CN214572217U - Cooling hood for microwave plasma chemical vapor deposition equipment - Google Patents

Cooling hood for microwave plasma chemical vapor deposition equipment Download PDF

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Publication number
CN214572217U
CN214572217U CN202023244078.8U CN202023244078U CN214572217U CN 214572217 U CN214572217 U CN 214572217U CN 202023244078 U CN202023244078 U CN 202023244078U CN 214572217 U CN214572217 U CN 214572217U
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China
Prior art keywords
cover body
vapor deposition
microwave plasma
fixedly connected
chemical vapor
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CN202023244078.8U
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Chinese (zh)
Inventor
刘华
刘引
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Chengdu Huayu Microwave Technology Co ltd
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Chengdu Huayu Microwave Technology Co ltd
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Abstract

The utility model discloses a microwave plasma chemical vapor deposition is cooling jacket for equipment, the on-line screen storage device comprises a base, the equal fixedly connected with spacing slide rail of top both sides edge of base, two the common embedding sliding connection of spacing slide rail has the cover body, the interior top of the cover body is opened and is equipped with a chamber, the both ends inside wall of the cover body has all been seted up the side chamber, and link up each other between side chamber and the chamber of pushing up, two the inboard in side chamber all imbeds and is provided with the heat pipe, and just two sets of heat pipes all extend to the inboard in chamber, and are two sets of fixed connection between the top of heat pipe. The utility model discloses in, through the route cooling with the air process for the leading-in air of cooling blower is cooled down, thereby makes these low temperature air blow to microwave plasma chemical vapor deposition equipment when the cover body, can dispel the heat to microwave plasma chemical vapor deposition equipment fast effectively, is favorable to promoting the radiating efficiency.

Description

Cooling hood for microwave plasma chemical vapor deposition equipment
Technical Field
The utility model relates to a microwave plasma chemical vapor deposition equipment accessory technical field especially relates to microwave plasma chemical vapor deposition equipment is with cooling jacket.
Background
The microwave plasma chemical vapor deposition system is a process test instrument used in the field of material science;
at present, most of heat dissipation of the existing microwave plasma chemical vapor deposition equipment is passive heat dissipation, so that the heat dissipation efficiency is low, and the effect of quickly cooling and dissipating heat of the microwave plasma chemical vapor deposition equipment cannot be achieved.
SUMMERY OF THE UTILITY MODEL
The utility model aims at solving the defects existing in the prior art and providing a cooling cover for a microwave plasma chemical vapor deposition device.
In order to achieve the above purpose, the utility model adopts the following technical scheme: the cooling cover for the microwave plasma chemical vapor deposition equipment comprises a base, wherein limit slide rails are fixedly connected at two side edges of the top end of the base, two limit slide rails are embedded into a sliding connection cover body together, a top cavity is arranged at the inner top side of the cover body, side cavities are arranged in the inner side walls of the two ends of the cover body, the side cavities are communicated with the top cavity, heat conduction pipes are embedded into the inner sides of the two side cavities, the two sets of heat conduction pipes extend to the inner side of the top cavity, the top ends of the two sets of heat conduction pipes are fixedly connected, one ends of the two sets of heat conduction pipes, far away from the top cavity, extend to the outer side through the inner side walls of the side cavities and are fixedly connected with a drainage interface, a plurality of heat dissipation grooves are arranged at the inner side walls of the two ends of the cover body, the heat dissipation grooves are communicated with the side cavities, and a water supply interface is fixedly connected at one side edge of the top end of the cover body, and the water supply interface runs through the top of the cover body and extends to the inboard of a chamber and with fixed connection between the junction of two sets of heat pipes, the top intermediate position fixedly connected with fixed interface of the cover body, fixed interface passes through bolt fixedly connected with cooling fan, the air inlet has been seted up to the position that the top of the cover body corresponds fixed interface, and link up each other between air inlet and the chamber of a top.
As a further description of the above technical solution:
a plurality of exhaust holes are formed in the two sides, close to the heat dissipation groove, of the top end of the base.
As a further description of the above technical solution:
the bottom four corners of base all fixedly connected with supporting legs.
As a further description of the above technical solution:
the base is close to the position of two spacing slide rail port departments and has seted up the location spout, and all mutually perpendicular between location spout and the two spacing slide rails.
As a further description of the above technical solution:
the locating sliding groove is embedded into the sliding connection and is provided with a limiting side plate, a transmission frame is fixedly connected to the top side of one end of the limiting side plate, a threaded hand wheel is connected to one side, away from the limiting side plate, of the transmission frame in a threaded mode, and the threaded hand wheel is embedded into the locating sliding groove and is rotatably connected with the locating sliding groove.
As a further description of the above technical solution:
and a filter screen is fixedly connected at the air inlet of the heat radiation fan.
The utility model discloses following beneficial effect has:
this cooling jacket for microwave plasma chemical vapor deposition equipment, the route through with the air process is cooled down for the leading-in air of cooling blower is cooled down, thereby makes these low temperature air blow to microwave plasma chemical vapor deposition equipment when the cover body, can dispel the heat to microwave plasma chemical vapor deposition equipment fast effectively, is favorable to promoting the radiating efficiency.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention;
fig. 2 is a schematic front view of the structure of the present invention;
fig. 3 is a schematic view of the structure of the limiting side plate of the present invention.
Illustration of the drawings: 1. a base; 2. a limiting slide rail; 3. a cover body; 4. a top chamber; 5. a lateral cavity; 6. a heat conducting pipe; 7. a heat sink; 8. a water supply interface; 9. an air inlet; 10. fixing the interface; 11. a water drainage interface; 12. an exhaust hole; 13. supporting legs; 14. positioning the chute; 15. a limiting side plate; 16. a threaded hand wheel; 17. a transmission frame; 18. a heat radiation fan; 19. and (4) a filter screen.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention; the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance, and furthermore, unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Referring to fig. 1-3, the present invention provides an embodiment: the cooling cover for the microwave plasma chemical vapor deposition equipment comprises a base 1, wherein two side edges of the top end of the base 1 are fixedly connected with limit slide rails 2, the two limit slide rails 2 are embedded into a sliding connection cover body 3 together, a top cavity 4 is arranged on the inner top side of the cover body 3, side cavities 5 are arranged in the inner side walls of the two ends of the cover body 3, the side cavities 5 and the top cavity 4 are communicated with each other, heat conduction pipes 6 are embedded into the inner sides of the two side cavities 5, the two groups of heat conduction pipes 6 extend to the inner side of the top cavity 4, the top ends of the two groups of heat conduction pipes 6 are fixedly connected, one ends of the two groups of heat conduction pipes 6, far away from the top cavity 4, extend to the outer side through the inner side walls of the side cavities 5 and are fixedly connected with a drainage interface 11, the inner side walls of the two ends of the cover body 3 are provided with a plurality of heat dissipation grooves 7, the heat dissipation grooves 7 and the side cavities 5 are communicated with each other, one side edge of the top end of the cover body 3 is fixedly connected with a water supply interface 8, and the water supply interface 8 runs through the top of the cover body 3 and extends to the inboard of the top chamber 4 and fixedly connected with the junction of the two sets of heat conduction pipes 6, the top middle position fixedly connected with fixed interface 10 of the cover body 3, fixed interface 10 is through bolt fixedly connected with cooling fan 18, the top of the cover body 3 corresponds the position of fixed interface 10 and has been seted up air inlet 9, and air inlet 9 and top chamber 4 are link up each other.
A plurality of exhaust holes 12 are formed in the two sides of the top end of the base 1 close to the heat dissipation groove 7, so that certain ventilation and heat dissipation effects on the bottom side of the microwave plasma chemical vapor deposition equipment are facilitated; the four corners of the bottom end of the base 1 are fixedly connected with supporting legs 13, which are beneficial to supporting the base 1, so that the exhaust holes 12 of the base 1 are convenient for exhausting gas; the base 1 is provided with a positioning chute 14 at a position close to the end openings of the two limiting slide rails 2, the positioning chute 14 is perpendicular to the two limiting slide rails 2, and the positioning chute 14 is arranged at the end opening of the limiting slide rail 2, so that a limiting side plate 15 in the positioning chute 14 can be conveniently and stably abutted to equipment embedded in the cover body 3; the positioning chute 14 is connected with a limiting side plate 15 in an embedded sliding mode, the top side of one end of the limiting side plate 15 is fixedly connected with a transmission frame 17, one side, far away from the limiting side plate 15, of the transmission frame 17 is connected with a threaded hand wheel 16 in a threaded mode, the threaded hand wheel 16 is connected with the positioning chute 14 in an embedded rotating mode, and the transmission frame 17 drives the limiting side plate 15 to stably move up and down along the positioning chute 14 by rotating the threaded hand wheel 16; the air inlet of the heat dissipation fan 18 is fixedly connected with a filter screen 19, which is beneficial to preventing the heat dissipation fan 18 from directly guiding external dust into the top cavity 4 and the side cavity 5.
The working principle is as follows: when the cooling cover for the microwave plasma chemical vapor deposition equipment is used, firstly, a water supply end of the water supply equipment is connected to a water supply interface 8 of the cover body 3, a backflow water pipe is connected to a water discharge interface 11 of the cover body 3, distilled water for cooling is injected into the heat conduction pipe 6 through the water supply equipment, the surface temperature of the heat conduction pipe 6 is rapidly reduced, meanwhile, the temperature in the top cavity 4 and the temperature in the side cavity 5 are rapidly reduced, when a heat radiation fan 18 on the fixed interface 10 blows air into the top cavity 4, the external air gradually flows to the side cavity 5 along the top cavity 4, in the process, the air is fully contacted with the heat conduction pipe 6, so that the temperature of the air discharged through the heat radiation groove 7 is greatly lower than the temperature of the external air, and when the air is discharged to the microwave plasma chemical vapor deposition equipment between the base 1 and the cover body 3, the microwave plasma chemical vapor deposition equipment can be rapidly and effectively cooled, be favorable to promoting the radiating efficiency, when microwave plasma chemical vapor deposition equipment was when the inboard operation of the cover body 3, the staff made the driving frame 17 drive spacing curb plate 15 upwards shift out along location spout 14 through rotating threaded hand wheel 16 to make spacing curb plate 15 support the microwave plasma chemical vapor deposition equipment of spacing slide rail 2 one side steadily, avoid equipment to take place to rock, have certain practicality.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications and variations can be made in the embodiments or in part of the technical features of the embodiments without departing from the spirit and the principles of the present invention.

Claims (6)

1. Microwave plasma chemistry cooling jacket for vapor deposition equipment, including base (1), its characterized in that: the edge of the two sides of the top end of the base (1) is fixedly connected with limit slide rails (2), the two limit slide rails (2) are embedded into a sliding connection cover body (3) together, a top cavity (4) is arranged on the inner top side of the cover body (3), side cavities (5) are arranged in the inner side walls of the two ends of the cover body (3), the side cavities (5) and the top cavity (4) are communicated with each other, heat conduction pipes (6) are embedded into the inner sides of the two side cavities (5), the two groups of heat conduction pipes (6) extend to the inner side of the top cavity (4), the top ends of the two groups of heat conduction pipes (6) are fixedly connected, one ends of the two groups of heat conduction pipes (6), far away from the top cavity (4), extend to the outer side through the inner side walls of the side cavities (5) and are fixedly connected with a drainage interface (11), and a plurality of heat dissipation grooves (7) are arranged on the inner side walls of the two ends of the cover body (3), and link up each other between radiating groove (7) and side chamber (5), the top one side edge fixedly connected with water supply interface (8) of the cover body (3), and water supply interface (8) run through the top of the cover body (3) extend to the inboard of top chamber (4) and with fixed connection between the junction of two sets of heat pipe (6), the top intermediate position fixedly connected with fixed interface (10) of the cover body (3), fixed interface (10) are through bolt fixedly connected with cooling fan (18), air inlet (9) have been seted up to the position that the top of the cover body (3) corresponds fixed interface (10), and link up each other between air inlet (9) and top chamber (4).
2. The cooling jacket for a microwave plasma chemical vapor deposition apparatus as set forth in claim 1, wherein: a plurality of exhaust holes (12) are formed in the two sides, close to the heat dissipation groove (7), of the top end of the base (1).
3. The cooling jacket for a microwave plasma chemical vapor deposition apparatus as set forth in claim 1, wherein: the bottom end four corners of the base (1) are fixedly connected with supporting legs (13).
4. The cooling jacket for a microwave plasma chemical vapor deposition apparatus as set forth in claim 1, wherein: the base (1) is close to the position of two spacing slide rail (2) port departments and has seted up location spout (14), and all mutually perpendicular between location spout (14) and two spacing slide rail (2).
5. The cooling jacket for a microwave plasma chemical vapor deposition apparatus as set forth in claim 4, wherein: the utility model discloses a spacing curb plate of location spout (14) embedding sliding connection has spacing curb plate (15), one end top side fixedly connected with driving frame (17) of spacing curb plate (15), one side threaded connection that spacing curb plate (15) were kept away from in driving frame (17) has screw thread hand wheel (16), and imbeds between screw thread hand wheel (16) and the location spout (14) and rotate to be connected.
6. The cooling jacket for a microwave plasma chemical vapor deposition apparatus as set forth in claim 1, wherein: and a filter screen (19) is fixedly connected at the air inlet of the heat radiation fan (18).
CN202023244078.8U 2020-12-29 2020-12-29 Cooling hood for microwave plasma chemical vapor deposition equipment Active CN214572217U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202023244078.8U CN214572217U (en) 2020-12-29 2020-12-29 Cooling hood for microwave plasma chemical vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202023244078.8U CN214572217U (en) 2020-12-29 2020-12-29 Cooling hood for microwave plasma chemical vapor deposition equipment

Publications (1)

Publication Number Publication Date
CN214572217U true CN214572217U (en) 2021-11-02

Family

ID=78335211

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202023244078.8U Active CN214572217U (en) 2020-12-29 2020-12-29 Cooling hood for microwave plasma chemical vapor deposition equipment

Country Status (1)

Country Link
CN (1) CN214572217U (en)

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