CN212620514U - Surface differential gauge and zero returning jig - Google Patents

Abstract

The utility model discloses a face differential gauge contains: a main scale having a first end and a second end opposite in an axial direction; a vernier scale slidable in an axial direction of the main scale, the vernier scale having claw arms extending perpendicularly to the axial direction; a base provided at the first end of the main scale, the base having a fixed base surface extending perpendicular to the axial direction; a probe foot connected to the claw arm, the probe foot having a movement measuring surface extending perpendicular to the axial direction, wherein the fixed base surface and the movement measuring surface are disposed opposite to each other. The surface differential gauge can simply and intuitively obtain an accurate clearance value and can also effectively protect the tip of the nozzle from being abraded. The utility model discloses provide a tool of zeroing for this face differential rule simultaneously.

Description

Surface differential gauge and zero returning jig

Technical Field

The utility model relates to a measuring tool technical field, in particular to face differential and be applicable to zero tool of this face differential.

Background

Photolithography is an essential process in the chip manufacturing process, and requires a nozzle to uniformly spray a developing solution onto the wafer surface. The conventional nozzle generally has a longitudinal structure extending in a radial direction of the wafer, and several tens to several hundreds of injection holes are distributed side by side at a tip end thereof facing the wafer. In order to ensure uniform spraying effect, the distance between the nozzle tip and the wafer surface needs to be strictly controlled within a proper range. The existing method of measuring the gap between the nozzle tip and the wafer is: standard wafers having different thicknesses (e.g., 0.8mm, 1.0mm, and 1.2mm) are placed on the wafer, and the wafer is rotated so that the standard wafers sequentially pass through the gap between the nozzle tip and the wafer. If the sheet can pass through the gap smoothly, the gap is larger than the thickness of the standard sheet; if the standard sheet cannot pass through the gap smoothly, the gap is smaller than the thickness of the standard sheet. The gap is thus defined, for example, in the range 0.8-1.0mm or 1.0-1.2 mm. However, the existing measurement methods have the following drawbacks: the standard sheet frequently contacts or rubs the tip of the nozzle during the measurement process, causing pollution or abrasion; the measurement is a range rather than an exact number; the position of the standard sheet is not fixed in the measuring process and is easy to lose.

Therefore, how to accurately measure the distance from the nozzle tip to the wafer is an urgent technical problem to be solved in the field of chip manufacturing.

SUMMERY OF THE UTILITY MODEL

In order to solve the prior technical problem, the utility model provides a face differential gauge, this face differential gauge can measure the clearance between nozzle and wafer with the mode that the probe moved up. And simultaneously, the utility model also discloses a zero setting tool that is used for this face differential gauge.

The foundation the utility model discloses, a surface differential gauge is provided, contain:

a main scale having a first end and a second end opposite in an axial direction;

a vernier scale slidable in an axial direction of the main scale, the vernier scale having claw arms extending perpendicularly to the axial direction;

a base provided at the first end of the main scale, the base having a fixed base surface extending perpendicular to the axial direction;

a probe foot connected to the claw arm, the probe foot having a movement measuring surface extending perpendicular to the axial direction, wherein the fixed base surface and the movement measuring surface are disposed opposite to each other.

According to an embodiment of the invention, the movement measuring surface is provided with hemispherical protrusions protruding in the axial direction and towards the second end.

According to the utility model discloses an embodiment, the face differential contains the fine motion frame of connecting claw arm and probe foot, and the fine motion frame is slidable along the direction perpendicular to axial direction for the claw arm.

According to an embodiment of the present invention, the probe has a zigzag structure.

According to the utility model discloses an embodiment is provided with digital display device on the vernier scale, and digital display device shows fixed base face and removes the distance of measuring between the face.

According to an embodiment of the present invention, the surface differential gauge has a first locking device for locking the vernier and a second locking device for locking the inching frame.

The foundation the utility model discloses, a return to zero tool for above-mentioned face difference gage is provided, contains:

an upper portion having a first plane;

a lower portion having a second plane opposite and parallel to the first plane;

a connecting part connecting the upper part and the lower part;

wherein, the first plane and the second plane have a specified standard distance, and the area of the second plane is larger than that of the first plane.

According to the utility model discloses an embodiment, the standard distance is the perpendicular distance at the horizontal base face of base and the steel ball top of probing the foot when the face difference rule returns zero.

According to an embodiment of the utility model, standard distance shows on the visual surface of the tool that returns to zero.

According to the utility model discloses an embodiment, zero tool is made by the stainless steel.

Due to the adoption of the technical scheme, compared with the prior art, the utility model have the following advantage:

1. by measuring the distance from the wafer to the lower surface of the nozzle with the probe pin moved up, the nozzle tip height (known) is subtracted from this distance to obtain an accurate value for the nozzle tip to wafer gap.

2. The surface differential gauge cannot be contacted with the tip of the nozzle in the measuring process, so that pollution and abrasion are avoided.

3. By means of the matched zero-returning fixture, the gap between the tip of the nozzle and the wafer can be directly measured.

Drawings

FIG. 1 shows a schematic view of a nozzle for a lithographic process;

FIG. 2 shows a side view of the nozzle and wafer;

fig. 3 shows a schematic view of an embodiment of a face differential gauge according to the present invention;

fig. 4 shows a block diagram of one embodiment of a zeroing fixture according to the present invention;

fig. 5 shows a side view of the zeroing jig of fig. 4.

In the figure, the position of the upper end of the main shaft,

1 nozzle, 11 nozzle main body, 12 nozzle tip, 2 wafer, 3-plane differential gauge, 31 main scale, 311 first end part, 312 second short column, 32 vernier scale, 321 claw arm, 322 digital display device, 323 first locking device, 33 base, 331 fixed base surface, 34 probe, 341 moving measurement surface, 342 hemispherical bulge, 35 micro-moving frame, 351 second locking device, 4 zero-returning jig, 41 upper part, 411 first plane, 42 lower part, 421 second plane, 43 connecting part.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be further described in detail with reference to the following embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.

Fig. 1 and 2 show a nozzle 1 for a lithographic process and a schematic representation of its operation. As shown, the nozzle 1 has a generally elongated configuration, including a nozzle body 11 and a nozzle tip 12 at the bottom thereof. Wherein the nozzle tip 12 extends downward from a flat bottom surface of the nozzle body 11 and has a substantially inverted triangular cross-section with a plurality of injection holes distributed side by side along the bottom thereof. In the photolithography process, the nozzle 1 is vertically arranged above the wafer 2 such that a plurality of injection holes are arranged at the same height x above the wafer 2 in a radial direction of the wafer 2. Typically, a particular type of nozzle tip 12 has its fixed height h, e.g., 8mm for nozzle tips 12 of E2 and E3 and 7mm for nozzle tips 12 of LD. Thus, the distance H from the flat bottom surface of the nozzle body 11 to the wafer 2 can be measured, and the accurate value of the nozzle tip-to-wafer gap can be obtained by subtracting the height H of the nozzle tip 12 from the distance H.

Fig. 3 shows an embodiment of a surface difference gauge according to the present invention, which can measure the distance H from the flat bottom surface of the nozzle body 11 to the wafer 2 by moving the probe upward. Specifically, the surface difference gauge 3 generally includes a main scale 31 and a vernier 32 slidable in the axial direction of the main scale 31. Wherein the main scale 31 has a first end 311 and a second end 312 opposite in the axial direction, and a base 33 is provided at the first end 311 of the main scale 31, the base 33 having a fixing base 331 extending perpendicular to the axial direction of the main scale 31. The vernier 32 has a claw arm 321 extending perpendicularly to the axial direction of the main scale 31. A probe 34 may be connected to the claw arm 321, the probe 34 having a movement measuring surface 341 extending perpendicular to the axial direction of the main scale 31, wherein the movement measuring surface 341 and the fixed base surface 331 of the base 33 are disposed opposite to each other. During measurement, the vernier scale 32 is moved in the axial direction until the moving measurement surface 341 of the probe 34 contacts the flat bottom surface of the nozzle body 11 by simply placing the fixed base surface 331 of the base 33 horizontally against the surface of the wafer 2, and at this time, the vertical distance between the moving measurement surface 341 of the probe 34 and the fixed base surface 331 of the base 33 is the distance H from the flat bottom surface of the nozzle body 11 to the wafer 2.

Preferably, a hemispherical protrusion 342 protruding toward the second end 312 in the axial direction of the main scale 31 may be provided on the moving measuring surface 341 so that the probe 34 is in point contact with the flat bottom surface of the nozzle body 11 to further improve the measuring accuracy and precision. In an embodiment of the present invention, the probe 34 may have a zigzag structure. Alternatively, the probe 34 may have other configurations for facilitating measurement, such as an L-shape, etc.

The face difference gauge 3 may further comprise a micro-motion frame 35 connecting the claw arm 321 and the probe 34, wherein the micro-motion frame 35 is in turn slidable with respect to the claw arm in a direction perpendicular to the axial direction in order to adjust the lateral distance of the claw arm 321 and the probe 34.

The vernier 32 of the face difference gauge 3 may be a conventional scale type vernier to read a measurement value by recognizing the scale on the main scale 31 and the vernier 32. Alternatively, it is also possible to provide a digital display device 322 on the vernier 32 to obtain a digital type vernier, and directly display the measured value on the display screen of the digital display device 322. To facilitate locking of the surface difference 3 when reading the measurement, first 323 and second 351 locking means may be provided on the vernier 32 and micromotion frame 35, respectively, to avoid unwanted movement of the vernier 32 and micromotion frame 35.

Fig. 4 and 5 show one embodiment of a zeroing jig for the face differential 3. The zeroing jig 4 generally includes an upper portion 41 having a first plane 411, a lower portion 42 having a second plane 421, and a connecting portion 43 connecting the upper portion 41 and the lower portion 42. Wherein the first plane 411 of the upper portion 41 is opposite to and parallel to the second plane 421 of the lower portion 42, and the area of the second plane 421 is significantly larger than that of the first plane 411. In particular, the zeroing jig 4 of the present invention is not "zeroing" in the conventional sense, but rather defines a specified nozzle tip 12 height h between the first plane 411 and the second plane 421 for the measurement process of the gap between the nozzle tip 12 and the wafer 2. Therefore, when the fixed base surface 331 of the base 33 of the surface difference gauge 3 is horizontally placed in close contact with the second plane 421 of the zero setting jig 4, the vernier scale 32 is moved in the axial direction until the hemispherical protrusion 342 of the probe 34 contacts the first plane 411 of the zero setting jig 4, and at this time, the vertical distance between the top end of the hemispherical protrusion 342 of the probe 34 and the fixed base surface 331 of the base 33 is the standard distance between the first plane 411 and the second plane 421 of the zero setting jig 4, namely, is equal to the height h of the specified nozzle tip 12. In this case, the surface gauge 3 is zeroed, that is, the measured value is "0" displayed on the display screen of the digital display device 322 of the surface gauge 3. When the distance H from the flat bottom surface of the nozzle body 11 to the wafer 2 is measured by using the surface difference gauge 3 after the zeroing, although the actual vertical distance between the movable measuring surface 341 of the probe 34 and the fixed base surface 331 of the base 33 is H, the distance x from the nozzle tip 12 to the wafer 2 can be directly read by subtracting the height H of the nozzle tip 12 from the measured value displayed on the display screen thereof.

Zero fixtures 4 with different standard distances may be used for different models of nozzles 1. Preferably, the standard distance may be displayed on the visible surface of the zeroing jig 4 for easy recognition. The zero-resetting jig 4 is preferably made of a material with good wear resistance, such as stainless steel, so as to ensure the accuracy and long service life of the zero-resetting jig.

Use the utility model discloses a face difference gage 3 combines to measure the distance between nozzle point 12 and the wafer 2 rather than supporting tool 4 of zeroing, not only can obtain accurate clearance value simply directly perceivedly, has still protected nozzle point 12 effectively not to receive wearing and tearing.

The above embodiments only express the embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims (10)

1. A surface differential gauge, comprising:

a main scale having first and second ends opposite in an axial direction;

a vernier scale slidable in an axial direction of the main scale, the vernier scale having claw arms extending perpendicular to the axial direction;

a base provided at the first end of the main scale, the base having a fixed base surface extending perpendicular to the axial direction;

a probe foot connected to the claw arm, the probe foot having a movement measuring surface extending perpendicular to the axial direction, wherein the fixed base surface and the movement measuring surface are disposed opposite to each other.

2. The face differential gauge of claim 1, wherein the movement measuring face is provided with hemispherical protrusions protruding in the axial direction and toward the second end.

3. The surface differential gauge of claim 1, comprising a micromotion frame connecting the claw arm and the feeler foot, the micromotion frame being slidable with respect to the claw arm in a direction perpendicular to the axial direction.

4. The surface differential gauge of claim 1, wherein the feeler has a zigzag structure.

5. The surface differential gauge according to claim 1, wherein a digital display device is provided on the vernier, the digital display device displaying the distance between the fixed base surface and the moving measuring surface.

6. A face differential gauge according to claim 3, characterized in that it has first locking means for locking the vernier and second locking means for locking the micromotion frame.

7. A zero-return jig for the surface irregularity of any one of claims 1-6, comprising:

an upper portion having a first plane;

a lower portion having a second plane opposite and parallel to the first plane;

a connecting portion connecting the upper portion and the lower portion;

wherein the first plane and the second plane have a specified standard distance therebetween, and the area of the second plane is larger than the area of the first plane.

8. The return-to-zero jig of claim 7, wherein the standard distance is a vertical distance between a horizontal base surface of the base and a top of a steel ball of the probe when the surface difference is returned to zero.

9. The zeroing jig according to claim 7, wherein the standard distance is displayed on a visible surface of the zeroing jig.

10. The zeroing jig according to claim 7, wherein the zeroing jig is made of stainless steel.

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