has the lining cloth layer, and the lining cloth profile on every wafer corresponds with the wafer.

Through adopting above-mentioned technical scheme, through compound bonding lining cloth, the lining cloth layer has better coarse feel and coefficient of friction for the wafer, is difficult for producing the circumstances such as skid when contacting with the surface fabric surface, and compound connection back can be so that wafer and base cloth layer keep more stable laminating.

The utility model discloses further set up as, the width of connecting band is less than the width of wafer, the connecting band passes from between wafer and the lining cloth layer.

By adopting the technical scheme, the connecting belt passes through the wafer and the lining cloth layer, and the wafer and the lining cloth layer are compounded and bonded in advance, so that the strength between the wafer and the connecting belt can be improved, and the stitching of the embroidery threads can reinforce the wafer and the connecting belt.

The utility model discloses it further sets up to, the embroidery line passes wafer, connecting band, lining cloth layer and base cloth layer and sews up.

By adopting the technical scheme, the embroidery threads sew and connect all parts integrally to form a beaten whole, and all parts on the fabric can move synchronously in the moving process of the fabric.

To sum up, the utility model discloses following beneficial effect has: auxiliary supporting and connection are carried out to each part of surface fabric through the enhancement strip, can carry out auxiliary when the surface fabric receives the pulling force of this position, thereby can improve the bulk strength of lace embroidery surface fabric.

Drawings

FIG. 1 is a schematic structural view of a lace wafer embroidery cloth of the present invention;

FIG. 2 is a schematic view of a connection structure of a wafer according to the present invention;

fig. 3 is a cross-sectional view of a wafer according to the present invention.

Reference numerals: 1. a base cloth layer; 2. lace tissue; 3. a reinforcing strip; 4. a connecting belt; 5. a wafer; 6. embroidery thread; 7. connecting holes; 8. a notch; 9. and a lining cloth layer.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, a lace wafer embroidery cloth includes a base cloth layer 1, a lace tissue 2 embroidered on the base cloth layer 1, the lace tissue 2 is distributed in a gap shape, the base cloth layer 1 can select a gauze or a transparent fabric according to the requirement, etc.; the reinforcing strips 3 are connected between the adjacent lace tissues 2, the lace tissues 2 are connected, and auxiliary support can be performed in the stretching process, so that the overall strength of the fabric is improved.

The reinforcing strip 3 comprises a connecting strip 4 and a plurality of wafers 5, wherein the wafers 5 are connected on the connecting strip 4 and can be connected by adopting a bonding or sewing or mutual combination mode; in order to improve the strength of the reinforcing strips 3, the connecting belt 4 can be woven by composite fibers, wherein the composite fibers comprise yarn cores formed by weaving polyester and nylon in a mixed mode to form a supporting framework, and cotton fibers or polyester fibers are coated outside the yarns for protection, so that the composite fibers which are more tensile and stable can be formed, and the strength and the toughness of the woven connecting belt 4 are improved.

The two ends of the connecting belt 4 are respectively sewn between the lace tissues 2 on the two sides and the base cloth layer 1 to form a pre-buried sewn connecting structure, so that the connecting strength of the reinforcing strips 3 and the lace tissues 2 can be improved, the reinforcing strips 3 are bonded or sewn with the base cloth layer 1 according to the trend of the reinforcing strips 3, and the reinforcing strips 3 can be well attached to the surface of the fabric; the wafer 5 is sewed on the connecting band 4 along the length direction of the connecting band 4 through the embroidery threads 6, the type and the color of the wafer 5 can be specifically selected with a flower type, and the wafer 5 is embroidered and reinforced on the strip 3, so that the surface of the embroidery cloth can be covered to a certain degree, and the three-dimensional effect of the fabric is improved.

The embroidery threads 6 are adopted to sew the wafer 5, the wafer 5 is provided with the connecting hole 7 and the notches 8, the connecting hole 7 is located in the middle of the wafer 5 and is used for the embroidery threads 6 to penetrate, the two notches 8 are located on the two side edges of the wafer 5, the embroidery threads 6 can be embedded, a more stable connecting structure is formed, and the wafer 5 is prevented from deviating. The symmetrical positions of the notches 8 can further increase the connection stability of the wafers 5 after being stitched.

The lining cloth layer 9 is compounded on one side of the wafer 5 facing the base cloth layer 1 and can be connected in an adhesive or hot pressing mode, the lining cloth contour on each wafer 5 corresponds to the wafer 5 and covers the positions of the connecting holes 7 and the notches 8 on the wafer 5, when the embroidery threads 6 penetrate through, force can be applied between the embroidery threads 6 and the lining cloth layer 9, and the situation that the embroidery threads 6 are broken due to cutting of the edges of the embroidery threads 6 and the wafer 5 is reduced.

Through the compound lining cloth that bonds, lining cloth layer 9 has better coarse feel and coefficient of friction for wafer 5, is difficult for producing the condition such as skid when contacting with the surface fabric, and compound the back of connecting can make wafer 5 and base cloth layer 1 keep more stable laminating.

In order to improve the fabric stability at the position of the reinforcing tape 3, the width of the connecting tape 4 is set to be smaller than the width of the wafer 5, and the connecting tape 4 is passed through between the wafer 5 and the interlining layer 9, and the three are combined and bonded in advance, whereby the strength between the wafer 5 and the connecting tape 4 can be improved, and the stitching of the stitch yarn 6 can reinforce the same. Then, when sewing, the sewn embroidery threads 6 can penetrate through the wafer 5, the connecting belt 4, the lining cloth layer 9 and the base cloth layer 1 to be sewn, the whole parts are sewn and connected by adopting the additional embroidery threads 6 to form a beaten whole, and the parts on the fabric can move synchronously in the moving process of the fabric, so that the stability of the fabric is improved.

It is above only the utility model discloses a preferred embodiment, the utility model discloses a scope of protection does not only confine above-mentioned embodiment, the all belongs to the utility model discloses a technical scheme under the thinking all belongs to the utility model discloses a scope of protection. It should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.

Claims

1. The lace wafer embroidery cloth comprises a base cloth layer (1) and is characterized in that a plurality of lace tissues (2) are arranged on the base cloth layer (1), reinforcing strips (3) are connected between every two adjacent lace tissues (2), each reinforcing strip (3) comprises a connecting belt (4) and a plurality of wafers (5), two ends of each connecting belt (4) are respectively connected between the lace tissues (2) on two sides and the base cloth layer (1) in a sewing mode, and the wafers (5) are sewn on the connecting belts (4) along the length direction of the connecting belts (4) through embroidery threads (6).

2. The lace wafer embroidery cloth according to claim 1, wherein: the wafer (5) is provided with a connecting hole (7) for the embroidery threads (6) to pass through and a notch (8) for the embroidery threads (6) to be embedded.

3. The lace wafer embroidery cloth according to claim 2, wherein: the two notches (8) on the wafer (5) are respectively positioned at two sides of the wafer (5).

4. The lace wafer embroidery cloth according to claim 3, wherein: one side of the wafer (5) facing the base cloth layer (1) is compounded with a lining cloth layer (9), and the outline of the lining cloth on each wafer (5) corresponds to that of the wafer (5).

5. The lace wafer embroidery cloth according to claim 4, wherein: the width of the connecting belt (4) is smaller than that of the wafer (5), and the connecting belt (4) penetrates through the space between the wafer (5) and the lining cloth layer (9).

6. The lace wafer embroidery cloth according to claim 5, wherein: the embroidery thread (6) penetrates through the wafer (5), the connecting belt (4), the lining cloth layer (9) and the base cloth layer (1) to be sewn.