CN211913317U - Tail gas treatment device and tail gas treatment system - Google Patents
Tail gas treatment device and tail gas treatment system Download PDFInfo
- Publication number
- CN211913317U CN211913317U CN202020072000.3U CN202020072000U CN211913317U CN 211913317 U CN211913317 U CN 211913317U CN 202020072000 U CN202020072000 U CN 202020072000U CN 211913317 U CN211913317 U CN 211913317U
- Authority
- CN
- China
- Prior art keywords
- tail gas
- gas treatment
- pipe
- exhaust gas
- reaction liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Treating Waste Gases (AREA)
Abstract
The utility model discloses a tail gas processing apparatus and tail gas processing system belongs to tail gas treatment technical field. The tail gas treatment device comprises an air inlet pipe, a circulating pipe, an exhaust pipe and a tail gas treatment tank. The gas inlet pipe is connected with the circulating pipe, reaction liquid is filled in the tail gas treatment tank, the tail gas treatment tank comprises a first treatment area and a second treatment area which are isolated from each other, and the first treatment area and the second treatment area are both positioned below the liquid level of the reaction liquid; one end of the circulating pipe is communicated with the first treatment area, the other end of the circulating pipe is communicated with the second treatment area, the reaction liquid can flow back to the first treatment area from the second treatment area through the circulating pipe, and the exhaust pipe is communicated with the top of the tail gas treatment tank. The tail gas treatment system comprises a plurality of tail gas treatment devices which are sequentially connected end to end along the tail gas flowing direction, the gas inlet pipe at the head end is connected with the tail gas discharge port of the tail gas discharge device, and the exhaust pipe at the tail end is connected with the gas inlet of the washing tower, so that the absorption rate of arsine is improved, the pretreatment of tail gas is realized, and the subsequent tail gas treatment pressure is reduced.
Description
Technical Field
The utility model relates to a tail gas treatment technical field especially relates to a tail gas processing apparatus and tail gas processing system.
Background
Arsine is a highly toxic, combustible gas that mixes with air to form a combustible mixture. As for the tail gas containing arsine, the arsine in the tail gas needs to be absorbed and then discharged into the atmosphere so as to prevent the pollution to the environment and the harm to human health. Arsine is mainly produced in the tail gas of furnace tubes, ion implantation processes, MOCVD (Metal-organic Chemical Vapor Deposition) processes in semiconductor industrial production, and in the tail gas produced in the production process of arsine gas.
In the prior art, the tail gas containing arsine is usually directly discharged into a spray tower from bottom to top, the spray tower sprays reaction liquid from top to bottom to absorb arsine, and the treated tail gas is discharged into the external atmosphere. The method has the advantages of large contact mass transfer resistance between the tail gas and the reaction liquid, low arsine absorption rate, high equipment investment and high operation cost for achieving the expected treatment effect.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a tail gas processing apparatus and tail gas processing system can improve the absorptivity of arsine, realizes the preliminary treatment to tail gas to alleviate follow-up tail gas treatment pressure.
To achieve the purpose, the utility model adopts the following technical proposal:
the utility model provides a tail gas processing apparatus, includes intake pipe, circulating pipe, blast pipe and tail gas treatment tank, the intake pipe is used for letting in tail gas, the intake pipe with the circulating pipe is connected, be equipped with reaction liquid in the tail gas treatment tank, the tail gas treatment tank includes the first treatment area and the second treatment area of mutual isolation, first treatment area with the second treatment area all is located below the reaction liquid level, the one end of circulating pipe with first treatment area intercommunication, the other end with second treatment area intercommunication, reaction liquid can pass through the circulating pipe is followed the second treatment area flows back extremely first treatment area, the blast pipe communicate in the top of tail gas treatment tank.
As a preferable technical scheme of the tail gas treatment device, the first treatment area and the second treatment area are both provided with a filler, two ends of the circulating pipe are both located below the filler, and the filler is used for increasing the contact area between the tail gas and the reaction liquid.
As a preferred technical scheme of the tail gas treatment device, the tail gas treatment device further comprises an ejector arranged on the circulating pipe, and the air inlet pipe is connected with the ejector.
As a preferable technical solution of the tail gas treatment device, the tail gas treatment device further comprises a heat exchanger disposed on the circulation pipe, and the heat exchanger is located between the second treatment area and the ejector.
As a preferable technical solution of the tail gas treatment device, the tail gas treatment device further comprises a first circulation pump, and the first circulation pump is disposed on the circulation pipe.
As a preferred technical scheme of the tail gas treatment device, the tail gas treatment device further comprises a liquid level measuring assembly, and the liquid level measuring assembly is used for measuring the liquid level height of the reaction liquid in the tail gas treatment tank.
For reaching above-mentioned purpose, the utility model also provides a tail gas treatment system, include the edge the flow direction of tail gas is end to end a plurality of as above in proper order tail gas treatment device, preceding one tail gas treatment device's blast pipe is as the latter tail gas treatment device's intake pipe, the head end tail gas treatment device's intake pipe is connected with tail gas discharge device's exhaust emission port, the tail end tail gas treatment device's blast pipe is connected with the air inlet of scrubbing tower.
As a preferred technical scheme of the tail gas treatment system, the tail gas treatment system further comprises a reaction liquid supplementing assembly, and the reaction liquid supplementing assembly is connected with the tail gas treatment tank and is used for supplementing the reaction liquid to the tail gas treatment tank.
As a preferred technical scheme of the tail gas treatment system, the tail gas treatment system further comprises a liquid discharge assembly, the liquid discharge assembly is connected with the circulating pipe, and the liquid discharge assembly is used for discharging the reaction liquid outwards.
As a preferred technical scheme of the tail gas treatment system, the tail gas treatment system further comprises a buffer tank, the buffer tank is connected to the gas inlet pipe of the tail gas treatment device at the head end, and the buffer tank is used for preventing reaction liquid from flowing back into the tail gas discharge device.
Compared with the prior art, the utility model discloses an advantage and beneficial effect lie in:
the utility model provides a tail gas treatment device, this tail gas treatment device include intake pipe, circulating pipe, blast pipe and tail gas treatment jar. The tail gas treatment tank comprises a first treatment area and a second treatment area which are isolated from each other, and the first treatment area and the second treatment area are both positioned below the liquid level of the reaction liquid; one end of the circulating pipe is communicated with the first treatment area, the other end of the circulating pipe is communicated with the second treatment area, the reaction liquid can flow back to the first treatment area from the second treatment area through the circulating pipe, and the exhaust pipe is communicated with the top of the tail gas treatment tank. And tail gas in the gas inlet pipe and reaction liquid in the circulating pipe are mixed and then flow into the first treatment area, the tail gas reacted with the reaction liquid is discharged from the exhaust pipe, and the reaction liquid circularly flows in the first treatment area, the second treatment area and the circulating pipe. The tail gas treatment device improves the absorptivity of arsine, realizes the pretreatment of tail gas, and can reduce the pressure of subsequent tail gas treatment.
The utility model also provides a tail gas treatment system, this tail gas treatment system include a plurality of foretell tail gas processing apparatus of end to end in proper order along tail gas flow direction, and preceding tail gas processing apparatus's blast pipe is as last tail gas processing apparatus's intake pipe, and the tail gas processing apparatus's of head end intake pipe is connected with tail gas discharge port of tail gas discharge device, and the tail gas processing apparatus's of tail end blast pipe is connected with the air inlet of scrubbing tower. Through setting up a plurality of tail gas processing apparatus, tail gas processing system realizes reaching emission standard to the multiple treatment of tail gas, or as the preliminary treatment to alleviate the processing pressure of follow-up tail gas.
Drawings
Fig. 1 is a schematic structural diagram of an exhaust gas treatment device according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of an exhaust gas treatment system according to an embodiment of the present invention.
Reference numerals:
1. an air inlet pipe; 2. a circulation pipe; 3. an exhaust pipe;
4. a tail gas treatment tank; 41. a first treatment zone; 42. a second treatment zone; 43. a filler;
5. a liquid level measurement assembly; 6. a concentration measurement component; 7. a pH measuring component; 8. an ejector; 9. a first circulation pump; 10. a heat exchanger;
100. a reaction liquid replenishing assembly; 1001. a liquid medicine tank; 1002. an alkali liquor tank; 1003. a second circulation pump;
200. a drainage assembly; 2001. a flow measurement assembly;
300. and a buffer tank.
Detailed Description
In order to make the technical problem solved by the present invention, the technical solution adopted by the present invention and the technical effect achieved by the present invention clearer, the technical solution of the present invention will be further explained by combining the drawings and by means of the specific implementation manner.
In the description of the present invention, unless expressly stated or limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, e.g., as meaning permanently connected, detachably connected, or integral to one another; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In the present disclosure, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact between the first and second features, or may comprise contact between the first and second features not directly. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
In the description of the present embodiment, the terms "upper", "lower", "left", "right", and the like are used in the orientation or positional relationship shown in the drawings only for convenience of description and simplicity of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used only for descriptive purposes and are not intended to have a special meaning.
As shown in fig. 1, the present embodiment provides an exhaust gas treatment device including an intake pipe 1, a circulation pipe 2, an exhaust pipe 3, and an exhaust gas treatment tank 4. Wherein, intake pipe 1 is used for letting in tail gas, and intake pipe 1 and circulating pipe 2 are connected, and reaction liquid is filled in tail gas treatment tank 4, and tail gas treatment tank 4 includes first treatment zone 41 and the second treatment zone 42 of mutual isolation, and first treatment zone 41 and second treatment zone 42 all are located below the reaction liquid level. One end of the circulating pipe 2 is communicated with the first treating region 41, the other end is communicated with the second treating region 42, the reaction liquid can flow back to the first treating region 41 from the second treating region 42 through the circulating pipe 2, and the exhaust pipe 3 is communicated with the top of the tail gas treating tank 4.
Specifically, a baffle is arranged below the liquid level of the reaction liquid in the tail gas treatment tank 4, one side of the baffle is a first treatment area 41, the other side of the baffle is a second treatment area 42, and the reaction liquid in the first treatment area 41 can only flow into the second treatment area 42 from the upper part of the baffle.
Tail gas enters the circulating pipe 2 from the gas inlet pipe 1, is mixed with reaction liquid which circularly flows in the circulating pipe 2 and enters the tail gas treatment tank 4, arsine in the tail gas and the reaction liquid generate chemical reaction and are absorbed, and the treated tail gas overflows from the reaction liquid and is discharged through the gas outlet pipe 3; the reaction liquid circulates in the first treating section 41, the second treating section 42 and the circulating pipe 2. Through dividing into first treatment area 41 and second treatment area 42 with tail gas treatment tank 4, the flow of reaction liquid in tail gas treatment tank 4 increases, prolongs the contact time of tail gas and reaction liquid, increases area of contact for tail gas and reaction liquid fully react, thereby improve the absorptivity of arsine in the tail gas, realized the preliminary treatment to tail gas, thereby alleviate the treatment pressure of follow-up tail gas. Preferably, in this embodiment, the first treatment zone 41 is larger than the second treatment zone 42 to further increase the contact time of the off-gas with the reaction liquid.
Optionally, the first treatment area 41 and the second treatment area 42 are both provided with a filler 43, and both ends of the circulating pipe 2 are both communicated with the lower part of the filler 43, so that the reaction liquid containing the tail gas is dispersed in the filler 43, and the contact area between the tail gas and the reaction liquid is increased. The filler 43 is generally an inert solid material, and in this embodiment, the filler 43 is preferably a spherical, stepped, or other high efficiency bulk filler. The filler 43 is provided to intensively mix the tail gas with the reaction liquid, so that the reaction degree of arsine in the tail gas with the reaction liquid is enhanced, and the absorption rate of arsine is improved.
Preferably, one end of the circulating pipe 2 extends into the space between the filler 43 and the bottom of the tail gas treatment tank 4, and a plurality of distribution holes are arranged on the pipe section of the extending part. The distribution holes can uniformly disperse the mixture of the tail gas and the reaction liquid in the circulating pipe 2 below the first treatment area 41, and the absorption rate of arsine in the tail gas is improved.
As shown in fig. 1, the exhaust gas treatment device further includes an ejector 8 disposed on the circulation pipe 2, and the intake pipe 1 is connected to the ejector 8. Ejector 8 includes the nozzle, inhale room and diffuser pipe, inhale the room and include mixing chamber and the air duct of mutual intercommunication, the air duct is connected with intake pipe 1, diffuser pipe and circulating pipe 2 intercommunication, reaction liquid is high-speed blowout behind the nozzle, high-speed reaction liquid is when the mixing chamber, the mixing chamber can form the vacuum, leading-in by the tail gas of air duct in with intake pipe 1, after tail gas gets into the mixing chamber, violently mix with reaction liquid, form gas-liquid mixture, finally discharge by the diffuser pipe. The ejector 8 disperses the tail gas and the reaction liquid by means of a special structure of the ejector and the movement of the fluid, and the tail gas and the reaction liquid are mixed with each other to improve the contact area of the reaction liquid and the tail gas and improve the absorptivity of arsine.
Optionally, the tail gas treatment device further comprises a first circulation pump 9, and the first circulation pump 9 is arranged on the circulation pipe 2. Before the tail gas treatment device treats the tail gas, the first circulating pump 9 is started to enable the reaction liquid to establish circulation between the circulating pipe 2 and the tail gas treatment tank 4, and after the ejector 8 establishes vacuum, the tail gas is introduced for treatment. Prevent that the gas among the tail gas processing apparatus from overflowing and scattering to cause the pollution in the tail gas discharging device of upper reaches to the vacuum environment that ejector 8 established can be more smooth with tail gas suction intake pipe 1 in, make the smooth going on of tail gas treatment.
Because the first circulating pump 9 does work on the reaction liquid, and the chemical reaction between the arsine in the tail gas and the reaction liquid is an exothermic reaction, the temperature of the reaction liquid rises, if the temperature of the reaction liquid is too high, the mixing of the tail gas and the reaction liquid is not facilitated, and the reaction rate is reduced due to the too high temperature, which is not conducive to the chemical reaction. The off-gas treatment plant therefore also comprises a heat exchanger 10 arranged on the recycling pipe 2, the heat exchanger 10 being located between the second treatment zone 42 and the ejector 8. The heat exchanger 10 can adjust the temperature of the reaction liquid in the circulation pipe 2 to improve the mixing degree of the tail gas and the reaction liquid, thereby improving the reaction rate of arsine and the reaction liquid and improving the absorption rate of arsine. In this example, the temperature of the reaction solution was maintained at room temperature.
Preferably, the tail gas treatment device further comprises a liquid level measuring assembly 5, and the liquid level measuring assembly 5 is used for measuring the liquid level height of the reaction liquid in the tail gas treatment tank 4. The liquid level measuring component 5 is used for monitoring the liquid level height, ensures that an operator can observe the liquid level height of the reaction liquid in real time, ensures that the operator can supplement the reaction liquid in time when the liquid level height is reduced to a set value, and ensures that the tail gas treatment is smoothly carried out. Preferably, in this embodiment, the liquid level is about 10cm to 20cm above the fill material 43. The level measurement assembly 5 is preferably a differential pressure level gauge connected to the off-gas treatment tank 4.
Preferably, the exhaust gas treatment device further comprises a concentration measuring component 6 and a PH measuring component 7. The concentration measuring unit 6 and the pH measuring unit 7 are used to monitor the concentration and pH of the reaction solution, respectively. One end of the concentration measuring component 6 extends below the liquid level of the reaction liquid, and the other end extends out of the tail gas treatment tank 4, so that an operator can monitor the concentration of the reaction liquid in real time. PH measuring unit 7 one end stretches into below the reaction liquid level, and the other end stretches out outside tail gas treatment jar 4 to operating personnel can real-time supervision reaction liquid's pH value. Specifically, the pH value is generally maintained at 9 to 12. Preferably, in the present embodiment, the concentration measuring unit 6 is a concentration probe, and the PH measuring unit 7 is a PH probe.
As shown in fig. 2, the present embodiment further provides an exhaust gas treatment system, which includes a plurality of the above-mentioned exhaust gas treatment devices connected end to end in sequence along the flow direction of the exhaust gas, the exhaust pipe 3 of the previous exhaust gas treatment device is used as the intake pipe 1 of the next exhaust gas treatment device, the intake pipe 1 of the first exhaust gas treatment device is connected with the exhaust gas discharge port of the exhaust gas discharge device, and the exhaust pipe 3 of the tail exhaust gas treatment device is connected with the air inlet of the scrubber.
Tail gas is discharged from the tail gas discharge port and is inhaled the circulating pipe 2 in by ejector 8, gets into first tail gas treatment jar 4 through circulating pipe 2, and the tail gas through the processing overflows from the reaction liquid level, gets into next tail gas treatment device's intake pipe 1 through blast pipe 3 in, and tail gas passes through a plurality of tail gas treatment device in proper order, realizes the multiple treatment to tail gas, improves the treatment effect of preliminary treatment, further alleviates follow-up tail gas treatment pressure, improves the absorption rate of arsine. The number of the tail gas treatment devices in the tail gas treatment system is set according to the concentration of arsine in the discharged tail gas, and the tail gas treated by the tail gas treatment system can reach the discharge standard, or is finally discharged into the environment through the spray washing of a subsequent spray tower, so that the tail gas meets the environmental protection requirement. Preferably, in this embodiment, the exhaust gas treatment system includes two exhaust gas treatment devices connected end to end in sequence along the exhaust gas flow direction.
Optionally, the tail gas treatment system further comprises a reaction liquid supplementing assembly 100, and the reaction liquid supplementing assembly 100 is connected to the tail gas treatment tank 4 and is used for supplementing the reaction liquid to the tail gas treatment tank 4. Specifically, reaction liquid supplements subassembly 100 including medicinal liquid jar 1001 and lye tank 1002, and medicinal liquid jar 1001 and lye tank 1002 are connected with tail gas treatment jar 4 through the pipeline respectively, are provided with second circulating pump 1003 on the pipeline. The liquid medicine tank 1001 is filled with sodium hypochlorite solution with the concentration of 1% -10%, and the alkaline solution tank 1002 is filled with sodium hydroxide solution with the concentration of 1% -40%. When the liquid level measuring assembly 5 monitors that the liquid level is lower than the preset value, an operator can add the liquid medicine in the liquid medicine tank 1001 into the tail gas treatment tank 4; when the concentration measuring component 6 detects that the concentration of the reaction liquid is lower than a preset value, the liquid medicine in the liquid medicine tank 1001 and the alkali liquor in the alkali liquor tank 1002 can be added into the tail gas treatment tank 4 to enable the concentration of the reaction liquid to reach the preset value; when the PH measuring component 7 monitors that the PH value of the reaction solution is lower than the preset value, the alkali solution in the alkali solution tank 1002 can be added into the tail gas treatment tank 4 to make the PH value of the reaction solution return to the preset range.
Optionally, the exhaust gas treatment system further comprises a liquid discharge assembly 200, the liquid discharge assembly 200 is connected to the circulation pipe 2, and the liquid discharge assembly 200 is used for discharging the reaction liquid outwards. Specifically, the liquid discharge assembly 200 includes a liquid discharge main pipe, a plurality of liquid discharge branch pipes and a plurality of flow measurement assemblies 2001, wherein the flow measurement assemblies 2001 correspond to the liquid discharge branch pipes one to one and are arranged on the liquid discharge branch pipes, one end of each liquid discharge branch pipe is connected with the circulation pipe 2 of the tail gas treatment device, the other end of each liquid discharge branch pipe extends to be connected with the liquid discharge main pipe, and the liquid discharge main pipe is connected with an arsenic-containing wastewater system. After the reaction solution is circulated for a period of time, the concentration of the reaction solution and arsine is decreased, so that the concentration of the reaction solution and arsine is increased, and in order to maintain the concentrations of the reaction solution and the reaction product within a certain range, the reaction solution in the tail gas treatment tank 4 needs to be discharged to a certain extent, so that the tail gas treatment can be continuously and effectively carried out. Preferably, in the present embodiment, the flow measurement assembly 2001 is selected as a flow meter.
Optionally, the tail gas treatment system further comprises a buffer tank 300, the buffer tank 300 is connected to the intake pipe 1 of the tail gas treatment device at the head end, and the buffer tank 300 is used for preventing the reaction liquid from flowing back into the tail gas discharge device. When tail gas processing system breaks down or the outage leads to the system stop work, because intake pipe 1 is the state of negative pressure, reaction liquid can produce the suck-back phenomenon because of pressure differential, can store the reaction liquid of suck-back backward flow through setting up buffer tank 300, prevents that reaction liquid from flowing into tail gas discharging equipment.
The above description is only for the preferred embodiment of the present invention, and for those skilled in the art, there are variations on the detailed description and the application scope according to the idea of the present invention, and the content of the description should not be construed as a limitation to the present invention.
Claims (10)
1. A tail gas treatment device is characterized by comprising an air inlet pipe (1), a circulating pipe (2), an exhaust pipe (3) and a tail gas treatment tank (4), the air inlet pipe (1) is used for introducing tail gas, the air inlet pipe (1) is connected with the circulating pipe (2), the tail gas treatment tank (4) is filled with reaction liquid, the tail gas treatment tank (4) comprises a first treatment area (41) and a second treatment area (42) which are isolated from each other, the first treatment zone (41) and the second treatment zone (42) are both located below the liquid level of the reaction liquid, one end of the circulating pipe (2) is communicated with the first treatment area (41), and the other end is communicated with the second treatment area (42), the reaction liquid can be returned from the second treatment zone (42) to the first treatment zone (41) through the circulation pipe (2), the exhaust pipe (3) is communicated with the top of the tail gas treatment tank (4).
2. The exhaust gas treatment device according to claim 1, wherein a packing (43) is disposed in each of the first treatment zone (41) and the second treatment zone (42), both ends of the circulation pipe (2) are located below the packing (43), and the packing (43) is used for increasing a contact area between the exhaust gas and the reaction solution.
3. The exhaust gas treatment device according to claim 1, further comprising an ejector (8) provided on the circulation pipe (2), the intake pipe (1) being connected to the ejector (8).
4. The exhaust gas treatment device according to claim 3, further comprising a heat exchanger (10) arranged on the circulation pipe (2), the heat exchanger (10) being located between the second treatment zone (42) and the ejector (8).
5. The exhaust gas treatment device according to claim 1, further comprising a first circulation pump (9), the first circulation pump (9) being arranged on the circulation pipe (2).
6. The exhaust gas treatment device according to claim 1, further comprising a liquid level measuring assembly (5), wherein the liquid level measuring assembly (5) is used for measuring the liquid level height of the reaction liquid in the exhaust gas treatment tank (4).
7. An exhaust gas treatment system, comprising a plurality of exhaust gas treatment devices according to any one of claims 1 to 6 connected end to end in sequence along the flow direction of the exhaust gas, wherein the exhaust pipe (3) of the former exhaust gas treatment device is used as the intake pipe (1) of the latter exhaust gas treatment device, the intake pipe (1) of the former exhaust gas treatment device is connected with the exhaust gas discharge port of the latter exhaust gas treatment device, and the exhaust pipe (3) of the latter exhaust gas treatment device is connected with the air inlet of the scrubber.
8. The exhaust gas treatment system according to claim 7, further comprising a reaction liquid replenishing assembly (100), wherein the reaction liquid replenishing assembly (100) is connected to the exhaust gas treatment tank (4) and is configured to replenish the reaction liquid into the exhaust gas treatment tank (4).
9. The exhaust gas treatment system according to claim 7, further comprising a drain assembly (200), wherein the drain assembly (200) is connected to the circulation pipe (2), and the drain assembly (200) is used for discharging the reaction solution to the outside.
10. The exhaust gas treatment system according to claim 7, further comprising a buffer tank (300), wherein the buffer tank (300) is connected to the inlet pipe (1) of the exhaust gas treatment device at the head end, and the buffer tank (300) is used for preventing the reaction liquid from flowing back into the exhaust gas discharge device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020072000.3U CN211913317U (en) | 2020-01-14 | 2020-01-14 | Tail gas treatment device and tail gas treatment system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020072000.3U CN211913317U (en) | 2020-01-14 | 2020-01-14 | Tail gas treatment device and tail gas treatment system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211913317U true CN211913317U (en) | 2020-11-13 |
Family
ID=73331354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020072000.3U Active CN211913317U (en) | 2020-01-14 | 2020-01-14 | Tail gas treatment device and tail gas treatment system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211913317U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111097278A (en) * | 2020-01-14 | 2020-05-05 | 上海正帆科技股份有限公司 | Tail gas treatment device and tail gas treatment system |
-
2020
- 2020-01-14 CN CN202020072000.3U patent/CN211913317U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111097278A (en) * | 2020-01-14 | 2020-05-05 | 上海正帆科技股份有限公司 | Tail gas treatment device and tail gas treatment system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108854487B (en) | Arsine/phosphane waste gas treatment device and arsine/phosphane waste gas treatment method | |
| CN211913317U (en) | Tail gas treatment device and tail gas treatment system | |
| CN111097278A (en) | Tail gas treatment device and tail gas treatment system | |
| CN109000217A (en) | A kind of boiler water feeding ammonification complete alternation system and method | |
| CN218901399U (en) | Tail gas treatment system for disilane production | |
| CN209791493U (en) | Feeding device for producing ammonium fluoride | |
| CN208964615U (en) | A kind of denitration treatment device containing nitrate wastewater | |
| CN217511825U (en) | Novel sodium hypochlorite generation device | |
| CN208318107U (en) | A kind of device for making of high-pure chlorinedioxide thimerosal | |
| CN207102257U (en) | A kind of chlorination reaction tail gas absorption processing unit | |
| CN109289744A (en) | It is a kind of for improving metronidazole production method, device and the application of nitric acid utilization rate | |
| CN213101398U (en) | Acid mist recycling device of reaction kettle for polyaluminium chloride | |
| CN209680087U (en) | It is a kind of for improving the metronidazole process units of nitric acid utilization rate | |
| CN207142846U (en) | System for the oxidation of acid chlorization aluminium system ferrous ions | |
| CN113087085A (en) | For military use disinfection electrolysis water spray truck that disinfects | |
| CN111675415A (en) | Low-temperature multi-effect seawater desalination decarbonization antiscaling device | |
| CN111634990A (en) | Device for removing carbonate and bicarbonate radical in cobaltic wastewater | |
| CN219804646U (en) | Reaction kettle for gaseous raw materials and liquid raw materials | |
| CN217756991U (en) | Vulcanization system for removing heavy metals in acidic wastewater | |
| CN212701405U (en) | Production equipment of air pollution treatment medicament | |
| CN221917462U (en) | Wet continuous accurate feeding device for solid powder medicament | |
| CN210473516U (en) | Tail gas recovery tower | |
| CN219002585U (en) | Ejector system for treating exhaust gas | |
| CN218871746U (en) | Exhaust gas additional unit and exhaust gas treatment system | |
| CN215288081U (en) | Micro-nano generator for sewage treatment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |