CN212255942U - Transparent display panel and display device - Google Patents
Transparent display panel and display device Download PDFInfo
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- CN212255942U CN212255942U CN202021435965.0U CN202021435965U CN212255942U CN 212255942 U CN212255942 U CN 212255942U CN 202021435965 U CN202021435965 U CN 202021435965U CN 212255942 U CN212255942 U CN 212255942U
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Abstract
The utility model discloses a transparent display panel and display device has sunk structure's bearer layer through the setting to set up the reflection stratum in one side of bearer layer orientation liquid crystal layer, can make the light guide substrate incide the light on the reflection structure and reflect the back and through going out light zone outgoing. Thereby, the liquid crystal display panel can realize the effect of transparent display.
Description
Technical Field
The utility model relates to a show technical field, in particular to transparent display panel and display device.
Background
With the development of display technology, a transparent display panel is proposed as a novel display means, and the transparent display panel can see displayed images from the front side of the panel and objects on the back side of the transparent display panel through the panel. Transparent display panels have many potential applications, such as windows in buildings or automobiles, display windows in stores. In addition to these large device applications, small devices such as handheld tablet computers may benefit from a transparent display panel.
SUMMERY OF THE UTILITY MODEL
An embodiment of the utility model provides a transparent display panel and display device for realize transparent demonstration.
The embodiment of the utility model provides a transparent display panel, including a plurality of sub-pixels, still include:
a substrate base plate;
the light guide substrate is arranged opposite to the substrate and comprises a plurality of light-in regions and a plurality of light-out regions which are arranged at intervals; wherein one of the sub-pixels includes one of the light-in regions and one of the light-out regions;
the liquid crystal layer is positioned between the substrate base plate and the light guide base plate;
the bearing layer is positioned between the substrate base plate and the liquid crystal layer and comprises a plurality of concave structures; wherein one of the sub-pixels includes one of the recessed structures;
the reflecting layer is positioned between the bearing layer and the liquid crystal layer and comprises a plurality of reflecting structures; wherein an orthographic projection of one of the concave structures on the substrate covers an orthographic projection of one of the reflective structures on the substrate;
in the same sub-pixel, the reflection structure is used for reflecting incident light to obtain emergent light when the incident light in the light-entering area of the light guide substrate is incident on the reflection structure through the liquid crystal layer, so that the emergent light passes through the light-exiting area of the light guide substrate to be emitted.
In some examples, the recessed structures are triangular in cross-section in a direction parallel to the rows of sub-pixels and in a direction perpendicular to the substrate base.
In some examples, the triangle has a first side, a second side, and a third side connected in series; wherein the first edge and the second edge are side edges of the recessed structure, and the third edge is an opening of the recessed structure;
the length of the second edge is greater than that of the first edge, and an included angle between the second edge and the third edge is 20-40 degrees.
In some examples, the bearer layer comprises a plurality of sub bearer layers arranged at intervals; and one sub-pixel comprises one sub-bearing layer, and the orthographic projection of the sub-bearing layer on the substrate covers the orthographic projection of the concave structure on the substrate.
In some examples, the material of the bearing layer is photoresist with light shielding performance.
In some examples, the transparent display panel further comprises: the transistor layer is positioned between the substrate base plate and the bearing layer, and the driving electrode layer is positioned between the transistor layer and the bearing layer; wherein the transistor layer comprises a plurality of thin film transistors; the driving electrode layer comprises a plurality of transparent pixel electrodes;
one of the sub-pixels includes one of the thin film transistors and one of the transparent pixel electrodes, and the thin film transistor and the transparent pixel electrode in the same sub-pixel are electrically connected to each other.
In some examples, in the same sub-pixel, an orthographic projection of the sub-carrier layer on the substrate covers an orthographic projection of the thin film transistor on the substrate; and/or the presence of a gas in the gas,
in the same sub-pixel, the orthographic projection of the transparent pixel electrode on the substrate covers the orthographic projection of the sub-bearing layer on the substrate.
In some examples, the display panel further comprises: a first flat layer between the reflective layer and the liquid crystal layer; wherein the first flat layer covers the substrate base plate and the bearing layer and is filled into the concave structure.
In some examples, the light guide substrate includes: the liquid crystal display panel comprises a substrate, a liquid crystal layer, a light guide plate, a light-taking layer, a transparent common electrode layer, a black matrix layer and a light source structure, wherein the liquid crystal layer is positioned on one side, away from the substrate, of the liquid crystal layer; wherein the light extraction layer comprises a plurality of openings which are arranged at intervals; the orthographic projection of one opening on the substrate base plate is positioned in one light incoming area;
the orthographic projection of the black matrix layer on the substrate and the orthographic projection of the light-out area on the substrate are overlapped, and the orthographic projection of the black matrix layer on the substrate and the orthographic projection of the light-in area on the substrate are not overlapped.
The embodiment of the utility model provides a still provide a display device, including above-mentioned transparent display panel.
The utility model discloses beneficial effect as follows:
the embodiment of the utility model provides a transparent display panel and display device has sunk structure's bearer layer through the setting to set up the reflection stratum in one side of bearer layer orientation liquid crystal layer, can make the light guide substrate incide the light on the reflection structure and reflect the back and through going out light zone outgoing. Thereby, the liquid crystal display panel can realize the effect of transparent display.
Drawings
Fig. 1 is a schematic top view of a transparent display panel according to an embodiment of the present invention;
FIG. 2a is a schematic cross-sectional view of the transparent display panel shown in FIG. 1 along direction AA';
FIG. 2b is another schematic cross-sectional view of the transparent display panel shown in FIG. 1 along direction AA';
FIG. 3 is a schematic cross-sectional view of the transparent display panel shown in FIG. 1 along direction AA';
fig. 4 is a flow chart of a manufacturing method in an embodiment of the present invention;
FIG. 5a is a schematic top view along direction AA' of the transparent display panel shown in FIG. 1;
FIG. 5b is a schematic top view along direction AA' of the transparent display panel shown in FIG. 1;
fig. 6 is a schematic top view of a second mask according to an embodiment of the present invention;
fig. 7a is a schematic top view of a second reticle and a substrate base plate according to an embodiment of the present invention;
FIG. 7b is a cross-sectional view along direction AA' of the schematic top view shown in FIG. 7 a;
fig. 8a is another schematic top view of a second reticle and a substrate base in an embodiment of the present invention;
FIG. 8b is a cross-sectional view along direction AA' of the schematic top view shown in FIG. 8 a;
fig. 9a is a schematic top view of a second reticle and a substrate base plate according to an embodiment of the present invention;
FIG. 9b is a cross-sectional view along direction AA' of the schematic top view shown in FIG. 9 a;
fig. 10a is a schematic top view of a second reticle and a substrate base plate according to an embodiment of the present invention;
FIG. 10b is a cross-sectional view along direction AA' of the schematic top view shown in FIG. 10 a;
fig. 11a is a schematic top view of a second reticle and a substrate base plate according to an embodiment of the present invention;
FIG. 11b is a cross-sectional view along direction AA' of the schematic top view shown in FIG. 11 a;
fig. 12a is a schematic top view of a second reticle and a substrate base plate according to an embodiment of the present invention;
FIG. 12b is a cross-sectional view along the AA' direction of the schematic top view shown in FIG. 12 a.
Detailed Description
In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the drawings of the embodiments of the present invention are combined below to clearly and completely describe the technical solution of the embodiments of the present invention. It is to be understood that the embodiments described are only some of the embodiments of the present invention, and not all of them. And without conflict, the embodiments and features of the embodiments of the present invention may be combined with each other. All other embodiments, which can be obtained by a person skilled in the art without any inventive work based on the described embodiments of the present invention, belong to the protection scope of the present invention.
Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by those of ordinary skill in the art to which the invention belongs. The use of "first," "second," and similar terms in the description herein do not denote any order, quantity, or importance, but rather the terms are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect.
It should be noted that the sizes and shapes of the figures in the drawings are not to be considered true scale, but are merely illustrative of the present invention. And the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout.
A Liquid Crystal Display (LCD) panel has the advantages of high color gamut, good picture quality, light weight, low power consumption, and the like, and is widely applied to electronic Display products such as a tablet computer, a television, a mobile phone, and a vehicle-mounted Display. However, in general, a liquid crystal display panel generally includes a liquid crystal display substrate and a backlight, and the liquid crystal display panel has a large obstacle when applied to transparent display due to the presence of the backlight.
In view of this, an embodiment of the present invention provides a transparent display panel, as shown in fig. 1 to 2b, which may include:
a substrate base plate 100 including a plurality of sub-pixels spx;
a light guide substrate 200 disposed opposite to the base substrate 100, the light guide substrate 200 including a plurality of light entrance regions RG and a plurality of light exit regions CG disposed at intervals; wherein, one sub-pixel spx comprises an light-in area RG and a light-out area CG;
a liquid crystal layer 300 between the substrate 100 and the light guide substrate 200;
the carrier layer 110 is located between the substrate 100 and the liquid crystal layer 300, and the carrier layer 110 includes a plurality of concave structures 112; wherein one sub-pixel spx comprises one recessed structure 112;
a reflective layer 130 located between the carrier layer 110 and the liquid crystal layer 300, wherein the reflective layer 130 includes a plurality of reflective structures 131; wherein, the orthographic projection of one concave structure 112 on the substrate base plate 100 covers the orthographic projection of one reflective structure 131 on the substrate base plate 100;
in the same sub-pixel spx, the reflective structure 131 is configured to reflect incident light to obtain outgoing light when the incident light in the light incident region RG of the light guide substrate 200 is incident on the reflective structure 131 through the liquid crystal layer 300, so that the outgoing light is emitted through the light outgoing region CG of the light guide substrate 200. Exemplarily, referring to fig. 2a, by controlling the deflection state of the liquid crystal molecules in the liquid crystal layer 300 in the subpixel spx, the refractive index of the liquid crystal layer 300 can be controlled, and further, the light S1 incident into the light guide substrate 200 can be refracted through the light incident region RG to form the light S2, the light S2 enters the liquid crystal layer 300 to form the light S3, the light S3 exits the liquid crystal to form the light S4, the light S4 is incident on the reflective structure 131, and the light S4 is reflected by the reflection action of the reflective structure 131 to obtain the reflected light S5, and the reflected light S5 passes through the liquid crystal layer and the light exiting region CG to exit the light guide substrate 200. This can realize an image display effect. It will be appreciated that the optical paths in figure 2a are only schematic.
The embodiment of the utility model provides an above-mentioned transparent display panel has sunk structure's bearer layer through the setting to set up the reflection stratum in one side of bearer layer to the liquid crystal layer, can make the light guide substrate incide the light on the reflection structure and reflect the back and through going out light zone outgoing. Thereby, the liquid crystal display panel can realize the effect of transparent display.
Illustratively, the carrier layer 110 has a light blocking effect. Thus, referring to fig. 3, by controlling the deflection state of the liquid crystal molecules in the liquid crystal layer 300 in the subpixel spx, the refractive index of the liquid crystal layer 300 can be changed, and further, the light S1 incident into the light guide substrate 200 can be refracted through the light incident region RG to form light S2, the light S2 enters the liquid crystal layer 300 to form light S9, the light S9 exits the liquid crystal to form light S10, the light S10 enters the carrier layer 110, and the light S5 can be prevented from exiting through the light exit region CG by the light blocking effect of the carrier layer 110, so that a black screen can be formed. It will be appreciated that the optical paths in figure 3 are only schematic.
In practical implementation, as shown in fig. 1 to 2b, the cross section of the recess structure 112 in the row direction F1 parallel to the sub-pixel spx and in the direction F3 perpendicular to the substrate base plate 100 is triangular in the embodiment of the present invention. Illustratively, the triangle has a first side L1, a second side L2, and a third side L3 connected in series; wherein, the first side L1 and the second side L2 are the sides of the recess structure 112, and the third side L3 is the opening of the recess structure 112; the length of the second side L2 is greater than that of the first side L1, and an included angle beta between the second side L2 and the third side L3 is 20-40 degrees. For example, the included angle β may be 25 to 35 degrees. For example, the included angle β may be 28 to 32 degrees. For example, the included angle β may be 20 degrees. Included angle beta may also be 25 degrees. Included angle beta may also be 28 degrees. The included angle beta may also be 30 degrees. Included angle beta may also be 32 degrees. Included angle beta may also be 35 degrees. The included angle beta may also be 40 degrees. The reflection angle of the light S3 can be adjusted by adjusting the angle of the included angle β, so that the light S3 can exit through the light exit region CG. Of course, in practical applications, the specific value of the included angle β may be designed and determined according to the requirements of practical applications, and is not limited herein.
In practical implementation, in the embodiment of the present invention, as shown in fig. 1 and fig. 2a, the reflective structure 131 may be disposed only on the second side L2 of the concave structure 112. This reduces the area of the reflection structure, and reduces the occurrence of stray light by not providing a reflection structure at a position where the concave structure 112 does not exhibit a reflection function. Alternatively, as shown in fig. 2b, the reflective structure 131 may be disposed on both the first side L1 and the second side L2 of the recess structure 112. Thus, the process preparation difficulty can be reduced.
In practical implementation, in the embodiment of the present invention, as shown in fig. 1 to fig. 2b, the sub-pixels are arranged in an array. For example, the sub-pixels are arranged uniformly in the row direction F1 and the column direction F2. Further, the transparent display panel may include: a plurality of pixel units arranged in an array. Each pixel unit includes a plurality of sub-pixels. Illustratively, the pixel unit may include a red sub-pixel, a green sub-pixel, and a blue sub-pixel, so that color mixing may be performed by red, green, and blue to realize a color display. Alternatively, the pixel unit may also include a red sub-pixel, a green sub-pixel, a blue sub-pixel, and a white sub-pixel, so that color display may be realized by performing color mixing of red, green, blue, and white. Of course, in practical applications, the light emitting color of the sub-pixels in the pixel unit may be determined according to practical application environments, and is not limited herein. Illustratively, each sub-pixel constitutes one pixel, i.e. each sub-pixel displays the same color, so that the design can realize monochrome display and increase the resolution of the display panel.
In practical implementation, in the embodiment of the present invention, as shown in fig. 1 to fig. 2b, the bearing layer 110 may include a plurality of sub bearing layers 111 arranged at intervals; one sub-pixel spx includes one sub-carrier layer 111, and an orthogonal projection of the sub-carrier layer 111 on the substrate 100 covers an orthogonal projection of the recess structure 112 on the substrate 100. By providing the sub-carrier layers 111 in this way, not only light incident on the reflective structure 131 from the substrate 100 side can be blocked, but also an effect of transparent display can be achieved by the gap between the sub-carrier layers 111.
For example, in order to enable the carrier layer 110 to achieve a light shielding effect, in an embodiment of the present invention, the material of the carrier layer 110 may be a material having a light shielding property. For example, the material of the carrier layer 110 may be a photoresist having a light shielding property. For example, the material of the carrier layer 110 may be black photoresist. Of course, in practical applications, the material of the carrier layer 110 may be designed according to the requirements of practical applications, and is not limited herein.
In a specific implementation, in an embodiment of the present invention, as shown in fig. 1 to fig. 2b, the transparent display panel may further include: a transistor layer 140 located between the substrate 100 and the carrier layer 110, and a driving electrode layer 150 located between the transistor layer 140 and the carrier layer 110; wherein the transistor layer 140 includes a plurality of thin film transistors; the driving electrode layer 150 includes a plurality of transparent pixel electrodes 151; one sub-pixel spx includes one thin film transistor and one transparent pixel electrode 151, and the thin film transistor and the transparent pixel electrode 151 in the same sub-pixel spx are electrically connected to each other. The thin film transistor includes a gate electrode, an active layer, a source electrode, and a drain electrode. For example, the transistor layer 140 may further include a plurality of gate lines and data lines, the gates of the thin film transistors of one row of the sub-pixels spx are electrically connected to one gate line, the sources of the thin film transistors of one column of the sub-pixels spx are electrically connected to one data line, and the drain of the thin film transistor in each sub-pixel spx is electrically connected to the transparent pixel electrode 151.
Preferably, in the embodiment of the present invention, the material of the transparent pixel electrode 151 may be a transparent conductive material, such as an Indium Tin Oxide (ITO) material, an Indium Zinc Oxide (IZO) material, a carbon nanotube, or graphene, and the like, which is not limited herein.
Preferably, in the embodiment of the present invention, as shown in fig. 1 to 2b, in the same sub-pixel spx, an orthogonal projection of the sub-carrier layer 111 on the substrate 100 covers an orthogonal projection of the thin film transistor on the substrate 100. Therefore, the problem of poor viewing effect caused by the fact that the thin film transistor views an object through the transparent display panel can be solved.
Preferably, in the embodiment of the present invention, as shown in fig. 1 to 2b, in the same sub-pixel spx, an orthogonal projection of the transparent pixel electrode 151 on the substrate 100 covers an orthogonal projection of the sub-carrier layer 111 on the substrate 100. Preferably, in the same subpixel spx, the light incident region RG is covered by the orthogonal projection of the transparent pixel electrode 151 on the substrate 100. This allows maximum control of the liquid crystal molecules for deflection.
In order to avoid the influence of the recessed structures 112 on the arrangement of the liquid crystal molecules, it is preferable that, in an embodiment of the present invention, as shown in fig. 1 to 2b, the display panel further includes: a first planarization layer 160 between the reflective layer 130 and the liquid crystal layer 300; wherein the first planarization layer 160 covers the substrate base plate 100 and the carrier layer 110, and fills the recess structure 112. Further, the display panel may further include: a first alignment layer 170 between the first planarization layer 160 and the liquid crystal layer 300; wherein the first alignment layer 170 covers the base substrate 100. In this way, a planarization effect can be achieved by the first planarization layer 160. Therefore, when the first alignment layer 170 is formed, the adverse effect of the concave structure 112 on the first alignment layer 170 when the first alignment layer 170 is rubbed can be reduced. And, because of the existence of the recessed structure, if the first planarization layer 160 is not provided, the liquid crystal is disturbed, causing light leakage, and the planarization can be presented by providing the first planarization layer 160 and covering the whole surface.
In practical implementation, in the embodiment of the present invention, as shown in fig. 1 to 2b, the light guide substrate 200 includes: the light guide plate 210 is positioned on one side of the liquid crystal layer 300, which is far away from the substrate 100, the light extraction layer 220 is positioned between the light guide plate 210 and the liquid crystal layer 300, the transparent common electrode layer 240 is positioned between the light extraction layer 220 and the liquid crystal layer 300, the black matrix layer 230 is positioned between the transparent common electrode layer 240 and the liquid crystal layer 300, and the light source structure 250 is positioned on one side of the light guide plate 210; wherein, the light extraction layer 220 includes a plurality of openings arranged at intervals; an opening is located in an incident light region RG in the orthogonal projection of the base substrate 100; the orthographic projection of the black matrix layer 230 on the base substrate 100 overlaps the orthographic projection of the black matrix layer 230 on the base substrate 100 with the light exit region CG, and the orthographic projection of the black matrix layer 230 on the base substrate 100 does not overlap the orthographic projection of the light entrance region RG on the base substrate 100.
In practical implementation, in the embodiment of the present invention, as shown in fig. 1 to fig. 2b, the transparent display panel may further include a color film layer 290. Illustratively, the orthographic projection of the color film layer 290 on the light guide plate 210 overlaps the light exit area CG. Preferably, the orthographic projection of the color film layer 290 on the light guide plate 210 overlaps the light exit region CG. Illustratively, the color film layer 290 in the red sub-pixel may be a red color film layer. The color film 290 in the green sub-pixel may be a green color film. The color film 290 in the blue sub-pixel may be a blue color film. Illustratively, the color film layer 290 may be a colorless transparent film layer, such as a transparent resin or the like.
Preferably, in the embodiment of the present invention, as shown in fig. 2a and fig. 2b, an etching barrier layer may be further disposed between the light extraction layer 220 and the light guide plate 210. Illustratively, the material of the etch barrier layer may be Indium Gallium Zinc Oxide (IGZO). Thus, when etching is performed later, the surface of the light blocking plate is prevented from being etched, so that the light guide plate 210 has a rough surface and is subjected to diffuse reflection.
Preferably, in the embodiment of the present invention, as shown in fig. 2a and fig. 2b, an auxiliary layer is further disposed between the light-extracting layer 220 and the transparent common electrode layer 240264. Also, the orthogonal projection of the auxiliary layer 264 on the light guide plate 210 overlaps the orthogonal projection of the light extraction layer 220 on the light guide plate 210. Further, the orthographic projection of the auxiliary layer 264 on the light guide plate 210 overlaps with the orthographic projection of the light-extracting layer 220 on the light guide plate 210. The auxiliary layer 264 serves to prevent the etching and stripping process from damaging the upper surface of the light extraction layer 220. Illustratively, the material of the auxiliary layer 264 may include SiO2. Of course, other materials can be used to prepare the auxiliary layer 264, which can be designed according to the requirements of the practical application and is not limited herein.
Preferably, in the embodiment of the present invention, as shown in fig. 2a and 2b, a third planarization layer 263 is further disposed between the auxiliary layer 264 and the transparent common electrode layer 240. Also, the third flat layer 263 covers the light guide plate 210, the light extraction layer 220, and the auxiliary layer 264, and fills the opening of the light extraction layer 220. In this way, a planarization effect can be achieved by the third planarization layer 263. Therefore, when the transparent common electrode layer 240 is formed, the adverse effect of the opening of the light-extracting layer 220 on the transparent common electrode layer 240 can be reduced.
Preferably, in the embodiment of the present invention, as shown in fig. 2a and 2b, a dielectric layer 265 is further disposed between the transparent common electrode layer 240 and the black matrix layer 230. Also, the dielectric layer 265 covers the transparent common electrode layer 240. The dielectric layer 265 may increase the adhesion of the black matrix layer 230 and insulate the black matrix layer 230 from the transparent common electrode layer 240, preventing the black matrix layer 230 from interfering with the electric field sensed by the liquid crystal. Illustratively, the material of the dielectric layer 265 may include SiO2. Of course, other materials may be used to prepare the dielectric layer 265, which may be designed according to the requirements of practical applications, and is not limited herein.
Preferably, in the embodiment of the present invention, as shown in fig. 2a and 2b, a second flat layer 262 is further disposed between the black matrix layer 230 and the liquid crystal layer 300, so that disorder of liquid crystal caused by a step difference can be prevented, and light leakage or other display abnormalities can be avoided.
It should be noted that different data voltages can be input to the transparent pixel electrode 151 by turning on and off the thin film transistor, so that the electric fields between the transparent pixel electrode 151 and the transparent common electrode layer can be different, thereby controlling different degrees of liquid crystal deflection, and realizing light emission and brightness of different gray scales. Further, the first flat layer 160 and the second flat layer 262 may be disposed to control the light emitting direction to be consistent when different gray scales are used for displaying. Referring to fig. 5a, θ 1 is the refraction angle of the light S2, θ 2 is the refraction angle of the light S3, θ 3 is the refraction angle of the light S4, n1 is the refraction index of the medium environment before the light enters the liquid crystal layer 300, n2 is the refraction index of the liquid crystal layer 300, and n3 is the refraction index of the first flat layer 160. The following formula may be satisfied: n1 ═ n2 ═ n (θ 2) ═ n3 ═ sin (θ 3). Where n1 and θ 1 are fixed. The liquid crystal layer can be equivalent to a parallel plate of a multilayer medium, and n2 is not a constant value. And n3 and θ 3 are fixed. Therefore, the final light-emitting angle can be set to be a constant value, and the light-emitting directions can be consistent.
In an embodiment of the present invention, the refractive index of the light-extracting layer 220 may be smaller than the refractive index of the light guide plate 210. Illustratively, the refractive index of the light extraction layer 220 may be 1.20 to 1.30. The refractive index of the light guide plate 210 may be 1.50 to 1.60. For example, the refractive index of the light extraction layer 220 may be 1.20, and the refractive index of the light guide plate 210 may be 1.50. Alternatively, the refractive index of the light extraction layer 220 may be 1.25, and the refractive index of the light guide plate 210 may be 1.56. Alternatively, the refractive index of the light extraction layer 220 may be 1.30, and the refractive index of the light guide plate 210 may be 1.60. In practical applications, the refractive indexes of the light-extracting layer 220 and the light guide plate 210 may be designed according to the requirements of practical applications, and are not limited herein.
In a specific implementation, the second planarization layer 262 may be equal to or approximately equal to the refractive index of the light guide plate 210, so as to allow light of the light guide plate 210 to effectively enter the light-entering region RG. For example, when the refractive index of the light guide plate 210 is 1.50, the refractive index of the second flat layer 262 may be 1.50, 1.52, or 1.55, and the refractive index of the second flat layer 262 may vary within a range of 1.52 ± 0.05 as the wavelength of light varies.
In a specific implementation, in the embodiment of the present invention, as shown in fig. 1 to fig. 2b, the light guide substrate 200 may further include: and a second alignment layer 280 between the transparent common electrode layer 240 and the liquid crystal layer 300. Also, the light source structure 250 may emit polarized light to the light guide plate 210. Illustratively, the light source structure 250 may be an LED light source.
Preferably, in this embodiment, the material of the transparent common electrode layer 240 may be a transparent conductive material, such as an Indium Tin Oxide (ITO) material, an Indium Zinc Oxide (IZO) material, a carbon nanotube, or graphene, and is not limited herein.
In practical implementation, in the embodiment of the present invention, a supporting portion may be further disposed between the first alignment layer 170 and the second alignment layer 280, so that the space for encapsulating the liquid crystal layer 300 can be supported by the supporting portion. Further, the orthographic projection of the sub-carrier layer 111 on the substrate 100 may cover the orthographic projection of the support portion on the substrate 100.
The embodiment of the utility model provides a preparation method of above-mentioned transparent display panel, as shown in FIG. 4, can include following step:
s410, forming a bearing layer 110 on the substrate base plate 100;
s420, forming a reflecting layer 130 on one side of the bearing layer 110, which is far away from the substrate base plate 100;
s430, forming a liquid crystal layer 300 between the substrate base plate 100 and the light guide base plate 200, and then performing cell alignment;
wherein the substrate base plate 100 includes a plurality of sub-pixels spx; the light guide substrate 200 includes a plurality of light-in regions RG and a plurality of light-out regions CG that are provided at intervals; the carrier layer 110 includes a plurality of recessed structures 112; the reflective layer 130 includes a plurality of reflective structures 131; wherein, one sub-pixel spx comprises an light-in area RG, a light-out area CG and a concave structure 112; and an orthographic projection of the concave structure 112 on the substrate 100 covers an orthographic projection of the reflective structure 131 on the substrate 100; and, in the same sub-pixel spx, the reflective structure 131 is configured to reflect the incident light to obtain the outgoing light when the incident light in the light incident region RG of the light guide substrate 200 is incident on the reflective structure 131 through the liquid crystal layer 300, so that the outgoing light is emitted through the light outgoing region CG of the light guide substrate 200.
In practical implementation, in the embodiment of the present invention, the forming of the carrier layer 110 on the substrate 100 may specifically include:
forming a carrier thin film layer on the substrate base plate 100 by using a photoresist having a light-shielding property;
exposing and developing the bearing thin film layer by adopting a first mask to form a plurality of sub bearing layers 111 arranged at intervals; wherein one sub-pixel spx includes one sub-carrier layer 111;
and performing multiple exposures with different exposure light intensities on each sub bearing layer 111 by using a second mask, and forming a concave structure 112 on each sub bearing layer 111 after the exposure.
Exemplarily, the exposing with different light intensities to each sub-carrier layer 111 by using the second mask specifically includes:
arranging a second mask 10 with a plurality of slits 11 arranged at intervals on one side of the bearing layer 110, which is far away from the substrate 100; as shown in fig. 6, one sub-carrier layer 111 corresponds to one slit 11;
setting stepping is adopted, the second mask is controlled to move along the row direction of the sub-pixels spx, and exposure is carried out after the second mask stops moving each time according to the condition that the exposure light intensity is increased in sequence;
the exposed base substrate 100 is developed to form a recess structure 112 on each sub-carrier layer 111.
For example, the step setting can be to control the second mask to move 1-3 microns at a time. For example, the step may be set to control the second reticle to move 1 micron at a time. The step may also be set to control the second reticle to move 2 microns at a time. The step may also be set to control the second reticle to move 3 microns at a time. Of course, the setting step can be designed and determined according to the requirements of practical application, and is not limited herein.
The following describes the above-mentioned preparation method provided by the embodiment of the present invention with reference to fig. 2 a. The embodiment of the utility model provides an above-mentioned preparation method can include following step:
(1) transistor layer 140 is formed on substrate 100 (e.g., a glass substrate). Wherein, the utility model provides a thin film transistor can be Metal Oxide Semiconductor field effect (MOS) transistor. In practical application, the thin film transistor in the embodiment of the present invention can be formed by a process of forming a MOS transistor, and the detailed process is not repeated herein.
(2) A plurality of transparent pixel electrodes 151 are formed on the transistor layer 140 away from the substrate 100 through the ITO material using a patterning process. Illustratively, the thickness of the transparent pixel electrode layer 140 can be 10-80 nm. For example, the thickness of the transparent pixel electrode layer may be 10 nm, 40 nm, 70 nm, or 80 nm. Preferably, the thickness of the transparent pixel electrode layer may be made 70 nm.
(3) A carrier film layer covering the substrate 100 is formed on the substrate 100 using a photoresist having a light shielding property. Illustratively, the thickness of the carrier film layer in a direction perpendicular to the substrate base plate 100 may be 4 to 8 micrometers. For example, the thickness of the carrier film layer in the direction perpendicular to the substrate base plate 100 may be 4 microns, 6 microns, 8 microns. Preferably, the thickness of the carrier film layer in a direction perpendicular to the base substrate 100 may be 6 micrometers.
(4) And exposing and developing the bearing thin film layer by using a first mask to form a plurality of sub bearing layers 111 arranged at intervals. Illustratively, the thickness of the sub-carrier layer 111 may be made 6 microns.
(5) A second mask having a plurality of slits arranged at intervals is arranged on a side of the carrier layer 110 facing away from the substrate 100. Wherein the width of the slit may be 2 micrometers.
(6) The second mask 10 is controlled to move in the row direction F1 of the sub-pixels spx according to a set step of controlling the second mask to move by 2 μm each time, and exposure is performed after the movement of the second mask 11 is stopped each time according to a condition that the exposure light intensity is sequentially reduced. Wherein the second reticle may be controlled to move 5 times. For example, as shown in fig. 7a and 7b, after the second mask is disposed on the base substrate 100, exposure is performed with light having an exposure light intensity of G6. Thereafter, as shown in fig. 8a and 8b, the second reticle 10 is controlled to move 2 μm in the row direction F1 of the sub-pixel spx, and exposure is performed with light having an exposure light intensity of G5. Thereafter, as shown in fig. 9a and 9b, the second reticle 10 is controlled to move 2 μm in the row direction F1 of the sub-pixel spx, and exposure is performed with light having an exposure light intensity of G4. Then, as shown in fig. 10a and 10b, the second reticle 10 is controlled to move 2 μm in the row direction F1 of the sub-pixel spx, and exposure is performed with light having an exposure light intensity G3. Thereafter, as shown in fig. 11a and 11b, the second reticle 10 is controlled to move 2 μm in the row direction F1 of the sub-pixel spx, and exposure is performed with light having an exposure light intensity of G2. Thereafter, as shown in fig. 12a and 12b, the second reticle 10 is controlled to move 2 μm in the row direction F1 of the sub-pixel spx, and exposure is performed with light having an exposure light intensity of G1. Wherein, G6> G5> G4> G3> G2> G1.
(7) The exposed substrate 100 is developed, so that the sub-bearing layer 111 can form a triangular recessed structure 112 as shown in fig. 2 a.
(8) A patterning process is used to form the reflective structure 131 in the reflective layer 130 on the side of the carrier layer 110 facing away from the substrate 100. The material of the reflective layer 130 may be a metal material, such as Al, Ag, Mo, etc., and is not limited herein. Illustratively, the reflective structure 131 may be formed on the second side L2, and the reflective structure 131 may have a width of 12 micrometers in a direction parallel to the second side L2.
(9) The first planarization layer 160 is formed on the side of the reflective layer 130 away from the substrate 100, so that the influence of the recess structure 112 on the alignment of the liquid crystal molecules can be reduced. For example, the thickness of the first planarization layer 160 on the sub-carrier layer 111 may be 1 μm, and the first planarization layer 160 at the rest positions may be filled to make the surface of the first planarization layer on the side facing away from the substrate base plate as flat as possible. For example, the thickness of the first planarization layer 160 filled in the gap between the sub-carrier layers 111 may be 7 μm.
(10) A first alignment layer 170 is formed on the side of the first planarization layer 160 facing away from the substrate base 100.
(11) An etch stopper 261 covering the light guide plate 210 is formed on the light guide plate 210 using an IGZO material. Illustratively, the thickness of the light guide plate is set to 0.5 mm. The thickness of the etch stop layer 261 is set to 0.08 μm.
(12) The light-extracting layer 220 is formed on the side of the etching barrier layer away from the light guide plate 210 by using a patterning process. The material of the light extraction layer 220 may include photoresist and SiO dispersed in the photoresist2. Illustratively, the light extraction layer 220 may have a thickness of 0.8 microns.
Also, SiO can be used2The auxiliary layer 264 is formed on the light extraction layer 220, so that the upper surface of the light extraction layer 220 can be prevented from being damaged by etching and stripping processes. Illustratively, the auxiliary layer 264 may have a thickness of 0.1 microns.
(13) A third flat layer 263 is formed on the auxiliary layer 264 on the side facing away from the light guide plate 210. The third flat layer 263 covers the light guide plate 210, the light extraction layer 220, and the auxiliary layer 264, and fills the opening of the light extraction layer 220. For example, the thickness of the third flat layer 263 on the auxiliary layer 264 may be 1.2 μm, and the third flat layer 263 at the rest positions may be filled to make the surface of the third flat layer 263 facing away from the light guide plate 210 as flat as possible. For example, the thickness of the third planarization layer 263 filled into the opening of the light-taking layer 220 may be 2.1 μm.
(14) The transparent common electrode layer 240 is formed on the third flat layer 263 at a side away from the light guide plate 210 using an ITO material. Illustratively, the thickness of the transparent common electrode layer 240 may be 0.07 μm.
(15) By means of SiO2And a dielectric layer 265 formed on the transparent common electrode layer 240 at a side away from the light guide plate 210. Illustratively, the dielectric layer 265 may have a thickness of 0.12 microns.
(16) The black matrix layer 230 is formed on the side of the dielectric layer 265 away from the light guide plate 210 by a patterning process. This can prevent light leakage, that is, by providing the black matrix layer 230, not only impurity light reflected due to unevenness of the surface of the reflective layer 130 but also stray light due to the action of liquid crystal molecules can be blocked. Illustratively, the thickness of the black matrix layer 230 may be 1 micrometer.
(17) A second flat layer 262 is formed on the side of the black matrix layer 230 facing away from the light guide plate 210. For example, the thickness of the second flat layer 262 on the black matrix layer 230 may be 1 μm, and the second flat layer 262 at the rest positions may be filled in such a way that the surface of the second flat layer 262 facing away from the light guide plate is as flat as possible.
(18) A second alignment layer 280 is formed on a side of the second flat layer 262 facing away from the light guide plate 210.
(19) The cell alignment is performed after the liquid crystal layer 300 is formed between the substrate 100 and the light guide substrate 200. Preferably, the thickness of the liquid crystal layer 300 is 30 micrometers.
The steps (1) to (10) may be performed independently of the steps (11) to (18), and the order of the steps (1) to (10) and the steps (11) to (18) is not limited herein.
An example relating to specific structural and dimensional relationships is given below: as shown in connection with fig. 5b, table 1 shows: the thickness H1 (micrometers) of the liquid crystal layer 300, the thickness H2 (micrometers) of the etching blocking layer 261, the thickness H3 (micrometers) of the light extracting layer 220, the thickness H4 (micrometers) of the auxiliary layer 264, the thickness H5 (micrometers) of the third planarization layer 263 located on the auxiliary layer 264, the thickness H6 (micrometers) of the transparent common electrode layer 240, the thickness H7 (micrometers) of the dielectric layer 265, the thickness H8 (micrometers) of the black matrix layer 230, the thickness H9 (micrometers) of the second planarization layer 262 located on the black matrix layer 230, the thickness H10 (micrometers) of the first planarization layer 160 located on the sub-carrier layer 111, the thickness H11 (micrometers) of the sub-carrier layer 111, and the thickness H12 (micrometers) of the transparent pixel electrode 151.
| H1 | H2 | H3 | H4 | H5 | H6 | H7 | H8 | H9 | H10 | H11 | H12 |
| 30 | 0.08 | 0.8 | 0.1 | 1.2 | 0.07 | 0.12 | 1 | 1 | 1 | 6 | 0.07 |
TABLE 1
As shown in connection with fig. 5b, table 2 shows: the refractive index n261 of the etching blocking layer 261, the refractive index n220 of the light extracting layer 220, the refractive index n264 of the auxiliary layer 264, the refractive index n263 of the third flat layer 263, the refractive index n240 of the transparent common electrode layer 240, the refractive index n265 of the dielectric layer 265, the refractive index n262 of the second flat layer 262 and the refractive index n160 of the first flat layer 160. It should be noted that the first flat layer 160, the second flat layer 262, and the third flat layer 263 can be made of the same material, and the refractive index thereof varies within a range of 1.52 ± 0.05 with the variation of the wavelength of light; it should be noted that the refractive indices of the remaining layers other than those listed in table 2 may be disregarded.
| n261 | n220 | n264 | n263 | n240 | n265 | n262 | n160 |
| 1.5 | 1.25 | 1.52 | 1.52 | 1.5 | 1.52 | 1.52 | 1.52 |
TABLE 2
As shown in connection with fig. 5b, table 3 shows: a thickness H1 (micrometers) of the liquid crystal layer 300 in a direction of F3, a width D (micrometers) of an opening in an incident light region RG in a direction of F1, an included angle β, a length LS (micrometers) of the reflective structure 131 along a second side L2, a distance LM (micrometers) between a left side of a front projection of the reflective structure 131 on the substrate base plate 100 and a left side of a front projection of the incident light region RG on the substrate base plate 100 in a direction of F1, a light efficiency L255 (a light efficiency may be defined as a ratio of a light intensity emitted from the sub-pixel to a light intensity entering the incident light region RG from the light guide plate in a sub-pixel spx without a color film layer 290) when the display panel displays a gray scale of 255 (for example, a light efficiency L0 when the display panel displays a gray scale of 0 (for example, a gray scale of 0 to 255), a contrast CR (i.e., L255L 0) of the display panel, a resolution of the display panel, a width of a black matrix layer 230 in a sub-pixel in a front projection of the substrate base plate in a left side of the F8678 (3625) in a I.e., the difference between the first distance NS11 and the second distance NS12 between the left region of the black matrix layer 230 in one sub-pixel in the orthographic projection of the base substrate and the left region of the light incident region RG in the orthographic projection of the base substrate 100), the width CS (micrometers) of the light incident region RG in the F1 direction. Illustratively, the width NS2 of the black matrix layer 230 in one sub-pixel in the right area of the orthographic projection of the substrate base plate can be set to be 20-50 micrometers. For example, NS2 may be 20 microns, NS2 may be 30 microns, and NS2 may be 50 microns.
TABLE 3
The width D of the opening in the light incident region RG in the direction F1 may gradually increase as the distance from the light source structure 250 becomes larger, so as to make the light emitted from the light guide plate uniform. When the width D of the opening in the RG in the direction of F1 changes, the structural size of the sub-pixel spx can be adjusted through the parameters in the table, and the included angle β does not need to be adjusted, so that the light intensities of the 255 gray scales corresponding to different light emitting areas CG are consistent or approximately consistent, and the display uniformity of the display panel is improved.
It should be noted that, the positions and refractive indexes of the technical features defined in table 1 and table 2 and table 3 are only examples, and the display panel disclosed in some embodiments of the present invention may be designed without being limited to the above dimensions and refractive indexes.
Based on same utility model the design, the embodiment of the utility model provides a still provide a display device, include the embodiment of the utility model provides an above-mentioned transparent display panel. The principle of the display device to solve the problem is similar to the transparent display panel, so the implementation of the display device can be referred to the implementation of the transparent display panel, and repeated details are not repeated herein.
In particular, in the embodiment of the present invention, the display device may be: any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like. Other essential components of the display device are understood by those skilled in the art, and are not described herein or should be taken as limitations of the present invention.
The embodiment of the utility model provides a transparent display panel and display device has sunk structure's bearer layer through the setting to set up the reflection stratum in one side of bearer layer orientation liquid crystal layer, can make the light guide substrate incide the light on the reflection structure and reflect the back and through going out light zone outgoing. Thereby, the liquid crystal display panel can realize the effect of transparent display.
It will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (10)
1. A transparent display panel comprising a plurality of sub-pixels, further comprising:
a substrate base plate;
the light guide substrate is arranged opposite to the substrate and comprises a plurality of light-in regions and a plurality of light-out regions which are arranged at intervals; wherein one of the sub-pixels includes one of the light-in regions and one of the light-out regions;
the liquid crystal layer is positioned between the substrate base plate and the light guide base plate;
the bearing layer is positioned between the substrate base plate and the liquid crystal layer and comprises a plurality of concave structures; wherein one of the sub-pixels includes one of the recessed structures;
the reflecting layer is positioned between the bearing layer and the liquid crystal layer and comprises a plurality of reflecting structures; wherein an orthographic projection of one of the concave structures on the substrate covers an orthographic projection of one of the reflective structures on the substrate;
in the same sub-pixel, the reflection structure is used for reflecting incident light to obtain emergent light when the incident light in the light-entering area of the light guide substrate is incident on the reflection structure through the liquid crystal layer, so that the emergent light passes through the light-exiting area of the light guide substrate to be emitted.
2. The transparent display panel of claim 1, wherein the recessed structures are triangular in cross-section in a direction parallel to the rows of subpixels and in a direction perpendicular to the substrate base plate.
3. The transparent display panel of claim 2, wherein the triangle has a first side, a second side, and a third side connected in sequence; wherein the first edge and the second edge are side edges of the recessed structure, and the third edge is an opening of the recessed structure;
the length of the second edge is greater than that of the first edge, and an included angle between the second edge and the third edge is 20-40 degrees.
4. The transparent display panel of claim 1, wherein the carrier layer comprises a plurality of sub-carrier layers arranged at intervals; and one sub-pixel comprises one sub-bearing layer, and the orthographic projection of the sub-bearing layer on the substrate covers the orthographic projection of the concave structure on the substrate.
5. The transparent display panel of claim 4, wherein the material of the carrier layer is a photoresist having light-shielding properties.
6. The transparent display panel of claim 4, further comprising: the transistor layer is positioned between the substrate base plate and the bearing layer, and the driving electrode layer is positioned between the transistor layer and the bearing layer; wherein the transistor layer comprises a plurality of thin film transistors; the driving electrode layer comprises a plurality of transparent pixel electrodes;
one of the sub-pixels includes one of the thin film transistors and one of the transparent pixel electrodes, and the thin film transistor and the transparent pixel electrode in the same sub-pixel are electrically connected to each other.
7. The transparent display panel of claim 6, wherein in the same sub-pixel, an orthographic projection of the sub-carrier layer on the substrate covers an orthographic projection of the thin film transistor on the substrate; and/or the presence of a gas in the gas,
in the same sub-pixel, the orthographic projection of the transparent pixel electrode on the substrate covers the orthographic projection of the sub-bearing layer on the substrate.
8. The transparent display panel of any one of claims 1-7, wherein the display panel further comprises: a first flat layer between the reflective layer and the liquid crystal layer; wherein the first flat layer covers the substrate base plate and the bearing layer and is filled into the concave structure.
9. The transparent display panel of any one of claims 1-7, wherein the light guide substrate comprises: the liquid crystal display panel comprises a substrate, a liquid crystal layer, a light guide plate, a light-taking layer, a transparent common electrode layer, a black matrix layer and a light source structure, wherein the liquid crystal layer is positioned on one side, away from the substrate, of the liquid crystal layer; wherein the light extraction layer comprises a plurality of openings which are arranged at intervals; the orthographic projection of one opening on the substrate base plate is positioned in one light incoming area;
the orthographic projection of the black matrix layer on the substrate and the orthographic projection of the light-out area on the substrate are overlapped, and the orthographic projection of the black matrix layer on the substrate and the orthographic projection of the light-in area on the substrate are not overlapped.
10. A display device comprising the transparent display panel according to any one of claims 1 to 9.
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| US11822176B2 (en) * | 2020-03-06 | 2023-11-21 | Boe Technology Group Co., Ltd. | Display panel and display device |
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