CN212451633U - PECVD vacuum pump pipeline sweeps device - Google Patents

PECVD vacuum pump pipeline sweeps device Download PDF

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Publication number
CN212451633U
CN212451633U CN202021035928.0U CN202021035928U CN212451633U CN 212451633 U CN212451633 U CN 212451633U CN 202021035928 U CN202021035928 U CN 202021035928U CN 212451633 U CN212451633 U CN 212451633U
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China
Prior art keywords
reducing tee
tee joint
vacuum pump
pipeline
hoop
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CN202021035928.0U
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Chinese (zh)
Inventor
顾明强
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Jiangsu Shenyang Photovoltaic Technology Co ltd
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Jiangsu Shenyang Photovoltaic Technology Co ltd
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Priority to CN202021035928.0U priority Critical patent/CN212451633U/en
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Abstract

The invention provides a PECVD vacuum pump pipeline purging device, which is characterized in that: the reducing tee joint comprises a reducing tee joint, a hoop and sealing plates, wherein the calibers of openings at two ends of the reducing tee joint are different, and the sealing plates are respectively buckled on the openings at two ends of the reducing tee joint by the hoop; and an opening on the side wall of the reducing tee joint is connected with the air inlet hose through a valve. The purging device can be directly externally connected to the pipeline to purge the deposition in the pipeline, so that huge cost is saved for a company; and the purging device can be adapted to pipelines of various specifications and is universal and quick.

Description

PECVD vacuum pump pipeline sweeps device
Technical Field
The invention belongs to the field of solar photovoltaic industry, and particularly relates to a PECVD vacuum pump pipeline purging device.
Background
With the development of new energy technology, the crystal silicon solar cell is developed rapidly, and the crystal silicon solar cell is an electronic component capable of converting solar energy into electric energy. The preparation of the crystalline silicon solar cell generally comprises the steps of texturing, diffusion, film coating, screen printing, sintering and the like. Wherein the coating is typically formed using PECVD techniques. Pecvd (plasma Enhanced Chemical Vapor deposition), also known as plasma Enhanced Chemical Vapor deposition, has a technical principle of ionizing a gas containing film constituent atoms by means of microwaves or radio frequencies, etc., to locally form plasma, which has strong Chemical activity and is easy to react, thereby depositing a desired film on a silicon wafer.
The PECVD coating film can use trimethylaluminum, the trimethylaluminum forms gaseous state deposition on the surface of a battery piece after high-temperature, high-pressure and high-frequency ionization, partial gaseous state and powdery aluminum oxide can be discharged out of a workshop by a vacuum pump along with an exhaust pipeline and is treated in an outdoor centralized manner, however, partial aluminum oxide can be deposited on the pipe wall or block the vacuum pump, the vacuum pump belongs to precision equipment, once the vacuum pump is blocked, the vacuum pump needs to be immediately stopped, disassembled and sent to an equipment manufacturer for maintenance, so that economic loss including shutdown production energy loss and vacuum pump maintenance cost is caused.
Disclosure of Invention
In view of the above, the invention provides a purging device for a PECVD vacuum pump pipeline, which can be directly externally connected to the pipeline to purge the deposition in the pipeline, thereby saving huge cost for a company; and the purging device can be adapted to pipelines with various specifications, is universal and quick, and has the following specific technical scheme.
The utility model provides a PECVD vacuum pump pipeline sweeps device which characterized in that: the reducing tee joint comprises a reducing tee joint, a hoop and sealing plates, wherein the calibers of openings at two ends of the reducing tee joint are different, and the sealing plates are respectively buckled on the openings at two ends of the reducing tee joint by the hoop; and an opening on the side wall of the reducing tee joint is connected with the air inlet hose through a valve.
Additional aspects and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.
Drawings
FIG. 1 is an exploded view of a PECVD vacuum pump pipeline purging device according to the present invention;
wherein, 1 is the reducing tee bend, 2 is the clamp, 3 is the shrouding, 4 is the valve, and 5 is the air inlet hose.
Detailed Description
The following description is presented to disclose the invention so as to enable any person skilled in the art to practice the invention. The preferred embodiments in the following description are given by way of example only, and other obvious variations will occur to those skilled in the art. The basic principles of the invention, as defined in the following description, may be applied to other embodiments, variations, modifications, equivalents, and other technical solutions without departing from the spirit and scope of the invention.
In the description of the present invention, it should be noted that the terms indicating orientation or positional relationship are based on the orientation or positional relationship shown in the drawings only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention.
FIG. 1 is a schematic view of a preferred embodiment of a PECVD vacuum pump pipeline purging device of the present invention. A PECVD vacuum pump pipeline purging device comprises a reducing tee 1, a hoop 2 and a sealing plate 3, wherein the diameters of openings at two ends of the reducing tee 1 are different, and the sealing plate 3 is respectively buckled on the openings at two ends of the reducing tee 1 by the hoop 2; an opening on the side wall of the reducing tee joint 1 is connected with an air inlet hose 5 through a valve 4.
In other embodiments, the reducing tee 1 can be replaced by a reducing tee or a reducing five-way according to requirements. When the PECVD vacuum pump pipeline purging device is used, the corresponding opening on the reducing tee 1 is selected according to the size of the blocked pipeline connector, the hoop 2 is opened, the sealing plate 3 is detached, the device is installed at the blocked pipeline connector, high-pressure nitrogen is introduced into the air inlet hose 5, the valve 4 is opened, the high-pressure nitrogen is directly purged into the pipeline, the alumina deposition in the pipeline and the vacuum pump is rapidly and safely purged, the shutdown operation is not needed, and the cleaning and maintenance time and cost are greatly saved.
It should be understood by those skilled in the art that while specific embodiments of the invention have been described in detail with reference to illustrative embodiments thereof, various other modifications and embodiments can be devised by those skilled in the art that will fall within the spirit and scope of the principles of this invention.

Claims (1)

1. The utility model provides a PECVD vacuum pump pipeline sweeps device which characterized in that: the reducing tee joint comprises a reducing tee joint, a hoop and sealing plates, wherein the calibers of openings at two ends of the reducing tee joint are different, and the sealing plates are respectively buckled on the openings at two ends of the reducing tee joint by the hoop; and an opening on the side wall of the reducing tee joint is connected with the air inlet hose through a valve.
CN202021035928.0U 2020-06-08 2020-06-08 PECVD vacuum pump pipeline sweeps device Active CN212451633U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202021035928.0U CN212451633U (en) 2020-06-08 2020-06-08 PECVD vacuum pump pipeline sweeps device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202021035928.0U CN212451633U (en) 2020-06-08 2020-06-08 PECVD vacuum pump pipeline sweeps device

Publications (1)

Publication Number Publication Date
CN212451633U true CN212451633U (en) 2021-02-02

Family

ID=74490927

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202021035928.0U Active CN212451633U (en) 2020-06-08 2020-06-08 PECVD vacuum pump pipeline sweeps device

Country Status (1)

Country Link
CN (1) CN212451633U (en)

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