CN212404260U

CN212404260U - Evaporation source configuration structure capable of saving space in vacuum coating chamber

Info

Publication number: CN212404260U
Application number: CN202021589372.XU
Authority: CN
Inventors: 吴萍; 范滨; 龙汝磊; 戴磊
Original assignee: Optorun Shanghai Co Ltd
Current assignee: Optorun Shanghai Co Ltd
Priority date: 2020-08-04
Filing date: 2020-08-04
Publication date: 2021-01-26
Anticipated expiration: 2030-08-04

Abstract

The utility model belongs to the technical field of the film preparation technique and specifically relates to an evaporation source configuration structure who saves indoor space of vacuum coating, its characterized in that: two or more evaporation sources are arranged in the vacuum coating chamber, and the evaporation sources are arranged in a staggered manner up and down along the height direction of the vacuum coating chamber. The utility model has the advantages that: more or larger evaporation sources can be placed under the condition that the volume of the inner space of the vacuum coating chamber is certain; namely, the space is reasonably utilized in a vacuum chamber with a certain size so as to realize the purpose of configuring more or larger evaporation source crucible tables; the economy is good, the existing vacuum coating equipment can be effectively utilized, and no additional configuration is needed; the film forming effect can be ensured.

Description

Evaporation source configuration structure capable of saving space in vacuum coating chamber

Technical Field

The utility model belongs to the technical field of the film preparation technique and specifically relates to an evaporation source configuration structure who saves indoor space of vacuum coating.

Background

With the improvement of the demand of a film process, the demand of a film material for an evaporation source of a film coating device is more and more, so that a crucible with a larger loading capacity needs to be configured to meet the film forming demand, but in order to carry the crucible with the large specification, the specification of a vacuum chamber needs to be enlarged, the vacuum chamber with the large specification needs to be configured with a vacuum obtaining pump set and related components meeting the demand, and meanwhile, the space demand layout of the whole device is larger.

Disclosure of Invention

The utility model aims at providing a save evaporation source configuration structure of vacuum coating indoor space according to above-mentioned prior art not enough, dispose the evaporation source through the upper and lower staggered floor mode of direction of height, under the certain circumstances of vacuum coating indoor space, realize the configuration of the evaporation source of more or bigger specification.

The utility model discloses the purpose is realized accomplishing by following technical scheme:

the utility model provides a save evaporation source configuration structure of vacuum coating indoor space, is including setting up the evaporation source at vacuum coating indoor space, its characterized in that: two or more evaporation sources are arranged in the vacuum coating chamber, and at least two of the evaporation sources are arranged in a staggered manner along the height direction of the vacuum coating chamber.

The staggered arrangement means that the evaporation sources are positioned in different planes, and the relative positions of the evaporation sources arranged in staggered arrangement up and down meet the film forming process requirements of evaporation angles required by the evaporation sources.

The evaporation source refers to a crucible table loaded with an evaporation material.

A design method for realizing the evaporation source configuration structure capable of saving the space in a vacuum coating chamber is characterized by comprising the following steps: according to the performance of evaporation materials of the evaporation source, the evaporation source is configured in a high-low staggered layer in a vacuum coating chamber.

Preferably, the property of the evaporation material comprises an evaporation angle required for the evaporation material, and the evaporation material having a relatively large evaporation angle is disposed above the evaporation material having a relatively small evaporation angle.

The evaporation material with a large evaporation angle can be placed at a higher position by the corresponding evaporation source, so that the substrate on the whole umbrella stand can receive the film material, and a space at a lower position can be reserved for other evaporation materials.

And judging the specific mode of staggered layer configuration according to the evaporation performance of the evaporation materials and the actual coating test result, wherein the specific mode comprises the specific positions of the evaporation materials in the high-low staggered layer arrangement mode and the relative positions of the evaporation materials.

When the evaporation sources are loading crucible tables loaded with the evaporation materials, the sizes of the loading crucible tables meet the film forming process requirements of the evaporation materials loaded on the loading crucible tables, and the relative positions of the loading crucible tables meet the film forming process requirements of evaporation angles required by the evaporation sources.

The utility model has the advantages that: more or larger crucibles can be placed under the condition that the volume of the inner space of the vacuum coating chamber is certain; namely, the space is reasonably utilized in a vacuum chamber with certain specification to realize the purpose of configuring an evaporation source crucible with larger specification; the economy is good, the existing vacuum coating equipment can be effectively utilized, and no additional configuration is needed; the film forming effect can be ensured.

Drawings

Fig. 1 is a top view of an arrangement structure of two evaporation sources in the present invention;

fig. 2 is a schematic structural diagram of the present invention.

Detailed Description

The features of the present invention and other related features are described in further detail below by way of example in conjunction with the accompanying drawings to facilitate understanding by those skilled in the art:

as shown in fig. 1-2, the labels 1-4 and A, H are respectively shown as: the vacuum coating device comprises a vacuum coating chamber 1, an evaporation source 2, an evaporation source 3, a substrate 4 to be coated, an inner diameter A of the vacuum coating chamber and an evaporation source height difference H.

Example (b): as shown in fig. 1 and 2, the evaporation source arrangement structure for saving space in a vacuum chamber in the present embodiment is used to arrange an evaporation source 2 and an evaporation source 3 in a vacuum coating chamber 1, and the evaporation source 2 and the evaporation source 3 are used to perform evaporation coating on a substrate 4 to be coated placed in the vacuum coating chamber 1, wherein fig. 2 shows the central positions of the evaporation source 2 and the evaporation source 3. The inner diameter of the vacuum coating chamber 1 is a certain value, namely the inner diameter A of the vacuum coating chamber. The purpose of this embodiment is to reasonably utilize the space to achieve the purpose of configuring the evaporation source 2 and the evaporation source 3 with larger size without changing the inner diameter A of the vacuum coating chamber. The need for larger

scale evaporation sources

2 and 3 is based on the increasing demand for evaporation sources in thin film processes.

Specifically, as shown in fig. 1 and 2, the evaporation source 2 and the evaporation source 3 are loading crucible stages loaded with a coating material, and both of the two loading crucible stages as evaporation sources are smaller in size than the inner diameter a of the vacuum coating chamber. As shown in fig. 2, the evaporation source 2 and the evaporation source 3 are arranged in a staggered manner in the height direction of the vacuum coating chamber 1, that is, the evaporation source 2 and the evaporation source 3 are located in two independent planes, so that the specification size of each loading crucible table can be enlarged in the independent plane where the loading crucible table is located, and the specification of each loading crucible table meets the requirements of a thin film process on the evaporation sources.

As shown in fig. 2, the two

evaporation sources

2 and 3 arranged in staggered layers have an evaporation source height difference H therebetween. When the outer contours of the evaporation sources 3 of the evaporation sources 2 have overlapping portions in the projection direction, that is, when the positions shown in fig. 1 interfere with each other, the evaporation source height difference H should satisfy the requirement that no adverse effect is generated between the two evaporation sources, on one hand, the loading crucible tables of the two evaporation sources do not collide with each other, and on the other hand, the two loading crucible tables need to be ensured to have evaporation angles meeting the requirements of the film forming process, that is, as shown in fig. 2, the evaporation angles of the

evaporation sources

2 and 3 are independent from each other and completely cover the surface of the plated substrate 4, so as to realize the film formation of the plated substrate 4.

In the present embodiment, the evaporation source arrangement structure for saving space in the vacuum chamber is designed by the following method:

1) the evaporation source is disposed in the vacuum coating chamber 1 in a staggered manner in the space according to the properties of the evaporation material of the evaporation source.

The properties of the evaporation material include the evaporation angle of the evaporation material, and since each evaporation material disposed in the vacuum coating chamber 1 often has a different evaporation angle due to its material characteristics and process requirements. At this time, the evaporation material with a relatively large evaporation angle can be placed at a higher position in the high-low staggered layer configuration mode, so that the coated substrate 4 on the umbrella stand in the whole vacuum coating chamber 1 can receive the film material, a lower position space can be reserved for other evaporation materials, and the evaporation material with a relatively small evaporation angle is arranged at a lower position, thereby saving the space in the vacuum chamber and configuring a larger or more evaporation source crucible tables.

Meanwhile, the specific manner of staggered arrangement can be determined by combining the actual coating test results according to the characteristics of the evaporation materials, such as the specific positions of the evaporation materials in the staggered arrangement (which evaporation materials are at a higher position, which evaporation materials are at a lower position, etc.) and the relative positions of the evaporation materials (the specific numerical value of the evaporation source height difference H, the horizontal position of the evaporation source crucible table corresponding to the evaporation materials in the direction of the inner diameter a of the vacuum coating chamber, etc.).

2) When the evaporation source is a loading crucible table loaded with the evaporation material, the size of the loading crucible table meets the film forming process requirement of the evaporation material loaded on the loading crucible table and is smaller than the inner diameter A of the vacuum coating chamber. The relative position of each loading crucible table meets the film forming process requirement of the evaporation angle required by each evaporation source.

In the embodiment, in specific implementation: in addition to the above-described two evaporation sources, i.e., the evaporation source 2 and the evaporation source 3, when two or more evaporation sources, e.g., three evaporation sources, are used, a configuration may be employed in which two evaporation sources are arranged in the same plane and another evaporation source is arranged above the two evaporation sources in staggered layers, so that more or larger crucibles can be placed with a constant volume of the inner space of the vacuum coating chamber.

Although the conception and the embodiments of the present invention have been described in detail with reference to the drawings, those skilled in the art will recognize that various changes and modifications can be made therein without departing from the scope of the appended claims, and therefore, the description thereof is not repeated herein.

Claims

1. The utility model provides a save evaporation source configuration structure of vacuum coating indoor space, is including setting up the evaporation source at vacuum coating indoor space, its characterized in that: two or more evaporation sources are arranged in the vacuum coating chamber, and at least two of the evaporation sources are arranged in a staggered manner along the height direction of the vacuum coating chamber.

2. The evaporation source arrangement structure for saving space in a vacuum coating chamber as claimed in claim 1, wherein: the staggered arrangement means that the evaporation sources are positioned in different planes, and the relative positions of the evaporation sources arranged in staggered arrangement up and down meet the film forming process requirements of evaporation angles required by the evaporation sources.

3. The evaporation source arrangement structure for saving space in a vacuum coating chamber as claimed in claim 1, wherein: the evaporation source refers to a crucible table loaded with an evaporation material.