CN211716246U - Ozone gas supply system - Google Patents

Ozone gas supply system Download PDF

Info

Publication number
CN211716246U
CN211716246U CN201922309442.5U CN201922309442U CN211716246U CN 211716246 U CN211716246 U CN 211716246U CN 201922309442 U CN201922309442 U CN 201922309442U CN 211716246 U CN211716246 U CN 211716246U
Authority
CN
China
Prior art keywords
valve
ozone
storage bottle
pipeline
supply system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201922309442.5U
Other languages
Chinese (zh)
Inventor
陶俊
石烨炜
薛帅
陈磊
孔祥才
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuxi kunsheng Intelligent Equipment Co., Ltd
Original Assignee
Wuxi Kunsheng Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuxi Kunsheng Technology Co ltd filed Critical Wuxi Kunsheng Technology Co ltd
Priority to CN201922309442.5U priority Critical patent/CN211716246U/en
Application granted granted Critical
Publication of CN211716246U publication Critical patent/CN211716246U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Formation Of Insulating Films (AREA)

Abstract

The utility model discloses an ozone gas supply system relates to the preparation of silicon oxide film, including ozone generator, tail gas processing system, storage bottle, reaction chamber, oxygen lets in ozone generator under the control of V1 valve through the main line, and ozone that ozone generator produced lets in the storage bottle of ultrapure water through V2 valve, the storage bottle is equipped with the liquid level inductor outward, and V3 valve one end pipeline switch-on storage bottle, other end pipeline switch-on main line, V5 valve set up the V2 valve, on the main line between the V3 valve, ozone and high pure water mix the back together and let in the reaction chamber, tail gas processing system passes through V6 valve and main line switch-on, in order to carry out high-pressure protection to the main line. The utility model discloses process time is short, the film quality is high, effectively promote the unit productivity, promotes battery efficiency. The ozone gas pipeline is directly combined with water vapor on the same pipeline, and the portable supply can be carried out, and the gas source can be independently supplied to be conveniently controlled.

Description

Ozone gas supply system
Technical Field
The utility model relates to a preparation technical field of silicon oxide film especially relates to an ozone gas supply system.
Background
The preparation process of the crystalline silicon solar cell comprises a step of oxidation process, and aims to prepare a layer of silicon oxide film on the surface of crystalline silicon, so that the surface of the crystalline silicon is passivated, and the composition of photo-generated electrons is reduced to improve the efficiency. The existing treatment modes mainly comprise two types, one is a wet oxidation method, namely, a silicon wafer and high-temperature pure HNO3 are subjected to oxidation reaction to prepare the silicon wafer, and the other is a dry oxidation method, namely, a thermal oxidation mode, wherein the silicon wafer is placed in a high-temperature oxygen atmosphere of more than 800 ℃ to react to generate silicon oxide. However, both of the two methods have certain disadvantages, and on one hand, the nitric acid wet oxidation method is poor in environmental protection and related to ammonia nitrogen discharge, and in addition, a grown film is loose and is easy to introduce into the surfaces of other composite centers, so that the passivation effect is poor. The main disadvantage of the dry oxidation method is that the growth rate of silicon oxide is too slow, and the productivity is too low to be suitable for industrial mass production.
The method mainly has the following defects that (1) the existing wet nitric acid oxidation method is not environment-friendly, the prepared silicon oxide is not compact, and the battery efficiency is low. (2) Dry thermal oxidation, too long process time and high cost of mass production.
(3) Ozone and water vapor are independently introduced into a conventional ventilation system, and the system is complex and difficult to control.
The utility model provides a new oxidation scheme suitable for crystalline silicon battery volume production, ozone (O3)/Water vapor Water mix the oxidation scheme promptly, the experiment is verified and is compared in the dry oxidation rate silicon chip more than 800 degrees and can promote by a wide margin under ozone Water vapor and the middle and low temperature high temperature environment about 450 degrees, simultaneously silicon oxide possess fine compactness and silicon surface lattice matching coefficient better consequently can guarantee good passivation effect. The utility model discloses an ozone gas source supply system, the high concentration ozone gas that ozone generator produced carry water vapor to let in the reaction chamber (quartz tube furnace) together through special gas pipeline under the effect of a plurality of valves and sensor.
SUMMERY OF THE UTILITY MODEL
The utility model aims at solving the defects in the prior art and providing an ozone gas supply system.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
an ozone gas source supply system comprises an ozone generator, a tail gas treatment system, a storage bottle and a reaction chamber, wherein oxygen is introduced into the ozone generator through a main pipeline under the control of a V1 valve, ozone generated by the ozone generator is introduced into the storage bottle of ultrapure water through a V2 valve, a liquid level sensor is arranged outside the storage bottle, a pipeline at one end of a V3 valve is communicated with the storage bottle, a pipeline at the other end of the V3 valve is communicated with the main pipeline, the V5 valve is arranged on the main pipeline between the V2 valve and the V3 valve, the ozone and the ultrapure water are mixed and then are introduced into the reaction chamber, and the tail gas treatment system is communicated with the main pipeline through a V6 valve, so that high-.
According to a further technical scheme, the storage bottle is further communicated with a water tank, and the V4 valve is arranged between the water tank and the pipeline of the storage bottle.
According to a further technical scheme, the storage bottle is made of quartz.
According to a further technical scheme, sealing rings are arranged at the joints of the V1 valve, the V2 valve, the V3 valve, the V4 valve, the V5 valve and the V6 valve and the pipeline, and the sealing rings are made of perfluoro rubber.
According to a further technical scheme, the main pipeline and the pipeline are made of stainless steel materials with the pipe diameter of 1/4.
In a further technical scheme, the model of the liquid level sensor adopts VP 02E.
Compared with the prior art, the beneficial effects of the utility model are that:
the utility model discloses process time is short, and the film quality is high, effectively promotes the unit productivity, promotes battery efficiency, and ozone gas circular source pipeline is direct to combine on a pipeline with steam, and the portability supply also can supply the air supply alone, and system structure is simple, and control is convenient.
Drawings
Fig. 1 is a flow chart of an ozone gas supply system according to the present invention.
In the figure: 1 a source of oxygen; a 2V1 valve; 3, an ozone generator; a 4V2 valve; 5, a tail gas treatment system; a 6V5 valve; a 7V3 valve; 8, storing the bottles; a 9V4 valve; 10 water tanks; 11 reaction chamber.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.
Referring to fig. 1, an ozone gas source supply system comprises an ozone generator 3, a tail gas treatment system 5, a storage bottle 8 and a reaction chamber 11, wherein oxygen provided by an oxygen source 1 is introduced into the ozone generator 3 through a main pipeline under the control of a V1 valve 2, ozone generated by the ozone generator 3 is introduced into the storage bottle 8 of ultrapure water through a V2 valve 4, a liquid level sensor (not labeled in the figure) is arranged outside the storage bottle 8, a pipeline at one end of a V3 valve 7 is communicated with the storage bottle 8, a pipeline at the other end is communicated with the main pipeline, the V5 valve 6 is arranged on a pipeline between the V2 valve 4 and a V3 valve 7, ozone and high-purity water are mixed and then are introduced into the reaction chamber 11 (quartz tube furnace), the tail gas treatment system 5 is communicated with the main pipeline through a V6 valve, the storage bottle 8 is also communicated with a 10, the V4 valve 9 is arranged between a water tank 10 and the pipeline of the storage bottle 8, the storage bottle, the joints between the V1 valve 2, the V2 valve 4, the V3 valve 7, the V4 valve 9, the V5 valve 6 and the V6 valve and the pipeline are provided with sealing rings made of perfluororubber, and the valves are preferably selected from fujikin and shiviaklok swagelok pneumatic valves.
The main pipeline and the pipeline are made of stainless steel material with the pipe diameter of 1/4, and the model of the liquid level sensor is VP 02E.
The specific working principle is as follows: oxygen is introduced into the ozone generator 3 through a main pipeline under the control of the V1 valve 2, the oxygen is electrolyzed into ozone gas under the action of a high-frequency power supply, and meanwhile, 1 Ethernet interface is reserved in the ozone generator 3 for communicating with the ozone generator and setting and monitoring the oxygen flow. The ozone generated by the ozone generator 3 is introduced into a storage bottle 8 of ultrapure water, the material of a bottle body of the ultrapure water storage bottle 8 is preferably quartz, a heating temperature control system is arranged around the storage bottle to ensure that the temperature in the bottle is always kept at a constant temperature, a liquid level sensor is arranged outside the storage bottle 8 and used for detecting the amount of the ultrapure water in the bottle, water is added into the bottle in time under the condition that the liquid level in the bottle is low, and the ozone and the ultrapure water are mixed and then are introduced into a reaction chamber 11 (a quartz tube furnace).
Secondly, the ozone generated by the ozone generator 3 can be independently introduced into the reaction chamber 11 (quartz tube furnace) by closing the V2 valve 4, the V3 valve 7 and the V4 valve 9 according to the process requirements. The pipeline can adopt a plurality of pressure sensor to carry out real-time supervision to pipeline pressure to carry out corresponding control to whole logical source process, when intraductal pressure reaches a definite value, open and carry out ozonolysis through tail gas processing system 5 and handle in order to carry out high-pressure protection V6 valve to the pipeline, the utility model discloses process time is short, and the film quality is high, effectively promotes the unit productivity, promotes battery efficiency, and ozone gas leads to the source pipeline and directly combines on a pipeline with steam, and the portability supply also can supply the air supply alone, and system structure is simple, and control is convenient.
The above, only be the concrete implementation of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the utility model, the concept of which is equivalent to replace or change, should be covered within the protection scope of the present invention.

Claims (6)

1. An ozone gas source supply system comprises an ozone generator, a tail gas treatment system, a storage bottle and a reaction chamber, and is characterized in that oxygen is introduced into the ozone generator through a main pipeline under the control of a V1 valve, ozone generated by the ozone generator is introduced into the storage bottle of ultrapure water through a V2 valve, a liquid level sensor is arranged outside the storage bottle, a pipeline at one end of a V3 valve is communicated with the storage bottle, a pipeline at the other end of the V3 valve is communicated with the main pipeline, a V5 valve is arranged on the main pipeline between the V2 valve and the V3 valve, the ozone and the ultrapure water are mixed and then are introduced into the reaction chamber, the tail gas treatment system is communicated with the main pipeline through a V6 valve, and high-pressure protection is.
2. The ozone gas supply system according to claim 1, wherein the storage bottle is further communicated with a water tank, and the V4 valve is arranged between the water tank and the storage bottle pipeline.
3. The ozone gas supply system according to claim 1, wherein the storage bottle is made of quartz.
4. The ozone gas supply system as claimed in claim 1 or 2, wherein the joints between the V1 valve, the V2 valve, the V3 valve, the V4 valve, the V5 valve and the V6 valve and the pipeline are provided with sealing rings, and the sealing rings are made of perfluororubber.
5. The ozone gas supply system as claimed in claim 1, wherein the main pipeline and the pipeline are made of stainless steel material with a diameter of 1/4 mm.
6. The ozone gas supply system according to claim 1, wherein the level sensor is of the type VP 02E.
CN201922309442.5U 2019-12-20 2019-12-20 Ozone gas supply system Active CN211716246U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201922309442.5U CN211716246U (en) 2019-12-20 2019-12-20 Ozone gas supply system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201922309442.5U CN211716246U (en) 2019-12-20 2019-12-20 Ozone gas supply system

Publications (1)

Publication Number Publication Date
CN211716246U true CN211716246U (en) 2020-10-20

Family

ID=72819219

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201922309442.5U Active CN211716246U (en) 2019-12-20 2019-12-20 Ozone gas supply system

Country Status (1)

Country Link
CN (1) CN211716246U (en)

Similar Documents

Publication Publication Date Title
US10584422B1 (en) Synthetic ammonia system for making hydrogen by electrolysis in thermal power plant
CN205599180U (en) Novel natural gas desulfurization complexing iron catalyst coupling regeneration coproduction electric energy device
CN211716246U (en) Ozone gas supply system
CN105819399A (en) Hydrogen production reaction with controllable hydrogen production speed
CN208757276U (en) A kind of device of scale reducing nitrogen oxides during preparation of silver nitrate discharge
CN103145106A (en) Preparation method of nitrided iron nano-powder and high-pressure gas-solid reaction bed thereof
CN218945014U (en) Preparation facilities of nanometer iron phosphate
CN105214476A (en) The microorganism electrochemical reactor that fixing carbon dioxide in waste gas generation organic matter product is disposed of sewage simultaneously and method
CN208177427U (en) A kind of gas hydrate reinforcing generating means
CN208327502U (en) Comprehensive water treatment device
CN105709594B (en) CO in a kind of power-plant flue gas2The method of recycling
CN208586061U (en) Ultrapure helium purification equipment
CN215404571U (en) System for utilize flue gas electrochemistry of thermal power plant to make ammonia
CN210560797U (en) Waste water hydrogen production device
CN201538708U (en) Purified water ozone disinfection system
CN201942747U (en) Sprinkler of organic chemical vapor deposition reactor of metal
CN205011382U (en) Ammonia decomposition hydrogen producer
CN209484283U (en) A kind of liquefied gas purification devices
CN102630510A (en) Carbon dioxide generating system heated by solar energy and carbon dioxide generating method
CN205973943U (en) High concentration ozone preparation facilities
CN216141633U (en) Proton exchange membrane electrolytic device for multiple products
CN213013085U (en) Novel liquid source gasification system applied to MOCVD
CN201694833U (en) Portable chlorine dioxide reacting apparatus
CN106854004B (en) Device and method for evaporative crystallization of white carbon black production wastewater
CN105170058A (en) Microwave plasma reaction device for quick material preparation

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: No.106 Xixian Road, Xinwu District, Wuxi City, Jiangsu Province

Patentee after: Wuxi kunsheng Intelligent Equipment Co., Ltd

Address before: No.106 Xixian Road, Xinwu District, Wuxi City, Jiangsu Province

Patentee before: WUXI KUNSHENG TECHNOLOGY Co.,Ltd.