CN212954315U - Hydrogen peroxide purification device for low-temperature plasma sterilizer - Google Patents

Hydrogen peroxide purification device for low-temperature plasma sterilizer Download PDF

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Publication number
CN212954315U
CN212954315U CN202021650594.8U CN202021650594U CN212954315U CN 212954315 U CN212954315 U CN 212954315U CN 202021650594 U CN202021650594 U CN 202021650594U CN 212954315 U CN212954315 U CN 212954315U
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purification
hydrogen peroxide
chamber
fixed
low
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陈飞
王道军
查士洪
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JIANGYIN BINJIANG MEDICAL EQUIPMENT CO Ltd
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JIANGYIN BINJIANG MEDICAL EQUIPMENT CO Ltd
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Abstract

The utility model discloses a hydrogen peroxide purification device for low temperature plasma sterilizer relates to hydrogen peroxide purification technical field. The utility model discloses an evaporating chamber, bivalve body, purification room and vacuum pump, evaporating chamber fix outside the sterilization cabin, and the fixed intercommunication in evaporating chamber one end and bivalve body's entrance is fixed with purification valve and diffusion valve on the bivalve body respectively, and evaporating chamber upper portion is equipped with pressure detection sensor and first temperature sensor. The utility model discloses an utilize the boiling point of hydrogen peroxide and water different, water at first vaporization separation under the prerequisite of heating under the vacuum to realize the purification of hydrogen peroxide solution, through changing semiconductor refrigeration heating device polarity, make the purification room refrigerate to certain low temperature, utilize the vacuum pump to take out into vacuum with the purification room, after the evaporating chamber heating, water at first vaporizes, the vapor-liquid separation is realized through the condensation stick of purification room to the hydrogen peroxide of the water vapor winding of vaporization, avoid the hydrogen peroxide loss of purification process.

Description

Hydrogen peroxide purification device for low-temperature plasma sterilizer
Technical Field
The utility model belongs to the technical field of hydrogen peroxide purification, especially, relate to a hydrogen peroxide purification device for low temperature plasma sterilizer.
Background
Aiming at the hydrogen peroxide purification device used by the low-temperature plasma sterilizer, the hydrogen peroxide purification device and the control flow process on the market can not realize the purification of high concentration and the effective separation of water, can cause the problem of waste due to the loss of most hydrogen peroxide in the purification process, and can not effectively ensure the purification concentration.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a hydrogen peroxide purification device for low temperature plasma sterilizer, boiling point through utilizing hydrogen peroxide and water is different, water at first vaporization separates under the prerequisite of heating under the vacuum, thereby realize the purification of hydrogen peroxide solution, through changing the semiconductor refrigeration heating device polarity, make the purification room refrigerate to certain low temperature, utilize the vacuum pump to take out the purification room into vacuum, after the evaporating chamber heating, water is at first vaporized, the hydrogen peroxide of the water vapor winding of vaporization realizes vapour-liquid separation through the condensation stick of purification room, avoid the hydrogen peroxide loss of purification process.
In order to solve the technical problem, the utility model discloses a realize through following technical scheme:
the utility model relates to a hydrogen peroxide purification device for a low-temperature plasma sterilizer, which comprises an evaporation chamber, a double valve body, a purification chamber and a vacuum pump, wherein the evaporation chamber is fixed outside a sterilization cabin body;
one end of the evaporation chamber is fixedly communicated with an inlet of the double valve body, a purification valve and a diffusion valve are respectively fixed on the double valve body, and a pressure detection sensor and a first temperature sensor are arranged at the upper part of the evaporation chamber;
the purification chamber is fixed on the evaporation chamber, condensers are fixed on the opposite sides of the purification chamber, and a heating rod is fixed at the top of the purification chamber;
semiconductor refrigerating and heating devices are mounted at the bottom of the evaporation chamber and one side of the condenser, and radiators are arranged on the semiconductor refrigerating and heating devices;
the outlet on the purification valve and one side of the sterilization cabin body are respectively communicated with the pumping hole of the vacuum pump through pipelines.
Furthermore, condenser one side is equipped with a plurality of condensation sticks, and is a plurality of the condensation stick all is located the purification room, the condensation stick is the cone structure.
Furthermore, the length of the condensation bars of the condensers is the same as the width of the inner cavity of the purification chamber, and the condensation bars on the two condensers are distributed in a staggered mode.
Furthermore, a port on the evaporation chamber is fixedly communicated with a feeding pipe, one end of the feeding pipe is fixedly provided with a feeding device, and the feeding device is a peristaltic pump or a dosage pump.
The semiconductor refrigeration and heating device is electrically connected with the condenser, the vacuum pump, the purification valve, the diffusion valve, the pressure detection sensor, the temperature sensor and the feeding device.
Furthermore, a second temperature sensor is fixed on the condenser and electrically connected with the controller.
The utility model discloses following beneficial effect has:
1. the utility model discloses an utilize the boiling point of hydrogen peroxide and water different, water at first vaporization separation under the prerequisite of heating under the vacuum to realize the purification of hydrogen peroxide solution, through changing semiconductor refrigeration heating device polarity, make the purification room refrigerate to certain low temperature, utilize the vacuum pump to take out into vacuum with the purification room, after the evaporating chamber heating, water at first vaporizes, the vapor-liquid separation is realized through the condensation stick of purification room to the hydrogen peroxide of the water vapor winding of vaporization, avoid the hydrogen peroxide loss of purification process.
2. The utility model discloses a at the fixed semiconductor refrigeration heating device in evaporating chamber bottom, can refrigerate and heat the processing to the inside hydrogen peroxide solution of evaporating chamber, under negative pressure vacuum state, the boiling point of solution is lower relatively, consequently makes solution begin to heat by the low temperature carrying out the purification in-process, avoids the higher condition that causes hydrogen peroxide solution to evaporate in advance of initial temperature to improve the purification effect.
Of course, it is not necessary for any particular product to achieve all of the above-described advantages at the same time.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is an exploded view of a hydrogen peroxide purification apparatus for a low-temperature plasma sterilizer according to the present invention;
FIG. 2 is a schematic structural view of the present invention;
in the drawings, the components represented by the respective reference numerals are listed below:
1-evaporation chamber, 2-double valve body, 3-purification chamber, 4-purification valve, 5-diffusion valve, 6-pressure detection sensor, 7-condenser and 701-condensation rod.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts belong to the protection scope of the present invention.
Referring to fig. 1-2, the present invention relates to a hydrogen peroxide purification device for a low temperature plasma sterilizer, which comprises an evaporation chamber 1, a double valve body 2, a purification chamber 3 and a vacuum pump, wherein the evaporation chamber 1 is fixed outside a sterilization cabin;
one end of the evaporation chamber 1 is fixedly communicated with an inlet of the double valve body 2, the double valve body 2 is respectively fixed with a purification valve 4 and a diffusion valve 5, and the upper part of the evaporation chamber 1 is provided with a pressure detection sensor 6 and a first temperature sensor;
the purification chamber 3 is fixed on the evaporation chamber 1, a condenser 7 is fixed on each of the opposite sides of the purification chamber 3, and a heating rod is fixed on the top of the purification chamber 3;
the bottom of the evaporation chamber 1 and one side of the condenser 7 are both provided with a semiconductor refrigerating and heating device, and the semiconductor refrigerating and heating device is provided with a radiator;
the outlet on the purification valve 4 and one side of the sterilization cabin body are respectively communicated with the pumping hole of the vacuum pump through pipelines.
As shown in fig. 1-2, a plurality of condensation rods 701 are disposed on one side of the condenser 7, the condensation rods 701 are all located in the purification chamber 3, and the condensation rods 701 are in a cone structure.
As shown in fig. 1-2, the length of the condensation bars 701 of the condensers 7 is the same as the width of the inner cavity of the purification chamber 3, and the condensation bars 701 of the two condensers 7 are distributed in a staggered manner.
Wherein, the port department on the evaporating chamber 1 is fixed to be communicated with the material loading pipe, and material loading pipe one end is fixed with feed arrangement, and feed arrangement is peristaltic pump or dosage pump, can carry hydrogen peroxide solution in the evaporating chamber 1 through material loading pipe, feed arrangement and diffusion valve 5.
The semiconductor refrigeration and heating device comprises a semiconductor refrigeration and heating device, a vacuum pump, a purification valve 4, a diffusion valve 5, a pressure detection sensor 6, a first temperature sensor and a feeding device, wherein the semiconductor refrigeration and heating device is electrically connected with the controller.
Wherein, a second temperature sensor is fixed on the condenser 7 and electrically connected with the controller.
The utility model discloses a theory of operation does:
1. the vacuum pump vacuumizes the evaporation chamber 1 and the purification chamber 5 to reach a certain negative pressure state through a valve port on the purification valve 4;
2. inputting a hydrogen peroxide solution with a certain concentration into the evaporation chamber 1 by using a feeding device and a feeding pipe;
3. the semiconductor refrigerating and heating device refrigerates the solution in the evaporation chamber 1 into low-temperature solution;
4. vacuumizing the sterilization cabin body by using a vacuum pump, starting a diffusion valve 5 to realize the communication between the sterilization cabin body and an evaporation chamber 1, and keeping the sterilization cabin body, the evaporation chamber 1 and a purification chamber 5 in a negative pressure state after the communication;
5. controlling the semiconductor refrigerating and heating device to heat, evaporating the solution in the evaporation chamber 1, condensing a small amount of hydrogen peroxide in the purification chamber 5, evaporating water and discharging the water to the sterilization cabin body through the diffusion valve 5.
In the description herein, references to the description of "one embodiment," "an example," "a specific example," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The preferred embodiments of the present invention disclosed above are intended only to help illustrate the present invention. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise embodiments disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and its practical applications, to thereby enable others skilled in the art to best understand the invention for and utilize the invention. The present invention is limited only by the claims and their full scope and equivalents.

Claims (6)

1. The utility model provides a hydrogen peroxide purification device for low temperature plasma sterilizer, includes evaporating chamber (1), bivalve body (2), purification room (3) and vacuum pump, evaporating chamber (1) is fixed outside the sterilization cabin, its characterized in that:
one end of the evaporation chamber (1) is fixedly communicated with an inlet of the double valve body (2), a purification valve (4) and a diffusion valve (5) are respectively fixed on the double valve body (2), and a pressure detection sensor (6) and a first temperature sensor are arranged at the upper part of the evaporation chamber (1);
the purification chamber (3) is fixed on the evaporation chamber (1), a condenser (7) is fixed on each of the opposite sides of the purification chamber (3), and a heating rod is fixed at the top of the purification chamber (3);
semiconductor refrigerating and heating devices are mounted at the bottom of the evaporation chamber (1) and one side of the condenser (7), and radiators are arranged on the semiconductor refrigerating and heating devices;
the outlet on the purification valve (4) and one side of the sterilization cabin body are respectively communicated with the pumping hole of the vacuum pump through pipelines.
2. The hydrogen peroxide purification device for the low-temperature plasma sterilizer as claimed in claim 1, wherein a plurality of condensation rods (701) are arranged on one side of the condenser (7), the plurality of condensation rods (701) are all positioned in the purification chamber (3), and the condensation rods (701) are in a cone structure.
3. The hydrogen peroxide purification device for low-temperature plasma sterilizer as claimed in claim 2, wherein the length of the condensation bars (701) of the condensers (7) is the same as the width of the inner cavity of the purification chamber (3), and the condensation bars (701) of the two condensers (7) are distributed in a staggered manner.
4. The hydrogen peroxide purification device for the low-temperature plasma sterilizer as claimed in claim 1, wherein a feeding pipe is fixedly communicated with a port on the evaporation chamber (1), a feeding device is fixed at one end of the feeding pipe, and the feeding device is a peristaltic pump or a dosage pump.
5. The hydrogen peroxide purification device for the low-temperature plasma sterilizer as claimed in claim 4, further comprising a controller, wherein the condenser (7), the semiconductor refrigeration heating device, the vacuum pump, the purification valve (4), the diffusion valve (5), the pressure detection sensor (6), the first temperature sensor and the feeding device are all electrically connected with the controller.
6. The hydrogen peroxide purification device for the low-temperature plasma sterilizer as claimed in claim 1, wherein a second temperature sensor is fixed on the condenser (7), and the second temperature sensor is electrically connected with the controller.
CN202021650594.8U 2020-08-11 2020-08-11 Hydrogen peroxide purification device for low-temperature plasma sterilizer Active CN212954315U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202021650594.8U CN212954315U (en) 2020-08-11 2020-08-11 Hydrogen peroxide purification device for low-temperature plasma sterilizer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202021650594.8U CN212954315U (en) 2020-08-11 2020-08-11 Hydrogen peroxide purification device for low-temperature plasma sterilizer

Publications (1)

Publication Number Publication Date
CN212954315U true CN212954315U (en) 2021-04-13

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CN (1) CN212954315U (en)

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