CN213546275U - Cleaning equipment for semiconductor furnace tube - Google Patents
Cleaning equipment for semiconductor furnace tube Download PDFInfo
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- CN213546275U CN213546275U CN202023292128.XU CN202023292128U CN213546275U CN 213546275 U CN213546275 U CN 213546275U CN 202023292128 U CN202023292128 U CN 202023292128U CN 213546275 U CN213546275 U CN 213546275U
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- 238000004140 cleaning Methods 0.000 title claims abstract description 142
- 239000004065 semiconductor Substances 0.000 title claims abstract description 60
- 239000007788 liquid Substances 0.000 claims description 16
- 238000003860 storage Methods 0.000 claims description 10
- 230000000007 visual effect Effects 0.000 claims description 8
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 6
- 230000005540 biological transmission Effects 0.000 abstract description 5
- 230000001360 synchronised effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
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Abstract
The utility model discloses a cleaning equipment of semiconductor boiler tube, including supporting mechanism, the supporting mechanism inboard is provided with and is used for supporting pivoted slewing mechanism to the semiconductor boiler tube, the slewing mechanism upside is provided with and carries out abluent wiper mechanism to the inside and outside wall of semiconductor boiler tube, slewing mechanism wiper mechanism one side is provided with the power unit that provides power, power unit with slewing mechanism the wiper mechanism is connected, slewing mechanism the wiper mechanism with supporting mechanism connects. The utility model discloses a transmission of power unit power drives slewing mechanism to the rotation of semiconductor boiler tube to and the synchronous motion of wiper mechanism's outer scavenge pipe, interior scavenge pipe, make the semiconductor boiler tube wash in step the internal and external wall in the pivoted time, improved abluent efficiency and quality, simplified the cleaning process.
Description
Technical Field
The utility model relates to a semiconductor boiler tube technical field especially relates to a cleaning equipment of semiconductor boiler tube.
Background
Along with the development of industrial science and technology, the requirement of semiconductor wafers on manufacturing cleanliness is higher and higher, and the requirement on the cleanliness of a furnace tube in direct contact with the wafers is also improved, so that the furnace tube needs to be cleaned, the operation of the conventional furnace tube cleaning equipment is complex, the inner wall and the outer wall of the furnace tube need to be cleaned step by step, the cleaning efficiency is low, and the practicability is poor.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a cleaning equipment of semiconductor boiler tube for solving the above problems.
The utility model discloses a following technical scheme realizes above-mentioned purpose:
the cleaning equipment for the semiconductor furnace tube comprises a supporting mechanism, wherein a rotating mechanism used for supporting and rotating the semiconductor furnace tube is arranged on the inner side of the supporting mechanism, a cleaning mechanism used for cleaning the inner wall and the outer wall of the semiconductor furnace tube is arranged on the upper side of the rotating mechanism, a power mechanism used for providing power is arranged on one side of the rotating mechanism and the cleaning mechanism, the power mechanism is connected with the rotating mechanism and the cleaning mechanism, and the rotating mechanism and the cleaning mechanism are connected with the supporting mechanism;
the supporting mechanism comprises a box body, a cleaning cavity is arranged above the inner side of the box body, a filter plate is arranged on the lower side of the cleaning cavity, a liquid storage cavity is arranged on the lower side of the filter plate, a box door is arranged on the front side of the cleaning cavity, and a control panel is arranged on the front wall of the box body;
the rotating mechanism comprises a first rotating shaft and a second rotating shaft, carrier rollers are uniformly arranged on the outer diameters of the first rotating shaft and the second rotating shaft at intervals, and the first rotating shaft and the second rotating shaft are positioned on the inner side of the cleaning cavity;
the cleaning mechanism comprises a moving mechanism, two fixing frames are arranged on the moving mechanism, an outer cleaning pipe is connected to the lower side of one fixing frame, a connecting pipe is arranged on the other fixing frame, an inner cleaning pipe is arranged at the tail end of the connecting pipe, the outer cleaning pipe and the inner cleaning pipe are positioned on the same vertical plane, nozzles are arranged on the inner wall of the outer cleaning pipe and the outer wall of the inner cleaning pipe at intervals, the connecting pipe and the outer cleaning pipe are connected with a suction pump through hoses, and the suction pump is positioned in the liquid storage cavity;
the power mechanism comprises a driving motor, a main chain wheel is arranged at the output end of the driving motor, a first double chain wheel is arranged on the first rotating shaft and on the lower side of the main chain wheel, a second double chain wheel is arranged on the second rotating shaft, and an auxiliary chain wheel is connected to the moving mechanism.
Further setting: the moving mechanism comprises a first sliding block, a lead screw and a feed bar are arranged on the first sliding block in a penetrating mode, the lead screw is in threaded connection with the first sliding block, and the feed bar is in sliding connection with the first sliding block.
According to the arrangement, the first sliding block is enabled to move directionally under the support of the feed rod through the rotating lead screw, so that the outer cleaning pipe and the inner cleaning pipe move.
Further setting: the moving mechanism comprises a second sliding block, a lead screw penetrates through the second sliding block, a guide rail is arranged at the rear end of the second sliding block, the second sliding block is in threaded connection with the lead screw, and the second sliding block is in sliding connection with the guide rail.
According to the arrangement, the second sliding block is enabled to move directionally under the support of the guide rail through the rotating lead screw, so that the outer cleaning pipe and the inner cleaning pipe move.
Further setting: the middle part of the box door is provided with a visual window, the box door is connected with the box body in a sliding mode, and the front end of the box door is provided with a handle.
So set up, be convenient for get getting of semiconductor furnace tube and put, simultaneously through the visual window is convenient for observe the cleaning process.
Further setting: the first rotating shaft and the second rotating shaft are positioned on the same horizontal line, and the first rotating shaft and the second rotating shaft are rotatably connected with the box body.
So set up, make first pivot, the second pivot carries out stable support to the semiconductor furnace tube.
Further setting: the outer cleaning pipe is in an upper semicircular arc shape, and the inner cleaning pipe is in a circular shape.
So set up, be convenient for through outer scavenge pipe, interior scavenge pipe washs the semiconductor boiler tube simultaneously inside and outside wall.
Further setting: the first rotating shaft is connected with the first double-chain-wheel key, the second rotating shaft is connected with the second double-chain-wheel key, and the first double-chain wheel is connected with the main chain wheel, the first double-chain wheel is connected with the second double-chain-wheel key, and chains are arranged among the auxiliary chain wheels.
So set up, make driving motor's power passes through the chain transmission and drives first pivot, the second pivot the lead screw rotates, makes the rotation of semiconductor boiler tube go on with wasing in step.
Further setting: the lead screw with vice sprocket key-type connection, the lead screw with the box rotates and is connected.
So set up, guarantee the stable transmission of the power of lead screw.
Further setting: one side of the box body is positioned on one side of the connecting pipe, and a through groove is formed in the side of the connecting pipe, and the connecting pipe is connected with the box body in a sliding mode.
So set up, be convenient for the connecting pipe is right the removal of interior scavenge pipe is supported.
Compared with the prior art, the beneficial effects of the utility model are as follows:
the power of the power mechanism is transmitted to drive the rotating mechanism to rotate the semiconductor furnace tube and the outer cleaning tube and the inner cleaning tube of the cleaning mechanism to synchronously move, so that the inner wall and the outer wall of the semiconductor furnace tube are synchronously cleaned while the semiconductor furnace tube rotates, the cleaning efficiency and quality are improved, and the cleaning process is simplified.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without inventive exercise.
Fig. 1 is a schematic view of a first structure of a cleaning apparatus for a semiconductor furnace tube according to the present invention;
FIG. 2 is a schematic diagram of a second structure of the cleaning apparatus for a semiconductor furnace tube according to the present invention;
fig. 3 is a schematic structural diagram of a right side view of an embodiment 1 of the cleaning apparatus for a semiconductor furnace tube according to the present invention;
FIG. 4 is a schematic view of a partial structure of a cleaning mechanism of a cleaning apparatus for a semiconductor furnace tube according to the present invention;
fig. 5 is a schematic structural view of a power mechanism of the cleaning apparatus for semiconductor furnace tubes according to the present invention;
FIG. 6 is a schematic view of a partial structure inside a box body of a cleaning apparatus for a semiconductor furnace tube according to the present invention;
fig. 7 is a schematic structural view of a moving mechanism of embodiment 1 of the cleaning apparatus for a semiconductor furnace tube according to the present invention;
fig. 8 is a schematic structural diagram of a moving mechanism of embodiment 2 of the cleaning apparatus for a semiconductor furnace tube according to the present invention.
The reference numerals are explained below:
1. a support mechanism; 11. a box body; 12. a cleaning chamber; 13. a box door; 14. a control panel; 15. a liquid storage cavity; 16. a visual window; 17. a filter plate; 2. a rotating mechanism; 21. a first rotating shaft; 22. a second rotating shaft; 23. a carrier roller; 3. a cleaning mechanism; 31. a moving mechanism; 311. a first slider; 312. a lead screw; 313. a polished rod; 314. a second slider; 315. a guide rail; 32. a fixed mount; 33. an outer cleaning tube; 34. a connecting pipe; 35. an inner cleaning tube; 36. a suction pump; 4. a power mechanism; 41. a drive motor; 42. a main sprocket; 43. a first double sprocket; 44. a second double sprocket; 45. a secondary sprocket; 5. a semiconductor furnace tube.
Detailed Description
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
The present invention will be further explained with reference to the accompanying drawings:
example 1
As shown in fig. 1 to 7, a cleaning apparatus for a semiconductor furnace tube comprises a supporting mechanism 1, wherein a rotating mechanism 2 for supporting and rotating a semiconductor furnace tube 5 is arranged at the inner side of the supporting mechanism 1, a cleaning mechanism 3 for cleaning the inner wall and the outer wall of the semiconductor furnace tube 5 is arranged at the upper side of the rotating mechanism 2, a power mechanism 4 for providing power is arranged at one side of the rotating mechanism 2 and one side of the cleaning mechanism 3, the power mechanism 4 is connected with the rotating mechanism 2 and the cleaning mechanism 3, and the rotating mechanism 2 and the cleaning mechanism 3 are connected with the supporting mechanism 1;
the supporting mechanism 1 comprises a box body 11, a cleaning cavity 12 is arranged above the inner side of the box body 11, a filter plate 17 is arranged on the lower side of the cleaning cavity 12 and is used for filtering liquid after cleaning, a liquid storage cavity 15 is arranged on the lower side of the filter plate 17 and is used for storing cleaning liquid, a box door 13 is arranged on the front side of the cleaning cavity 12, and a control panel 14 is arranged on the front wall of the box body 11;
the rotating mechanism 2 comprises a first rotating shaft 21 and a second rotating shaft 22, the outer diameters of the first rotating shaft 21 and the second rotating shaft 22 are uniformly provided with carrier rollers 23 at intervals to rotatably support the semiconductor furnace tube 5, and the first rotating shaft 21 and the second rotating shaft 22 are positioned at the inner side of the cleaning cavity 12;
the cleaning mechanism 3 comprises a moving mechanism 31, two fixing frames 32 are arranged on the moving mechanism 31, the lower side of one fixing frame 32 is connected with an outer cleaning pipe 33, the other fixing frame 32 is provided with a connecting pipe 34 which is communicated and fixed with an inner cleaning pipe 35, the tail end of the connecting pipe 34 is provided with the inner cleaning pipe 35, the outer cleaning pipe 33 and the inner cleaning pipe 35 are positioned on the same vertical plane, nozzles are arranged on the inner wall of the outer cleaning pipe 33 and the outer wall of the inner cleaning pipe 35 at intervals, the connecting pipe 34 and the outer cleaning pipe 33 are connected with a suction pump 36 through hoses, and the suction pump 36 is positioned in the liquid storage cavity 15;
the power mechanism 4 comprises a driving motor 41 for providing the rotation power of the semiconductor furnace tube 5 and the moving power of the moving mechanism 31, the output end of the driving motor 41 is provided with a main chain wheel 42, a first double chain wheel 43 is arranged on the first rotating shaft 21 and below the main chain wheel 42, a second double chain wheel 44 is arranged on the second rotating shaft 22, and the moving mechanism 31 is connected with a secondary chain wheel 45.
Preferably: the moving mechanism 31 comprises a first sliding block 311, a lead screw 312 and a feed bar 313 are arranged on the first sliding block 311 in a penetrating manner, the lead screw 312 is in threaded connection with the first sliding block 311, the feed bar 313 is in sliding connection with the first sliding block 311, and the first sliding block 311 is enabled to move directionally under the support of the feed bar 313 through the rotating lead screw 312, so that the outer cleaning pipe 33 and the inner cleaning pipe 35 move; a visual window 16 is arranged in the middle of the box door 13, the box door 13 is connected with the box body 11 in a sliding mode, a handle is arranged at the front end of the box door 13, the semiconductor furnace tube 5 can be conveniently taken and placed, and meanwhile the cleaning process can be conveniently observed through the visual window 16; the first rotating shaft 21 and the second rotating shaft 22 are positioned on the same horizontal line, and the first rotating shaft 21 and the second rotating shaft 22 are rotatably connected with the box body 11, so that the first rotating shaft 21 and the second rotating shaft 22 stably support the semiconductor furnace tube 5; the outer cleaning pipe 33 is in an upper semicircular arc shape, and the inner cleaning pipe 35 is in a circular shape, so that the inner wall and the outer wall of the semiconductor furnace tube 5 can be cleaned simultaneously through the outer cleaning pipe 33 and the inner cleaning pipe 35; the first rotating shaft 21 is in key connection with a first double-chain wheel 43, the second rotating shaft 22 is in key connection with a second double-chain wheel 44, chains are arranged among the first double-chain wheel 43, the main chain wheel 42, the first double-chain wheel 43, the second double-chain wheel 44 and the auxiliary chain wheel 45, so that the power of the driving motor 41 is transmitted through the chains to drive the first rotating shaft 21, the second rotating shaft 22 and the lead screw 312 to rotate, and the rotation and the cleaning of the semiconductor furnace tube 5 are performed synchronously; the lead screw 312 is in key connection with the auxiliary chain wheel 45, and the lead screw 312 is in rotary connection with the box body 11, so that the stable transmission of the power of the lead screw 312 is ensured; a through groove is formed in one side, located on one side of the connecting pipe 34, of the box body 11, and the connecting pipe 34 is connected with the box body 11 in a sliding mode, so that the connecting pipe 34 can conveniently support the inner cleaning pipe 35 in a moving mode.
Further, the first double sprocket 432 and the second double sprocket 44 are both elliptical sprockets, long axes of the two elliptical sprockets are perpendicular to each other, meanwhile, one ends of the first rotating shaft 21 and the second rotating shaft 22, which are far away from the first double sprocket 432 and the second double sprocket 44, are fixed by a universal joint (so that when the first rotating shaft 21 and the second rotating shaft 22 fluctuate due to rotation of the elliptical sprockets, the other ends can adaptively rotate, and a length difference between the long axis and the short axis of the first double sprocket 432 and the second double sprocket 44 should be less than 10cm, so as to prevent the semiconductor furnace tube from fluctuating too high and sliding, and meanwhile, friction of the carrier roller 23 can be improved, and the carrier roller 23 is made of a corrosion-resistant rubber material). It should be noted that the distances between the outer cleaning tube 33 and the semiconductor furnace tube, between the inner cleaning tube 35 and the semiconductor furnace tube, should be set to prevent the semiconductor furnace tube from being damaged by collision.
Example 2
As shown in fig. 1, fig. 2, fig. 4-fig. 6, and fig. 8, a cleaning apparatus for a semiconductor furnace tube includes a supporting mechanism 1, a rotating mechanism 2 for supporting and rotating the semiconductor furnace tube 5 is disposed inside the supporting mechanism 1, a cleaning mechanism 3 for cleaning the inner and outer walls of the semiconductor furnace tube 5 is disposed on the upper side of the rotating mechanism 2, a power mechanism 4 for providing power is disposed on one side of the rotating mechanism 2 and the cleaning mechanism 3, the power mechanism 4 is connected with the rotating mechanism 2 and the cleaning mechanism 3, and the rotating mechanism 2 and the cleaning mechanism 3 are connected with the supporting mechanism 1;
the supporting mechanism 1 comprises a box body 11, a cleaning cavity 12 is arranged above the inner side of the box body 11, a filter plate 17 is arranged on the lower side of the cleaning cavity 12 and is used for filtering liquid after cleaning, a liquid storage cavity 15 is arranged on the lower side of the filter plate 17 and is used for storing cleaning liquid, a box door 13 is arranged on the front side of the cleaning cavity 12, and a control panel 14 is arranged on the front wall of the box body 11;
the rotating mechanism 2 comprises a first rotating shaft 21 and a second rotating shaft 22, the outer diameters of the first rotating shaft 21 and the second rotating shaft 22 are uniformly provided with carrier rollers 23 at intervals to rotatably support the semiconductor furnace tube 5, and the first rotating shaft 21 and the second rotating shaft 22 are positioned at the inner side of the cleaning cavity 12;
the cleaning mechanism 3 comprises a moving mechanism 31, two fixing frames 32 are arranged on the moving mechanism 31, the lower side of one fixing frame 32 is connected with an outer cleaning pipe 33, the other fixing frame 32 is provided with a connecting pipe 34 which is communicated and fixed with an inner cleaning pipe 35, the tail end of the connecting pipe 34 is provided with the inner cleaning pipe 35, the outer cleaning pipe 33 and the inner cleaning pipe 35 are positioned on the same vertical plane, nozzles are arranged on the inner wall of the outer cleaning pipe 33 and the outer wall of the inner cleaning pipe 35 at intervals, the connecting pipe 34 and the outer cleaning pipe 33 are connected with a suction pump 36 through hoses, and the suction pump 36 is positioned in the liquid storage cavity 15;
the power mechanism 4 comprises a driving motor 41 for providing the rotation power of the semiconductor furnace tube 5 and the moving power of the moving mechanism 31, the output end of the driving motor 41 is provided with a main chain wheel 42, a first double chain wheel 43 is arranged on the first rotating shaft 21 and below the main chain wheel 42, a second double chain wheel 44 is arranged on the second rotating shaft 22, and the moving mechanism 31 is connected with a secondary chain wheel 45.
Preferably: the moving mechanism 31 comprises a second sliding block 314, a lead screw 312 penetrates through the second sliding block 314, a guide rail 315 is arranged at the rear end of the second sliding block 314, the second sliding block 314 is in threaded connection with the lead screw 312, the second sliding block 314 is in sliding connection with the guide rail 315, and the second sliding block 314 is enabled to move directionally under the support of the guide rail 315 through the rotating lead screw 312, so that the outer cleaning pipe 33 and the inner cleaning pipe 35 move; a visual window 16 is arranged in the middle of the box door 13, the box door 13 is connected with the box body 11 in a sliding mode, a handle is arranged at the front end of the box door 13, the semiconductor furnace tube 5 can be conveniently taken and placed, and meanwhile the cleaning process can be conveniently observed through the visual window 16; the first rotating shaft 21 and the second rotating shaft 22 are positioned on the same horizontal line, and the first rotating shaft 21 and the second rotating shaft 22 are rotatably connected with the box body 11, so that the first rotating shaft 21 and the second rotating shaft 22 stably support the semiconductor furnace tube 5; the outer cleaning pipe 33 is in an upper semicircular arc shape, and the inner cleaning pipe 35 is in a circular shape, so that the inner wall and the outer wall of the semiconductor furnace tube 5 can be cleaned simultaneously through the outer cleaning pipe 33 and the inner cleaning pipe 35; the first rotating shaft 21 is in key connection with a first double-chain wheel 43, the second rotating shaft 22 is in key connection with a second double-chain wheel 44, chains are arranged among the first double-chain wheel 43, the main chain wheel 42, the first double-chain wheel 43, the second double-chain wheel 44 and the auxiliary chain wheel 45, so that the power of the driving motor 41 is transmitted through the chains to drive the first rotating shaft 21, the second rotating shaft 22 and the lead screw 312 to rotate, and the rotation and the cleaning of the semiconductor furnace tube 5 are performed synchronously; the lead screw 312 is in key connection with the auxiliary chain wheel 45, and the lead screw 312 is in rotary connection with the box body 11, so that the stable transmission of the power of the lead screw 312 is ensured; a through groove is formed in one side, located on one side of the connecting pipe 34, of the box body 11, and the connecting pipe 34 is connected with the box body 11 in a sliding mode, so that the connecting pipe 34 can conveniently support the inner cleaning pipe 35 in a moving mode.
A use method of cleaning equipment of a semiconductor furnace tube comprises the following steps:
a. placing the semiconductor furnace tube 5 on the carrier rollers 23 on the first rotating shaft 21 and the second rotating shaft 22, closing the box door 13, and opening the equipment;
b. the driving motor 41 drives the main chain wheel 42, the first double chain wheel 43, the second double chain wheel 44 and the auxiliary chain wheel 45 to transmit power, so that the first rotating shaft 21 and the second rotating shaft 22 of the rotating mechanism 2 rotate in the same direction, the semiconductor furnace tube 5 on the carrier roller 23 rotates, and meanwhile, the lead screw 312 of the moving mechanism 31 rotates to drive the outer cleaning tube 33 and the inner cleaning tube 35 on the fixed frame 32 to move to one side;
c. the suction pump 36 pumps the cleaning liquid in the liquid storage cavity 15 into the outer cleaning pipe 33 and the inner cleaning pipe 35, and the cleaning liquid is sprayed to the inner wall and the outer wall of the semiconductor furnace tube 5 through the spray heads, and the outer cleaning pipe 33 and the inner cleaning pipe 35 move simultaneously along with the rotation of the semiconductor furnace tube 5, so that the inner wall and the outer wall are cleaned synchronously.
The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It will be understood by those skilled in the art that the present invention is not limited to the above embodiments, and that the foregoing embodiments and descriptions are provided only to illustrate the principles of the present invention without departing from the spirit and scope of the present invention.
Claims (9)
1. The utility model provides a cleaning equipment of semiconductor furnace tube which characterized in that: the device comprises a supporting mechanism (1), wherein a rotating mechanism (2) used for supporting and rotating a semiconductor furnace tube (5) is arranged on the inner side of the supporting mechanism (1), a cleaning mechanism (3) used for cleaning the inner wall and the outer wall of the semiconductor furnace tube (5) is arranged on the upper side of the rotating mechanism (2), a power mechanism (4) used for providing power is arranged on one side of the rotating mechanism (2) and one side of the cleaning mechanism (3), the power mechanism (4) is connected with the rotating mechanism (2) and the cleaning mechanism (3), and the rotating mechanism (2) and the cleaning mechanism (3) are connected with the supporting mechanism (1);
the supporting mechanism (1) comprises a box body (11), a cleaning cavity (12) is arranged above the inner side of the box body (11), a filter plate (17) is arranged on the lower side of the cleaning cavity (12), a liquid storage cavity (15) is arranged on the lower side of the filter plate (17), a box door (13) is arranged on the front side of the cleaning cavity (12), and a control panel (14) is arranged on the front wall of the box body (11);
the rotating mechanism (2) comprises a first rotating shaft (21) and a second rotating shaft (22), carrier rollers (23) are uniformly arranged on the outer diameters of the first rotating shaft (21) and the second rotating shaft (22) at intervals, and the first rotating shaft (21) and the second rotating shaft (22) are positioned on the inner side of the cleaning cavity (12);
the cleaning mechanism (3) comprises a moving mechanism (31), two fixing frames (32) are arranged on the moving mechanism (31), an outer cleaning pipe (33) is connected to the lower side of one fixing frame (32), a connecting pipe (34) is arranged on the other fixing frame (32), an inner cleaning pipe (35) is arranged at the tail end of the connecting pipe (34), the outer cleaning pipe (33) and the inner cleaning pipe (35) are positioned on the same vertical plane, nozzles are arranged on the inner wall of the outer cleaning pipe (33) and the outer wall of the inner cleaning pipe (35) at intervals, the connecting pipe (34) and the outer cleaning pipe (33) are connected with a suction pump (36) through hoses, and the suction pump (36) is positioned in the liquid storage cavity (15);
the power mechanism (4) comprises a driving motor (41), a main chain wheel (42) is arranged at the output end of the driving motor (41), a first double chain wheel (43) is arranged on the first rotating shaft (21) and on the lower side of the main chain wheel (42), a second double chain wheel (44) is arranged on the second rotating shaft (22), and an auxiliary chain wheel (45) is connected to the moving mechanism (31).
2. The apparatus of claim 1, wherein: the moving mechanism (31) comprises a first sliding block (311), a lead screw (312) and a feed bar (313) are arranged on the first sliding block (311) in a penetrating mode, the lead screw (312) is in threaded connection with the first sliding block (311), and the feed bar (313) is in sliding connection with the first sliding block (311).
3. The apparatus of claim 1, wherein: the moving mechanism (31) comprises a second sliding block (314), a lead screw (312) penetrates through the second sliding block (314), a guide rail (315) is arranged at the rear end of the second sliding block (314), the second sliding block (314) is in threaded connection with the lead screw (312), and the second sliding block (314) is in sliding connection with the guide rail (315).
4. The apparatus of claim 1, wherein: the middle part of the box door (13) is provided with a visual window (16), the box door (13) is connected with the box body (11) in a sliding mode, and the front end of the box door (13) is provided with a handle.
5. The apparatus of claim 1, wherein: the first rotating shaft (21) and the second rotating shaft (22) are located on the same horizontal line, and the first rotating shaft (21) and the second rotating shaft (22) are rotatably connected with the box body (11).
6. The apparatus of claim 1, wherein: the outer cleaning pipe (33) is in an upper semicircular arc shape, and the inner cleaning pipe (35) is in a circular shape.
7. The apparatus of claim 1, wherein: the first rotating shaft (21) is connected with the first double chain wheel (43) in a key mode, the second rotating shaft (22) is connected with the second double chain wheel (44) in a key mode, the first double chain wheel (43) is connected with the main chain wheel (42), the first double chain wheel (43) is connected with the second double chain wheel (44), and chains are arranged between the second double chain wheel (44) and the auxiliary chain wheel (45).
8. The apparatus of claim 2 or 3, wherein: the lead screw (312) is connected with the auxiliary chain wheel (45) in a key mode, and the lead screw (312) is connected with the box body (11) in a rotating mode.
9. The apparatus of claim 1, wherein: one side of the box body (11) is positioned at one side of the connecting pipe (34) and is provided with a through groove, and the connecting pipe (34) is in sliding connection with the box body (11).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023292128.XU CN213546275U (en) | 2020-12-30 | 2020-12-30 | Cleaning equipment for semiconductor furnace tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023292128.XU CN213546275U (en) | 2020-12-30 | 2020-12-30 | Cleaning equipment for semiconductor furnace tube |
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| Publication Number | Publication Date |
|---|---|
| CN213546275U true CN213546275U (en) | 2021-06-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202023292128.XU Active CN213546275U (en) | 2020-12-30 | 2020-12-30 | Cleaning equipment for semiconductor furnace tube |
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| CN (1) | CN213546275U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112833679A (en) * | 2020-12-30 | 2021-05-25 | 江苏亚电科技有限公司 | Cleaning equipment for semiconductor furnace tube |
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- 2020-12-30 CN CN202023292128.XU patent/CN213546275U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112833679A (en) * | 2020-12-30 | 2021-05-25 | 江苏亚电科技有限公司 | Cleaning equipment for semiconductor furnace tube |
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