CN213447306U - Liquid-free ammonia treatment device for circuit board alkaline etching solution - Google Patents
Liquid-free ammonia treatment device for circuit board alkaline etching solution Download PDFInfo
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- CN213447306U CN213447306U CN202021763996.9U CN202021763996U CN213447306U CN 213447306 U CN213447306 U CN 213447306U CN 202021763996 U CN202021763996 U CN 202021763996U CN 213447306 U CN213447306 U CN 213447306U
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Abstract
The utility model discloses a no liquid ammonia processing apparatus of circuit board alkaline etching liquid, include: an ammonia treatment tank for holding an ammonia-containing water and/or an inorganic ammonium salt solution, or for holding an inorganic ammonium salt solid; at least one ammonia preparation tank, wherein the ammonia preparation tank is used for containing alkaline etching solution and/or alkaline etching waste solution and/or alkaline etching regeneration preparation solution or is used for preparing alkaline etching sub-solution; and the gas drainage device is used for draining gas from the ammonia treatment tank to the ammonia preparation tank. The device can realize the supplement of the ammonia source to the alkaline etching solution under the condition of not using liquid ammonia, and can also realize the safe addition of the ammonia source in the process of regenerating the alkaline etching waste liquid into the alkaline etching sub-liquid.
Description
Technical Field
The utility model belongs to circuit board etching waste liquid retrieves the field, concretely relates to no liquid ammonia processing apparatus of circuit board alkaline etching liquid.
Background
Etching is an important step in the existing Printed Circuit Board (PCB) manufacturing process. Etching is to remove unnecessary copper on the copper-clad substrate by chemical reaction with an etching solution to form a desired circuit pattern.
The basic copper chloride ammonia etching solution (hereinafter referred to as basic etching solution) is one of the most common circuit board etching solutions at present, and comprises the main components of copper salt, ammonium chloride, ammonia and clear water, and optionally carbonate and other optional additives, wherein the carbonate usually adopts ammonium carbonate and/or ammonium bicarbonate. In order to keep the components of the alkaline etching solution stable during the actual production process, it is necessary to continuously add a replenishment solution to maintain the etching. The make-up solution is typically an aqueous solution of ammonia and/or ammonium chloride and/or ammonium salts and/or additives, and is referred to collectively in the art as an alkaline etchant solution when it contains more than one component.
The chemical reaction formula of the alkaline etching process is as follows: cu +2NH4Cl+2NH3+1/2O2→Cu(NH3)4Cl2+H2And O. Parameters for etching solution process control: the pH value ranges from 6.7 to 10.5; copper ion concentration of 30E200g/L。
Ammonia is one of the main components in the alkaline etching solution and is also the most active reactant in the alkaline etching process. The ammonia has volatility, and the escaped ammonia needs to be pumped and discharged in time in the actual production process. Therefore, the ammonia concentration in the alkaline etching solution is reduced due to the volatilization of ammonia and the exhaust gas of the etching solution is pumped out in the production process, and the ammonia needs to be supplemented in time so as to quickly solve the technical problem of ammonia deficiency of the etching solution.
On the other hand, adding supplementary solution continuously in the etching production process inevitably increases the amount of alkaline etching solution in the etching tank and overflows the tank to form alkaline etching waste solution. For manufacturers using alkaline etching solutions, a large amount of alkaline etching waste solution with high copper ion concentration needs to be treated every day.
In addition to selling the waste liquid to an environmental protection company for treatment, some manufacturers adopt equipment of an extraction electrolysis regeneration method and/or a direct electrolysis regeneration method to recycle the copper-taking recovery waste liquid in factories. In order to recycle the waste liquid after copper extraction, the solution which is produced after copper extraction in the recovery process and contains a certain amount of copper ions needs to be prepared and regenerated again according to the requirement of the alkaline etching process. The solution which is remained after the alkaline etching waste liquid is taken out and is regenerated after being prepared again is an alkaline etching regeneration preparation solution, and the solution which is obtained after the alkaline etching regeneration preparation solution is added with chloride salt and/or ammonia and/or additive and/or clear water for preparation is called alkaline etching regeneration sub-solution in the industry.
Therefore, neither the treatment of the alkaline etching solution in the etching process nor the regeneration treatment of the alkaline etching waste solution requires the replenishment of ammonia.
Currently, ammonia sources for supplementing ammonia in the regeneration process of alkaline etching solution or alkaline etching waste solution are generally ammonia water and liquid ammonia. Because the volume change of the solution needs to be considered when the regeneration device is used, the concentration of other components is reduced and the normal circulation cannot be realized by directly adding ammonia water, so that the regeneration process is meaningless. Liquid ammonia is currently more widely used because it does not result in a significant increase in the volume of the solution after addition.
However, liquid ammonia is more susceptible to leakage of ammonia gas than ammonia water. Liquid ammonia leakage is changed into toxic ammonia gas in air, and the toxic ammonia gas and the air can explode after being properly mixed, so that the liquid ammonia leakage belongs to a major hazard source and buries hidden troubles for safe production. Therefore, at present, when liquid ammonia is used for production, on one hand, special care needs to be taken by operators, on the other hand, more safety facilities need to be used for preventing dangers, and the cost burden is increased for production of enterprises.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a no liquid ammonia processing apparatus of circuit board alkaline etching liquid can realize carrying out the replenishment in ammonia source to alkaline etching liquid under the condition that does not use liquid ammonia through the device, also can realize the safe interpolation in ammonia source for the in-process of alkaline etching liquid waste regeneration for alkaline etching liquid.
The purpose of the utility model is realized through the following technical scheme:
a liquid-free ammonia processing device of circuit board alkaline etching liquid comprises:
an ammonia treatment tank for holding an ammonia-containing water and/or an inorganic ammonium salt solution, or for holding an inorganic ammonium salt solid;
at least one ammonia preparation tank, wherein the ammonia preparation tank is used for containing alkaline etching solution and/or alkaline etching waste solution and/or alkaline etching regeneration preparation solution or is used for preparing alkaline etching sub-solution;
and the gas drainage device is used for draining gas from the ammonia treatment tank to the ammonia preparation tank.
The working principle of the utility model is as follows: adding alkaline substances and/or heating treatment to ammonia and/or inorganic ammonium salt solution and/or inorganic ammonium salt solid in an ammonia treatment tank to enable ammonia and/or ammonium components in the ammonia and/or inorganic ammonium salt solution to form ammonia gas to escape, draining the escaped ammonia gas into an ammonia preparation tank through a gas drainage device, safely adding the ammonia gas into alkaline etching solution/alkaline etching waste liquid/alkaline etching regeneration preparation solution/prepared alkaline etching sub-solution contained in the ammonia preparation tank to serve as an ammonia source, and supplementing the ammonia content in the corresponding solution. Therefore, the use of liquid ammonia in the treatment process of the alkaline etching solution or the alkaline etching waste liquid can be avoided, and the safety of the treatment process is improved; on the other hand, the problem that the concentration of each component is reduced due to the increase of the volume of the solution under the condition of using ammonia water can be solved, so that the environment-friendly process for recycling the production waste liquid meets the requirements of national safety production rules. When the ammonia in the ammonia treatment tank is exhausted, the residual substances can be discharged after simple treatment, and the burden of cost is not brought.
When the ammonia preparation tank contains alkaline etching solution and/or alkaline etching regeneration preparation solution, the solution can also be adjusted by ammonium carbonate and/or ammonium bicarbonate, so that the alkaline etching regeneration sub-solution prepared by the solution under a certain ammonia content and the volatilization amount of ammonia of the etching solution in the etching production process can be reduced due to less free ammonia in the solution, and the environmental pollution is reduced.
The ammonia preparation tank and the ammonia treatment tank can be respectively provided with a feed inlet and an exhaust outlet.
The gas drainage device adopts a device capable of mixing liquid and gas, and comprises but is not limited to a device for directly pumping gas into solution by using a centrifugal fan to perform air floatation stirring and mixing, a pipeline spraying type gas-liquid mixing device and a water solution vacuum jet flow (Venturi mixer) device. Preferably, the water solution vacuum jet device is selected, the liquid in the ammonia preparation tank is used as the mixed liquid, and the mixed liquid and the ammonia gas discharged from the ammonia treatment tank form a gas-liquid mixture, so that the ammonia gas can be absorbed more effectively.
In order to better realize the escape of the ammonia gas in the ammonia treatment tank, the ammonia treatment tank is provided with a heating source for heating the ammonia treatment tank. The ammonia water and the inorganic ammonium salt in the ammonia treatment tank can accelerate volatilization or thermal decomposition reaction under the condition of heating to escape ammonia gas, and the ammonia gas can escape more completely. The heating source can be a direct heat source or an indirect heat source. The heating source can adopt liquid bath heating, dry heat conduction heating, radiation heating, electric heating type dip rod heating and a liquid heat transfer medium pipeline immersion type temperature heat exchanger.
Preferably, an electrothermal dip rod is selected as the heating source for convenient control. More preferably, hot water is selected as the liquid heat transfer medium, and the hot water pipe immersion type temperature heat exchanger is used for heating, so that the process application is safer and easier to control.
The utility model discloses can be used in alkaline etching process and directly supply ammonia composition to alkaline etching solution on alkaline etching production line:
the ammonia preparation tank is connected with the alkaline etching production line, and the solution added with the ammonia source in the ammonia preparation tank is conveyed to the etching production line according to the real-time requirement in the etching production process, so that the real-time supplement of the ammonia source in the alkaline etching solution is realized.
When connecting between each structure, all can set up valve and/or pumping to control opening and shutting down of solution transport between each structure, or the flow size that the adjustment passes through.
The utility model can also be used for supplementing ammonia component when preparing the alkaline etching regeneration sub-liquid after the alkaline etching waste liquid is used for taking copper.
Under the condition that the ammonia preparation tank is connected with the alkaline etching production line and a pump and/or a valve are arranged between the ammonia preparation tank and the alkaline etching production line, the pump and/or the valve can be arranged to automatically control the opening or closing or adjust the flow size of the solution passing through according to the detection result of a detection device on the alkaline etching production line so as to add the solution in the ammonia preparation tank.
In a preferred embodiment of the present invention, the ammonia preparation tank is provided with a temperature cold-heat exchanger to control the temperature of the ammonia preparation tank. Under the condition of heating, the volatilization of the solution in the ammonia preparation tank can be accelerated, and the purpose of accelerating concentration is achieved; in the case of refrigeration, the heat released in the process of dissolving the ammonia source in the solution can be rapidly cooled, so that the dissolving process of the ammonia source is accelerated, and the escaping waste is reduced.
The utility model can be provided with a stirring device in the ammonia preparation tank and/or the ammonia treatment tank. The stirring device can adopt any one of a liquid reflux stirring device, an impeller stirring device and a pneumatic stirring device or any combination thereof. The liquid reflux stirring device comprises a liquid outlet pipe, a pump or a combination of the pump and a valve, and a reflux pipe; the pneumatic stirring device is a device which can lead gas into the tank to make the liquid in the tank flow.
The stirring device is arranged in the ammonia preparation tank, so that the escape of evaporation gas is facilitated when the solution is concentrated, and a newly added ammonia source and other components are easily mixed when the solution is prepared again; the stirring device arranged in the ammonia treatment tank can help ammonia gas to smoothly escape.
As a preferred embodiment of the present invention, a condensation collector is provided to condense the gas generated from the solution in the ammonia preparation tank. The condensation collector is arranged, so that gas generated in the ammonia preparation tank in the preparation process is liquefied when contacting the condensation collector and is collected to obtain separated moisture. The setting modes which can be implemented comprise: is arranged in the ammonia preparation tank; the ammonia preparation tank is arranged outside the ammonia preparation tank and is connected with the ammonia preparation tank through a pipeline; the gas pumping device is arranged outside the ammonia preparation tank and connected with a gas pumping device, and the gas pumping device can pump and exhaust gas generated in the ammonia preparation tank.
Thus, as the gasification and condensation processes continue, the water content of the solution in the ammonia preparation tank continuously decreases, so that the solution is concentrated. Meanwhile, the separated water still contains a large amount of ammonia, and the ammonia can be removed by adding an alkaline substance into the separated water and/or heating the separated water. The ammonia gas removed from the separated water can be drained back to the solution in the ammonia preparation tank through the gas drainage device, so that the ammonia source is not reduced while the volume of the solution in the ammonia preparation tank is reduced, and ammonia water can be used as a supplementary ammonia source, and the problem that etching cannot be performed due to the fact that the concentration of other substances is reduced is solved.
Therefore, the utility model can be used for concentrating the alkaline etching solution when the ammonia content of the alkaline etching solution is too low in the etching process so as to add ammonia water to supplement an ammonia source; can be used for concentrating the alkaline etching waste liquid before the regeneration treatment; the method can also be used for concentrating the alkaline etching regeneration preparation solution obtained after the alkaline etching waste liquid is extracted with the metal copper so as to use ammonia water as an ammonia source to prepare the alkaline etching regeneration sub-liquid. In the production and use process of the alkaline etching solution or the regeneration and recycling process of the alkaline etching waste liquid, the ammonia preparation tank can be used for concentrating the alkaline etching solution and then supplementing and adjusting the alkaline etching solution with ammonia water, or after the ammonia preparation tank is used for concentrating the alkaline etching regeneration preparation solution, supplementing chloride salt and/or ammonia water and/or an additive to the alkaline etching regeneration preparation solution and then preparing the alkaline etching regeneration sub-solution again.
As a preferred embodiment, the main body of the condensation collector is arranged in the ammonia preparation tank, and the inlet and outlet pipelines of the refrigerant material of the condensation collector penetrate out of the ammonia preparation tank, so that the heat exchange process is carried out outside the ammonia preparation tank, and the condensation collector is also provided with a drainage pipe which is drained out of the ammonia preparation tank. The condensation collector is arranged in such a way, so that the cold-heat exchange process of the refrigeration working medium is carried out outside the ammonia preparation tank, and the separated moisture generated after condensation can be drained out of the ammonia preparation tank through the drainage tube.
The refrigerating source of the condensing collector can be a compression type refrigerating machine for realizing the refrigerating cycle by ammonia and fluorine working media so as to realize the control of the automatic operation process. The cooling system of ammonia and fluorine working medium can exchange heat with clear water to produce cold water working medium as a refrigerating source, the cold water working medium is connected with the main body of the condensation collector in the ammonia preparation tank through a pipeline and flows in the condensation collector, so that the condensation collector is cooled and then contacts with steam of the solution in the ammonia preparation tank to exchange heat, condensed water drops are obtained, and the water drops are drained out of the ammonia preparation tank through a drainage pipe. The method can be applied to the solution contained in the ammonia preparation tank to improve the safety when the solution has strong corrosivity.
Preferably, the condensation collector is further provided with a tail gas outlet, and the tail gas outlet is connected with a gas-liquid mixing device so as to mix the gas passing through the condensation collector into the solution in the ammonia preparation tank.
The utility model discloses can also adopt following mode to improve:
and arranging an etching solution regeneration preparation tank for preparing and storing alkaline etching regeneration sub-solution. The solution in the ammonia preparation tank can be transferred to the etching solution regeneration preparation tank after the ammonia content is adjusted, and then the alkaline etching regeneration sub-solution is prepared and stored, so that the ammonia preparation tank can continuously perform concentration work, and the production efficiency is improved.
As an optional embodiment, the etching solution regeneration preparation tank is provided with a stirring device and/or a temperature cold-heat exchanger.
The etching solution regeneration preparation tank can be connected with an ammonia preparation tank and/or an etching production line. When the etching solution regeneration preparation tank is used for storing alkaline etching regeneration sub-solution, and a pump and/or a valve are arranged between the etching solution regeneration preparation tank and the etching production line, the pump and/or the valve are/is automatically started or stopped according to the detection result of a detection device on the alkaline etching production line, or the flow rate of the etching solution passing through the detection device is adjusted.
In order to improve the production automation, the ammonia preparation tank and/or the ammonia treatment tank and/or the etching solution regeneration preparation tank can be internally provided with a detection device and/or an automatic detection feeding controller. The detection device arranged in the ammonia preparation tank can adopt any one or combination of a plurality of hydrometers, colorimeters, PH meters, oxidation-reduction potentiometers, liquid level meters and thermometers to realize the control of the ammonia source content in the ammonia preparation tank and/or automatically add and supplement other raw materials according to actual requirements to prepare new solution; the detection device arranged in the ammonia treatment tank can adopt any one or combination of a hydrometer, a PH meter, an oxidation-reduction potentiometer, a liquid level meter, a thermometer and an ammonia detection device for detecting liquid and/or gas; the detection device arranged in the etching solution regeneration preparation tank can adopt any one or combination of a hydrometer, a colorimeter, a PH meter, an oxidation-reduction potentiometer, a liquid level meter and a thermometer.
As another embodiment of the utility model, an alkaline etching regenerated liquid storage tank is arranged to store the prepared alkaline etching regenerated liquid. The alkaline etching regenerated sub-liquid storage tank can realize monitoring or automatic control only by arranging the liquid level meter, and the alkaline etching regenerated sub-liquid is stored more simply and more cost-effectively than the etching liquid regeneration preparation tank.
The alkaline etching regeneration sub-liquid storage tank is connected with an etching production line and/or an etching liquid regeneration preparation tank and/or an ammonia preparation tank. And under the condition that a pump and/or a valve are arranged between the alkaline etching regeneration sub-liquid storage tank and the etching production line, the pump and/or the valve automatically controls the on or off or adjusts the flow rate according to the detection result of a detection device on the alkaline etching production line so as to add the alkaline etching regeneration sub-liquid.
The alkaline etching regenerated sub-liquid storage tank can be provided with a stirring device and a temperature cold-heat exchanger, and the temperature cold-heat exchanger can enable the alkaline etching regenerated sub-liquid added to an etching production line to meet the temperature requirement of an etching process.
The etching solution regeneration preparation tank and the alkaline etching regeneration sub-solution storage tank can be respectively provided with a material inlet and a material outlet and/or an exhaust port.
As an embodiment of the utility model, set up ammonia tail gas treatment tower to be connected with ammonia preparation groove and/or etching solution regeneration preparation groove and/or alkaline etching regeneration subphase storage tank, with the tail gas that will contain the ammonia introduce ammonia tail gas treatment tower in handle, realize the purpose of environmental protection production.
Compared with the prior art, the utility model discloses following beneficial effect has:
1. the device of the utility model can avoid using liquid ammonia in the process of supplementing ammonia source for alkaline etching solution or regenerating alkaline etching waste liquid, thereby reducing the production cost; meanwhile, the use of liquid ammonia which is a major hazard source is avoided, so that safety production rules and regulations are implemented, and operating cost is saved.
2. The utility model discloses equipment gets copper at alkaline etching waste liquid and retrieves the processing of regeneration cyclic utilization this whole process to ammonia comparatively perfect, does not have waste water and waste gas to arrange outward, has stopped the ammonia nitrogen basically and has polluted, effectively realizes green production.
Drawings
The present invention will be further described with reference to the accompanying drawings.
FIG. 1 is a schematic structural diagram of the equipment in embodiment 1.
Fig. 2 is a schematic structural diagram of the device in embodiment 2.
Fig. 3 is a schematic structural diagram of the device in embodiment 3.
Fig. 4 is a schematic structural diagram of the device in embodiment 4.
FIG. 5 is a schematic diagram of the structure of the device in embodiment 5.
Fig. 6 is a schematic structural diagram of the device in embodiment 6.
Fig. 7 is a schematic structural diagram of the device in embodiment 7.
FIG. 8 is a schematic diagram of the structure of the device in embodiment 8.
Fig. 9 is a schematic structural diagram of the device in embodiment 9.
Reference numerals: 1-an ammonia preparation tank; 2-an ammonia treatment tank; 3-a gas drainage device; 4-a condensation collector; 5-a liquid suction port; 6-air suction port; 7-a liquid outlet; 8-etching a regeneration preparation tank; 9-alkaline etching regeneration sub-liquid storage tank; 10-material inlet and outlet; 11-exhaust gas outlet; 12-temperature cold heat exchanger; 13-a stirring device; 14-a detection device; 15-a refrigerating working medium material inlet and outlet pipe orifice; 16-drainage separation water outlet; 17-a heating source; 18-an exhaust port; 19-automatic detection feeding controller; 20-a refrigeration device; 21-alkaline etching line; 22-a liquid level meter; 23-an ammonia tail gas treatment tower; 24-a production line detection device; 25-a gas source; 26-a make-up stock storage tank; 27-air outlet; ^ turning to a valve; p-pump.
Detailed Description
The present invention will be further described with reference to the following specific examples.
Example 1
As shown in fig. 1, the basic embodiment of the present invention includes:
an ammonia preparation tank 1 for containing ammonia-containing water and/or inorganic ammonium salt solution or inorganic ammonium salt solid;
the ammonia treatment tank 2 is used for containing alkaline etching solution and/or alkaline etching waste liquid and/or alkaline etching regeneration preparation solution or preparing alkaline etching sub-solution;
the gas drainage device 3 is a centrifugal fan and comprises a gas suction port 6 and a gas outlet 27, the gas suction port 6 is connected with a gas pumping device positioned above the ammonia treatment tank 2, and the gas outlet 27 extends into the ammonia preparation tank 1 through a pipeline and is used for draining gas generated by the ammonia treatment tank 2 into the ammonia treatment tank 1.
Example 2
As shown in fig. 2, an embodiment of adjusting the ammonia content in real time for the alkaline etching solution according to the present invention includes:
the ammonia is prepared groove 1, ammonia processing tank 2 and gas drainage device 3, wherein:
the ammonia preparation tank 1 is provided with a stirring device 13, a detection device 14 and an exhaust port 18, and the stirring device 13 adopts an impeller stirring device.
The ammonia preparation tank 1 is provided with a material inlet and outlet 10 and is connected with an alkaline etching production line 21, the alkaline etching production line 21 is provided with a production line detection device 24, and the ammonia preparation tank 1 and the alkaline etching production line 21 are provided with pumps which can be started, stopped or adjusted according to the detection result of the production line detection device 24.
The ammonia preparation tank 1 is connected with a liquid outlet 7 of the gas drainage device 3, the gas drainage device 3 is a water solution vacuum jet device, a liquid suction port 5 of the gas drainage device 3 is connected with the ammonia preparation tank 1, a pump is arranged between the liquid suction port and the ammonia preparation tank 1, so that the solution can be sucked from the ammonia preparation tank 1, a gas suction port 6 of the gas drainage device 3 is connected with a gas exhaust port 18 of the ammonia treatment tank 2, so that ammonia gas generated in the ammonia treatment tank 2 is sucked, and therefore, the gas drainage device 3 effectively mixes the ammonia gas generated in the ammonia treatment tank 2 with the solution in the ammonia preparation tank 1 in a vacuum jet mode, and then enters the ammonia preparation tank 1 to complete ammonia source supplement of the solution in the ammonia preparation tank 1.
The ammonia treatment tank 2 is provided with two material inlet/outlet ports 10 for feeding and discharging the raw materials, a stirring device 13, a detecting device 14, and a heating source 17. The stirring device 13 adopts an impeller stirring device; the heating source 17 heats the ammonia treatment tank 2 by radiation heating to promote the escape of ammonia gas from the ammonia treatment tank 2, and sends the ammonia gas to the gas guiding device 3 through the exhaust port 18.
Example 3
As shown in FIG. 3, an embodiment of the present invention for pretreating an alkaline waste etching solution comprises:
the difference between the ammonia preparation tank 1, the ammonia treatment tank 2 and the gas diversion device 3 in the embodiment 1 is that:
a condensation collector 4 is arranged and is a compression type refrigerator; a suction port 6 of the condensation collector 4, and the suction port 6 can allow the vapor generated in the ammonia formulating tank 1 to enter the condensation collector 4.
In this way, when the alkaline waste etching solution is concentrated by the device, the solution in the ammonia preparation tank 1 is gasified to generate steam, and the steam is condensed and collected by the condensation collector 4, so that the concentration effect is achieved.
Example 4
As shown in fig. 4, an embodiment of supplementing ammonia source for the alkaline etching regeneration preparation solution obtained after copper is taken from the alkaline etching waste liquid according to the present invention includes:
the ammonia is prepared groove 1, ammonia processing tank 2 and gas drainage device 3, wherein:
the ammonia preparation tank 1 is provided with a feed/discharge port 10, a temperature heat exchanger 12, a stirring device 13, and a detection device 14. The stirring device 13 adopts a liquid reflux stirring device;
the ammonia treatment tank 2 is provided with two, and the gas introducing device 3 is correspondingly provided with two.
The ammonia preparation tank 1 is connected with a liquid outlet 7 of the gas drainage device 3, the gas drainage device 3 is a water solution vacuum jet device and a pipeline spraying type gas-liquid mixing device, a liquid suction port 5 of the gas drainage device 3 is connected with the ammonia preparation tank 1, a pump is arranged between the gas drainage device and the ammonia preparation tank 1, so that the solution can be sucked from the ammonia preparation tank 1, a gas suction port 6 of the gas drainage device 3 is connected with a gas exhaust port 18 of the ammonia treatment tank 2, so that the ammonia gas generated in the ammonia treatment tank 2 is sucked, and therefore, the gas drainage device 3 effectively mixes the ammonia gas generated in the ammonia treatment tank 2 with the solution in the ammonia preparation tank 1 in a vacuum jet or pipeline spraying mode and then enters the ammonia preparation tank 1, and the ammonia source supplement of the solution in the ammonia preparation tank 1 is completed.
The two ammonia processing tanks 2 are respectively provided with a stirring device 13 and a detection device 14, and the stirring device 13 is a pneumatic stirring device and comprises a gas source 25 for stirring the solution in the ammonia processing tanks 2; the inlet/outlet 10 of the ammonia processing tank 2 is connected to a supplement storage tank 26, and a pump is provided between them, and an automatic detection charging controller 19 is provided so that the pump can be turned on or off according to the detection result of the detection device 14. One of the ammonia treatment tanks 2 is provided with a heating source 17 and heated by liquid bath heating.
A condensation collector 4 is respectively arranged between the ammonia preparation tank 1 and the two ammonia processing tanks 2, one end of the condensation collector 4 is connected with a tail gas outlet 11 of the ammonia preparation tank 1, and the other end is connected with a feed inlet 10 of the ammonia processing tank 2. The condensation collector 4 takes tap water as a refrigeration working medium, is connected with a tap water source and is used for condensing steam generated by the ammonia preparation tank 1 outside the ammonia preparation tank 1, and liquid generated after condensation enters the ammonia treatment tank 2.
Two etching regeneration preparation tanks 8 are arranged, wherein one etching regeneration preparation tank 8 is provided with a temperature cold-heat exchanger 12 and a stirring device 13, the stirring device 13 is a liquid reflux stirring device, and the etching regeneration preparation tank 8 is connected with the ammonia preparation tank 1 through a pipeline with a pump and a valve; the other etching regeneration preparation tank 8 is also provided with a stirring device 13, the stirring device 13 is a liquid reflux stirring device, the etching regeneration preparation tank 8 is connected with two alkaline etching regeneration sub-liquid storage tanks 9 through pipelines with pumps and valves, so that the prepared alkaline etching regeneration sub-liquid is transferred into the alkaline etching regeneration sub-liquid storage tanks 9, and the etching regeneration preparation tank 8 is further connected with the ammonia preparation tank 1 through a pipeline with a pump and a valve.
Example 5
As shown in fig. 5, an embodiment of supplementing ammonia source for the alkaline etching regeneration preparation solution obtained after copper is taken from the alkaline etching waste liquid according to the present invention includes:
the ammonia is prepared groove 1, ammonia processing tank 2 and gas drainage device 3, wherein:
the ammonia preparation tank 1 is provided with a condensation collector 4, a discharge port 10, a tail gas discharge port 11 and a detection device 14, the main body of the condensation collector 4 is arranged in the ammonia preparation tank 1, a refrigerating working medium material discharge port 15 of the condensation collector penetrates out of the ammonia preparation tank 1 to form a circulation loop, so that steam generated by the ammonia preparation tank 1 is led out of the ammonia preparation tank 1, heat exchange is carried out through a refrigerating device 20, the steam flows back to the collection device, and liquid generated after condensation is led into the ammonia treatment tank 2 through a drainage separation water outlet 16 connected with the discharge port 10 of the ammonia treatment tank 2. The refrigerating device 20 is a compression type refrigerator, and the refrigerating working medium material is a cold water working medium produced after the refrigerating system performs heat exchange.
The ammonia preparation tank 1 is connected with a liquid outlet 7 of the gas drainage device 3, the gas drainage device 3 is a water solution vacuum jet device, a liquid suction port 5 of the gas drainage device 3 is connected with the ammonia preparation tank 1, a pump is arranged between the liquid suction port and the ammonia preparation tank 1, so that the solution can be sucked from the ammonia preparation tank 1, a suction port 6 of the gas drainage device 3 is respectively connected with two exhaust ports 18 of the ammonia treatment tank 2, so that ammonia gas generated in the ammonia treatment tank 2 is sucked, therefore, the gas drainage device 3 effectively mixes the ammonia gas generated in the ammonia treatment tank 2 with the solution in the ammonia preparation tank 1 in a vacuum jet mode, and then enters the ammonia preparation tank 1 to complete ammonia source supplement of the solution in the ammonia preparation tank 1.
The ammonia treatment tank 2 is provided with a stirring device 13, a detection device 14 and a heating source 17, and the ammonia treatment tank 2 is used for treating the liquid condensed and collected by the condensation collector 4 so as to escape ammonia gas; the heating source 17 adopts radiation type heating, and the stirring device 13 is an impeller stirring device.
An etching regeneration preparation tank 8 is arranged and connected with the ammonia preparation tank 1, and a pump is arranged between the etching regeneration preparation tank and the ammonia preparation tank; the etching regeneration preparation tank 8 is provided with an exhaust gas discharge port 11 and a detection device 14.
An alkaline etching regeneration sub-liquid storage tank 9 is arranged and connected with an etching regeneration preparation tank 8, and a pump and a valve are arranged between the alkaline etching regeneration sub-liquid storage tank and the etching regeneration preparation tank; the alkaline etching regeneration sub-liquid storage tank 9 is provided with a tail gas discharge port 11 and a liquid level meter 22.
The alkaline etching regeneration sub-liquid storage tank 9 is connected with the alkaline etching production line 21, and a pump and a valve are arranged between the alkaline etching regeneration sub-liquid storage tank and the alkaline etching production line.
Example 6
As shown in fig. 6, an embodiment of supplementing ammonia source for the alkaline etching regeneration preparation solution obtained after copper is taken from the alkaline etching waste liquid according to the present invention includes:
the ammonia is prepared groove 1, ammonia processing tank 2 and gas drainage device 3, wherein:
the ammonia preparation tank 1 is provided with a condensation collector 4, a discharge port 10, a tail gas discharge port 11 and a detection device 14, the main body of the condensation collector 4 is arranged in the ammonia preparation tank 1, a refrigerating working medium material discharge port 15 of the condensation collector penetrates out of the ammonia preparation tank 1 to form a circulation loop, so that steam generated by the ammonia preparation tank 1 is led out of the ammonia preparation tank 1, heat exchange is carried out through a refrigerating device 20, the steam flows back to the collection device, and liquid generated after condensation is led into the ammonia treatment tank 2 through a drainage separation water outlet 16 connected with the discharge port 10 of the ammonia treatment tank 2. The refrigerating device 20 is a compression type refrigerator, and the refrigerating working medium material is a cold water working medium produced after the refrigerating system performs heat exchange; the tail gas outlet 11 is connected with an ammonia tail gas treatment tower 23.
The ammonia preparation tank 1 is connected with a liquid outlet 7 of the gas drainage device 3, the gas drainage device 3 is a water solution vacuum jet device, a liquid suction port 5 of the gas drainage device 3 is connected with the ammonia preparation tank 1, a pump is arranged between the liquid suction port and the ammonia preparation tank 1, so that the solution can be sucked from the ammonia preparation tank 1, a gas suction port 6 of the gas drainage device 3 is connected with a gas exhaust port 18 of the ammonia treatment tank 2, so that ammonia gas generated in the ammonia treatment tank 2 is sucked, and therefore, the gas drainage device 3 effectively mixes the ammonia gas generated in the ammonia treatment tank 2 with the solution in the ammonia preparation tank 1 in a vacuum jet mode, and then enters the ammonia preparation tank 1 to complete ammonia source supplement of the solution in the ammonia preparation tank 1.
The ammonia processing tank 2 is provided with a material inlet and outlet 10, a stirring device 13, a detection device 14 and a heating source 17, and the ammonia processing tank 2 can process the liquid condensed and collected by the condensation collector 4 so as to escape ammonia gas; the heating source 17 adopts an electric heating type dip rod for heating, and the stirring device 13 is a liquid reflux stirring device.
An etching regeneration preparation tank 8 is arranged and connected with the ammonia preparation tank 1, and a pump is arranged between the etching regeneration preparation tank and the ammonia preparation tank; the etching regeneration preparation tank 8 is provided with a feed/discharge port 10, an exhaust gas discharge port 11, and a detection device 14. The inlet/outlet 10 is connected to a replenishing tank 26, and a pump is provided between the two, and an automatic detection and charging controller 19 is provided so that the pump can be turned on or off according to the detection result of the detection device 14. The tail gas outlet 11 is connected with an ammonia tail gas treatment tower 23.
The etching regeneration preparation tank 8 is simultaneously connected with the alkaline etching production line 21, and a pump and a valve are arranged between the etching regeneration preparation tank and the alkaline etching production line 21, and the pump and the valve can be started, shut down or adjust the flow rate according to the detection result of a production line detection device 24 arranged on the alkaline etching production line 21.
Example 7
As shown in fig. 7, an embodiment of supplementing ammonia source for the alkaline etching regeneration preparation solution obtained after copper is extracted from the alkaline etching waste liquid according to the present invention includes:
the ammonia is prepared groove 1, ammonia processing tank 2 and gas drainage device 3, wherein:
the ammonia preparation tank 1 is provided with a condensation collector 4, a discharge port 10 and a temperature heat exchanger 12, the main body of the condensation collector 4 is arranged in the ammonia preparation tank 1, and a refrigerating working medium material inlet and outlet pipe orifice 15 of the condensation collector penetrates out of the ammonia preparation tank 1 to form a circulation loop, so that steam generated by the ammonia preparation tank 1 is led out of the ammonia preparation tank 1, and flows back to a collecting device after heat exchange is carried out through a refrigerating device 20, and liquid generated after condensation is led into the ammonia treatment tank 2 through a drainage separation water outlet 16 connected with the discharge port 10 of the ammonia treatment tank 2. The refrigerating device 20 is a compression type refrigerator, and the refrigerating working medium material is a cold water working medium produced after the refrigerating system performs heat exchange; one of the material inlet and outlet ports 10 is connected with a supplement storage tank 26, a pump is arranged between the material inlet and outlet ports, and an automatic detection feeding controller 19 is arranged between the material inlet and outlet ports, so that the pump can be controlled to be started or stopped according to actual requirements, and the addition of the supplement is controlled. The temperature cold heat exchanger 12 adopts a liquid heat transfer medium pipeline immersed temperature heat exchanger.
The ammonia preparation tank 1 is connected with a liquid outlet 7 of the gas drainage device 3, the gas drainage device 3 is a water solution vacuum jet device, a liquid suction port 5 of the gas drainage device 3 is connected with the ammonia preparation tank 1, a pump is arranged between the liquid suction port and the ammonia preparation tank 1, so that the solution can be sucked from the ammonia preparation tank 1, a gas suction port 6 of the gas drainage device 3 is connected with a gas exhaust port 18 of the ammonia treatment tank 2, so that ammonia gas generated in the ammonia treatment tank 2 is sucked, and therefore, the gas drainage device 3 effectively mixes the ammonia gas generated in the ammonia treatment tank 2 with the solution in the ammonia preparation tank 1 in a vacuum jet mode, and then enters the ammonia preparation tank 1 to complete ammonia source supplement of the solution in the ammonia preparation tank 1.
The ammonia processing tank 2 is provided with a material inlet and outlet 10, a stirring device 13, a detection device 14 and a heating source 17; the heating source 17 adopts a liquid heat transfer medium pipeline immersion type temperature heat exchanger, and the stirring device 13 is an impeller stirring device.
An alkaline etching regeneration sub-liquid storage tank 9 is arranged and connected with the ammonia preparation tank 1, and a pump is arranged between the alkaline etching regeneration sub-liquid storage tank and the ammonia preparation tank; the alkaline etching regeneration sub-liquid storage tank 9 is provided with an exhaust gas outlet 11 and a temperature cold-heat exchanger 12. The temperature cold heat exchanger 12 adopts a liquid heat transfer medium pipeline immersed temperature heat exchanger, and the stirring device 13 is an impeller stirring device; the tail gas outlet 11 is connected with an ammonia tail gas treatment tower 23.
The alkaline etching regeneration sub-liquid storage tank 9 is simultaneously connected with the alkaline etching production line 21, and a pump is arranged between the alkaline etching regeneration sub-liquid storage tank and the alkaline etching production line 21, and the pump can be started or stopped or can adjust the flow rate according to the detection result of a production line detection device 24 arranged on the alkaline etching production line 21.
Example 8
As shown in fig. 8, an embodiment of the device of the present invention connected to an alkaline etching line for processing alkaline etching solution comprises:
the ammonia is prepared groove 1, ammonia processing tank 2 and two gas drainage device 3, wherein:
the ammonia preparation tank 1 is provided with a condensation collector 4, a feed and discharge port 10, a detection device 14 and an exhaust port 18, the condensation collector 4 is a compression type refrigerator, an air suction port 6 of the condensation collector is connected with the ammonia preparation tank 1, and a liquid outlet 7 of the condensation collector is connected with the feed and discharge port 10 of the ammonia treatment tank 2, so that steam generated by the ammonia preparation tank 1 is led out of the ammonia preparation tank 1, and flows into the ammonia treatment tank 2 after heat exchange. One of the material inlet and outlet ports 10 is connected to a supplement storage tank 26, a pump is provided between the two, and an automatic detection feeding controller 19 is provided to control the pump to be turned on or off according to the detection result of the detection device 14, thereby controlling the addition of the supplement.
The ammonia preparation tank 1 is connected with a liquid outlet 7 of the gas drainage device 3, the gas drainage device 3 is a water solution vacuum jet device, a liquid suction port 5 of the gas drainage device 3 is connected with the ammonia preparation tank 1, and a pump is arranged between the two devices, so that the solution can be sucked from the ammonia preparation tank 1; the air suction port 6 of one of the gas drainage devices 3 is connected with the air exhaust port 18 of the ammonia treatment tank 2 so as to suck the ammonia gas generated in the ammonia treatment tank 2, and thus, the gas drainage device 3 effectively mixes the ammonia gas generated in the ammonia treatment tank 2 with the solution in the ammonia preparation tank 1 in a vacuum jet manner and then enters the ammonia preparation tank 1 to complete the ammonia source supplement of the solution in the ammonia preparation tank 1; the air suction port 6 of the other gas drainage device 3 and the tail gas discharge port 11 of the condensation collector 4 ensure that after steam generated by the solution in the ammonia preparation tank 1 is condensed, the rest part of ammonia gas can be mixed with the solution through the gas drainage device 3 and then flows back to the ammonia preparation tank 1 again.
The ammonia processing tank 2 is provided with a material inlet and outlet 10, a stirring device 13, a detection device 14 and a heating source 17; the heating source 17 is a dry heat conduction heating, and the stirring device 13 includes an impeller stirring device and a pneumatic stirring device, and the pneumatic stirring device includes a gas source 25.
The ammonia preparation tank 1 is connected to the alkaline etching line 21 through a pipe with a pump and a valve.
Example 9
As shown in fig. 9, an embodiment of the present invention for preparing alkaline etchant after extracting copper from alkaline etching waste solution includes:
the ammonia is prepared groove 1, ammonia processing tank 2 and gas drainage device 3, wherein:
the ammonia preparation tank 1 is provided with a feed/discharge port 10, a stirring device 13, a detection device 14, and an exhaust port 18, and the stirring device 13 is an impeller stirring device.
The ammonia preparation tank 1 is connected with a liquid outlet 7 of the gas drainage device 3, the gas drainage device 3 is a water solution vacuum jet device, a liquid suction port 5 of the gas drainage device 3 is connected with the ammonia preparation tank 1, a pump is arranged between the liquid suction port and the ammonia preparation tank 1, so that the solution can be sucked from the ammonia preparation tank 1, a gas suction port 6 of the gas drainage device 3 is connected with a gas exhaust port 18 of the ammonia treatment tank 2, so that ammonia gas generated in the ammonia treatment tank 2 is sucked, and therefore, the gas drainage device 3 effectively mixes the ammonia gas generated in the ammonia treatment tank 2 with the solution in the ammonia preparation tank 1 in a vacuum jet mode, and then enters the ammonia preparation tank 1 to complete ammonia source supplement of the solution in the ammonia preparation tank 1.
The ammonia treatment tank 2 is used for treating ammonium chloride or ammonium chloride solution obtained in the process of taking copper from residual liquid and/or waste liquid obtained after copper taking directly or after inorganic alkali is added to adjust the pH value so as to enable ammonia gas to escape; the device is provided with a material inlet and outlet 10, a stirring device 13, a detection device 14 and a heating source 17; the heating source 17 adopts radiation type heating, and the stirring device 13 is an impeller stirring device.
It should be noted that the above-mentioned embodiments are only illustrative and not restrictive, and any modifications or changes within the meaning and range of equivalents of the technical solution of the present invention by those skilled in the art should be considered as included in the protection scope of the present invention.
Claims (10)
1. A liquid-free ammonia treatment device for a circuit board alkaline etching solution is characterized by comprising:
an ammonia treatment tank for holding an ammonia-containing water and/or an inorganic ammonium salt solution, or for holding an inorganic ammonium salt solid;
at least one ammonia preparation tank, wherein the ammonia preparation tank is used for containing alkaline etching solution and/or alkaline etching waste solution and/or alkaline etching regeneration preparation solution or is used for preparing alkaline etching sub-solution;
and the gas drainage device is used for draining gas from the ammonia treatment tank to the ammonia preparation tank.
2. The apparatus as claimed in claim 1, wherein the ammonia treatment tank is provided with a heating source for heating the ammonia treatment tank.
3. The device for treating alkaline etching solution for circuit boards as claimed in claim 1, wherein the ammonia preparation tank is connected to an alkaline etching line.
4. The device for treating alkaline etching solution for circuit boards as claimed in claim 1, wherein the ammonia preparation tank is provided with a temperature cold-heat exchanger to control the temperature of the ammonia preparation tank.
5. A device for treating alkaline etching solution for circuit boards according to any one of claims 1 to 4 without using liquid ammonia, characterized in that a condensation collector is provided to condense the gas generated from the solution in the ammonia preparation tank.
6. The device for treating alkaline etching solution for circuit boards as claimed in claim 5, wherein the condensation collector is arranged in combination with one or more of the following ways:
is arranged in the ammonia preparation tank; or
The ammonia preparation tank is arranged outside the ammonia preparation tank and is connected with the ammonia preparation tank through a pipeline; or
The gas pumping device is arranged outside the ammonia preparation tank and connected with a gas pumping device, and the gas pumping device can pump and exhaust gas generated in the ammonia preparation tank.
7. The device for treating no-liquid ammonia in alkaline etching solution for circuit boards as claimed in claim 5, wherein the main body of the condensation collector is disposed in the ammonia preparation tank, and the inlet and outlet pipes for the refrigerant material pass through the outside of the ammonia preparation tank, so as to perform heat exchange process outside the ammonia preparation tank, and the condensation collector is further provided with a drainage pipe leading to the outside of the ammonia preparation tank.
8. The device for treating alkaline etching solution for circuit boards according to claim 1 without using liquid ammonia, wherein an etching solution regeneration preparation tank is provided for preparing and storing an alkaline etching regeneration sub-solution.
9. The device for treating alkaline etching solution for circuit boards according to claim 1 without liquid ammonia, wherein an alkaline etching regeneration sub-solution storage tank is provided to store the prepared alkaline etching regeneration sub-solution.
10. The device for treating the non-liquid ammonia in the alkaline etching solution for the circuit boards according to any one of claims 1, 8 and 9, wherein an ammonia tail gas treatment tower is arranged and connected with an ammonia preparation tank and/or an etching solution regeneration preparation tank and/or an alkaline etching regeneration sub-solution storage tank so as to introduce ammonia-containing tail gas into the ammonia tail gas treatment tower for treatment.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2019107761434 | 2019-08-21 | ||
| CN201910776143 | 2019-08-21 | ||
| CN2019108398683 | 2019-09-05 | ||
| CN201910839868 | 2019-09-05 | ||
| CN201910965521 | 2019-10-10 | ||
| CN2019109655213 | 2019-10-10 |
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| CN213447306U true CN213447306U (en) | 2021-06-15 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113716586A (en) * | 2021-09-15 | 2021-11-30 | 广东德同环保科技有限公司 | Method and device for producing ammonia gas by thermally decomposing ammonia-containing compound |
| CN118019232A (en) * | 2024-04-09 | 2024-05-10 | 广州市巨龙印制板设备有限公司 | Circuit board two-fluid spraying device with recycling and atomizing functions |
-
2020
- 2020-08-21 CN CN202021763996.9U patent/CN213447306U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113716586A (en) * | 2021-09-15 | 2021-11-30 | 广东德同环保科技有限公司 | Method and device for producing ammonia gas by thermally decomposing ammonia-containing compound |
| CN118019232A (en) * | 2024-04-09 | 2024-05-10 | 广州市巨龙印制板设备有限公司 | Circuit board two-fluid spraying device with recycling and atomizing functions |
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