CN212527291U - Water-cooled fixed disc of single-side polishing machine - Google Patents
Water-cooled fixed disc of single-side polishing machine Download PDFInfo
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- CN212527291U CN212527291U CN202020991649.5U CN202020991649U CN212527291U CN 212527291 U CN212527291 U CN 212527291U CN 202020991649 U CN202020991649 U CN 202020991649U CN 212527291 U CN212527291 U CN 212527291U
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Abstract
The utility model relates to the technical field of machinery. The water-cooled fixed disc of the single-sided polishing machine comprises a fixed disc body, wherein the fixed disc body comprises an upper disc body and a lower disc body which are arranged up and down, a diversion trench with an upward opening is arranged on the lower disc body, and when the upper disc body is connected with the lower disc body, the upper disc body covers the upper end notch of the diversion trench and encloses a circuitous water cooling channel for conveying cooling water; the roundabout water cooling channels are at least two and are circumferentially arranged; each circuitous water cooling channel is provided with an independent water inlet for inputting cooling water and an independent water outlet for leading out the cooling water, and the water inlet and the water outlet are positioned on the lower disc body; the upper tray body is a stainless steel tray body; the lower plate is a cast iron plate coated with a teflon coating. The water cooling of the fixed disc of the polishing machine is convenient to realize, and the cooling water flows uniformly in the fixed disc, so that the temperature of the fixed disc is uniform, and the temperature of the surface of the polishing cloth is influenced; the temperature of the polishing cloth is effectively controlled, and the surface temperature of the polishing cloth is uniform.
Description
Technical Field
The utility model relates to the technical field of machinery, specifically the burnishing machine fixed plate.
Background
The surface polishing of the silicon wafer is a key process in the silicon wafer processing, and the processing precision of the silicon wafer directly influences the technical indexes such as the performance, the qualification rate and the like of an IC chip. An important factor affecting the precision of the silicon wafer surface polishing process is temperature. In the polishing process, as the pressure and the rotating speed are increased, the silicon wafer rubs on the polishing cloth, the temperature of the polishing cloth can be continuously increased, and if the temperature distribution is not uniform, the quality of the silicon wafer can be influenced.
How to realize the temperature control of the polishing cloth influences the quality of the silicon wafer.
SUMMERY OF THE UTILITY MODEL
Problem to prior art existence, the utility model provides a single face burnishing machine water-cooled price fixing to solve above at least one technical problem.
In order to achieve the purpose, the utility model provides a water-cooled fixed disc of a single-side polishing machine, which comprises a fixed disc body and is characterized in that the fixed disc body comprises an upper disc body and a lower disc body which are arranged up and down, wherein the lower disc body is provided with a diversion trench with an upward opening;
the at least two roundabout water-cooling channels are arranged in the circumferential direction;
each circuitous water cooling channel is provided with an independent water inlet for inputting cooling water and an independent water outlet for leading out the cooling water, and the water inlet and the water outlet are positioned on the lower disc body;
the upper tray body is a stainless steel tray body;
the lower plate body is a cast iron plate coated with a Teflon coating.
The water cooling of the fixed disc of the polishing machine is convenient to realize, and the cooling water flows uniformly in the fixed disc, so that the temperature of the fixed disc is uniform, and the temperature of the surface of the polishing cloth is influenced; the temperature of the polishing cloth is effectively controlled, the surface temperature of the polishing cloth is uniform, and the TTV (total thickness variation of crystals) level of the polishing sheet can be improved. The structure is simple, the water flow is uniform, the temperature is balanced, and the stability is strong.
The material combination of the upper tray body and the lower tray body ensures that no particles pollute the silicon wafer during processing.
Preferably, the number of the circuitous water cooling channels is two;
the two circuitous water cooling channels are arranged in a centrosymmetric structure.
The uniformity of water cooling is convenient to ensure.
Further preferably, the circuitous water cooling channel comprises a first flow guide channel for guiding flow in an S shape from inside to outside and a second flow guide channel for guiding flow in an S shape from outside to inside;
the first flow guide channel and the second flow guide channel are in butt joint conduction to form the roundabout water cooling channel.
The water cooling effect is convenient to guarantee.
Preferably, the first flow guide channel comprises arc-shaped flow guide sections which are sequentially arranged from inside to outside, and adjacent arc-shaped flow guide sections are in butt joint conduction to form the first flow guide channel.
The uniformity of water cooling is convenient to ensure.
Preferably, the lower disc body comprises a groove with an upward opening, and a detachable flow blocking block is connected in the groove;
the diversion trench is enclosed by the groove and the flow choking block.
The control of the flow guide direction is realized conveniently through the flow blocking block.
Preferably, the lower disc body is provided with an inner limiting ring and an outer limiting ring which are arranged inside and outside, and at least three flow guide layers which are radially arranged from inside to outside are arranged between the inner limiting ring and the outer limiting ring;
each flow guide layer comprises two arc-shaped flow guide blocks which are oppositely arranged;
the arc-shaped flow guide blocks of the adjacent flow guide layers are arranged in different directions, the arc-shaped flow guide block of one flow guide layer in the adjacent flow guide layers is arranged in the front and back direction, and the arc-shaped flow guide block of the other flow guide layer is arranged in the left and right direction;
two arc-shaped flow guide blocks of the same flow guide layer are separated by a flow blocking block, and a flow guide gap is reserved between the end part of each arc-shaped flow guide block and the flow blocking block;
the two ends of the flow blocking block in the radial direction are respectively connected with the adjacent arc-shaped flow guiding blocks or the outer limiting rings;
the centers of the two arc-shaped flow guide blocks positioned at the innermost side are respectively connected with the inner limiting ring through two inner side flow blocking blocks;
the water inlet and the water outlet are respectively positioned at the adjacent positions of the two inner side flow blocking blocks.
The adjustment of the flow guide direction is convenient to realize through the flow blocking block.
Further preferably, a sealing ring is arranged at the joint of the upper tray body and the lower tray body. And the anti-seepage effect is improved.
Further preferably, the choke block is provided with a mounting hole for mounting a screw, and the mounting hole is connected with the upper disc body through a sealing ring.
And the anti-seepage effect is improved.
Further preferably, the upper tray body is detachably connected with the lower tray body through screws.
Further preferably, the bluff block is a cast iron block coated with a teflon coating.
Drawings
Fig. 1 is a cross-sectional view of the present invention;
fig. 2 is a top view of the lower tray body of the present invention.
Wherein: 1 is the upper plate body, 2 is the lower plate body, 3 is the choked flow piece, 4 is the second delivery port, 5 is first delivery port, 6 is first water inlet, 7 is the second water inlet, 8 is first sealing washer, 9 is the second sealing washer.
Detailed Description
The present invention will be further described with reference to the accompanying drawings.
Referring to fig. 1 to 2, the water-cooled fixed disc of the single-sided polishing machine comprises a fixed disc body, wherein the fixed disc body comprises an upper disc body 1 and a lower disc body 2 which are arranged up and down, a diversion trench with an upward opening is arranged on the lower disc body 2, and when the upper disc body 1 is connected with the lower disc body 2, the upper disc body 1 covers the upper end notch of the diversion trench and encloses a circuitous water-cooling channel for conveying cooling water; the roundabout water cooling channels are at least two and are circumferentially arranged; each circuitous water cooling channel is provided with an independent water inlet for inputting cooling water and an independent water outlet for leading out the cooling water, and the water inlet and the water outlet are positioned on the lower disc body 2; the upper tray body 1 is a stainless steel tray body; the lower plate 2 is a cast iron plate coated with a teflon coating. The water cooling of the fixed disc of the polishing machine is convenient to realize, and the cooling water flows uniformly in the fixed disc, so that the temperature of the fixed disc is uniform, and the temperature of the surface of the polishing cloth is influenced; the temperature of the polishing cloth is effectively controlled, the surface temperature of the polishing cloth is uniform, and the TTV level of the polishing sheet can be improved. The structure is simple, the water flow is uniform, the temperature is balanced, and the stability is strong.
The material combination of the upper tray body 1 and the lower tray body 2 ensures that no particles pollute the silicon wafer during processing.
Two circuitous water cooling channels are arranged; the two circuitous water cooling channels are arranged in a centrosymmetric structure. The uniformity of water cooling is convenient to ensure. The two circuitous water cooling channels are respectively a first circuitous water cooling channel and a second circuitous water cooling channel. The two ends of the first roundabout water-cooling channel are respectively communicated with the first water outlet 5 and the first water inlet 6, and the two ends of the second roundabout water-cooling channel are respectively communicated with the second water outlet 4 and the second water inlet 7.
The circuitous water cooling channel comprises a first flow guide channel for S-shaped flow guide from inside to outside and a second flow guide channel for S-shaped flow guide from outside to inside; the first flow guide channel and the second flow guide channel are in butt joint conduction to form a roundabout water cooling channel. The water cooling effect is convenient to guarantee. The first flow guide channel comprises arc-shaped flow guide sections which are sequentially arranged from inside to outside, and the adjacent arc-shaped flow guide sections are in butt joint conduction to form the first flow guide channel. The uniformity of water cooling is convenient to ensure.
The lower tray body 2 comprises a groove with an upward opening, and a flow choking block 3 is detachably connected in the groove; the diversion trench is enclosed with the flow choking block 3 through the groove. The control of the flow guide direction is realized conveniently through the flow blocking block 3.
An inner limiting ring and an outer limiting ring which are arranged inside and outside are arranged on the lower disc body 2, and at least three flow guide layers which are radially arranged from inside to outside are arranged between the inner limiting ring and the outer limiting ring; each flow guide layer comprises two arc-shaped flow guide blocks which are oppositely arranged; the arc-shaped flow guide blocks of the adjacent flow guide layers are arranged in different directions, the arc-shaped flow guide block of one flow guide layer in the adjacent flow guide layers is arranged in the front and back direction, and the arc-shaped flow guide block of the other flow guide layer is arranged in the left and right direction; two arc-shaped flow guide blocks of the same flow guide layer are separated by a flow blocking block 3, and a flow guide gap is reserved between the end part of each arc-shaped flow guide block and the flow blocking block 3; the two ends of the flow blocking block 3 in the radial direction are respectively connected with the adjacent arc-shaped flow guiding blocks or the outer limiting rings; the centers of the two arc-shaped flow guide blocks positioned at the innermost side are respectively connected with the inner limiting ring through the two inner side flow blocking blocks 3; the water inlet and the water outlet are respectively positioned at the adjacent parts of the two inner side flow blocking blocks 3. The adjustment of the flow guide direction is realized conveniently through the flow blocking block 3. The water inlet and the water outlet of the same roundabout water cooling channel are respectively positioned at the same side of the adjacent parts of the two inner side flow blocking blocks 3.
The joint of the upper tray body 1 and the lower tray body 2 is provided with a first sealing ring 8. And the anti-seepage effect is improved. The choke block 3 is provided with a mounting hole for mounting a screw, and the mounting hole is connected with the upper disc body 1 through a second sealing ring 9. And the anti-seepage effect is improved.
The upper tray body 1 is detachably connected with the lower tray body 2 through screws.
The bluff block 3 is a cast iron block coated with a teflon coating.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.
Claims (10)
1. The water-cooled fixed disc of the single-side polishing machine comprises a fixed disc body and is characterized in that the fixed disc body comprises an upper disc body and a lower disc body which are arranged up and down, wherein a diversion trench with an upward opening is formed in the lower disc body, and when the upper disc body is connected with the lower disc body, the upper disc body covers the upper end notch of the diversion trench and is surrounded into a circuitous water cooling channel for conveying cooling water;
the at least two roundabout water-cooling channels are arranged in the circumferential direction;
each circuitous water cooling channel is provided with an independent water inlet for inputting cooling water and an independent water outlet for leading out the cooling water, and the water inlet and the water outlet are positioned on the lower disc body;
the upper tray body is a stainless steel tray body;
the lower plate body is a cast iron plate coated with a Teflon coating.
2. The water-cooled fixed plate of the single-sided polishing machine according to claim 1, characterized in that: two circuitous water cooling channels are arranged;
the two circuitous water cooling channels are arranged in a centrosymmetric structure.
3. The water-cooled fixed plate of the single-sided polishing machine according to claim 2, characterized in that: the circuitous water cooling channel comprises a first flow guide channel for S-shaped flow guide from inside to outside and a second flow guide channel for S-shaped flow guide from outside to inside;
the first flow guide channel and the second flow guide channel are in butt joint conduction to form the roundabout water cooling channel.
4. The water-cooled fixed plate of the single-sided polishing machine according to claim 3, characterized in that: the first flow guide channel comprises arc-shaped flow guide sections which are sequentially arranged from inside to outside, and the adjacent arc-shaped flow guide sections are in butt joint conduction to form the first flow guide channel.
5. The water-cooled fixed plate of the single-sided polishing machine according to claim 1, characterized in that: the lower disc body comprises a groove with an upward opening, and a detachable flow choking block is connected in the groove;
the diversion trench is enclosed by the groove and the flow choking block.
6. The water-cooled fixed plate of the single-sided polishing machine according to claim 2, characterized in that: the lower disc body is provided with an inner limiting ring and an outer limiting ring which are arranged inside and outside, and at least three flow guide layers which are radially arranged from inside to outside are arranged between the inner limiting ring and the outer limiting ring;
each flow guide layer comprises two arc-shaped flow guide blocks which are oppositely arranged;
the arc-shaped flow guide blocks of the adjacent flow guide layers are arranged in different directions, the arc-shaped flow guide block of one flow guide layer in the adjacent flow guide layers is arranged in the front and back direction, and the arc-shaped flow guide block of the other flow guide layer is arranged in the left and right direction;
two arc-shaped flow guide blocks of the same flow guide layer are separated by a flow blocking block, and a flow guide gap is reserved between the end part of each arc-shaped flow guide block and the flow blocking block;
the two ends of the flow blocking block in the radial direction are respectively connected with the adjacent arc-shaped flow guiding blocks or the outer limiting rings;
the centers of the two arc-shaped flow guide blocks positioned at the innermost side are respectively connected with the inner limiting ring through two inner side flow blocking blocks;
the water inlet and the water outlet are respectively positioned at the adjacent positions of the two inner side flow blocking blocks.
7. The water-cooled fixed plate of the single-sided polishing machine according to claim 1, characterized in that: and a sealing ring is arranged at the joint of the upper tray body and the lower tray body.
8. The water-cooled fixed plate of the single-sided polishing machine according to claim 5, characterized in that: the flow blocking block is provided with a mounting hole for mounting a screw, and the mounting hole is connected with the upper disc body through a sealing ring.
9. The water-cooled fixed plate of the single-sided polishing machine according to claim 1, characterized in that: the upper tray body is detachably connected with the lower tray body through screws.
10. The water-cooled fixed plate of the single-sided polishing machine according to claim 5, characterized in that: the bluff block is a cast iron block coated with a teflon coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020991649.5U CN212527291U (en) | 2020-06-03 | 2020-06-03 | Water-cooled fixed disc of single-side polishing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020991649.5U CN212527291U (en) | 2020-06-03 | 2020-06-03 | Water-cooled fixed disc of single-side polishing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212527291U true CN212527291U (en) | 2021-02-12 |
Family
ID=74638479
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020991649.5U Active CN212527291U (en) | 2020-06-03 | 2020-06-03 | Water-cooled fixed disc of single-side polishing machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212527291U (en) |
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2020
- 2020-06-03 CN CN202020991649.5U patent/CN212527291U/en active Active
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