CN101705471B - Preparation method of chromium nitride titanium aluminum nitrogen gradient hard reaction film - Google Patents
Preparation method of chromium nitride titanium aluminum nitrogen gradient hard reaction film Download PDFInfo
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- CN101705471B CN101705471B CN2009102202721A CN200910220272A CN101705471B CN 101705471 B CN101705471 B CN 101705471B CN 2009102202721 A CN2009102202721 A CN 2009102202721A CN 200910220272 A CN200910220272 A CN 200910220272A CN 101705471 B CN101705471 B CN 101705471B
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Abstract
The invention discloses a preparation method of a chromium nitride titanium aluminum nitrogen gradient hard reaction film. The preparation method sequentially comprises the steps of: firstly, deposition technology and determination of target elements; secondly, selection and pretreatment of workpieces; thirdly, determination of pre-bombardment technique; fourthly, determination of the deposition technique; fifthly, processing of vacuum heating; and sixthly, rotation of workpieces. In the invention, according to the method of preparing a multi-arc ion plated CrTiAlN nitrogen gradient hard reaction film by adopting a combination target of a chromium target and titanium aluminum alloy target, the CrTiAlN nitrogen gradient hard reaction film can be obtained; in addition, the nitrogen content of the CrTiAlN nitrogen gradient hard reaction film are distributed in gradient, the adhesive force is strong (not less than 150 N), and the hardness is high (not less than HV4200). The preparation method reduces the film coating cost, guarantees the synchronous realization of the high film layer hardness and adhesive force, reduces the internal stress of the film and has excellent stability and repeatability.
Description
Technical field:
The present invention relates to a kind of preparation method of nitrogen gradient hard reaction film, particularly adopt and make up the method that target prepares the multi-arc ion coating nitrogen gradient hard reaction film, such as the chromium nitride titanium aluminum nitrogen gradient hard reaction film preparation method of (following use " CrTiAlN " replaces " chromium nitride titanium aluminum ").
Background technology:
Multi-arc ion coating is a kind of physical vacuum deposition technique that is provided with a plurality of cathodic arc evaporation sources that can evaporate simultaneously, has distinguishing features such as sedimentation velocity is fast, rete dense structure, strong adhesion, good uniformity.This technology is applicable to the preparation of hard films and hard reaction gradient film, and at titanium nitride, TiAlN and the more preparation aspect achieving success application of polybasic hard reaction film.TiAlN, titanium nitride chromium, titanium base hard reaction films such as titanium nitride zirconium are because hardness height, characteristic and have more development prospect than titanium nitride film separately such as frictional coefficient is little, thermotolerance is strong, up to the present, multicomponent hard reaction gradient film mainly is base with the titanium and passes through to add units such as aluminium, zirconium, chromium and usually realize.
Be that mainly have following shortcoming: 1, be difficult on the multicomponent alloy target market buying, usually need special melting, processing, not only cost is higher, and the cycle is longer for the multicomponent hard reaction gradient film of base for the polynary hard reaction film of individual layer with the titanium; 2, the general easy contradiction that occurs between film hardness and the film adhesion, promptly hardness and sticking power are difficult to satisfy simultaneously; 3, in rete, produce bigger internal stress easily, influence the result of use and the work-ing life of hard films.
Summary of the invention
The preparation method who the purpose of this invention is to provide a kind of chromium nitride titanium aluminum (CrTiAlN) nitrogen gradient hard reaction film, this method has reduced coating cost, realize when having guaranteed high film hardness and high adhesive force, reduce the internal stress of rete, and have satisfactory stability and repeatability.
Technical scheme of the present invention is: the preparation method of a kind of chromium nitride titanium aluminum (CrTiAlN) nitrogen gradient hard reaction film comprises successively:
1, determining of deposition technique and target composition: determine the technology of preparing of multi-arc ion coating as the CrTiAlN nitrogen gradient hard reaction film, select two different azimuth for use and become the arc source starting the arc simultaneously of 90 degree configurations to deposit, one of them arc source is the chromium target of purity 99.99%, another arc source is the titanium-aluminum alloy target of purity 99.99%, and the atomic ratio of titanium-aluminum alloy target is Ti: Al=50: 50.
2, the selection of workpiece and pre-treatment: select commercial Wimet as workpiece material, before putting into coating chamber and carrying out plated film, use metal detergent that workpiece is carried out that routine is deoiled, decontamination is handled and carry out surface finish and handle, carry out ultrasonic cleaning with acetone and ethanol respectively at last, hair dryer dries up with standby.
3, bombard determining of technology in advance: refer to for obtain the ion bombardment technology that multi-arc ion coating CrTiAlN nitrogen gradient hard reaction film carried out before deposition, when coating chamber back of the body end vacuum reaches 10
-3Handkerchief, temperature charge into the reactant gases argon gas when reaching 240 ℃, make coating chamber vacuum tightness reach≤1.8 * 10
-1Handkerchief is opened two arc sources, keeps arc current at 55～56 amperes, carries out ion bombardment 10～12 minutes, and the bombardment bias voltage is increased to 400 volts gradually from 350 volts.
4, determining of depositing operation: refer to prepare the depositing operation that the CrTiAlN nitrogen gradient hard reaction film adopts for obtaining the multi-arc ion coating technology, coating process is divided into seven stages, and the first step remains on 2.0 * 10 with the ar pressure in the coating chamber
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 5 minutes; Second step fed nitrogen in coating chamber, make its partial pressure reach 0.5 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 10 minutes; The 3rd step increased nitrogen flow, made its partial pressure reach 1.0 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes; The 4th step, continue to increase nitrogen flow, make its partial pressure reach 1.5 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes; The 5th step, close the argon gas inlet, making argon flow amount is 0, partial pressure of ar gas is 0, and continues to increase nitrogen flow, makes its pressure reach 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes; In the 6th step, continuing increases nitrogen flow, makes its pressure reach 2.5 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes; In the 7th step, continuing increases nitrogen flow, makes its pressure reach 3.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes.
5, vacuum heating treatment: comprise workpiece heating and rete baking, the workpiece type of heating adopts electric heating element baking heating, and when workpiece heated, heat-up rate remained on 3～5 ℃/minute, can reach 240 ℃ after one hour; The rete baking is meant that deposition process finishes the back sedimentary CrTiAlN nitrogen gradient hard reaction film is carried out the post-heating baking, adopts little electric current to carry out little heating 10～15 minutes, and electric current is reduced to 30 amperes from 50 amperes gradually.
6, Workpiece Rotating: keep Workpiece Rotating in the whole process of workpiece heating, ion bombardment, film deposition, rete baking, rotating speed is 4～6 rev/mins always.
The method for preparing multi-arc ion coating CrTiAlN nitrogen gradient hard reaction film according to employing chromium target proposed by the invention and titanium-aluminum alloy target combination target, can obtain above-mentioned CrTiAlN nitrogen gradient hard reaction film, the nitrogen content distribution gradient of this CrTiAlN nitrogen gradient hard reaction film, strong adhesion (〉=150N), the hardness height (〉=HV4200).
Compare with prior art, the present invention has determined the technology of preparing of conventional general multi-arc ion coating as the ZrTiAlN nitrogen gradient hard reaction film, determine commercial chromium target and titanium-aluminum alloy target as arc source, avoided the limitation of special smelting, preparation zirconium titanium-aluminum alloy target, reduced coating cost; The present invention has determined target composition, quantity and configuration orientation, has determined that commercial YT15 Wimet is as workpiece material, determined the workpiece pre-treating technology, realize when having guaranteed high film hardness and high adhesive force, thereby help improving the friction durability of ZrTiAlN nitrogen gradient hard reaction film more, be more suitable in application in the cutter industry; The present invention has determined the depositing operation of ZrTiAlN nitrogen gradient hard reaction film, thereby guaranteed that prepared ZrTiAlN nitrogen gradient hard reaction film has tangible nitrogen content Gradient distribution on the coating growth direction, help reducing the internal stress of rete, and have satisfactory stability and repeatability.
Embodiment
Embodiment 1
Preparation CrTiAlN nitrogen gradient hard reaction film on commercial YT15 Wimet, its method is:
1, determining of deposition technique and target composition: determine the technology of preparing of multi-arc ion coating as the CrTiAlN nitrogen gradient hard reaction film, select two different azimuth for use and become the arc source starting the arc simultaneously of 90 degree configurations to deposit, one of them arc source is the chromium target of purity 99.99%, another arc source is the titanium-aluminum alloy target of purity 99.99%, and the atomic ratio of titanium-aluminum alloy target is Ti: Al=50: 50.
2, the selection of workpiece and pre-treatment: select commercial YT15 Wimet as workpiece material, before putting into coating chamber and carrying out plated film, use metal detergent that workpiece is carried out that routine is deoiled, decontamination is handled and carry out surface finish and handle, carry out ultrasonic cleaning with acetone and ethanol respectively at last, hair dryer dries up with standby.
3, bombard determining of technology in advance: refer to for obtain the ion bombardment technology that multi-arc ion coating CrTiAlN nitrogen gradient hard reaction film carried out before deposition, when coating chamber back of the body end vacuum reaches 10
-3Handkerchief, temperature charge into the reactant gases argon gas when reaching 240 ℃, make coating chamber vacuum tightness reach 1.8 * 10
-1Handkerchief is opened two arc sources, keeps arc current at 55～56 amperes, carries out ion bombardment 10 minutes, and the bombardment bias voltage is increased to 400 volts gradually from 350 volts.
4, determining of depositing operation: refer to prepare the depositing operation that the CrTiAlN nitrogen gradient hard reaction film adopts for obtaining the multi-arc ion coating technology, coating process is divided into seven stages, and the first step remains on 2.0 * 10 with the ar pressure in the coating chamber
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150 volts, depositing time 5 minutes; Second step fed nitrogen in coating chamber, make its partial pressure reach 0.5 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150 volts, depositing time 10 minutes; The 3rd step increased nitrogen flow, made its partial pressure reach 1.0 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150 volts, depositing time 15 minutes; The 4th step, continue to increase nitrogen flow, make its partial pressure reach 1.5 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150 volts, depositing time 15 minutes; The 5th step, close the argon gas inlet, making argon flow amount is 0, partial pressure of ar gas is 0, and continues to increase nitrogen flow, makes its pressure reach 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150 volts, depositing time 15 minutes; In the 6th step, continuing increases nitrogen flow, makes its pressure reach 2.5 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150 volts, depositing time 15 minutes; In the 7th step, continuing increases nitrogen flow, makes its pressure reach 3.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150 volts, depositing time 15 minutes.
5, vacuum heating treatment: comprise workpiece heating and rete baking, the workpiece type of heating adopts electric heating element baking heating, and when workpiece heated, heat-up rate remained on 3～5 ℃/minute, reached 240 ℃ after one hour; The rete baking is meant that deposition process finishes the back sedimentary CrTiAlN nitrogen gradient hard reaction film is carried out the post-heating baking, adopts little electric current to carry out little heating 15 minutes, and electric current is reduced to 30 amperes from 50 amperes gradually.
6, Workpiece Rotating: keep Workpiece Rotating in the whole process of workpiece heating, ion bombardment, film deposition, rete baking, rotating speed is 5 rev/mins always.
The CrTiAlN nitrogen gradient hard reaction film that uses method for preparing is tested, the nitrogen content distribution gradient of this CrTiAlN nitrogen gradient hard reaction film, sticking power reaches 170N, and hardness is up to HV4200.
Embodiment 2
Preparation CrTiAlN nitrogen gradient hard reaction film on commercial YT15 Wimet, its method is:
1, determining of deposition technique and target composition: determine the technology of preparing of multi-arc ion coating as the CrTiAlN nitrogen gradient hard reaction film, select two different azimuth for use and become the arc source starting the arc simultaneously of 90 degree configurations to deposit, one of them arc source is the chromium target of purity 99.99%, another arc source is the titanium-aluminum alloy target of purity 99.99%, and the atomic ratio of titanium-aluminum alloy target is Ti: Al=50: 50.
2, the selection of workpiece and pre-treatment: select commercial YT15 Wimet as workpiece material, before putting into coating chamber and carrying out plated film, use metal detergent that workpiece is carried out that routine is deoiled, decontamination is handled and carry out surface finish and handle, carry out ultrasonic cleaning with acetone and ethanol respectively at last, hair dryer dries up with standby.
3, bombard determining of technology in advance: refer to for obtain the ion bombardment technology that multi-arc ion coating CrTiAlN nitrogen gradient hard reaction film carried out before deposition, when coating chamber back of the body end vacuum reaches 10
-3Handkerchief, temperature charge into the reactant gases argon gas when reaching 240 ℃, make coating chamber vacuum tightness reach 1.8 * 10
-1Handkerchief is opened two arc sources, keeps arc current at 55～56 amperes, carries out ion bombardment 10 minutes, and the bombardment bias voltage is increased to 400 volts gradually from 350 volts.
4, determining of depositing operation: refer to prepare the depositing operation that the CrTiAlN nitrogen gradient hard reaction film adopts for obtaining the multi-arc ion coating technology, coating process is divided into seven stages, and the first step remains on 2.0 * 10 with the ar pressure in the coating chamber
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 250 volts, depositing time 5 minutes; Second step fed nitrogen in coating chamber, make its partial pressure reach 0.5 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 250 volts, depositing time 10 minutes; The 3rd step increased nitrogen flow, made its partial pressure reach 1.0 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 250 volts, depositing time 15 minutes; The 4th step, continue to increase nitrogen flow, make its partial pressure reach 1.5 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 250 volts, depositing time 15 minutes; The 5th step, close the argon gas inlet, making argon flow amount is 0, partial pressure of ar gas is 0, and continues to increase nitrogen flow, makes its pressure reach 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 250 volts, depositing time 15 minutes; In the 6th step, continuing increases nitrogen flow, makes its pressure reach 2.5 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 250 volts, depositing time 15 minutes; In the 7th step, continuing increases nitrogen flow, makes its pressure reach 3.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 250 volts, depositing time 15 minutes.
5, vacuum heating treatment: comprise workpiece heating and rete baking, the workpiece type of heating adopts electric heating element baking heating, and when workpiece heated, heat-up rate remained on 3～5 ℃/minute, reached 240 ℃ after one hour; The rete baking is meant that deposition process finishes the back sedimentary CrTiAlN nitrogen gradient hard reaction film is carried out the post-heating baking, adopts little electric current to carry out little heating 15 minutes, and electric current is reduced to 30 amperes from 50 amperes gradually.
6, Workpiece Rotating: keep Workpiece Rotating in the whole process of workpiece heating, ion bombardment, film deposition, rete baking, rotating speed is 5 rev/mins always.
The CrTiAlN nitrogen gradient hard reaction film that uses method for preparing is tested, the nitrogen content distribution gradient of this CrTiAlN nitrogen gradient hard reaction film, sticking power reaches 180N, and hardness is up to HV4300.
Claims (1)
1. the preparation method of a chromium nitride titanium aluminum nitrogen gradient hard reaction film, it is characterized in that: following use CrTiAlN replaces chromium nitride titanium aluminum, and a kind of preparation method of chromium nitride titanium aluminum nitrogen gradient hard reaction film comprises successively:
(1), determining of deposition technique and target composition: determine the technology of preparing of multi-arc ion coating as the CrTiAlN nitrogen gradient hard reaction film, select two different azimuth for use and become the arc source starting the arc simultaneously of 90 degree configurations to deposit, one of them arc source is the chromium target of purity 99.99%, another arc source is the titanium-aluminum alloy target of purity 99.99%, and the atomic ratio of titanium-aluminum alloy target is Ti: Al=50: 50;
(2), the selection of workpiece and pre-treatment: select commercial Wimet as workpiece material, before putting into coating chamber and carrying out plated film, use metal detergent that workpiece is carried out that routine is deoiled, decontamination is handled and carry out surface finish and handle, carry out ultrasonic cleaning with acetone and ethanol respectively at last, hair dryer dries up with standby;
(3), in advance bombard determining of technology: refer to for obtain the ion bombardment technology that multi-arc ion coating CrTiAlN nitrogen gradient hard reaction film carried out before deposition, when coating chamber back of the body end vacuum reaches 10
-3Handkerchief, temperature charge into the reactant gases argon gas when reaching 240 ℃, make coating chamber vacuum tightness reach≤1.8 * 10
-1Handkerchief is opened two arc sources, keeps arc current at 55～56 amperes, carries out ion bombardment 10～12 minutes, and the bombardment bias voltage is increased to 400 volts gradually from 350 volts;
(4), determining of depositing operation: refer to prepare the depositing operation that the CrTiAlN nitrogen gradient hard reaction film adopts for obtaining the multi-arc ion coating technology, coating process is divided into seven stages, and the first step remains on 2.0 * 10 with the ar pressure in the coating chamber
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 5 minutes; Second step fed nitrogen in coating chamber, make its partial pressure reach 0.5 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 10 minutes; The 3rd step increased nitrogen flow, made its partial pressure reach 1.0 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes; The 4th step, continue to increase nitrogen flow, make its partial pressure reach 1.5 * 10
-1Handkerchief is adjusted argon flow amount then, makes the mixed gas total pressure remain on 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes; The 5th step, close the argon gas inlet, making argon flow amount is 0, partial pressure of ar gas is 0, and continues to increase nitrogen flow, makes its pressure reach 2.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes; In the 6th step, continuing increases nitrogen flow, makes its pressure reach 2.5 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes; In the 7th step, continuing increases nitrogen flow, makes its pressure reach 3.0 * 10
-1Handkerchief, the arc current of titanium-aluminum alloy target and pure chromium target all places 55～56 amperes, and workpiece bias is 150～250 volts, depositing time 15 minutes;
(5), vacuum heating treatment: comprise workpiece heating and rete baking, the workpiece type of heating adopts electric heating element baking heating, and when workpiece heated, heat-up rate remained on 3～5 ℃/minute, reached 240 ℃ after one hour; The rete baking is meant that deposition process finishes the back sedimentary CrTiAlN nitrogen gradient hard reaction film is carried out the post-heating baking, adopts little electric current to carry out little heating 10～15 minutes, and electric current is reduced to 30 amperes from 50 amperes gradually;
(6), Workpiece Rotating: keep Workpiece Rotating in the whole process of workpiece heating, ion bombardment, film deposition, rete baking, rotating speed is 4～6 rev/mins always.
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