CN212370663U

CN212370663U - Semiconductor raw material cleaning device

Info

Publication number: CN212370663U
Application number: CN202020265563.4U
Authority: CN
Inventors: 文新艳; 付华秀
Original assignee: Individual
Current assignee: Individual
Priority date: 2020-03-06
Filing date: 2020-03-06
Publication date: 2021-01-19
Anticipated expiration: 2030-03-06

Abstract

The utility model relates to a semiconductor raw materials washs technical field, and discloses a semiconductor raw materials belt cleaning device, including wasing the bucket, the activity of the upper end of wasing the bucket is pegged graft and is had fixing device, and washs the inside intermediate position fixedly connected with belt cleaning device of bucket. This kind of semiconductor raw material belt cleaning device, through setting up belt cleaning device isotructure, when wasing semiconductor raw materials, through the revolving stage that belt cleaning device upper end set up, through the spout of revolving stage below, remove the clean post that the revolving stage top is connected, make clean post be close to semiconductor raw materials, then it is rotatory to drive clean post through the revolving stage on the cleaning device, wash the rotation type to the fixed semiconductor raw materials of rinsing bench upper end and wash, wash water through the nozzle blowout, fully wash semiconductor raw materials, and simultaneously, wash the wash port through setting up and can carry out the reutilization in the header tank of wash bucket lower extreme with the surplus water drainage, reached and repeatedly washed and make the more abundant effect of washing.

Description

Semiconductor raw material cleaning device

Technical Field

The utility model relates to a semiconductor raw materials washs technical field, specifically is a semiconductor raw materials belt cleaning device.

Background

Semiconductor manufacturing, whether it is silicon wafer, integrated circuit manufacturing or IC chip packaging, is a very complicated manufacturing process, and there are a lot of chemical species used in the manufacturing process, and the residue of these chemical species or solvents not only pollutes the air during the manufacturing process, but also has a great influence on the yield of silicon wafer, integrated circuit or IC chip.

However, in order to increase the yield of semiconductor manufacturing, the semiconductor cleaning process must ensure that the chemical substances on the semiconductor are cleaned and no chemical substances remain, so the length of the cleaning process and the cleaning equipment must be increased, but the semiconductor cleaning process is performed in a clean room environment, and if the length of the process and the equipment must be increased, the area of the clean room must be increased, and the high cost of building the clean room and the cleaning equipment will have a great influence on the profit of the semiconductor factory.

SUMMERY OF THE UTILITY MODEL

Technical problem to be solved

The not enough to prior art, the utility model provides a semiconductor raw materials belt cleaning device possesses advantages such as diversified cleanness repeatedly, has solved the problem that the background art provided.

(II) technical scheme

For realizing the purpose of the above-mentioned diversified cleanness repeatedly, the utility model provides a following technical scheme: the utility model provides a semiconductor raw materials belt cleaning device, includes the washing bucket, the upper end activity of washing bucket is pegged graft and is had fixing device, and the inside intermediate position fixedly connected with belt cleaning device of washing bucket.

Preferably, the upper end of the fixing device is fixedly connected with a motor, connecting columns are fixedly connected to two sides of the bottom end of the fixing device, and a cleaning table is fixedly connected to the bottom end of each connecting column.

Preferably, the periphery of the surface of the upper end of the cleaning table is provided with a fixing groove, and the surface of the cleaning table at the inner side of the fixing groove is provided with a drain hole.

Preferably, the middle position in the fixed groove is rotatably connected with a guide wheel, the tail end of the guide wheel is fixedly connected with a spring, and the other end of the spring is fixedly connected to the inner wall of the cleaning table.

Preferably, the upper end of the cleaning device is rotatably connected with a rotary table, and the upper end in the rotary table is provided with a sliding groove.

Preferably, the equal fixedly connected with of the upper end left and right sides of revolving stage cleans the post, and the bottom of cleaning the post extends to the bottom of revolving stage, the inside at the spout of the terminal sliding connection of cleaning the post.

Preferably, the side surface of the cleaning column is fixedly connected with a nozzle, and the bottom end inside the cleaning barrel is provided with a water collecting tank.

(III) advantageous effects

Compared with the prior art, the utility model discloses possess following beneficial effect:

1. this kind of semiconductor raw material belt cleaning device, through setting up fixing device isotructure, when wasing on fixing the device with the semiconductor, only need with the fixed grafting of semiconductor raw materials in the fixed slot that the fixing device lower extreme set up, then accessible motor drives the clean bench that lower extreme and spliced pole are connected and rotates for the fixed semiconductor raw materials of clean bench top can rotate in equidirectional not, then washs, and the inside guide pulley of fixed slot and spring prevent the landing of semiconductor raw materials simultaneously.

2. This kind of semiconductor raw material belt cleaning device, through setting up belt cleaning device isotructure, when wasing semiconductor raw materials, through the revolving stage that belt cleaning device upper end set up, through the spout of revolving stage below, remove the clean post that the revolving stage top is connected, make clean post be close to semiconductor raw materials, then it is rotatory to drive clean post through the revolving stage on the cleaning device, wash the rotation type to the fixed semiconductor raw materials of rinsing bench upper end and wash, wash water through the nozzle blowout, fully wash semiconductor raw materials, and simultaneously, wash the wash port through setting up and can carry out the reutilization in the header tank of wash bucket lower extreme with the surplus water drainage, reached and repeatedly washed and make the more abundant effect of washing.

Drawings

FIG. 1 is a schematic view of the three-dimensional structure of the present invention;

FIG. 2 is a schematic view of the three-dimensional structure of the fixing device of the present invention;

fig. 3 is a schematic side sectional view of the fixing groove of the present invention;

fig. 4 is a schematic view of the front sectional structure of the cleaning barrel of the present invention.

In the figure: 1. a washing barrel; 2. a fixing device; 21. a motor; 22. connecting columns; 23. a cleaning table; 24. fixing grooves; 241. a guide wheel; 242. a spring; 25. a drain hole; 3. a cleaning device; 31. a turntable; 32. a chute; 4. cleaning the column; 41. a nozzle; 5. a water collection tank.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Example 1

Referring to fig. 1-3, a semiconductor material cleaning apparatus includes a cleaning barrel 1, a fixing device 2 is movably inserted into an upper end of the cleaning barrel 1, a cleaning device 3 is fixedly connected to an inner middle position of the cleaning barrel 1, a motor 21 is fixedly connected to an upper end of the fixing device 2, connecting posts 22 are fixedly connected to two sides of a bottom end of the fixing device 2, a cleaning platform 23 is fixedly connected to a bottom end of the connecting posts 22, fixing grooves 24 are formed around an upper end surface of the cleaning platform 23, a water drain hole 25 is formed on a surface of the cleaning platform 23 inside the fixing grooves 24, guide wheels 241 are rotatably connected to inner middle positions of the fixing grooves 24, a spring 242 is fixedly connected to a tail end of the guide wheels 241, the other end of the spring 242 is fixedly connected to an inner wall of the cleaning platform 23, and when a semiconductor is fixed to the apparatus for cleaning by arranging the fixing, only need with the fixed slot 24 of pegging graft of semiconductor raw materials setting in fixing device 2 lower extreme, then accessible motor 21 drives the clean bench 23 that lower extreme and spliced pole 22 are connected and rotates for the fixed semiconductor raw materials in clean bench 23 top can rotate in different directions, then washs, and the inside guide pulley 241 of fixed slot 24 and spring 242 prevent the semiconductor raw materials landing simultaneously.

Example 2

Based on embodiment 1, as shown in fig. 2-4, the upper end of the cleaning device 3 is rotatably connected with a turntable 31, the upper end of the inside of the turntable 31 is provided with a chute 32, the left and right sides of the upper end of the turntable 31 are fixedly connected with cleaning columns 4, the bottom ends of the cleaning columns 4 extend to the bottom end of the turntable 31, the ends of the cleaning columns 4 are slidably connected with the inside of the chute 32, the side surfaces of the cleaning columns 4 are fixedly connected with nozzles 41, the bottom end of the inside of the cleaning barrel 1 is provided with a water collecting tank 5, by arranging the cleaning device 3 and other structures, when cleaning the semiconductor raw material, the cleaning column 4 connected above the turntable 31 is moved through the chute 32 below the turntable 31 by the turntable 31 arranged at the upper end of the cleaning device 3, so that the cleaning column 4 is close to the semiconductor raw material, then the turntable 31 on the cleaning device drives the cleaning column 4 to rotate, the cleaning water is sprayed out through the nozzle 41 to fully clean the semiconductor raw material, and meanwhile, the residual water can be discharged into the water collecting tank 5 at the lower end of the cleaning barrel through the arranged drain hole 25 for secondary utilization, so that the effect of more fully cleaning due to repeated cleaning is achieved.

The working principle is as follows: when a semiconductor is fixed on a device for cleaning, only a semiconductor raw material needs to be fixedly inserted in a fixing groove 24 arranged at the lower end of a fixing device 2, then a cleaning table 23 with the lower end connected with a connecting column 22 can be driven by a motor 21 to rotate, so that the semiconductor raw material fixed above the cleaning table 23 can rotate in different directions and then be cleaned, meanwhile, a guide wheel 241 and a spring 242 in the fixing groove 24 prevent the semiconductor raw material from sliding off, when the semiconductor raw material is cleaned, a cleaning column 4 connected above the rotating table 31 is moved by a rotating table 31 arranged at the upper end of a cleaning device 3, the cleaning column 4 is close to the semiconductor raw material by a sliding chute 32 below the rotating table 31, then the rotating table 31 on the cleaning device drives the cleaning column 4 to rotate, the semiconductor raw material fixed at the upper end of the cleaning table 23 is cleaned in a rotating manner, and cleaning water is, the semiconductor raw material is fully cleaned, and meanwhile, residual water can be discharged into the water collecting tank 5 at the lower end of the cleaning barrel through the arranged drain hole 25 for secondary utilization, so that repeated cleaning can be carried out.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. A semiconductor raw material cleaning device comprises a cleaning barrel (1);

the method is characterized in that:

the upper end of the cleaning barrel (1) is movably inserted with a fixing device (2), and the middle position inside the cleaning barrel (1) is fixedly connected with a cleaning device (3).

2. A semiconductor source material cleaning apparatus according to claim 1, wherein: the upper end fixedly connected with motor (21) of fixing device (2), and the bottom both sides fixedly connected with spliced pole (22) of fixing device (2), and the bottom fixedly connected with clean bench (23) of spliced pole (22).

3. A semiconductor source material cleaning apparatus according to claim 2, wherein: the periphery of the upper end surface of the cleaning table (23) is provided with fixing grooves (24), and the surface of the cleaning table (23) at the inner side of the fixing grooves (24) is provided with drain holes (25).

4. A semiconductor source material cleaning apparatus according to claim 3, wherein: the inside intermediate position of fixed slot (24) rotates and is connected with guide pulley (241), and the terminal fixedly connected with spring (242) of guide pulley (241), and the other end fixed connection of spring (242) is in the inner wall department of clean bench (23).

5. A semiconductor source material cleaning apparatus according to claim 1, wherein: the upper end of the cleaning device (3) is rotatably connected with a rotary table (31), and the upper end in the rotary table (31) is provided with a sliding groove (32).

6. The apparatus for cleaning semiconductor source material according to claim 5, wherein: the equal fixedly connected with of the upper end left and right sides of revolving stage (31) cleans post (4), and the bottom of cleaning post (4) extends to the bottom of revolving stage (31), the terminal sliding connection of cleaning post (4) is in the inside of spout (32).

7. The apparatus for cleaning semiconductor source material according to claim 6, wherein: the side face of the cleaning column (4) is fixedly connected with a nozzle (41), and the bottom end of the interior of the cleaning barrel (1) is provided with a water collecting tank (5).