CN212411012U - Lithographic system - Google Patents
Lithographic system Download PDFInfo
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- CN212411012U CN212411012U CN202020997090.7U CN202020997090U CN212411012U CN 212411012 U CN212411012 U CN 212411012U CN 202020997090 U CN202020997090 U CN 202020997090U CN 212411012 U CN212411012 U CN 212411012U
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Abstract
The utility model relates to an optics technical field discloses a photoetching system to improve the convenience of operation and the intelligent of linkage. The utility model discloses a: a first light source module for emitting laser for lithography; the switch controller is used for controlling the on and off states of the light path of the first light source module which is transmitted into the polarization control module; the polarization control module is used for modulating the polarization direction of the photoetching laser by taking a pixel as a unit; the displacement platform is used for bearing a sample, synchronously switching the pixel displacement of the XY axis according to the state of the tracking switch controller, and switching the pixel displacement of the Z axis according to the instruction of the light spot correction module; a dichroic mirror is arranged between the microscope objective and the polarization control module; and the second light source module is used for emitting visible light for correcting the size of the light spot without changing the photoetching information of the sample, and the visible light is emitted to the sample through the microscope objective lens, and the visible light reflected by the sample returns to the light spot correction module for correcting the size of the light spot through the microscope objective lens.
Description
Technical Field
The utility model relates to the field of optical technology, especially, relate to a lithography system.
Background
Photolithography is the underlying technology of chip fabrication. And can also be widely applied to other application scenes such as anti-counterfeiting and the like.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to disclose a lithography system to improve the convenience of operation and the intelligent of linkage.
To achieve the above object, the present invention discloses a lithography system, comprising:
a first light source module for emitting laser for lithography;
the switch controller is positioned between the first light source module and the polarization control module and is used for controlling the on and off states of a light path which is emitted into the polarization control module by the first light source module;
the polarization control module is used for modulating the polarization direction of the photoetching laser by taking a pixel as a unit;
the microscope objective is positioned between the polarization control module and the displacement table;
the displacement platform is used for bearing a sample, tracking the state of the switch controller, synchronously switching the pixel displacement of the XY axis, and switching the pixel displacement of the Z axis according to the instruction of the light spot correction module;
a dichroic mirror is arranged between the microscope objective and the polarization control module; the dichroic mirror is used for transmitting photoetching laser and building a visible light reflection light path required by the light spot correction module; and the optical axis of the visible light deviates from the optical axis of the photoetching laser;
the second light source module is used for emitting visible light which is used for correcting the size of the light spot and does not change the photoetching information of the sample, the visible light is emitted to the sample through the microscope objective, and the visible light reflected by the sample returns to the light spot correction module for correcting the size of the light spot through the microscope objective.
The utility model discloses following beneficial effect has:
because the three-dimensional structures of all pixel points on the common sample light facet are different, in the laser direct writing process, the light spot difference between all pixels of a sample under the driving action of the displacement table is amplified based on the microscope objective, and the size of a photoetching light spot can be conveniently ensured to be consistent along with the change of the three-dimensional structure of the sample through the light spot correction of visible light, so that the photoetching information is convenient to decode and identify. Under the action of the dichroic mirror, the visible light path and the photoetching light path share one set of microscope objective, so that the system cost is reduced, and the accuracy of light spot calibration is ensured.
The present invention will be described in further detail below with reference to the accompanying drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. In the drawings:
FIG. 1 is a block diagram of a lithography system according to an embodiment of the present invention.
Detailed Description
The embodiments of the invention will be described in detail below with reference to the drawings, but the invention can be implemented in many different ways as defined and covered by the claims.
Example one
The present embodiment discloses a lithography system, as shown in fig. 1, including:
the first light source module 1 is used for emitting laser for lithography.
And the switch controller 2 is positioned between the first light source module and the polarization control module and is used for controlling the on and off states of a light path which is emitted into the polarization control module by the first light source module.
The polarization control module 3 is configured to modulate the polarization direction of the lithography laser by using a pixel as a unit.
Specifically, the polarization control module may be configured to obtain a mapping relation table between each pixel value and a polarization direction; and after the pixel value of the current pixel point to be engraved is obtained, the polarization direction of the photoetching laser is modulated according to the mapping relation table. For example: the pixel value in the mapping relation table may be the gray value of the pixel, or may be the RGB component. Usually, the value range of the pixel value is [ 0,255 ], the value range of the polarization direction can be [ 0,180 ], which is convenient for calculation and improves the efficiency of data processing, and the mapping relationship is preferably a strict direct proportional relationship. In actual deployment, if the interval between the maximum value and the minimum value of the polarization direction is less than 180 degrees, as long as the value range of the polarization direction and the pixel value meets the direct proportional relationship or the one-to-one relationship, the same objective can be achieved, and the polarization direction and the pixel value both belong to the protection range of the utility model.
Alternatively, the polarization control module of this embodiment may be a polarizer that is mechanically driven to rotate. As a modification, the polarization control module of this embodiment may also include a polarizer and a wave plate that is rotated by mechanical driving, and the wave plate is located between the polarizer and the microscope objective. Preferably, the polarization control module comprises an electro-optical crystal controlled in an electrically controlled manner. The polarization state of the exiting beam is changed by a change in voltage.
And the microscope objective 4 is positioned between the polarization control module and the displacement table 5.
And the displacement table is used for bearing a sample, tracking the state of the switch controller, synchronously switching the pixel displacement of the XY axis, and switching the pixel displacement of the Z axis according to the instruction of the light spot correction module 6.
A dichroic mirror 8 is arranged between the microscope objective and the polarization control module; the dichroic mirror is used for transmitting photoetching laser and building a visible light reflection light path required by the light spot correction module; and the optical axis of the visible light is deviated from the optical axis of the photoetching laser, so that the mutual influence between the visible light and the photoetching laser can be effectively avoided.
And the second light source module 7 is used for emitting visible light for correcting the size of the light spot without changing the photoetching information of the sample, the visible light is emitted to the sample through the microscope objective, and the visible light reflected by the sample returns to the light spot correction module for correcting the size of the light spot through the microscope objective. Optionally, the light spot correction module includes a CCD camera and a controller for analyzing the light spot size image collected by the CCD camera to perform linkage control on the displacement stage according to an analysis result. As an implementation of the degradation, in a non-industrial application environment with low requirement on efficiency, the analysis and the linkage control can also be implemented in a manner of manual adjustment.
In the embodiment, a light spot correction module is required to correct light spots of each pixel point, in each correction process, visible light returned by a microscope objective after being reflected by a sample is received, whether the size of the light spots of the reflected visible light is consistent with that of a target or not is judged, and if the size of the light spots of the reflected visible light is not consistent with that of the target, a displacement table is instructed to adjust Z-axis displacement until the size of the reflected light spots is consistent with that of the target; and after the light spot is corrected, the switch controller is instructed to switch to the on state of the light path written into the current pixel point. Wherein, the light spot size target with uniform pixels needs to be calibrated before the light spot size correction.
Optionally, in this embodiment, a light beam shaping component may be further disposed between the first light source module and the polarization control module, and relevant shaping processing includes, but is not limited to, one or any combination of beam expansion, beam contraction, collimation, and the like.
To sum up, the utility model discloses above-mentioned embodiment has following beneficial effect at least:
because the three-dimensional structures of all pixel points on the common sample light facet are different, in the laser direct writing process, the light spot difference between all pixels of a sample under the driving action of the displacement table is amplified based on the microscope objective, and the size of a photoetching light spot can be conveniently ensured to be consistent along with the change of the three-dimensional structure of the sample through the light spot correction of visible light, so that the photoetching information is convenient to decode and identify. Under the action of the dichroic mirror, the visible light path and the photoetching light path share one set of microscope objective, so that the system cost is reduced, and the accuracy of light spot calibration is ensured.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. A lithography system, comprising:
a first light source module for emitting laser for lithography;
the switch controller is positioned between the first light source module and the polarization control module and is used for controlling the on and off states of a light path which is emitted into the polarization control module by the first light source module;
the polarization control module is used for modulating the polarization direction of the photoetching laser by taking a pixel as a unit;
the microscope objective is positioned between the polarization control module and the displacement table;
the displacement platform is used for bearing a sample, tracking the state of the switch controller, synchronously switching the pixel displacement of the XY axis, and switching the pixel displacement of the Z axis according to the instruction of the light spot correction module;
a dichroic mirror is arranged between the microscope objective and the polarization control module; the dichroic mirror is used for transmitting photoetching laser and building a visible light reflection light path required by the light spot correction module; and the optical axis of the visible light deviates from the optical axis of the photoetching laser;
the second light source module is used for emitting visible light which is used for correcting the size of the light spot and does not change the photoetching information of the sample, the visible light is emitted to the sample through the microscope objective, and the visible light reflected by the sample returns to the light spot correction module for correcting the size of the light spot through the microscope objective.
2. The lithography system of claim 1, wherein a beam shaping assembly is disposed between the first light source module and the polarization control module.
3. The lithography system of claim 1, wherein the polarization control module comprises a polarizer that rotates with a mechanical drive.
4. The lithography system of claim 1, wherein the polarization control module comprises a polarizer and a wave plate rotated with a mechanical drive, the wave plate being located between the polarizer and the microscope objective.
5. The lithography system of claim 1, wherein said polarization control module comprises an electronically controlled electro-optic crystal.
6. The lithography system according to any one of claims 1 to 5, wherein said spot correction module comprises a CCD camera and a controller for analyzing the spot size image collected by said CCD camera to perform a coordinated control of said stage according to the analysis result.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020997090.7U CN212411012U (en) | 2020-06-03 | 2020-06-03 | Lithographic system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020997090.7U CN212411012U (en) | 2020-06-03 | 2020-06-03 | Lithographic system |
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| CN212411012U true CN212411012U (en) | 2021-01-26 |
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| CN202020997090.7U Active CN212411012U (en) | 2020-06-03 | 2020-06-03 | Lithographic system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114952023A (en) * | 2022-06-24 | 2022-08-30 | 长沙麓邦光电科技有限公司 | Clamp for preparing grating ruler and joint control method thereof |
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2020
- 2020-06-03 CN CN202020997090.7U patent/CN212411012U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114952023A (en) * | 2022-06-24 | 2022-08-30 | 长沙麓邦光电科技有限公司 | Clamp for preparing grating ruler and joint control method thereof |
| CN114952023B (en) * | 2022-06-24 | 2024-01-30 | 长沙麓邦光电科技有限公司 | Clamp for preparing grating ruler and joint control method thereof |
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