CN212160348U - Photoetching equipment with power-off protection device - Google Patents
Photoetching equipment with power-off protection device Download PDFInfo
- Publication number
- CN212160348U CN212160348U CN202020803584.7U CN202020803584U CN212160348U CN 212160348 U CN212160348 U CN 212160348U CN 202020803584 U CN202020803584 U CN 202020803584U CN 212160348 U CN212160348 U CN 212160348U
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- China
- Prior art keywords
- power
- protection device
- rail
- lithography
- switch
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
- H02H5/00—Emergency protective circuit arrangements for automatic disconnection directly responsive to an undesired change from normal non-electric working conditions with or without subsequent reconnection
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model discloses a lithography apparatus with power-off protection device, be in including base, setting platform, setting on the base are in lithography mechanism, the realization that is used for of platform top lithography mechanism for the actuating mechanism of platform motion, and be used for lithography mechanism surpasss and realizes when predetermineeing the motion stroke the power-off protection device of actuating mechanism outage. Through the structure, the motion can be stopped in time when the motion is out of control, and the damage caused by flying off of the photoetching mechanism is prevented.
Description
Technical Field
The utility model relates to a lithography apparatus protects technical field, especially relates to a lithography apparatus with power protection devices.
Background
In the photoetching equipment, photoetching is realized through movement of a photoetching mechanism, the photoetching mechanism is at a high speed, the out-of-control or limiting failure of a photoetching mechanism operation shaft can cause great influence on the whole equipment, a good result buffer can block the impact force of the photoetching mechanism at the high speed, the bad result photoetching mechanism moving at the high speed collides the buffer to fly out of the whole equipment or collides other mechanisms, so that a device is required to timely perform power failure treatment on a movement control system under the condition that the photoetching mechanism is out-of-control or limiting failure, the motor loses power, the condition that the motor continues to operate at the high speed under the condition that the photoetching mechanism is out-of-control or limiting failure is timely prevented, and meanwhile, the control system needs to be manually powered on to operate after power failure.
The foregoing description is provided for general background information and is not admitted to be prior art.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a lithography apparatus with power-off protection device can in time realize the motion and stop when the motion is out of control.
The utility model provides a lithography apparatus with power-off protection device, be in including base, setting platform, setting on the base are in lithography mechanism, the realization that is used for of platform top lithography mechanism for the actuating mechanism of platform motion, and be used for lithography mechanism surpasss and realizes when the motion stroke the power-off protection device of actuating mechanism outage.
In one embodiment, the power-off protection device comprises a collision switch, an alternating current contactor and a path switch, wherein one end of the collision switch is connected with the alternating current contactor, the other end of the collision switch is grounded, one end of the path switch is connected with a power supply, and the other end of the path switch is connected with the alternating current contactor.
In one embodiment, the access switch is provided with a jog button or a time relay, and the collision switch is a spring-lever travel switch.
In one embodiment, the driving mechanism comprises a motor and a guiding mechanism for connecting the base and the lithography mechanism, the motor is arranged inside the base and is connected with the power-off protection device and the guiding mechanism, and the guiding mechanism comprises a first guiding device for realizing horizontal movement of the lithography mechanism or/and a second guiding device for realizing longitudinal movement of the lithography mechanism.
In one embodiment, the first guiding device includes a first guiding rail disposed on two opposite sides of the base, and a first sliding member mounted on the first guiding rail, and the second guiding device includes a beam, a second guiding rail disposed on two opposite sides of the beam, and a second sliding member mounted on the second guiding rail.
In one embodiment, the power-off protection devices are arranged at two ends of the base or the first guide rail outside two ends of the first guide rail, and the power-off protection devices are arranged at two ends of the cross beam outside two ends of the second guide rail or the second guide rail.
In one embodiment, two buffer limiting blocks are arranged between two corresponding power-off protection devices, and the distance between the two buffer limiting blocks is greater than or equal to the movement stroke of the second guide device or the lithography mechanism.
The utility model provides a lithography apparatus with power-off protection device is through being used for lithography mechanism realizes when surpassing the motion stroke the power-off protection device of actuating mechanism outage can in time realize when the motion is out of control that the motion stops, prevents the damage that lithography mechanism caused because of breaking away from.
Drawings
FIG. 1 is a schematic diagram of a lithographic apparatus with a power-off protection device according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a circuit connection of a lithographic apparatus with a power-off protection device according to an embodiment of the present invention.
Detailed Description
The following detailed description of the embodiments of the present invention is provided with reference to the accompanying drawings and examples. The following examples are intended to illustrate the invention, but are not intended to limit the scope of the invention.
Referring to fig. 1 and fig. 2, the lithography apparatus with a power-off protection device provided in the embodiment of the present invention includes a base 1, a platform 11 disposed on the base 1 and used for placing a light guide plate, a lithography mechanism 4 disposed above the platform 11 and used for lithography the light guide plate, a driving mechanism 2 for realizing the motion of the lithography mechanism 4 relative to the platform, and a power-off protection device 8 for realizing the power-off of the driving mechanism 2 when the lithography mechanism 4 exceeds a motion stroke.
The middle of the base 1 is convex and forms a convex section; the convex top face is used for placing the platform 11.
The base 1 is connected to a power supply. The power supply may supply power to the power-off protection device 8, thereby enabling the power-off protection device 8 to be in an operating state.
The drive mechanism 2 comprises an electric motor (not shown). The motor may be disposed inside the base 1 or may not be disposed on the base 1.
The lithographic apparatus with the power-off protection is further provided with a guiding mechanism 3 for connecting the drive mechanism 2 and the lithographic mechanism 4. Specifically, the guiding mechanism 3 is installed on the base 1, and the guiding mechanism 3 is electrically connected to the motor and the power-off protection device 8.
The guiding mechanism 3 comprises a first guiding device 31 for realizing the horizontal movement of the lithography mechanism 4 or/and a second guiding device 32 for realizing the longitudinal movement of the lithography mechanism 4.
In the present embodiment, the guide mechanism 3 is provided with a first guide 31 and a second guide 32. The first guide 31 is connected to the base 1 and the second guide 32, respectively, and the second guide 32 is connected to the lithography mechanism 4.
The first guide 31 includes a first guide rail 311 and a first slider 312. The first guide rails 311 are arranged at the edges of two opposite sides of the base 1, and the platform 11 for placing the light guide plate is positioned between the two first guide rails 311; the first sliding part 312 is installed on the first guide rail 311, and the first sliding part 312 is fixed on the second guiding device 32, so that the first sliding part 312 drives the second guiding device 32 to move horizontally when moving back and forth along the first guide rail 311, thereby driving the photolithography mechanism 4 to move horizontally.
The second guide 32 comprises a beam 323, a second guide rail 321 and a second slide. A groove 3231 penetrating through the beam 323 is formed in the middle of the upper surface of the beam 323 along the longitudinal movement direction of the photoetching mechanism 4; the lower surface of the beam 323 is fixedly connected with the first sliding part 312; second guide rails 321 are arranged on the edges of two opposite sides of the upper surface of beam 323, that is, second guide rails 321 are arranged on the top surfaces of two sides of groove 3231; the second slider is mounted on the second guide rail 321, and the second slider is fixed on the lithography mechanism 4, so that the second slider drives the lithography mechanism 4 to move longitudinally when moving along the second guide rail 321.
The base 1 at the outer sides of the two ends of the first guide rail 311 is provided with a power-off protection device 8.
In other embodiments, a power-off protection device 8 is mounted on both ends of the first rail 311.
A power-off protection device 8 is mounted on the beam 323 outside both ends of the second guide rail 321, specifically, the power-off protection device 8 is mounted on the side of the beam 323.
In other embodiments, a power-off protection device 8 is mounted on each end of the second rail 321.
It should be noted that, in any installation, it is necessary to ensure that the power-off protection device 8 is touched in time when the second guiding device 32 or/and the lithography mechanism 4 exceeds the movement stroke.
The power cutoff protection device 8 includes a collision switch 81, an ac contactor 82, and a passage switch 83. One end of the collision switch 81 is connected with the alternating current contactor 82, and the other end is grounded; the on-switch 83 has one end connected to the power supply and the other end connected to the ac contactor 82.
In other embodiments, the power-off protection device 8 may be a power-off protection device 8 that powers off the drive mechanism 2 in other ways, such as by light sensing.
The passage switch 83 is provided with a jog button; the collision switch 81 is a spring rod type travel switch; the ac contactor 82 is provided with a coil 821. Specifically, one end of the collision switch 81 is connected to the coil 821 of the ac contactor 82, and the other end is grounded; the path switch 83 has one end connected to the power source 6 and the other end connected to the coil 821 of the ac contactor 82.
In other embodiments, the access switch is provided with a time relay.
During operation, as shown in fig. 2, the access switch 83 is turned on, and the collision switch 81 is in a closed state, so that the ac contactor 82 is closed, and the driving mechanism 2 is powered on to operate; when an abnormality, such as a limit failure, occurs, that is, the guide mechanism 3 or/and the lithography mechanism 4 touch the collision switch 81 in the power-off protection device 8, so that the collision switch 81 is in an open state, the ac contactor 82 is opened, so that the drive mechanism 2 is powered off and stops working, and the guide mechanism 3 stops moving. When the guiding mechanism 3 leaves the collision switch 81 and returns to the normal movement stroke, the collision switch 81 is in a closed state, the access switch 83 is pressed, the alternating current contactor 82 is attracted, and the driving mechanism 2 is electrified again to work.
The lithography equipment with the power-off protection device is also provided with a buffer protection mechanism, and the buffer protection mechanism comprises a buffer limiting block 7 or/and a mechanical buffer block 9. The buffer limiting block 7 is detachably fixed, and is used for limiting and adjusting the movement strokes of the second guiding device 32 and the photoetching mechanism 4 during photoetching of products with different sizes.
In this embodiment, the buffering protection mechanism includes a buffering stopper 7 and a mechanical buffer 9.
The buffer limiting blocks 7 are arranged between the two corresponding power-off protection devices 8, that is, the distance between the two buffer limiting blocks 7 is smaller than the distance between the two corresponding power-off protection devices 8, and the distance between the two buffer limiting blocks 7 is greater than or equal to the movement stroke of the second guide device 32 or/and the lithography mechanism 4; the second guiding device 32 and/or the lithography mechanism 4 is used for limiting the movement stroke of the second guiding device 32 and/or the lithography mechanism 4, and the second guiding device 32 and/or the lithography mechanism 4 plays a role of buffering and blocking when the second guiding device 32 and/or the lithography mechanism 4 cannot stop in time, so that the second guiding device 32 and/or the lithography mechanism 4 is prevented from exceeding the movement stroke, or the speed of the second guiding device 32 and/or the lithography mechanism 4 is reduced to reduce the impact force on the power-off protection device 8 after the second guiding device 32 and/or the lithography mechanism 4 exceeds the movement stroke, and the power-off protection device 8 is prevented from being damaged due to the excessive impact force. The mechanical buffer blocks 9 are arranged outside the two corresponding power-off protection devices 8, i.e. the distance between the two mechanical buffer blocks 9 is larger than the distance between the two corresponding power-off protection devices 8, so as to prevent the second guiding device 32 or/and the lithography mechanism 4 from being flushed out of the track due to inertia after power-off.
Specifically, the buffer stopper 7 for buffering and stopping the second guiding device 32 is disposed on the side surface of the side protruding toward the first rail 311 in the middle of the base 1, and the buffer stopper 7 for buffering and stopping the lithography mechanism 4 is disposed on the side wall of the groove 3231 of the beam 323. The mechanical buffer block 9 for preventing the second guiding device 32 from being punched out is arranged behind the corresponding buffer stop 7, and the mechanical buffer block 9 for preventing the photoetching mechanism from being punched out is arranged behind the corresponding buffer stop 7 (in the groove 3231).
In other embodiments, the buffer stoppers 7 are disposed on both the two first guide rails 311 and the two second guide rails 321.
In other embodiments, mechanical bumpers 9 are provided on both ends of the first guide rail 311 and the second guide rail 321.
It should be noted that, whatever the installation method, it is necessary to ensure that the second guide device 32 or/and the lithography mechanism 4 can touch the buffer stop 7 when exceeding the movement stroke, and ensure that the second guide device 32 or/and the lithography mechanism 4 can touch the mechanical buffer 9 when punching out of the track.
The lithography mechanism 4 comprises a fixed plate 41 and a lithography device (not shown). Specifically, one end of the fixing plate 41 is provided with a mounting structure 411 for mounting the photolithography device, and the mounting structure 411 enables the photolithography device to be perpendicular to the platform 11 for placing the light guide plate; the lower surface of the fixed plate 41 is fixedly connected with the second slider. It should be noted that when the photolithography mechanism 4 moves to the maximum stroke, the fixing plate 41 contacts the mechanical stopper 9.
The lithography equipment with the power-off protection device is also provided with a control system, and the control system is respectively connected with the driving mechanism 2 and the lithography mechanism 4. The control system can preset a motion stroke and a motion track. It should be noted that the preset movement stroke refers to a maximum stroke of allowing the lithography mechanism 4 to move when the lithography mechanism 4 moves horizontally and longitudinally, and is not a maximum stroke on a lithography track of the lithography mechanism 4; the preset motion track refers to a track required by the photoetching mechanism 4 to perform photoetching on a pattern.
In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. It will be understood that when an element such as a layer, region or substrate is referred to as being "formed on," "disposed on" or "located on" another element, it can be directly on the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly formed on" or "directly disposed on" another element, there are no intervening elements present.
In this document, unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms can be understood in a specific case to those of ordinary skill in the art.
In this document, the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", "vertical", "horizontal", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for the sake of clarity and convenience of description of the technical solutions, and thus, should not be construed as limiting the present invention.
As used herein, the ordinal adjectives "first", "second", etc., used to describe an element are merely to distinguish between similar elements and do not imply that the elements so described must be in a given sequence, either temporally, spatially, in ranking, or in any other manner.
As used herein, the meaning of "a plurality" or "a plurality" is two or more unless otherwise specified.
As used herein, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, including not only those elements listed, but also other elements not expressly listed.
The above description is only for the specific embodiments of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art can easily think of the changes or substitutions within the technical scope of the present invention, and all should be covered within the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (7)
1. A photoetching equipment with a power-off protection device is characterized by comprising a base, a platform arranged on the base, a photoetching mechanism arranged above the platform, a driving mechanism used for realizing the movement of the photoetching mechanism relative to the platform, and the power-off protection device used for realizing the power-off of the driving mechanism when the photoetching mechanism exceeds a preset movement stroke.
2. The lithographic apparatus with a power down protection device according to claim 1, wherein the power down protection device comprises a collision switch, an ac contactor, and a path switch, wherein one end of the collision switch is connected to the ac contactor, and the other end is connected to ground, and one end of the path switch is connected to a power supply, and the other end is connected to the ac contactor.
3. The lithographic apparatus with power down protection as claimed in claim 2, wherein the access switch is provided with a jog button or a time relay, and the bump switch is a spring-loaded travel switch.
4. The lithographic apparatus with power down protection device according to claim 1, further comprising a guide mechanism for connecting the drive mechanism and the lithographic mechanism, the guide mechanism being disposed on the base, the guide mechanism comprising a first guide for horizontal movement of the lithographic mechanism or/and a second guide for longitudinal movement of the lithographic mechanism.
5. The lithographic apparatus with power down protection as claimed in claim 4, wherein the first guiding device comprises a first rail disposed on opposite sides of the base and a first slider mounted on the first rail, and the second guiding device comprises a beam, a second rail disposed on opposite sides of the beam and a second slider mounted on the second rail.
6. The lithographic apparatus with power-off protection device according to claim 5, wherein the power-off protection device is disposed on the base or at both ends of the first rail outside both ends of the first rail, and the power-off protection device is disposed on the beam outside both ends of the second rail or at both ends of the second rail.
7. A lithographic apparatus with a power-off protection device according to claim 4, wherein two buffer stoppers are provided between two corresponding power-off protection devices, and the distance between the two buffer stoppers is greater than or equal to the movement stroke of the second guiding device or the lithographic mechanism.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020803584.7U CN212160348U (en) | 2020-05-14 | 2020-05-14 | Photoetching equipment with power-off protection device |
| PCT/CN2020/126466 WO2021227389A1 (en) | 2020-05-14 | 2020-11-04 | Photoetching device provided with power-off protection apparatuses |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020803584.7U CN212160348U (en) | 2020-05-14 | 2020-05-14 | Photoetching equipment with power-off protection device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212160348U true CN212160348U (en) | 2020-12-15 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020803584.7U Active CN212160348U (en) | 2020-05-14 | 2020-05-14 | Photoetching equipment with power-off protection device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN212160348U (en) |
| WO (1) | WO2021227389A1 (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014010046A1 (en) * | 2012-07-11 | 2014-01-16 | 三菱電機株式会社 | Laser resonator control power supply, laser oscillator, and laser oscillation system |
| CN206732380U (en) * | 2017-04-28 | 2017-12-12 | 广州万林模型设计有限公司 | Multi-use architecture laser cutting machine |
| CN207155039U (en) * | 2017-09-21 | 2018-03-30 | 艾博特镭射科技徐州有限公司 | A kind of high efficiency plasma laser cutting machine |
| CN208437844U (en) * | 2018-07-05 | 2019-01-29 | 武汉汇科信工业技术股份有限公司 | A kind of laser cutting machine |
| CN109249282A (en) * | 2018-11-08 | 2019-01-22 | 青岛新松机器人自动化有限公司 | A kind of multimachine bed automatic loading and unloading system and method based on robot |
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2020
- 2020-05-14 CN CN202020803584.7U patent/CN212160348U/en active Active
- 2020-11-04 WO PCT/CN2020/126466 patent/WO2021227389A1/en active Application Filing
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| Publication number | Publication date |
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| WO2021227389A1 (en) | 2021-11-18 |
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