CN214477358U

CN214477358U - Vertical fixed rotatory wafer drier

Info

Publication number: CN214477358U
Application number: CN202120965408.8U
Authority: CN
Inventors: 张华�; 王育新; 刘庆辉
Original assignee: Baoding Tongmei Crystal Manufacturing Co ltd
Current assignee: Baoding Tongmei Crystal Manufacturing Co ltd
Priority date: 2021-05-08
Filing date: 2021-05-08
Publication date: 2021-10-22
Anticipated expiration: 2031-05-08

Abstract

The utility model discloses a vertical fixed rotatory wafer drier, including frame, get rid of dry chamber, drive motor and rotor for use, the controller is installed at the top of frame, the motor with the controller electricity is connected, it sets up to get rid of dry chamber on the inside central line of frame, the rotor is installed the intracavity that spin-dries, just one side of rotor with the motor is connected, motor drive the rotatory operation of rotor, the top of rotor is provided with the cavity of two symmetries, and a cavity is the counter weight room, and another cavity is for getting rid of dry room. The utility model discloses equipment structure is compact, and occupation space is little, operation convenient to use, and the finished product that spin-dries can not increase secondary pollution, reduces product cost, and the operation that independently spin-dries of multicavity room design can improve production efficiency.

Description

Vertical fixed rotatory wafer drier

Technical Field

The utility model relates to a wafer drier technical field especially relates to a vertical fixed rotatory wafer drier.

Background

The existing spin-drying equipment comprises a vertical spin-drying machine and a horizontal spin-drying machine, wherein the vertical spin-drying machine directly drives a wafer in a spin-drying cavity to rotate in the spin-drying cavity by a motor, the horizontal spin-drying machine drives a disc by the motor, and the spin-drying cavity moves around a shaft in a circular manner. The vertical type spin dryer has the following defects: during spin-drying, the wafer is easy to rotate in the spin-drying cavity, and the wafer is easy to be scratched. Disadvantages of horizontal spin dryers: the volume is large, the operation is inconvenient when the drying cavity is put, the door closing action is slow, and the efficiency is low.

Therefore, how to develop a novel wafer drying machine has compact structure, convenient and fast installation and high working efficiency, and becomes a technical problem to be solved urgently by technical personnel in the field.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a vertical fixed rotatory wafer drier compact structure, simple to operate is swift, and work efficiency is high.

In order to solve the technical problem, the utility model adopts the following technical scheme:

the utility model relates to a vertical fixed rotatory wafer drier, including frame, get rid of dry chamber, drive motor and the rotor of usefulness, the controller is installed at the top of frame, the motor with the controller electricity is connected, it sets up to get rid of dry chamber on the inside central line of frame, the rotor is installed the intracavity that spin-dries, just one side of rotor with the motor is connected, motor drive the rotatory operation of rotor, the top of rotor is provided with the cavity of two symmetries, and a cavity is the counter weight room, and another cavity is for getting rid of dry room.

Furthermore, the drying cavity is provided with two and is symmetrically arranged in the rack.

Furthermore, the motor and the rotor correspond to each other one by one, the motor is installed on the inner side wall of the rack through a bolt assembly, the spin-drying cavity is connected to the top of the rack, and a rotating shaft of the motor penetrates through the bottom surface of the spin-drying cavity and then is connected with the rotor.

Furthermore, the counterweight chamber and the spin-drying chamber are symmetrically arranged on the rotor, and the number of the counterweight blocks placed in the counterweight chamber corresponds to the number of the wafers placed in the spin-drying chamber.

Compared with the prior art, the utility model discloses a beneficial technological effect:

the utility model discloses vertical fixed rotatory wafer drier, including frame, spin-drying chamber, motor and rotor for the drive, during operation, the spin-drying chamber is the immovable in the rotor, and after the rotor stops rotating, the wafer in the spin-drying chamber is close to the cavity bottom, guarantees that the wafer does not fall out; two cavities are arranged in the rotor and are divided into a counterweight chamber and a spin-drying chamber, so that the stress balance during spin-drying operation is ensured, and the stability during operation is kept. The utility model discloses equipment structure is compact, and occupation space is little, operation convenient to use, and the finished product that spin-dries can not increase secondary pollution, reduces product cost, and the operation that independently spin-dries of multicavity room design can improve production efficiency.

Drawings

The present invention will be further explained with reference to the following description of the drawings.

FIG. 1 is a main view of the vertical fixed rotary spin dryer of the present invention;

FIG. 2 is a side sectional view of the vertical fixed rotary spin dryer of the present invention;

description of reference numerals: 1. a frame; 2. a drying cavity; 3. a motor; 4. a rotor; 5. a controller; 6. a counterweight chamber; 7. and (7) a drying chamber.

Detailed Description

As shown in fig. 1-2, a vertical fixed rotary wafer drier comprises a frame 1, a drying cavity 2, a motor 3 and a rotor 4 for driving, wherein a controller 5 is installed at the top of the frame 1, the motor 3 is electrically connected with the controller 5, the drying cavity 2 is arranged on the central line inside the frame 1, the rotor 4 is installed in the drying cavity 2, one side of the rotor 4 is connected with the motor 3, the motor 3 drives the rotor 4 to rotate, two symmetrical cavities are arranged at the top of the rotor 4, one cavity is a counterweight chamber 6, and the other cavity is a drying chamber 7. Specifically, the balance weight chamber 6 and the drying chamber 7 are symmetrically arranged and mounted on the rotor 4, and the number of the balance weights placed in the balance weight chamber 6 corresponds to the number of the wafers placed in the drying chamber 7. Specifically, for the convenience of adjustment, counter weight chamber and spin-dry chamber structure are the same, and inside all is provided with a plurality of blocks, adopts useless or useless wafer as the counterweight, and the counter weight block that places in the counter weight chamber 6 is filled up, counter weight wafer quantity and spin-dry chamber 7 in place block, wait to spin-dry the wafer quantity corresponding.

Specifically, the drying cavity 2 is provided with two and symmetrically arranged inside the frame 1.

Specifically, motor 3 with 4 one-to-one of rotor, motor 3 passes through bolt assembly and installs on the inside wall of frame 1, motor 3's rotation axis runs through behind the bottom surface of spin-drying chamber 2 with rotor 4 links together through shaft coupling or other connecting piece transmissions, promptly the motor starts directly to drive the rotatory operation of rotor.

The working process of the utility model is as follows:

firstly, a cover plate on one side of a frame 1 is opened, a wafer to be dried is placed in a drying chamber 7 and is fixed through an internal positioning structure, a corresponding control button is started through a controller 5, a motor 3 is started, a rotor 4 is driven to rotate at a high speed through a coupler, a drying cavity 2 is fixed in the process of drying and rotating the wafer, and a balancing weight in a balancing weight chamber 6 can be used for adjusting the balance, so that the stability in the drying operation is ensured.

Specifically, a drain hole is formed in the spin-drying cavity 2, water in the spin-drying process is drained through the drain hole, and then is guided out of the rack through a drain pipe in the rack.

The utility model discloses adopt vertical mode of arranging in the wafer spin dryer, controller and two are got rid of dry chamber 2 and arrange from top to bottom, the effectual whole size that has reduced the frame, the rational utilization space, the controller is located the top, the operation of being convenient for.

The above-mentioned embodiments are only intended to describe the preferred embodiments of the present invention, but not to limit the scope of the present invention, and those skilled in the art should also be able to make various modifications and improvements to the technical solution of the present invention without departing from the spirit of the present invention, and all such modifications and improvements are intended to fall within the scope of the present invention as defined in the appended claims.

Claims

1. The utility model provides a vertical fixed rotatory wafer drier which characterized in that: including frame, get rid of dry chamber, motor and rotor that the drive used, the controller is installed at the top of frame, the motor with the controller electricity is connected, it sets up to get rid of dry chamber on the inside central line of frame, the rotor is installed the intracavity that spin-dries, just one side of rotor with the motor is connected, motor drive the rotatory operation of rotor, the top of rotor is provided with the cavity of two symmetries, and a cavity is the counter weight room, and another cavity is for getting rid of dry chamber.

2. The vertical stationary rotary wafer dryer of claim 1, wherein: the drying cavity is provided with two and is symmetrically arranged in the rack.

3. The vertical stationary rotary wafer dryer of claim 1, wherein: the motor with the rotor one-to-one, the motor passes through bolt assembly and installs on the inside wall of frame, the rotation axis of motor run through behind the bottom surface of spin-drying chamber with the rotor is connected.

4. The vertical stationary rotary wafer dryer of claim 1, wherein: the balance weight chamber and the spin-drying chamber are symmetrically arranged and installed on the rotor, and the number of the balance weight blocks placed in the balance weight chamber corresponds to the number of the wafers placed in the spin-drying chamber.