CN212230390U

CN212230390U - Edge ring for plasma chamber

Info

Publication number: CN212230390U
Application number: CN202020516038.5U
Authority: CN
Inventors: 迈克尔·C·凯洛格; 亚当·克里斯多夫·梅斯; 阿列克谢·马拉霍塔诺夫; 约翰·霍兰德; 陈志刚; 菲力克斯·莱布·科扎克维奇; 亚历山大·马丘什金
Original assignee: Lam Research Corp
Current assignee: Lam Research Corp
Priority date: 2020-04-10
Filing date: 2020-04-10
Publication date: 2020-12-25
Anticipated expiration: 2030-04-10
Also published as: CN214411118U

Abstract

An edge ring for a plasma chamber is configured to be placed along a periphery of a substrate support. The top portion of the edge ring includes: an inner step area; a tilt region; an outer curved region; an intermediate top region having a top annular surface. The intermediate top region extends between the outer bend region and the sloped region. The sloped region has an annular angled surface and is disposed between the intermediate top region and the inner stepped region. The bottom portion of the edge ring includes a bottom annular surface having a plurality of screw inserts formed into the edge ring from the bottom annular surface.

Description

Edge ring for plasma chamber

Technical Field

The utility model relates to an edge ring that is used for plasma body processing module to have screw jack spare (screw insert).

Background

A typical substrate processing system used in processing semiconductor substrates includes a substrate storage cassette [ also referred to as a "substrate storage station" or front opening wafer transfer pod (FOUP) ] for transporting and storing substrates, an Equipment Front End Module (EFEM) engaged between the FOUP and a first side of one or more load lock chambers (also referred to as "airlocks"), a vacuum transport module coupled to a second side of the one or more airlocks, and one or more process modules coupled to the vacuum transport module. Each process module is used to perform a specific manufacturing operation, such as a cleaning operation, a deposition, an etching operation, a rinsing operation, a drying operation, and the like. Some of the hardware components of the process module are bonded together with other hardware components of the process module using a gel. Some gels wear out over time during manufacturing operations. As the gel wears, the adhesion between the two hardware components decreases. When the adhesion force is reduced, the hardware component is displaced during the manufacturing operation. This leads to poor results in manufacturing operations.

In this context, embodiments of the present invention have emerged.

SUMMERY OF THE UTILITY MODEL

An edge ring for a plasma chamber is disclosed, the edge ring configured to be placed along a periphery of a substrate support, the edge ring characterized in that a top portion of the edge ring comprises an inner step region; a tilt region; an outer curved region; a middle top region having a top annular surface, wherein the middle top region extends between the outer curved region and the sloped region, wherein the sloped region has an annular angled surface and is disposed between the middle top region and the inner stepped region; and the bottom of the edge ring includes a bottom annular surface having a plurality of screw inserts formed into the edge ring from the bottom annular surface.

Drawings

Fig. 1 is a top perspective view of an edge ring with screw inserts for a semiconductor processing module according to the present invention;

FIG. 2 is a top view thereof;

FIG. 3 is a bottom perspective thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a side view thereof;

FIG. 6 is a cross-sectional side view taken in cross-section along the bottom view of FIG. 4;

FIG. 7 is an enlarged cross-sectional side view of a portion of the view of FIG. 6 (shown by the dashed rectangle in FIG. 6);

fig. 8 is an enlarged cross-sectional side view of a portion of the views of fig. 6 and 7 (shown by the dashed circle in fig. 6).

Detailed Description

Fig. 1 illustrates a top perspective view of an edge ring 100 for a semiconductor processing module, which is a plasma chamber. The edge ring 100 is configured to be disposed along the periphery of the substrate support such that the edge ring 100 is positioned proximate to an edge of the substrate when the substrate is received in the semiconductor processing module. In one embodiment, the substrate support is a chuck. In one embodiment, the edge ring 100 is an adjustable or replaceable ring and includes a top annular surface 102 extending along the periphery of the substrate. The top annular surface 102 is the plasma-facing surface.

Fig. 2 is a top view of the edge ring 100. The top annular surface 102 is visible in fig. 2 and extends between an inner edge 202 and an outer edge 204 of the top annular surface 102. The outer edge 204 is annular; and the inner edge 202 is annular except for its straight portion 206. In one embodiment, the diameter of the inner edge 202 is 11.7 inches and the diameter of the outer edge 204 is 14.1 inches. Further, in one embodiment, the horizontal distance between the portion 206 of the inner edge 202 and the centroid of the edge ring 100 is 5.8 inches.

Fig. 3 is a bottom perspective view of the edge ring 100. The edge ring 100 has a bottom annular surface 302.

Fig. 4 is a bottom view of the edge ring 100 and shows details of the bottom side surface of the edge ring 100, i.e., the bottom annular surface 302. The bottom annular surface 302 extends between the inner edge 202 and the outer edge 204 and is spaced from the top annular surface 102 by the inner edge 202 and the outer edge 204. Furthermore, a straight portion 206 of the inner edge 202 is visible in fig. 3.

As shown in fig. 4, the bottom annular surface 302 has a plurality of

screw socket pieces

402A, 402B, 402C, 402D, 402E, 402F, 402G, 402H, and 402I. The screw socket pieces 402A-402I are sometimes referred to herein as screw holes or screw openings for receiving screws. Each screw socket piece 402A-402I is configured to receive a screw. Screw inserts 402A-402I are formed in the bottom annular surface 302 of the edge ring 100 and extend in a vertical direction from the bottom annular surface 302.

The screw socket pieces 402A to 402I are symmetrically disposed along the bottom annular surface 302. In an embodiment, the distance between any two adjacent screw socket pieces of the screw socket pieces 402A to 402I is the same. For example, the distance between

screw socket pieces

402A and 402B is the same as the distance between

screw socket pieces

402B and 402C. Screw receptacles 402A-402I are formed between inner edge 202 and outer edge 204.

In an embodiment, the angle between a first set of two adjacent screw socket pieces 402A-402I is the same as the angle between a second set of two adjacent screw socket pieces 402A-402I. In this embodiment, the angle between

screw socket pieces

402A and 402B is equal to the angle between

screw socket pieces

402B and 402C. In an embodiment, the angle between any two adjacent screw socket pieces of the screw socket pieces 402A to 402I is 40 degrees from the center of mass of the edge ring 100. In one embodiment, an imaginary circle passing through the locations of the screw socket pieces 402A-402I has a diameter of 13 inches.

Fig. 5 shows a side view of the edge ring 100. As shown, the outer edge 204 of the edge ring 100 is visible. Further, the top annular surface 102 is shown in fig. 5, and the bottom annular surface 302 is shown.

FIG. 6 illustrates a cross-sectional side view of the edge ring 100 taken along section 6-6 of FIG. 4. The cross-sectional view shows the plasma-facing surface defined as the top annular surface 102 of the edge ring 100, and the screw insert 402A extending vertically from the bottom annular surface 302 toward the top annular surface 102. The screw socket 402A does not reach the top annular surface 102 and is therefore not a through hole. The thickness 600 of the edge ring 100 between the top annular surface 102 and the bottom annular surface 302 is 0.25 inches.

Fig. 7 shows an enlarged cross-sectional side view of a portion of the view of fig. 6. The edge ring 100 has a top portion 734, the top portion 734 including an inner stepped region 704, a sloped region 702, an intermediate top region 708, and an outer curved region 706. The bottom 736 of the edge ring 100 includes a bottom annular surface 302. The inner step region 704 extends horizontally from the inner edge 202 to an angled surface 710 and has a top stop surface 720. The angled surface 710 is annular. The sloped region 702 extends horizontally from the inner stepped region 704 to the intermediate top region 708 and has an angled surface 710. The sloped region 702 provides a slope from the top annular surface 102 down to the top stop surface 720. The sloped region 702 is between the inner step region 704 and the intermediate top region 708. The middle top region 708 extends horizontally from the sloped region 702 to the outer curved region 706 and has a top annular surface 102. An intermediate top region 708 is between the sloped region 702 and the outer curved region 706. Outer curved region 706 has a top outer curved surface 722.

The top stop surface 720 extends from the inner edge 202 to the angled surface 710. The angled surface 710 extends from the top stop surface 720 to the top annular surface 102. The top annular surface 102 extends from the angled surface 710 to a top outer curved surface 722. The top outer curved surface 722 extends from the top annular surface 102 to the outer edge 204.

The inner step area 704 also includes an inner edge 202 and a bottom inner curved surface 724. The inner stepped region 704 extends vertically downward from the top stop surface 720 to the bottom annular surface 302. The sloped region 702 extends vertically downward from the angled surface 710 to the bottom annular surface 302. The intermediate top region 708 extends vertically downward from the top annular surface 102 to the bottom annular surface 302. The outer curved region 706 extends vertically downward from the top outer curved surface 722 to the bottom annular surface 302.

Bottom inner curved surface 724 extends from inner edge 202 to bottom annular surface 302. The bottom inner curved surface 724 is below the inner edge 202. The bottom annular surface 302 extends from the bottom inner curved surface 724 to the outer edge 204.

The edge ring 100 has a lower stepped region 716 and an upper stepped region 718. The upper stepped region 718 is located above the lower stepped region 716. The upper step area 718 extends vertically upward from the top stop surface 720 to the top annular surface 102. The lower step region 716 extends vertically upward from the bottom annular surface 302 to a top stop surface 720.

The lower step region 716 extends horizontally from the inner edge 202 to the outer edge 204 and includes a bottom inner curved surface 724 and the bottom annular surface 302. The upper step area 718 extends horizontally from the vertical height of the inner edge 202 to the vertical height of the outer edge 204 and includes a top stop surface 720, an angled surface 710, the top annular surface 102, and a top outer curved surface 722.

The screw socket piece 402A extends vertically upward from the bottom annular surface 302 into the intermediate top region 708. The screw socket piece 402A extends vertically into and along the lower stepped region 716. Similarly, screw socket pieces 402B-402I (fig. 4) extend vertically upward from bottom annular surface 302 into intermediate top region 708. The screw socket pieces 402B to 402I extend toward the top annular surface 102 and along the lower step area 716.

The screw socket piece 402A extends toward the top annular surface 102 without contacting the top annular surface 102. The screw socket 402A does not form a through hole in the middle top region 708, but extends partially into the middle top region 708. In an embodiment, the screw socket 402A does not extend vertically into the upper step area 718. In an embodiment, top surface 728 of screw jack 402A is below the level of top stop surface 720. The level of the top stop surface 720 is between the level of the top annular surface 102 and the level of the bottom annular surface 302. In an embodiment, the depth level of the top stop surface 720 is between the level of the top annular surface 102 and the depth level of the bottom annular surface 302. The depth level of the top stop surface 720 and the depth level of the bottom annular surface 302 are measured from the level of the top annular surface 102. Further, the top surface 728 has a depth between the top annular surface 102 and the bottom annular surface 302. The depth of the top surface 728 is measured from the level of the top annular surface 102.

Similarly, each of the remaining screw socket pieces 402B to 402I extend toward the top annular surface 102 without contacting the top annular surface 102. Each of the remaining screw socket pieces 402B to 402I does not form a through hole within the middle top region 708, but extends partially into the middle top region 708. In an embodiment, each of the remaining screw socket pieces 402B-402I extend vertically into the lower stepped region 716 and do not extend vertically into the upper stepped region 718. Further, the top surfaces of the remaining screw socket pieces 402B to 402I have a depth between the top annular surface 102 and the bottom annular surface 302. The depth of the top surface of the remaining screw socket pieces 402B to 402I is measured from the level of the top annular surface 102. In an embodiment, the top surface of each of the remaining screw socket pieces 402B-402I is below the level of the top stop surface 720.

The screw socket piece 402A has a chamfer 726 and a plurality of receiving threads 712(receiving threads) extending vertically upward from the chamfer 726. Chamfer 726 is adjacent bottom annular surface 302 and receives threads 712 adjacent chamfer 726 and above chamfer 726. The receiving threads 712 are configured to engage with threads of a screw to form a coupling between the edge ring 100 and another ring located below the edge ring 100. In one embodiment, the other ring below the edge ring 100 is a support ring or a coupling ring.

Receiving threads 712 include external threads 730 and internal threads 732. The diameter of the external threads 730 is greater than the diameter of the internal threads 732. The receiving thread 712 includes a plurality of internal threads and a plurality of external threads, and the internal threads and the external threads are interspersed with each other to form the receiving thread 712. The screw socket piece 402A has an unthreaded portion above the receiving threads 712, and the top surface 728 is a top surface of the unthreaded portion.

Each of the remaining screw socket pieces 402B to 402H has the same structure as the screw socket piece 402A. For example, each of the screw socket pieces 402B to 402H has receiving threads for receiving a screw to couple the edge ring 100 to another ring below the edge ring 100.

Fig. 8 is an enlarged cross-sectional side view of a portion of the cross-sectional side view of fig. 7. As shown in fig. 8, in one embodiment, the vertical distance 802 between the top surface 728 and the top annular surface 102 is 0.09 inches. Further, in an embodiment, the vertical distance 804 between the bottom annular surface 302 and the topmost one of the receiving threads 712 is 0.13 inches. In some embodiments, the vertical distance 806 between the bottom annular surface 302 and the top surface 728 is 0.16 inches. In one embodiment, the diameter 808 of the internal threads that receive the threads 712 is 0.09 ± 0.0045 inches. In one embodiment, chamfer 726 forms a 45 ° angle with respect to bottom annular surface 302 and has a maximum length of 0.01 inches.

Claims

1. An edge ring for a plasma chamber, the edge ring configured to be placed along a periphery of a substrate support, the edge ring characterized by,

a top portion of the edge ring, comprising:

an inner step area;

a tilt region;

an outer curved region;

a middle top region having a top annular surface, wherein the middle top region extends between the outer curved region and the sloped region, wherein the sloped region has an annular angled surface and is disposed between the middle top region and the inner stepped region; and

a bottom portion of the edge ring including a bottom annular surface having a plurality of screw inserts formed into the edge ring from the bottom annular surface.

2. The edge ring of claim 1, wherein each of the plurality of screw inserts extends to a depth between the bottom annular surface and the top annular surface.

3. The edge ring of claim 1, wherein each of the plurality of screw inserts has a receiving thread.

4. The edge ring of claim 1, wherein each of the plurality of screw inserts has a receiving thread configured to receive a thread of a screw.

5. The edge ring of claim 1, wherein each of the plurality of screw inserts extends into the intermediate top region from the bottom annular surface toward the top annular surface.

6. The edge ring of claim 1, wherein each of the plurality of screw inserts is free of through holes in the intermediate top region.

7. The edge ring of claim 1, wherein each of the plurality of screw inserts extends partially into the intermediate top region.

8. The edge ring of claim 1, wherein the edge ring has a lower stepped region and an upper stepped region, wherein the upper stepped region is located above the lower stepped region, wherein each of the plurality of screw inserts extends into the lower stepped region and does not extend into the upper stepped region.

9. The edge ring of claim 1, wherein the inner stepped region has a top stop surface, wherein the sloped region provides a slope from the top annular surface down to the top stop surface.