CN214244654U - Fragment cleaning device and electroplating equipment - Google Patents
Fragment cleaning device and electroplating equipment Download PDFInfo
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- CN214244654U CN214244654U CN202022216543.0U CN202022216543U CN214244654U CN 214244654 U CN214244654 U CN 214244654U CN 202022216543 U CN202022216543 U CN 202022216543U CN 214244654 U CN214244654 U CN 214244654U
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/06—Filtering particles other than ions
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Abstract
The utility model provides a piece cleaning device and electroplating device, piece cleaning device includes: the device comprises a technical treatment tank for containing liquid medicine and a substrate to be treated, wherein a liquid medicine discharge port is formed in the bottom of a tank body of the technical treatment tank, and a liquid medicine discharge port is formed in the side wall of the tank body of the technical treatment tank; and the self-circulation fragment discharging system comprises a circulation pipeline communicated between the liquid medicine discharging port and the liquid medicine discharging port, and the circulation pipeline is provided with a control valve for controlling the on-off state of the circulation pipeline, a fragment filtering and collecting device for filtering fragments in the circulation pipeline and a power pump for providing circulation driving force for the liquid medicine in the circulation pipeline. The utility model provides a piece cleaning device and electroplating device can effectively reduce because the shut down activity time that the piece leads to in the process such as electroplating, reduces manual work's safe risk and impurity and introduces the risk.
Description
Technical Field
The utility model relates to an electroplating process technical field especially relates to a piece cleaning device and electroplating device.
Background
In the process of electroplating and other processes, glass fragment accidents are inevitable, and the fragments need to be cleaned after the fragments are broken, so that the influence of the fragments on the quality of the subsequent process is prevented. At present, after fragments occur in an electroplating process, the fragments need to be drained, the fragments are manually placed into an electroplating bath for operation, electroplating liquid is extracted, and the shutdown operation time, the safety risk of manual operation and the risk of introducing impurities (particles) are increased.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problem, the utility model provides a piece cleaning device and electroplating device can effectively reduce because the shut down activity time that the piece leads to in the process such as electroplating, reduces manual work's safe risk and impurity and introduces the risk.
In order to achieve the above purpose, the utility model discloses a technical scheme is:
the embodiment of the disclosure provides a fragment cleaning device for cleaning fragments generated in process equipment, the fragment cleaning device comprises:
the device comprises a technical treatment tank for containing liquid medicine and a substrate to be treated, wherein a liquid medicine discharge port is formed in the bottom of a tank body of the technical treatment tank, and a liquid medicine discharge port is formed in the side wall of the tank body of the technical treatment tank;
and the self-circulation fragment discharging system comprises a circulation pipeline communicated between the liquid medicine discharging port and the liquid medicine discharging port, and the circulation pipeline is provided with a control valve for controlling the on-off state of the circulation pipeline, a fragment filtering and collecting device for filtering fragments in the circulation pipeline and a power pump for providing circulation driving force for the liquid medicine in the circulation pipeline.
Illustratively, the bottom of the tank body of the process treatment tank is a first inverted cone-shaped cavity used for guiding the liquid medicine in the process treatment tank to the liquid medicine outlet, and the bottom of the first inverted cone-shaped cavity is communicated with the liquid medicine outlet.
Illustratively, the control valve includes at least one of a manual valve and a solenoid valve.
Illustratively, the debris filtering and collecting device comprises: a debris collector and a filter arranged in sequence from the liquid medicine outlet to the liquid medicine inlet.
Illustratively, the debris collector comprises: collect the box, it is box body form to collect the box, the box body upper portion of collecting the box is equipped with inlet and liquid outlet, the piece collection cavity of the box body lower part for being used for collecting the piece of collecting the box, the bottom of piece collection cavity is equipped with and is used for the piece exhaust piece discharge port with piece, piece discharge port department is provided with and opens or closes the apron of piece discharge port.
Illustratively, the debris collection cavity is a second inverted conical cavity.
Illustratively, the debris collector further comprises: the filter, the filter set up in the liquid outlet, including can filtering the at least two-layer filter screen of different size particles.
Illustratively, the lateral wall of the second back taper cavity on the side where the liquid inlet is located is an inclined lateral wall which forms an inclined included angle with the horizontal plane, and the lateral wall of the second back taper cavity on the side where the liquid outlet is located is a vertical lateral wall which is perpendicular to the horizontal plane.
Illustratively, at least one side wall of the process treatment tank is a liquid return wall, a plurality of liquid return ports are distributed on the liquid return wall, and a filtering protection device is further arranged on the liquid return wall and used for preventing fragments in the process treatment tank from entering the liquid return ports.
Illustratively, the filter guard includes: the frame is fixed on the liquid return wall, and the filter screen is fixed on the frame.
The embodiment of the disclosure also provides electroplating equipment, which comprises the fragment cleaning device, wherein the process treatment tank is an electroplating tank of the electroplating equipment.
The beneficial effects brought by the embodiment of the disclosure are as follows:
the fragment cleaning device and the electroplating equipment provided by the embodiment of the disclosure can automatically clean fragments out of the tank from the inside of the process treatment tank by using a fluid correlation principle through a self-circulation fragment discharging system, the fragments do not need to be extracted by liquid medicine and manually enter the tank body at every time, the safety risks of shutdown operation time and manual operation are reduced, the risk of introducing impurities (particles) is reduced, the liquid medicine can be recycled, and the cost is saved.
Drawings
Fig. 1 is a schematic structural diagram of a debris removal device according to an embodiment of the present disclosure;
FIG. 2 shows a perspective cross-sectional view of a process tank in a debris removal apparatus according to an embodiment of the present disclosure;
FIG. 3 is a front view, cross-sectional view of a process tank in the debris removal device according to an embodiment of the present disclosure;
fig. 4 shows a schematic structural diagram of a debris filtering and collecting device in the debris cleaning device according to the embodiment of the present disclosure.
Detailed Description
In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the drawings of the embodiments of the present invention are combined below to clearly and completely describe the technical solution of the embodiments of the present invention. It is to be understood that the embodiments described are only some of the embodiments of the present invention, and not all of them. All other embodiments, which can be derived from the description of the embodiments of the present invention by a person skilled in the art, are within the scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
Before a detailed description of the debris cleaning apparatus provided by the embodiments of the present disclosure, it is necessary to describe the following related art:
in the related technology, the electrochemical deposition process is a low-cost chemical film forming mode, thick metal of 2-20 um can be deposited, lower resistance can be obtained, and products such as Mini LED back plates and the like, nano-imprinting template manufacturing, liquid crystal antenna manufacturing and the like can be realized by an electrochemical deposition method at present. The glass substrate is deposited with a metal film with the thickness of 2-20 um, so that the resistance value can be reduced, the heating phenomenon is reduced, and the service life is obviously prolonged. At present, a metal film is deposited on a glass substrate mainly by three modes of sputtering, electroplating and chemical plating, the time for sputtering the thick film is long, the efficiency is low, the horizontal deposition mode of the chemical plating has the risk of foreign matter inclusion, and the electroplating has the advantages of high efficiency, low stress, small risk and the like. In the electroplating process, glass fragment accidents are inevitable, the fragments are cleaned after being fragmented, the influence of the fragments on the subsequent process quality is prevented, and the protection of equipment is particularly critical for preventing the fragments from causing downtime and damaging and influencing a pumping system, a filtering system and a pipeline of the system. After fragments occur in the existing electroplating process, the fragments need to be drained, the electroplating tank body is manually operated to extract electroplating liquid, and the shutdown operation time, the safety risk of manual operation and the risk of introducing impurities (particles) are increased.
In order to solve the technical problem, the utility model provides a piece cleaning device can be effective, has reduced the down time that the piece leads to, reduces manual work's safe risk and impurity and introduces the risk.
As shown in fig. 1, an embodiment of the present disclosure provides a debris cleaning apparatus for cleaning debris generated in process equipment, the debris cleaning apparatus including:
the technical treatment tank 100 is used for containing liquid medicine and a substrate 10 to be treated, a liquid medicine outlet 110 is arranged at the bottom of the technical treatment tank 100, and a liquid medicine outlet 120 is arranged on the side wall of the technical treatment tank 100;
and the self-circulation debris discharging system 200, wherein the self-circulation debris discharging system 200 comprises a circulation pipeline 210 communicated between the liquid medicine outlet 110 and the liquid medicine inlet 120, and the circulation pipeline 210 is provided with a control valve for controlling the on-off state of the circulation pipeline 210, a debris filtering and collecting device 220 for filtering debris in the circulation pipeline 210, and a power pump 230 for providing a circulation driving force for the liquid medicine in the circulation pipeline 210.
In the fragment cleaning device provided by the embodiment of the disclosure, the bottom of the process treatment tank 100 is provided with the liquid medicine outlet 110, taking the process treatment tank 100 as an electroplating tank as an example, the liquid medicine outlet 110 is communicated with the liquid medicine outlet 120 on the process treatment tank 100 through a pipeline of the self-circulation fragment discharging system 200, so that when substrate fragments occur in an electroplating process, the fragments are deposited at the bottom of the process treatment tank 100 by utilizing self gravity, and the fragments are conveniently discharged out of the process treatment tank 100 through the self-circulation fragment discharging system 200 in the next step; the discharged liquid medicine enters the pipeline of the self-circulation fragment discharging system 200, the control valve controls the pipeline to be opened, and the liquid medicine enters the liquid medicine discharging port 120 of the process treatment tank 100 after passing through the fragment filtering and collecting device 220 on the pipeline of the self-circulation fragment discharging system 200 by the driving force provided by the power pump 230, wherein the fragment filtering and collecting device 220 realizes the filtering of fragments and other impurities, and ensures the cleanliness of the liquid medicine entering the tank body of the process treatment tank 100 through the self-circulation fragment discharging system 200.
Therefore, the fragment cleaning device provided by the embodiment of the disclosure can realize the effect of automatically cleaning the fragments out of the process treatment tank 100 by the self-circulation fragment discharging system 200 and utilizing the principle related to fluid, and the fragments do not need to be extracted with electroplating liquid medicine and manually enter the tank body at each time, so that the shutdown operation time and the safety risk of manual operation are reduced, the risk of introducing impurities (particles) is reduced, the electroplating liquid medicine can be recycled, and the cost is saved.
In some exemplary embodiments, the diameter of the chemical liquid discharge port 110 at the bottom of the tank body of the process tank 100 may be 200 to 500mm, so as to facilitate the discharge of the chemical liquid and the debris. It is to be understood that, in practical applications, the size of the medical fluid outlet 110 is not limited.
In addition, in some exemplary embodiments, as shown in fig. 1 to 3, the bottom of the tank body of the process treatment tank 100 is a first inverted conical cavity 130 for guiding the chemical liquid in the process treatment tank 100 to the chemical liquid outlet 110, and the bottom of the first inverted conical cavity 130 is communicated with the chemical liquid outlet 110.
By adopting the above scheme, the bottom of the tank body of the process treatment tank 100 is the first inverted cone-shaped cavity 130, and the inner side wall of the first inverted cone-shaped cavity 130 is an inclined smooth surface which is inclined relative to the horizontal plane, so that the fragments are more favorably deposited on the liquid medicine outlet 110 at the bottom of the process treatment tank 100 by the self gravity.
It should be noted that, the inclination angle of the inner side wall of the first inverted cone cavity 130 can be 45-75 degrees, so that the fragments are not easy to accumulate at the corners of the first inverted cone cavity 130 and the groove body of the process treatment groove 100 while the fragments are deposited at the bottom of the groove body.
In addition, it should be noted that the process treatment tank 100 may be made of a transparent material, so as to facilitate observation of whether a fragment phenomenon occurs in the tank body.
Further, as shown, in some embodiments, to increase the strength of the process tank 100, a structural beam 140 may be disposed on top of the first inverted conical cavity 130.
In some exemplary embodiments, as shown in fig. 1, the control valve includes a manual valve 240 and a solenoid valve 250, which are sequentially disposed from the medical fluid discharge port 110 to the medical fluid discharge port 120. The electromagnetic valve 250 can control the automatic on-off of the valve (for example, when an operator observes that fragments are generated, the electromagnetic valve 250 can be controlled to be opened through a human-computer interface to automatically clean the fragments) when the fragments in the process treatment tank 100 need to be cleaned, so as to control the on-off of the pipeline of the self-circulation fragment discharging system 200, the normal operation of the electromagnetic valve 250 is a normally closed state, that is, the pipeline of the self-circulation fragment discharging system 200 is controlled to be disconnected during the normal operation, and the pipeline of the self-circulation fragment discharging system 200 is controlled to be opened only during the fragment cleaning. The manual valve 240 is normally open, and when the electromagnetic valve 250 fails or is maintained, the pipeline of the self-circulation debris discharge system 200 can be manually closed, so that the manual control of the communication between the pipeline of the self-circulation debris discharge system 200 and the liquid medicine of the process treatment tank 100 is realized.
It will of course be appreciated that in other embodiments the control valve may comprise only the manual valve 240, or only the solenoid valve 250.
Further, in some exemplary embodiments, as shown in fig. 1, the debris filtering and collecting device 220 includes: a debris collector 221 and a filter 222 provided in this order from the chemical solution outlet port 110 toward the chemical solution inlet port 120.
With the above arrangement, the debris collector 221 is located in front of the filter 222, and the debris filtering and collecting device 220 is easy to disassemble.
Illustratively, as shown in fig. 1 and 4, the debris collector 221 includes: the collecting box 2211, the collecting box 2211 is box body shape, the box body upper portion of collecting box 2211 is equipped with inlet 2212 and liquid outlet 2213, the box body lower part of collecting box 2211 is the piece collection cavity 2214 for collecting the piece, the bottom of piece collection cavity 2214 is equipped with the piece discharge port that is used for discharging the piece, piece discharge port department is provided with can open or close the apron 2215 of piece discharge port.
With the above scheme, the upper part of the collecting box 2211 of the debris collector 221 is the liquid inlet 2212 and the liquid outlet 2213, and the lower part of the box is the debris collecting cavity 2214, so that when the liquid medicine enters the collecting box 2211 from the liquid inlet 2212, the liquid medicine can sink to the debris collecting cavity 2214 by using the self gravity, and then the liquid medicine is discharged from the collecting box 2211 through the liquid outlet 2213. A cover 2215 capable of opening or closing the debris discharge port is arranged at the debris discharge port, and when a certain amount of debris is collected, the debris discharge port is detached and cleaned.
In some embodiments, a locking device 2216 is disposed on the cover 2215 for opening or closing the cover 2215.
Further, in some exemplary embodiments, as shown in fig. 4, the debris collection cavity 2214 is a second, inverted conical cavity. Debris collection cavity 2214's cell body bottom is the second back taper cavity, and the inside wall of second back taper cavity is for comparing the slope smooth surface in the horizontal plane slope, like this, more be favorable to the debris rely on self gravity deposit in debris collection cavity 2214.
It should be noted that the inclination angle of the inner side wall of the second inverted cone-shaped cavity can be 45-75 degrees, so that the second inverted cone-shaped cavity and the corner where the fragment collection cavity 2214 is connected are not prone to accumulation of fragments while the fragments are deposited at the bottom of the fragment collection cavity 2214.
Furthermore, in some exemplary embodiments, as shown in fig. 4, the debris collector 221 further includes: a filter 222, wherein the filter 222 is disposed at the liquid outlet 2213 and comprises at least two layers of filter screens capable of filtering particles with different sizes; the side wall of the second inverted cone-shaped cavity at the side where the liquid inlet 2212 is located is an inclined side wall 2217 which forms an inclined included angle with the horizontal plane, and the side wall of the side where the liquid outlet 2213 is located is a vertical side wall 2218 which is perpendicular to the horizontal plane.
Adopt above-mentioned scheme, oblique lateral wall 2215 be favorable to the piece deposit in piece collection cavity 2214 bottom, the filter screen set up in liquid outlet 2213, like this, the piece can by the filter screen blocks, vertical lateral wall 2216 is favorable to by the piece that the filter screen blockked falls into smoothly piece collection cavity 2214 bottom is collected, and is difficult for leading to by the piece that the filter screen blockked is in liquid outlet 2213 piles up.
Further, in some embodiments, the collection box 2211 is a transparent box to facilitate viewing of the debris accumulation within the collection box 2211.
In addition, in the related art, the process treatment tank is internally provided with a liquid return wall, liquid return ports are distributed on the liquid return wall, and when fragments occur, the fragments enter a liquid return system through the liquid return ports, so that damage and influence are caused to a pumping system, a filtering system and a pipeline of the system.
In order to solve the above technical problem, as shown in fig. 3, in some exemplary embodiments of the present disclosure, at least one side wall of the process tank 100 is a liquid return wall, a plurality of liquid return ports are distributed on the liquid return wall 115, and a filtering and protecting device 116 is further disposed on the liquid return wall 115 for preventing debris in the process tank 100 from entering the liquid return ports.
By adopting the scheme, the filtering and protecting device is arranged on the liquid return wall of the process treatment tank 100, so that fragments can be effectively prevented from entering the liquid return port to damage a pump, a filtering system and a pipeline.
In some exemplary embodiments, as shown in fig. 3, the filter guard 116 includes: a frame 117 fixed on the liquid return wall, and a filter screen 118 fixed on the frame 117.
The frame and the filter screen should be made of acid-alkali resistant material, such as PP (polypropylene).
In addition, the area of the liquid return wall is large, and in order to ensure the installation stability of the filter screen, as shown in the figure, in some embodiments, the frame may include a hollow main frame 1171, at least one cross beam 1172 and at least one vertical beam 1173, the cross beam 1172 and the vertical beam 1173 are arranged in a crossing manner, so as to divide the hollow area of the hollow main frame 1171 into a plurality of fixing areas, and a filter screen 118 is arranged in each fixing area.
It will be understood, of course, that in practice, the specific structure of the filter guard 116 is not limited.
In addition, it should be noted that the debris cleaning device provided by the embodiment of the present disclosure is suitable for an electrochemical deposition process of a glass substrate, and can be applied to the field of electrochemical deposition of glass substrates with different sizes, and also can be applied to the related field of electrochemical deposition of metals such as Ni, Ag, and the like.
In addition, the fragment cleaning device provided by the embodiment of the disclosure can also be applied to the field of fragment cleaning and protection of other process treatment equipment such as cleaning, drying, acid washing, alkali washing and the like.
The following points need to be explained:
(1) the drawings of the embodiments of the disclosure only relate to the structures related to the embodiments of the disclosure, and other structures can refer to the common design.
(2) For purposes of clarity, the thickness of layers or regions in the figures used to describe embodiments of the present disclosure are exaggerated or reduced, i.e., the figures are not drawn on a true scale. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, it can be "directly on" or "under" the other element or intervening elements may be present.
(3) Without conflict, embodiments of the present disclosure and features of the embodiments may be combined with each other to arrive at new embodiments.
The above is only a specific embodiment of the present disclosure, but the scope of the present disclosure is not limited thereto, and the scope of the present disclosure should be determined by the scope of the claims.
Claims (10)
1. A debris removal apparatus for removing debris generated in process equipment, the debris removal apparatus comprising:
the device comprises a technical treatment tank for containing liquid medicine and a substrate to be treated, wherein a liquid medicine discharge port is formed in the bottom of a tank body of the technical treatment tank, and a liquid medicine discharge port is formed in the side wall of the tank body of the technical treatment tank;
and the self-circulation fragment discharging system comprises a circulation pipeline communicated between the liquid medicine discharging port and the liquid medicine discharging port, and the circulation pipeline is provided with a control valve for controlling the on-off state of the circulation pipeline, a fragment filtering and collecting device for filtering fragments in the circulation pipeline and a power pump for providing circulation driving force for the liquid medicine in the circulation pipeline.
2. Debris cleaning device according to claim 1,
the bottom of the tank body of the process treatment tank is a first inverted cone-shaped cavity used for guiding the liquid medicine in the process treatment tank to the liquid medicine outlet, and the bottom of the first inverted cone-shaped cavity is communicated with the liquid medicine outlet.
3. Debris cleaning device according to claim 2,
the control valve includes at least one of a manual valve and an electromagnetic valve.
4. Debris cleaning device according to claim 1,
the debris filtering and collecting device comprises: a debris collector and a filter arranged in sequence from the liquid medicine outlet to the liquid medicine inlet.
5. Debris cleaning device according to claim 4,
the debris collector comprises: collect the box, it is the box body form to collect the box, the box body upper portion of collecting the box is equipped with inlet and liquid outlet, the piece collection cavity of the box body lower part for being used for collecting the piece of collecting the box, the piece is collected the cavity and is second back taper cavity, the bottom that the piece was collected the cavity is equipped with and is used for the piece exhaust piece discharge port, piece discharge port department is provided with and opens or close the apron of piece discharge port.
6. Debris cleaning device according to claim 5,
the debris collector further comprises: the filter, the filter set up in the liquid outlet, including can filtering the at least two-layer filter screen of different size particles.
7. Debris extraction device according to claim 6,
the side wall of the side where the liquid inlet is located of the second inverted cone cavity is an inclined side wall which forms an inclined included angle with the horizontal plane, and the side wall of the side where the liquid outlet is located of the second inverted cone cavity is a vertical side wall which is perpendicular to the horizontal plane.
8. Debris cleaning device according to claim 1,
at least one side wall of the process treatment tank is a liquid return wall, a plurality of liquid return ports are distributed on the liquid return wall, and a filtering protection device is further arranged on the liquid return wall and used for preventing fragments in the process treatment tank from entering the liquid return ports.
9. Debris extraction device according to claim 8,
the filtration and protection device comprises: the frame is fixed on the liquid return wall, and the filter screen is fixed on the frame.
10. An electroplating apparatus comprising the debris removal apparatus according to any one of claims 1 to 9, wherein the process treatment tank is an electroplating tank of the electroplating apparatus.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022216543.0U CN214244654U (en) | 2020-09-30 | 2020-09-30 | Fragment cleaning device and electroplating equipment |
| US17/398,980 US20220098752A1 (en) | 2020-09-30 | 2021-08-10 | Debris cleaning device and electroplating system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022216543.0U CN214244654U (en) | 2020-09-30 | 2020-09-30 | Fragment cleaning device and electroplating equipment |
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| Publication Number | Publication Date |
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| CN214244654U true CN214244654U (en) | 2021-09-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202022216543.0U Active CN214244654U (en) | 2020-09-30 | 2020-09-30 | Fragment cleaning device and electroplating equipment |
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| US (1) | US20220098752A1 (en) |
| CN (1) | CN214244654U (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002241998A (en) * | 2001-02-13 | 2002-08-28 | Ricoh Co Ltd | Electrodeposition apparatus and electrodeposition method |
| US9534308B2 (en) * | 2012-06-05 | 2017-01-03 | Novellus Systems, Inc. | Protecting anodes from passivation in alloy plating systems |
| CN109371450A (en) * | 2018-12-25 | 2019-02-22 | 柳州坚瑞新材料科技有限公司 | The method that electrophoresis prepares aluminum alloy materials |
| CN111607819A (en) * | 2020-06-10 | 2020-09-01 | 十堰协同工贸有限公司 | Cleaning device of plating bath |
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2020
- 2020-09-30 CN CN202022216543.0U patent/CN214244654U/en active Active
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- 2021-08-10 US US17/398,980 patent/US20220098752A1/en active Pending
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| US20220098752A1 (en) | 2022-03-31 |
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