CN213060192U - Probe for preparing ultra-smooth slider - Google Patents
Probe for preparing ultra-smooth slider Download PDFInfo
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- CN213060192U CN213060192U CN202020945751.1U CN202020945751U CN213060192U CN 213060192 U CN213060192 U CN 213060192U CN 202020945751 U CN202020945751 U CN 202020945751U CN 213060192 U CN213060192 U CN 213060192U
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- probe
- slider
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- platform
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- 239000000523 sample Substances 0.000 title claims abstract description 57
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 23
- 239000010937 tungsten Substances 0.000 claims abstract description 23
- 238000005530 etching Methods 0.000 claims abstract description 7
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 abstract description 8
- 238000010008 shearing Methods 0.000 abstract description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 18
- 229910002804 graphite Inorganic materials 0.000 description 17
- 239000010439 graphite Substances 0.000 description 17
- 238000011068 loading method Methods 0.000 description 8
- 230000006378 damage Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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Abstract
The utility model provides a probe for preparing super smooth slider, including tungsten filament and probe tip, wherein, through methods such as focused ion beam etching, a platform is located to etch at the probe tip, contacts with this platform and super smooth slider during the use to use the probe to contact super smooth slider from the top, exert normal pressure and shearing force, thereby promote the slider. The probe can avoid the problem that when the ultra-smooth slide block is large, the slide block is buckled and unstably under the pushing of the probe so as to be damaged.
Description
Technical Field
The utility model relates to a solid structure ultra-smooth field especially relates to a probe for preparing ultra-smooth slider.
Background
For a long time, friction and wear problems have been closely related not only to manufacturing, but also directly to energy, environment and health. Statistically, about one third of the world's energy is consumed during friction, and about 80% of machine component failures are caused by wear. The ultra-smooth structure is one of ideal schemes for solving the problem of frictional wear, and the ultra-smooth structure refers to the phenomenon that the friction and the wear between two atomic-level smooth and non-metric contact Van der Waals solid surfaces (such as two-dimensional material surfaces of graphene, molybdenum disulfide and the like) are almost zero. In 2004, the netherlands scientist j, Frenken, set of studies measured the friction of a few nm-sized (total of about 100 carbon atoms) graphite sheet stuck to a probe as it slides along the crystal planes of Highly Oriented Pyrolytic Graphite (HOPG), the first experiment confirming the presence of nano-scale super-lubrication. In 2013, zhengquan professor for the first time found the ultra-slip phenomenon between hopg (high Oriented cementitious graphite) sheet materials at micron scale, which marks the transition of ultra-slip from basic research to applicable technical research process.
The existing method for preparing the micron-scale ultra-smooth sliding block is to form a plurality of micron-scale graphite islands on the surface of an HOPG material by coating and patterning photoresist, etching the photoresist and part of graphite which is not protected by the photoresist. And then pushing away the graphite islands in sequence to form a super-slip surface, thereby preparing the super-slip slider. In the preparation process of the ultra-smooth slide block, pushing away the graphite islands is an important step, and whether the available ultra-smooth slide block and the ultra-smooth sliding surface can be obtained or not is determined. Generally, the etching preparation process of the graphite island array is mature, and the success rate is high. However, in the process of pushing away the graphite island in the prior art, the situation that the ultra-smooth slider cannot be obtained due to the damaged graphite island occurs.
The existing method for pushing the ultra-smooth sliding block is to push the graphite island by a probe, and the loading mode of the probe is to push the sliding block by applying a lateral force through the contact of the probe with the side surface of the ultra-smooth sliding block. However, this loading method is liable to cause damage to the slider. Specifically, with the increase of the size of the ultra-smooth slider, the slider is pushed by using the existing probe pushing loading mode, so that the slider is buckled and unstable in the out-of-plane direction, and at the moment, the slider is structurally damaged due to plastic deformation, fracture and the like, so that the ultra-smooth sliding cannot be normally realized. In addition, the ultra-smooth slide block with the counter bore on the top surface is processed, and the conventional probe is used for contacting the slide block at the counter bore and pushing the slide block so as to avoid the buckling instability problem. The counter bore processing technology is complex, and if the pressure applied by the probe to the counter bore is too high, the damage to the top surface of the sliding block can still be caused.
In a word, the probe loading mode in the existing ultra-smooth slider preparation method may cause buckling instability of the slider and structural damage, so that a qualified ultra-smooth slider cannot be obtained. This reduces the yield of mass-produced ultra-smooth sliders, and a simple solution is needed to solve the instability problem.
Disclosure of Invention
In order to solve the instability problem that the ultra-smooth slider may lead to after the probe loading, the following probe structure is provided: a platform is etched on a probe tip by methods such as focused ion beam etching, the size of the platform is close to that of the ultra-smooth sliding block, the platform is used for contacting the ultra-smooth sliding block, the loading mode is changed into a mode that the probe contacts the ultra-smooth sliding block from the top, and positive pressure and shearing force are applied, so that the sliding block is pushed.
The novel purpose is realized by the following scheme:
a probe for preparing an ultra-smooth slider comprises a first part, a tip part and a platform part, wherein the diameter of the first part is 0.1-0.5 mm, the radius of curvature of the tip part is 1-10 mu m, and the platform part is positioned at the front end of the tip part and is used for contacting the ultra-smooth slider.
Further, the probe is a tungsten probe.
Further, the first portion is a tungsten wire.
Further, the size of the platform part is close to the size of the ultra-smooth sliding block to be contacted.
Further, the size of the platform part is 2-8 mu m.
Further, the platform part is etched by a focused ion beam.
Further, the platform portion is at an angle of inclination to the tip portion.
Further, the tip portion is prepared by an electrochemical etching method.
This novel probe simple structure that provides is convenient, can avoid when the super smooth slider is great, thereby the slider takes place the problem that the bucking unstability received the destruction under the probe promotes. Simultaneously, use this novel structure that provides can improve the yield of batch production super smooth slider to have extensive suitability.
Drawings
Fig. 1 shows a buckling instability phenomenon occurring when a conventional tungsten probe is loaded and a graphite island structure is pushed.
Fig. 2 shows the structure of the tungsten probe proposed by the present invention.
Fig. 3 shows a perspective view of the tip portion of the tungsten probe proposed by the present invention.
Figure 4 shows a side view of the tip portion of the tungsten probe proposed by the present invention.
Fig. 5 shows a front view of a tip portion of a tungsten probe as proposed by the present invention.
Fig. 6 shows the process of pushing graphite island structures to make ultra-smooth sliders using the new proposed tungsten probe.
Reference numerals
1. The existing tungsten probe, 2, graphite island substrate, 3, graphite island slide block, 4, tungsten filament, 5, tungsten probe tip part, 6, tungsten probe tip platform
Detailed Description
The probe for preparing the ultra-smooth slider according to the present invention will be described in detail with reference to the accompanying drawings.
Fig. 1 shows a buckling instability phenomenon occurring when a conventional tungsten probe is loaded and a graphite island structure is pushed. The loading mode of the existing probe is that the tip of the probe contacts the side surface of the ultra-smooth sliding block, and lateral force is applied to push the sliding block. However, with the increase of the size of the ultra-smooth slider, the slider is pushed by using the existing probe pushing loading mode, so that the slider is buckled and unstable in the out-of-plane direction, and at the moment, the slider is structurally damaged due to plastic deformation, fracture and the like, so that the ultra-smooth sliding cannot be normally realized.
Fig. 2 to 5 show a tungsten probe according to the present invention, which includes a tungsten filament 4, a tip portion 5, a platform 6, wherein the diameter of the tungsten filament is about 0.1 to 0.5mm, the curvature radius of the tip portion is 1 to 10 μm, the tungsten filament and the platform are integrally formed by electrochemical etching, the platform 6 is located at the front end of the tip portion 5, the size of the platform is close to the size of a graphite island structure to be pushed, and the platform is about 2 to 8 μm, and the platform is etched by a focused ion beam at a certain inclination angle at the tip of the tungsten probe.
As shown in fig. 6, the tungsten probe is manipulated by the micro-nano mechanical arm, so that the platform 6 at the tip of the tungsten probe is in contact with the slider 3 from the top of the slider, and a certain positive pressure is applied. The probe is then manipulated to apply a shear force to the slide in a horizontal direction. The positive pressure applied to the slider 3 by the platform 6 of the tungsten probe tip at this time inhibits buckling instability of the slider 3, and therefore the ultra-smooth slider can be sheared and slid without causing structural damage to the slider. Meanwhile, because the contact area between the platform 6 of the tungsten probe tip and the top of the sliding block 3 is large, the normal stress is low under the same positive pressure, and the structural damage of the sliding block is further avoided.
The above description is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiment, but equivalent modifications or changes made by those skilled in the art according to the present invention should be included in the protection scope of the claims.
Claims (8)
1. A probe for preparing an ultra-smooth slider is characterized by comprising a first part (4), a tip part (5) and a platform part (6), wherein the diameter of the first part (4) is 0.1-0.5 mm, the radius of curvature of the tip part (5) is 1-10 mu m, and the platform part (6) is positioned at the front end of the tip part (5) and is used for contacting the ultra-smooth slider.
2. The probe of claim 1, wherein the probe is a tungsten probe.
3. The probe of claim 1, wherein the first portion is a tungsten wire.
4. A probe according to claim 1, characterized in that the platform part (6) has dimensions close to those of the ultra-smooth slider it is to contact.
5. A probe according to any of claims 1 to 4, wherein the size of the platform part (6) is 2 to 8 μm.
6. A probe according to any of claims 1-4, characterized in that the platform part (6) is etched out by means of a focused ion beam.
7. A probe according to any of claims 1-4, wherein the platform part (6) is at an inclination to the tip part (5).
8. The probe according to any of claims 1 to 4, wherein the tip portion (5) is prepared by electrochemical etching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020945751.1U CN213060192U (en) | 2020-05-29 | 2020-05-29 | Probe for preparing ultra-smooth slider |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020945751.1U CN213060192U (en) | 2020-05-29 | 2020-05-29 | Probe for preparing ultra-smooth slider |
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| Publication Number | Publication Date |
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| CN213060192U true CN213060192U (en) | 2021-04-27 |
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| CN202020945751.1U Active CN213060192U (en) | 2020-05-29 | 2020-05-29 | Probe for preparing ultra-smooth slider |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113627390A (en) * | 2021-08-30 | 2021-11-09 | 深圳清华大学研究院 | Positioning method, device and equipment based on image recognition |
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2020
- 2020-05-29 CN CN202020945751.1U patent/CN213060192U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113627390A (en) * | 2021-08-30 | 2021-11-09 | 深圳清华大学研究院 | Positioning method, device and equipment based on image recognition |
| CN113627390B (en) * | 2021-08-30 | 2023-12-01 | 深圳清华大学研究院 | Positioning method, device and equipment based on image recognition |
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