CN101526736A - Laser direct rendering apparatus - Google Patents
Laser direct rendering apparatus Download PDFInfo
- Publication number
- CN101526736A CN101526736A CN200910003408A CN200910003408A CN101526736A CN 101526736 A CN101526736 A CN 101526736A CN 200910003408 A CN200910003408 A CN 200910003408A CN 200910003408 A CN200910003408 A CN 200910003408A CN 101526736 A CN101526736 A CN 101526736A
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- CN
- China
- Prior art keywords
- rendering apparatus
- laser
- direct rendering
- glass plate
- laser direct
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
Abstract
The invention provides a laser direct rendering apparatus which can perform the rotation regulation for the projection position of the beam simply and accurately. A glass board between a DMD and a substrate (W) is rectangular and kept on a piezo-electric element supported by a fixed frame. The piezo-electric element is arranged at two opposite ends of the glass board, i.e. at four corners of the rectangular glass board and controlled by a torsion control device. The piezo-electric elements are respectively expanded and shortened so as to make the ends turn to the opposite direction. Thus, the surface angle of the glass board is switched so as to regulate the irradiation position of the laser beam on the substrate (W) through the glass board.
Description
Technical field
The present invention relates to a kind of laser direct rendering apparatus.
Background technology
At laser direct rendering method (laser direct rendering: laster Direct Imaging (following note is made LDI)), by the multi-stripe laser bundle being projected lift-launch on the position that pre-determines on the transfer table as substrate of object etc., come to form in the photoresist on substrate the sub-image of wiring pattern, by carry out the formation of sub-image according to the wiring pattern data, can not use photomask and directly expose.Thus, can shorten the time of exposure process, in the manufacturing of printed circuit board, also use the laser direct rendering method gradually.
In this LDI, use DMD as spatial light modulator (Digital Micromirror Device: DigitalMicromirror Device) respectively to the startup of laser beam/close (ON/OFF) to control.Being formed with a plurality of (for example, 1024 * 768) size in DMD is the square catoptrons of 14 μ m, can cut off the connected sum of catoptron and individually control (patent documentation 1).Substrate constitutes: it is positioned on the transfer table, making this transfer table when a direction moves, to the relevant position of linear pattern illumination beam, thereby forms the sub-image of wiring pattern on the photoresist that is coated on the substrate.In this optical system, need be configured to improve exploring degree (patent documentation 2 to 4) by reflection mirror array with the position illumination beam of other precision of μ m level to expection with respect to direction of scanning (moving direction of transfer table) rotation predetermined angular with DMD.
Be explained by Figure 11.The sense of rotation of DMD is the most important project in adjustment aspect of carrying out light-beam position.Thus, can be with light beam projecting to the position also littler than the element spacing of DMD self.In (A) of Figure 11, the beam spacing of establishing DMD is p, and establishing its inclination angle is θ, then and the difference delta d between the adjacent light beam be p θ.By making angle θ be very little value, can make Δ d be below 1/10 of d, interval.But if make θ be displaced to (θ+Δ θ) from predetermined value shown in Figure 11 (B), then only there is small change (ε d=p Δ θ) at the interval with the adjacent beams position.The size of the skew between the adjacent beams is very little, and is n ε d in the difference (E) between the light beam at n interval, so the value of difference (E) is bigger than the interval d that wants to adjust.
Patent documentation 1: TOHKEMY 2004-9595
Patent documentation 2: TOHKEMY 2004-181723
Patent documentation 3: TOHKEMY 2007-10758
Patent documentation 4: TOHKEMY 2007-219011
Patent documentation 5: TOHKEMY 2007-47561
As above illustrated, be to utilize to make the whole rotation of the optical system that is equipped with DMD in the past, or the method for the platform rotation that is equipped with substrate is adjusted, yet, only carry out the angular setting of such machinery, existence can not obtain the problem of predetermined accuracy.In order to address this problem, following mode (document 5) is also disclosed: the prism that two wedge-likes are set, adjust the thickness and the inclination angle of these two prisms, come the position of focus (z direction) to light beam and x, y direction to adjust respectively thus, yet but can not adjust the interval of laser beam with enough precision.
Summary of the invention
The objective of the invention is to solve above-mentioned prior art problems.
In order to reach above-mentioned purpose, laser direct rendering apparatus of the present invention is connected and is shone on the object with cutting off by making the multi-stripe laser bundle, form the sub-image of predetermined pattern, it is characterized in that, this laser direct rendering apparatus has: tabular transmissive body, it is located on the described object, and makes the transmission of described multi-stripe laser bundle; And the member that reverses round about of two ends that will this tabular transmissive body, adjust interval between the described multi-stripe laser bundle by the torsion angle of adjusting this reverse component.
Laser direct rendering apparatus of the present invention have can precision well and carry out the effect that the rotation of the launching position of light beam is adjusted simply.
Description of drawings
Fig. 1 is the synoptic diagram of expression an embodiment of the invention.
Fig. 2 is the key diagram of the action of expression an embodiment of the invention.
Fig. 3 is the key diagram of the action of expression an embodiment of the invention.
Fig. 4 is the key diagram of the action of expression an embodiment of the invention.
Fig. 5 is the key diagram of the action of expression an embodiment of the invention.
Fig. 6 is the key diagram of the action of expression an embodiment of the invention.
Fig. 7 is the key diagram of the action of expression an embodiment of the invention.
Fig. 8 is the synoptic diagram of expression other embodiments of the present invention.
Fig. 9 is the synoptic diagram of expression other embodiments of the present invention.
Figure 10 is the key diagram of the action of expression an embodiment of the invention.
Figure 11 is the key diagram of conventional example.
Label declaration
1: glass plate; 2: twist control; 5: laser; 6: the light beam magnifying optics; 7:DMD; 8: imaging optical system; 10: the end; 11: the bight; 20: fixed frame; 21: piezoelectric element; 22: the height control screw; 25: fixed frame; 26: framework; 40: line array CCD; 50: control device; 51: the wiring pattern memory storage; The 52:DMD control device; 53: the platform control device; 60: platform; The 70:DMD element; The 71:DMD element.
Embodiment
Fig. 1 is the example that laser direct rendering apparatus of the present invention is applied to the manufacturing of printed circuit board.It constitutes: mounting substrate W on platform 60, by platform control device 53 this 60 is moved with certain speed along the y direction, and utilize sensor (not shown) to detect the position of appearance 60 simultaneously, from wiring pattern memory storage 51, read the wiring pattern corresponding with the position of platform 60, make connecting of DMD7 by DMD control device 52, the wiring pattern of wiring pattern memory storage 51 is directly exposed with this pattern corresponding elements.
The wiring pattern of wiring pattern memory storage 51 generated based on wiring data in the exposure preparatory stage.Specifically, will convert data bitmap to, and it will be kept in the wiring pattern memory storage 51 as wiring pattern with the wiring data that vector data is write as two-dimensional image data.This operation also can be undertaken by control device 50, also can utilize other not shown computing machines to carry out.
From the laser beam of laser 5 via light beam magnifying optics 6, by connection and cut-out corresponding with wiring pattern as previously mentioned on DMD7, have only transmitted light via imaging optical system 8, the glass plate 1 that sees through as the laser beam transmission body shines on the substrate W then.Glass plate 1 is arranged between DMD7 and the substrate W, but as long as it is arranged on the light path of laser beam, then also can be arranged on other positions.
Reverse round about by the two ends that make glass plate 1 like this, the surperficial angle of glass plate 1 changes, thereby can adjust through the irradiation position of laser beam on substrate W that shines behind the glass plate 1 on the substrate W.This is described by Fig. 3.
By reversing glass plate 1, make certain part tilt angle theta of glass plate 1 after, see through the transmitted light beam B shifted by delta x of this part.When being θ at the pitch angle, offset x represents with t θ (1-1/n).Wherein, t is the thickness of glass plate 1, and n is the refractive index of glass plate 1.
In addition, the relation that has Δ Z=θ W between the z direction shifted by delta Z of the width W of glass plate 1 and end.For example, make that refractive index is 1.5, thickness is 1mm, width when being the glass plate 1 inclination Δ Z=15 μ m of 10mm, beam deviation (Δ x) is 0.5 μ m.
Then, by Fig. 4 to Fig. 6 the beam deviation of glass plate 1 integral body is described.
Current, as shown in Figure 4, on glass plate 1, when incident has light beam a, b, c, d, be example with the some a of illustrated four laser beam institutes transmission and b, c and d, their position adjustment is described.In addition, make the center O of glass plate 1 consistent, and make the center line of x, y direction of glass plate 1 consistent with the central shaft T1, the T2 that reverse with optical axis.In other words, be that the x with glass plate, the center line of y direction are that central shaft reverses glass plate 1.At this moment, a, b, the relative center O of c, d are positioned at the position of symmetry.That is, a, b and c, d are respectively with respect to central shaft T1 line symmetry, and a, c and b, d are respectively with respect to central shaft T2 line symmetry.Figure 5 illustrates under such condition with the shift in position of the laser beam of two ends 10,10 when the direction shown in solid line or the dotted line is reversed of glass plate 1.
Fig. 5 is that the beam irradiation position when the represented direction of the dotted line shown in Fig. 4 is reversed glass plate 1 changes, and Fig. 6 is that the beam irradiation position when the represented direction of the solid line shown in Fig. 4 is reversed glass plate 1 changes.A among Fig. 5, B represent to incide the position of light beam irradiates on substrate W of a, b respectively.Reverse round about by the two ends that make glass plate 1, make respectively in an a tilt angle theta, at a b angle of inclination-θ, at this moment, such as among Fig. 3 discussion cross like that, the x direction interval that sees through some a, b and project to the laser beam on the object is compared with initial value D and has been increased by 2 Δ x.On the other hand, in Fig. 6, the light beam irradiates that sees through some a, b is to A ', B ', and 2 Δ x have been reduced by in both intervals.
Fig. 7 represents the state of an a, b, c, the d irradiation position on substrate W.With respect to initial irradiation position (A0, B0, C0, D0), be that dotted arrow, solid arrow change like that by the torsional direction that makes glass plate 1, irradiation position is varied to A, B, C, D or A ', B ', C ', D '.Consequently, can make each x direction interval variation, by changing torsional direction and torsion angle, can be to finely tuning at interval.According to this structure, can carry out micron-sized trickle light-beam position adjustment.
In addition, the center O of glass plate 1 is not because of reversing, and consequently, its irradiation position O does not move.In addition, angle of inclination and this distance of putting center O of the each point N on the glass plate 1 that produces by reversing of glass plate 1 increase pro rata, and its result also increases with this distance to center O pro rata for the displacement of irradiation position.
Fig. 8 represents other embodiments.In this embodiment, disposed a pair of piezoelectric element 21,21 from tow sides, thereby torque forces is increased in the bight 11 of glass plate 1.
Fig. 9 represents other embodiments, in this embodiment, uses height control screw 22 to replace piezoelectric element 21.Label 25 is a fixed frame, and label 26 is a framework.Height control screw 22 is driven by motor (not shown), by the power that the driving of adjusting by this motor applies, can adjust light-beam position.
By Figure 10 control method is described.
Carry out at first the adjusting of the outward appearance angle of DMD in the following order.
First operation) measures the DMD pitch angle
Second operation) measures the torsion angle of glass plate 1 and the relation at DMD outward appearance pitch angle
The 3rd operation) torsion angle of adjustment glass plate 1
The 4th operation) confirms and correction DMD outward appearance pitch angle.
Measuring method as the DMD pitch angle in first operation has such method: test pattern exposed coating on the photoresist of substrate, and after the video picture, the method for the position of test pattern being measured with dimensioner; And, utilize the sensor that is arranged in the device that the position of exposing light beam is measured, and measure the method at angle of inclination according to this measurement result.The former exists because the video picture of the sub-image after need exposing by other operations thereby the problem of spended time, and thereby therefore the latter describes the back method that can carry out more efficiently measurement owing to have the exposure that can omit line and advantage that videograph process can shorten the adjustment time.
In the time can not covering the exposure range of DMD7, can solve by adopting many line array CCDs 40 with a line array CCD 40.In addition, also can use two-dimensional CCD to replace line array CCD 40.Under this situation, platform 60 is moved so that the image space of DMD7 on CCD, makes platform 60 static then.The computing method of the angle of DMD7 are identical with the situation of the line array CCD of following explanation.
When measuring the tilt angle theta of DMD7, for example only make two DMD elements 70,71 for on-state and on linear array CCD40, pass through, and store its signal pattern.At this moment, the image space of some DMD element 70,71 on substrate is respectively A ', B '.Result according to measuring can know that the distance of hot spot on sensor of A ', B ' is Δ p, and the time interval that detects both is Δ t.If the translational speed of the platform 60 of this moment is v, the angle θ of imaging point can calculate by tan θ=Δ p/ (Δ tv).Here it is apparent DMD angle of inclination.
In addition, measurement point herein is two, but can take measurement of an angle more exactly owing to a large amount of measurement points are set, and therefore can increase measurement point as required.
Then, in second operation, use this mensuration system, before real exposure, measure the relation between the change amount of the voltage be applied on the piezoelectric element 21 and apparent DMD angle.Specifically, change the voltage that is applied on each piezoelectric element 21, use the method that in first operation, illustrated that the variation of each light-beam position is measured, and the record result.Increase the element logarithm of the DMD7 that in this measurement, measures, can measure the relation that applies between voltage and the light beam more exactly.To apply the relation record of variation of voltage and each light beam in control device 50.
In the 3rd operation,, adjust the inclination angle of DMD7 as the preparation of using before exposure device carries out real exposure.At first, use first operation to measure the angle of DMD7.Control device 50 judges that measured angle is whether in the permissible range of set angle, under the situation in the initial setting range of deflecting away from that takes measurement of an angle, the relation that use is tried to achieve by second operation applies voltage to piezoelectric element 21, enters measurement range so that take measurement of an angle.
In the 4th operation, behind the use exposure device certain hour, carry out the 3rd operation, confirm that the outward appearance angle of DMD7 has entered in the setting value.This be because, owing to use exposure device, the Temperature Distribution and the zero hour dissimilate, light-beam position changes sometimes.Exceed in the angle that measures under the situation of setting range, use the relation of trying to achieve, adjust the voltage that is applied to piezoelectric element 21, so that the angle of glass plate 1 is revised by second operation.
In addition, under the situation of embodiment shown in Figure 9, read the storer of height control screw 22,, can carry out the action identical with piezoelectric element 21 by being rotated and revising with staff.
Claims (4)
1. laser direct rendering apparatus, it is connected and cuts off and shine on the object by making the multi-stripe laser bundle, forms the sub-image of predetermined pattern, it is characterized in that,
This laser direct rendering apparatus has:
Tabular transmissive body, it is located on the described object, is used to make the transmission of described multi-stripe laser bundle; And
The member that the two ends of the transmissive body that this is tabular are reversed round about,
Adjust interval between the described multi-stripe laser bundle by the torsion angle of adjusting this reverse component.
2. laser direct rendering apparatus according to claim 1 is characterized in that,
Carry out the connection and the cut-out of described laser beam by spatial light modulator.
3. laser direct rendering apparatus according to claim 1 is characterized in that,
Described reverse component has the piezoelectric element of the end that is arranged on described transmissive body.
4. laser direct rendering apparatus according to claim 1 is characterized in that,
Described reverse component has the mechanical screw of the end that is arranged at described transmissive body.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008055777 | 2008-03-06 | ||
| JP2008055777A JP2009210960A (en) | 2008-03-06 | 2008-03-06 | Laser direct drawing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101526736A true CN101526736A (en) | 2009-09-09 |
Family
ID=41094652
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910003408A Pending CN101526736A (en) | 2008-03-06 | 2009-01-12 | Laser direct rendering apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2009210960A (en) |
| KR (1) | KR20090096298A (en) |
| CN (1) | CN101526736A (en) |
| TW (1) | TW200941036A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116149144A (en) * | 2023-03-01 | 2023-05-23 | 浙江蓝海光学科技有限公司 | Detection device and detection method for projection system of LDI exposure machine |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5875904B2 (en) * | 2012-03-13 | 2016-03-02 | 株式会社Ｓｃｒｅｅｎホールディングス | Drawing apparatus and drawing method |
| KR102184042B1 (en) * | 2014-01-29 | 2020-11-27 | 엘지이노텍 주식회사 | Camera apparatus |
| CN107264151A (en) * | 2017-06-23 | 2017-10-20 | 何志达 | A kind of cup device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5557469A (en) * | 1994-10-28 | 1996-09-17 | Ultratech Stepper, Inc. | Beamsplitter in single fold optical system and optical variable magnification method and system |
| JP2003223003A (en) * | 2001-11-22 | 2003-08-08 | Adtec Engineeng Co Ltd | Projection exposure device |
| JP2005234113A (en) * | 2004-02-18 | 2005-09-02 | Fuji Photo Film Co Ltd | Exposure apparatus |
| JP2007047561A (en) * | 2005-08-11 | 2007-02-22 | Fujifilm Corp | Exposure apparatus |
-
2008
- 2008-03-06 JP JP2008055777A patent/JP2009210960A/en active Pending
- 2008-12-15 TW TW097148715A patent/TW200941036A/en unknown
- 2008-12-18 KR KR1020080129192A patent/KR20090096298A/en not_active Application Discontinuation
-
2009
- 2009-01-12 CN CN200910003408A patent/CN101526736A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116149144A (en) * | 2023-03-01 | 2023-05-23 | 浙江蓝海光学科技有限公司 | Detection device and detection method for projection system of LDI exposure machine |
| CN116149144B (en) * | 2023-03-01 | 2023-08-15 | 浙江蓝海光学科技有限公司 | Detection device and detection method for projection system of LDI exposure machine |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090096298A (en) | 2009-09-10 |
| JP2009210960A (en) | 2009-09-17 |
| TW200941036A (en) | 2009-10-01 |
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Application publication date: 20090909 |