CN212181323U - Vacuum airflow control system - Google Patents
Vacuum airflow control system Download PDFInfo
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- CN212181323U CN212181323U CN202020927698.2U CN202020927698U CN212181323U CN 212181323 U CN212181323 U CN 212181323U CN 202020927698 U CN202020927698 U CN 202020927698U CN 212181323 U CN212181323 U CN 212181323U
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Abstract
The utility model discloses a vacuum airflow control system, it is connected outside the vacuum chamber of analytical instrument, include: a gas flow rate control device and an air filtration system; when vacuum pumping is carried out, gas is pumped out by the vacuum pump after being sent to the gas flow rate control device from the vacuum chamber through the four-way valve; when depressurized, gas from the air filtration system reaches the vacuum chamber via a four-way. This application is directly external to real empty room under the advantage that keeps the current structure of analytical instrument, reduces the velocity of flow that gets into and flow out the interior gas of vacuum room to vacuum and cleanliness factor in the assurance vacuum room, thereby play the effect of the interior electrical components of protection vacuum room.
Description
Technical Field
The utility model relates to an analytical instrument field, the more specifically vacuum airflow control system on real empty room that is applied to analytical instrument that says so.
Background
In the analytical instrument industry, particularly in the energy spectrometer industry, sample detection is required in a vacuum environment. It is now common to connect the vacuum pump directly to the vacuum chamber. The vacuum chamber is internally provided with an electric element, a film and the like, the gas flow velocity is increased during vacuum pumping, particles in the vacuum chamber are taken up, and the particles impact the surfaces of the electric element and the film, so that the electric element and the film are damaged. Meanwhile, when pressure is relieved, atmosphere is directly introduced into the vacuum chamber through the pipeline, impurities such as dust in the air can enter the vacuum chamber and move along with the air flow, and the impurities can possibly impact the surfaces of the electric elements and the thin film.
The two phenomena are ubiquitous in the existing analytical instrument, the service life of the instrument is seriously influenced, and meanwhile, inconvenience is brought to repair.
SUMMERY OF THE UTILITY MODEL
The application provides a vacuum airflow control system, which aims to solve the problem that the vacuum chamber of the existing analysis instrument is damaged due to increased airflow and increased particles caused by vacuum pumping/releasing.
In order to solve the above technical problems, the present application adopts the following technical means:
a vacuum flow control system connected to a vacuum chamber of an analytical instrument, comprising: a gas flow rate control device, comprising: one port of the first tee joint is connected with a vacuum pump, and the other two ports are respectively connected with a first needle valve and an electromagnetic valve through pipelines, wherein the electromagnetic valve controls the opening of the first tee joint; one port of the second tee joint is connected with the battery valve, the other port of the second tee joint is connected with the first needle valve, and the third port of the second tee joint is connected with a four-way joint; the electromagnetic valve is connected and controlled by a time control device; an air filtration system comprising a filter, a second needle valve, and a conduit valve, wherein: the second needle valve is connected with the filter and then connected with the four-way valve through a pipeline, and an adapter and the pipeline valve are sequentially arranged on the pipeline; one port of the four-way valve is connected with the vacuum chamber; when vacuum pumping is carried out, gas is pumped out by the vacuum pump after being sent to the gas flow rate control device from the vacuum chamber through the four-way valve; when depressurized, gas from the air filtration system reaches the vacuum chamber via a four-way.
Preferably, a vacuum pressure gauge is arranged on the four-way joint.
Preferably, the pipeline valve is at least one electromagnetic valve.
Preferably, the gas flow rate control means is provided in a fixed sealing means.
Preferably, the sealing device further comprises a power source or power adapter.
Preferably, the vacuum pump and the air filtration system are wired to the power source or the power adapter.
Preferably, the first tee and the second tee are respectively butted with the vacuum pump and the cross joint through a flange extending out of the sealing device.
By adopting the technical scheme, the vacuum chamber is directly connected with the outside under the advantage of keeping the existing structure of the analysis instrument, the flow velocity of gas entering and flowing out of the vacuum chamber is reduced, the vacuum degree and the cleanliness in the vacuum chamber are ensured, and therefore the effect of protecting electrical elements in the vacuum chamber is achieved.
Drawings
FIG. 1 is a schematic diagram of the present application;
fig. 2 is a schematic cross-sectional view of the inside of the sealing device of the present application.
Detailed Description
The technical solution of the present invention is further specifically described below by way of examples and with reference to the accompanying drawings.
The vacuum airflow control system is directly connected to the vacuum chamber of the analytical instrument through a four-way pipe through a flange, the advantages of the original structure are reserved, and large changes are not needed. Referring to fig. 1, a schematic diagram of the present application is shown. The application mainly comprises two parts: a gas flow rate control device A and an air filtration system B. The gas flow rate control device A is mainly used for controlling the gas flow rate during vacuumizing and slowing down the flow rate. The air filtering system B is mainly used for filtering air and controlling pressure relief flow rate during pressure relief. The detailed structure is shown in fig. 1 and fig. 2.
The gas flow rate control device A comprises a first tee joint 1, a second tee joint 2, an electromagnetic valve 3, a needle valve 4, a time control device 5 and the like. The gas flow rate control device a of the present application is fixed within a sealing device 6, which sealing device 6 may be, but is not limited to, an electric box. As shown in fig. 2, a mounting plate 7 is provided in the sealing device 6, and the components are fixed to the mounting plate 7. The first tee joint 1 and the second tee joint 2 are fixed in the sealing device 6 and are located at the edge, close to the sealing device 6. The first tee joint 1 and the second tee joint 2 are connected through two pipelines. The first pipeline is provided with the electromagnetic valve 3, and the vent caliber of the second tee joint flowing into the first tee joint 1 is controlled through the battery valve 3, so that a high-flow-rate vent pipeline is formed; the second pipeline is provided with the needle valve 4, and the needle valve 4 has a smaller relative vent aperture, thereby forming a low-flow-rate vent pipeline. The first tee 1 is connected to a vacuum pump 10 via a first flange 9 extending from the sealing device 6, while the second tee 2 is connected to a cross 12 via a second flange 11 extending from the sealing device 6, via which cross 12 a vacuum chamber 13 of an analytical instrument is connected.
A time control device 5 is fixed to the sealing device 6, and the time control device 5 is not limited to a time delay relay or the like. The time control device 5 is electrically connected to and controls the solenoid valve 3. When low-flow-rate gas is needed, the time control device 5 closes the battery valve 3 (the needle valve 4 is a manual regulating valve and is always in an open state), and the gas passes through the low-flow-rate ventilation pipeline at low speed; when high-flow-rate gas is needed, the time control device opens the electromagnetic valve 3, the vent aperture of the electromagnetic valve 3 is larger than that of the needle valve 4, but smaller than that of the direct pipeline, and the gas passes through the high-flow-rate vent pipeline at high speed. In general, a low-flow-rate ventilation pipeline is adopted to be matched with the vacuum pump 10 for pumping air, the low flow rate can reduce the movement speed of dust particles, and the electric components in the vacuum chamber are protected. When special requirements are required, the high-flow-rate ventilation pipeline can be used for passing through the high-flow-rate ventilation pipeline. The design can not only ensure the normal use condition to reduce the gas flow speed, but also can not influence the special requirements under the special condition.
As shown in fig. 1 and 2, a power adapter 8 (which may be a power socket) is further provided in the sealing device 5, and the power adapter 8 is used for external power supply to supply power to the whole system. The sealing device 5 is provided with an output 51 and an input 52 of a power supply, which are connected to the vacuum pump 10 and the air filtration system B through wires and plugs as shown in fig. 2.
Referring again to fig. 1, the air filtration system B includes a filter 14, a second needle valve 15, a pipe valve 16, and the like. The second needle valve 15 with filter 14 connects back through the tube coupling cross 12 be equipped with adapter 17 in proper order on the pipeline and pipeline valve 16. To ensure the air tightness, the pipe valve 16 of the present application may be two solenoid valves 161 and 162, both of which are controlled by the time control device 5 in the sealing device 6. And one port of the four-way joint 12 is connected with the vacuum chamber 13, and a vacuum pressure gauge is arranged on the four-way joint 12. Due to the addition of the air filtering system B, the purity of the gas entering the vacuum chamber 13 during pressure relief can be effectively filtered, and meanwhile, the flow rate of the gas is slowed down through the addition of the needle valve 15 (which is always in an open state and has an air vent adjusted before use), so that the gas entering the vacuum chamber 13 is clean and slowed down.
The gas flow direction of the whole system is as follows: when the vacuum pumping is carried out, gas is pumped out from the vacuum chamber 13 to the gas flow rate control device A through the four-way 12 by the vacuum pump 10; when depressurized, the gas reaches the vacuum chamber 13 from the air filter system B via a four-way 12.
After the system of this application has been increased, on the basis of maintaining current real empty room structure advantage basically on class effectual reduction vacuum chamber gas velocity of flow and can guarantee vacuum degree, the cleanliness factor in the vacuum chamber to the time of evacuation, putting the vacuum and the interior gas velocity of flow of vacuum chamber can be controlled.
The above-described embodiments are merely illustrative of the present invention and are not intended to limit the scope of the present invention. Those skilled in the art will recognize that changes and modifications can be made in the invention as described herein without departing from the scope of the invention as defined by the appended claims.
Claims (7)
1. A vacuum flow control system for connection to a vacuum chamber of an analytical instrument, comprising:
a gas flow rate control device, comprising:
one port of the first tee joint is connected with a vacuum pump, and the other two ports are respectively connected with a first needle valve and an electromagnetic valve through pipelines, wherein the electromagnetic valve controls the opening of the first tee joint;
one port of the second tee joint is connected with the electromagnetic valve, the other port of the second tee joint is connected with the first needle valve, and the third port of the second tee joint is connected with a four-way joint;
the electromagnetic valve is connected and controlled by a time control device;
an air filtration system comprising a filter, a second needle valve, and a conduit valve, wherein: the second needle valve is connected with the filter and then connected with the four-way valve through a pipeline, and an adapter and the pipeline valve are sequentially arranged on the pipeline;
one port of the four-way valve is connected with the vacuum chamber;
when vacuum pumping is carried out, gas is pumped out by the vacuum pump after being sent to the gas flow rate control device from the vacuum chamber through the four-way valve; when depressurized, gas from the air filtration system reaches the vacuum chamber via a four-way.
2. The vacuum gas flow control system of claim 1, wherein a vacuum pressure gauge is provided on the cross.
3. The vacuum gas flow control system of claim 1, wherein the conduit valve is at least one solenoid valve.
4. The vacuum gas flow control system of claim 1, wherein the gas flow rate control device is disposed within a fixed seal.
5. The vacuum gas flow control system of claim 4, wherein the sealing device further comprises a power source or power adapter.
6. The vacuum airflow control system of claim 5 wherein the vacuum pump and the air filtration system are wired to the power source or the power adapter.
7. The vacuum gas flow control system of claim 4, wherein the first tee and the second tee are respectively interfaced with the vacuum pump and the cross by a flange extending from the sealing device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020927698.2U CN212181323U (en) | 2020-05-28 | 2020-05-28 | Vacuum airflow control system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020927698.2U CN212181323U (en) | 2020-05-28 | 2020-05-28 | Vacuum airflow control system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212181323U true CN212181323U (en) | 2020-12-18 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020927698.2U Active CN212181323U (en) | 2020-05-28 | 2020-05-28 | Vacuum airflow control system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212181323U (en) |
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2020
- 2020-05-28 CN CN202020927698.2U patent/CN212181323U/en active Active
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