CN214078090U - Cleaning equipment before quartz wafer processing - Google Patents
Cleaning equipment before quartz wafer processing Download PDFInfo
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- CN214078090U CN214078090U CN202022952099.9U CN202022952099U CN214078090U CN 214078090 U CN214078090 U CN 214078090U CN 202022952099 U CN202022952099 U CN 202022952099U CN 214078090 U CN214078090 U CN 214078090U
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Abstract
The utility model relates to a quartz wafer cleaning device before processing, which comprises a device body, wherein a plurality of supporting legs are fixedly arranged on the bottom surface of the device body; the quartz wafer conveying equipment to be processed is fixedly arranged on the top surface of the equipment body; the quartz wafer cleaning device comprises a supporting plate fixedly arranged on the side surface of a device body, a mounting plate fixedly arranged on the top surface of the supporting plate, and a spray pipe fixedly arranged on the bottom surface of the mounting plate and used for cleaning a quartz wafer on a quartz wafer conveying device to be processed; the second conveying equipment is fixedly arranged on the top surface of the equipment body behind the conveying equipment for the quartz wafers to be processed and used for conveying the cleaned quartz wafers; the quartz wafer on the quartz wafer conveying equipment to be processed can be washed through the spray pipe, so that quartz particles or quartz powder on the quartz wafer can be washed to a certain extent, the processing error of the washed quartz wafer is smaller, and the structural design is reasonable.
Description
Technical Field
The utility model relates to a quartz wafer processing technology field, especially a cleaning equipment before quartz wafer processing.
Background
The quartz crystal oscillator is a quartz crystal resonator made of quartz materials, is commonly called as a crystal oscillator, plays a role in generating frequency, has stability and good anti-interference performance, and is widely applied to various electronic products;
when a quartz crystal oscillator is manufactured by using a quartz material, the quartz crystal obtained by equipment processing needs to be cleaned to a certain extent before deep processing, quartz powder particles attached to the surface of the quartz crystal are washed, and the washed quartz crystal is subjected to subsequent processing, so that the quartz crystal pre-processing cleaning equipment which has high cleaning efficiency and can wash a plurality of quartz crystals is provided.
Disclosure of Invention
The to-be-solved technical problem of the utility model is not enough to prior art, a cleaning equipment before quartz wafer processing that cleaning efficiency is high can wash established to a plurality of quartz crystal is provided.
The technical problem to be solved by the utility model is realized by the following technical proposal, including,
the bottom surface is fixedly provided with an equipment body provided with a plurality of supporting legs;
the quartz wafer conveying equipment to be processed is fixedly arranged on the top surface of the equipment body;
the quartz wafer cleaning device comprises a supporting plate fixedly arranged on the side surface of a device body, a mounting plate fixedly arranged on the top surface of the supporting plate, and a spray pipe fixedly arranged on the bottom surface of the mounting plate and used for cleaning a quartz wafer on a quartz wafer conveying device to be processed;
and the second conveying equipment is fixedly arranged on the top surface of the equipment body behind the conveying equipment for the quartz wafers to be processed and is used for conveying the cleaned quartz wafers.
The utility model discloses the technical problem that solve can also realize through following technical scheme, above a quartz wafer processing preceding cleaning equipment, treat that processing quartz wafer conveying equipment and second conveying equipment all adopt belt conveyor.
The technical problem to be solved by the utility model can also be realized by the following technical proposal that the cleaning device before processing the quartz wafer also comprises a water recovery mechanism,
the quartz wafer conveying equipment to be processed is positioned on the equipment body between the two first guide plates, the first guide plate positioned above the quartz wafer conveying equipment to be processed is provided with a flow guide hole for water sprayed through a spray pipe, and the outer wall of the first guide plate positioned below the flow guide hole is fixedly provided with a flow guide plate for guiding the water flowing out of the flow guide hole;
fixed mounting is in the recovery water reservoir box on the equipment body lateral wall that is located the guide plate below, and the top that has the space that is used for holding water and recovery water reservoir box in the recovery water reservoir box is open setting, has seted up the slide rail at the inner wall of recovery water reservoir box, still is provided with the filter in recovery water reservoir box, has on the filter and can filters the filter screen that establishes to entering into recovery water reservoir box internal water, the side fixed mounting of filter have the slider that can follow the slide rail removal and establish, on the top surface of filter still fixed mounting be convenient for take out the lug that establishes with the filter from recovery water reservoir box.
The utility model discloses the technical problem that solve can also be realized through following technical scheme, above a quartz wafer processing preceding cleaning equipment, the bottom of equipment body in have the water tank, the elevator pump has in the water tank, the outlet end of elevator pump passes through the pipeline and is connected with the shower.
The utility model discloses the technical problem that solve can also be realized through following technical scheme, above a quartz wafer processing preceding cleaning equipment, treat that processing quartz wafer conveying equipment's exit end is located second conveying equipment middle part and sets up directly over.
The utility model discloses the technical problem that solve can also be realized through following technical scheme, above a quartz wafer processing preceding cleaning equipment, fixed mounting has the second deflector on the equipment body that is located second conveying equipment both sides, the ponding groove has been seted up on the equipment body top surface of tip before being located the second deflector, fixed mounting has the guide subassembly on the equipment body top surface that is located second deflector rear end portion, the water channel has been seted up on the equipment body that is located second conveying equipment middle part top, the entrance point of water channel and the bottom inner wall intercommunication of recovery water reservoir box.
The utility model discloses the technical problem that solve can also be realized through following technical scheme, above a quartz wafer processing preceding cleaning equipment, the guide subassembly include two spinal branch daggers, be located the top surface of support column on fixed mounting have the guide swash plate, the entrance point of guide swash plate is located second conveying equipment exit end under, offers the slide that is used for the quartz wafer to slide to establish on the top surface of guide swash plate.
Compared with the prior art, the utility model has the advantages that: can treat the quartz wafer on the quartz wafer conveying equipment of processing through the shower and wash, to a certain extent make quartz granule or quartz powder on the quartz wafer can be washed down for the machining error by the quartz wafer after washing is littleer, can filter the recovery with the water after washing through retrieving water mechanism, wash quartz wafer once more through water channel, to a certain extent make the washing effect of quartz wafer better, its structural design is reasonable.
Drawings
Fig. 1 is a schematic view of the structure of the present invention;
fig. 2 is a schematic diagram of the local enlarged structure of the present invention.
Detailed Description
The embodiments of the present invention will be further described with reference to the accompanying drawings so as to facilitate the further understanding of the present invention by those skilled in the art, and do not limit the right thereto.
Example 1, referring to fig. 1, a quartz wafer pre-process cleaning apparatus includes,
the bottom surface is fixedly provided with an equipment body 1 with a plurality of supporting legs;
the quartz wafer conveying equipment 2 to be processed is fixedly arranged on the top surface of the equipment body 1;
the quartz wafer cleaning device comprises a supporting plate 3 fixedly arranged on the side surface of the device body 1, a mounting plate 4 fixedly arranged on the top surface of the supporting plate 3, and a spray pipe 5 fixedly arranged on the bottom surface of the mounting plate 4 and used for cleaning a quartz wafer on the quartz wafer conveying device 2 to be processed;
and the second conveying device 6 is fixedly arranged on the top surface of the device body 1 behind the quartz wafer conveying device 2 to be processed and used for conveying the cleaned quartz wafer. The cross section of the equipment body 1 is rectangular; the cross section of the supporting plate 3 is rectangular; the cross section of the mounting plate 4 is rectangular.
the quartz wafer conveying equipment to be processed is positioned on the equipment body 1 between the two first guide plates 7, the first guide plate 7 positioned above the quartz wafer conveying equipment to be processed is provided with a flow guide hole 8 for water sprayed out through the spray pipe 5, and the outer wall of the first guide plate 7 positioned below the flow guide hole 8 is fixedly provided with a flow guide plate 9 for guiding the water flowing out of the flow guide hole 8;
fixed mounting is in the recovery water reservoir box 10 on the 1 lateral wall of equipment body that is located guide plate 9 below, and it has the space that is used for holding water and the top of recovery water reservoir box 10 to be open setting to retrieve water reservoir box 10 in the recovery water reservoir box 10, has seted up the slide rail at the inner wall of recovery water reservoir box 10, still is provided with the filter in recovery water reservoir box 10, has on the filter and can filters the filter screen 11 that establishes to entering into recovery water reservoir box 10 water-logging, the side fixed mounting of filter have can follow the slide rail and remove the slider that establishes, it has the lug 12 of establishing of being convenient for take out the filter from recovery water reservoir box 10 to go back fixed mounting on the top surface of filter. The cross section of the first guide plate 7 is rectangular; the cross section of the guide plate 9 is rectangular; the cross section of the recovered water storage box 10 is rectangular; the cross section of the filter plate is rectangular; the filter screen 11 can be a filter screen 11 with 40-70 meshes, for example, a filter screen 11 with 50 meshes, and can be selected according to the use requirement.
When the cleaning device before quartz wafer processing is used, the conveying device 2 for quartz wafers to be processed, the second conveying device 6 and the lifting pump 14 are started through an external power supply, the quartz wafers to be cleaned are placed on the conveying device 2 for quartz wafers to be processed, the quartz wafers are conveyed to the second conveying device 6 through the conveying device 2 for quartz wafers to be processed, the quartz wafers are conveyed to the slide way 19 on the material guide inclined plate 18 through the second conveying device 6, and the accommodating box or other box bodies for accommodating the quartz wafers is prevented from being arranged below the slide way 19;
during cleaning, the lift pump 14 pumps water in the water tank 13 into the spraying pipe 5, and the quartz wafer on the quartz wafer conveying equipment 2 to be processed is primarily sprayed through the spraying pipe 5, and it should be noted that, since the water flowing into the recovered water reservoir box 10 contains a small amount of quartz wafer particles, which are impurities to be removed, the content of quartz wafers in the water filtered by the filter screen 11 is greatly reduced, even a small amount of quartz wafer particles or powder, which is entrained in the water, is precipitated at the bottom of the recovered water reservoir box 10, even when a slight amount of the quartz wafer particles or powder flows again onto the quartz wafer on the second conveying device 6 along the water passage 17, the whole cleaning effect is not influenced, the water on the second conveying equipment 6 flows into the water collecting tank 16 by gravity, and the water collecting tank 16 can be provided with a device for extracting the water in the water collecting tank 16.
Claims (7)
1. A cleaning equipment before quartz wafer processing is characterized in that: comprises the steps of (a) preparing a mixture of a plurality of raw materials,
the bottom surface is fixedly provided with an equipment body provided with a plurality of supporting legs;
the quartz wafer conveying equipment to be processed is fixedly arranged on the top surface of the equipment body;
the quartz wafer cleaning device comprises a supporting plate fixedly arranged on the side surface of a device body, a mounting plate fixedly arranged on the top surface of the supporting plate, and a spray pipe fixedly arranged on the bottom surface of the mounting plate and used for cleaning a quartz wafer on a quartz wafer conveying device to be processed;
and the second conveying equipment is fixedly arranged on the top surface of the equipment body behind the conveying equipment for the quartz wafers to be processed and is used for conveying the cleaned quartz wafers.
2. A quartz wafer pre-process cleaning apparatus as set forth in claim 1 wherein: the to-be-processed quartz wafer conveying equipment and the second conveying equipment both adopt belt conveyors.
3. A quartz wafer pre-process cleaning apparatus as set forth in claim 2 wherein: also comprises a water recovery mechanism, which comprises,
the quartz wafer conveying equipment to be processed is positioned on the equipment body between the two first guide plates, the first guide plate positioned above the quartz wafer conveying equipment to be processed is provided with a flow guide hole for water sprayed through a spray pipe, and the outer wall of the first guide plate positioned below the flow guide hole is fixedly provided with a flow guide plate for guiding the water flowing out of the flow guide hole;
fixed mounting is in the recovery water reservoir box on the equipment body lateral wall that is located the guide plate below, and the top that has the space that is used for holding water and recovery water reservoir box in the recovery water reservoir box is open setting, has seted up the slide rail at the inner wall of recovery water reservoir box, still is provided with the filter in recovery water reservoir box, has on the filter and can filters the filter screen that establishes to entering into recovery water reservoir box internal water, the side fixed mounting of filter have the slider that can follow the slide rail removal and establish, on the top surface of filter still fixed mounting be convenient for take out the lug that establishes with the filter from recovery water reservoir box.
4. A quartz wafer pre-process cleaning apparatus as set forth in claim 3 wherein: the bottom of the equipment body is internally provided with a water tank, the water tank is internally provided with a lift pump, and the water outlet end of the lift pump is connected with the spray pipe through a pipeline.
5. A quartz wafer pre-process cleaning apparatus as set forth in claim 4 wherein: and the outlet end of the quartz wafer conveying equipment to be processed is positioned right above the middle part of the second conveying equipment.
6. A quartz wafer pre-process cleaning apparatus as set forth in claim 5 wherein: the device body located on two sides of the second conveying device is fixedly provided with a second guide plate, the top surface of the device body located on the front end portion of the second guide plate is provided with a water accumulating groove, the top surface of the device body located on the rear end portion of the second guide plate is fixedly provided with a material guide assembly, the device body located above the middle portion of the second conveying device is provided with a water passing channel, and the inlet end of the water passing channel is communicated with the inner wall of the bottom of the recovered water accumulating box.
7. A quartz wafer pre-process cleaning apparatus as set forth in claim 6 wherein: the material guiding assembly comprises two supporting columns, a material guiding inclined plate is fixedly mounted on the top surfaces of the supporting columns, the inlet end of the material guiding inclined plate is located right below the outlet end of the second conveying device, and a slide for the sliding of the quartz wafers is arranged on the top surface of the material guiding inclined plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022952099.9U CN214078090U (en) | 2020-12-11 | 2020-12-11 | Cleaning equipment before quartz wafer processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022952099.9U CN214078090U (en) | 2020-12-11 | 2020-12-11 | Cleaning equipment before quartz wafer processing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214078090U true CN214078090U (en) | 2021-08-31 |
Family
ID=77461477
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022952099.9U Active CN214078090U (en) | 2020-12-11 | 2020-12-11 | Cleaning equipment before quartz wafer processing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214078090U (en) |
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2020
- 2020-12-11 CN CN202022952099.9U patent/CN214078090U/en active Active
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