CN212762560U - Workstation and dust pelletizing system that has it - Google Patents

Abstract

The application discloses workstation and dust pelletizing system. The workstation is used for intelligent crystal face machine, and intelligent crystal face machine includes the polishing subassembly. The workstation is including body, stoving subassembly and dust removal subassembly, and wherein, the body includes along the workstation that extends the setting with ground horizontal direction, and the stoving subassembly is acceptd in the body for dry polishing subassembly when intelligent brilliant face machine docks with the workstation, and the dust removal subassembly is acceptd in the body, is used for scraping the rubbish that will be attached to polishing subassembly when intelligent brilliant face machine docks with the workstation. In the workstation of this application, when the brilliant face machine of intelligence docks with the workstation, carry out drying process to polishing subassembly through the stoving subassembly, will adhere to the rubbish clearance on polishing subassembly by the dust removal subassembly again to polishing subassembly has been guaranteed to the nursing effect of ground stone material. Therefore, manual intervention on the polishing assembly is avoided, and user experience is improved.

Description

Workstation and dust pelletizing system that has it

Technical Field

The application relates to the technical field of robots, in particular to a workstation and a dust removal system with the same.

Background

In the related art, the stone care equipment can use a care pad or a scouring pad to perform care such as maintenance, renovation or cleaning on the floor stone. However, in the nursing process of the nursing pad or the cleaning pad, dust, nursing agent or cleaning agent and other garbage are attached to the nursing pad or the cleaning pad, which affects the normal nursing effect of the nursing pad or the cleaning pad.

SUMMERY OF THE UTILITY MODEL

In view of the above, the present application is directed to solving, at least to some extent, one of the problems in the related art. To this end, the object of the present application is to provide a workstation and a dust pelletizing system having the same.

The workstation of this application embodiment is used for intelligent brilliant face machine, intelligence brilliant face machine includes the polishing subassembly, the workstation includes:

the body comprises a workbench which extends along the horizontal direction with the ground;

the drying assembly is accommodated in the body and used for drying the polishing assembly when the intelligent wafer surface machine is in butt joint with the workstation;

and the dust removal assembly is contained in the body and is used for scraping the garbage attached to the polishing assembly when the intelligent crystal face machine is in butt joint with the workstation.

In the workstation of this application embodiment, carry out drying process to polishing subassembly through the stoving subassembly when the brilliant face machine of intelligence docks with the workstation, strike off the rubbish that will adhere to on polishing subassembly by the dust removal subassembly again for polishing subassembly becomes clean, and then has guaranteed the nursing effect of polishing subassembly to ground stone material, and, need not the manual work and intervene polishing subassembly, has reduced the recruitment cost, has promoted user experience.

In some embodiments, the upper surface of the work table is formed with a first opening, and the drying assembly includes:

the air duct is internally provided with a heating element and a first fan, the first fan is used for enabling heat generated by the heating element to form hot air, one end of the air duct is provided with an air outlet, and the hot air is blown out of the air outlet through the air duct;

the air outlet is communicated with the first opening, so that the hot air is blown out of the air outlet through the first opening to dry the polishing assembly.

So, first fan blows off hot-blast air to polishing subassembly from the air outlet in wind channel to dry polishing subassembly.

In some embodiments, the drying assembly further comprises:

the cover body is arranged at the air outlet;

the cover body is connected with the air outlet through the first elastic piece, when the workbench is in a non-working state, the sealing cover covers the air outlet under the action of the first elastic piece, and when the workbench is in a working state, the sealing cover is opened under the action of hot air.

So, through setting up lid and first elastic component, when the workstation is in unoperated state, sealed lid covers the air outlet under the effect of first elastic component, has avoided the rubbish that the polishing subassembly dropped to fall into in the wind channel from the air outlet.

In some embodiments, the upper surface of the table is formed with a second opening, and the dust removing assembly includes:

a scraping element exposed from the second opening for scraping off debris attached to the polishing assembly when the intelligent wafer machine is docked with the workstation.

So, strike off the component through setting up, when the brilliant face machine of intelligence docks with the workstation, the dust removal subassembly will be attached to polishing assembly's rubbish through striking off the component and scraping.

In certain embodiments, the dust extraction assembly comprises:

and the dust collection box is arranged below the scraping element and is contained in the second opening, and the dust collection box is used for collecting the garbage which is scraped by the scraping element and falls off.

So, dust removal component can be with polishing the last garbage collection that drops of subassembly through setting up the dust collection box.

In certain embodiments, the dust collection bin includes a mount, the dirt collection assembly further includes a mounting structure, the mounting structure including:

the mounting bracket is mounted on the mounting seat and is provided with a concave groove;

the movable element is movably arranged in the concave groove, and the scraping element is mounted on the movable element;

and the second elastic piece is arranged between the mounting bracket and the movable element and used for resetting the movable element.

So, through setting up mounting structure, the scraping component can be fixed on the dust collection box to guarantee that the rubbish that the scraping component will polish the subassembly and strike off falls into in the dust collection box.

In some embodiments, the mounting bracket comprises:

the clamping pieces are fixedly connected with the mounting seat and comprise two clamping pieces, and the two clamping pieces are arranged at intervals to form a movable space;

the mounting panel is installed in the activity space, the mounting panel be concave type form and include a diapire and respectively with two lateral walls that the diapire is connected and is relative to set up, two lateral walls respectively with two holding pieces pass through connecting piece swing joint, the connecting piece is adjustable the mounting panel with the mounted position of holding piece in vertical direction.

Thus, by arranging the clamping pieces and the mounting plate, the mounting position of the mounting plate in the vertical direction can be adjusted, and the mounting position of the scraping element can be changed.

In some embodiments, the workstation further comprises:

the dust collection assembly is accommodated in the body and communicated with the dust removal assembly and used for recovering the garbage scraped and dropped by the dust removal assembly.

Therefore, the dust collection assembly can recycle the garbage in the dust collection box, so that the garbage accumulation in the dust collection box is avoided.

In certain embodiments, the dust extraction assembly comprises:

a dust collection box, the dust collection box is arranged below the scraping element and is used for collecting the garbage which is scraped by the scraping element and falls;

the dust collection assembly comprises:

a dust collection box;

the connecting pipe is used for communicating the dust collecting box and the dust collecting box;

and the second fan is used for generating suction force to enable the garbage falling into the dust collecting box to be sucked into the dust collecting box through the connecting pipe.

Therefore, by arranging the dust collection box, the connecting pipe and the second fan, the first fan can suck the garbage in the dust collection box into the dust collection box through the connecting pipe.

In some embodiments, the workstation further comprises:

the adjusting element, the adjusting element includes a plurality ofly, a plurality of adjusting element sets up on the body to be used for adjusting the space between body and ground and/or wall.

So, through setting up adjusting element, can adjust the space between body and ground and/or wall, avoided the ground unevenness and leaded to the body slope.

The dust pelletizing system of this application includes as above-mentioned arbitrary workstation and intelligent crystal face machine, intelligence crystal face machine is including polishing subassembly, the workstation be used for with when the butt joint of intelligence crystal face machine clean polishing subassembly.

Therefore, the polishing assembly of the intelligent wafer surface machine can be cleaned through the workstation, and manual intervention on the polishing assembly is avoided. The labor cost is reduced, and the user experience is improved.

In workstation and dust pelletizing system of this application, carry out drying process to polishing subassembly through the stoving subassembly when intelligent brilliant face machine docks with the workstation, strike off the rubbish that will adhere to on polishing subassembly by the dust pelletizing subassembly again for the cleanness that polishing subassembly becomes, and then guaranteed the nursing effect of polishing subassembly to ground stone material, and, need not the manual work and intervene polishing subassembly, reduced the recruitment cost, promoted user experience.

Additional aspects and advantages of the present application will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the present application.

Drawings

The above and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:

FIG. 1 is a schematic block diagram of a workstation according to an embodiment of the present application;

FIG. 2 is a schematic structural diagram of the butt joint of a workstation and an intelligent crystal face machine according to the embodiment of the application;

FIG. 3 is a schematic structural diagram of a dust removal assembly, a drying assembly and a dust collection assembly according to an embodiment of the present application;

FIG. 4 is a schematic structural diagram of a drying assembly according to an embodiment of the present application;

fig. 5 is a schematic structural view of a dust box according to an embodiment of the present application;

FIG. 6 is a schematic view of a portion of the dust extraction assembly of an embodiment of the present application;

FIG. 7 is a schematic mechanical view of a suction assembly according to an embodiment of the present application;

FIG. 8 is a cross-sectional view of a vacuum assembly in accordance with an embodiment of the present application;

FIG. 9 is a schematic structural view of a polishing assembly according to an embodiment of the present application;

FIG. 10 is a schematic cross-sectional view of a polishing assembly according to an embodiment of the present application;

fig. 11 is a schematic structural diagram of a weight member according to an embodiment of the present application.

Description of the main element symbols:

the dust collecting device comprises a workstation 100, a body 10, a workbench 11, a first opening 111, a second opening 112, a cavity 12, a drying component 20, an air duct 21, an air outlet 211, a rotating rod 212, a heating component 22, a first fan 23, a cover 24, a connecting part 241, a first elastic member 25, a dust removing component 30, a scraping component 31, a scraping part 311, a connecting rod 312, a dust collecting box 32, a first bottom plate 321, a mounting groove 3211, a first side plate 322, a first accommodating space 323, a extending plate 324, a mounting seat 325, a mounting structure 33, a mounting bracket 331, a mounting lug 3311, a concave groove 3312, a clamping piece 3313, a waist-shaped groove 31, a mounting plate 3314, a bottom wall 33141, a side wall 33142, a connecting part 3315, a movable component 332, a second elastic member 333, a dust collecting component 40, a dust collecting box 41, a second bottom plate 411, a second side plate 412, a third opening 4121, a top plate 413, a filter element 414, a holding part 4141, a second accommodating space 415, A dust collecting chamber 4152, a connection pipe 42, a second fan 43, an adjusting member 50, a first sub adjusting member 51, a second sub adjusting member 52;

the intelligent wafer machine 200, the body bracket 210, the moving assembly 220, the guide wheel 2201, the driving wheel 2202, the polishing assembly 230, the polishing member 2301, the working plate 23011, the nursing pad 23012, the driving element 2302, the driving part 23021, the main body plate 2303, the open groove 23031, the limiting hole 23032, the connecting hole 23033, the rotating motor 2304, the rotating part 23041, the counterweight 2305 and the guide column 23051.

A dust removal system 1000.

Detailed Description

Reference will now be made in detail to embodiments of the present application, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative and are only for the purpose of explaining the present application and are not to be construed as limiting the present application.

In the description of the present application, it is to be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present application and for simplicity in description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and are not to be construed as limiting the present application. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.

In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; may be mechanically connected, may be electrically connected or may be in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.

In this application, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact of the first and second features, or may comprise contact of the first and second features not directly but through another feature in between. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.

The following disclosure provides many different embodiments or examples for implementing different features of the application. In order to simplify the disclosure of the present application, specific example components and arrangements are described below. Of course, they are merely examples and are not intended to limit the present application. Moreover, the present application may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, examples of various specific processes and materials are provided herein, but one of ordinary skill in the art may recognize applications of other processes and/or use of other materials.

At present, many places such as malls, office buildings, squares, etc. use stone such as marble to lay the floor. In order to ensure the cleanness of the floor, users need to perform care work such as maintenance, renovation or cleaning on the floor stones through stone care equipment.

In the related art, the stone care equipment generally uses a care pad or a scouring pad to care the floor stones. However, in the nursing pad or the scouring pad, during the nursing process, garbage such as nursing agent such as cleaning agent or waxing agent, dust, etc. may be attached to the nursing pad or the scouring pad, which may affect the nursing effect of the nursing pad or the scouring pad on the floor stone, and thus, the nursing pad or the scouring pad needs to be manually intervened to remove the attached dust, nursing agent, etc. Therefore, labor cost is increased, efficiency is low, and user experience is poor.

Referring to fig. 1 and 2, the present application provides a workstation 100 for an intelligent wafer machine 200, where the intelligent wafer machine 200 includes a polishing assembly 230. The workstation 100 comprises a body 10, a drying assembly 20 and a dust removing assembly 30. The body 10 comprises a workbench 11 extending along the horizontal direction of the ground, the drying assembly 20 and the dust removal assembly 30 are contained in the body 10, the drying assembly 20 is used for drying the polishing assembly 230 when the intelligent wafer surface machine 200 is in butt joint with the workstation 100, and the dust removal assembly 30 is used for scraping off garbage attached to the polishing assembly 230 when the intelligent wafer surface machine 200 is in butt joint with the workstation 100.

The intelligent wafer machine 200 comprises a body support 210, a moving assembly 220, a polishing assembly 230 and a control module. Wherein, remove subassembly 220 and polishing subassembly 230 and set up in the one side that body support 210 is close to ground, and intelligent brilliant face machine 200 removes through removing subassembly 220, and polishing subassembly 230 is used for nursing the ground stone material, and control module installs in body support 210, respectively with polishing subassembly 230 and removal subassembly 220 electric connection for control intelligent brilliant face machine 200 is automatic work under unmanned control.

Further, the moving assembly 220 includes a guide wheel 2201 and a driving wheel 2202, wherein the guide wheel 2201 is disposed on one side of the traveling end of the body support 210, and the driving wheel 2202 may include a plurality of wheels spaced apart from one side of the body support 210 close to the side away from the traveling end. Polishing assembly 230 includes polishing member 2301. In some examples, polishing member 2301 is disposed on a side of body bracket 210 near the ground between guide wheel 2201 and drive wheel 2202. In other examples, polishing member 2301 may be disposed at the forward-most end of body mount 210, i.e., polishing member 2301 is located at the front side of guide wheel 2201. The polishing assembly 230 treats the floor stone through the polishing member 2301. The number of the polishing members 2301 may be one or plural, and in this example, two polishing members 2301 are provided. When the smart crystal face machine 200 performs a polishing task, the polishing member 2301 rotates in a horizontal direction and contacts with the floor stone to perform a care such as waxing, polishing or cleaning on the floor stone.

The body 10 comprises a cavity 12 and a workbench 11, wherein the workbench 11 extends from the cavity 12 along the horizontal direction with the ground. The chamber 12 is substantially rectangular. The table 11 may be a single table or a plurality of tables, and may be set according to the position of the polishing member 2301 in the polishing assembly 230. For example, if the polishing member 2301 is disposed at the foremost end of the body frame 210, the table 11 may be one piece, and if the polishing member 2301 is disposed between the guide wheel 2201 and the drive wheel 2202, the table 11 may be a plurality of pieces.

In this example, the number of the work tables 11 is two, the two work tables 11 are arranged at intervals and communicated with the cavity 12, and the two work tables 11 and the cavity 12 enclose a horizontal limiting space. The drying assemblies 20 are arranged in the two work tables 11 symmetrically, the dust removing assemblies 30 are arranged in the two work tables 11 symmetrically, and the drying assemblies 20 and the dust removing assemblies 30 on each work table 11 are arranged at intervals. After the intelligent crystal face machine 200 finishes ground stone nursing, the control module controls the moving assembly 220 to move so that the intelligent crystal face machine 200 moves towards the workstation 100, the guide wheel 2201 enters the workstation 100 from the limiting space until the intelligent crystal face machine 200 is in butt joint with the workstation 11, and the polishing piece 2301 is opposite to the workstation 11.

Further, the work station 100 is started, specifically, the work station 100 performs a drying process on the polishing member 2301 through the drying assembly 20 to dry the polishing member 2301, and the dust removing assembly 30 contacts the polishing member 2301, so that the garbage attached to the polishing member 2301 is scraped, and the cleaning of the polishing member 2301 is ensured.

It can be understood that, since the intelligent wafer machine 200 usually sprays cleaning solution, waxing agent, etc. to the floor during the nursing process, it works in conjunction with the polishing member 2301. Therefore, in the process of nursing the floor stone by the polishing assembly 230, the polishing assembly 230 may be stuck with nursing agent and dust, and the drying assembly 20 performs drying treatment on the polishing assembly 230, so that the dust removing assembly 30 can scrape off the waste on the polishing member 2301.

Illustratively, polishing member 2301 remains horizontally rotated while station 100 cleans polishing assembly 230.

In conclusion, in the workstation 100 of this application, carry out drying process to polishing subassembly 230 when intelligent brilliant face machine 200 docks with workstation 100 through drying assembly 20, will adhere to the rubbish scraping on polishing subassembly 230 by dust removal subassembly 30 again for the cleanness that polishing subassembly 230 becomes, and then guaranteed polishing subassembly 230 to the nursing effect of ground stone material, and, need not the manual work and clean polishing subassembly 230, reduced the recruitment cost, promoted user experience.

In the following, explanation will be given by taking one table 11 of the station 100 having two tables 11 as an example, and it is understood that the two tables 11 are symmetrically disposed with respect to the limit space and are arranged identically.

Referring to fig. 1, 3 and 4, in some embodiments, a first opening 111 is formed on an upper surface of the working platform 11, and the drying assembly 20 includes an air duct 21, a heating element 22 and a first fan 23. The heating element 22 and the first fan 23 are disposed in the air duct 21, the first fan 23 is configured to enable heat generated by the heating element 22 to form hot air, an air outlet 211 is formed at one end of the air duct 21, the hot air is blown out from the air outlet 211 through the air duct 21, and the air outlet 211 is communicated with the first opening 111, so that the hot air is blown out from the air outlet 211 through the first opening 111 to dry the polishing assembly 230.

Specifically, the upper surface of the table 11 refers to a side of the table 11 away from the ground, and the lower surface of the table 11 refers to a side of the table 11 close to the ground. When the polishing module 230 is mated with the table 11, the upper surface of the table 11 faces the polishing member 2301 and is spaced apart from the polishing member 2301. The drying assembly 20 is installed in the work table 11 through an air duct 21. The air duct 21 includes two ends, the heating element 22 and the first fan 23 are disposed at one end of the drying assembly 20, and the other end is an air outlet 211 disposed at the first opening 111. The heating element 22 can generate heat, and the heat generated by the heating element 22 is heated by the first fan 23 and blown to the air outlet 211 through the duct, so that the heated air is blown out from the first opening 111 of the table 11 toward the polishing member 2301 to dry the polishing member 2301.

Further, the first opening 111 and the air outlet 211 are substantially in a bar shape to expand a drying range of the polishing member 2301 and improve a drying effect of the polishing member 2301, and of course, the first opening 111 and the air outlet 211 may have other shapes, such as a circle, an irregular shape, and the like, and the specific shape is not limited. The heating element 22 may be a PTC thermistor or a heating wire, etc., and the first fan 23 may be a blower.

Referring to fig. 4, in some embodiments, the drying assembly 20 further includes a cover 24 and a first elastic member 25, the cover 24 is installed at the air outlet 211, the cover 24 is connected to the air outlet 211 through the first elastic member 25, when the workbench 11 is in a non-working state, the cover 24 covers the air outlet 211 under the action of the first elastic member 25, and when the workbench 11 is in a working state, the cover 24 is opened under the action of hot air.

Specifically, the cover 24 is substantially in a long strip shape, and covers the air outlet 211, and the cross-sectional area of the cover 24 may be larger than that of the air outlet 211. The air duct further includes a rotating rod 212 disposed at the air outlet 211, the two ends of the cover 24 include a connecting portion 241 bent toward the air outlet 211, the rotating rod 212 is disposed on the connecting portion 241 to connect with the cover 24, and the cover 24 can rotate around the rotating rod 212. The first elastic member 25 is elastically connected to the rotating rod 212 and the connecting portion 241, and the cover 24 is disposed on the air outlet 211 to close the air duct 21.

When the workbench 11 is in the operating state, the first fan 23 blows the formed hot air to the air outlet 211, so that the cover 24 rotates around the rotating rod 212 to lift the cover 24 from the air outlet 211. When the workbench 11 is in a non-working state, the cover 24 rotates around the rotating rod 212 under the action of the first elastic member 25 to be reset, and is covered on the air outlet 211. It can be understood that when the garbage attached to the polishing member 2301 falls off, the garbage easily falls into the air duct 21 from the air outlet 211, and blocks the air duct 21. When the workbench 11 works, the first fan 23 blows hot air to the air outlet 211 to prevent the air outlet 211 from falling into the air duct 21, when the workbench 11 is in a non-working state, the first fan 23 cannot blow hot air to the air outlet 211, and the cover body 24 covers the air outlet 211 under the action of the first elastic piece 25 to isolate the air duct 21 from the outside, so that garbage is prevented from falling into the air duct 21 from the air outlet 211.

Referring to fig. 1, 3 and 6, in some embodiments, the upper surface of the working table 11 is formed with a second opening 112, and the dust removing assembly 30 includes a scraping element 31, and the scraping element 31 is exposed from the second opening 112 for scraping off the garbage attached to the polishing assembly 230 when the intelligent wafer machine 200 is docked with the working station 100.

The second opening 112 is substantially rectangular, is opened on the upper surface of the table 11, and is spaced apart from the first opening 111. The scraping element 31 comprises a scraping portion 311 and a link 312. Wherein the connecting rod 312 is movably arranged in the workbench 11 along the vertical direction, the scraping part 311 is basically a rod-shaped body and is arranged at a distance from the upper surface of the workbench 11, and part of the connecting rod 312 extends out of the workbench 11 from the second opening 112 and is connected with the scraping part 311. When the smart wafer machine 200 is docked with the workstation 100, the polishing member 2301 rotates horizontally, and the scraping element 31 contacts the polishing member 2301 through the scraping part 311, so as to scrape off the garbage attached to the polishing member 2301. The scraping element 31 may be formed by splicing the scraping portion 311 and the connecting rod 312, or may be integrally formed. As such, by providing the scraping element 31, when the intelligent wafer machine 200 is docked with the workstation 100, the dust removing assembly 30 scrapes off the garbage attached to the polishing assembly 230 through the scraping element 31.

Referring to fig. 5, in some embodiments, the dust removing assembly 30 includes a dust collecting box 32, the dust collecting box 32 is disposed below the scraping element 31 and is received in the second opening 112, and the dust collecting box 32 is used for collecting the garbage scraped and dropped by the scraping element 31.

The dust collecting box 32 is disposed in the workbench 11 and opposite to the second opening 112, the dust collecting box 32 is substantially rectangular, the lower surface of the dust collecting box 32 is connected to the workbench 11, and the connection mode of the dust collecting box 32 and the workbench 11 is not limited, such as welding, riveting or screwing.

Further, the dust box 32 includes a first bottom plate 321 and a first side plate 322. The first side plate 322 is vertically arranged and comprises a plurality of blocks, the first bottom plate 321 is connected with the bottoms of the plurality of first side plates 322 to form a first accommodating space 323 with an opening facing the scraping element 31, the first bottom plate 321 comprises a mounting groove 3211, and the first bottom plate 321 is fixedly connected with the workbench 11 through the mounting groove 3211.

Further, the dust collecting box 32 further includes an extending plate 324, the extending plate 324 includes a plurality of pieces, each extending plate 324 is correspondingly installed at one end of each first side plate 322 far away from the first bottom plate 321, the extending plate 324 extends from the first side plate 322 to the second opening 112 and partially extends out of the working table 11, and each extending plate 324 is obliquely arranged in a direction away from the first accommodating space 323, so as to form an enlarged collecting opening, thereby enlarging a collecting range of the dust collecting box 32 for the garbage, and reducing the garbage scraped by the scraping element 31 to fall onto the working station 100. In this way, by providing the dust box 32, the dust falling from the polishing assembly 230 by the scraping member 31 can be collected in the first accommodating space 323, and the falling dust is prevented from being accumulated on the work station 100 to affect the work of the scraping member 31.

Referring to fig. 5 and 6, in some embodiments, the dust collecting box 32 includes a mounting seat 325, the dust removing assembly 30 further includes a mounting structure 33, and the mounting structure 33 includes a mounting bracket 331, a movable member 332 and a second elastic member 333. The mounting bracket 331 is mounted on the mounting seat 325, the mounting bracket 331 is formed with a recess 3312, the movable member 332 is movably disposed in the recess 3312, the scraping member 31 is mounted on the movable member 332, and the second elastic member 333 is disposed between the mounting bracket 331 and the movable member 332 for restoring the movable member 332.

Specifically, the mount 325 is disposed in the first receiving space 323 and fixed on the first side plate 322. The mounting structure 33 is disposed in the dust collecting box 32, the mounting bracket 331 includes a mounting lug 3311, and the mounting bracket 331 is fixedly connected to the mounting base 325 via the mounting lug 3311, for example, by screwing or welding. The mounting bracket 331 includes a recessed groove 3312 formed to open toward the scraping element 31. The movable element 332 is movably disposed in the concave groove 3312, the link 312 of the scraping element 31 extends from the scraping portion 311 to the concave groove 3312 and passes through the movable element 332 and the mounting bracket 331 to connect the movable element 332 and the mounting bracket 331, the link 312 is fixed to the movable element 332, and the link 312 drives the movable element 332 to move in a vertical direction. The second elastic member 333 is disposed between the mounting bracket 331 and the movable element 332, respectively presses against the movable element 332 and the mounting bracket 331, and is sleeved on the connecting rod 312.

Further, the movable member 332 and the mounting bracket 331 respectively include through slots correspondingly arranged in a vertical direction, and the garbage scraped by the scraping member 31 can fall into the dust box 32 through the through slots.

Under the condition that the polishing assembly 230 is butted with the workstation 100, the polishing member 2301 is abutted against the scraping element 31, so that the scraping element 31 drives the movable element 332 to approach the mounting bracket 331 towards the vertical direction, the relative position between the polishing member 2301 and the scraping element 31 is changed, and the polishing member 2301 or the scraping element 31 is prevented from being damaged due to excessive abutting of the polishing member 2301 and the scraping element 31. In the case where the polishing assembly 230 and the workstation 100 are not docked, the second elastic member 333 presses against the movable element 332 so that the movable element 332 drives the scraping element 31 to return.

Referring to fig. 5, in some embodiments, the mounting bracket 331 includes two clamping pieces 3313 and a mounting plate 3314, the clamping pieces 3313 are fixedly connected to the mounting base 325, the two clamping pieces 3313 are spaced apart to form a movable space, the mounting plate 3314 is mounted in the movable space, the mounting plate 3314 is concave and includes a bottom wall 33141 and two side walls 33142 connected to the bottom wall 33141 and disposed opposite to the bottom wall, the two side walls 33142 are movably connected to the two clamping pieces 3313 through connecting pieces 3315, and the connecting pieces 3315 can adjust the mounting positions of the mounting plate 3314 and the clamping pieces 3313 in the vertical direction.

Specifically, the mounting ears 3311 are disposed on the side of the clamping pieces 3313 close to the ground, and the mounting ears 3311 may be formed by bending the clamping pieces 3313. The holding pieces 3313 are fixed to the mounting base 325 by mounting lugs 3311, and the two holding pieces 3313 are arranged in parallel at an interval to form a movable space in which the mounting plate 3314 is disposed. The mounting plate 3314 includes a bottom wall 33141 and a side wall 33142, the side wall 33142 includes two side walls 33142, and the two side walls 33142 are respectively bent and extended from two sides of the bottom wall 33141 close to the holding plate 3313 in a direction away from the ground. The recessed slot 3312 is bounded by a bottom wall 33141 and two side walls 33142. The two holding pieces 3313 are provided with symmetrically arranged slots 33131. The mounting bracket 331 further includes a connector 3315 which may be secured to the side wall 33142 by screwing, welding or riveting and extends from the side wall 33142 toward the tab 3313 and through the slot 33131. The connecting member 3315 may be fixed in the slot 33131 by a nut, and if the nut is unscrewed, the mounting plate 3314 may drive the connecting member 3315 to move vertically in the slot 33131, so as to adjust the mounting positions of the mounting plate 3314 and the holding plate 3313 in the vertical direction.

Referring to fig. 3, in some embodiments, the workstation 100 further includes a dust collection assembly 40 housed in the body 10, wherein the dust collection assembly 40 is in communication with the dust removal assembly 30 for collecting the garbage scraped and dropped by the dust removal assembly 30.

It will be appreciated that the dust container 32 has a limited volume and that the dust container 32 is easily filled with dust scraped off by the dust removing member 30 and falling into the dust container 32. Therefore, to avoid the accumulation of debris within the dust bin 32, the workstation 100 is also provided with a dust extraction assembly 40. Specifically, the dust suction assembly 40 is installed in the body 10 and communicates with the dust removal assembly 30. When the scraping member 31 scrapes the polishing member 2301, the dust collection assembly 40 operates to collect the garbage scraped by the dust collection assembly 30 and dropped into the dust collection box 32, thereby ensuring that no garbage is accumulated in the dust collection box 32.

Referring to fig. 7 and 8, in some embodiments, the dust suction assembly 40 includes a dust box 41, a connection pipe 42, and a second fan 43. The connection pipe 42 is used for connecting the dust box 32 and the dust box 41, and the second fan 43 is used for generating suction force to suck the garbage falling into the dust box 32 into the dust box 41 through the connection pipe 42.

Specifically, the dust box 41 is vertically disposed within the cavity 12, and a volume of the dust box 41 may be greater than a volume of the dust box 32. The dust box 41 includes a second bottom plate 411, a second side plate 412 and a top plate 413. Wherein the second bottom plate 411 is disposed near the lower surface of the cavity 12, the top plate 413 is disposed near the upper surface of the cavity 12, the second side plate 412 is vertically disposed between the second bottom plate 411 and the top plate 413, and is respectively connected to the second bottom plate 411 and the top plate 413, and encloses a second accommodating space 415, the second accommodating space 415 may be rectangular, circular or other irregular shapes, in this example, the second accommodating space 415 is rectangular. The top plate 413 is provided with a through hole, and the second fan 43 is installed on the top plate 413 and partially extends into the second accommodating space 415 from the through hole. The connection pipe 42 includes two ends, one end is connected to the second side plate 412 of the dust box 41, and the other end is connected to the dust box 32, so that the dust box 41 is communicated with the dust box 32, and when the dust collection assembly 40 is operated, the second fan 43 generates suction force in the second accommodation space 415 to suck the garbage in the dust box 32 into the second accommodation space 415 through the connection pipe 42.

Further, the dust bin 41 also comprises a filter element 414. The second side plate 412 is further opened with a third opening 4121, and the filter element 414 is detachably inserted into the second accommodating space 415 from the third opening 4121 to divide the second accommodating space 415 into a negative pressure chamber 4151 and a dust collecting chamber 4152. Wherein the negative pressure chamber 4151 is connected to the second fan 43. The Filter element 414 may be a High Efficiency Air Filter (HEPA) mainly used for filtering Particulate dust and various suspended substances above 0.5 um. When the dust collection assembly 40 is in operation, the second fan 43 draws air from the dust box 41 to form a negative pressure in the dust box 41, so that dust in the dust box 32 is sucked into the dust collection chamber 4152. It can be understood that if fine particles such as dust enter the second fan 43, the second fan 43 may be damaged or affected to work normally. In this manner, by providing the filter element 414, dust can be prevented from entering the negative pressure chamber 4151 to affect the second fan 43.

Further, the filter element 414 includes a holding portion 4141, and the user can draw the filter element 414 out of the third opening 4121 through the holding portion 4141 to clean and replace the garbage attached to the filter element 414, thereby ensuring that the negative pressure chamber 4151 and the dust chamber 4152 are communicated with each other when the second fan 43 is operated. The second bottom plate 411 is detachably connected to the second side plate 412, and a user can disconnect the second bottom plate 411 from the second side plate 412 to clean the dust chamber 4152.

In some examples, the dust collection assembly 40 further includes a fixing frame, the fixing frame is disposed on a side of the dust box 41 close to the ground, and the dust box 41 is fixed in the cavity 12 through the fixing frame.

Referring further to fig. 2, in some embodiments, the workstation 100 further includes a plurality of adjusting elements 50, and the plurality of adjusting elements 50 are disposed on the body 10 for adjusting the space between the body 10 and the ground and/or the wall.

The adjustment element 50 is adjustable in length, and the adjustment element 50 includes a plurality of first sub-adjustment elements 51 and a plurality of second sub-adjustment elements 52. Wherein, a plurality of first sub-adjusting elements 51 are respectively and uniformly arranged on the lower surfaces of the cavity 12 and the worktable 11, the body 10 is connected with the ground through the first sub-adjusting elements 51, and the first sub-adjusting elements 51 can adjust the space between the body 10 and the ground. The second sub-adjusting element 52 is installed on one side of the cavity 12 far away from the workbench 11, the body 10 is connected with the wall surface through the second sub-adjusting element 52, and the second sub-adjusting element 52 can adjust the space between the body 10 and the wall surface. It will be appreciated that if there is an uneven surface on the floor or wall, the workstation 100 may tilt, and therefore the polishing assembly 230 and the table 11 may be docked, so that the dust removing assembly 30 cannot completely scrape off all the garbage attached to the polishing member 2301, and the nursing effect of the polishing member 2301 may be affected. Therefore, by providing the first sub-adjustment element 51 and the second sub-adjustment element 52, the space between the body 10 and the ground and/or the wall surface can be adjusted, so that the dust removal assembly 30 can normally scrape off the garbage attached to the polishing member 2301 when the polishing assembly 230 is abutted to the working table 11.

The application also provides a dust removal system 1000, the dust removal system 1000 comprises the workstation 100 and the intelligent wafer machine 200 of any one of the above embodiments, the intelligent wafer machine 200 comprises a polishing assembly 230, and the workstation 100 is used for cleaning the polishing assembly 230 when being docked with the intelligent wafer machine 200.

In some embodiments, the intelligent wafer machine 200 further includes a sensor, which may be an image sensor, a distance sensor, a laser radar, or the like. The sensor is disposed at the moving end of the body bracket 210 and electrically connected to the control module. The sensor is used for acquiring object data information of the intelligent wafer machine 200 in the traveling direction and transmitting the object data information to the control module, so that the control module generates a control command to control the moving assembly 220 or the polishing assembly 230. For example, the position of the workstation 100 can be obtained by the intelligent wafer machine 200 through the sensor, and then the control module can plan the travel path according to the position information of the workstation 100, and finally the control module controls the moving assembly 220 to move to the workstation 100.

Referring to fig. 9 and 10, in some embodiments, polishing assembly 230 further comprises a drive element 2302, a body plate 2303 and a rotary motor 2304. The control module is electrically connected to the driving element 2302 and the rotating motor 2304, respectively. The driving member 2302 is vertically installed on the body bracket 210, and includes a driving part 23021 extending toward the ground in a direction perpendicular to the ground.

The main body plate 2303 is movably disposed between the body bracket 210 and the polishing element 2301, the main body plate 2303 includes an open slot 23031, the open slot 23031 is disposed on a side of the main body plate 2303 away from the ground, and a portion of the driving portion 23021 extends into the open slot 23031 and is connected to the main body plate 2303, and the specific connection manner is not limited. Under the control of the control module, the driving element 2302 can drive the driving portion 23021 to drive the main plate 2303 to move in the direction perpendicular to the ground.

The rotating motor 2304 is installed on the main body plate 2303, the rotating motor 2304 includes a rotating portion 23041 extending toward the ground, and the rotating motor 2304 is connected to the polishing member 2301 movably installed on one side of the main body plate 2303 near the ground through the rotating portion 23041. Under the control of the control module, the rotating motor 2304 can drive the rotating part 23041 to drive the polishing element 2301 to rotate in the horizontal direction by the rotating motor 2304.

In some embodiments, the polishing article 2301 includes a work plate 23011 and a care pad 23012, wherein the care pad 23012 is used to care for floor stones. The work plate 23011 and the nursing pad 23012 are substantially circular in configuration. The working plate 23011 is disposed on one side of the nursing pad 23012 close to the main body plate 2303, the working plate 23011 is mounted on the rotating portion 23041, and the rotating portion 23041 can drive the working plate 23011 to rotate in the horizontal direction. The nursing pad 23012 is detachably mounted on the work tray 23011. The nursing pad 23012 and the working plate 23011 are specifically installed in a non-limiting manner, for example, the nursing pad 23012 may be installed on the working plate 23011 by using a hook and loop fastener. It can be understood that the care pad 23012 may be worn due to the contact with the ground during the care process of the stone on the ground, which may affect the care effect of the care pad 23012. Therefore, in order to ensure the nursing effect of the nursing pad 23012, the nursing pad 23012 needs to be replaced frequently, and in order to ensure that the nursing pad 23012 can also achieve the optimal nursing state in different scenes, the nursing pad 23012 with different specifications and sizes may need to be adopted according to different scenes. In this manner, the nursing pad 23012 can be easily replaced by detachably attaching the nursing pad 23012 to the work tray 23011. Further, in other examples, the work tray 23011 can also be equipped with a removable brush tray, dust cart, or the like, to replace the nursing pad 23012, such that the polishing assembly 230 can clean the floor with a brush tray, dust cart, or the like.

Furthermore, the control module is further configured to control the rotating motor 2304, and when the polishing assembly 230 works, the rotating portion 23041 is controlled to rotate so as to adjust the rotating speed of the nursing pad 23012, thereby ensuring that the nursing pad 23012 can achieve a better nursing effect when the ground stone is polished and nursed.

Referring to fig. 10 and 11, in some embodiments, the polishing assembly 230 further includes a weight 2305, and the weight 2305 is detachably mounted on the main body plate 2303 for adjusting the nursing strength of the polishing assembly 230 to the ground stone.

It is understood that the stone used to lay the floor may include a plurality of stones, such as marble, granite, or artificial marble, etc., and the sanding force of the polishing assembly 230 may be different for different stones, for example, in some scenarios, too much sanding force of the polishing assembly 230 may cause the floor stone to be broken or worn during the nursing process, and for example, in some scenarios, too little sanding force of the polishing assembly 230 may not achieve the nursing effect and affect the finish of the floor stone. Because polishing assembly 230 is through polishing piece 2301 and ground contact, the weight of polishing assembly 230 is big more, and pressure to ground is then big more, and then polishing piece 2301 is also big more to the dynamics of polishing of ground stone material, and installs on main part board 2303 through balancing weight 2305 detachable, promptly, increase or demolish balancing weight 2305 on main part board 2303 in order to adjust the pressure of polishing assembly 230 to ground stone material, and then can adjust the dynamics of polishing piece 2301 to the grinding of ground stone material.

The main body plate 2303 further includes a plurality of limiting holes 23032 and connecting holes 23033, wherein the limiting holes 23032 and the connecting holes 23033 are circular holes and are disposed at the end of the main body plate 2303 at intervals. The weight 2305 includes a plurality of guide posts 23051 and a stripper. The guide column 23051 is substantially a rod, and is disposed in cooperation with the limiting hole 23032, and the diameter of the guide column 23051 is smaller than the limiting hole 23032, so that the guide column 23051 can be inserted into the limiting hole 23032 to limit the weight block 2305 on the main body plate 2303 when the weight block 2305 is mounted. The connecting hole 23033 is matched with the dismounting member, and the counterweight 2305 is detachably mounted on the connecting hole 23033 through the dismounting member. It can be understood that the weight 2305 is detachably mounted on the position-limiting hole 23032 and the connecting hole 23033 of the main body plate 2303 through the guide pillar 23051 and the dismounting member, and since the weight 2305 has a certain weight, the weight of the weight 2305 makes the guide pillar 23051 and the dismounting member stressed in the direction perpendicular to the ground, which may cause the guide pillar 23051 and the dismounting member to be bent and deformed, thereby affecting the dismounting and mounting of the weight 2305 on the main body plate 2303. Therefore, the weight 2305 is provided with the plurality of guide pillars 23051 and the detachable member, so that bending deformation of the guide pillars 23051 and the detachable member can be avoided, and convenience in detachment and installation of the weight 2305 on the main body plate 2303 can be ensured.

Further, the balancing weight 2305 can include a plurality of, and every balancing weight 2305 all includes a plurality of guide pillars 23051 and dismouting piece, and main part board 2303 includes spacing hole 23032 and the dismouting piece that is connected with a plurality of balancing weights 2305, and then increases or reduces balancing weight 2305 according to the ground scene is different. It can be understood that, because the ground surface paved with different stones has different grinding force bearing capacities on the intelligent crystal face machine 200, in order to enable the intelligent crystal face machine 200 to adapt to different scenes as much as possible, the pressure of the intelligent crystal face machine 200 on the ground surface can be adjusted by increasing or decreasing the number of the balancing weights 2305 mounted on the main body plate 2303, so that the polishing assembly 230 achieves the optimal care effect.

Further, the weight 2305 is substantially semi-annular, but the weight 2305 may be circular, rectangular or other irregular shapes, and the shape is not limited. The balancing weight 2305 can be an iron block, a lead block or a copper block and other metal blocks with large density to reduce the size, and the balancing weight 2305 can be guaranteed not to be damaged easily or to deform.

In the description herein, references to the description of the terms "one embodiment," "certain embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

While embodiments of the present application have been shown and described, it will be understood by those of ordinary skill in the art that: numerous changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the application, the scope of which is defined by the claims and their equivalents.

Claims (10)

1. A workstation for an intelligent crystal face machine, the intelligent crystal face machine including a polishing assembly, the workstation comprising:

the body comprises a cavity and a workbench extending from the cavity along the horizontal direction with the ground;

the drying assembly is accommodated in the body and used for drying the polishing assembly when the intelligent wafer surface machine is in butt joint with the workstation;

and the dust removal assembly is contained in the body and is used for scraping the garbage attached to the polishing assembly when the intelligent crystal face machine is in butt joint with the workstation.

2. The workstation of claim 1, wherein an upper surface of the table is formed with a first opening, the drying assembly comprising:

the air duct is internally provided with a heating element and a first fan, the first fan is used for enabling heat generated by the heating element to form hot air, one end of the air duct is provided with an air outlet, and the hot air is blown out of the air outlet through the air duct;

the air outlet is communicated with the first opening, so that the hot air is blown out of the air outlet through the first opening to dry the polishing assembly.

3. The workstation of claim 2, wherein the drying assembly further comprises:

the cover body is arranged at the air outlet;

the cover body is connected with the air outlet through the first elastic piece, when the workbench is in a non-working state, the cover body covers the air outlet under the action of the first elastic piece, and when the workbench is in a working state, the cover body is opened under the action of hot air.

4. The workstation of claim 1 wherein an upper surface of the table is formed with a second opening, the dust extraction assembly comprising:

a scraping element exposed from the second opening for scraping off debris attached to the polishing assembly when the intelligent wafer machine is docked with the workstation.

5. The workstation of claim 4, wherein the dust extraction assembly comprises:

and the dust collection box is arranged below the scraping element and is contained in the second opening, and the dust collection box is used for collecting the garbage which is scraped by the scraping element and falls off.

6. The workstation of claim 5, wherein the dust collection bin includes a mount, the dirt extraction assembly further including a mounting structure, the mounting structure including:

the mounting bracket is mounted on the mounting seat and is provided with a concave groove;

the movable element is movably arranged in the concave groove, and the scraping element is mounted on the movable element;

and the second elastic piece is arranged between the mounting bracket and the movable element and used for resetting the movable element.

7. The workstation of claim 6, wherein the mounting bracket comprises:

the clamping pieces are fixedly connected with the mounting seat and comprise two clamping pieces, and the two clamping pieces are arranged at intervals to form a movable space;

the mounting panel is installed in the activity space, the mounting panel be concave type form and include a diapire and respectively with two lateral walls that the diapire is connected and is relative to set up, two lateral walls respectively with two holding pieces pass through connecting piece swing joint, the connecting piece is adjustable the mounting panel with the mounted position of holding piece in vertical direction.

8. The workstation according to claim 4, further comprising:

the dust collection assembly is accommodated in the body and communicated with the dust removal assembly and used for recovering the garbage scraped and dropped by the dust removal assembly.

9. The workstation of claim 8, wherein the dust extraction assembly comprises:

a dust collection box, the dust collection box is arranged below the scraping element and is used for collecting the garbage which is scraped by the scraping element and falls;

the dust collection assembly comprises:

a dust collection box;

the connecting pipe is used for communicating the dust collecting box and the dust collecting box;

and the second fan is used for generating suction force to enable the garbage falling into the dust collecting box to be sucked into the dust collecting box through the connecting pipe.

10. A dust extraction system comprising the workstation of any one of claims 1-9 and an intelligent crystal face machine, the intelligent crystal face machine comprising a polishing assembly, the workstation for cleaning the polishing assembly when docked with the intelligent crystal face machine.

Images