CN212166997U - Novel plasma formula tail gas processing apparatus based on microwave - Google Patents
Novel plasma formula tail gas processing apparatus based on microwave Download PDFInfo
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- CN212166997U CN212166997U CN202020168995.3U CN202020168995U CN212166997U CN 212166997 U CN212166997 U CN 212166997U CN 202020168995 U CN202020168995 U CN 202020168995U CN 212166997 U CN212166997 U CN 212166997U
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Abstract
The utility model discloses a novel plasma type tail gas treatment device based on microwave, belonging to the technical field of microwave application, comprising a reaction cavity, at least one microwave plasma torch and a tail gas inlet pipe corresponding to the number of the microwave plasma torches; the microwave plasma torch comprises a shielding shell, a metal inlet pipe, a metal outlet pipe, a quartz pipe, a compression waveguide and a microwave source; the metal inlet pipe is fixed at the top of the shielding shell; the surface of the side of the metal inlet pipe is provided with at least one working air inlet pipe, and the metal inlet pipe is connected with a tail gas inlet pipe; the metal outlet pipe is fixed at the bottom of the shielding shell; the quartz tube is connected with the metal inlet tube and the metal outlet tube; a feed port is arranged on the shielding shell; the microwave source is connected to the feed port through a compression waveguide; the feed port is used for inputting microwaves into the quartz tube. The utility model discloses a novel plasma formula tail gas processing apparatus based on microwave utilizes microwave production plasma to decompose waste gas, has long service life, and the treatment effeciency is high, characteristics such as energy saving.
Description
Technical Field
The utility model belongs to the technical field of the microwave is used, specifically speaking relates to a novel plasma formula tail gas processing apparatus based on microwave.
Background
The low-temperature plasma is a substance fourth state following solid, liquid and gas states, and when an external voltage reaches the discharge voltage of the gas, the gas is broken down to generate a mixture including electrons, various ions, atoms and free radicals. Although the electron temperature is high in the discharge process, the heavy particle temperature is low, and the whole system is in a low-temperature state, so that the system is called low-temperature plasma. The low-temperature plasma pollutant degradation utilizes the action of active particles such as high-energy electrons and free radicals and pollutants in exhaust gas to decompose pollutant molecules in a very short time and carry out subsequent various reactions so as to achieve the purpose of degrading pollutants.
However, the mode of generating plasma by adopting the discharge of the gas with the external voltage needs to be changed frequently, the two ends of the electrode generate high voltage, and the plasma bombards the electrode to damage the electrode, so that the service life of the equipment is shortened. The efficiency of decomposing exhaust gas by using microwave to generate and maintain plasma is higher, mainly because the microwave frequency is high and the light quantum energy is high, so that the electron concentration generated under the same power is high, and the efficiency of treating exhaust gas is higher.
SUMMERY OF THE UTILITY MODEL
The utility model aims at the above-mentioned weak point provide a novel plasma formula tail gas processing apparatus based on microwave, and the life-span of trying to solve current electrode type plasma equipment processing waste gas is short, the low scheduling problem of treatment effeciency. In order to achieve the above object, the utility model provides a following technical scheme:
a novel plasma type tail gas treatment device based on microwaves comprises a reaction cavity, at least one microwave plasma torch and tail gas inlet pipes, wherein the number of the tail gas inlet pipes corresponds to that of the microwave plasma torches; the microwave plasma torch is used for spraying flame into the reaction cavity and decomposing tail gas to be treated; the microwave plasma torch comprises a shielding shell, a metal inlet pipe, a metal outlet pipe, a quartz pipe, a compression waveguide and a microwave source; the metal inlet pipe is fixed at the top of the shielding shell; the metal inlet pipe is connected with a tail gas inlet pipe, and the tail gas inlet pipe is used for conveying tail gas to be treated to the metal inlet pipe; the working air inlet pipe is used for inputting working gas; the metal outlet pipe is fixed at the bottom of the shielding shell; the quartz tube is connected with the metal inlet tube and the metal outlet tube; a feed port is formed in the shielding shell; the microwave source is connected to the feed port through a compression waveguide; the feed port is used for inputting microwaves into the quartz tube. According to the structure, the tail gas inlet pipe inputs tail gas from the upper end of the metal inlet pipe, the working gas enters the metal inlet pipe from the working gas inlet pipe on the side surface of the metal inlet pipe, and the tail gas and the working gas enter the metal inlet pipe together and flow to the metal outlet pipe and finally enter the reaction cavity; the shielding shell is generally a metal shell, so that microwave leakage is reduced; the metal inlet pipe itself also plays the role of a microwave suppressor. The metal outlet tube also plays the role of a microwave suppressor. The quartz tube is connected with the metal inlet tube and the metal outlet tube, so that gas in the input tube cannot enter the shielding shell. The quartz tube can extend out of the metal outlet tube downwards, so that the flame is sprayed out from the lower part of the quartz tube; the quartz tube does not extend downwards out of the metal outlet tube, and the flame is sprayed out of the metal outlet tube. The compression waveguide improves the energy density of the microwave source entering the microwave and improves the efficiency of generating the plasma. The working gas is generally nitrogen or argon; exhaust gases such as scrubber treated exhaust gases used by semiconductor industry CVD equipment; the quartz tube can penetrate through microwaves, the microwave frequency is high, the photon energy is high, working gas can generate high-concentration electrons to decompose waste gas, and in addition, the decomposition of the waste gas is also promoted due to the high temperature of plasma; because the microwave is adopted to generate plasma under the same power, the electron concentration is high, and the efficiency of treating the waste gas is higher. In addition, the electrode is abandoned, so that the electrode does not need to be replaced, the service life is longer, and the resources are saved. The common mode of the tail gas and the working gas ensures that the tail gas and the working gas are mixed more fully, and the tail gas is in the center of flame and is decomposed more easily.
Furthermore, the top of the reaction chamber is covered with a cover plate; the microwave plasma torch is arranged on the cover plate.
Further, there is one microwave plasma torch. From the above-described structure, it is understood that one microwave plasma torch is used when the amount of exhaust gas treatment is small.
Furthermore, the number of the microwave plasma torches is several, and the microwave plasma torches are uniformly arranged on the cover plate. According to the structure, when the waste gas treatment capacity is large, a plurality of microwave plasma torches are adopted, so that the power of the microwave source is reduced, and the cost is reduced.
Further, there are four microwave plasma torches.
Furthermore, the movement form of the working gas input into the metal inlet pipe by the working gas inlet pipe is a spiral advancing type. According to the structure, the central line of the working air inlet pipe can be inclined downwards, and deviates from the central line of the metal inlet pipe, the metal inlet pipe is arranged on the inner wall of the metal inlet pipe to admit air, so that the working air can enter the inner wall of the metal inlet pipe along the metal and start to flow downwards in a spiral mode, heat of the metal inlet pipe, the metal outlet pipe and the quartz pipe can be taken away through the working air, the equipment is more durable, and heat dissipation is better.
Further, the device also comprises a lighter; the igniter is used for extending from the top of the metal inlet pipe to generate point discharge. According to the structure, the igniter can extend into the metal inlet pipe to generate point discharge, the plasma is instantaneously excited to generate, and then the igniter is taken away from the metal inlet pipe, so that the power of the microwave source is reduced, and the cost is saved.
Further, the microwave is input from the feed port, passes through the center of the quartz tube and then is reflected by the inner wall of the shielding shell, the distance from the inner wall of the shielding shell to the center of the quartz tube is 0.5 × n +0.25 times of wavelength, and n is a non-negative integer. According to the structure, the size enables the central electric field of the quartz tube to be strongest, and the efficiency of generating plasma is improved.
Furthermore, the number of the working air inlet pipes is two, and the working air inlet pipes are uniformly surrounded on the metal inlet pipe.
The utility model has the advantages that:
the utility model discloses a novel plasma type tail gas treatment device based on microwave, which comprises a reaction cavity, at least one microwave plasma torch and tail gas inlet pipes, wherein the number of the tail gas inlet pipes corresponds to that of the microwave plasma torches; the microwave plasma torch comprises a shielding shell, a metal inlet pipe, a metal outlet pipe, a quartz pipe, a compression waveguide and a microwave source; the metal inlet pipe is fixed at the top of the shielding shell; the surface of the side of the metal inlet pipe is provided with at least one working air inlet pipe, and the metal inlet pipe is connected with a tail gas inlet pipe; the metal outlet pipe is fixed at the bottom of the shielding shell; the quartz tube is connected with the metal inlet tube and the metal outlet tube; a feed port is arranged on the shielding shell; the microwave source is connected to the feed port through a compression waveguide; the feed port is used for inputting microwaves into the quartz tube. The utility model discloses a novel plasma formula tail gas processing apparatus based on microwave utilizes microwave production plasma to decompose waste gas, has long service life, and the treatment effeciency is high, characteristics such as energy saving.
Drawings
Fig. 1 is a schematic view of the whole structure of the microwave plasma torch of the present invention;
FIG. 2 is a schematic top view of the metal inlet pipe of the present invention;
FIG. 3 is a first schematic structural view of the present invention;
FIG. 4 is a schematic top view of a first embodiment of the present invention;
FIG. 5 is a second structural schematic diagram of the present invention;
FIG. 6 is a schematic top view of a second embodiment of the present invention;
in the drawings: 1-shielding shell, 2-working air inlet pipe, 3-metal inlet pipe, 4-metal outlet pipe, 5-quartz pipe, 6-igniter, 7-compression waveguide, 8-microwave source, 9-reaction cavity and 10-microwave plasma torch.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments, but the present invention is not limited to the following embodiments.
The first embodiment is as follows:
see figures 1, 2, 3, 4. A novel plasma type tail gas treatment device based on microwaves comprises a reaction cavity 9, at least one microwave plasma torch 10 and tail gas inlet pipes, wherein the number of the tail gas inlet pipes corresponds to that of the microwave plasma torches 10; the microwave plasma torch 10 is used for spraying flame into the reaction cavity 9 and decomposing the tail gas to be treated; the microwave plasma torch 10 comprises a shielding shell 1, a metal inlet pipe 3, a metal outlet pipe 4, a quartz pipe 5, a compression waveguide 7 and a microwave source 8; the metal inlet pipe 3 is fixed at the top of the shielding shell 1; the side surface of the metal inlet pipe 3 is provided with at least one working air inlet pipe 2, the metal inlet pipe 3 is connected with a tail gas inlet pipe, and the tail gas inlet pipe is used for conveying tail gas to be treated to the metal inlet pipe 3; the working air inlet pipe 2 is used for inputting working gas; the metal outlet pipe 4 is fixed at the bottom of the shielding shell 1; the quartz tube 5 is connected with the metal inlet tube 3 and the metal outlet tube 4; a feed port is arranged on the shielding shell 1; the microwave source 8 is connected to the feed port through a compression waveguide 7; the feed port is used for inputting microwaves into the quartz tube 5. According to the structure, the tail gas is input into the tail gas inlet pipe from the upper end of the metal inlet pipe 3, the working gas enters the metal inlet pipe 3 from the working gas inlet pipe 2 on the side surface of the metal inlet pipe 3, the tail gas and the working gas jointly enter the metal inlet pipe 3 and flow to the metal outlet pipe 4, and finally enter the reaction cavity 9; the shielding shell 1 is generally made of a metal shell, so that microwave leakage is reduced; the metal inlet pipe 3 itself also plays the role of a microwave suppressor. The metal outlet tube 4 also plays the role of a microwave suppressor. The quartz tube 5 is connected with the metal inlet tube 3 and the metal outlet tube 4, so that gas in the inlet tube cannot enter the shielding shell 1. The quartz tube 5 can extend downwards out of the metal outlet tube 4, so that the flame is sprayed out from the lower part of the quartz tube 5; the quartz tube 5 does not extend downward beyond the metal outlet tube 4, and the flame is ejected from the metal outlet tube 4. The compression waveguide 7 increases the energy density of the microwave source 8 entering the microwaves and increases the efficiency of generating the plasma. The working gas is generally nitrogen or argon; exhaust gases such as scrubber treated exhaust gases used by semiconductor industry CVD equipment; the quartz tube 5 can penetrate microwaves, the microwave frequency is high, the photon energy is high, working gas can generate high-concentration electrons to decompose waste gas, and in addition, the decomposition of the waste gas is also promoted due to the high temperature of plasma; because the microwave is adopted to generate plasma under the same power, the electron concentration is high, and the efficiency of treating the waste gas is higher. In addition, the electrode is abandoned, so that the electrode does not need to be replaced, the service life is longer, and the resources are saved. The common mode of the tail gas and the working gas ensures that the tail gas and the working gas are mixed more fully, and the tail gas is in the center of flame and is decomposed more easily.
The top of the reaction cavity 9 is covered with a cover plate; the microwave plasma torch 10 is provided on a cover plate.
There is one such microwave plasma torch 10. As can be seen from the above configuration, when the amount of exhaust gas treatment is small, one microwave plasma torch 10 is used.
The working gas input into the metal inlet pipe 3 from the working gas inlet pipe 2 moves in a spiral advancing mode. According to the structure, the central line of the working air inlet pipe 2 can be inclined downwards, and deviates from the central line of the metal inlet pipe 3, the inner wall of the metal inlet pipe 3 is filled with air, so that the working air can flow downwards along the inner wall of the metal inlet pipe 3 and starts to flow downwards in a spiral mode, heat of the metal inlet pipe 3, the metal outlet pipe 4 and the quartz tube 5 can be taken away through the working air, the equipment is more durable, and heat dissipation is better.
Also comprises a lighter 6; the igniter 6 is used for extending from the top of the metal inlet pipe 3 to generate point discharge. According to the structure, the igniter 6 can extend into the metal inlet pipe 3 to generate point discharge, and instantly excites plasma to generate, and then is taken away from the metal inlet pipe 3, so that the power of the microwave source is reduced, and the cost is saved.
The microwave is input from the feed port, passes through the center of the quartz tube 5 and then is reflected by the inner wall of the shielding shell 1, the distance from the inner wall of the shielding shell 1 to the center of the quartz tube 5 is 0.5 x n +0.25 times of wavelength, and n is a non-negative integer. According to the structure, the size enables the central electric field of the quartz tube 5 to be strongest, and the efficiency of generating plasma is improved.
The number of the working air inlet pipes 2 is two, and the working air inlet pipes are uniformly surrounded on the metal inlet pipe 3.
Example two:
see figures 1, 2, 5, 6. A novel plasma type tail gas treatment device based on microwaves comprises a reaction cavity 9, at least one microwave plasma torch 10 and tail gas inlet pipes, wherein the number of the tail gas inlet pipes corresponds to that of the microwave plasma torches 10; the microwave plasma torch 10 is used for spraying flame into the reaction cavity 9 and decomposing the tail gas to be treated; the microwave plasma torch 10 comprises a shielding shell 1, a metal inlet pipe 3, a metal outlet pipe 4, a quartz pipe 5, a compression waveguide 7 and a microwave source 8; the metal inlet pipe 3 is fixed at the top of the shielding shell 1; the side surface of the metal inlet pipe 3 is provided with at least one working air inlet pipe 2, the metal inlet pipe 3 is connected with a tail gas inlet pipe, and the tail gas inlet pipe is used for conveying tail gas to be treated to the metal inlet pipe 3; the working air inlet pipe 2 is used for inputting working gas; the metal outlet pipe 4 is fixed at the bottom of the shielding shell 1; the quartz tube 5 is connected with the metal inlet tube 3 and the metal outlet tube 4; a feed port is arranged on the shielding shell 1; the microwave source 8 is connected to the feed port through a compression waveguide 7; the feed port is used for inputting microwaves into the quartz tube 5. According to the structure, the tail gas is input into the tail gas inlet pipe from the upper end of the metal inlet pipe 3, the working gas enters the metal inlet pipe 3 from the working gas inlet pipe 2 on the side surface of the metal inlet pipe 3, the tail gas and the working gas jointly enter the metal inlet pipe 3 and flow to the metal outlet pipe 4, and finally enter the reaction cavity 9; the shielding shell 1 is generally made of a metal shell, so that microwave leakage is reduced; the metal inlet pipe 3 itself also plays the role of a microwave suppressor. The metal outlet tube 4 also plays the role of a microwave suppressor. The quartz tube 5 is connected with the metal inlet tube 3 and the metal outlet tube 4, so that gas in the inlet tube cannot enter the shielding shell 1. The quartz tube 5 can extend downwards out of the metal outlet tube 4, so that the flame is sprayed out from the lower part of the quartz tube 5; the quartz tube 5 does not extend downward beyond the metal outlet tube 4, and the flame is ejected from the metal outlet tube 4. The compression waveguide 7 increases the energy density of the microwave source 8 entering the microwaves and increases the efficiency of generating the plasma. The working gas is generally nitrogen or argon; exhaust gases such as scrubber treated exhaust gases used by semiconductor industry CVD equipment; the quartz tube 5 can penetrate microwaves, the microwave frequency is high, the photon energy is high, working gas can generate high-concentration electrons to decompose waste gas, and in addition, the decomposition of the waste gas is also promoted due to the high temperature of plasma; because the microwave is adopted to generate plasma under the same power, the electron concentration is high, and the efficiency of treating the waste gas is higher. In addition, the electrode is abandoned, so that the electrode does not need to be replaced, the service life is longer, and the resources are saved. The common mode of the tail gas and the working gas ensures that the tail gas and the working gas are mixed more fully, and the tail gas is in the center of flame and is decomposed more easily.
The top of the reaction cavity 9 is covered with a cover plate; the microwave plasma torch 10 is provided on a cover plate.
The microwave plasma torches 10 are provided in number and are uniformly disposed on the cover plate. As can be seen from the above configuration, when the amount of waste gas to be treated is large, the use of a plurality of microwave plasma torches 10 is advantageous in reducing the power of the microwave source 8 and reducing the cost. For example four such microwave plasma torches 10.
The working gas input into the metal inlet pipe 3 from the working gas inlet pipe 2 moves in a spiral advancing mode. According to the structure, the central line of the working air inlet pipe 2 can be inclined downwards, and deviates from the central line of the metal inlet pipe 3, the inner wall of the metal inlet pipe 3 is filled with air, so that the working air can flow downwards along the inner wall of the metal inlet pipe 3 and starts to flow downwards in a spiral mode, heat of the metal inlet pipe 3, the metal outlet pipe 4 and the quartz tube 5 can be taken away through the working air, the equipment is more durable, and heat dissipation is better.
Also comprises a lighter 6; the igniter 6 is used for extending from the top of the metal inlet pipe 3 to generate point discharge. According to the structure, the igniter 6 can extend into the metal inlet pipe 3 to generate point discharge, and instantly excites plasma to generate, and then is taken away from the metal inlet pipe 3, so that the power of the microwave source is reduced, and the cost is saved.
The microwave is input from the feed port, passes through the center of the quartz tube 5 and then is reflected by the inner wall of the shielding shell 1, the distance from the inner wall of the shielding shell 1 to the center of the quartz tube 5 is 0.5 x n +0.25 times of wavelength, and n is a non-negative integer. According to the structure, the size enables the central electric field of the quartz tube 5 to be strongest, and the efficiency of generating plasma is improved.
The number of the working air inlet pipes 2 is two, and the working air inlet pipes are uniformly surrounded on the metal inlet pipe 3.
The above only is the preferred embodiment of the present invention, not limiting the scope of the present invention, all the equivalent structures or equivalent flow changes made by the contents of the specification and the drawings, or directly or indirectly applied to other related technical fields, are included in the same way in the protection scope of the present invention.
Claims (9)
1. The utility model provides a novel plasma formula tail gas processing apparatus based on microwave which characterized in that: comprises a reaction cavity (9), at least one microwave plasma torch (10) and tail gas inlet pipes with the number corresponding to that of the microwave plasma torches (10); the microwave plasma torch (10) is used for spraying flame into the reaction cavity (9) and decomposing tail gas to be treated; the microwave plasma torch (10) comprises a shielding shell (1), a metal inlet pipe (3), a metal outlet pipe (4), a quartz pipe (5), a compression waveguide (7) and a microwave source (8); the metal inlet pipe (3) is fixed at the top of the shielding shell (1); the side surface of the metal inlet pipe (3) is provided with at least one working air inlet pipe (2), the metal inlet pipe (3) is connected with a tail gas inlet pipe, and the tail gas inlet pipe is used for conveying tail gas to be treated to the metal inlet pipe (3); the working air inlet pipe (2) is used for inputting working gas; the metal outlet pipe (4) is fixed at the bottom of the shielding shell (1); the quartz tube (5) is connected with the metal inlet tube (3) and the metal outlet tube (4); a feed port is arranged on the shielding shell (1); the microwave source (8) is connected to the feed port through a compression waveguide (7); the feed port is used for inputting microwaves into the quartz tube (5).
2. The novel plasma type tail gas treatment device based on microwave as claimed in claim 1, characterized in that: the top of the reaction cavity (9) is covered with a cover plate; the microwave plasma torch (10) is arranged on the cover plate.
3. The novel plasma type tail gas treatment device based on microwave as claimed in claim 2, characterized in that: one of the microwave plasma torches (10).
4. The novel plasma type tail gas treatment device based on microwave as claimed in claim 2, characterized in that: the number of the microwave plasma torches (10) is several, and the microwave plasma torches are uniformly arranged on the cover plate.
5. The novel plasma type tail gas treatment device based on microwave as claimed in claim 2, characterized in that: four microwave plasma torches (10) are provided.
6. The novel plasma-based tail gas treatment device based on microwaves according to any one of claims 1 to 5, wherein: the working gas input into the working gas inlet pipe (2) in the metal inlet pipe (3) moves in a spiral advancing mode.
7. The novel plasma-based tail gas treatment device based on microwaves according to any one of claims 1 to 5, wherein: also comprises a lighter (6); the igniter (6) is used for extending from the top of the metal inlet pipe (3) to generate point discharge.
8. The novel plasma-based tail gas treatment device based on microwaves according to any one of claims 1 to 5, wherein: the microwave is input from the feed port, passes through the center of the quartz tube (5) and then is reflected by the inner wall of the shielding shell (1), the distance from the inner wall of the shielding shell (1) to the center of the quartz tube (5) is (0.5 x n +0.25) times of wavelength, and n is a non-negative integer.
9. The novel plasma-based tail gas treatment device based on microwaves according to any one of claims 1 to 5, wherein: the number of the working air inlet pipes (2) is two, and the working air inlet pipes are uniformly surrounded on the metal inlet pipe (3).
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| CN202020168995.3U CN212166997U (en) | 2020-02-14 | 2020-02-14 | Novel plasma formula tail gas processing apparatus based on microwave |
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| CN202020168995.3U CN212166997U (en) | 2020-02-14 | 2020-02-14 | Novel plasma formula tail gas processing apparatus based on microwave |
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Effective date of registration: 20230120 Address after: No.1109, 11th floor, building 8, no.388, north section of Yizhou Avenue, hi tech Zone, Chengdu, Sichuan 610000 Patentee after: Chengdu zhihexin Electric Technology Development Co.,Ltd. Address before: No. 37, floor 9, unit 2, building 14, No. 366 jucui street, Wuhou District, Chengdu, Sichuan 610000 Patentee before: Chen Yong |
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