CN212688170U

CN212688170U - Blue-black metal film and coated article

Info

Publication number: CN212688170U
Application number: CN202022196818.9U
Authority: CN
Inventors: 田梦军; 薛涛; 董悦
Original assignee: VDL Industry Shenzhen Co Ltd
Current assignee: VDL Industry Shenzhen Co Ltd
Priority date: 2020-09-29
Filing date: 2020-09-29
Publication date: 2021-03-12
Anticipated expiration: 2030-09-29

Abstract

The utility model relates to a blue black metal film and coating film goods. Wherein, blue black metal film includes: the metal priming layer is arranged on the surface of the base material and is made of at least one of Cr and Ti; the transition layer is arranged on the metal priming layer; the transition layer is made of TiCrCBN; the color reference layer is arranged on the transition layer and made of TiCBN; the color adjusting layer is arranged on the color reference layer and made of Cr. The blue-black metal film optimizes the hardness of the film layer through the matching of the metal priming layer, the transition layer, the color reference layer and the color adjusting layer, increases the wear resistance and corrosion resistance of the film, improves the comprehensive performance of the metal film, enables the metal film to still present uniform and stable blue black in products with curved surfaces such as slotted holes, included angles and steps, and can be widely applied to the field of high-end decorative coating.

Description

Blue-black metal film and coated article

Technical Field

The utility model relates to a film material technical field especially relates to a blue black metal film and coating film goods.

Background

The bluish black color has the visual characteristics of steady, low tone, rich technological sense and the like, so the bluish black color is favored by customers and markets, and TiAl alloy target materials and N are generally used in different proportions₂The preparation method is characterized in that the preparation method is carried out by reactive magnetron sputtering, the color of the film layer is controlled by adjusting the proportion of Ti, Al and N and adjusting the film thickness, and the film belongs to an interference film. The blue-black film prepared by the method has wide color adjusting range, easy color control and wide application at present. However, although the TiAlN film has a certain hardness and scratch resistance, the film has a significant color difference at the positions of a slot hole, an included angle, a step and the like on the surface of a workpiece, and the film has poor corrosion resistance and needs to be improved in corrosion resistance.

SUMMERY OF THE UTILITY MODEL

Accordingly, a blue black metal thin film having a uniform color and excellent corrosion resistance is required.

A blue-black metal thin film, comprising:

the metal priming layer is arranged on the surface of the base material;

the transition layer is arranged on the metal priming layer; the transition layer is made of TiCrCBN;

the color reference layer is arranged on the transition layer and made of TiCBN;

the color adjusting layer is arranged on the color reference layer and made of Cr.

The blue-black metal film comprises a metal priming layer, a transition layer, a color reference layer and a color adjusting layer which are sequentially arranged on a substrate, wherein the transition layer, the color reference layer and the color adjusting layer are respectively made of TiCrCBN, TiCbN and Cr, the hardness of the film layer can be optimized, the wear resistance and the corrosion resistance of the film are improved, the comprehensive performance of the metal film is improved, and the metal film can still present uniform and stable blue black in products with curved surfaces such as slotted holes, included angles and steps.

The utility model discloses above-mentioned blue black metal film can wide application in high-end decoration coating film field, for example electronic product such as clock and watch, cell-phone to and other ornaments, handicraft etc..

In some of these embodiments, the color-adjusting layer has a thickness of 0.01 μm to 0.1 μm.

In some of these embodiments, the color reference layer has a thickness of 0.2 μm to 1 μm.

Further, the thickness of the color reference layer is 0.2 to 0.5 μm.

In some of these embodiments, the transition layer has a thickness of 0.1 μm to 1.5 μm.

In some of these embodiments, the metal primer layer has a thickness of 0.1 μm to 0.5 μm.

In some of these embodiments, the metal primer layer is a Cr layer, a Ti layer, or a TiCr layer.

The utility model also provides a coated product, coated product includes the substrate and as above blue black metal film, blue black metal film locates on the substrate.

In some of these embodiments, the substrate is one of steel, titanium alloy, plastic, and ceramic.

In some of these embodiments, the coated article is an electronic device or an ornamental article.

Drawings

Fig. 1 is a schematic structural diagram of a blue-black metal film in a preferred embodiment of the present invention.

Detailed Description

In order to facilitate understanding of the present invention, the present invention will be described more fully hereinafter with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. The invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.

It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

The traditional TiAlN blue film adopts a TiAl alloy target material and N₂When the reactive magnetron sputtering preparation is carried out, the film thickness of the curved surface of the workpiece surface, such as a slot hole, an included angle, a step and the like, is thin and the color reaction is insufficient, so that obvious heterochrosis exists at the position of the curved surface, the appearance of the product is influenced, and the application on a high-end product is difficult; moreover, because the film structure contains Al element, the potential of Al is low, and the chemical property is active, the TiAlN blue film is easy to generate electrochemical corrosion in the film and between the film and the substrate, and the corrosion resistance is poor.

In order to solve the problems, the utility model adopts magnetron sputtering to utilize TiB target material, Cr target material and C₂H₂、N₂And performing reactive magnetron sputtering on the reaction gas to prepare the blue-black film with consistent surface color, and avoiding the problem of poor corrosion resistance caused by Al contained in the structure of the blue-black film.

As shown in fig. 1, an embodiment of the present invention provides a blue-black metal thin film 20, which includes a metal priming layer 21, a transition layer 22, a color reference layer 23 and a color adjusting layer 24 sequentially disposed on a surface of a substrate 10.

Wherein, the metal bottom layer 21 is a Cr layer, a Ti layer or a TiCr layer; the metal base layer 21 is deposited on the substrate 10 by a coating technology such as magnetron sputtering, and the bonding force between the film layer deposited subsequently and the substrate 10 can be improved.

The material of the transition layer 22 is TiCrCBN, which can improve the hardness and corrosion resistance of the film layer.

The material of the color reference layer 23 is TiCBN; the color reference layer 23, which has an L value adjustable between 28 and 38 and a b value adjustable between-3 and-20, determines the blue tone of the entire film.

The material of the color adjusting layer 24 is Cr; the layer can adjust the L value of the color reference layer 23, and the adjustment range of the film color is widened, so that the L value is adjustable between 28 and 60 under the condition that the blue basic tone is kept for the whole film layer.

The L value represents brightness, the value is 0-100, and the value is larger, the value is brighter; the value a represents the color information from green to magenta, the value is between-128 and +127, the color is more vivid when the absolute value is larger, and 0 represents that the color information from green and magenta does not exist; the value b represents the color information from blue to yellow, the value is between-128 and +127, the color is more vivid when the absolute value is larger, and 0 represents the color information without blue and yellow. The structure of the blue-black metal film does not contain Al, so that the problem of poor corrosion resistance caused by electrochemical corrosion easily generated inside the film layer and between the film layer and the base material due to the fact that the traditional TiAlN film contains Al with low potential and active chemical property is solved; meanwhile, nonmetal N, C and B are introduced into the color reference layer, so that the magnetron sputtering reaction is more sufficient due to the multi-component composition, the problem that different colors exist in the positions of a slotted hole, an included angle, a step and the like on the surface of a workpiece in a metal film prepared by the traditional TiAl alloy target material reaction magnetron sputtering is solved, and the whole film is determined to be uniform and consistent bluish black through the matching of the color reference layer 23 and the color adjusting layer 24.

In some embodiments, the color-adjusting layer 24 has a thickness of 0.01 μm to 0.1 μm. The Cr film has a high L value which can reach about 84, and the a and b values of the Cr film are close to 0, so that the influence on the a and b values of the color reference layer 23 is small, and the problems of too dark L value and narrow range of the color reference layer 23 can be solved by controlling the thickness of the color adjusting layer 24 to be between 0.01 and 0.1 mu m, so that the L value of the whole film can be adjusted to be between 28 and 60.

In some embodiments, the color reference layer 23 has a thickness of 0.2 μm to 1 μm. Preferably, the color reference layer 23 has a thickness of 0.2 μm to 0.5. mu.m.

In some embodiments, the thickness of the metal primer layer 21 is 0.1 μm to 0.5 μm, and the thickness of the transition layer 22 is 0.1 μm to 1.5 μm.

In some embodiments, the blue-black metal thin film 20 has a thickness of 0.5 μm to 3 μm.

Another embodiment of the present invention provides a method for preparing the blue composite film, which comprises depositing a metal priming layer, a transition layer, a color reference layer and a color adjusting layer on a substrate in sequence by using magnetron sputtering and other coating techniques.

Specifically, the method comprises the following steps S10-S40:

s10, depositing a metal bottom layer on the base material; the target material used for depositing the transition layer is at least one of Cr source and Ti source.

In some embodiments, the target material used to deposit the transition layer is at least one of a Cr target and a Ti target.

In some embodiments, a metal primer layer is formed using reactive magnetron sputtering deposition; the process conditions for depositing the metal bottom layer are as follows: introducing working gas Ar with the flow rate of 200 sccm-800 sccm and the pressure intensity of less than or equal to 8.0 multiplied by 10^-3Pa, bias voltage of 50-400V, arc current of 40-100A, and power of Cr target or Ti target of 3-12 kW.

Further, the deposition thickness of the metal base layer is 0.1-0.5 μm. Specifically, the thickness of the film layer can be controlled by controlling the deposition time, or the thickness of each film layer can be controlled by rotating the frame.

Wherein, the mode of revolving rack circle recording is: the sensor is arranged on the rotating frame, the rotating frame starts and finishes rotating from the same position every time, and the film thickness is controlled through the number of turns. The film thickness is controlled by adopting a rotating frame circle recording mode, the precision is high, and the film thickness is uniform.

From the viewpoint of magnetron sputtering technology and detection capability of film thickness of the thin film, the thinner the thin film, the more difficult the thickness accuracy is to control, especially for the coating of optical interference principle. A certain optical interference color can be reflected only in a certain film thickness, and the color of the film can be influenced by the fluctuation of the film thickness within dozens or even tens of nanometers. The utility model discloses a mode of above-mentioned revolving rack note circle is controlled thick membrane, can solve the thick inhomogeneous problem of revolving rack round individuality position membrane that relies on the arouse of control film forming time, improves the film forming uniformity, makes the colour unanimous with the stove coating.

Specifically, the substrate to be plated is arranged on a rotating frame of a magnetron sputtering film plating machine, and targets are arranged inside and outside the rotating frame to perform film deposition on the substrate to be plated. During the coating process, a software program is used for controlling the starting and stopping of the sputtering of the target material, a certain fixed point of the rotating frame is set as a counting point and is connected with the software program, and a certain fixed point of the furnace wall is provided with a receiver. The rotating frame rotates in the furnace, when the 'receiver' on the furnace wall senses the 'counting point' on the rotating frame for the first time, the number of turns is counted, the target is opened simultaneously for sputtering, and the first turn counting is completed when the 'counting point' is sensed for the second time. Thus, the rotating frame completes one circle of rotation, and the thickness of the coating deposited on the surface of the substrate to be plated on the rotating frame is consistent, namely the thickness of the coating on the whole rotating frame is uniform. For example, if the thickness of the coating is 0.1 micron after 50 revolutions of the turret, then the number of revolutions of the turret should be set to 100 in order to obtain a coating with a thickness of 0.2 micron.

In this embodiment, the time for depositing the metal primer layer is 10min to 50 min. Thus, the metal bottom layer with the thickness of 0.1-0.5 μm can be obtained by sputtering deposition.

In some embodiments, before the step of depositing the metal primer layer, the method further comprises the step of bombarding the substrate with a Cr arc target and/or a Ti arc target;

the technological conditions for bombarding the base material by adopting the Cr arc target and/or the Ti arc target are as follows: the pressure is less than or equal to 8.0 multiplied by 10 < -3 > Pa, the Ar gas flow is 200sccm to 800sccm, the bias voltage is 200V to 800V, the arc current is 40A to 100A, and the time is 3min to 10 min. Before depositing the metal base coat, the metal Cr or Ti arc target bombardment treatment is firstly carried out to activate the surface of the base material, and simultaneously, the residual foreign matters on the surface of the base material can be further removed.

In some embodiments, the substrate is cleaned prior to arc target bombardment to remove dirt, oil and other residual foreign matter from the surface of the workpiece, and the cleaned substrate is placed under vacuum at a pressure of 8.0 × 10 or less^-3Pa, and the temperature is 115-125 ℃. Different film forming temperatures are selected according to workpieces made of different materials, and lower film forming preheating temperature and vacuum degree are adopted, so that gas adsorption on the surface of the base material can be reduced.

S20, introducing carbon source reaction gas and N₂Reacting and depositing on the metal priming layer to form a transition layer; the target material used for depositing the transition layer provides a Cr source, a Ti source and a B source.

In some embodiments, the target materials used to deposit the transition layer are Cr targets and TiB targets.

In some embodiments, the carbon source reaction gas is selected from CH₄And C₂H₂And the like.

In some embodiments, the transition layer is formed using reactive magnetron sputter deposition; the process conditions for depositing the transition layer are as follows: introducing working gas Ar with the flow rate of 200 sccm-800 sccm and carbon source reaction gas C₂H₂The flow rate is 50sccm to 150sccm, and the reaction gas N₂The flow is 50 sccm-150 sccm, the bias voltage is 50V-400V, the Cr target power is 3 kW-12 kW, and the TiB target power is 3 kW-12 kW.

Further, the deposition time is 6min to 100 min. The thickness of the transition layer is controlled to be 0.1-1.5 mu m by controlling the deposition time.

S30, introducing carbon source reaction gas and N₂Reacting and depositing on the transition layer to form a color reference layer; the target material used to form the color reference layer provides a Ti source and a B source.

In some embodiments, the target material used to form the color reference layer is a TiB target.

In some embodiments, the color reference layer is formed using reactive magnetron sputter deposition; the process conditions for depositing the color reference layer are as follows: introducing working gas Ar with the flow rate of 200 sccm-800 sccm and reaction gas C₂H₂The flow rate is 150sccm to 300sccm, and the reaction gas N₂The flow rate is 50 sccm-150 sccm, the bias voltage is 50V-400V, and the TiB target power is 3 kW-12 kW.

Further, the deposition time is 40min to 200 min. The thickness of the color reference layer is controlled to be 0.2 μm to 1 μm by controlling the deposition time.

And S40, depositing a color adjusting layer on the color reference layer by using a Cr target.

In some embodiments, the process conditions for depositing the color adjusting layer are: and introducing working gas Ar with the flow rate of 200 sccm-800 sccm, the bias voltage of 50V-400V and the Cr target power of 0.5 kW-2 kW.

Further, the deposition time is 3min to 15 min. The thickness of the color adjusting layer is controlled to be 0.01-0.1 μm by controlling the deposition time.

Therefore, by reasonably controlling the preparation process of each film layer, a compact film layer can be prepared, and the comprehensive performance of the metal film is optimized.

Another embodiment of the present invention provides a coated article comprising a substrate and the blue-black metal thin film, wherein the blue-black metal thin film is disposed on the substrate.

In some embodiments, the substrate is one of steel, titanium alloy, plastic, and ceramic.

In some embodiments, the coated article is an electronic device or an ornamental article.

The coating product comprising the blue-black metal film has uniform blue-black surface, and can improve the corrosion resistance, wear resistance, scratch resistance and the like of the product.

The following are specific examples

Example 1

An electronic device comprises a substrate 10 and a blue black metal film 20 arranged on the surface of the substrate 10, wherein the substrate 10 is made of stainless steel.

As shown in fig. 1, the blue-black metal thin film 20 includes a metal primer layer 21, a transition layer 22, a color reference layer 23, and a color adjustment layer 24 sequentially deposited on a substrate 10.

Wherein, the metal bottom layer 21 is made of Cr and has a thickness of 0.3 μm; the transition layer 22 is made of TiCrCBN with the thickness of 0.8 μm; the color reference layer 23 is made of TiCBN and has a thickness of 0.35 μm; the color adjusting layer 24 was made of Cr and had a thickness of 0.04. mu.m.

The blue-black metal film 20 is deposited by adopting a medium-frequency magnetron sputtering technology, and the thickness of each layer of film is controlled by utilizing a rotating frame circle recording mode, and the method comprises the following steps:

1) and cleaning the base material 10 before deposition to remove dirt, oil stains and other residual foreign matters on the surface of the base material 10.

2) Preheating the cleaned base material in a vacuum chamber, and vacuumizing to pressure not more than 8.0 × 10^-3Pa, and the preheating temperature is 120 ℃.

3) And carrying out Cr arc target bombardment treatment on the preheated base material 10: the working gas Ar is introduced at a flow rate of 500sccm, and a bias voltage of 400V (duty cycle, the same applies below) and an arc current of 60A are applied to the substrate 10 for 7min to activate the substrate surface and further remove the residual foreign matters on the substrate surface.

4) And depositing a Cr bottom layer 21 on the surface of the base material: connecting the Cr target with a medium-frequency magnetron sputtering power supply, introducing working gas Ar, wherein the flow is 500sccm, the bias voltage is 200V, the Cr target power is 8kW, and the number of turns of the rotating frame is 120 (equivalent to the deposition time of 30 min).

5) And depositing a TiCrCBN transition layer 22 on the priming layer: the Cr target and the TiB target are connected with a medium-frequency magnetron sputtering power supply, working gas Ar is introduced, the flow rate is 500sccm, and reaction gas C₂H₂Flow rate of 100sccm and reaction gas N₂The flow rate was 100sccm, the bias was 200V, the Cr target power was 6.5kW, the TiB target power was 6.5kW, and the number of turns of the turret was 240 turns (corresponding to a time of 60 mi)n)。

6) Depositing a TiCbN color reference layer 23 on the TiCrCBN transition layer 22: the TiB target is connected with a medium-frequency magnetron sputtering power supply, working gas Ar is introduced with the flow of 500sccm and reaction gas C₂H₂A flow rate of 230sccm and a reaction gas N₂The flow is 100sccm, the bias voltage is 200V, the TiB target power is 7kW, and the film-forming turns of the rotating frame are adjusted to the target film thickness according to different parameter settings.

7) Depositing a Cr color adjusting layer 24 on the TiCBN color reference layer 23: the Cr target is connected with a medium-frequency magnetron sputtering power supply, working gas Ar is introduced, the flow is 500sccm, the bias voltage is 200V, the Cr target power is 1kW, and the number of turns of the rotating frame is 20 (equivalent to 5 min).

Example 2

An electronic device comprises a substrate and a blue black metal film arranged on the surface of the substrate.

The blue-black metal film comprises a metal priming layer, a transition layer, a color reference layer and a color adjusting layer which are sequentially deposited on a base material.

Wherein the metal bottom layer is made of Cr and has a thickness of 0.3 μm; the material of the transition layer is TiCrCBN, and the thickness is 0.8 mu m; the color reference layer 23 is made of TiCBN and has a thickness of 0.35 μm; the color adjusting layer 24 was made of Cr and had a thickness of 0.06. mu.m.

The blue black metal film is deposited by adopting a medium-frequency magnetron sputtering technology, and the thickness of each layer of film is controlled by utilizing a rotating frame circle recording mode, and the method comprises the following steps:

steps 1) to 6) are the same as in example 1.

7) And depositing a Cr color adjusting layer on the TiCBN color reference layer: the Cr target is connected with a medium-frequency magnetron sputtering power supply, working gas Ar is introduced, the flow is 500sccm, the bias voltage is 200V, the Cr target power is 1kW, and the number of turns of the rotating frame is 30 (equivalent to the time of 7.5 min).

Example 3

The decoration comprises a substrate and a blue black metal film arranged on the surface of the substrate.

Wherein the metal bottom layer is made of Cr and has a thickness of 0.3 μm; the material of the transition layer is TiCrCBN, and the thickness is 0.8 mu m; the color reference layer is made of TiCBN and has the thickness of 0.35 mu m; the color adjusting layer was made of Cr and had a thickness of 0.02. mu.m.

steps 1) to 6) are the same as in example 1.

7) And depositing a Cr color adjusting layer on the TiCBN color reference layer: the Cr target is connected with a medium-frequency magnetron sputtering power supply, working gas Ar is introduced, the flow is 500sccm, the bias voltage is 200V, the Cr target power is 0.5kW, and the number of turns of the rotating frame is 16 (equivalent to 4 min).

Example 4

The electronic device and the blue-black metal thin film of the electronic device in this embodiment 4 have similar structures and manufacturing methods to those of embodiment 1, except that the material of the primer layer is Ti.

Example 5

The blue-black metal thin film of the industrial electronic device and the blue-black metal thin film of the electronic device in this embodiment 5 has a structure similar to that of embodiment 1, except that the material of the primer layer is TiCr.

Comparative example 1

The electronic device of comparative example 1 and the blue-black metal thin film of the electronic device have a structure similar to that of example 1 except that: the color adjusting layer is not arranged, and the specific structure is as follows: the color film comprises a base material, a Cr metal priming layer, a TiCrCBN transition layer and a TiCbN color reference layer which are sequentially stacked on the base material.

Comparative example 2

The electronic device of comparative example 2 and the blue-black metal thin film of the electronic device have a structure similar to that of example 1 except that: the color reference layer is made of TiAlN and is not provided with a color adjusting layer.

The color and performance of the blue black metal film on the surface of the products of the above examples 1 to 5 and comparative examples 1 to 2 were tested, and the test method and test results are as follows:

1. color value testing: the samples after coating were tested for the L, a, b values according to the CIE-94 standard (L stands for lightness and darkness (black and white), + for lightness, -for darkness, -for red and green, + for magenta, -for green, -for yellow and b for yellow and for yellow, -for blue), using D65 as the standard illuminant.

2. And (3) testing the grids: after the film coating is finished, a cutting tool is used for scratching 1mm multiplied by 1mm small grids on the surface of the sample, then adhesive paper with fixed model is pasted at the grids, the adhesive paper is pulled off forcibly at an angle vertical to the surface of the sample, and pasting and tearing the adhesive paper are repeated for 3 times, and the sample is qualified when the adhesive force reaches or exceeds 4B.

3. And (3) water boiling hundred-grid test: and (3) placing the sample subjected to film coating in constant-temperature purified water at the temperature of 80 +/-2 ℃ for 30min, and performing a hundred-grid test, wherein the sample is qualified when the appearance is abnormal, obvious changes (such as corrosion, film layer falling and the like) are avoided, and the adhesive force reaches or exceeds 4B.

4. Vibration and wear resistance: and (3) placing the sample after the film coating, ceramsite, plastic granules and the like in a vibration resistant mill for vibration test for 2H, wherein the sample is qualified in the conditions that no coating falls off and slight scratch exists.

5. 24H vibration disc: and (3) placing the sample after the film coating and the ceramsite in a vibration disc testing machine for testing for 24H, wherein the sample is qualified in the conditions that no coating falls off and slight scratch exists.

6. DMGO TEST: after the sample is coated with the film, a Dimethylglyoxime (DMGO) solution is wiped on the surface of the sample, and the sample is qualified that the sample cannot change to pink after the test.

7. 72H salt spray test: and (3) placing the sample after the film coating is finished in a salt spray test box with the salt water concentration of 5% and the test temperature of 35 +/-1 ℃ for testing for 72H, and taking the sample surface after the test as qualified as free from corrosion, spots, decoloration, discoloration, cracks and swelling.

8. 2H chlorine water soaking test: and (3) soaking the sample after the film coating is finished in a mixed solution of saline water and a bleaching agent for 72H, and determining that the surface of the sample is qualified without corrosion, spots, decoloration, cracks and swelling after the test.

9. 72H high temperature and high humidity test: and (3) placing the sample after coating in a constant temperature and humidity box with the temperature of 85 ℃ and the humidity of 95% for 72H, and determining that the surface of the sample is free of corrosion, spots, decoloration, discoloration, cracks and swelling after testing.

TABLE 1

The utility model discloses a metallic film is blue black, and its appearance is unanimous, and the rete is fine and close, wear-resisting, resistant scraping and corrosion resisting property is good, and blue black metallic film's colour scope mainly is decided jointly by colour benchmark layer and colour adjustment layer, can stabilize that the L value is adjustable between 28 ~ 60, and the a value is adjustable between 0 ~ 5, and the b value is adjustable between-3 ~ 20.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only represent some embodiments of the present invention, and the description thereof is specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims

1. A blue-black metal thin film, comprising:

the metal priming layer is arranged on the surface of the base material;

the transition layer is arranged on the metal priming layer, and the material of the transition layer is TiCrCBN;

2. The blue-black metal thin film according to claim 1, wherein the thickness of the color adjusting layer is 0.01 μm to 0.1 μm.

3. The blue-black metal thin film according to claim 1, wherein the thickness of the color reference layer is 0.2 μm to 1 μm.

4. The blue-black metal thin film according to claim 3, wherein the thickness of the color reference layer is 0.2 μm to 0.5 μm.

5. The blue-black metal thin film according to claim 1, wherein the thickness of said transition layer is 0.1 μm to 1.5 μm.

6. The blue-black metal thin film according to claim 1, wherein the thickness of said metal primer layer is 0.1 μm to 0.5 μm.

7. The blue-black metal thin film according to any one of claims 1 to 6, wherein the metal primer layer is a Cr layer, a Ti layer or a TiCr layer.

8. A coated article comprising a substrate and the blue-black metal thin film according to any one of claims 1 to 7, wherein the blue-black metal thin film is provided on the substrate.

9. The coated article of claim 8, wherein the substrate is one of steel, titanium alloy, plastic, and ceramic.

10. The coated article according to claim 8 or 9, wherein the coated article is an electronic device or a decorative article.