CN214210032U

CN214210032U - Absorption system for synthesizing acidic dust-containing tail gas by organic silicon monomer

Info

Publication number: CN214210032U
Application number: CN202022982885.3U
Authority: CN
Inventors: 陈道伟; 刘发礼; 余秋祥; 胡晓武
Original assignee: ZHEJIANG KAIHUA SYNTHETIC MATERIAL CO Ltd
Current assignee: ZHEJIANG KAIHUA SYNTHETIC MATERIAL CO Ltd
Priority date: 2020-12-11
Filing date: 2020-12-11
Publication date: 2021-09-17
Anticipated expiration: 2030-12-11

Abstract

The utility model discloses an acid dusty tail gas absorption system for organosilicon monomer synthesis, including sediment thick liquid jar, suction hood, dust removal case, pipeline, neutralization jar, rose box, water jet vacuum machine and tail gas absorption jar, sediment thick liquid jar top is connected with the suction hood, the suction hood is connected with dust removal case one end through the pipeline, the dust removal case is connected with the neutralization jar through the pipeline, the neutralization jar is connected with the rose box through the pipeline, the rose box is connected with the water jet vacuum machine through the pipeline, the water jet vacuum machine is connected with the tail gas absorption jar through the pipeline, still install the discharge pipe on the tail gas absorption jar; the dust removal incasement is equipped with the filter chamber, first recess, second recess and third recess have been seted up respectively to dust removal case top, first recess bottom seted up with the first slot of first recess intercommunication. The system for absorbing the acidic dust-containing tail gas synthesized by the organic silicon monomer has reasonable design and can avoid environmental pollution.

Description

Absorption system for synthesizing acidic dust-containing tail gas by organic silicon monomer

Technical Field

The utility model belongs to the technical field of the organosilicon monomer, concretely relates to be used for synthetic acid dusty tail gas absorption system of organosilicon monomer.

Background

The organic silicon monomer is a raw material for preparing silicone oil, silicone rubber, silicone resin and a silane coupling agent, and thousands of organic silicon products can be produced from a plurality of basic monomers. The silicone industry is characterized by centralized monomer production and dispersed product processing. Therefore, monomer production plays an important role in the silicone industry, and the production level of monomers directly reflects the development level of the silicone industry.

In the organosilicon monomer synthesis process, a large amount of acidic dust-containing gas is generated in the process of discharging the slag slurry and the waste contact body, if the acidic dust-containing gas is not collected and treated, a large amount of smoke and dust are generated on site, the environment is seriously influenced, and a common vacuum pump can easily form jelly to block a pipeline due to the reaction of the acidic gas in the pipeline in the process of recovering the waste gas.

Disclosure of Invention

An object of the utility model is to provide a be used for synthetic acid dusty tail gas absorption system of organosilicon monomer to solve the problem that proposes in the above-mentioned background art.

In order to achieve the above object, the utility model provides a following technical scheme: the acid dusty tail gas absorption system for synthesizing the organic silicon monomer comprises a slag slurry tank, a dust hood, a dust removal box, a pipeline, a neutralization tank, a filter box, a water jet vacuum machine and a tail gas absorption tank, wherein the dust hood is connected to the top end of the slag slurry tank, the dust hood is connected with one end of the dust removal box through the pipeline, the dust removal box is connected with the neutralization tank through the pipeline, the neutralization tank is connected with the filter box through the pipeline, the filter box is connected with the water jet vacuum machine through the pipeline, the water jet vacuum machine is connected with the tail gas absorption tank through the pipeline, and a discharge pipe is further installed on the tail gas absorption tank;

a filter cavity is arranged in the dust removing box, a first groove, a second groove and a third groove are respectively formed in the top end of the dust removing box, a first slot communicated with the first groove is formed in the bottom end of the first groove, a second slot communicated with the second groove is formed in the bottom end of the second groove, a third slot communicated with the third groove is formed in the bottom end of the third groove, the first slot, the second slot and the third slot are all communicated with the filter cavity, a first mounting plate is arranged in the first groove, a third mounting plate is arranged in the second groove, a second mounting plate is arranged in the third groove, a polyester screen plate is arranged in the first slot, a liquid alkali screen plate is arranged in the second slot, a frame and a mounting frame are arranged in the third slot, the top end of the polyester screen plate is fixedly connected with the first mounting plate, and the top end of the liquid alkali screen plate is fixedly connected with the third mounting plate, the top end of the frame is fixedly connected with the second mounting plate;

install first filter, second filter, third filter and fourth filter in the rose box respectively, first filter, second filter, third filter and the equal relative parallel arrangement of fourth filter.

Preferably, one side of the mounting frame is fixedly connected with the frame through bolts, one side of the mounting frame is fixedly connected with a dust removal cloth bag, the dust removal cloth bag is located in the filtering cavity, and the polyester screen plate and the liquid caustic soda screen plate are located in the filtering cavity.

Preferably, the handle is fixedly connected to the upper end faces of the first mounting plate, the third mounting plate and the second mounting plate, the limiting part is fixedly connected to the lower end faces of the first mounting plate, the third mounting plate and the second mounting plate, and a sealing pad is adhered to one side, away from the first mounting plate, the third mounting plate and the second mounting plate, of the limiting part.

Preferably, the frame, the mounting rack and the limiting part are all rectangular frame structures, and the limiting part is provided with a plurality of parts.

Preferably, the inner walls of the bottom ends of the first groove, the second groove and the third groove are provided with limit grooves, and limit parts and sealing gaskets are arranged in the limit grooves.

Preferably, the polyester mesh plate, the liquid alkali mesh plate, the frame and the mounting frame are all arranged in parallel relatively.

Preferably, a fourth groove is formed in the top end of the filter box, a fourth slot communicated with the fourth groove is formed in the inner wall of the bottom end of the fourth groove, a fourth mounting plate is arranged in the fourth groove, and four grooves, four slots and four mounting plates are arranged.

Preferably, first filter, second filter, third filter and fourth filter top all with mounting panel fixed connection, the mesh diameter of first filter is greater than the mesh diameter of second filter, the mesh diameter of second filter is greater than the mesh diameter of third filter, the mesh diameter of third filter is greater than the mesh diameter of fourth filter.

The utility model discloses a technological effect and advantage: the absorption system for organic silicon monomer synthesized acid dusty tail gas, organic silicon acid dusty tail gas is treated by a neutralization dust removal tank, the problem that a common vacuum pump is easy to block a pipeline in the use process is solved, the organic silicon acid dusty tail gas is convenient to treat through the design of a polyester screen plate, a liquid alkali screen plate and a dust removal cloth bag, the problem of pipeline blockage of the vacuum pump can be solved at the same time, through the design of a limiting part and a limiting groove, the positions of a first mounting plate, a third mounting plate and a second mounting plate can be limited, a sealing gasket is a rubber gasket, the sealing performance of the first mounting plate, the third mounting plate and the second mounting plate can be increased, through the design of the first filter plate, the second filter plate, the third filter plate and the fourth filter plate, the tail gas is convenient to be filtered in a grading manner, the first filter plate, the second filter plate, the third filter plate and the fourth filter plate are active carbon screen plates, the activated carbon screen plate can remove acidic substances in smoke, and the system for synthesizing acidic dusty tail gas by using the organic silicon monomer is reasonable in design and can avoid environmental pollution.

Drawings

Fig. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic view of the internal structure of the dust box of the present invention;

FIG. 3 is a perspective view of the dust box of the present invention;

fig. 4 is a perspective view of the first mounting plate of the present invention;

fig. 5 is a perspective view of a second mounting plate of the present invention;

fig. 6 is the schematic diagram of the internal structure of the filtering box of the present invention.

In the figure: 1 slurry tank, 2 suction hoods, 3 dust removal boxes, 4 pipelines, 5 neutralization tanks, 6 filter tanks, 7 water jet vacuum machines, 8 tail gas absorption tanks, 9 discharge pipes, 10 first grooves, 11 second grooves, 12 third grooves, 13 first mounting plates, 14 frames, 15 handles, 16 second mounting plates, 17 polyester otter boards, 18 liquid alkali otter boards, 19 mounting racks, 20 bolts, 21 dust removal cloth bags, 22 limiting grooves, 23 first slots, 24 second slots, 25 third slots, 26 filter chambers, 27 third mounting plates, 28 limiting parts, 29 sealing gaskets, 30 third grooves, 31 fourth mounting plates, 32 first filter plates, 33 second filter plates, 34 third filter plates, 35 fourth filter plates.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

The utility model provides a be used for organic silicon monomer to synthesize acid dusty tail gas absorption system as shown in fig. 1-6, including sediment thick liquid jar 1, suction hood 2, dust removal case 3, pipeline 4, neutralization jar 5, filter box 6, water injection vacuum machine 7 and tail gas absorption jar 8, sediment thick liquid jar 1 top is connected with suction hood 2, suction hood 2 is connected with dust removal case 3 one end through pipeline 4, dust removal case 3 is connected with neutralization jar 5 through pipeline 4, neutralization jar 5 is connected with filter box 6 through pipeline 4, filter box 6 is connected with water injection vacuum machine 7 through pipeline 4, water injection vacuum machine 7 is connected with tail gas absorption jar 8 through pipeline 4, still install discharge pipe 9 on the tail gas absorption jar 8;

be equipped with filter chamber 26 in dust removal case 3, first recess 10, second recess 11 and third recess 12 have been seted up respectively on dust removal case 3 top, first slot 23 with first recess 10 intercommunication is seted up to first recess 10 bottom, second slot 24 with second recess 11 intercommunication is seted up to second recess 11 bottom, third slot 25 with third recess 12 intercommunication is seted up to third recess 12 bottom, first slot 23, second slot 24 and third slot 25 all communicate with

filter chamber

26, 10 is equipped with first mounting panel 13 in the first recess, be equipped with third mounting panel 27 in the second recess 11, be equipped with second mounting panel 16 in the third recess 12, be equipped with polyester otter board 17 in the first slot 23, be equipped with liquid caustic soda otter board 18 in the second slot 24, be equipped with frame 14 in the third slot 25, The top end of the polyester screen plate 17 is fixedly connected with the first mounting plate 13, the top end of the liquid caustic soda screen plate 18 is fixedly connected with the third mounting plate 27, and the top end of the frame 14 is fixedly connected with the second mounting plate 16;

install first filter 32, second filter 33, third filter 34 and fourth filter 35 in the rose box 6 respectively, first filter 32, second filter 33, third filter 34 and the relative parallel arrangement of fourth filter 35 homogeneous phase.

Specifically, one side of the mounting frame 19 is fixedly connected with the frame 14 through bolts 20, one side of the mounting frame 19 is fixedly connected with a dust removal cloth bag 21, the dust removal cloth bag 21 is located in a filter cavity 26, the polyester screen plate 17 and the liquid alkali screen plate 18 are both located in the filter cavity 26, the polyester screen plate 17 is composed of polyester nets, the polyester nets are screen cloths woven by different weaving methods by using textile machinery and are one of filter materials, and the liquid alkali screen plate 18 is manufactured by soaking a fiber screen plate serving as a substrate in liquid alkali.

Specifically, the handle 15 is fixedly connected to the upper end surfaces of the first mounting plate 13, the third mounting plate 27 and the second mounting plate 16, the limiting part 28 is fixedly connected to the lower end surfaces of the first mounting plate 13, the third mounting plate 27 and the second mounting plate 16, and the sealing gasket 29 is fixed to one side, away from the first mounting plate 13, the third mounting plate 27 and the second mounting plate 16, of the limiting part 28 through glue.

Specifically, the frame 14, the mounting bracket 19 and the limiting member 28 are all rectangular frame structures, and the limiting member 28 is provided in a plurality of numbers, and through the design of the limiting member 28 and the limiting groove 22, the positions of the first mounting plate 13, the third mounting plate 27 and the second mounting plate 16 can be limited.

Specifically, the limiting groove 22 has all been seted up to first recess 10, second recess 11 and third recess 12 bottom inner wall, be equipped with locating part 28, sealed pad 29 in the limiting groove 22, sealed pad 29 is the rubber pad to can increase the leakproofness of first mounting panel 13, third mounting panel 27 and second mounting panel 16.

Specifically, the polyester mesh plate 17, the liquid caustic soda mesh plate 18, the frame 14 and the mounting frame 19 are all arranged in parallel relatively.

Specifically, fourth recess 30 has been seted up on 6 tops of rose box, the bottom inner wall of fourth recess 30 all seted up with the fourth slot of fourth recess 30 intercommunication, be equipped with fourth mounting panel 31 in the fourth recess 30, fourth slot and fourth mounting panel 31 all are equipped with four, and fourth mounting panel 31 up end fixedly connected with handle 15, terminal surface fixedly connected with locating part 28 under the fourth mounting panel 31, one side fixed glue that fourth mounting panel 31 was kept away from to locating part 28 has sealed the pad 29, and the spacing groove 22 with locating part 28 looks adaptation is seted up to fourth recess 30 bottom inner wall.

It is specific, first filter 32, second filter 33, third filter 34 and fourth filter 35 top all with mounting panel 31 fixed connection, the mesh diameter of first filter 32 is greater than the mesh diameter of second filter 33, the mesh diameter of second filter 33 is greater than the mesh diameter of third filter 34, the mesh diameter of third filter 34 is greater than the mesh diameter of fourth filter 35, through the design of first filter 32, second filter 33, third filter 34 and fourth filter 35, is convenient for carry out the stage filtration to tail gas, and first filter 32, second filter 33, third filter 34 and fourth filter 35 are the active carbon otter board, and the acidic material in the flue gas can be got rid of to the active carbon otter board.

Specifically, the acidic dust-containing tail gas absorption system for synthesizing the acidic dust-containing tail gas by the organic silicon monomer synthesis section is characterized in that the acidic dust-containing tail gas generated in the deslagging process is absorbed into a neutralization tank 5 through a dust removal tank 3 by an air suction hood 2, the acidic dust-containing tail gas sequentially passes through a polyester screen 17, a liquid alkali screen 18 and a dust removal cloth bag 21 after entering the dust removal tank 3, so that the acidic dust-containing tail gas is subjected to preliminary dust removal and deacidification, liquid alkali is arranged in the neutralization tank 2, the acidic dust-containing tail gas is subjected to absorption and dust removal in the neutralization tank 2 by the liquid alkali to remove most of acidic gas and dust, the rest nitrogen and a small amount of acidic dust-containing gas enter a water spraying vacuum machine 7 through a filter tank 6, the acidic dust-containing gas is subjected to graded filtration by a first filter plate 32, a second filter plate 33, a third filter plate 34 and a fourth filter plate 35 in the filter tank 6, and the acidic dust-containing gas is further subjected to dust removal and deacidification, acid dusty gas removes dust through the absorption of straight-flow water in water injection vacuum machine 7 water tank and tail gas absorption tank 8, makes the unloading tail gas reach emission standard, discharges away through the delivery pipe, should be used for synthetic acid dusty tail gas absorption system of organosilicon monomer, and reasonable in design can avoid environmental pollution.

Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications and variations can be made in the embodiments or in part of the technical features of the embodiments without departing from the spirit and the scope of the invention.

Claims

1. The utility model provides a be used for synthetic acid dusty tail gas absorption system of organosilicon monomer, includes sediment thick liquid jar (1), suction hood (2), dust removal case (3), pipeline (4), neutralization tank (5), rose box (6), water injection vacuum machine (7) and tail gas absorption jar (8), its characterized in that: the slag slurry tank is characterized in that the top end of the slag slurry tank (1) is connected with a dust hood (2), the dust hood (2) is connected with one end of a dust removal tank (3) through a pipeline (4), the dust removal tank (3) is connected with a neutralization tank (5) through a pipeline (4), the neutralization tank (5) is connected with a filter tank (6) through a pipeline (4), the filter tank (6) is connected with a water jet vacuum machine (7) through a pipeline (4), the water jet vacuum machine (7) is connected with a tail gas absorption tank (8) through a pipeline (4), and a discharge pipe (9) is further installed on the tail gas absorption tank (8);

a filter cavity (26) is arranged in the dust removing box (3), a first groove (10), a second groove (11) and a third groove (12) are respectively formed in the top end of the dust removing box (3), a first slot (23) communicated with the first groove (10) is formed in the bottom end of the first groove (10), a second slot (24) communicated with the second groove (11) is formed in the bottom end of the second groove (11), a third slot (25) communicated with the third groove (12) is formed in the bottom end of the third groove (12), the first slot (23), the second slot (24) and the third slot (25) are all communicated with the filter cavity (26), a first mounting plate (13) is arranged in the first groove (10), a third mounting plate (27) is arranged in the second groove (11), a second mounting plate (16) is arranged in the third groove (12), a polyester screen plate (17) is arranged in the first slot (23), a liquid alkali screen plate (18) is arranged in the second slot (24), a frame (14) and a mounting frame (19) are arranged in the third slot (25), the top end of the polyester screen plate (17) is fixedly connected with the first mounting plate (13), the top end of the liquid alkali screen plate (18) is fixedly connected with the third mounting plate (27), and the top end of the frame (14) is fixedly connected with the second mounting plate (16);

install first filter (32), second filter (33), third filter (34) and fourth filter (35) in rose box (6) respectively, first filter (32), second filter (33), third filter (34) and fourth filter (35) homogeneous phase are parallel arrangement relatively.

2. The system for absorbing acidic dust-containing tail gas generated in the synthesis of organosilicon monomers as claimed in claim 1, wherein: one side of the mounting frame (19) is fixedly connected with the frame (14) through bolts (20), one side of the mounting frame (19) is fixedly connected with a dust removal cloth bag (21), the dust removal cloth bag (21) is positioned in the filter cavity (26), and the polyester mesh plate (17) and the liquid caustic soda mesh plate (18) are both positioned in the filter cavity (26).

3. The system for absorbing acidic dust-containing tail gas generated in the synthesis of organosilicon monomers as claimed in claim 1, wherein: the utility model discloses a sealing gasket, including first mounting panel (13), third mounting panel (27) and second mounting panel (16), the equal fixedly connected with handle of terminal surface (15) on first mounting panel (13), third mounting panel (27) and second mounting panel (16), the equal fixedly connected with locating part (28) of terminal surface under first mounting panel (13), third mounting panel (27) and second mounting panel (16), one side fixed glue that first mounting panel (13), third mounting panel (27) and second mounting panel (16) were kept away from in locating part (28) has sealed the pad (29).

4. The system for absorbing acidic dust-containing tail gas generated in the synthesis of organosilicon monomers as claimed in claim 1, wherein: the frame (14), the mounting rack (19) and the limiting piece (28) are all rectangular frame structures, and the limiting piece (28) is provided with a plurality of parts.

5. The system for absorbing acidic dust-containing tail gas generated in the synthesis of organosilicon monomers as claimed in claim 1, wherein: limiting grooves (22) are formed in the inner walls of the bottom ends of the first groove (10), the second groove (11) and the third groove (12), and limiting parts (28) and sealing gaskets (29) are arranged in the limiting grooves (22).

6. The system for absorbing acidic dust-containing tail gas generated in the synthesis of organosilicon monomers as claimed in claim 1, wherein: the polyester screen plate (17), the liquid alkali screen plate (18), the frame (14) and the mounting rack (19) are arranged in parallel relatively.

7. The system for absorbing acidic dust-containing tail gas generated in the synthesis of organosilicon monomers as claimed in claim 1, wherein: fourth recess (30) have been seted up on rose box (6) top, fourth recess (30) bottom inner wall all seted up with the fourth slot of fourth recess (30) intercommunication, be equipped with fourth mounting panel (31) in fourth recess (30), fourth slot and fourth mounting panel (31) all are equipped with four.

8. The system for absorbing acidic dust-containing tail gas generated in the synthesis of organosilicon monomers as claimed in claim 7, wherein: first filter (32), second filter (33), third filter (34) and fourth filter (35) top all with mounting panel (31) fixed connection, the mesh diameter of first filter (32) is greater than the mesh diameter of second filter (33), the mesh diameter of second filter (33) is greater than the mesh diameter of third filter (34), the mesh diameter of third filter (34) is greater than the mesh diameter of fourth filter (35).