CN214496460U - Independent mechanism of changing of sputter source target - Google Patents
Independent mechanism of changing of sputter source target Download PDFInfo
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- CN214496460U CN214496460U CN202023043505.6U CN202023043505U CN214496460U CN 214496460 U CN214496460 U CN 214496460U CN 202023043505 U CN202023043505 U CN 202023043505U CN 214496460 U CN214496460 U CN 214496460U
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Abstract
The invention provides an independent target replacing mechanism of a sputtering source, which comprises a vacuum cavity, wherein an inner cavity is fixedly arranged in the vacuum cavity, the sputtering source for coating is arranged in the inner cavity, the sputtering source is detachably arranged in the inner cavity, one end surface of the inner cavity is connected with the end surface of the vacuum cavity, a channel for the sputtering source to pass through is arranged on the end surface of the inner cavity connected with the inner wall of the vacuum cavity, the channel is communicated with the outside, a detachable pressing plate is arranged at the channel, and the pressing plate is hermetically connected with the channel; a gap is arranged on the side wall of the inner cavity, and a rotating cover plate used for sealing the gap is arranged at the gap. When the damaged sputtering source is overhauled and replaced, the vacuum cavity is ensured to maintain the vacuum environment when the sputtering source is maintained, and the time for cooling, vacuumizing and returning to the temperature and releasing vacuum is saved; the magnetron sputtering source has independent space, and when the target material is abnormal, the whole machine does not need to be stopped, so that the continuous production can be realized, the production efficiency is improved, and the product scrap is reduced.
Description
Technical Field
The invention relates to the technical field of magnetron sputtering, in particular to an independent target replacing mechanism of a sputtering source.
Background
With the continuous progress of science and technology, film products are widely applied to high-end fields such as 5G, automobiles, new energy sources and the like, the market demand is continuously increased, and the application requirements are gradually increased. With the continuous improvement of the quality and economic efficiency of film products, the control requirements on the problems of product quality reduction, excellent rate reduction and the like caused by abnormal vacuum degree, target structure water leakage, difficult target head replacement, abnormal target sputtering and the like in the production process of vacuum coating equipment are higher and higher. The common vacuum magnetron sputtering winding film plating machine mainly comprises a vacuum cavity, a winding mechanism, a sputtering source, a cooling roller and a vacuum system. At present there are the sputter source of two kinds of different modes on the market mainly, one kind is to use planar target to sputter, and another kind is rotatory going on through columniform target, and equipment manufacture factory is integrated the magnetron sputtering equipment with the sputter source through two kinds of structures on, one kind is directly to fix the sputter source in the vacuum cavity, and another kind is integrated on the target car.
No matter the sputter source is fixed in the vacuum chamber or integrated business turn over at the target car, the equipment begins to advance the storehouse and carries out the evacuation back, if take place that the target quality is unusual, the sealed condition such as unusual of sputter source, can't operate alone, must let out the vacuum with equipment, winding system withdraws from the back, personnel get into in the chamber or the target car just can change after withdrawing from, can waste very big partly cooling evacuation and time that the vacuum was let out to the rewarming like this to vacuum apparatus, greatly reduced production efficiency. Especially, when the above sudden failures occur in the production process, the continuity of the produced film product and the performance index of the film product are affected.
Disclosure of Invention
The invention provides an independent target replacing mechanism of a sputtering source, which solves the problem that a vacuum cavity is deflated in the process of replacing the sputtering source after the sputtering source of vacuum coating equipment in the prior art fails.
In order to solve the technical problem, the invention provides the following technical scheme: a sputtering source target material independent replacement mechanism comprises a vacuum cavity and a bracket for supporting the vacuum cavity, wherein an inner cavity is fixedly arranged in the vacuum cavity, a sputtering source for coating is arranged in the inner cavity, the sputtering source is detachably arranged in the inner cavity, one end face of the inner cavity is connected with the end face of the vacuum cavity, a channel for the sputtering source to pass through is arranged on the end face of the inner cavity connected with the inner wall of the vacuum cavity, the channel is communicated with the outside, a detachable pressing plate is arranged at the channel, and the pressing plate is hermetically connected with the channel; a notch is formed in the side wall of the inner cavity, and a rotating cover plate used for sealing the notch is arranged at the notch.
When the sputtering source fails, the cover plate can be closed to isolate the inner cavity from the vacuum cavity, so that the product in the vacuum cavity can be continuously produced; if the sputtering source is damaged, the cover plate is closed at the moment, the inner cavity and the vacuum cavity are mutually isolated, the vacuum environment of the vacuum cavity is ensured to be maintained when the sputtering source is maintained, the time for cooling, vacuumizing and returning to the temperature and releasing the vacuum is saved, then the sealing pressure plate connected with the atmospheric pressure is opened, the maintenance personnel takes out the sputtering source positioned in the inner cavity, the sputtering source is carried out fault maintenance and replacement, the sputtering source is pushed into the sputtering source chamber after the maintenance is finished, the pressing plate is locked, the cover plate in the vacuum chamber is opened, can reuse, a mechanism is independently changed to sputter source target when overhauing the sputter source trouble, has realized independent processing, can not lead to vacuum chamber to let out the vacuum because of overhauing the sputter source, guarantees that vacuum chamber vacuum environment obtains keeping when the sputter source maintenance, practices thrift the time that the evacuation of cooling and back temperature let out the vacuum, has promoted the work efficiency who overhauls and scribble the membrane.
Furthermore, in order to realize the opening and closing control of the cover plate, the independent target replacing mechanism of the sputtering source further comprises a connecting rod, one end of the connecting rod penetrates through the inner cavity to be connected with the top of the cover plate, and the other end of the connecting rod is positioned outside the vacuum cavity; the vacuum cavity is characterized in that an air cylinder is arranged on the outer wall of the vacuum cavity, an L-shaped connecting piece is arranged at the extending end of the air cylinder, and a connecting rod positioned outside the vacuum cavity is connected with the extending end of the air cylinder through the connecting piece.
Furthermore, in order to facilitate the maintenance personnel to take out the sputtering source in the inner cavity for maintenance, a guide rail with a trapezoidal cross section is arranged on the side wall of the inner cavity, a sliding table flat plate is arranged on the side wall of the inner cavity, and a sliding groove matched with the guide rail is arranged on the lower surface of the sliding table flat plate; the dull and stereotyped fixed surface of slip table is provided with a plurality of jacking cylinders, slip table dull and stereotyped upper surface top be provided with one with a plurality of jacking cylinder stretches out fixed connection's lifter plate, the sputter source set up in the lifter plate upper surface.
Furthermore, in order to adjust the distance from the sputtering source to the film sputtering surface conveniently and facilitate process adjustment, a motor with a transmission shaft is arranged on the outer wall of the vacuum cavity, one end of the transmission shaft is fixedly connected with the output end of the motor, the other end of the transmission shaft penetrates through the outer wall of the vacuum cavity and is positioned in the inner cavity, and one end of the transmission shaft, which is positioned in the inner cavity, is fixedly connected with a driving gear;
the sputtering source comprises a target head, a target head insulating sleeve and a target material, the target head is fixedly connected with one side of the upper surface of the lifting plate, a target tail support is fixedly arranged on the other side of the upper surface of the lifting plate, and a driven gear which is matched with the driving gear and is used for driving the target material to rotate is arranged on the target head; the target is of a cylindrical structure, one end of the target is connected with the target head, and the other end of the target is rotatably connected with the target tail support; the jacking cylinder is used for driving the lifting plate to move linearly, and meshing or separating of the driven gear and the driving gear is achieved.
And furthermore, rollers which are in contact with the side wall of the inner cavity body are arranged on two side surfaces of the sliding table flat plate.
Further, slip table dull and stereotyped upper surface is fixed and is provided with many guiding axles, many the free end of guiding axle all passes the lifter plate, many guiding axles pass lifter plate department and all are provided with a linear bearing.
Further, a handle is arranged on the side face, close to the channel end, of the sliding table flat plate.
Furthermore, a sealing bearing is arranged at the position where the connecting rod and the transmission shaft penetrate through the vacuum cavity.
Compared with the prior art, the invention has the following advantages: when the damaged sputtering source is overhauled and replaced, the vacuum cavity is ensured to maintain the vacuum environment when the sputtering source is maintained, and the time for cooling, vacuumizing and returning to the temperature and releasing vacuum is saved; the magnetron sputtering source has independent space, when the target material is abnormal, the whole machine does not need to be stopped, the continuous production can be realized, the production efficiency is improved, and the product scrap is reduced; the sputtering source is jacked up by adopting the cylinder lifting platform, so that the distance from the sputtering source to the film sputtering surface is convenient to adjust, and the process adjustment is facilitated; the target material can be replaced in batches, the use efficiency of the target material is shortened, the utilization rate of the target material can be greatly improved, and the cost is reduced.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the principles of the invention. In the drawings:
FIG. 1 is a schematic structural view of an independent target replacement mechanism of a sputtering source.
FIG. 2 is a schematic diagram of an internal structure of an independent target replacement mechanism of a sputtering source.
Fig. 3 is a schematic view of the internal structure of the internal cavity.
FIG. 4 is a schematic view of a sputtering source located within the inner chamber.
FIG. 5 is a schematic view of the connection between the sputtering source and the motor.
Reference numbers and corresponding part names in the drawings:
1. a vacuum chamber; 2. an inner cavity; 3. a cylinder; 4. a motor; 5. a connecting rod; 6. pressing a plate; 7. a target head; 8. a lifting plate; 9. a sliding table flat plate; 10. jacking a cylinder; 11. a cover plate; 12. a target material; 13. a driving gear; 14. a linear bearing; 15. a roller; 16. a guide rail; 17. a target tail support; 18. a target head insulating sleeve; 19. a driven gear; 20. a handle.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail below with reference to examples, and the exemplary embodiments and descriptions thereof are only used for explaining the present invention and are not used as limitations of the present invention.
Example 1
As shown in fig. 1 to 5, the independent target replacement mechanism for a sputtering source provided by the invention comprises a vacuum cavity 1 and a bracket for supporting the vacuum cavity 1, wherein an inner cavity 2 is fixedly arranged in the vacuum cavity 1, the sputtering source for coating is arranged in the inner cavity 2 and is detachably arranged in the inner cavity 2, one end surface of the inner cavity 2 is connected with the end surface of the vacuum cavity 1, a channel for the sputtering source to pass through is arranged on the end surface of the inner cavity 2 connected with the inner wall of the vacuum cavity 1, the channel is communicated with the outside, a detachable pressing plate 6 is arranged at the channel, and the pressing plate 6 is hermetically connected with the channel; a gap is arranged on the side wall of the inner cavity 2, and a rotating cover plate 11 for sealing the gap is arranged at the gap.
The independent target replacing mechanism for the sputtering source further comprises a connecting rod 5, wherein one end of the connecting rod 5 penetrates through the inner cavity 2 to be connected with the top of the cover plate 11, and the other end of the connecting rod 5 is positioned outside the vacuum cavity 1; an air cylinder 3 is arranged on the outer wall of the vacuum cavity 1, an L-shaped connecting piece is arranged at the extending end of the air cylinder 3, and a connecting rod 5 positioned outside the vacuum cavity 1 is connected with the extending end of the air cylinder 3 through the connecting piece; the setting of cylinder 3 and connecting piece realizes the control of lapping 11 and opening and shutting, when needs are taken out the sputter source with interior cavity 2, the end that stretches out of cylinder 3 stretches out, drives connecting rod 5 through the connecting piece and rotates, and then drives apron 11 and rotate, laps 11 sealed breach for interior cavity 2 and vacuum cavity 1 keep apart each other, avoid leading to vacuum cavity 1 to leak the vacuum because of the maintenance sputter source.
The side wall of the inner cavity 2 is provided with a guide rail 16 with a trapezoidal cross section, the side wall of the inner cavity 2 is provided with a sliding table flat plate 9, two side surfaces of the sliding table flat plate 9 are provided with rollers 15 which are in contact with the side wall of the inner cavity 2, and the rollers 15 are arranged to reduce friction force, so that a maintainer can pull out the sliding table flat plate 9 more easily; a handle 20 is arranged on the side surface of the sliding table flat plate 9 close to the channel end, the handle 20 is arranged to facilitate the holding by the maintainer, and a sliding groove matched with the guide rail 16 is arranged on the lower surface of the sliding table flat plate 9; a plurality of jacking cylinders 10 are fixedly arranged on the upper surface of the sliding table flat plate 9, a lifting plate 8 fixedly connected with the extending ends of the jacking cylinders 10 is arranged at the top of the upper surface of the sliding table flat plate 9, a plurality of guide shafts are fixedly arranged on the upper surface of the sliding table flat plate 9, the free ends of the guide shafts penetrate through the lifting plate 8, a linear bearing 14 is arranged at the position where the guide shafts penetrate through the lifting plate 8, and the guide shafts and the linear bearing 14 are arranged to improve the stability of the lifting plate 8 in the lifting process; the sputter source sets up in 8 upper surfaces of lifter plate, and lifter plate 8 drives the sputter source and removes, conveniently adjusts the distance of sputter source to film sputtering face, is favorable to the technology to be adjusted.
The outer wall of the vacuum cavity 1 is provided with a motor 4 with a transmission shaft, one end of the transmission shaft is fixedly connected with the output end of the motor 4, the other end of the transmission shaft penetrates through the outer wall of the vacuum cavity 1 and is positioned in the inner cavity 2, and one end of the transmission shaft, which is positioned in the inner cavity 2, is fixedly connected with a driving gear 13; the connecting rod and the transmission shaft are provided with a sealing bearing at the position where the connecting rod and the transmission shaft penetrate through the vacuum cavity 1, so that the sealing performance is ensured. The sputtering source comprises a target head 7, a target head insulating sleeve 18 and a target material 12, the target head 7 is fixedly connected with one side of the upper surface of the lifting plate 8, a target tail support 17 is fixedly arranged on the other side of the upper surface of the lifting plate 8, and a driven gear 19 which is matched with the driving gear 13 and is used for driving the target material 12 to rotate is arranged on the target head 7; the target material 12 is in a cylindrical structure, one end of the target material 12 is connected with the target head 7, and the other end of the target material 12 is rotatably connected with the target tail support 17; the jacking cylinder 10 is used for driving the lifting plate 8 to move linearly, and meshing or separating the driven gear 19 and the driving gear 13 is realized.
When the sputtering source fails, the cover plate 11 in the vacuum cavity 1 can be closed to isolate the sputtering source from the vacuum cavity 1, if the sputtering source fails partially, the product in the vacuum cavity 1 can be continuously produced, and the process caused by the failed sputtering source is acceptable through verification; if the sputtering source all damages, independent change device can guarantee that vacuum chamber 1 vacuum environment obtains keeping when the sputtering source maintains this moment, practice thrift the time of cooling evacuation and temperature return vacuum, then open and be connected seal clamp plate 6 with atmospheric pressure again, the personnel pull out the slip table flat board 9 that the sputtering source passes through, carry out troubleshooting and change to it, after finishing overhauing push it in interior cavity 2 again, lock top board 6, open apron 11 in the vacuum chamber 1, can reuse.
A warehousing step: the sputtering source is pushed into the inner cavity 2 along the track, the channel is sealed by the pressing plate 6, when the vacuum in the vacuum cavity 1 is vacuumized to the process vacuum and the coating starts, the cylinder drives the cover plate 11 to be lifted upwards, the jacking cylinder 10 jacks the sputtering source target head 7 and the target material 12 to the designated position, and the driving gear 13 is meshed with the driven gear 19 on the target head 7, so that the rotating function is realized.
And (3) discharging: when the sputtering source is abnormal, the jacking cylinder 10 retracts, the gear is disengaged, the cover plate 11 is closed, the pressing plate 6 can be opened by maintenance personnel, the sputtering source is pulled out for maintenance, and the step of repeatedly entering the warehouse is completed. When the damaged sputtering source is overhauled and replaced, the vacuum cavity 1 is ensured to maintain the vacuum environment when the sputtering source is maintained, and the time for cooling, vacuumizing and returning to the temperature and releasing vacuum is saved; the magnetron sputtering source has independent space, when the target material 12 is abnormal, the whole machine does not need to be stopped, the continuous production can be realized, the production efficiency is improved, and the product scrap is reduced; the sputtering source is jacked up by adopting the lifting plate 8 of the cylinder 3, so that the distance from the sputtering source to the film sputtering surface is convenient to adjust, and the process adjustment is facilitated; the target material 12 can be replaced in batches, the use efficiency of the target material 12 is shortened, the utilization rate of the target material 12 can be greatly improved, and the cost is reduced.
The above embodiments are provided to further explain the objects, technical solutions and advantages of the present invention in detail, it should be understood that the above embodiments are merely exemplary embodiments of the present invention and are not intended to limit the scope of the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (8)
1. A sputtering source target material independent replacement mechanism comprises a vacuum cavity (1) and a support for supporting the vacuum cavity (1), and is characterized in that an inner cavity (2) is fixedly arranged in the vacuum cavity (1), a sputtering source for coating is arranged in the inner cavity (2), the sputtering source is detachably arranged in the inner cavity (2), one end face of the inner cavity (2) is connected with the end face of the vacuum cavity (1), a channel for the sputtering source to pass through is arranged on the end face of the inner cavity (2) connected with the inner wall of the vacuum cavity (1), the channel is communicated with the outside, a detachable pressing plate (6) is arranged at the channel, and the pressing plate (6) is hermetically connected with the channel; a gap is arranged on the side wall of the inner cavity (2), and a rotating cover plate (11) used for sealing the gap is arranged at the gap.
2. The mechanism for independently replacing the target of the sputtering source according to claim 1, further comprising a connecting rod (5), wherein one end of the connecting rod (5) passes through the inner cavity (2) to be connected with the top of the cover plate (11), and the other end is located outside the vacuum chamber (1);
be provided with on vacuum chamber body (1) outer wall cylinder (3), cylinder (3) stretch out to serve and be provided with a connecting piece that is L shape, and connecting rod (5) that are located vacuum chamber body (1) outside pass through connecting piece and cylinder (3) stretch out the end and are connected.
3. The mechanism for independently replacing the target of the sputtering source according to claim 2, wherein a guide rail (16) with a trapezoidal cross section is arranged on the side wall of the inner cavity (2), a sliding table flat plate (9) is arranged on the side wall of the inner cavity (2), and a sliding groove matched with the guide rail (16) is arranged on the lower surface of the sliding table flat plate (9); fixed surface is provided with a plurality of jacking cylinders (10) on the dull and stereotyped (9) of slip table, and slip table dull and stereotyped (9) upper surface top is provided with one and a plurality of jacking cylinder (10) stretch out fixed connection's lifter plate (8), the sputter source set up in lifter plate (8) upper surface.
4. The mechanism of claim 3, wherein the outer wall of the vacuum chamber (1) is provided with a motor (4) with a transmission shaft, one end of the transmission shaft is fixedly connected with the output end of the motor (4), the other end of the transmission shaft penetrates through the outer wall of the vacuum chamber (1) and is positioned in the inner chamber (2), and one end of the transmission shaft positioned in the inner chamber (2) is fixedly connected with a driving gear (13);
the sputtering source comprises a target head (7), a target head insulating sleeve (18) and a target (12), the target head (7) is fixedly connected with one side of the upper surface of the lifting plate (8), a target tail support (17) is fixedly arranged on the other side of the upper surface of the lifting plate (8), and a driven gear (19) which is matched with the driving gear (13) and is used for driving the target (12) to rotate is arranged on the target head (7); the target (12) is of a cylindrical structure, one end of the target (12) is connected with the target head (7), and the other end of the target is rotatably connected with the target tail support (17); the jacking cylinder (10) is used for driving the lifting plate (8) to move linearly, and meshing or separating of the driven gear (19) and the driving gear (13) is achieved.
5. The mechanism of claim 4, wherein rollers (15) contacting with the side wall of the inner cavity (2) are arranged on two side surfaces of the sliding table flat plate (9).
6. The mechanism of claim 5, wherein a plurality of guide shafts are fixedly arranged on the upper surface of the sliding table flat plate (9), the free ends of the plurality of guide shafts penetrate through the lifting plate (8), and a linear bearing (14) is arranged at the position where the plurality of guide shafts penetrate through the lifting plate (8).
7. The mechanism of claim 6, wherein the slipway plate (9) is provided with a handle (20) on the side surface near the channel end.
8. The mechanism of claim 7, wherein a sealed bearing is provided at the position where the connecting rod (5) and the transmission shaft pass through the vacuum chamber (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023043505.6U CN214496460U (en) | 2020-12-16 | 2020-12-16 | Independent mechanism of changing of sputter source target |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023043505.6U CN214496460U (en) | 2020-12-16 | 2020-12-16 | Independent mechanism of changing of sputter source target |
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| Publication Number | Publication Date |
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| CN214496460U true CN214496460U (en) | 2021-10-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202023043505.6U Active CN214496460U (en) | 2020-12-16 | 2020-12-16 | Independent mechanism of changing of sputter source target |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116334552A (en) * | 2023-04-07 | 2023-06-27 | 宁波招宝磁业有限公司 | Neodymium iron boron cast sheet sputtering processing method |
-
2020
- 2020-12-16 CN CN202023043505.6U patent/CN214496460U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116334552A (en) * | 2023-04-07 | 2023-06-27 | 宁波招宝磁业有限公司 | Neodymium iron boron cast sheet sputtering processing method |
| CN116334552B (en) * | 2023-04-07 | 2023-09-05 | 宁波招宝磁业有限公司 | Neodymium iron boron cast sheet sputtering processing method |
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Effective date of registration: 20220929 Address after: 361006 room 201-1, complex building 5, No. 11, Butang Middle Road, industrial base, Xiamen Torch High tech Zone (Tongxiang), Xiamen, Fujian Patentee after: Xiamen Haichen Energy Storage Technology Co.,Ltd. Address before: Room 604, North Building, Torch Plaza, No. 56-58, Torch Road, Torch Park, Torch High-tech Zone, Xiamen Patentee before: Xiamen Haichen Intelligent Technology Co.,Ltd. |
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