CN212560436U

CN212560436U - Acid etching recovery unit

Info

Publication number: CN212560436U
Application number: CN202020933852.7U
Authority: CN
Inventors: 王泊可
Original assignee: Shenzhen Ruitihong Technology Co Ltd
Current assignee: Shenzhen Ruitihong Technology Co Ltd
Priority date: 2020-05-28
Filing date: 2020-05-28
Publication date: 2021-02-19
Anticipated expiration: 2030-05-28

Abstract

The utility model discloses an acid etching recovery unit, this acid etching recovery unit includes etching waste liquid hold up tank, the electrolysis trough, the ejector, the jet current collecting vat, exhaust treatment device, the waste liquid pump, etching jar and pipeline, the electrolysis trough divide into cathode chamber and anode chamber through compound diaphragm, etching waste liquid hold up tank fixed connection cathode chamber and with etching jar fixed connection, anode chamber gas outlet fixed connection ejector air inlet, ejector and jet current collecting vat fixed connection, the jet current collecting vat communicates with each other and circulation fixed connection with the production line etching jar, jet current collecting vat and exhaust treatment device fixed connection, possess the sustainable advantage of circulation energy-conservation, respond the national energy-concerving and environment-protective theme.

Description

Acid etching recovery unit

Technical Field

The utility model relates to a waste liquid waste gas recovery technical field particularly, relates to an acid etching recovery unit.

Background

The acid etching solution is used for manufacturing fine circuits of printed circuit boards and inner layers of multilayer boards. The rapid development of modern electronic industry, circuit board manufacturing enterprises are increasing rapidly, industrial waste water and waste gas of the enterprises cause serious environmental pollution, and the content of copper ions in the industrial waste water is very high, so that the problems of serious environmental pollution and resource waste caused by waste water and waste gas generated by circuit board manufacturing enterprises are generally concerned by the society.

An effective solution to the problems in the related art has not been proposed yet.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide an acid etching recovery unit to solve the problem that proposes among the above-mentioned background art.

In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides an acid etching recovery unit, this acid etching recovery unit includes etching waste liquid hold up tank, electrolysis trough, ejector, efflux collecting vat, exhaust treatment device, waste liquid pump, etching jar and pipeline, the electrolysis trough divide into cathode chamber and anode chamber through compound diaphragm, etching waste liquid hold up tank is connected the cathode chamber and with etching jar fixed connection, anode chamber gas outlet fixed connection ejector air inlet, the ejector with efflux collecting vat fixed connection, the efflux collecting vat communicates with each other and circulates fixed connection with the production line etching jar, the efflux collecting vat with exhaust treatment device fixed connection.

Furthermore, the etching waste liquid storage tank, the electrolytic tank, the ejector, the jet flow collecting tank and the etching cylinder are fixedly connected through the pipeline and the waste liquid pump.

Furthermore, a metal titanium plate without a coating is arranged in the cathode chamber and is connected with the cathode of the direct current power supply.

Furthermore, the anode chamber is internally coated with a conductive titanium anode plate with a rhodium or iridium noble metal coating and is connected with the anode of a direct current power supply.

Furthermore, the electrolytic cell can be divided into a plurality of cathode chambers and anode chambers.

Furthermore, the waste gas treatment device comprises a dissolved gas absorption module and a spraying absorption module, and waste gas collected by the jet flow collecting tank is treated by the dissolved gas absorption module and the spraying absorption module.

Compared with the prior art, the utility model discloses following beneficial effect has:

(1) the utility model provides a pair of acid etching recovery unit utilizes the electrolysis principle to separate out elementary substance copper at the negative pole, has reduced the copper ion concentration in the etching waste liquid, and utilizes the chloride ion electrolysis principle to produce strong oxidant chlorine, oxidizes cuprous ion in the etching waste liquid, has both solved the technical problem that adds the oxidant in the prior art and change cuprous ion additionally, has reduced the cost of generation, and does not add impurity to the regenerated etching liquid, has guaranteed the uniformity of regenerated etching liquid and fresh etching liquid; meanwhile, cathode copper with high purity can be recovered, and the method has the advantages of energy conservation and sustainability in circulation.

(2) The utility model provides a pair of acid etching recovery unit is provided with in the exhaust gas collecting groove and dissolves the gas absorption module and spray the absorption module and dissolve the gas and adopt the micropore to dissolve the gas mode, enables gaseous fully to dissolve in absorption solution, and the absorbent has reducibility, like solutions such as ferrite, sulphite, sprays the absorbent and is strong alkaline solution, like solutions such as sodium hydroxide, calcium hydroxide, can carry out degree of depth, thorough processing to waste gas, responds the national energy-concerving and environment-protective theme.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

Fig. 1 is a schematic structural diagram of an acid etching recovery device according to an embodiment of the present invention.

Reference numerals:

1. an etching waste liquid storage tank; 2. an electrolytic cell; 2.1, a cathode chamber; 2.2, an anode chamber; 3. a jet flow collecting tank; 4. an ejector; 5. an exhaust gas treatment device; 6. a waste liquid pump; 7. etching the cylinder; 8. a molten gas absorption module; 9, a spray absorption module; 10. a pipeline.

Detailed Description

The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, rather than all embodiments, and all other embodiments obtained by a person of ordinary skill in the art without creative work belong to the protection scope of the present invention based on the embodiments of the present invention.

In the description of the present invention, it should be noted that the terms "top", "bottom", "one side", "the other side", "front", "back", "middle part", "inside", "top", "bottom", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, which is only for the convenience of description and simplification of the description, but does not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention; the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance; furthermore, unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, as they may be fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

Please refer to fig. 1, according to the embodiment of the present invention, an acid etching recovery device, the acid etching recovery device includes an etching waste liquid storage tank 1, an electrolytic bath 2, an ejector 4, a jet collecting tank 3, an exhaust gas treatment device 5, a waste liquid pump 6, an etching cylinder 7 and a pipeline 10, the electrolytic bath 2 is divided into a cathode chamber 2.1 and an anode chamber 2.2 through a composite diaphragm, the etching waste liquid storage tank 1 is fixedly connected with the cathode chamber 2.1 and fixedly connected with the etching cylinder 7, an air inlet of the jet ejector 2.2 is fixedly connected with an air outlet of the anode chamber 2.2, the jet ejector 4 is fixedly connected with the jet collecting tank 3, the jet collecting tank 3 is communicated with the etching cylinder 7 of a production line and is fixedly connected with a circulation, the jet collecting tank 3 is fixedly connected.

Through the above technical scheme of the utility model, through pipeline 10 and 6 fixed connection of waste liquid pump between etching waste liquid hold up tank 1, electrolysis trough 2, ejector 4, efflux collecting vat 3 and the etching jar 7.

Through the above technical scheme of the utility model, put uncoated metal titanium board in the cathode chamber 2.1 to link to each other with DC power supply's negative pole.

Through the technical scheme of the utility model, the conductive titanium anode plate coated with rhodium or iridium noble metal coating in the anode chamber 2.2 is connected with the positive pole of the direct current power supply.

Through the technical scheme of the utility model, the electrolytic bath 2 can be divided into a plurality of cathode chambers 2.1 and anode chambers 2.2.

Through the above technical scheme of the utility model, exhaust treatment device 5 is including dissolving gas absorption module 8 and spraying absorption module 9, and the waste gas that jet collecting vat 3 was collected is through dissolving gas absorption module 8 and spraying absorption module 9 and handling.

When specifically using, the utility model provides an acid etching recovery unit, with the fixed intercommunication of etching waste liquid hold up tank 1 and production line etching jar 7, store the etching waste liquid in the production line etching jar 7 to provide this etching waste liquid to the cathode chamber 2.1 under passing through the effect of waste liquid pump 6. The etching waste liquid takes place reduction reaction in cathode chamber 2.1 under the effect of electric current, and its copper ion is reduced into simple substance copper, then flows to anode chamber 2.2 through compound diaphragm, and etching solution takes place oxidation reaction in above-mentioned anode chamber 2.2 under the effect of electric current equally, because 1mol copper of electrolytic in-process production will produce 1mol chlorine, though cuprous oxide ion has consumed a part in above-mentioned anode chamber 2.2, but still a large amount of chlorine can spill over from anode chamber 2.2 in, the utility model discloses a reach the mesh of complete regeneration, after regenerating etching waste liquid, the unnecessary chlorine of production is reacted with the etching solution in above-mentioned efflux suction 5 under the effect of ejector 4, and specific reaction formula shows: cl2+2CuCl ═ 2CuCl 2. The air inlet of ejector 4 is fixedly connected with the air outlet of anode chamber 2.2, the air outlet of ejector 4 is fixedly connected with the bottom of jet flow collecting cylinder 4, the top of jet flow collecting tank 3 is fixedly connected with etching cylinder 7 through pipeline 10 and hydraulic pump 6, and etching cylinder 7 is fixedly connected with jet flow collecting cylinder 3 through pipeline 10 and hydraulic pump 6. The etching solution in the jet flow collecting tank 3 and the acid etching solution in the production line etching cylinder 7 are forcibly circulated, so that cuprous ions in the etching cylinder 7 are oxidized into bivalent copper ions, the acid etching solution has enough etching activity, the waste gas treatment device 5 comprises a dissolved gas absorption module 8 and a spraying absorption module 9, and the dissolved gas adopts a micropore dissolved gas mode, so that the gas can be fully dissolved in the absorption solution. The absorbent has reducibility, such as ferrous salt, sulfite solution, etc., and the spray absorbent is strong alkaline solution, such as sodium hydroxide, calcium hydroxide, etc.

Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described in the foregoing embodiments, or equivalents may be substituted for elements thereof. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. An acid etching recovery device is characterized by comprising an etching waste liquid storage tank (1), an electrolytic tank (2), an ejector (4), a jet flow collecting tank (3), a waste gas treatment device (5), a waste liquid pump (6), an etching cylinder (7) and a pipeline (10), the electrolytic tank (2) is divided into a cathode chamber (2.1) and an anode chamber (2.2) by a composite diaphragm, the etching waste liquid storage tank (1) is fixedly connected with the cathode chamber (2.1) and is fixedly connected with the etching cylinder (7), the air outlet of the anode chamber (2.2) is fixedly connected with the air inlet of the ejector (4), the jet device (4) is fixedly connected with the jet collecting tank (3), the jet collecting tank (3) is communicated with a production line etching cylinder (7) and is circularly and fixedly connected with the production line etching cylinder, the jet flow collecting tank (3) is fixedly connected with the waste gas treatment device (5).

2. The acid etching recovery device according to claim 1, wherein the etching waste liquid storage tank (1), the electrolytic tank (2), the ejector (4), the jet collecting tank (3) and the etching cylinder (7) are fixedly connected through the pipeline (10) and the waste liquid pump (6).

3. The acid etching recovery device according to claim 1, characterized in that the cathode chamber (2.1) is provided with an uncoated metal titanium plate and is connected with the negative pole of the direct current power supply.

4. An acid etching recovery device according to claim 1, characterized in that the anode chamber (2.2) is provided with a conductive titanium anode plate coated with rhodium or iridium and connected with the positive pole of a direct current power supply.

5. An acid etching recovery device according to claim 1, characterized in that the electrolytic cell (2) is divided into a plurality of cathode chambers (2.1) and anode chambers (2.2).

6. An acid etching recovery device according to claim 1, characterized in that the waste gas treatment device (5) comprises a dissolved gas absorption module (8) and a spray absorption module (9).