CN214486119U - Waste gas treatment equipment for semiconductor processing - Google Patents

Waste gas treatment equipment for semiconductor processing Download PDF

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Publication number
CN214486119U
CN214486119U CN202120051942.8U CN202120051942U CN214486119U CN 214486119 U CN214486119 U CN 214486119U CN 202120051942 U CN202120051942 U CN 202120051942U CN 214486119 U CN214486119 U CN 214486119U
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shell
fixed
plate
sets
filter plate
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CN202120051942.8U
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马克军
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Zhisheng Jinggong Electromechanical Tianjin Co ltd
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Zhisheng Jinggong Electromechanical Tianjin Co ltd
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Abstract

The utility model relates to the technical field of semiconductor environmental protection processing, in particular to a waste gas treatment device for semiconductor processing, which is convenient for cleaning a filter plate in time, ensures the filtering effect, does not need to stop working when cleaning, ensures the working process, can uniformly use the active carbon component, and improves the use reliability; the device comprises a shell, an input pipe, an output pipe, a filter plate and an active carbon adsorption plate, wherein the input pipe and the output pipe are respectively communicated and arranged at the left end and the right end of the shell; still include shunt tubes, servo motor, plectane, net box, four group's support piece, connection frame, brush board, support and two sets of bolts, be provided with multiunit shunt branch pipe on the shunt tubes output, the filter is buckled to the tubbiness outward appearance, and the net box inserts to tubbiness filter inboard, holds the intracavity and contains the active carbon granule, and brush board top is provided with the brush hair, and brush hair and tubbiness filter downside contact are provided with the transmission shaft on servo motor's the anterior output.

Description

Waste gas treatment equipment for semiconductor processing
Technical Field
The utility model relates to a semiconductor environmental protection processing technology field specifically is a waste gas treatment equipment for semiconductor processing.
Background
As is well known, the waste gas generated in the semiconductor processing process needs to be treated to ensure the environmental protection effect, and the method is widely used in the environmental protection field; the existing waste gas treatment equipment for semiconductor processing comprises a shell, an input pipe, an output pipe and a filter plate, wherein a placing cavity is arranged in the shell, the front end of the shell is provided with a mounting opening, a stop door is arranged on the mounting opening, the input pipe and the output pipe are respectively communicated and mounted at the left end and the right end of the shell, the filter plate is mounted in the shell, and an activated carbon adsorption plate is arranged at the right side of the filter plate; when the waste gas treatment equipment for semiconductor processing is used, waste gas is input into the shell through the input pipe, so that impurities in the waste gas are filtered by the filter plate, the filtered gas adsorbs harmful substances in the waste gas through the activated carbon adsorption plate, and finally, the treated waste gas is output through the output pipe; the waste gas treatment equipment for semiconductor processing is used for finding that the filter plate is easy to block for a long time, the filtering effect is influenced, if the filter plate needs to be cleaned, the filter plate needs to stop working, then the filter plate is taken out, the working process is influenced, and when waste gas passes through the activated carbon adsorption plate, all activated carbon components are not in the structures of the waste gas, so that the activated carbon components in the activated carbon adsorption plate are easy to use uniformly, and the use reliability is limited.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
The utility model provides a not enough to prior art, the utility model provides a convenience is in time cleaned the filter, guarantees the filter effect, and need not stop work when clean, guarantees the work progress, can carry out the even use to the active carbon composition simultaneously, improves the exhaust-gas treatment equipment who is used for semiconductor processing who uses the reliability.
(II) technical scheme
In order to achieve the above object, the utility model provides a following technical scheme: a waste gas treatment device for semiconductor processing comprises a shell, an input pipe, an output pipe and a filter plate, wherein a placing cavity is arranged in the shell, the front end of the shell is provided with a mounting opening, a stop door is arranged on the mounting opening, and the input pipe and the output pipe are respectively communicated and mounted at the left end and the right end of the shell; the automatic filter comprises a filter plate, and is characterized by further comprising a flow dividing pipe, a servo motor, a circular plate, a net box, four groups of supporting pieces, a connecting frame, a brush plate, a support and two groups of bolts, wherein the flow dividing pipe is communicated and installed at the output end of an input pipe, a plurality of groups of flow dividing branch pipes are arranged at the output end of the flow dividing pipe, the plurality of groups of flow dividing branch pipes are respectively and evenly positioned on the left side of the filter plate from front to back, the filter plate is bent into a barrel-shaped appearance, the outer side wall of the barrel-shaped filter plate is in contact with the inner side wall of a shell, the four groups of supporting pieces are respectively fixed on the left half area and the right half area of the front end of the inner bottom wall of the shell and the left half area and the right half area of the rear side of the inner side of the shell, the net box is inserted into the inner side of the barrel-shaped filter plate, a containing cavity is arranged in the net box, active carbon particles are contained in the containing cavity, a taking and placing opening is arranged at the front end of the net box, a blocking cover is arranged on the taking and placing opening, an output opening is arranged at the bottom end of the shell, the connecting frame is fixed on the output opening, the support passes through two sets of bolt fastening on the shell downside, and the support top is provided with the standing groove, and the carriage bottom inserts to placing inside the box top, the brush board is fixed inside placing the box, and the brush board top is provided with the brush hair, and brush hair and the contact of tubbiness filter downside, servo motor installs in the shell rear end, and the servo motor outside is provided with the shock attenuation cover, be provided with the transmission shaft on servo motor's the anterior output, plectane leading flank and the contact of net box trailing flank, the transmission shaft front end passes the shell and is connected with the plectane rear end, plectane lateral wall and tubbiness filter inside wall rear end in close contact with.
Preferably, the support is including placing box, supporting shoe, fixed frame, two sets of fixed plates and two sets of gaskets, and the supporting shoe is fixed on placing box inner bottom wall, fixed frame is fixed on the supporting shoe top, and fixed frame inside wall and brush board lateral wall contact, brush board bottom and supporting shoe top contact, two sets of fixed plates are fixed respectively and are being placed box left and right sides both ends, and two sets of gaskets are fixed respectively on two sets of fixed plates, two sets of bolt output passes two sets of fixed plates and two sets of gaskets and spiral shell dress respectively inboard in the shell bottom, and the side all contacts with the shell downside on two sets of gaskets.
Preferably, the shock attenuation cover is including the cover body, three damping spring groups of group and three groups shock attenuation boards, and the cover body is fixed in the shell rear end, three damping spring groups of group are fixed respectively on the internal roof of cover, interior diapire and interior back lateral wall, and three damping spring groups of group are fixed respectively on three damping spring group output ends of group, just three damping spring groups of group are connected with servo motor top, bottom and rear end respectively.
Preferably, the support member comprises a support block and an arc-shaped plate, the support block is fixed on the inner bottom wall of the shell, the arc-shaped plate is fixed at the top end of the support block, and the upper side surface of the arc-shaped plate is in contact with the outer side wall of the barrel-shaped filter plate.
Preferably, the blocking cover comprises a cover plate and a clamping block, the outer side wall of the clamping block is in close contact with the inner side wall of the taking and placing port, and the cover plate is fixed at the front end of the clamping block.
Preferably, still include two sets of left gag lever posts and two sets of right gag lever posts, two sets of left gag lever posts and two sets of right gag lever posts are fixed respectively on the left front side of diapire and left rear side in the shell, and two sets of left gag lever posts and two sets of right gag lever posts top are connected with roof left front side and left rear side in the shell respectively, two sets of left gag lever posts right-hand members contact with both sides around the tubbiness filter plate left end respectively, right gag lever post left end contacts with both sides around the tubbiness filter plate right-hand member respectively.
Preferably, still include the rubber pad, the roof is provided with the fixed slot in the shell, and the rubber pad is fixed inside the fixed slot, just rubber pad bottom and tubbiness filter top contact.
(III) advantageous effects
Compared with the prior art, the utility model provides a waste gas treatment equipment for semiconductor processing possesses following beneficial effect:
1. according to the waste gas treatment equipment for semiconductor processing, the barrel-shaped filter plate is driven by the servo motor to rotate anticlockwise, impurities adhered to the outer side surface of the barrel-shaped filter plate are brushed down by the bristles on the brush plate in the rotating process, and the brushed impurities are contained by the placing groove, so that the filter plate can be timely cleaned in work, and the working process is guaranteed;
2. this a waste gas treatment equipment for semiconductor processing evenly carries the tubbiness filter left side with waste gas through the shunt tubes to drive the box with a net when the tubbiness filter rotates through servo motor and also drive and rotate, make the inside active carbon granule of box with a net also rotate thereupon, thereby evenly use the active carbon composition, improve the reliability in utilization.
Drawings
Fig. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic diagram of the left structure among the servo motor, the filter plate and the activated carbon particles;
FIG. 3 is a schematic structural view between the support and the brush plate;
fig. 4 is a partially enlarged view of a portion a of fig. 2.
In the figure: 1. a housing; 2. an input tube; 3. an output pipe; 4. a filter plate 6 and a shunt pipe; 7. a servo motor; 8. a circular plate; 9. a net box; 10. a support member; 11. a connecting frame; 12. brushing the board; 13. a support; 14. a bolt; 15. brushing; 16. a branch pipe; 18. activated carbon particles; 19. a shock-absorbing housing; 20. Placing the box; 21. a support block; 22. a fixing frame; 23. a fixing plate; 24. a gasket; 25. a cover body; 26. A damping spring set; 27. a damper plate; 28. supporting a block; 29. an arc-shaped plate; 30. a cover plate; 31. a clamping block; 32. a left stop lever; 33. a right stop lever; 34. and (7) a rubber pad.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-4, an exhaust gas treatment apparatus for semiconductor processing comprises a housing 1, an input pipe 2, an output pipe 3 and a filter plate 4, wherein a placing chamber is arranged inside the housing 1, a mounting opening is arranged at the front end of the housing 1, a shutter is arranged on the mounting opening, and the input pipe 2 and the output pipe 3 are respectively communicated and mounted at the left end and the right end of the housing 1; the exhaust gas purification device also comprises a flow dividing pipe 6, a servo motor 7, a circular plate 8, a net box 9, four groups of supporting pieces 10, a connecting frame 11, a brush plate 12, a support 13 and two groups of bolts 14, wherein the flow dividing pipe 6 is communicated and installed at the output end of the input pipe 2, the output end of the flow dividing pipe 6 is provided with a plurality of groups of flow dividing branch pipes 16, the plurality of groups of flow dividing branch pipes 16 are respectively and evenly positioned at the left side of the filter plate 4 from front to back, the flow dividing pipe 6 evenly conveys exhaust gas to the left side of the barrel-shaped filter plate 4, the filter plate 4 is bent into a barrel-shaped appearance, the outer side wall of the barrel-shaped filter plate 4 is contacted with the inner side wall of the shell 1, the four groups of supporting pieces 10 are respectively fixed on the left half area and the right half area at the front end and the left half area and the right half area at the back end of the inner bottom wall of the shell 1, the net box 9 is inserted into the inner side of the barrel-shaped filter plate 4, a containing cavity is internally provided with active carbon particles 18, the servo motor 7 drives the net box 9 to rotate when driving the barrel-shaped filter plate 4 to rotate, the active carbon particles 18 in the net box 9 are rotated along with the net box 9, so that the active carbon components are uniformly used, the front end of the net box 9 is provided with a taking and placing opening, a baffle cover is arranged on the taking and placing opening, the bottom end of the shell 1 is provided with an output opening, a connecting frame 11 is fixed on the output opening, a support 13 is fixed on the lower side surface of the shell 1 through two groups of bolts 14, the top end of the support 13 is provided with a placing groove, the bottom end of the connecting frame 11 is inserted into the top end of the placing groove, a brush plate 12 is fixed in the support, the top end of the brush plate 12 is provided with brush bristles 15, the brush bristles 15 are contacted with the lower side surface of the barrel-shaped filter plate 4, a servo motor 7 is arranged at the rear end of the shell 1, the outer side of the servo motor 7 is provided with a shock absorption cover 19, the front output end of the servo motor 7 is provided with a transmission shaft, the front side surface of the 8 is contacted with the rear side surface of the net box 9, the front end of the transmission shaft penetrates through the shell 1 and is connected with the rear end of the circular plate 8, the servo motor 7 drives the barrel-shaped filter plate 4 to rotate anticlockwise, the impurities adhered to the outer side surface of the barrel-shaped filter plate 4 are brushed down by the bristles 15 on the brush plate 12 in the rotating process, the brushed impurities are contained and stored by the placing groove, the outer side wall of the circular plate 8 is tightly contacted with the rear end of the inner side wall of the barrel-shaped filter plate 4, the support 13 comprises a placing box 20, a supporting block 21, a fixing frame 22, two groups of fixing plates 23 and two groups of gaskets 24, the supporting block 21 is fixed on the inner bottom wall of the placing box 20, the fixing frame 22 is fixed at the top end of the supporting block 21, the inner side wall of the fixing frame 22 is contacted with the outer side wall of the brush plate 12, the bottom end of the brush plate 12 is contacted with the top end of the supporting block 21, the two groups of fixing plates 23 are respectively fixed at the left end and the right end of the placing box 20, the two groups of gaskets 24 are respectively fixed on the two groups of fixing plates 23, the output ends of the two groups of bolts 14 respectively pass through the two groups of fixing plates 23 and the two groups of gaskets 24 and are screwed on the inner side of the bottom end of the shell 1, the upper sides of the two groups of gaskets 24 are contacted with the lower side of the shell 1, the placing box 20 can contain and store the impurities under the brush, and the placing box 20 and the brush plate 12 are taken down by screwing out the two groups of bolts 14 in a rotating way, and then are cleaned, the damping cover 19 comprises a cover body 25, three groups of damping spring groups 26 and three groups of damping plates 27, the cover body 25 is fixed at the rear end of the shell 1, the three groups of damping spring groups 26 are respectively fixed on the inner top wall, the inner bottom wall and the inner rear side wall of the cover body 25, the three groups of damping plates 27 are respectively fixed on the output ends of the three groups of damping spring groups 26, the three groups of damping plates 27 are respectively connected with the top end, the bottom end and the rear end of the servo motor 7, the spring action enhances the buffering and damping effect when the servo motor 7 is used, the supporting piece 10 comprises a supporting block 28 and an arc-shaped plate 29, the supporting block 28 is fixed on the inner bottom wall of the shell 1, the arc-shaped plate 29 is fixed at the top end of the supporting block 28, the upper side surface of the arc plate 29 is contacted with the outer side wall of the barrel-shaped filter plate 4, the supporting effect on the barrel-shaped filter plate 4 is enhanced, the blocking cover comprises a cover plate 30 and a clamping block 31, the outer side wall of the clamping block 31 is tightly contacted with the inner side wall of the taking and placing port, the cover plate 30 is fixed at the front end of the clamping block 31, the cover plate 30 and the clamping block 31 are taken out from the taking and placing port so as to replace the activated carbon particles 18, the blocking cover also comprises two groups of left limiting rods 32 and two groups of right limiting rods 33, the two groups of left limiting rods 32 and the two groups of right limiting rods 33 are respectively fixed on the left front side and the left rear side of the inner bottom wall of the shell 1, the top ends of the two groups of left limiting rods 32 and the two groups of right limiting rods 33 are respectively connected with the left front side and the left rear side of the inner top wall of the shell 1, the right ends of the two groups of left limiting rods 32 are respectively contacted with the front side and the front and rear sides of the left end of the barrel-shaped filter plate 4, the left end of the right limiting rods 33 are respectively contacted with the front and rear sides of the barrel-shaped filter plate 4, so as to limit the barrel-shaped filter plate 4, strengthen the steadiness of tubbiness filter 4 in shell 1 inside, still include rubber pad 34, the roof is provided with the fixed slot in shell 1, and rubber pad 34 is fixed inside the fixed slot, and rubber pad 34 bottom and the contact of tubbiness filter 4 top strengthen the steadiness of tubbiness filter 4 in shell 1 inside.
In conclusion, when the waste gas treatment equipment for semiconductor processing is used, waste gas is firstly input into the shunt pipe 6 through the input pipe 2, the waste gas is uniformly conveyed to the left side of the barrel-shaped filter plate 4 through the shunt pipe 6, the filter plate 4 filters impurities in the waste gas, meanwhile, the servo motor 7 is controlled to drive the barrel-shaped filter plate 4 to rotate anticlockwise, the impurities adhered to the outer side surface of the barrel-shaped filter plate 4 are brushed down through the bristles 15 on the brush plate 12 in the rotating process, the brushed impurities are contained through the placing groove, the filter plate 4 is ensured to be cleaned in time when in work, the filtered gas adsorbs harmful substances in the gas through the active carbon adsorption plate 5, the net box 9 is driven to rotate by the barrel-shaped filter plate 4 during adsorption, the active carbon particles 18 in the net box 9 also rotate along with the net box, and therefore, the active carbon components are uniformly used, finally, outputting the treated waste gas through an output pipe 3; if the brush plate 12 is to be replaced or the interior of the storage box 20 is to be cleaned, the two groups of bolts 14 are respectively taken out from the shell 1 in a rotating manner, then the storage box 20 is moved downwards to leave the shell 1, then the bottom end of the brush plate 12 is taken out from the fixing frame 22, and then the brush plate 12 is replaced and the interior of the storage box 20 is cleaned.
The electrical components presented in this document are electrically connected to an external master controller and 220V mains, and the master controller may be a conventional known device for controlling a computer or the like, and in the description in this document, the terms "connected" and "connected" should be understood in a broad sense unless otherwise explicitly specified and limited.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (7)

1. A waste gas treatment device for semiconductor processing comprises a shell (1), an input pipe (2), an output pipe (3) and a filter plate (4), wherein a placing cavity is arranged in the shell (1), the front end of the shell (1) is provided with a mounting port, a stop door is arranged on the mounting port, and the input pipe (2) and the output pipe (3) are respectively communicated and mounted at the left end and the right end of the shell (1); the method is characterized in that: the novel screen printing machine is characterized by further comprising a shunt pipe (6), a servo motor (7), a circular plate (8), a screen box (9), four groups of supporting pieces (10), a connecting frame (11), a brush plate (12), a support (13) and two groups of bolts (14), wherein the shunt pipe (6) is communicated and installed at the output end of the input pipe (2), a plurality of groups of shunt branch pipes (16) are arranged at the output end of the shunt pipe (6), the plurality of groups of shunt branch pipes (16) are respectively and uniformly positioned on the left side of the filter plate (4) from front to back, the filter plate (4) is bent into a barrel-shaped appearance, the outer side wall of the barrel-shaped filter plate (4) is contacted with the inner side wall of the shell (1), the four groups of supporting pieces (10) are respectively fixed on the left half area and the right half area of the front end of the inner bottom wall of the shell (1) and the left half area and the right area of the back side, the screen box (9) is inserted into the inner side of the barrel-shaped filter plate (4), and a containing cavity is arranged inside the screen box (9), the activated carbon particles (18) are contained in the containing cavity, the front end of the net box (9) is provided with a taking and placing opening, a blocking cover is arranged on the taking and placing opening, the bottom end of the shell (1) is provided with an output opening, the connecting frame (11) is fixed on the output opening, the support (13) is fixed on the lower side surface of the shell (1) through two groups of bolts (14), the top end of the support (13) is provided with a placing groove, the bottom end of the connecting frame (11) is inserted into the top end of the placing groove, the brush plate (12) is fixed inside the support (13), the top end of the brush plate (12) is provided with brush bristles (15), the brush bristles (15) are in contact with the lower side surface of the barrel-shaped filter plate (4), the servo motor (7) is arranged at the rear end of the shell (1), the outer side of the servo motor (7) is provided with a damping cover (19), the front output end of the servo motor (7) is provided with a transmission shaft, the front side surface of the circular plate (8) is in contact with the rear side surface of the net box (9), the front end of the transmission shaft penetrates through the shell (1) and is connected with the rear end of the circular plate (8), and the outer side wall of the circular plate (8) is in close contact with the rear end of the inner side wall of the barrel-shaped filter plate (4).
2. An exhaust gas treatment device for semiconductor processing according to claim 1, wherein: support (13) are including placing box (20), supporting shoe (21), fixed frame (22), two sets of fixed plate (23) and two sets of gasket (24), and supporting shoe (21) are fixed on placing box (20) interior diapire, fixed frame (22) are fixed on supporting shoe (21) top, and fixed frame (22) inside wall and brush board (12) lateral wall contact, brush board (12) bottom and supporting shoe (21) top contact, both ends about placing box (20) are fixed respectively in two sets of fixed plate (23), and two sets of gasket (24) are fixed respectively on two sets of fixed plate (23), two sets of bolt (14) output passes two sets of fixed plate (23) and two sets of gasket (24) respectively and spiral shell dress are inboard in shell (1) bottom, and on two sets of gasket (24) the side all with shell (1) downside contact.
3. An exhaust gas treatment device for semiconductor processing according to claim 2, wherein: shock attenuation cover (19) are including the cover body (25), three damping spring of group (26) and three damping plate of group (27), and the cover body (25) is fixed in shell (1) rear end, three damping spring of group (26) are fixed respectively on the interior roof of the cover body (25), interior diapire and interior back lateral wall, and three damping plate of group (27) are fixed respectively on three damping spring of group (26) output of group, just three damping plate of group (27) are connected with servo motor (7) top, bottom and rear end respectively.
4. An exhaust treatment apparatus for semiconductor processing according to claim 3, wherein: the support piece (10) comprises a support block (28) and an arc-shaped plate (29), the support block (28) is fixed on the inner bottom wall of the shell (1), the arc-shaped plate (29) is fixed at the top end of the support block (28), and the upper side surface of the arc-shaped plate (29) is in contact with the outer side wall of the barrel-shaped filter plate (4).
5. An exhaust gas treatment device for semiconductor processing according to claim 4, wherein: the blocking cover comprises a cover plate (30) and a clamping block (31), the outer side wall of the clamping block (31) is in close contact with the inner side wall of the taking and placing opening, and the cover plate (30) is fixed at the front end of the clamping block (31).
6. An exhaust treatment apparatus for semiconductor processing according to claim 5, wherein: still include two sets of left gag lever post (32) and two sets of right gag lever post (33), two sets of left gag lever post (32) and two sets of right gag lever post (33) are fixed respectively on diapire left front side and left rear side in shell (1), and two sets of left gag lever post (32) and two sets of right gag lever post (33) tops are connected with roof left front side and left rear side in shell (1) respectively, two sets of left gag lever post (32) right-hand members contact with both sides around tubbiness filter (4) left end respectively, right gag lever post (33) left end contacts with both sides around tubbiness filter (4) right-hand member respectively.
7. An exhaust treatment apparatus for semiconductor processing according to claim 6, wherein: the novel filter plate is characterized by further comprising a rubber pad (34), a fixed groove is formed in the inner top wall of the shell (1), the rubber pad (34) is fixed inside the fixed groove, and the bottom end of the rubber pad (34) is in contact with the top end of the barrel-shaped filter plate (4).
CN202120051942.8U 2021-01-08 2021-01-08 Waste gas treatment equipment for semiconductor processing Active CN214486119U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202120051942.8U CN214486119U (en) 2021-01-08 2021-01-08 Waste gas treatment equipment for semiconductor processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202120051942.8U CN214486119U (en) 2021-01-08 2021-01-08 Waste gas treatment equipment for semiconductor processing

Publications (1)

Publication Number Publication Date
CN214486119U true CN214486119U (en) 2021-10-26

Family

ID=78214765

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202120051942.8U Active CN214486119U (en) 2021-01-08 2021-01-08 Waste gas treatment equipment for semiconductor processing

Country Status (1)

Country Link
CN (1) CN214486119U (en)

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