CN214325868U - Photoresist spitting device - Google Patents

Photoresist spitting device Download PDF

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Publication number
CN214325868U
CN214325868U CN202022592273.3U CN202022592273U CN214325868U CN 214325868 U CN214325868 U CN 214325868U CN 202022592273 U CN202022592273 U CN 202022592273U CN 214325868 U CN214325868 U CN 214325868U
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China
Prior art keywords
photoresist
sliding
bag
extrusion
spitting
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CN202022592273.3U
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Chinese (zh)
Inventor
熊超超
李瑶
肖清凯
易熊军
黄韬
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Chongqing Kangjia Photoelectric Technology Research Institute Co Ltd
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Chongqing Kangjia Photoelectric Technology Research Institute Co Ltd
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Abstract

The utility model relates to a photoresist spitting device. The photoresist spitting device comprises: the box body is provided with an extrusion opening and a placing opening; the photoresist bag is provided with an outlet which is communicated with the extrusion port; the extrusion structure, the extrusion structure sets up the opening part of placing at the box, and the extrusion structure encloses into the accommodation space that is used for holding the photoresist bag with the box, and extrusion structure and box swing joint can be to one side motion of compression accommodation space. The utility model provides an among the prior art photoresist spit-out system have the easy problem of polluting, wasting of photoresist.

Description

Photoresist spitting device
Technical Field
The utility model relates to a photoresist storage device technical field especially relates to a photoresist spit-out device.
Background
In the existing photoresist spitting system device, nitrogen is continuously introduced into a photoresist bottle, the pressure in the photoresist bottle is increased by introducing the nitrogen so as to extrude the photoresist out of the photoresist bottle from a dip tube, and then a photoresist homogenizing process is carried out.
The nitrogen gas may contain dust, particles, etc. due to its uncontrolled quality, and thus, the introduction of nitrogen gas into the photoresist bottle may contaminate the photoresist. In addition, the nitrogen gas may also contain a substance that changes the characteristics of the photoresist, such as ammonia gas, which also affects the photoresist.
The bubbles are easily mixed when nitrogen is introduced into the photoresist bottle, and the subsequent product yield and characteristics are affected by the photoresist mixed with the bubbles. In addition, the photoresist dip tube has a certain distance with the bottom of the bottle, and when the photoresist uses the liquid level to the position of the dip tube opening, the residual part can not be discharged, so that the photoresist is wasted.
That is, the photoresist spitting system in the prior art has the problem that the photoresist is easy to pollute and waste.
SUMMERY OF THE UTILITY MODEL
In view of the above disadvantages of the prior art, an object of the present application is to provide a photoresist spitting device, which aims to solve the problem that a photoresist spitting system in the prior art is easily contaminated and wasted.
A photoresist spitting device comprises: the box body is provided with an extrusion opening and a placing opening; the photoresist bag is provided with an outlet which is communicated with the extrusion port; the extrusion structure, the extrusion structure sets up the opening part of placing at the box, and the extrusion structure encloses into the accommodation space that is used for holding the photoresist bag with the box, and extrusion structure and box swing joint can be to one side motion of compression accommodation space.
Through setting up box and extrusion structure for form the accommodation space of holding photoresist bag between box and the extrusion structure, the photoresist holding is in the photoresist bag, and extrusion structure extrusion photoresist bag is in order to tell the photoresist from the exit. The photoresist bag is matched with the extrusion structure, so that the photoresist is discharged from the photoresist bag under the extrusion of external force, and the pollution of gas to the photoresist is avoided. Meanwhile, the photoresist bag is accommodated in the accommodating space, the extrusion structure can completely extrude the photoresist in the photoresist bag, and the waste of the photoresist is effectively reduced.
Optionally, the compression structure is slidably or rotatably connected to the housing. The extrusion structure is connected with the box body in a sliding mode, so that the extrusion structure slides relative to the box body to extrude the photoresist bag, and photoresist is discharged from the photoresist bag. The extrusion structure is rotatably connected with the box body and rotates relative to the box body, so that the extrusion structure extrudes the photoresist bag, and photoresist is discharged from the photoresist bag.
Optionally, the box body has a first sliding structure, and the extrusion structure has a second sliding structure matched with the first sliding structure. The first sliding structure and the second sliding structure are arranged so that the extrusion structure and the box body can slide relatively, and the photoresist bag can be extruded conveniently.
Optionally, the first sliding structure is a sliding chute, and the second sliding structure is a sliding block; or the first sliding structure is a sliding rod, and the second sliding structure is a sliding hole. The sliding groove is formed in the side wall of the box body, the sliding block extends out of the side wall of the extrusion plate, and the extrusion plate is detachably connected with the box body. The slide hole is arranged on the slide rod in a penetrating mode, the extrusion structure slides along the extending direction of the slide rod to change the volume of the accommodating space, and then the photoresist bag is extruded to enable photoresist to be discharged from the photoresist bag. The matching form of the sliding rod and the sliding hole is convenient for manufacturing, the manufacturing process is simplified, and the production cost is reduced.
Optionally, the first sliding structure is a sliding rod, the second sliding structure is a sliding hole, the sliding rods are multiple, the sliding rods extend out of the placing opening from the inner surface of the box body, and the sliding rods are arranged at intervals. The slide bar extends out from the inner surface of the box body to the placing opening, so that the photoresist bag can be extruded to the inner surface of the box body by the extruding structure, and photoresist in the photoresist bag is completely discharged.
Optionally, the extrusion structure comprises: the extrusion plate is provided with a plurality of sliding holes, and the sliding holes and the sliding rods are arranged in a one-to-one correspondence manner; the rod body is connected with one side of the extrusion plate, which is far away from the photoresist bag; the driving structure is connected with the rod body in a driving mode and drives the rod body to move so as to drive the extrusion plate to extrude the photoresist bag. The extrusion plate is in direct contact with the photoresist bag, and the surface of the extrusion plate in contact with the photoresist bag is a plane, so that the photoresist bag is prevented from being scratched, and the working stability of the photoresist bag is ensured. The driving structure drives the rod body to move, and then drives the extrusion plate to slide along the slide rod so as to extrude the photoresist bag, and photoresist in the photoresist bag is discharged.
Optionally, the rod body comprises a screw, the driving structure comprises a motor and a turbine arranged on an output shaft of the motor, and the turbine is engaged with the screw. The motor works to enable the motor output shaft to rotate so as to drive the turbine to rotate, and the turbine is meshed with the screw rod so as to enable the screw rod to do linear motion, and then the extrusion plate is driven to extrude the photoresist bag. The matching form of the motor, the turbine and the screw rod ensures the miniaturization of the extrusion structure, thereby being beneficial to the miniaturization of the photoresist spitting device.
Optionally, the photoresist spitting device includes a photoresist pipeline, the photoresist pipeline is disposed at the extrusion port, and the outlet is communicated with the photoresist pipeline. The arrangement of the photoresist pipeline is convenient for other structural members to be connected with the photoresist spitting device, so that the spitted photoresist flows into the photoresist homogenizing area. The photoresist pipeline is connected with the extrusion port in a sealing mode, so that the influence of the external environment on the photoresist can be reduced, and the performance of the photoresist is guaranteed.
Optionally, the outlet extends into the photoresist pipeline, and the outlet is connected with the photoresist pipeline in a sealing manner. The outlet extends into the photoresist pipeline, so that the outlet can be prevented from being separated from the extrusion port, the photoresist is prevented from flowing into the accommodating space, and the photoresist can be ensured to stably flow into the photoresist pipeline.
Optionally, the photoresist pocket is made of an elastomeric material. The photoresist bag is made of elastic materials, so that the photoresist bag is conveniently extruded by an extrusion structure, the photoresist bag is prevented from being broken in the extrusion process, and the working stability of the photoresist bag is ensured.
Drawings
FIG. 1 is a schematic structural view of a resist spitting apparatus according to an embodiment of the present invention;
fig. 2 is a schematic structural view of an extrusion plate according to an embodiment of the present invention.
Description of reference numerals:
10-a box body; 11-an extrusion opening; 12-placing the opening; 13-a first glide configuration; 20-a photoresist bag; 21-an outlet; 30-an extruded structure; 31-a second glide configuration; 32-a stripper plate; 33-a rod body; 34-a drive structure; 40-an accommodation space; 50-photoresist line.
Detailed Description
To facilitate an understanding of the present application, the present application will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present application are given in the accompanying drawings. This application may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.
As described in the background section, the photoresist spitting system in the prior art has the problem that the photoresist is easily contaminated and wasted.
Based on this, the present application intends to provide a solution to the above technical problem, the details of which will be explained in the following embodiments.
As shown in fig. 1 and 2, the photoresist discharging apparatus includes a tank 10, a photoresist bag 20, and a pressing structure 30, the tank 10 having a squeezing port 11 and a placing opening 12; the photoresist bag 20 is used for containing photoresist, the photoresist bag 20 is provided with an outlet 21, and the outlet 21 is communicated with the extrusion port 11; the squeezing structure 30 is arranged at the placing opening 12 of the box body 10, the squeezing structure 30 and the box body 10 enclose an accommodating space 40 for accommodating the photoresist bag 20, and the squeezing structure 30 is movably connected with the box body 10 and can move to one side of the compressed accommodating space 40 to squeeze the photoresist bag 20 to discharge the photoresist from the outlet 21.
By arranging the box body 10 and the squeezing structure 30, a containing space 40 containing the photoresist bag 20 is formed between the box body 10 and the squeezing structure 30, the photoresist is contained in the photoresist bag 20, and the squeezing structure 30 squeezes the photoresist bag 20 to spit the photoresist out of the outlet 21. The photoresist bag 20 and the extrusion structure 30 are matched with each other, so that the photoresist is discharged from the photoresist bag 20 under the extrusion of external force, and the pollution of gas to the photoresist is avoided. Meanwhile, the photoresist bag 20 is accommodated in the accommodating space 40, and the extrusion structure 30 can completely extrude the photoresist in the photoresist bag 20, so that the waste of the photoresist is effectively reduced.
Example one
In this embodiment, the pressing structure 30 is slidably coupled to the housing 10. The squeezing structure 30 is slidably connected with the box body 10, so that the squeezing structure 30 slides relative to the box body 10 to squeeze the photoresist bag 20, and the photoresist is discharged from the photoresist bag 20.
As shown in fig. 1 and 2, the box 10 has a first sliding structure 13, and the pressing structure 30 has a second sliding structure 31 cooperating with the first sliding structure 13. The first sliding structure 13 and the second sliding structure 31 are arranged to facilitate relative sliding between the squeezing structure 30 and the box body 10 so as to facilitate squeezing of the photoresist bag 20.
As shown in fig. 1 and 2, the first sliding structure 13 is a sliding rod, and the second sliding structure 31 is a sliding hole. The sliding hole is formed through the sliding rod, and the pressing structure 30 slides along the extending direction of the sliding rod to change the volume of the accommodating space 40, so as to press the photoresist bag 20 to discharge the photoresist from the photoresist bag. The matching form of the sliding rod and the sliding hole is convenient for manufacturing, the manufacturing process is simplified, and the production cost is reduced.
As shown in fig. 1, the first sliding structure 13 is a sliding rod, the second sliding structure 31 is a sliding hole, the number of the sliding rods is multiple, the sliding rods extend from the inner surface of the box 10 to the placing opening 12, and the multiple sliding rods are arranged at intervals. The sliding bar protrudes from the inner surface of the housing 10 toward the placing opening 12 so that the pressing structure 30 can press the photoresist bag 20 to the inner surface of the housing 10 to discharge the photoresist in the photoresist bag 20 completely.
In the embodiment shown in fig. 1, the slide bars are spaced from the side walls of the housing 10 to facilitate guiding of the slide bars to the crush structure 30 and to facilitate mounting of the crush structure 30 to the housing 10. The slide bar and the box body 10 are arranged at intervals, so that redundant photoresist bags 20 can fall to the area between the slide bar and the box body 10, and photoresist can be conveniently discharged.
Of course, the sliding bars may be provided on the side walls of the cabinet 10.
As shown in fig. 2, the extrusion structure 30 includes an extrusion plate 32, a rod body 33 and a driving structure 34, the extrusion plate 32 has a plurality of slide holes, and the plurality of slide holes are arranged in one-to-one correspondence with the plurality of slide bars; the rod body 33 is connected with one side of the extrusion plate 32 far away from the photoresist bag 20; the driving structure 34 is drivingly connected to the rod 33, and the driving structure 34 drives the rod 33 to move, so as to drive the squeezing plate 32 to squeeze the photoresist bag 20. The extrusion plate 32 is in direct contact with the photoresist bag 20, and the surface of the extrusion plate 32 in contact with the photoresist bag 20 is a plane, so that the photoresist bag 20 is prevented from being scratched, and the working stability of the photoresist bag 20 is ensured. The driving structure 34 drives the rod 33 to move, and further drives the squeezing plate 32 to slide along the sliding rod to squeeze the photoresist bag 20, so that the photoresist in the photoresist bag 20 is discharged.
Alternatively, the rod 33 comprises a screw, and the driving structure 34 comprises a motor and a turbine disposed on an output shaft of the motor, wherein the turbine is engaged with the screw. The motor operates to rotate the motor output shaft to drive the worm gear to rotate, and the worm gear is engaged with the screw to make the screw move linearly, thereby driving the extrusion plate 32 to extrude the photoresist bag 20. The cooperation of the motor, the worm gear and the screw rod, and the miniaturization of the extrusion structure 30 are beneficial to the miniaturization of the photoresist spitting device.
As shown in fig. 1, the photoresist spitting device includes a photoresist pipeline 50, the photoresist pipeline 50 is disposed at the extrusion port 11, and the outlet 21 is communicated with the photoresist pipeline 50. The photoresist pipeline 50 is arranged to facilitate the connection of other structural members with the photoresist spitting device, so that the spitted photoresist flows into the photoresist homogenizing area. The photoresist pipeline 50 is hermetically connected with the extrusion port 11, so that the influence of the external environment on the photoresist can be reduced, and the performance of the photoresist can be ensured.
As shown in fig. 1, the outlet 21 extends into the photoresist pipe 50, and the outlet 21 is hermetically connected to the photoresist pipe 50. The outlet 21 extends into the photoresist pipeline 50, so that the outlet 21 can be prevented from being separated from the extrusion port 11, the photoresist can be prevented from flowing into the accommodating space 40, and the photoresist can be ensured to stably flow into the photoresist pipeline 50.
Specifically, the photoresist bag 20 is made of an elastic material. The photoresist bag 20 is made of an elastic material, so that the extrusion structure 30 can extrude the photoresist bag conveniently, the photoresist bag 20 is prevented from being broken in the extrusion process, and the working stability of the photoresist bag 20 is ensured.
It should be noted that the photoresist bag 20 in the present application is made of a wear-resistant material to ensure that the photoresist bag 20 does not break during the pressing process.
As shown in fig. 1, the extrusion port 11 is provided on a side wall of the casing 10 opposite to the placement opening 12. The arrangement is convenient for extruding all the photoresist in the photoresist bag 20, and the waste of the photoresist is avoided.
Example two
The difference from the first embodiment is that the fitting form between the pressing structure 30 and the case 10 is different.
In the present embodiment, the pressing structure 30 is rotatably connected to the box 10, and the pressing structure 30 rotates relative to the box 10, so that the pressing structure 30 presses the photoresist bag 20, and the photoresist is discharged from the photoresist bag 20.
When the pressing structure 30 is rotatably connected to the casing 10, a thread needs to be formed between the inner wall surfaces of the casing 10 to facilitate the rotation of the pressing structure 30.
EXAMPLE III
The difference from the first embodiment is that the first glide structure 13 and the second glide structure 31 have different specific forms.
In the present embodiment, the first sliding structure 13 is a sliding chute, and the second sliding structure 31 is a sliding block. In this embodiment, the sliding groove is opened on the side wall of the case 10, the slider is protruded from the side wall of the pressing plate 32, and the pressing plate 32 is detachably connected to the case 10.
It is to be understood that the invention is not limited to the above-described embodiments, and that modifications and variations may be made by those skilled in the art in light of the above teachings, and all such modifications and variations are intended to be included within the scope of the invention as defined in the appended claims.

Claims (10)

1. A photoresist spitting device is characterized by comprising:
a box body (10), wherein the box body (10) is provided with an extrusion opening (11) and a placing opening (12);
a photoresist bag (20), the photoresist bag (20) having an outlet (21), the outlet (21) communicating with the extrusion port (11);
the photoresist bag comprises a squeezing structure (30), wherein the squeezing structure (30) is arranged at a place opening (12) of the box body (10), the squeezing structure (30) and the box body (10) are enclosed to form a containing space (40) used for containing the photoresist bag (20), and the squeezing structure (30) is movably connected with the box body (10) and can move to one side of the containing space (40) in a compression mode.
2. The photoresist spitting apparatus according to claim 1, wherein the pressing structure (30) is slidably or rotatably connected to the housing (10).
3. The photoresist spitting apparatus according to claim 2, wherein the case (10) has a first sliding structure (13), and the pressing structure (30) has a second sliding structure (31) cooperating with the first sliding structure (13).
4. The resist spitting apparatus according to claim 3, wherein,
the first sliding structure (13) is a sliding groove, and the second sliding structure (31) is a sliding block; or
The first sliding structure (13) is a sliding rod, and the second sliding structure (31) is a sliding hole.
5. The resist spitting device according to claim 3, wherein the first sliding mechanism (13) is a slide bar, the second sliding mechanism (31) is a slide hole, the slide bar is a plurality of slide bars, the slide bars protrude from the inner surface of the case (10) toward the placing opening (12), and the plurality of slide bars are provided at intervals.
6. The resist spitting apparatus according to claim 5, wherein the pressing structure (30) comprises:
the extrusion plate (32) is provided with a plurality of sliding holes, and the sliding holes and the sliding rods are arranged in a one-to-one correspondence manner;
the rod body (33), the rod body (33) is connected with one side of the extrusion plate (32) far away from the photoresist bag (20);
drive structure (34), drive structure (34) with body of rod (33) drive is connected, drive structure (34) drive body of rod (33) motion, in order to drive stripper plate (32) extrusion photoresist bag (20).
7. The photoresist spitting apparatus according to claim 6, wherein the rod body (33) comprises a screw, and the driving structure (34) comprises a motor and a worm gear disposed on an output shaft of the motor, the worm gear being engaged with the screw.
8. The photoresist spitting device according to any one of claims 1 to 7, comprising a photoresist line (50), wherein the photoresist line (50) is disposed at the extrusion port (11), and wherein the outlet port (21) communicates with the photoresist line (50).
9. The photoresist spitting apparatus according to claim 8, wherein the outlet (21) protrudes into the photoresist tube (50), and the outlet (21) is hermetically connected to the photoresist tube (50).
10. The resist spitting device according to any one of claims 1 to 6, wherein the resist bag (20) is made of an elastic material.
CN202022592273.3U 2020-11-10 2020-11-10 Photoresist spitting device Active CN214325868U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202022592273.3U CN214325868U (en) 2020-11-10 2020-11-10 Photoresist spitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202022592273.3U CN214325868U (en) 2020-11-10 2020-11-10 Photoresist spitting device

Publications (1)

Publication Number Publication Date
CN214325868U true CN214325868U (en) 2021-10-01

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ID=77894578

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202022592273.3U Active CN214325868U (en) 2020-11-10 2020-11-10 Photoresist spitting device

Country Status (1)

Country Link
CN (1) CN214325868U (en)

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