CN213388894U

CN213388894U - Workpiece pretreatment equipment

Info

Publication number: CN213388894U
Application number: CN202020989030.0U
Authority: CN
Inventors: 郭馨; 江锐; 王倩; 周翊; 赵江山; 王宇
Original assignee: Institute of Microelectronics of CAS
Current assignee: Institute of Microelectronics of CAS
Priority date: 2020-05-06
Filing date: 2020-06-02
Publication date: 2021-06-08
Anticipated expiration: 2030-06-02

Abstract

The utility model discloses a work piece pre treatment facility relates to laser instrument technical field to solve among the prior art work piece passivation and use the easy more stable carbon oxidation superficial layer that generates of gaseous phase passivation, influence the problem of the performance of laser instrument. The workpiece preprocessing apparatus includes: a passivation solution container; a sample container disconnectable from the passivation solution container; a cleaning liquid supply device disconnectable from the sample container; an inert gas supply disconnectable from the sample container.

Description

Workpiece pretreatment equipment

Technical Field

The utility model relates to the field of photoelectric technology, especially, relate to a work piece pre treatment device.

Background

The laser has important application value in the fields of semiconductors, liquid crystal panel display, solar photovoltaics, automobile manufacturing, medical treatment, scientific research, national defense and the like.

However, the working medium of the laser contains a strongly corrosive halogen medium, and reacts with elements such as Si, C, H, O and the like on the surface and inside of the discharge chamber part to generate harmful gaseous products, which affect the performance of the laser, so that ultrasonic cleaning, drying and passivation treatment are required to be performed on each part in the discharge chamber. However, even if ultrasonic cleaning is carried out for a plurality of times, the carbon oxidation reaction layer on the surface of the part cannot be completely removed, and the surface of the part is inevitably subjected to carbon oxidation reaction again because the part is exposed to the atmosphere during drying, assembling and the like and the intermediate transfer process of the part during cleaning. The surface layer of each part after passivation treatment will be composed of halide and oxycarbide together.

Therefore, a stable carbon oxidation surface layer is generated before passivation, the discharge cavity part may still contain a large amount of harmful elements after gas passivation, and harmful gas is slowly generated in the operation process of the laser to influence the output performance of the laser; and in the passivation process, halogen gas with higher concentration needs to be filled and pumped out from the discharge cavity for many times, so that the problems of environmental pollution and certain danger to operators are easily caused.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a work piece pre treatment facility for use liquid phase passivation medium to realize wasing, drying, passivation process to the work piece in sealed environment, avoid the more stable formation on carbon oxidation surface layer among the prior art, influence the performance of laser instrument.

In order to achieve the above object, the present invention provides a workpiece preprocessing apparatus, comprising:

a passivation solution container for containing a passivation solution for passivating the workpiece;

the sample container is disconnected with the passivation solution container and used for containing a workpiece and passivating the workpiece by using passivation solution provided by the passivation solution container;

a cleaning liquid supply device disconnectable from the sample container, for supplying a cleaning liquid to the sample container, the sample container being further used for cleaning the passivated workpiece with the cleaning liquid;

an inert gas supply means disconnectable from said sample container for supplying an inert gas to said sample container;

the sample container is also used for dehumidifying the cleaned workpiece under the protection of the inert gas.

Compared with the prior art, the utility model provides a pair of among the preprocessing equipment, utilize liquid phase passivation medium to replace original washing and gaseous passivation process, realize once only washing and the passivation to the material, through adding inert gas in to the sample container, make after wasing the work piece is in and carries out drying and dehumidification operation in the environment of isolated air, has avoided the problem that original technology easily generates stable state oxycarbide, is difficult to get rid of fast. And the utility model discloses a pretreatment equipment carries out pretreatment process in the seal equipment, has reduced gaseous passivation and has caused environmental pollution and to operating personnel's danger.

The utility model also provides a work piece preliminary treatment method, include:

controlling a passivation solution container to provide passivation solution for the sample container, so that the sample container passivates the workpiece by the passivation solution provided by the passivation solution container;

controlling a cleaning liquid supply device to supply a cleaning liquid to the sample container, so that the sample container cleans the passivated workpiece by using the cleaning liquid;

and controlling an inert gas supply device to supply inert gas to the sample container, so that the sample container dehumidifies the cleaned workpiece under the protection of the inert gas.

Compared with the prior art, the utility model provides a workpiece pretreatment method's beneficial effect and above-mentioned technical scheme pretreatment equipment's beneficial effect is the same, and the here is not repeated.

The utility model also provides a terminal equipment, include:

the processor is used for running a computer program to realize the workpiece preprocessing method in the technical scheme.

Compared with the prior art, the utility model provides a terminal equipment's beneficial effect and above-mentioned technical scheme preprocessing equipment's beneficial effect is the same, and the here is not repeated.

The utility model also provides a work piece pretreatment systems, include:

the workpiece pretreatment equipment of the technical scheme is provided;

and the terminal equipment in the technical scheme.

The utility model also provides a computer storage medium, the storage has the instruction in the computer storage medium, works as when the instruction is operated, realizes above-mentioned technical scheme work piece preprocessing method.

Compared with the prior art, the utility model provides a computer storage medium's beneficial effect and above-mentioned technical scheme preprocessing equipment's beneficial effect is the same, and the here is not repeated.

Drawings

The accompanying drawings, which are described herein, serve to provide a further understanding of the invention and constitute a part of this specification, and the exemplary embodiments and descriptions thereof are provided for explaining the invention without unduly limiting it. In the drawings:

fig. 1 is a block diagram of a workpiece preprocessing system according to an embodiment of the present invention;

fig. 2 is a schematic structural diagram of a workpiece pretreatment apparatus according to an embodiment of the present invention;

fig. 3 is a main flow chart of a workpiece preprocessing method according to an embodiment of the present invention;

fig. 4 is a first flowchart illustrating a first process of a workpiece preprocessing method according to an embodiment of the present invention;

FIG. 5 is a second flowchart illustrating a second exemplary embodiment of a workpiece preprocessing method according to the present invention;

fig. 6 is a block diagram illustrating a detailed process of a workpiece preprocessing method according to an embodiment of the present invention;

fig. 7 is a schematic structural diagram ii of a workpiece pretreatment apparatus according to an embodiment of the present invention;

fig. 8 is a schematic diagram of a hardware structure of a terminal device according to an embodiment of the present invention;

fig. 9 is a schematic structural diagram of a chip according to an embodiment of the present invention;

reference numerals:

1-cover 2-workpiece

3-sample container 4-passivating solution container

5-liquid level detection device 6-sixth valve

7-passivating liquid supplementing device 8-component detection device

9-fifth valve 10-cleaning liquid supply device

11-passivation solution inflow pump 12-workpiece pretreatment equipment controller

13-first valve 14-air drying device

15-corrosion resistance detection device 16-recording apparatus

17-second valve 18-third valve

19-inert gas supply device 20-drying device

21-fourth valve 22-waste liquid collection device.

Detailed Description

For the convenience of clearly describing the technical solution of the embodiment of the present invention, in the embodiment of the present invention, the words "first", "second", etc. are adopted to distinguish the same items or similar items with basically the same functions and actions. For example, the first threshold and the second threshold are only used for distinguishing different thresholds, and the sequence order of the thresholds is not limited. Those skilled in the art will appreciate that the terms "first," "second," etc. do not denote any order or quantity, nor do the terms "first," "second," etc. denote any order or importance.

It is to be understood that the terms "exemplary" or "such as" are used herein to mean serving as an example, instance, or illustration. Any embodiment or design described herein as "exemplary" or "e.g.," is not necessarily to be construed as preferred or advantageous over other embodiments or designs. Rather, use of the word "exemplary" or "such as" is intended to present concepts related in a concrete fashion.

In the present invention, "at least one" means one or more, "a plurality" means two or more. "and/or" describes the association relationship of the associated objects, meaning that there may be three relationships, e.g., a and/or B, which may mean: a exists alone, A and B exist simultaneously, and B exists alone, wherein A and B can be singular or plural. The character "/" generally indicates that the former and latter associated objects are in an "or" relationship. "at least one of the following" or similar expressions refer to any combination of these items, including any combination of the singular or plural items. For example, at least one (one) of a, b, or c, may represent: a, b, c, a and b combination, a and c combination, b and c combination, or a, b and c combination, wherein a, b and c can be single or multiple.

Before describing the embodiments of the present invention, the following explanations will be made to related terms related to the embodiments of the present invention:

passivation refers to a process of oxidizing metal by a strong oxidant or an electrochemical method to change the surface into an inactive state, i.e., a passive state, and is a method of converting the metal surface into a state which is not easily oxidized to retard the corrosion rate of the metal.

An excimer laser is a gas laser device which uses an excimer as a working substance. Excitation is usually achieved with a relativistic electron beam (energy greater than 200 kev) or with a transverse fast pulsed discharge. When the unstable molecular bonds of the excited excimer molecules are broken and dissociated into ground state atoms, the energy of the excited state is discharged in the form of laser radiation.

The excimer laser has short laser wavelength and no thermal effect on the material, so that the excimer laser has wide application in the industrial processing field. Particularly in the high-end lithography field, an excimer laser having the characteristics of high repetition frequency, narrow line width and large energy has become an absolutely dominant light source in the semiconductor lithography field at present. Currently, the mainstream excimer lasers in commercial use are 193nm ArF excimer laser and 248nm KrF excimer laser. The working gas of the two lasers contains halogen gas F with a certain proportion of about 0.1 percent₂，F₂The chemical property is very active, has strong oxidizability, and can react with almost all organic and inorganic substances except the perfluorinated compounds. The inner wall of the discharge cavity of the excimer laser is contacted with the working gas, the impurities contained in the metal material of the discharge cavity are mainly C, Si, and the residual impurity gas is mainly O when the discharge cavity is assembled₂、H₂O, etc. will be equal to F₂Reaction to result in F₂Consumption when F₂When the content of (b) is lower than the normal content, the output performance of the excimer laser deteriorates, and even the excimer laser cannot operate normally. Therefore, in order to reduce the introduction of harmful components and reduce the degree of corrosion reaction in the operation process of the excimer laser, each part in the discharge chamber needs to be subjected to ultrasonic cleaning, drying and passivation treatment.

The ultrasonic cleaning treatment is to make the dirt layer dispersed, emulsified and stripped by utilizing the direct and indirect action of the cavitation action, acceleration action and direct/current action of ultrasonic waves in liquid to the liquid and the dirt, thereby achieving the purpose of removing the attachments and the carbon oxidation reaction layer on the surface of the part; the drying treatment is to thoroughly remove the water on the surface and inside of the parts; the passivation treatment after assembly is an important process step before the operation of an excimer laser discharge cavity, and is to introduce a certain proportion of rare gas and halogen gas into the discharge cavity and assist the discharge with a certain frequency, so that surface pollutants and surface hazardous elements of the component are fully reacted with a halogen medium, vaporized and escaped, and a stable halide protective layer is generated on the surface of the component.

However, even if ultrasonic cleaning is carried out for a plurality of times, the carbon oxidation reaction layer on the surface of the part cannot be completely removed, and the surface of the part is inevitably subjected to carbon oxidation reaction again when the part is cleaned and exposed to the atmosphere during drying, assembling and the like and the intermediate transfer process. Research shows that the metal material directly contacts the halogen medium to generate a halogenation reaction layer which is basically stable after being exposed in the atmosphere, but if a carbon oxidation reaction layer exists on the surface of materials such as Al, Cu and the like and then enters the environment of the halogen medium, the carbon oxide inhibits the progress of the halogenation reaction, and the surface layer of each part after passivation treatment is composed of halide and carbon oxide (possibly one or more compounds, possibly a compound with the coexistence of carbon, hydrogen, oxygen and halogen). Under the condition, the surface layer of each part can still slowly react with the halogen medium in the laser operation process, further consume the halogen medium and generate harmful gas.

Meanwhile, the passivation process is carried out in the discharge chamber, the passivation process is influenced by the content and the existence form of hazardous elements of the material, the surface structure of the part, the environment of the discharge chamber and other multiple factors, and relates to multiple links of raw materials, part processing, pretreatment, assembly and the like, and the reaction has certain uncertainty. Whether the passivation of the discharge cavity of the laser is finished at present needs to be judged by experience.

At present, commercial excimer lasers directly adopt working gas for discharge passivation and need to be directly usedFrequent replacement of working gas, wherein F₂And Ne gas is extremely expensive, thus causing a large amount of economic loss, and the vacuum degree of the discharge chamber exhaust is only about 20kPa, which cannot ensure that the laser is fully passivated and the residual gas impurities are completely removed. And fluorine is a highly toxic gas and can irritate the mucous membranes of the eyes, skin and respiratory tract. When the fluorine concentration is 5-10 ppm, the fluorine can stimulate mucous membranes of eyes, nose, throat and the like, pulmonary edema can be caused after long acting time, hair can be burnt when the fluorine contacts with skin, coagulation necrosis of contact parts, carbonization of epithelial tissues and the like can be caused, and various symptoms such as anorexia, nausea, abdominal pain, gastric ulcer, cramp bleeding and even death can be caused due to different inhalation amounts. Chronic contact can cause osteopetrosis and ligament calcification. Frequent replacement of working gas during passivation is likely to cause environmental pollution and is somewhat dangerous to operators. Another fatal disadvantage is that the discharge chamber material continuously releases impurity gas into the discharge chamber, thereby continuously polluting the discharge chamber and causing F₂And thus the output performance of the laser.

In view of the above problem, an embodiment of the present invention provides a workpiece preprocessing system 100, which can be applied to the preprocessing of workpieces 2 such as laser discharge cavity components, and also can be applied to the preprocessing of other workpieces 2. The embodiment of the utility model provides a work piece 2 includes but not limited to each spare part of laser instrument discharge chamber, pipeline etc.. Fig. 1 shows a block diagram of a workpiece preprocessing system 100 according to an embodiment of the present invention. As shown in fig. 1, the workpiece preprocessing system 100 includes a workpiece preprocessing device 101 and a terminal device 102, and the workpiece preprocessing device 101 and the terminal device 102 are communicatively connected.

As shown in fig. 1, the parts and the inner cavity of the workpiece preprocessing device 101 according to the embodiment of the present invention are passivated, and the materials of the pipes and the inner cavity include, but are not limited to, a passivated nickel plating material, a passivated polytetrafluoroethylene material, etc. The workpiece pretreatment apparatus 101 is used to provide a closed environment for cleaning, drying and passivating the workpiece 2.

As shown in fig. 1, the terminal device 102 may be a terminal device with a data processing function, such as a desktop computer, a notebook computer, a tablet, or a mobile phone. The terminal device 102 can automatically control the workpiece preprocessing device 101 to automatically preprocess the workpiece 2.

Fig. 2 shows a schematic structural diagram of a workpiece preprocessing apparatus 101 according to an embodiment of the present invention. As shown in fig. 2, the workpiece preprocessing apparatus 101 includes: a passivation solution container 4, a sample container 3, a cleaning solution supply device 10, and an inert gas supply device 19.

As shown in fig. 2, the passivation solution container 4 is used to contain a passivation solution for passivating the work piece 2. The sample container 3 and the passivation solution container 4 can be disconnected, and are used for containing the workpiece 2 and passivating the workpiece 2 by using the passivation solution provided by the passivation solution container 4.

In practical applications, the sample container 3 may be disconnectable from the passivating solution container 4 by means of a first valve 13, as shown in fig. 2. When the passivation solution container 4 needs to supply the passivation solution into the sample container 3, the first valve 13 should be kept open so that the sample container 3 can communicate with the passivation solution container 4 through the first valve 13. At this time, the sample container 3 passivates the workpiece 2 with the passivating liquid supplied from the passivating liquid container 4.

When the passivating liquid container 4 is not required to supply passivating liquid into the sample container 3, as shown in fig. 2, the first valve 13 should be in a closed state, so that the sample container 3 and the passivating liquid container 4 are not connected to each other.

In practical applications, the sample container 3 may be disconnected from the cleaning solution supply device 10 by the second valve 17, as shown in fig. 2. When the sample container 3 needs to be cleaned by the cleaning solution supply device 10 for the passivated workpiece 2, the second valve 17 should be in an open state so that the sample container 3 can communicate with the cleaning solution supply device 10 through the second valve 17. At this time, the sample container 3 cleans the workpiece 2 with the cleaning liquid supplied from the cleaning liquid supply device 10.

When the cleaning liquid supply means 10 is not required to supply the cleaning liquid into the sample container 3, as shown in fig. 2, the second valve 17 should be in a closed state so that the sample container 3 and the cleaning liquid supply means 10 are not connected to each other.

As shown in fig. 2, the cleaning liquid supply device 10 includes, but is not limited to, a distilled water supply device 10, a pure water supply device, and the like. The cleaning liquid is selected based on the condition that other impurity ions are not introduced into the device.

As shown in fig. 2, the sample container 3 includes, but is not limited to, a sample tank, a sample bottle, and the like for containing a sample.

As shown in fig. 2, the passivation solution container 4 includes, but is not limited to, a passivation solution tank for holding passivation solution, a passivation solution bottle, etc.

In practical applications, the sample container 3 may be disconnected from the inert gas supply 19 by a third valve 18, as shown in fig. 2. When the sample container 3 needs to be protected from the cleaned workpiece 2 by the inert gas supplied from the inert gas supply 19, the third valve 18 should be in an open state so that the sample container 3 can communicate with the inert gas supply 19 through the third valve 18. At this time, the sample container 3 protects the cleaned workpiece 2 from the reaction of the cleaned workpiece 2 with impurities in the air by the inert gas supplied from the inert gas supply device 19.

When the inert gas supply 19 is not required to supply inert gas into the sample container 3, as shown in fig. 2, the third valve 18 should be in a closed state so that the sample container 3 and the inert gas supply 19 are not connected.

In order to ensure that the passivation of the workpiece 2 is normally carried out, the workpiece pretreatment device further comprises a component detection device 8 and a liquid level detection device 5, as shown in fig. 2. The component detection means 8 and the liquid level detection means 5 may be electrically connected to a terminal device so that the terminal device can acquire information detected by the component detection means 8 and information detected by the liquid level detection means 5.

As shown in fig. 2, the component detection device 8 is used to detect the type of the passivation solution in the passivation solution container 4 before the sample container 3 is used to passivate the workpiece 2 with the passivation solution supplied from the passivation solution container 4.

As shown in fig. 2, the liquid level detection device 5 detects the passivation liquid level of the passivation liquid container 4 when the type of the passivation liquid meets the passivation requirement of the workpiece 2.

As shown in fig. 2, the workpiece preprocessing device 101 of the present invention further includes a waste liquid collecting device 22. The waste liquid collecting device 22 is disconnectable from the passivating liquid container 4. The passivating liquid container 4 is also used for discharging passivating liquid to the waste liquid collecting device 22 when the type of the passivating liquid does not meet the passivating requirement of the workpiece 2.

In practical applications, as shown in fig. 2, the passivation solution container 4 and the waste liquid collection device 22 are disconnectable through a fourth valve 21, so as to disconnect the waste liquid collection device 22 from the passivation solution container 4. When the type of the passivation solution does not meet the passivation requirement of the workpiece 2, the passivation solution container 4 discharges the passivation solution to the waste liquid collecting device 22 through the fourth valve 21 connected with the waste liquid collecting device 22. After the passivation solution is completely discharged, the fourth valve 21 is in a closed state, and the passivation solution container 4 and the waste liquid collecting device 22 are disconnected.

As shown in fig. 2, in some cases, the above-described cleaning liquid supply means 10 is disconnectable from the passivation liquid container 4. The passivation solution container 4 is used for discharging passivation solution to the waste liquid collecting device 22, and the cleaning solution supplying device 10 is used for cleaning the passivation solution container 4.

In practical application, as shown in fig. 2, the cleaning liquid supply device 10 and the passivation solution container 4 are disconnectable via the fifth valve 9, when the passivation solution container 4 discharges passivation solution to the waste liquid collection device 22, the fifth valve 9 is in an open state, the passivation solution container 4 is cleaned by the cleaning liquid supply device 10, and after cleaning is completed, the cleaning liquid can be discharged to the waste liquid collection device 22. For this reason, the passivation solution container 4 needs to be cleaned by the cleaning solution supply device 10 before the fourth valve 21 is closed. The cleaning liquid supply device 10 is connected with the passivation container through the fifth valve 9, when the passivation liquid container 4 discharges passivation liquid to the waste liquid collecting device 22, the fifth valve 9 is in an open state, the cleaning liquid supply device 10 cleans the passivation liquid container 4, and after the cleaning is completed, the fourth valve 21 and the fifth valve 9 are closed.

As shown in fig. 2, as a possible implementation manner, after the passivation solution container 4 discharges the passivation solution to the waste liquid collection device 22, the fifth valve 9 is in an open state, the passivation solution container 4 is cleaned by the cleaning solution supply device 10, and after the cleaning is completed, the fourth valve 21 and the fifth valve 9 are closed.

As shown in fig. 2, in order to ensure that the ion concentration of the passivation solution meets the requirement, the component detection device 8 is used for detecting the halogen ion concentration of the passivation solution when the passivation solution liquid level of the passivation solution container 4 meets the preset passivation liquid level of the workpiece 2.

As shown in fig. 2, the workpiece preprocessing apparatus 101 further includes a passivation solution replenishing device 7. The passivating liquid supplementing device 7 is disconnectable from the passivating liquid container 4.

In practical application, the passivation solution supplementing device 7 and the passivation solution container 4 can be disconnected through the sixth valve 6. When the liquid level of the passivation solution does not meet the preset passivation liquid level of the workpiece 2, a sixth valve 6 between a passivation solution supplementing device 7 and a passivation solution container 4 is opened, so that the passivation solution supplementing device 7 and the passivation solution container 4 are in a communicated state, and the passivation solution meeting the preset passivation liquid level of the workpiece 2 is added into the passivation solution container 4 through the passivation solution supplementing device 7.

In practical application, the passivation solution replenishing device 7 is disconnectable from the passivation solution container 4 through a sixth valve 6, as shown in fig. 2. When the halogen ion concentration of the passivation solution does not meet the preset halogen ion concentration of the workpiece 2, a sixth valve 6 between a passivation solution supplementing device 7 and a passivation solution container 4 is opened, so that the passivation solution supplementing device 7 and the passivation solution container 4 are in a communicated state, and the passivation solution meeting the preset halogen ion concentration of the workpiece 2 is added into the passivation solution container 4 through the passivation solution supplementing device 7.

As shown in fig. 2, the passivation solution supplementing device 7 of the embodiment of the present invention may be a passivation solution supplementing device 7 only containing a high concentration passivation acid solution, and in the case that the halogen ion concentration of the passivation solution does not satisfy the preset halogen ion concentration of the workpiece 2, the passivation solution supplementing device 7 is used to directly supplement the passivation solution containing the high concentration passivation acid solution into the passivation solution container 4.

As shown in fig. 2, in practical applications, the passivation solution supplementing device 7 may also be a plurality of passivation solutions with different concentrations, and when the passivation solution meeting the preset concentration of halogen ions of the workpiece 2 needs to be supplemented, the passivation solution supplying device with the concentration required by the control executed by the terminal device fills the passivation solution container 4 with the required passivation solution, so as to obtain the passivation solution meeting the preset concentration of halogen ions of the workpiece 2.

From the above, the passivation solution meeting the passivation requirements of the workpiece 2 is obtained through quantitative judgment of the passivation solution type, the passivation solution liquid level and the passivation solution ion concentration in the passivation solution container 4.

It should be noted that, as shown in fig. 2, the passivation solution type required for passivating the workpiece 2 in the embodiment of the present invention is an acidic passivation solution corresponding to the corrosive medium in the use process of the workpiece 2. The above-described passivation requirements of the workpiece 2 and the preset ion concentration of the workpiece 2 vary depending on the passivated workpiece 2. The preset passivation liquid level of the workpiece 2 is changed according to different volumes of the passivated workpiece 2.

As shown in fig. 2, in order to ensure that the passivation of the workpiece 2 is normally performed, the workpiece preprocessing device 101 further comprises an air drying device 14. The seasoning device 14 includes, but is not limited to, a fan, etc.

As shown in fig. 2, the sample container 3 is also used to discharge the passivation solution into the passivation solution container 4 after the passivation of the work 2 and before the passivation of the work 2 by the cleaning solution device.

As shown in fig. 2, after the passivation solution is discharged from the sample container 3 to the passivation solution container 4, the air drying device 14 performs an air drying operation on the workpiece 2 to air-dry the acid solution on the surface of the workpiece 2.

As shown in fig. 2, in order to prevent the work 2 from coming into contact with impurities in the air before cleaning, the work pretreatment apparatus further includes a lid body 1 for closing the sample container 3.

In practical application, as shown in fig. 2, the cap 1 may be a top cap movably connected to the sample container 3, and the cap 1 is used to seal the device, and after the inert gas is introduced, the workpiece 2 is prevented from reacting with impurities in the air to form a carbon oxidation reaction layer.

As shown in fig. 2, in practical use, when the cover 1 of the sample container 3 is in a closed state, the sample container 3 and the cleaning solution supply device 10 are disconnectable by the second valve 17; after the second valve 17 is opened to communicate the sample container 3 with the cleaning liquid supply means 10, the passivated workpiece 2 is cleaned with the cleaning liquid in the cleaning liquid supply means 10. Under the protection of inert gas introduced into the sample container 3 of the cleaned workpiece 2, the workpiece 2 is dehumidified by the drying device 20, and after the workpiece 2 is dehumidified by the drying device 20, the workpiece 2 is taken out.

As shown in fig. 2, in order to ensure that the determination as to whether the workpiece 2 is passivated is performed properly, the above-described workpiece pretreatment apparatus 101 further includes corrosion resistance detection means 15. The corrosion resistance detection device 15 may be configured to detect the corrosion resistance of the workpiece 2 after the air drying device 14 air-dries the acid solution on the surface of the workpiece 2.

As shown in fig. 2, when the number of times of detecting the corrosion resistance of the workpiece 2 is less than or equal to the preset number of times, if the error of the actual corrosion resistance of the workpiece 2 is less than or equal to 20%, it indicates that the passivation of the workpiece 2 is completed.

As shown in fig. 2, when the error of the actual corrosion resistance of the workpiece 2 is larger than 20%, it is indicated that the workpiece 2 is not suitable for the corrosion environment, and the workpiece 2 in the sample container 3 needs to be replaced by the workpiece replacement device. Based on this, the above-described workpiece preprocessing apparatus 101 further includes a workpiece replacement device for replacing the workpiece 2 in the specimen container 3.

As shown in fig. 2, the workpiece replacement apparatus according to the embodiment of the present invention is used to perform an operation of removing and replacing a workpiece 2 that is not suitable for passivation. Workpiece changing devices include, but are not limited to, robots and the like.

For example, as shown in fig. 2, when the number of times of detection of the corrosion resistance is preset to be less than or equal to the number of times of actual detection of the corrosion resistance, the error of the corrosion resistance of the workpiece 2 is greater than 20%, the lid body 1 of the sample container 3 is opened, the workpiece 2 is taken out by using the manipulator, cleaning is performed, and the other workpiece 2 can be replaced to continue the pretreatment.

For example, as shown in fig. 2, when the number of times of detecting the corrosion resistance is preset to be less than or equal to the number of times of actually detecting the corrosion resistance, the error of the corrosion resistance of the workpiece 2 is greater than 20%, after the cleaning solution supplying device 10 cleans the acid solution on the surface of the workpiece 2, the device cover 1 is opened, the workpiece 2 is taken out by using the manipulator, and the other workpiece 2 can be replaced to continue the pretreatment.

In one example, as shown in FIG. 2, the theoretical passivation etch resistance R if the workpiece 2 is described₀It is determined that the error of the actual corrosion resistance R of the workpiece 2 satisfies Δ R ═ (R-R)₀)/R₀；

In another example, as shown in FIG. 2, if the theoretical passivation etch resistance R of the workpiece 2 is₀Unknown, the error of the actual corrosion resistance R of the workpiece 2 satisfies Δ R ═ (R)_i+1-R_i)/R_i(ii) a Wherein R is_iIndicating the corrosion resistance detection value of the workpiece 2 at the ith time; and i is less than or equal to the preset detection times.

Therefore, when the preset corrosion resistance detection times are less than or equal to the actual corrosion resistance detection times and the corrosion resistance error of the workpiece 2 is less than or equal to 20%, the workpiece 2 is considered to be passivated, and when the preset corrosion resistance detection times are less than or equal to the actual corrosion resistance detection times and the corrosion resistance error of the workpiece 2 is always greater than 20%, the workpiece 2 is considered to be not suitable for a corrosion environment, so that the passivation degree of the workpiece 2 can be judged, and the condition of excessive passivation or insufficient passivation is avoided.

It should be noted that the number of times of detecting the corrosion resistance is between 50 and 100, and is varied according to the different workpieces 2.

As a possible implementation, as shown in fig. 2, the component detection device 8 is further configured to detect the passivation solution liquid density in the passivation solution container 4 after the workpiece 2 is cleaned by the cleaning solution device and the sample container 3 is disconnected from the passivation solution container 4.

As shown in fig. 2, when the passivation solution liquid density in the passivation solution container 4 varies by more than a variation threshold, the halogen content of the passivation solution in the passivation solution container 4 is detected by the component detection device 8.

As shown in fig. 2, when the halogen content of the passivation solution in the passivation solution container 4 is lower than the threshold value, the passivation solution is discharged from the passivation solution container 4 to the waste solution collecting device 22, the passivation solution container 4 is cleaned by the cleaning solution supplying device at the same time or after the passivation solution is discharged from the passivation solution container 4 to the waste solution collecting device 22, and after the cleaning is completed, the workpiece pretreatment apparatus 101 is closed.

As shown in fig. 2, when the detected halogen content is higher than the threshold value, the upper layer liquid in the passivation liquid container 4 is discharged as a waste liquid collecting device 22, the upper layer liquid may be composed of oil stains on the workpiece 2, and after the upper layer liquid is discharged, the workpiece pretreatment apparatus 101 is closed.

As shown in fig. 2, when the passivation solution density variation in the passivation solution container 4 is lower than the variation threshold, the component detection device 8 is used to detect the halogen content of the passivation solution in the passivation solution container 4, when the halogen content of the passivation solution in the passivation solution container 4 is higher than the threshold, the workpiece pretreatment device 101 is directly closed, and when the halogen content of the passivation solution in the passivation solution container 4 is lower than the threshold, the sixth valve 6 between the passivation solution container replenishment device 7 and the passivation solution container 4 is opened, and the passivation solution is replenished into the passivation solution container 4 until the halogen content of the passivation solution in the passivation solution container 4 meets the passivation requirement of the workpiece 2.

As shown in fig. 2, the passivation solution liquid density variation Δ ρ ═ after passivation of the workpiece-the passivation solution liquid density ρ ═ before passivation of the workpiece₀│。

From the above, according to the judgment of the liquid density and the halogen content of the passivation solution in the passivation solution container 4, the information whether the passivation solution can be reused is obtained, so that the cyclic utilization of the passivation solution is realized, and the resources are saved.

As shown in fig. 2, the embodiment of the present invention will be further described in detail by taking the integrated processing and detection of the discharge chamber component of the ArF excimer laser as an example. In this example, the terminal equipment may include a workpiece preprocessing device controller 12 and a recording device 16. The disconnectable connection mode between the devices can be valve connection, and the cleaning liquid can be distilled water. Between the sample container 3 and the passivation solution container 4, the passivation solution in the passivation solution container 4 can be flowed into the sample container 3 by the passivation solution inflow pump 11. The pretreatment method of the excimer laser discharge cavity component mainly comprises the following steps.

1) Opening a cover body 1 of the workpiece pretreatment equipment, putting a workpiece 2 to be treated after processing into a sample container 3, and closing the cover body 1;

2) determining that enough HF passivation solution exists in the container according to the liquid level detection device 5 of the passivation solution container 4;

3) starting the component detection device 8, determining that the mass percentage content of HF is 55%, opening a valve, and using the passivation solution supplement device 7 to supplement the HF solution until the content of HF in the passivation solution reaches 68%;

4) turning on a passivation solution inflow pump 11 to enable the part to be completely immersed in the HF passivation solution, turning on a workpiece pretreatment device controller 12, and starting timing;

5) after five minutes, the first valve 13 is actuated to discharge the passivation solution in the sample container 3 to the passivation solution container 4, and the air drying device 14 is opened.

6) After ten minutes, the air dryer 14 was closed, the corrosion resistance detector 15 was opened, and the corrosion resistance of the parts was measured and recorded as R₀The corrosion resistance detection device 15 is turned off.

7) Due to the corrosion resistance R that should be achieved after passivation of the component_thIf not, the recording device 16 is started to record the data of the ith test as R_iRepeating the steps 4) to 6) until (R)_i+1-R_i)/R_iLess than or equal to 20 percent, as shown in the following table:

unit: omega	0	1	2	3
					R_i	<10	1200	1600	1900
(R_i+1-R_i)/R_i	-	-	33％	18.7％

8) The part is considered to have been passivated and the corrosion resistance R to be achieved after passivation of the part is recorded_th≥1900Ω；

9) Opening the second valve 17 to rapidly wash the parts with water in the distilled water supply device 10 to remove the residual acid solution on the surface;

10) opening a third valve 18 to enable the gas in the passive gas cylinder to be filled into the sample container 3 to exhaust air, starting a drying device 20, controlling the temperature of the sample container 3 to be 105 +/-5 ℃, and drying the workpiece 2;

11) opening the device cover body 1, and taking out the workpiece 2, namely the workpiece 2 which is subjected to cleaning, passivation and drying treatment, and can be directly used for assembly;

12) starting a component detection device 8 in the passivation solution tank 4, determining that the density change of the liquid is higher than 10%, and entering a step 13);

13) and (3) determining that the required halogen content is lower than a threshold value, opening a fourth valve 21 to enable passivation solution to flow into a waste liquid collecting device 22, opening a fifth valve 9 to enable water in the distilled water supply device 10 to rapidly clean the passivation solution container 4, and closing the workpiece pretreatment device 101.

The utility model discloses a work piece pre treatment facility 101, add passivation solution in to sample container 3 through passivation solution container 4 for accomplish work piece 2's washing in work piece 2 soaks and the passivation solution, passivation treatment process, through using the inert gas bottle to carry out the protection of isolated air to work piece 2 after wasing, utilize gaseous medium to wash work piece 2 among the prior art, expose easily during the passivation and generate stable carbon oxidation reaction layer in the air, thereby influence the problem of excimer laser service property. The corrosion resistance error of the workpiece 2 is detected by using the corrosion resistance, the passivation degree of the workpiece 2 is judged, the quantification of the passivation result of the workpiece 2 is realized, and the condition of excessive passivation or insufficient passivation is avoided. And the utility model discloses a work piece preprocessing equipment 101 passivates in inclosed environment, and the time liquid passivation medium of using, has solved among the prior art passivation process and need fill into many times into the halogen gas of taking higher concentration out to the discharge chamber, easily causes environmental pollution and has certain dangerous problem to operating personnel.

The embodiment of the utility model provides a still provide a work piece preliminary treatment method, this work piece preliminary treatment method can use above-mentioned work piece preliminary treatment equipment 101 to be used for carrying out integration preliminary treatment operation to various work pieces 2 that more need the passivation. The workpiece 2 here includes, but is not limited to, discharge chamber parts of an excimer laser, pipes, etc.

Fig. 3 shows a main flow chart of a workpiece preprocessing method according to an embodiment of the present invention. The workpiece preprocessing method may be executed by the terminal device 102 described above or may be executed by a chip applied to the terminal device 102. As shown in fig. 3, a workpiece preprocessing method according to an embodiment of the present invention includes:

step 101: the terminal apparatus 102 controls the passivation solution container 4 to supply the passivation solution to the sample container 3 so that the sample container 3 passivates the workpiece 2 with the passivation solution supplied from the passivation solution container 4.

Step 102: the terminal device 102 controls the cleaning liquid supply means 10 to supply the cleaning liquid to the sample container 3 so that the sample container 3 cleans the passivated workpiece 2 with the cleaning liquid.

Step 103: the terminal device 102 controls the inert gas supply device 19 to supply the inert gas to the sample container 3 so that the sample container 3 dehumidifies the cleaned workpiece 2 under the protection of the inert gas.

As shown in fig. 3, in the above-mentioned work piece pretreatment method, the utility model discloses utilize liquid phase passivation medium to wash, passivate work piece 2, realize once only washing and the passivation to the material, through adding inert gas in to sample container 3, make work piece 2 after the washing carry out drying and dehumidifying operation in the environment of isolated air, avoided original technology easily to generate steady state carbon oxide and be difficult to get rid of fast, influence the output's of laser problem. Therefore, the workpiece pretreatment method of the utility model can carry out sealed integrated pretreatment on the workpiece 2 needing passivation, and has higher universality and transportability.

As a possible implementation manner, as shown in fig. 4, before the terminal device 102 executes step 101, the workpiece preprocessing method further includes:

step 1001: the terminal device 102 acquires the type of the passivation solution in the passivation solution container 4 transmitted from the component detection apparatus 8.

Step 1002: and under the condition that the terminal equipment 102 determines that the type of the passivation solution meets the passivation requirement of the workpiece 2, the passivation solution level of the passivation solution container 4 is obtained.

Step 1003: the terminal device 102 determines that the halogen ion concentration of the passivation solution is obtained under the condition that the passivation solution level of the passivation solution container 4 meets the preset passivation level of the workpiece 2.

Step 1004: the terminal device 102 determines that the halogen ion concentration of the passivation solution satisfies the preset ion concentration of the workpiece 2.

Therefore, the steps 1001 to 1003 are continuously circulated, so that the passivation solution for passivating the workpiece 2 meets the requirement of passivating the workpiece 2. When the terminal device executes step 1004, it is determined that the loop of steps 1001 to 1004 can be ended, and the terminal device 102 executes step 101 when it is determined that the passivation solution is a passivation solution that satisfies the requirement for passivation of the workpiece 2.

As a possible implementation manner, as shown in fig. 4, after the terminal device executes step 1001, the workpiece preprocessing method further includes:

step 1011: and under the condition that the terminal equipment 102 determines that the type of the passivation solution does not meet the passivation requirement of the workpiece 2, the passivation solution container 4 is controlled to discharge the passivation solution to the waste liquid collecting device 22.

Step 1021: the terminal device 102 controls the cleaning liquid supply apparatus 10 to clean the passivation solution container 4. The waste liquid from the cleaning liquid device for cleaning the passivation liquid container 4 is also discharged into the waste liquid collecting device 22.

After the terminal equipment executes the steps 1011 to 1021, the continuous circulation of the steps 1002 to 1003 is continuously executed, so that the passivation solution for passivating the workpiece 2 meets the requirement of passivating the workpiece 2. When the terminal device executes step 1004, it is determined that the loop of steps 1001 to 1004 can be ended, and the terminal device executes step 101 after determining that the passivation solution is a passivation solution that satisfies the requirement of passivation of the workpiece 2.

As a possible implementation manner, as shown in fig. 4, after the terminal device executes step 1003, the workpiece preprocessing method further includes:

step 1013: and under the condition that the terminal equipment 102 determines that the halogen ion concentration of the passivation solution does not meet the preset halogen ion concentration of the workpiece 2, the passivation solution supplementing device 7 is controlled to add the passivation solution meeting the preset halogen ion concentration of the workpiece 2 into the passivation solution container 4. The embodiment of the utility model provides an in passivation solution supplementary device 7 can be one or more. The passivating liquid supplementing device 7 is filled with one or more passivating liquids with different concentrations.

After the terminal device executes step 1013 and the passivation solution for passivating the workpiece 2 meets the requirement for passivating the workpiece 2, the terminal device executes step 1004, ends the cycle, determines that the passivation solution is the passivation solution meeting the requirement for passivating the workpiece 2, and executes step 101.

As a possible implementation manner, as shown in fig. 4, after the terminal device executes step 1002, the workpiece preprocessing method further includes:

step 1012: and under the condition that the terminal equipment 102 determines that the liquid level of the passivation solution does not meet the preset passivation liquid level of the workpiece 2, the passivation solution supplementing device 7 is controlled to add the passivation solution meeting the preset passivation liquid level of the workpiece 2 into the passivation solution container 4.

Specifically, under the condition that the liquid level does not meet the preset passivation liquid level requirement of the workpiece 2, the passivation liquid consisting of the high-concentration passivation acid liquid supplementing device 7 and distilled water is supplemented;

furthermore, under the condition that the liquid level does not meet the preset liquid level requirement for passivation of the workpiece 2, the passivation liquid can be supplemented by using a pre-mixed passivation liquid supplementing device 7.

After the terminal device executes step 1012, continuously executing step 1003 for continuous circulation, so as to ensure that the passivation solution for passivating the workpiece 2 meets the requirement of passivating the workpiece 2. When the terminal device executes step 1004, it is determined that the loop of steps 1001 to 1004 can be ended, and the terminal device executes step 101 after determining that the passivation solution is a passivation solution that satisfies the requirement of passivation of the workpiece 2.

As a possible implementation manner, as shown in fig. 5, after the terminal device performs step 101 and before the terminal device performs step 102, the workpiece preprocessing method further includes:

step 101A: the terminal apparatus 102 controls the sample container 3 to discharge the passivation solution to the passivation solution container 4.

Step 101B: the terminal device 102 controls the seasoning apparatus 14 to season the work 2 in the sample container 3.

Before cleaning the passivated workpiece 2, in an actual operation, it is necessary to discharge the passivation solution in the sample container 3, and then air-dry the sample container 3 and the workpiece 2 to dry the surface of the workpiece 2.

step 101C: the terminal device 102 acquires the corrosion resistance of the workpiece 2;

step 101D: in the case where the terminal device 102 determines that the number of times of detection of the corrosion resistance of the workpiece 2 is less than or equal to the preset number of times of detection, it determines that the error of the actual corrosion resistance of the workpiece 2 is less than or equal to 20%. The embodiment of the utility model provides an in predetermine the detection number of times and change according to the material change of work piece 2, reachs through the experiment.

It should be noted that, when the terminal device executes step 101C, the terminal device may directly execute the step 101C, and preferably, after executing step 101A and step 101B, the terminal device executes step 101C. Optionally, after step 101A is executed, the terminal device executes step 101C. Alternatively, after step 101B, the terminal device executes step 101C.

The actual corrosion resistance error of the workpiece 2 includes the following two cases:

if the theoretical passivation corrosion resistance R of the workpiece 2₀It was determined that the error of the actual corrosion resistance R of the workpiece 2 satisfies Δ R ═ (R-R)₀)/R₀. The detection data of the ith time is executed and recorded by the terminal equipment, and the error of the actual corrosion resistance R of the workpiece 2 satisfies delta R ═ R (R-R)₀)/R₀When 20% or less, the workpiece 2 is considered to be passivated.

If the theoretical passivation corrosion resistance R0 of the workpiece 2 is unknown, the error of the actual corrosion resistance R of the workpiece 2 satisfies Δ R ═ R (R)_i+1-R_i)/R_i. Wherein R is_iIndicating the corrosion resistance detection value of the workpiece 2 at the ith time; i is less than or equal to the preset detection times. The detection data of the ith time is recorded and executed by the terminal device, and the error of the actual corrosion resistance R of the workpiece 2 satisfies the condition that R is equal to (R)_i+1-R_i)/R_iWhen 20% or less, the workpiece 2 is considered to be passivated.

From top to bottom, the utility model discloses a pretreatment methods utilizes the method that the corrosion resistance detected to realize prejudging the degree of passivation of work piece 2, and the method is simple effective, can avoid the condition that work piece 2 passivation is excessive and the passivation is not enough.

As a possible implementation manner, as shown in fig. 5, after the terminal device executes step 101C, the workpiece preprocessing method further includes:

and 101E, under the condition that the terminal equipment 102 determines that the corrosion resistance detection times of the workpiece 2 are less than or equal to the preset detection times, determining that the error of the actual corrosion resistance of the workpiece 2 is more than 20%, and controlling the workpiece 2 replacing device to replace the workpiece 2 in the sample container 3. And within the preset detection times of the corrosion resistance of the workpiece 2, the actual corrosion resistance of the workpiece 2 is changed all the time violently, the workpiece 2 is considered not to be suitable for a high-corrosivity environment, and the terminal equipment executes the step 101E to control the replacing device to replace the workpiece 2. Optionally, in practical applications, before the terminal device performs step 101E, the terminal device performs step 102 to clean the acidic liquid on the surface of the workpiece 2, and then performs step 101E. The replacement device in the embodiment of the present invention includes but is not limited to a device that can replace the workpiece 2 such as a robot.

It is from top to bottom visible, the embodiment of the utility model provides an under the condition that has shown that 2 corrosion resistance detection times of work piece surpass preset times, 2 corrosion resistance errors of work piece still are greater than 20%, confirm 2 not applicable strong corrosive environment of work piece, can be used to detect whether the material can be applicable to discharge chamber extreme corrosive environment.

As a possible implementation manner, as shown in fig. 6, after the terminal device executes step 102, the workpiece preprocessing method further includes:

step 1021: the terminal device 102 acquires the passivation liquid density in the passivation liquid container 4.

Step 1022: the terminal device 102 obtains the halogen content of the passivation solution in the passivation solution container 4 when determining that the density variation of the passivation solution in the passivation solution container 4 is higher than the variation threshold. The change threshold value here is the difference of passivation liquid initial density and the density of passivation liquid when detecting, the utility model discloses the change threshold value scope of embodiment is 8% -12%, and is preferred, the change threshold value scope of the embodiment of the utility model is 10%.

Step 1023: under the condition that the terminal device 102 determines that the halogen content of the passivation solution in the passivation solution container 4 is lower than the threshold value, controlling the passivation solution container 4 to discharge the passivation solution to the waste liquid collecting device 22; the cleaning liquid supply device 10 is controlled to clean the passivation solution container 4.

Step 1024: in the case where the terminal device 102 determines that the halogen content of the passivation solution in the passivation solution container 4 is higher than the threshold value, the passivation solution container 4 is controlled to discharge the upper layer liquid of the passivation solution to the waste liquid collection device 22. The embodiment of the utility model provides an in upper liquid be that the impurity such as the oil stain on 2 surfaces of work pieces is passivated by passivation liquid immersion passivation, after the washing liquid washs, flows into passivation liquid container 4 to form layering phenomenon with the passivation liquid in passivation liquid container 4.

Step 1025: the terminal device 102 obtains the halogen content of the passivation solution in the passivation solution container 4 when determining that the variation of the liquid density of the passivation solution in the passivation solution container 4 is lower than the variation threshold.

Step 1026: and when the terminal equipment 102 determines that the halogen content of the passivation solution in the passivation solution container 4 is lower than the threshold value, the passivation solution supplementing device 7 is controlled to add the passivation solution meeting the halogen content requirement into the passivation solution container 4.

From top to bottom, through the liquid density to the passivation solution in passivation solution container 4, the detection of halogen ion content judges whether passivation solution can recycle, the utility model discloses a pretreatment methods still has energy-concerving and environment-protective beneficial effect.

The above-mentioned main angle of following with terminal equipment of the utility model discloses the scheme of the embodiment is introduced. It is understood that the terminal device includes corresponding hardware structures and/or software modules for performing the respective functions in order to implement the above functions. Those of skill in the art will readily appreciate that the various illustrative elements and algorithm steps described in connection with the embodiments disclosed herein may be implemented as hardware or combinations of hardware and computer software. Whether a function is performed as hardware or computer software drives hardware depends upon the particular application and design constraints imposed on the solution. Skilled artisans may implement the described functionality in varying ways for each particular application, but such implementation decisions should not be interpreted as causing a departure from the scope of the present invention.

The embodiment of the present invention can perform the division of the functional units according to the above method example terminal device, for example, each functional unit can be divided corresponding to each function, and two or more functions can be integrated into one processing unit. The integrated unit can be realized in a form of hardware, and can also be realized in a form of a software functional unit. It should be noted that, the division of the units in the embodiments of the present invention is schematic, and is only a logic function division, and there may be another division manner in actual implementation.

In the case of adopting the corresponding integrated unit, fig. 7 shows a schematic structural diagram of the workpiece preprocessing device 101 provided by the embodiment of the present invention. The workpiece preprocessing device 101 may be the terminal device 102 shown in fig. 1, or may be a chip applied to the terminal device 102 shown in fig. 1.

As shown in fig. 7, the workpiece preprocessing apparatus 101 includes: a processing unit 201. Optionally, the workpiece preprocessing apparatus 101 may further include a storage unit 203 for storing program codes and data of the workpiece preprocessing method.

As shown in FIG. 7, the processing unit 201 is used for supporting the workpiece preprocessing device 101 to execute the steps 101-103 executed by the terminal device 102 shown in FIG. 1 in the above embodiment.

Optionally, the workpiece preprocessing device 101 further includes a communication unit 202, configured to support the workpiece preprocessing device 101 to perform steps 1001 to 1003 performed by the terminal device 102 shown in fig. 1 in the foregoing embodiment.

The processing unit 201 is used for supporting the workpiece preprocessing device 101 to execute the step 1004 executed by the terminal device 102 shown in fig. 1 in the above embodiment.

In a possible implementation manner, as shown in fig. 7, the communication unit 202 is further configured to support the workpiece preprocessing device 101 to perform steps 1011 and 1021 performed by the terminal device 102 shown in fig. 1 in the foregoing embodiment.

In a possible implementation manner, as shown in fig. 7, the communication unit 202 is further configured to support the workpiece preprocessing device 101 to execute step 1013 executed by the terminal device 102 shown in fig. 1 in the foregoing embodiment.

In a possible implementation manner, as shown in fig. 7, the communication unit 202 is further configured to support the workpiece preprocessing device 101 to perform step 1012 performed by the terminal device 102 shown in fig. 1 in the foregoing embodiment.

In a possible implementation manner, as shown in fig. 7, the processing unit 201 is configured to support the workpiece preprocessing device 101 to perform steps 101A to 101D performed by the terminal device 102 shown in fig. 1 in the foregoing embodiment.

In a possible implementation manner, as shown in fig. 7, the communication unit 202 is further configured to support the workpiece preprocessing device 101 to perform step 101E performed by the terminal device 102 shown in fig. 1 in the foregoing embodiment.

In a possible implementation manner, as shown in fig. 7, the processing unit 201 is configured to support the workpiece preprocessing device 101 to perform steps 1021 to 1026, which are performed by the terminal device 102 shown in fig. 1 in the foregoing embodiment.

As shown in fig. 7, the Processing Unit 201 may be a Processor or a controller, such as a Central Processing Unit (CPU), a general purpose Processor, a Digital Signal Processor (DSP), an Application-Specific Integrated Circuit (ASIC), a Field Programmable Gate Array (FPGA) or other Programmable logic device, a transistor logic device, a hardware component, or any combination thereof. Which may implement or perform the various illustrative logical blocks, modules, and circuits described in connection with the disclosure. The processor may also be a combination of computing functions, e.g., comprising one or more microprocessors, DSPs, and microprocessors, among others. The communication unit 202 may be a transceiver, a transceiving circuit or a communication interface, etc. The storage unit 203 may be a memory.

As shown in fig. 7, when the processing unit 201 is a processor, the communication unit 202 is a transceiver, and the storage unit 203 is a memory, the workpiece preprocessing device 101 according to the embodiment of the present invention may be a hardware configuration diagram of the terminal device 102 shown in fig. 8.

As shown in fig. 8, the terminal device 102 provided by the embodiment of the present invention includes a processor 110 and a communication interface 130. The communication interface 130 is coupled to the processor 110.

As shown in fig. 8, the processor 110 may be a general processing unit (CPU), a microprocessor, an application-specific integrated circuit (ASIC), or one or more ics for controlling the execution of the program according to the present invention. The communication interface 130 may be one or more. The communication interface 130 may use any transceiver or the like for communicating with other devices or communication networks.

As shown in fig. 8, the terminal device 102 may further include a communication line 140. Communication link 140 may include a path for transmitting information between the aforementioned components.

Optionally, as shown in fig. 8, the terminal device 102 may further include a memory 120. The memory 120 is used for storing computer instructions for performing aspects of the present invention and is controlled by the processor for execution. The processor 110 is used for executing the computer instructions stored in the memory 120, thereby implementing the workpiece preprocessing method provided by the embodiment of the invention.

As shown in fig. 8, the memory 120 may be a read-only memory (ROM) or other types of static storage devices that can store static information and instructions, a Random Access Memory (RAM) or other types of dynamic storage devices that can store information and instructions, an electrically erasable programmable read-only memory (EEPROM), a compact disc read-only memory (CD-ROM) or other optical disc storage, optical disc storage (including compact disc, laser disc, optical disc, digital versatile disc, blu-ray disc, etc.), magnetic disk storage media or other magnetic storage devices, or any other medium that can be used to carry or store desired program code in the form of instructions or data structures and that can be accessed by a computer, but is not limited to such. The memory 120 may be separate and coupled to the processor 110 via a communication link 140. Memory 120 may also be integrated with processor 110.

Optionally, the computer instructions in the embodiments of the present invention may also be referred to as application program codes, and the embodiments of the present invention are not limited thereto specifically.

In one implementation, as shown in FIG. 8, processor 110 may include one or more CPUs, such as CPU0 and CPU1 of FIG. 8, for example.

In one embodiment, as shown in fig. 8, the terminal device 102 may include a plurality of processors 110, such as the processor 110 and the processor 150 in fig. 8. Each of these processors may be a single core processor or a multi-core processor.

Fig. 9 is a schematic structural diagram of a chip according to an embodiment of the present invention. As shown in fig. 9, the chip 200 includes one or more (including two) processors 210 and a communication interface 220.

Optionally, as shown in fig. 9, the chip 200 further includes a memory 230, and the memory 230 may include a read-only memory and a random access memory and provide operating instructions and data to the processor 210. The portion of memory may also include non-volatile random access memory (NVRAM).

In some embodiments, as shown in FIG. 9, memory 230 stores elements, execution modules or data structures, or a subset thereof, or an expanded set thereof.

In the embodiment of the present invention, as shown in fig. 9, the processor 210 executes the corresponding operation by calling the operation instruction stored in the memory (the operation instruction may be stored in the operating system).

As shown in fig. 9, a processor 210, which may also be referred to as a Central Processing Unit (CPU), controls the processing operations of any of the terminal devices 102.

As shown in fig. 9, memory 230 may include both read-only memory and random access memory and provides instructions and data to processor 210. A portion of the memory 230 may also include NVRAM. For example, in applications where the memory, communication interface, and memory are coupled together by a bus system that may include a power bus, a control bus, a status signal bus, etc., in addition to a data bus. For clarity of illustration, however, the various buses are labeled as bus system 240 in fig. 9.

The method disclosed by the embodiment of the present invention can be applied to a processor, or implemented by a processor. The processor may be an integrated circuit chip having signal processing capabilities. In implementation, the steps of the above method may be performed by integrated logic circuits of hardware in a processor or instructions in the form of software. The processor may be a general purpose processor, a Digital Signal Processor (DSP), an ASIC, an FPGA (field-programmable gate array) or other programmable logic device, discrete gate or transistor logic device, or discrete hardware components. The various methods, steps and logic blocks disclosed in embodiments of the present invention may be implemented or performed. A general purpose processor may be a microprocessor or the processor may be any conventional processor or the like. The steps of the method disclosed by the embodiment of the present invention can be directly embodied as the execution of the hardware decoding processor, or the combination of the hardware and the software module in the decoding processor. The software module may be located in ram, flash memory, rom, prom, or eprom, registers, etc. storage media as is well known in the art. The storage medium is located in a memory, and a processor reads information in the memory and completes the steps of the method in combination with hardware of the processor.

The embodiment of the utility model provides a still provide a computer readable storage medium. The computer readable storage medium has stored therein instructions that, when executed, implement the functions performed by the terminal device 102 in the above-described embodiments.

In the above embodiments, the implementation may be wholly or partially realized by software, hardware, firmware, or any combination thereof. When implemented in software, may be implemented in whole or in part in the form of a computer program product. The computer program product includes one or more computer programs or instructions. When the computer program or instructions are loaded and executed on a computer, the processes or functions described in the embodiments of the present invention are executed in whole or in part. The computer may be a general purpose computer, a special purpose computer, a computer network, a terminal, a user device, or other programmable apparatus. The computer program or instructions may be stored in a computer readable storage medium or transmitted from one computer readable storage medium to another computer readable storage medium, for example, the computer program or instructions may be transmitted from one website, computer, server, or data center to another website, computer, server, or data center by wire or wirelessly. The computer-readable storage medium can be any available medium that can be accessed by a computer or a data storage device such as a server, data center, etc. that integrates one or more available media. The usable medium may be a magnetic medium, such as a floppy disk, a hard disk, a magnetic tape; or optical media such as Digital Video Disks (DVDs); it may also be a semiconductor medium, such as a Solid State Drive (SSD).

While the invention has been described in connection with various embodiments, other variations to the disclosed embodiments can be understood and effected by those skilled in the art in practicing the claimed invention, from a review of the drawings, the disclosure, and the appended claims. In the claims, the word "comprising" does not exclude other elements or steps, and the word "a" or "an" does not exclude a plurality. A single processor or other unit may fulfill the functions of several items recited in the claims. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage.

While the invention has been described in conjunction with specific features and embodiments thereof, it will be apparent that various modifications and combinations can be made thereto without departing from the spirit and scope of the invention. Accordingly, the specification and figures are merely exemplary of the invention as defined in the appended claims and are intended to cover any and all modifications, variations, combinations, or equivalents within the scope of the invention. It will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims and their equivalents, the present invention is also intended to include such modifications and variations.

Claims

1. A workpiece pretreatment apparatus, comprising:

2. The apparatus for pretreating a workpiece according to claim 1, further comprising a lid for closing the specimen container.

3. The apparatus for pretreating a workpiece according to claim 1, further comprising a composition detecting device and a liquid level detecting device;

the sample container is used for utilizing the passivation solution provided by the passivation solution container before passivating the workpiece, and the component detection device is used for detecting the type of the passivation solution in the passivation solution container;

the liquid level detection device is used for detecting the passivation liquid level of the passivation liquid container when the type of the passivation liquid meets the passivation requirement of a workpiece;

the component detection device is also used for detecting the halogen ion concentration of the passivation solution when the passivation solution liquid level of the passivation solution container meets the preset liquid level for workpiece passivation;

the sample container is specifically used for passivating the workpiece by using the passivation solution provided by the passivation solution container when the halogen ion concentration of the passivation solution meets the preset halogen ion concentration of the workpiece.

4. The workpiece pretreatment apparatus according to claim 3, further comprising a waste liquid collection device; the waste liquid collecting device is disconnectable from the passivation liquid container;

the passivation solution container is also used for discharging passivation solution to the waste liquid collecting device when the type of the passivation solution does not meet the workpiece passivation requirement;

the cleaning liquid supply device is disconnectable from the passivation liquid container; and the cleaning liquid supply device is used for cleaning the passivation liquid container after the passivation liquid container is used for discharging passivation liquid to the waste liquid collecting device.

5. The workpiece pretreatment apparatus according to claim 4, further comprising a passivation solution replenishment device; the passivation solution supplementing device is disconnectable from the passivation solution container;

the passivation solution supplementing device is used for adding passivation solution meeting the halogen ion preset concentration of the workpiece into the passivation solution container when the halogen ion concentration of the passivation solution does not meet the halogen ion preset concentration of the workpiece;

the passivation solution supplementing device is also used for adding passivation solution meeting the preset liquid level for workpiece passivation into the passivation solution container when the liquid level of the passivation solution does not meet the preset liquid level for workpiece passivation.

6. The apparatus for pretreating workpieces according to claim 1, wherein the sample container is used before cleaning the passivated workpieces with the cleaning liquid, and the sample container is further used for discharging a passivation liquid to the passivation liquid container after the workpieces are passivated;

the workpiece pretreatment equipment further comprises an air drying device;

the sample container is used for discharging passivation liquid to the passivation liquid container after the workpiece is passivated, and the air drying device is used for air-drying the workpiece.

7. The workpiece pretreatment apparatus according to any one of claims 1 to 6, wherein said workpiece pretreatment apparatus further comprises corrosion resistance detection means;

the sample container is also used for detecting the corrosion resistance of the workpiece after the workpiece is passivated;

and the sample container is used for cleaning the passivated workpiece by utilizing the cleaning liquid if the error of the actual corrosion resistance of the workpiece is less than or equal to 20% when the corrosion resistance detection times of the workpiece are less than or equal to the preset detection times.

8. The workpiece pretreatment apparatus according to claim 7, further comprising: a workpiece replacing device for replacing the workpiece in the sample container when an error of an actual corrosion resistance of the workpiece is more than 20%.

9. The apparatus for pretreating workpieces according to claim 7, wherein the theoretical passivation corrosion resistance R of the workpiece is₀Determining that the error of the actual corrosion resistance R of the workpiece satisfies Δ R = (R-R)₀)/R₀；

If the theoretical passivation corrosion resistance R of the workpiece₀Unknown, the error of the actual corrosion resistance R of the workpiece satisfies Δ R = (R)_i+1-R_i）/R_i(ii) a Wherein R is_iIndicating the corrosion resistance detection value of the workpiece at the ith time; and i is less than or equal to the preset detection times.

10. The workpiece pretreatment apparatus according to claim 5, wherein said sample container is used for cleaning the passivated workpiece with said cleaning liquid, and said component detection means is further used for detecting a passivation liquid density in a passivation liquid container;

the component detection device is used for detecting the halogen content of the passivation solution in the passivation solution container when the density variation of the passivation solution in the passivation solution container is higher than a variation threshold;

the passivation solution container is also used for discharging passivation solution to the waste liquid collecting device when the halogen content of the passivation solution in the passivation solution container is lower than a threshold value; the cleaning liquid supply device is used for cleaning the passivation liquid container;

the passivation solution container is further used for discharging upper passivation solution to the waste liquid collecting device when the detected halogen content of the demand is higher than a threshold value.

11. The apparatus for pretreating workpieces according to claim 10, wherein the composition detecting device is further configured to detect a halogen content of the passivation solution in the passivation solution container when a passivation solution liquid density variation in the passivation solution container is below a variation threshold;

the liquid density change amount of the passivation liquid is Δ = -the liquid density of the passivation liquid after passivation of the workpiece-the liquid density of the passivation liquid before passivation of the workpiece₀│；

The passivation solution supplementing device is used for adding passivation solution meeting the halogen content requirement into the passivation solution container when the halogen content of the passivation solution in the passivation solution container is lower than a threshold value.

12. The workpiece pretreatment apparatus of any of claims 1 to 6, wherein said workpiece is a laser discharge chamber component.