CN214361652U - Temperature measuring device of vacuum coating sputtering target - Google Patents
Temperature measuring device of vacuum coating sputtering target Download PDFInfo
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- CN214361652U CN214361652U CN202120265522.XU CN202120265522U CN214361652U CN 214361652 U CN214361652 U CN 214361652U CN 202120265522 U CN202120265522 U CN 202120265522U CN 214361652 U CN214361652 U CN 214361652U
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- bracket
- sputtering target
- detecting head
- vacuum
- temperature measuring
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- 238000005477 sputtering target Methods 0.000 title claims abstract description 64
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 17
- 238000009529 body temperature measurement Methods 0.000 claims abstract description 17
- 239000013077 target material Substances 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims description 45
- 229910000831 Steel Inorganic materials 0.000 claims description 16
- 239000010959 steel Substances 0.000 claims description 16
- 239000000523 sample Substances 0.000 claims description 12
- 230000001681 protective effect Effects 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 2
- 238000001514 detection method Methods 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 10
- 239000011248 coating agent Substances 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 5
- 230000008901 benefit Effects 0.000 abstract description 4
- 238000013461 design Methods 0.000 abstract description 2
- 238000011160 research Methods 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
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Abstract
The utility model discloses a temperature measuring device of vacuum coating sputtering target, including vacuum cavity room, vacuum cavity room and infrared temperature measurement detecting head, the indoor sputtering target that is equipped with of vacuum cavity places the platform, be equipped with detecting head rotary device on the infrared temperature measurement detecting head, the platform bottom is placed to the sputtering target is equipped with flexible stay tube, be equipped with linking bridge on the flexible stay tube to link to each other with detecting head rotary device through linking bridge, and realize that infrared temperature measurement detecting head places the target material of bench for the sputtering target through detecting head rotary device and carry out the temperature measurement. The utility model has the advantages that: design benefit, rational in infrastructure, convenient to use uses this device to realize the sputtering target temperature measurement, has simplified people's observation operation process by a wide margin, has reduced the sputtering target and has received the high temperature, leads to the cracked risk of target, has improved security and coating film effect, has important meaning to the research field of film.
Description
Technical Field
The utility model relates to a sputter coating device technical field, concretely relates to temperature measuring device of vacuum coating sputtering target.
Background
The requirements of sputtering targets are higher than those of the traditional material industry, and the requirements are generally such as size, flatness, purity, content of various impurities, density, N/O/C/S, grain size and defect control; higher or special requirements include: surface roughness, resistance value, grain size uniformity, composition and structure uniformity, foreign matter (oxide) content and size, magnetic permeability, ultra-high density and ultra-fine grains, and the like. Magnetron sputtering coating is a novel physical vapor phase coating mode, namely, an electron gun system is used for emitting and focusing electrons on a coated material, atoms sputtered out of the material fly away from the material to a substrate by higher kinetic energy according to a momentum conversion principle to deposit and form a film, and the coated material is called sputtering target material. The sputtering target material is metal, alloy, ceramic compound, etc. The sputtering target material is mainly applied to the electronic and information industries, such as integrated circuits, information storage, liquid crystal display screens, laser memories, electronic control devices and the like, can also be applied to the field of glass coating, and can also be applied to the industries of wear-resistant materials, high-temperature corrosion resistance, high-grade decorative articles and the like.
At present, only the temperature of a cavity and the temperature of a substrate are measured in the coating process, if the temperature of a sputtering target is not measured, the sputtering target is broken to influence the coating effect if the temperature of the sputtering target is too high, the coating effect is poor, and the coating may not be effective even.
SUMMERY OF THE UTILITY MODEL
To the above-mentioned problem that exists among the prior art, the utility model aims to provide a temperature measuring device of vacuum coating sputtering target to realize fast, in real time, easy and simple to handle and realize the temperature measurement of target difference point.
The utility model adopts the following technical scheme:
the utility model provides a temperature measuring device of vacuum coating sputtering target, its characterized in that, includes vacuum cavity room, vacuum cavity room and infrared temperature measurement detecting head, the indoor sputtering target that is equipped with of vacuum cavity places the platform, be equipped with detecting head rotary device on the infrared temperature measurement detecting head, the platform bottom is placed to the sputtering target is equipped with flexible stay tube, be equipped with the linking bridge on the flexible stay tube to link to each other with detecting head rotary device through the linking bridge, and realize through detecting head rotary device that infrared temperature measurement detecting head places the target material on the platform and carry out temperature measurement to the sputtering target.
The temperature measuring device of the vacuum coating sputtering target is characterized in that the connecting support comprises a first support, a second support, a third support and a fourth support, the first support and the second support are symmetrically arranged and movably connected, the third support and the fourth support are symmetrically arranged and movably connected, the first support and the fourth support are fixedly connected, and the second support and the third support are fixedly connected.
The temperature measuring device for the vacuum coating sputtering target is characterized in that the flexible supporting tube comprises an upper metal supporting rod, a middle corrugated tube and a lower metal supporting rod, one end of the upper metal supporting rod is fixedly connected with the sputtering target placing table, the other end of the upper metal supporting rod is fixedly connected with one end of the middle corrugated tube, the other end of the middle corrugated tube is fixedly connected with one end of the lower metal supporting rod, and the other end of the lower metal supporting rod is fixed at the bottom of the vacuum cavity chamber.
The temperature measuring device for the vacuum coating sputtering target is characterized in that the first support and the fourth support are fixed on the upper metal supporting rod, and the second support and the third support are fixed on the lower metal supporting rod.
The temperature measuring device for the vacuum coating sputtering target is characterized in that the detecting head rotating device comprises a baffle, a metal rod, a flexible steel wire and a motor, a fixing cap is arranged at one end of the baffle, one end of the metal rod penetrates through the baffle and the fixing cap and is fixed on the fixing cap through a fastening screw, the other end of the metal rod penetrates through a fourth support, the tail end of the metal rod is fixedly connected with the flexible steel wire, the flexible steel wire penetrates through a third support, and the tail end of the flexible steel wire is in transmission connection with the motor outside a vacuum cavity.
The temperature measuring device for the vacuum coating sputtering target is characterized in that the infrared temperature measuring probe penetrates through the baffle and is fixed through the first tightening bolt and the second tightening bolt.
The temperature measuring device for the vacuum coating sputtering target is characterized in that a sensor protective cover is arranged at the bottom of the baffle plate and around the infrared temperature measuring probe.
The temperature measuring device for the vacuum coating sputtering target is characterized in that a clamping plate is arranged on the metal rod, and the flexible steel wire is fixed on the clamping plate through a second fastening screw.
The utility model has the advantages that: design benefit, rational in infrastructure, convenient to use uses this device to realize the sputtering target temperature measurement, has simplified people's observation operation process by a wide margin, has reduced the sputtering target and has received the high temperature, leads to the cracked risk of target, has improved security and coating film effect, has important meaning to the research field of film.
Drawings
Fig. 1 is a schematic structural view of the present invention;
fig. 2 is an isometric illustration of the present invention;
in the figure: 1-a vacuum chamber, 2-an infrared temperature measuring probe, 3-a sensor protective cover, 4-a fixing cap, 5-a baffle, 6-a first fastening screw, 7-a control metal rod, 8-a sputtering target placing table, 9-a first bracket, 10-a middle corrugated pipe, 11-a second bracket, 12-a third bracket, 13-a flexible steel wire, 14-a fourth bracket, 16-a first tightening bolt, 17-a second tightening bolt, 18-a bearing, 19-a clamping plate, 20-a third fastening screw, 21-an upper metal support rod and 22-a lower metal support rod.
Detailed Description
The technical scheme of the utility model is further described with the accompanying drawings of the specification as follows:
as shown in fig. 1-2, a temperature measuring device for a vacuum plating sputtering target comprises a vacuum chamber 1, an infrared temperature measuring probe 2, a sensor protective cover 3, a fixing cap 4, a baffle plate 5, a first fastening screw 6, a control metal rod 7, a sputtering target placing table 8, a first bracket 9, an intermediate corrugated pipe 10, a second bracket 11, a third bracket 12, a flexible steel wire 13, a fourth bracket 14, a first fastening bolt 16, a second fastening bolt 17, a bearing 18, a clamping plate 19, a second fastening screw 20, an upper metal support rod 21 and a lower metal support rod 22.
Example (b):
the utility model provides a temperature measuring device of vacuum coating sputtering target, includes vacuum chamber room 1, vacuum chamber room 1 is equipped with the sputtering target and places platform 8, the sputtering target is placed platform 8 bottom welding and is set up metal support stick 21, go up metal support stick 21 bottom welding and set up middle bellows 10, middle bellows 10 bottom welding sets up down metal support stick 22, metal support stick 22 passes vacuum chamber room 1 down to fix in vacuum chamber room 1 bottom through the nut.
The sputtering target placing table comprises a sputtering target placing table 8, and is characterized in that a first support 9 and a fourth support 14 are arranged on an upper metal supporting rod 21 at the bottom of the sputtering target placing table 8, a second support 11 and a third support 12 are arranged on a lower metal supporting rod 22, the first support 9 and the second support 11 are symmetrically arranged, the first support 9 and the second support 11 are movably connected through bolts (equivalent to pins), the third support 12 and the fourth support 14 are symmetrically arranged, the third support 12 and the fourth support 14 are movably connected through bolts (equivalent to pins), the first support 9 and the fourth support 14 are fixedly connected through screws, and the second support 11 and the third support 12 are fixedly connected through screws. The middle corrugated pipe is connected with the symmetrical support through the bolts, so that the sputtering target placing table is flexible, a temperature measuring point is required during temperature measurement, certain deflection is completed, and the sputtering target can be installed on the sputtering target placing table to complete the deflection of an angle.
A metal rod 7 is arranged in a hole of the fourth bracket 14 through a bearing 18, a baffle plate 5 is arranged at the top of the metal rod 7, a fixing cap 4 is arranged on the baffle plate 5, the top end of the metal rod 7 penetrates through the baffle plate 5 and the fixing cap 4, and is fixed on the fixing cap 4 through a first fastening screw 6, an infrared temperature measuring probe 2 is arranged in a mounting hole in the middle of the baffle 5, the infrared temperature measuring probe 2 is fixed on the baffle 5 through a first tightening bolt 16 and a second tightening bolt 17 which are arranged at the bottom of the baffle 5, the bottom of the baffle is provided with a sensor protective cover 3 which protects the influence of atoms on the sensor during sputtering, the bottom of the metal bar 7 is provided with a clamping plate 19, the flexible steel wire 13 is fixed on the clamping plate 19 through a second fastening screw 20, the flexible steel wire 13 penetrates through the third bracket 12 and is in transmission connection with a motor outside the vacuum chamber 1 through a magnetic coupling,
the sputtering target placing table 8 can complete rotation at a certain angle through the middle corrugated pipe, when a required working angle is reached, after sputtering is started, the flexible steel wire 13 can be controlled to rotate through operation of a motor outside the vacuum cavity, and the metal rod 7 is driven to rotate through the flexible steel wire 13, so that the infrared temperature measurement probe 2 on the baffle 5 rotates and is located above a sputtering target material.
The infrared temperature measuring probe 2 can measure the temperature of the target material through an internal infrared temperature sensor, any substance higher than absolute zero (-273.15 ℃) can generate infrared rays, modern physics refers to the heat rays, the infrared temperature receives infrared radiation from an object, and the infrared radiation is converted into a standard signal through the sensor, the optical system and an electronic circuit to be output. The infrared temperature measuring probe 2 can calculate the surface temperature of the object by measuring the infrared intensity emitted from the target without contacting the target. Then, the temperature indication of the target is displayed on an external machine, and whether the temperature of the target is too high is judged according to the observation indication. If the temperature is judged to be too high, the working process can be stopped. After the temperature is measured instantly, the baffle can be controlled to rotate to deviate from the sputtering target again, and the working state of the sputtering target is not influenced. The temperature of the sputtering target can be measured by rotating the shutter at intervals.
The working process is as follows:
the method comprises the steps that a corrugated pipe and a first support, a second support, a third support and a fourth support which are arranged beside the corrugated pipe and used for being connected and fixed are moved, a sputtering target placing table deflects to a required angle to place an experimental target, a magnetron sputtering coating experiment is started, when the temperature needs to be tested, a metal rod is controlled by controlling a rotating baffle to realize the rotation of the baffle, an infrared temperature measuring head is aligned with the sputtering target, the infrared temperature receives infrared amplitude dispersion from an object, the infrared amplitude dispersion is converted into a standard signal through a sensor, an optical system and an electronic circuit and is output, the degree is obtained outside, whether the temperature is too high is judged, and the follow-up operation is completed. After instantaneous temperature measurement is finished, the baffle can be continuously rotated, so that the infrared temperature measuring head does not measure the temperature of the target material, the temperature of the sputtering target material is detected at intervals, the situation that the temperature of the sputtering target material is too high, the target material is broken and the like is prevented, the film coating effect is improved, and the occurrence of film coating accidents is also prevented.
Claims (8)
1. The utility model provides a temperature measuring device of vacuum coating sputtering target, its characterized in that, includes vacuum cavity room (1), vacuum cavity room (1) and infrared temperature measurement detecting head (2), it places platform (8) to be equipped with the sputtering target in vacuum cavity room (1), be equipped with detecting head rotary device on infrared temperature measurement detecting head (2), the sputtering target is placed platform (8) bottom and is equipped with flexible stay tube, be equipped with the linking bridge on the flexible stay tube to link to each other with detecting head rotary device through the linking bridge, and realize infrared temperature measurement detecting head (2) through detecting head rotary device and place the target material on platform (8) and carry out temperature detection to the sputtering target.
2. The temperature measuring device of the vacuum coating sputtering target according to claim 1, wherein the connecting bracket comprises a first bracket (9), a second bracket (11), a third bracket (12) and a fourth bracket (14), the first bracket (9) and the second bracket (11) are symmetrically arranged, the first bracket (9) and the second bracket (11) are movably connected, the third bracket (12) and the fourth bracket (14) are symmetrically arranged, the third bracket (12) and the fourth bracket (14) are movably connected, the first bracket (9) and the fourth bracket (14) are fixedly connected, and the second bracket (11) and the third bracket (12) are fixedly connected.
3. The temperature measuring device for the vacuum plating sputtering target according to claim 2, wherein the flexible supporting tube comprises an upper metal supporting rod (21), a middle corrugated tube (10) and a lower metal supporting rod (22), one end of the upper metal supporting rod (21) is fixedly connected with the sputtering target placing table (8), the other end of the upper metal supporting rod (21) is fixedly connected with one end of the middle corrugated tube (10), the other end of the middle corrugated tube (10) is fixedly connected with one end of the lower metal supporting rod (22), and the other end of the lower metal supporting rod (22) is fixed at the bottom of the vacuum chamber (1).
4. The apparatus for measuring the temperature of a vacuum coated sputtering target according to claim 3, wherein the first bracket (9) and the fourth bracket (14) are fixed to the upper metal support rod (21), and the second bracket (11) and the third bracket (12) are fixed to the lower metal support rod (22).
5. The temperature measuring device of a vacuum coating sputtering target according to claim 2, wherein the probe rotating device comprises a baffle plate (5), a metal rod (7), a flexible steel wire (13) and a motor, one end of the baffle plate (5) is provided with a fixing cap (4), one end of the metal rod (7) passes through the baffle plate (5) and the fixing cap (4) and is fixed on the fixing cap (4) through a fastening screw (6), the other end of the metal rod (7) passes through a fourth bracket (14), and the tail end of the metal rod is fixedly connected with the flexible steel wire (13), the flexible steel wire (13) passes through a third bracket (12), and the tail end of the flexible steel wire is in transmission connection with the motor outside the vacuum chamber (1).
6. The temperature measuring device for the vacuum coated sputtering target according to claim 5, wherein the infrared temperature measuring probe (2) is inserted into the baffle plate (5) and fixed by a first tightening bolt (16) and a second tightening bolt (17).
7. The temperature measuring device for the vacuum coated sputtering target according to claim 5, wherein the sensor protective cover (3) is arranged at the bottom of the baffle plate (5) around the infrared temperature measuring probe (2).
8. The apparatus for measuring the temperature of a vacuum coated sputtering target according to claim 5, wherein the metal rod (7) is provided with a clamping plate (19), and the flexible steel wire (13) is fixed to the clamping plate (19) by a second fastening screw (20).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202120265522.XU CN214361652U (en) | 2021-01-31 | 2021-01-31 | Temperature measuring device of vacuum coating sputtering target |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202120265522.XU CN214361652U (en) | 2021-01-31 | 2021-01-31 | Temperature measuring device of vacuum coating sputtering target |
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CN214361652U true CN214361652U (en) | 2021-10-08 |
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CN202120265522.XU Expired - Fee Related CN214361652U (en) | 2021-01-31 | 2021-01-31 | Temperature measuring device of vacuum coating sputtering target |
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CN (1) | CN214361652U (en) |
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2021
- 2021-01-31 CN CN202120265522.XU patent/CN214361652U/en not_active Expired - Fee Related
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Granted publication date: 20211008 |