CN213339372U - A method of manufacturing a semiconductor device, comprising the steps of 1: 1 Special UV logo with accurate registration - Google Patents
A method of manufacturing a semiconductor device, comprising the steps of 1: 1 Special UV logo with accurate registration Download PDFInfo
- Publication number
- CN213339372U CN213339372U CN202022577931.1U CN202022577931U CN213339372U CN 213339372 U CN213339372 U CN 213339372U CN 202022577931 U CN202022577931 U CN 202022577931U CN 213339372 U CN213339372 U CN 213339372U
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- China
- Prior art keywords
- logo
- transparent pet
- special
- logo pattern
- pattern
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- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000004065 semiconductor Substances 0.000 title claims description 4
- 239000000049 pigment Substances 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims abstract description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000003292 glue Substances 0.000 claims description 4
- 238000003848 UV Light-Curing Methods 0.000 claims description 3
- 238000001723 curing Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000007639 printing Methods 0.000 abstract description 13
- 238000010023 transfer printing Methods 0.000 abstract description 3
- 230000008023 solidification Effects 0.000 abstract 1
- 238000007711 solidification Methods 0.000 abstract 1
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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Abstract
The utility model provides a 1: 1 special UVlogo of accurate counterpoint relates to pattern printing technical field, including the logo pattern, and the logo pattern is opaque pigment, the logo pattern is printed in transparent PET's front, transparent PET's front reprints has first layer texture, and the logo pattern inlays between transparent PET and first layer texture, and carries out the UV solidification in transparent PET openly, the utility model discloses a transparent PET is as printing substrate, and location is prepared in the printing, is difficult for appearing the overprint error, can improve product yield and efficiency greatly, also can do more exquisite texture effect; the utility model discloses a transfer printing layer thickness is only about 10um according to texture structure, and the naked eye openly can not see the drop basically to guarantee in the rendition that carries out two kinds of textures, two kinds of color effects that correspond realize 1: 1, accurate registration.
Description
Technical Field
The utility model relates to a pattern printing technical field especially relates to a 1: 1 precisely registered special UV logo.
Background
Overprinting, which means that image-text printing of each color plate is required to be in overlapping registration during multicolor printing, that is, single-color printing plates with different screen angles, which are prepared by color separation of an original, are sequentially overlapped and registered according to the color sequence of the printing plates, and finally, a printed product with the same level and color tone as the original is obtained by printing.
The logo corresponds different texture effects in the existing UV logo class product preparation technology, and traditional printing counterpoint mode overprinting is basically adopted, because positioning error during machine and product printing often has an error in overprinting, and operation yield and efficiency are not high, so that more exquisite texture effect is difficult to make.
SUMMERY OF THE UTILITY MODEL
The purpose of the utility model is to solve the shortcomings existing in the prior art, and the proposed 1: 1 precisely registered special UV logo.
In order to achieve the above purpose, the utility model adopts the following technical scheme: a method of manufacturing a semiconductor device, comprising the steps of 1: the special UV logo capable of being accurately registered comprises a logo pattern, wherein the logo pattern is made of opaque pigment, the logo pattern is printed on the front face of transparent PET, head layer textures are transferred to the front face of the transparent PET, the logo pattern is embedded between the transparent PET and the head layer textures, and UV curing is carried out on the front face of the transparent PET.
Preferably, the transparent PET can be made of PC or PMMA material.
Preferably, the front surface of the head layer texture is transferred with two layers of textures, and the transparent PET is irradiated with UV light for curing.
Preferably, the back of the transparent PET irradiates UV light, and glue at the corresponding position of the front of the logo pattern can be erased by alcohol to form a hollow groove.
Preferably, the back surface of the transparent PET is printed with an ink layer.
Advantageous effects
1. The utility model discloses a transparent PET is as printed substrate, and the location is prepared in the printing, is difficult for appearing the overprinting error, can improve product yield and efficiency greatly, also can do more exquisite texture effect.
2. The utility model discloses a transfer printing layer thickness is only about 10um according to texture structure, and the naked eye openly can not see the drop basically to guarantee in the rendition that carries out two kinds of textures, two kinds of color effects that correspond realize 1: 1, accurate registration.
Drawings
Fig. 1 is a cross-sectional view of a first embodiment of the present invention;
fig. 2 is a cross-sectional view of a second embodiment of the present invention;
fig. 3 is a cross-sectional view of a third embodiment of the present invention;
FIG. 4 is a cross-sectional view of a third embodiment of the present invention showing the top layer texture and the second layer texture after they have been dip-dyed;
fig. 5 is a cross-sectional view of a fourth embodiment of the present invention.
Illustration of the drawings:
1. a logo pattern; 2. a top layer texture; 3. transparent PET; 4. two layers of textures; 5. an empty groove; 6. and (4) an ink layer.
Detailed Description
In order to make the technical means, the creation features, the achievement purposes and the functions of the present invention easy to understand, the present invention will be further explained below with reference to the following embodiments and the accompanying drawings, but the following embodiments are only the preferred embodiments of the present invention, and not all embodiments are included. Based on the embodiments in the implementation, other embodiments obtained by those skilled in the art without any creative work belong to the protection scope of the present invention.
Specific embodiments of the present invention will be described below with reference to the accompanying drawings.
Specific example 1:
referring to fig. 1, a 1: 1, precisely registering a special UV logo, wherein the special UV logo comprises a logo pattern 1, the logo pattern 1 is made of opaque pigment, the logo pattern 1 is printed on the front surface of transparent PET3, the front surface of transparent PET3 is transferred with a head layer texture 2, the logo pattern 1 is embedded between the transparent PET3 and the head layer texture 2, and UV curing is carried out on the front surface of transparent PET 3; and the transparent PET3 can also be made of PC or PMMA material. The logo pattern 1 is printed according to the transparent PET3 substrate, so that the printing precision is guaranteed, overprinting errors are not prone to occurring, the product yield and efficiency can be greatly improved, and a more exquisite texture effect can be achieved.
Specific example 2:
referring to fig. 2, when the multi-layer texture transfer coating is performed, the front surface of the head layer texture 2 is transferred with the two layers of textures 4, and the back surface of the transparent PET3 is irradiated with UV light for curing, so that the two layers of textures 4 can be tightly coated on the surface of the transparent PET3, and the phenomenon of falling and mottling is not easy to occur.
Specific example 3:
referring to fig. 3-4, the back of transparent PET3 is irradiated with UV light, and the glue on the corresponding position of the front of logo pattern 1 can be wiped off with alcohol to form empty groove 5. because logo pattern 1 is made of opaque pigment, a region which is difficult to irradiate UV light appears on the corresponding position of logo pattern 1 on the front of transparent PET3, and the redundant and undried glue in the region can be dissolved in alcohol and can be wiped off with alcohol to prevent the surface of the ornament from being polluted.
Specific example 4:
referring to fig. 5, the back side of transparent PET3 is printed with ink layer 6, and two textures corresponding to two color effects realization 1 can be seen from the front side: 1 accurate register, and the transfer printing layer thickness is about 10um according to texture structure to guarantee in the rendition of carrying out two kinds of textures, two kinds of color effects that correspond realize 1: 1, accurate registration.
In the present disclosure, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact between the first and second features, or may comprise contact between the first and second features not directly. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It should be understood by those skilled in the art that the present invention is not limited by the above embodiments, and the description in the above embodiments and the description is only preferred examples of the present invention, and is not intended to limit the present invention, and that the present invention can have various changes and modifications without departing from the spirit and scope of the present invention, and these changes and modifications all fall into the scope of the claimed invention. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (5)
1. A method of manufacturing a semiconductor device, comprising the steps of 1: 1 special UV logo of accurate registration position, including logo pattern (1), and logo pattern (1) is opaque pigment, its characterized in that: the logo pattern (1) is printed on the front surface of the transparent PET (3), the front surface of the transparent PET (3) is transferred with the head layer texture (2), the logo pattern (1) is embedded between the transparent PET (3) and the head layer texture (2), and UV curing is carried out on the front surface of the transparent PET (3).
2. A method as claimed in claim 1, wherein said step of applying said coating comprises applying to said substrate a composition comprising: 1 special UV logo of accurate cover position, its characterized in that: the transparent PET (3) is made of PC or PMMA materials.
3. A 1: 1 special UV logo of accurate cover position, its characterized in that: the front surface of the head layer texture (2) is transferred with two layers of textures (4), and the back surface of the transparent PET (3) is irradiated with UV light for curing.
4. A method as claimed in claim 3, wherein said step of applying said coating comprises applying to said substrate a coating comprising one of the following 1: 1 special UV logo of accurate cover position, its characterized in that: and irradiating UV light on the back surface of the transparent PET (3), and erasing glue at the corresponding position on the front surface of the logo pattern (1) by using alcohol to form a hollow groove (5).
5. A 1: 1 special UV logo of accurate cover position, its characterized in that: the back of the transparent PET (3) is printed with an ink layer (6).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202022577931.1U CN213339372U (en) | 2020-11-10 | 2020-11-10 | A method of manufacturing a semiconductor device, comprising the steps of 1: 1 Special UV logo with accurate registration |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202022577931.1U CN213339372U (en) | 2020-11-10 | 2020-11-10 | A method of manufacturing a semiconductor device, comprising the steps of 1: 1 Special UV logo with accurate registration |
Publications (1)
Publication Number | Publication Date |
---|---|
CN213339372U true CN213339372U (en) | 2021-06-01 |
Family
ID=76076906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202022577931.1U Expired - Fee Related CN213339372U (en) | 2020-11-10 | 2020-11-10 | A method of manufacturing a semiconductor device, comprising the steps of 1: 1 Special UV logo with accurate registration |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN213339372U (en) |
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2020
- 2020-11-10 CN CN202022577931.1U patent/CN213339372U/en not_active Expired - Fee Related
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Legal Events
Date | Code | Title | Description |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20210601 |