CN213835519U - Target material back plate - Google Patents
Target material back plate Download PDFInfo
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- CN213835519U CN213835519U CN202022456979.7U CN202022456979U CN213835519U CN 213835519 U CN213835519 U CN 213835519U CN 202022456979 U CN202022456979 U CN 202022456979U CN 213835519 U CN213835519 U CN 213835519U
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- flow channel
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- avoiding groove
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Abstract
The utility model discloses a target backplate, include: the back plate main body is provided with a target material on the front surface and a flow channel on the back surface, the flow channel is provided with a liquid inlet and a liquid outlet, and the flow channel can be used for cooling liquid to flow; the cover plate is arranged on the back surface of the back plate main body and covers the flow channel; and the sealing ring is arranged between the cover plate and the flow channel and used for sealing the flow channel. During the use, can set up the target in the front of backplate main part, make the coolant liquid can flow in from the runner inlet that is located the backplate main part back, flow from the liquid outlet, the coolant liquid can take away the heat that is located the positive target of backplate main part to reduce the temperature of target in sputter coating process, and then can promote the coating quality. In addition, the sealing ring arranged between the cover plate and the flow channel can seal the flow channel.
Description
Technical Field
The utility model relates to a sputter coating field, in particular to target backplate.
Background
The target material is a special electronic material with high added value, and is mainly used in the industries of microelectronics, displays, memories, optical coating and the like.
Sputtering is a process of bombarding the surface of a target material with ions generated by an ion source, so that target atoms are sputtered away from the target and then deposited on the surface of a substrate. Sputter coating has the following significant advantages: the film has strong binding force and good stability of the film thickness, the thickness of the film cannot be changed, and the stability of the film thickness can be summarized into good controllability and repeatability of the film thickness.
At present, when sputtering coating is carried out on a target, high-speed ion beam flow bombards the surface of the target, so that the target generates a large amount of heat, the temperature of the target is increased, and the coating quality is influenced.
SUMMERY OF THE UTILITY MODEL
The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, the utility model provides a target backplate can reduce the temperature of target in sputter coating process, promotes the coating film quality.
According to the utility model discloses target backplate of embodiment includes: the back plate main body is provided with a target material on the front surface and a flow channel on the back surface, the flow channel is provided with a liquid inlet and a liquid outlet, and the flow channel can be used for cooling liquid to flow; the cover plate is arranged on the back surface of the back plate main body and covers the flow channel; and the sealing ring is arranged between the cover plate and the flow channel and used for sealing the flow channel.
The method has the following beneficial effects: during the use, can set up the target in the front of backplate main part, make the coolant liquid can flow in from the runner inlet that is located the backplate main part back, flow from the liquid outlet, the coolant liquid can take away the heat that is located the positive target of backplate main part to reduce the temperature of target in sputter coating process, and then can promote the coating quality. In addition, the sealing ring arranged between the cover plate and the flow channel can seal the flow channel.
According to some embodiments of the utility model, the runner is the U type, the inlet with the liquid outlet is located the same one end of backplate main part.
According to some embodiments of the utility model, the width of inlet reaches the width of liquid outlet all follows the length direction of backplate main part by the inside of backplate main part to the outside of backplate main part reduces gradually.
According to some embodiments of the utility model, the apron be with the U type that the runner agrees with mutually, the apron with the inlet with the corresponding region of liquid outlet has been seted up the inlet respectively and has been dodged groove and liquid outlet and dodge the groove, the inlet dodges the groove and the liquid outlet dodges the width in groove and all is less than the width of runner.
According to some embodiments of the utility model, the backplate main part with the apron corresponding to the inlet dodges the groove and the position that the groove was dodged to the liquid outlet all is provided with the depressed part, the size of depressed part is greater than the inlet dodges the size in groove and the size in groove is dodged to the liquid outlet.
According to some embodiments of the utility model, be the U type the centre-to-centre spacing of two sidelines of runner is 80mm to 90 mm.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a schematic structural diagram of an embodiment of the present invention;
FIG. 2 is an enlarged view of a portion of FIG. 1 at A;
fig. 3 is a schematic view of a main structure of a back plate in an embodiment of the present invention;
FIG. 4 is a cross-sectional view taken along line B-B of FIG. 3;
fig. 5 is a schematic view of a cover plate structure in an embodiment of the present invention.
Reference numerals: the back plate comprises a back plate body 100, a flow channel 110, a liquid inlet 111, a liquid outlet 112, a cover plate 200, a liquid inlet avoiding groove 210, a liquid outlet avoiding groove 220 and a concave part 230.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present invention, and should not be construed as limiting the present invention.
In the description of the present invention, the target material of the present invention is not the structure of the present invention, and the target material is introduced to illustrate the structure and/or function.
In the description of the present invention, unless there is an explicit limitation, the words such as setting and connection should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meaning of the above words in the present invention by combining the specific contents of the technical solution.
Referring to fig. 1 to 5, the present invention discloses a target backing plate, which comprises a backing plate main body 100, a cover plate 200 and a sealing ring.
The back plate main body 100 has a target on the front surface, a flow channel 110 on the back surface, the flow channel 110 having a liquid inlet 111 and a liquid outlet 112, the flow channel 110 being for flowing a cooling liquid, a cover plate 200 disposed on the back surface of the back plate main body 100 and covering the flow channel 110, and a sealing ring disposed between the cover plate 200 and the flow channel 110 for sealing the flow channel 110.
It can be understood that, when in use, the target material can be disposed on the front surface of the backplate main body 100, so that the cooling liquid can flow in from the liquid inlet 111 of the flow channel 110 on the back surface of the backplate main body 100 and flow out from the liquid outlet 112, and the cooling liquid can take away the heat of the target material on the front surface of the backplate main body 100, thereby reducing the temperature of the target material in the sputtering coating process and further improving the coating quality. In addition, the sealing ring disposed between the cover plate 200 and the flow channel 110 can seal the flow channel 110.
Referring to fig. 3 and 5, in some embodiments of the present invention, the flow channel 110 is U-shaped, and the liquid inlet 111 and the liquid outlet 112 are located at the same end of the back plate body 100. The U-shaped flow channel 110 can increase the cooling area of the target material, thereby improving the cooling effect; the liquid inlet 111 and the liquid outlet 112 are located at the same end of the backplate main body 100, so that the cooling liquid can be conveniently circulated, wherein the liquid inlet 111 and the liquid outlet 112 are both connected with an external cooling system, and the cooling liquid flowing out of the liquid outlet 112 can enter the external cooling system for recycling.
In addition, referring to fig. 2, in some embodiments of the present invention, the cover plate 200 is a U-shaped structure matching with the flow channel 110, the cover plate 200 has an inlet avoiding groove 210 and an outlet avoiding groove 220 respectively disposed in the corresponding areas of the inlet 111 and the outlet 112, and the width of the inlet avoiding groove 210 and the width of the outlet avoiding groove 220 are both smaller than the width of the flow channel 110. The liquid inlet 111 and the liquid outlet 112 may be directly connected to the external cooling system on the back plate main body 100, or may be connected to the external cooling system through a liquid inlet avoiding groove 210 and a liquid outlet avoiding groove 220 formed in the cover plate 200, wherein the liquid inlet avoiding groove 210 and the liquid outlet avoiding groove 220 are respectively disposed corresponding to the liquid inlet 111 and the liquid outlet 112. Specifically, the external cooling system is a cooling system that collects and cools the coolant having heat, and allows the cooled coolant to flow into the flow channel 110 again.
Specifically, when the cooling liquid flows into the flow channel 110 from the outside through the liquid inlet avoiding groove 210, the flow velocity of the cooling liquid is increased due to the fact that the cross section of the cooling liquid is changed from small to large, and the cooling of the cooling liquid on the target can be accelerated; when the cooling liquid flows out from the groove 220 through the liquid outlet in the inner diameter of the flow channel 110, the flowing cross section is changed from large to small, the flowing speed of the cooling liquid is reduced due to obstruction, the flow speed of the cooling liquid flowing into the external cooling system can be reduced, and the external cooling system is protected.
In some embodiments of the present invention, the width of the liquid inlet 111 and the width of the liquid outlet 112 are gradually decreased from the inside of the backboard main body 100 to the outside of the backboard main body 100 along the length direction of the backboard main body 100. It can be understood that when the cooling liquid flows into the flow channel 110 from the outside, the flow velocity of the cooling liquid will be increased due to the larger and smaller cross sections, which can accelerate the cooling of the target material by the cooling liquid; when the cooling liquid flows out from the flow channel 110 to the outside, the flow of the cooling liquid is blocked and the speed is reduced due to the small cross section, so that the flow speed of the cooling liquid flowing into the external cooling system can be reduced, and the external cooling system is protected.
Referring to fig. 2, in some embodiments of the present invention, the back plate main body 100 and the cover plate 200 are provided with a recess 230 at positions corresponding to the inlet avoiding groove 210 and the outlet avoiding groove 220, and the size of the recess 230 is larger than the size of the inlet avoiding groove 210 and the size of the outlet avoiding groove 220. When the pipelines of the external cooling system are connected, the concave portion 230 can align the pipelines with the positions of the inlet avoiding groove 210 and the outlet avoiding groove 220, which is convenient for installation.
In some embodiments of the present invention, the center-to-center distance between the two side lines of the U-shaped flow channel 110 is 80mm to 90 mm. The flow channels 110 on the two sides of the U-shape may not be too far away, which may affect the cooling effect of the target, but if too far away, it is not suitable for processing, so the center distance can be controlled to be 80mm to 90 mm.
In addition, the manufacturing process of the target backing plate in some embodiments of the present invention is as follows: preparing a back plate main body 100 with a corresponding size, processing a flow channel 110 on the back surface of the back plate main body 100, and reserving margins on the thicknesses of the front surface and the back surface of the back plate main body 100; processing the cover plate 200 to enable the cover plate 200 to cover the flow channel 110, and reserving allowance for the thickness of the cover plate 200; arranging a sealing ring between the cover plate 200 and the flow channel 110, and welding the back plate main body 100 and the cover plate 200 to combine the back plate main body 100 and the cover plate 200 into a target back plate semi-finished product; leveling the combined target back plate semi-finished product; carrying out rough machining on the semi-finished target back plate by using a numerical control machine tool, and reducing partial allowance of thicknesses of the front surface and the back surface of the semi-finished target back plate; eliminating the internal residual stress of the target back plate semi-finished product; performing finish machining on the semi-finished target back plate by using a numerical control machine tool to reduce all allowance of thicknesses of the front surface and the back surface of the semi-finished target back plate; and performing a leak detection test on the flow channel 110 to obtain a target backing plate.
The embodiments of the present invention have been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made without departing from the spirit of the present invention within the knowledge of those skilled in the art.
Claims (6)
1. The target backplate, its characterized in that includes:
the back plate comprises a back plate main body (100), wherein the front surface of the back plate main body is provided with a target, the back surface of the back plate main body is provided with a flow channel (110), the flow channel (110) is provided with a liquid inlet (111) and a liquid outlet (112), and cooling liquid can flow in the flow channel (110);
the cover plate (200) is arranged on the back surface of the back plate main body (100) and covers the flow channel (110);
and the sealing ring is arranged between the cover plate (200) and the flow channel (110) and is used for sealing the flow channel (110).
2. The target backing plate of claim 1, wherein the flow channel (110) is U-shaped, and the liquid inlet (111) and the liquid outlet (112) are located at the same end of the backing plate body (100).
3. The target backing plate of claim 2, wherein the width of the liquid inlet (111) and the width of the liquid outlet (112) both gradually decrease from the inside of the backing plate body (100) to the outside of the backing plate body (100) along the length direction of the backing plate body (100).
4. The target backing plate of claim 2, wherein the cover plate (200) is U-shaped and fits to the flow channel (110), the cover plate (200) is provided with a liquid inlet avoiding groove (210) and a liquid outlet avoiding groove (220) in regions corresponding to the liquid inlet (111) and the liquid outlet (112), respectively, and the widths of the liquid inlet avoiding groove (210) and the liquid outlet avoiding groove (220) are both smaller than the width of the flow channel (110).
5. The target backing plate of claim 4, wherein the backing plate body (100) and the cover plate (200) are each provided with a recess (230) at a position corresponding to the inlet avoiding groove (210) and the outlet avoiding groove (220), the size of the recess (230) being larger than the size of the inlet avoiding groove (210) and the size of the outlet avoiding groove (220).
6. The target backing plate of claim 2, wherein the two side lines of the U-shaped flow channel (110) are spaced apart by a center distance of 80mm to 90 mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022456979.7U CN213835519U (en) | 2020-10-29 | 2020-10-29 | Target material back plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022456979.7U CN213835519U (en) | 2020-10-29 | 2020-10-29 | Target material back plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213835519U true CN213835519U (en) | 2021-07-30 |
Family
ID=77012013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022456979.7U Active CN213835519U (en) | 2020-10-29 | 2020-10-29 | Target material back plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213835519U (en) |
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2020
- 2020-10-29 CN CN202022456979.7U patent/CN213835519U/en active Active
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