CN211771649U - Electromagnetic structure surface treatment device based on radio frequency breakdown threshold - Google Patents
Electromagnetic structure surface treatment device based on radio frequency breakdown threshold Download PDFInfo
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- CN211771649U CN211771649U CN202020006297.3U CN202020006297U CN211771649U CN 211771649 U CN211771649 U CN 211771649U CN 202020006297 U CN202020006297 U CN 202020006297U CN 211771649 U CN211771649 U CN 211771649U
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Abstract
The utility model mainly relates to the technical field of surface treatment, and provides an electromagnetic structure surface treatment device based on a radio frequency breakdown threshold value, which comprises a first vertical cabinet, a second vertical cabinet and a third vertical cabinet which are sequentially arranged from bottom to top, wherein the first vertical cabinet is provided with an ultrasonic cleaner controller and an ultrasonic cleaner, the second vertical cabinet is provided with an electrochemical polishing switch power supply, an electrochemical polishing water tank and a clear water flushing machine, and the third vertical cabinet is provided with a mechanical pump and a vacuum baking box; the method comprises the steps of removing oil stains on the surface of the electromagnetic structure to be cleaned by using an ultrasonic cleaning machine, improving the cleanliness of the surface of the electromagnetic structure to be cleaned, carrying out electrochemical polishing on the surface of the electromagnetic structure to be cleaned by using a phosphoric acid cleaning agent, wherein the phosphoric acid cleaning agent and metal ions on the surface of the electromagnetic structure to be cleaned can form a phosphate film on the surface of the electromagnetic structure to be cleaned, gradually leveling the rough surface of the electromagnetic structure to be cleaned, improving the smoothness of the electromagnetic structure to be cleaned, and being beneficial to improving the breakdown threshold value of a radio frequency field on the surface of the electromagnetic structure of.
Description
Technical Field
The utility model relates to a surface treatment technical field especially relates to an electromagnetic structure surface treatment device based on radio frequency punctures threshold value.
Background
HPM (High-power microwave) generally refers to electromagnetic waves with power greater than 100MW and frequency between 0.1GHz and 100 GHz. HPM devices refer to relativistic electric vacuum devices used to generate high power microwaves, most of which are driven by a high current relativistic electron beam. In recent years, the HPM device technology has been rapidly developed by the traction of high-energy radio frequency accelerators, plasma thermonuclear fusion, directional energy weapons, high-power radars, world power transmission, emission of small deep space detectors, material processing and processing, and other applications.
In order to improve the single pulse energy and the average power of the HPM devices, which are the targets of continuous research in the field of HPM research, the single pulse energy and the average power can be generally achieved by improving the peak power, the pulse width and the repetition frequency of the devices. In the nineties of the last century, researchers have gradually found that it is difficult to significantly increase the peak power level of HPM devices, and that it is also very difficult to operate at frequencies at or above kHz. Therefore, extending the pulse width of the output microwave is an important means for increasing the single pulse energy and average power level of HPM devices in the field of high-power microwave research. The international recognized key technical problem of pulse shortening is encountered in the practical research process of the long-pulse HPM device, namely that the microwave pulse is ended before the electric pulse is ended, and the problem is more serious when the microwave power is higher. Relevant researches show that the radio frequency breakdown of the surface of the electromagnetic structure in the HPM device is an important factor causing pulse shortening, the improvement of the pulse width of output microwaves is seriously restricted, and the cleanliness and the smoothness of the surface of the electromagnetic structure are main factors restricting the improvement of a radio frequency breakdown threshold value. Therefore, by adopting a new design idea, how to improve the cleanliness and the smoothness of the surface of the electromagnetic structure and further prolong the pulse width of output microwaves by researching an electromagnetic structure surface treatment process based on a radio frequency breakdown threshold value is a technical problem to be solved urgently at present.
SUMMERY OF THE UTILITY MODEL
Based on the technical problem that exists among the above-mentioned prior art, the utility model provides an electromagnetic structure surface treatment device based on radio frequency punctures threshold value improves the cleanliness and the smooth finish on electromagnetic structure surface to improve HPM device electromagnetic structure surface radio frequency field and puncture the threshold value.
The utility model provides an electromagnetic structure surface treatment device based on radio frequency breakdown threshold value, the device includes first clothes closet, second clothes closet and third clothes closet that set gradually from bottom to top, first clothes closet is equipped with ultrasonic cleaner controller and ultrasonic cleaner, the second clothes closet is equipped with electrochemistry polishing switching power supply, electrochemistry polishing basin and clear water flushing machine, the third clothes closet is equipped with mechanical pump and vacuum baking box, ultrasonic cleaner controller with the ultrasonic cleaner is connected, mechanical pump with the vacuum baking box is connected;
ultrasonic cleaner controller is used for control ultrasonic cleaner will treat that clean electromagnetic structure carries out ultrasonic cleaning, electrochemistry polishing switch power supply be used for connect in electrochemistry polishing switch power supply's electrochemistry polishing equipment power supply, electrochemistry polishing equipment is used for adopting the phosphoric acid cleaner right in the electrochemistry polishing basin treat that the surface of clean electromagnetic structure carries out the electrochemistry polishing, the clear water flushing machine is used for after the electrochemistry polishing treat that clean electromagnetic structure washs, the mechanical pump is used for doing vacuum baking oven carries out the evacuation, vacuum baking oven is used for right treat that clean electromagnetic structure carries out the vacuum baking.
Preferably, the ultrasonic cleaning machine is used for injecting clean water, and the ultrasonic cleaning machine controller is further used for controlling the temperature of the clean water to be 60 ℃ and controlling the ultrasonic cleaning time to reach a first preset time period t1，t1Greater than or equal to 1 hour.
Preferably, the electrochemical polishing device comprises an L-shaped copper bar with a lead, a clamp wire and a three-phase power plug;
one end of a clamp of the clamp line is clamped on the electrochemical polishing water tank, the other end of the clamp line is connected to an output anode of the electrochemical polishing switching power supply, a long handle end of the copper rod is connected with an output cathode of the electrochemical polishing switching power supply through a lead, a short handle end of the copper rod is wrapped by glass fiber cloth to form an electrochemical polishing contact head, and the electrochemical polishing contact head is used for uniformly smearing phosphoric acid cleaning agent on the surface of the electromagnetic structure to be cleaned so as to facilitate the electrochemical polishing of the surface of the electromagnetic structure to be cleaned by using the phosphoric acid cleaning agent;
the input end of the electrochemical polishing switching power supply is connected with the three-phase power plug, and the three-phase power plug is used for supplying power to the electrochemical polishing switching power supply.
Preferably, the phosphoric acid cleaning agent is prepared by mixing 99.99% phosphoric acid (by weight) and water 1: 1 (weight) is prepared.
Preferably, the vacuum baking oven is further specifically used for controlling the temperature of the vacuum baking oven, and the temperature is 120 ℃.
Has the advantages that: compared with the prior art, the utility model provides an electromagnetic structure surface treatment device based on radio frequency breakdown threshold value utilizes ultrasonic cleaner to carry out ultrasonic cleaning with the electromagnetic structure of waiting to clean, can clear away the greasy dirt on the electromagnetic structure surface of waiting to clean effectively to improve the cleanliness on the electromagnetic structure surface of waiting to clean, then adopts phosphoric acid cleaner to carry out electrochemical polishing in electrochemical polishing basin to the surface of waiting to clean the electromagnetic structure, phosphoric acid cleaner can form a layer of phosphate membrane with the metal ion on the electromagnetic structure surface of waiting to clean in the electromagnetic structure surface of waiting to clean, this phosphate membrane is in the protruding department on the electromagnetic structure surface of waiting to clean is thinner, the concavity is thicker, because the protruding department current density is high and dissolve fast, flows along with the phosphate membrane, along with unsmooth change, the rough surface of waiting to clean electromagnetic structure is levelled gradually, the clear water flushing machine is used for after the electrochemical polishing treat that clean electromagnetic structure washs, the mechanical pump is used for doing the case is baked in the vacuum carries out the evacuation, the case is baked in the vacuum is used for right treat that clean electromagnetic structure carries out the vacuum and toasts, thereby can improve effectively treat the smooth finish of clean electromagnetic structure, consequently, the embodiment of the utility model provides an electromagnetic structure surface treatment device based on radio frequency punctures the threshold value can improve the cleanliness and the smooth finish on electromagnetic structure surface effectively to can improve HPM device electromagnetic structure surface radio frequency field and puncture the threshold value, be favorable to prolonging the pulsewidth of HPM device output microwave, thereby can improve the monopulse energy and the average power of HPM device.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an electromagnetic structure surface processing apparatus based on a radio frequency breakdown threshold according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a first vertical cabinet of an electromagnetic structure surface treatment device based on a radio frequency breakdown threshold according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a second vertical cabinet of an electromagnetic structure surface treatment device based on a radio frequency breakdown threshold according to an embodiment of the present invention;
fig. 4 is a schematic structural diagram of an electrochemical polishing apparatus of an electromagnetic structure surface treatment device based on a radio frequency breakdown threshold according to an embodiment of the present invention;
fig. 5 is a schematic structural diagram of a third vertical cabinet of an electromagnetic structure surface treatment device based on a radio frequency breakdown threshold according to an embodiment of the present invention;
1-ultrasonic cleaner controller; 2-ultrasonic cleaning machine; 3-electrochemical polishing of the switching power supply; 4-electrochemical polishing water tank; 5-washing with clear water; 6-a mechanical pump; 7-vacuum oven; 8-L-shaped copper rods; 9-clamp line; 10-three-phase power plug.
Detailed Description
In order to make the technical solution of the present invention better understood, the technical solution of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts shall belong to the protection scope of the present invention.
Embodiments of the present application will be described below with reference to the accompanying drawings, but not limiting the invention.
As shown in fig. 1, for the embodiment of the utility model provides a structural schematic diagram of electromagnetic structure surface treatment device based on radio frequency puncture threshold value, the device includes first clothes closet, second clothes closet and the third clothes closet that sets gradually from bottom to top, first clothes closet is equipped with ultrasonic cleaner controller 1 and ultrasonic cleaner 2, the second clothes closet is equipped with electrochemical polishing switching power supply 3, electrochemical polishing basin 4 and clear water flushing machine 5, the third clothes closet is equipped with mechanical pump 6 and vacuum baking box 7, ultrasonic cleaner controller 1 with ultrasonic cleaner 2 connects, mechanical pump 6 with vacuum baking box 7 connects. Ultrasonic cleaner controller 1 is used for control ultrasonic cleaner 2 will treat that clean electromagnetic structure carries out ultrasonic cleaning, electrochemistry polishing switching power supply 3 be used for connect in electrochemistry polishing switching power supply 3's electrochemistry polishing equipment power supply, electrochemistry polishing equipment is used for adopting the phosphoric acid cleaner right in the electrochemistry polishing basin 4 treat that the surface of clean electromagnetic structure carries out the electrochemistry polishing, clear water flushing machine 5 is used for after the electrochemistry polishing treat that clean electromagnetic structure washs, mechanical pump 6 is used for doing vacuum baking box 7 carries out the evacuation, vacuum baking box 7 is used for right treat that clean electromagnetic structure carries out the vacuum baking.
Preferably, the ultrasonic cleaning machine 2 is used for injecting cleaning liquidWater, the ultrasonic cleaning machine controller 1 is also used for controlling the temperature of the clean water to be 60 ℃ and controlling the ultrasonic cleaning time to reach a first preset time period t1，t1Greater than or equal to 1 hour.
Specifically, as shown in fig. 2, for the embodiment of the utility model provides a structural schematic diagram of the first clothes closet of electromagnetic structure surface treatment device based on radio frequency puncture threshold value, ultrasonic cleaner controller 1 is fixed the one corner of first clothes closet, through general power cord with the outer power of first clothes closet is connected, ultrasonic cleaner controller 1 is used for controlling ultrasonic cleaner 2's operating condition. The operation principle comprises the following steps: firstly, injecting clear water into an ultrasonic cleaning machine 2, placing an electromagnetic structure to be cleaned in the clear water injected into the ultrasonic cleaning machine 2, starting a power supply outside the first vertical cabinet, starting an ultrasonic cleaning machine controller 1, setting the temperature to be 60 ℃, controlling the ultrasonic cleaning machine 2 to heat and keeping the temperature of the clear water to be 60 ℃, adjusting the power of a vibrator to be maximum when the temperature of the clear water reaches 60 ℃, and starting ultrasonic cleaning for 1 hour. Wherein t is1Can be set according to the oil stain degree on the surface of the electromagnetic structure to be cleaned in practice, and correspondingly, the larger the oil stain degree on the surface of the electromagnetic structure is, the set t1The longer the length, the embodiments of the present invention are not particularly limited.
Specifically, as shown in fig. 3, for the embodiment of the utility model provides a structural schematic diagram of the second clothes closet of electromagnetic structure surface treatment device based on radio frequency breakdown threshold value, be provided with electrochemical polishing switching power supply 3, electrochemical polishing basin 4 and clear water flushing machine 5 in the second clothes closet, through an electrochemical polishing equipment, adopt the phosphoric acid cleaner, it is right in electrochemical polishing basin 4 treat that the surface of clean electromagnetic structure carries out electrochemical polishing.
Preferably, as shown in fig. 4, a schematic structural diagram of an electrochemical polishing device of the electromagnetic structure surface treatment apparatus based on the radio frequency breakdown threshold provided in the embodiment of the present invention, the electrochemical polishing device includes an L-shaped copper rod 8 with a conducting wire, a clip wire 9, and a three-phase power plug 10.
One end of a clamp of the clamp line 9 is clamped on the electrochemical polishing water tank 4, the other end of the clamp line 9 is connected to an output anode of the electrochemical polishing switching power supply 3, a long handle end of the copper rod 8 is connected with an output cathode of the electrochemical polishing switching power supply 3 through a lead, a short handle end of the copper rod 8 is wrapped by glass fiber cloth to form an electrochemical polishing contact head, and the electrochemical polishing contact head is used for uniformly smearing phosphoric acid cleaning agent on the surface of the electromagnetic structure to be cleaned so as to facilitate the electrochemical polishing of the surface of the electromagnetic structure to be cleaned by using the phosphoric acid cleaning agent.
The input end of the electrochemical polishing switching power supply 3 is connected with the three-phase power plug 10, and the three-phase power plug 10 is used for supplying power to the electrochemical polishing switching power supply 3.
Preferably, the phosphoric acid cleaning agent is prepared by mixing 99.99% phosphoric acid (by weight) and water 1: 1 (weight) is prepared.
Specifically, the electromagnetic structure to be cleaned is taken out of the ultrasonic cleaning machine 2, and the electromagnetic structure to be cleaned is put into an electrochemical polishing water tank 4; clamping one end of a clamp of the clamp line 9 on the electrochemical polishing water tank 4, and connecting the other end of the clamp line 9 to the output positive electrode of the electrochemical polishing switching power supply 3; connecting the long handle end of the copper rod 8 with the output cathode of the electrochemical polishing switching power supply 3 through a lead, and wrapping the short handle end of the copper rod 8 with glass fiber cloth to form the electrochemical polishing contact; soaking an electrochemical polishing contact head of an electrochemical polishing device in the phosphoric acid cleaning agent for a second preset time period t2，t2The value of (2) set for according to practical application, for example 5 minutes or 10 minutes, specific value the utility model discloses do not specifically limit, electrochemical polishing switching power supply 3's input is connected three-phase power plug 10 for electrochemical polishing switching power supply 3 supplies power, opens electrochemical polishing switching power supply 3 soaks electrochemical polishing contact of electrochemical polishing equipment in the phosphoric acid cleaner, the purpose is for being stained with on the electrochemical polishing contact of electrochemical polishing equipment phosphoric acid cleaner to with electrochemical polishing contactAnd coating the surface of the electromagnetic structure to be cleaned by using an electrochemical polishing contact to realize the purpose of electrochemical polishing of the surface of the electromagnetic structure to be cleaned.
Placing the electrochemical polishing contact head soaked with the phosphoric acid cleaning agent on the surface of the electromagnetic structure to be cleaned for uniform smearing, and using the phosphoric acid cleaning agent to perform electrochemical polishing on the surface of the electromagnetic structure to be cleaned, wherein the phosphoric acid cleaning agent is prepared from 99.99% phosphoric acid (by weight) and water 1: 1 (weight) is prepared. Using 99.99% phosphoric acid (by weight) and water 1: 1 (weight) and metal ions form a layer of phosphate film on the surface of the electromagnetic structure to be cleaned, the phosphate film is thinner at the convex part of the surface of the electromagnetic structure to be cleaned and thicker at the concave part, and the phosphate film is fast to dissolve due to high current density at the convex part and flows along with the phosphate film, and the concave and convex parts are continuously changed, so that the rough surface of the electromagnetic structure to be cleaned is gradually leveled, and the purpose of electrochemical polishing of the surface of the electromagnetic structure to be cleaned is realized.
Specifically, in the process of performing electrochemical polishing on the surface of the electromagnetic structure to be cleaned, a foamy yellow liquid appears on the surface of the electromagnetic structure to be cleaned, which is a residual liquid on the surface of the electromagnetic structure to be cleaned after the electrochemical polishing, so that the electromagnetic structure to be cleaned after the electrochemical polishing needs to be placed in a clean water flushing machine 5; and cleaning the electromagnetic structure to be cleaned after the electrochemical polishing by the clean water flushing machine 5, so as to clean residual liquid on the surface of the electromagnetic structure to be cleaned.
As shown in fig. 5, for the embodiment of the present invention provides a structural schematic diagram of a third clothes closet of an electromagnetic structure surface treatment device based on a radio frequency breakdown threshold, a mechanical pump 6 and a vacuum baking box 7 are provided in the third clothes closet, the mechanical pump 6 and the vacuum baking box 7 are connected therebetween, the mechanical pump 6 is used for vacuumizing the vacuum baking box 7, and the operation is as follows: taking the electromagnetic structure to be cleaned out of the clean water flushing machine 5, wiping the electromagnetic structure to be cleaned by water absorption cloth, and then putting the electromagnetic structure to be cleaned into a vacuum baking box 7; open vacuum bake out case 7 with connect in the power of vacuum bake out the mechanical pump 6 of case 7, vacuum bake out the case specifically still is used for control the temperature of vacuum bake out case, the temperature is 120 ℃, mechanical pump 6 is used for doing vacuum bake out case 7 carries out the evacuation, thereby it is right treat that clean electromagnetic structure carries out the vacuum baking.
Has the advantages that: compared with the prior art, the utility model provides an electromagnetic structure surface treatment device based on radio frequency breakdown threshold value utilizes ultrasonic cleaner to carry out ultrasonic cleaning with the electromagnetic structure of waiting to clean, can clear away the greasy dirt on the electromagnetic structure surface of waiting to clean effectively to improve the cleanliness on the electromagnetic structure surface of waiting to clean, then adopts phosphoric acid cleaner to carry out electrochemical polishing in electrochemical polishing basin to the surface of waiting to clean the electromagnetic structure, phosphoric acid cleaner can form a layer of phosphate membrane with the metal ion on the electromagnetic structure surface of waiting to clean in the electromagnetic structure surface of waiting to clean, this phosphate membrane is in the protruding department on the electromagnetic structure surface of waiting to clean is thinner, the concavity is thicker, because the protruding department current density is high and dissolve fast, flows along with the phosphate membrane, along with unsmooth change, the rough surface of waiting to clean electromagnetic structure is levelled gradually, the clear water flushing machine is used for after the electrochemical polishing treat that clean electromagnetic structure washs, the mechanical pump is used for doing the case is baked in the vacuum carries out the evacuation, the case is baked in the vacuum is used for right treat that clean electromagnetic structure carries out the vacuum and toasts, thereby can improve effectively treat the smooth finish of clean electromagnetic structure, consequently, the embodiment of the utility model provides an electromagnetic structure surface treatment device based on radio frequency punctures the threshold value can improve the cleanliness and the smooth finish on electromagnetic structure surface effectively to can improve HPM device electromagnetic structure surface radio frequency field and puncture the threshold value, be favorable to prolonging the pulsewidth of HPM device output microwave, thereby can improve the monopulse energy and the average power of HPM device.
The embodiments of the present invention have been described in detail, and the principles and embodiments of the present invention have been explained herein by using specific embodiments, and the above description of the embodiments is only used to help understand the core idea of the present invention; meanwhile, for the general technical personnel in the field, according to the idea of the present invention, there are changes in the specific implementation and application scope, to sum up, the content of the present specification should not be understood as the limitation of the present invention.
Claims (4)
1. The electromagnetic structure surface treatment device based on the radio frequency breakdown threshold value is characterized by comprising a first vertical cabinet, a second vertical cabinet and a third vertical cabinet which are sequentially arranged from bottom to top, wherein the first vertical cabinet is provided with an ultrasonic cleaning machine controller (1) and an ultrasonic cleaning machine (2), the second vertical cabinet is provided with an electrochemical polishing switch power supply (3), an electrochemical polishing water tank (4) and a clear water flushing machine (5), the third vertical cabinet is provided with a mechanical pump (6) and a vacuum baking box (7), the ultrasonic cleaning machine controller (1) is connected with the ultrasonic cleaning machine (2), and the mechanical pump (6) is connected with the vacuum baking box (7);
ultrasonic cleaner controller (1) is used for control ultrasonic cleaner (2) will treat that clean electromagnetic structure carries out ultrasonic cleaning, electrochemistry polishing switching power supply (3) are used for connecting in the electrochemistry polishing equipment power supply of electrochemistry polishing switching power supply (3), electrochemistry polishing equipment is used for adopting the phosphoric acid cleaner is in electrochemistry polishing basin (4) right treat that the surface of clean electromagnetic structure carries out the electrochemistry polishing, clear water flushing machine (5) are used for after the electrochemistry polishing treat that clean electromagnetic structure washs, mechanical pump (6) are used for doing vacuum baking box (7) are taken out the vacuum, vacuum baking box (7) are used for right treat that clean electromagnetic structure carries out the vacuum baking.
2. The electromagnetic structure surface treatment device based on radio frequency breakdown threshold according to claim 1, wherein the ultrasonic cleaning machine (2) is configured to inject clean water, the ultrasonic cleaning machine controller (1) is further configured to control the temperature of the clean water to be 60 ℃, and the ultrasonic cleaning time to be a first preset time period t1，t1Greater than or equal to 1 and lessThen (c) is performed.
3. The electromagnetic structure surface treatment device based on the radio frequency breakdown threshold value as claimed in claim 2, wherein the electrochemical polishing equipment comprises an L-shaped copper bar (8) with a conducting wire, a clamp wire (9) and a three-phase power plug (10);
one end of a clamp of the clamp line (9) is clamped on the electrochemical polishing water tank (4), the other end of the clamp line (9) is connected to an output anode of the electrochemical polishing switching power supply (3), a long handle end of the copper rod (8) is connected with an output cathode of the electrochemical polishing switching power supply (3) through a lead, a short handle end of the copper rod (8) is wrapped by glass fiber cloth to form an electrochemical polishing contact head, and the electrochemical polishing contact head is used for uniformly smearing phosphoric acid cleaning agent on the surface of the electromagnetic structure to be cleaned so as to facilitate the electrochemical polishing of the surface of the electromagnetic structure to be cleaned by using the phosphoric acid cleaning agent;
the input end of the electrochemical polishing switching power supply (3) is connected with the three-phase power plug (10), and the three-phase power plug (10) is used for supplying power to the electrochemical polishing switching power supply (3).
4. The device for electromagnetic structure surface treatment based on a radio frequency breakdown threshold according to claim 3, characterized in that the vacuum baking chamber (7) is further configured to control the temperature of the vacuum baking chamber (7), wherein the temperature is 120 ℃.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202020006297.3U CN211771649U (en) | 2020-01-03 | 2020-01-03 | Electromagnetic structure surface treatment device based on radio frequency breakdown threshold |
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| CN202020006297.3U CN211771649U (en) | 2020-01-03 | 2020-01-03 | Electromagnetic structure surface treatment device based on radio frequency breakdown threshold |
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| CN211771649U true CN211771649U (en) | 2020-10-27 |
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