CN211698641U - Device for monitoring and compensating concentration of main salt in working solution for surface treatment process - Google Patents
Device for monitoring and compensating concentration of main salt in working solution for surface treatment process Download PDFInfo
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- CN211698641U CN211698641U CN201821734166.6U CN201821734166U CN211698641U CN 211698641 U CN211698641 U CN 211698641U CN 201821734166 U CN201821734166 U CN 201821734166U CN 211698641 U CN211698641 U CN 211698641U
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- main salt
- surface treatment
- working solution
- monitoring
- compensation
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- 239000012224 working solution Substances 0.000 title claims abstract description 27
- 238000004381 surface treatment Methods 0.000 title claims abstract description 26
- 238000012544 monitoring process Methods 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 21
- 150000003839 salts Chemical class 0.000 title claims abstract description 19
- 230000008569 process Effects 0.000 title claims abstract description 18
- 239000003814 drug Substances 0.000 claims abstract description 26
- 230000007246 mechanism Effects 0.000 claims abstract description 8
- 230000005611 electricity Effects 0.000 claims abstract 2
- -1 salt ion Chemical class 0.000 claims description 17
- 238000005259 measurement Methods 0.000 claims description 7
- 230000002572 peristaltic effect Effects 0.000 claims description 6
- 230000004044 response Effects 0.000 claims description 6
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 5
- 229910001431 copper ion Inorganic materials 0.000 claims description 5
- 238000001914 filtration Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000007747 plating Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
The utility model discloses a working solution main salt concentration monitoring and compensation arrangement for surface treatment process, including monitoring mechanism and medicament compensating pump, monitoring mechanism is including setting up one or more main salt ion concentration sensor in the surface treatment workspace working solution and the embedded treater of being connected with main salt ion concentration sensor electricity, and embedded treater and medicament compensating pump are connected. The utility model discloses main salt ion to working solution when surface treatment measures through one or more sensors, carries out the level and smooth through gaussian filtering or mean value filtering to observed value, fuses through kalman filtering and further revises and falls the noise to obtain comparatively accurate current concentration. The relevant actuator is driven to release the medicament for compensation. Meanwhile, the sensor monitors the compensation effect in real time, and adjusts the compensation amount, thereby finally achieving the purpose of closed-loop control and adjustment.
Description
Technical Field
The utility model belongs to working solution main salt concentration monitoring and compensation arrangement, concretely relates to working solution main salt concentration monitoring and compensation arrangement for surface treatment process.
Background
The main salt concentration of the working solution used for the surface treatment process is an important influencing parameter of the surface treatment process, generally, the main salt concentration needs to be monitored at any time in the surface treatment process, and the salt concentration of the working solution used for the surface treatment process is supplemented according to the monitoring result.
Similar patents exist in the prior art, such as patent CN 206741327U which discloses a device for measuring discharge of automatic dosing through a water outlet; CN 106145208A discloses a method and apparatus for direct addition without detecting the concentration of a target substance. In the patent CN 206741327U, a medicine concentration monitor is arranged on the medicine feeding pipe, and the medicine concentration in the medicine feeding pipe and the working solution in the surface treatment working area is different, so that the measurement result of the medicine concentration monitor has deviation, in the patent CN 106145208A, a medicine concentration detection device is not arranged, the concentration of the medicine liquid can not be well controlled by adding the medicine concentration monitor according to experience, and the medicine concentration in the working solution in the working area in the two patents can not be effectively detected.
In the above patent, the medicament to be added or compensated is not or only simply measured, and under the condition of not considering the actual working condition, due to the error caused by uneven mixing of the substances, the response drift of the sensor and the like, the medicament is often excessively added or insufficiently added in the actual application.
SUMMERY OF THE UTILITY MODEL
The utility model provides a overcome the shortcoming that exists among the prior art and propose, its purpose provides a working solution owner's salt concentration monitoring and compensation arrangement for surface treatment process.
The technical scheme of the utility model is that:
the working solution main salt concentration monitoring and compensating device for the surface treatment process comprises a monitoring mechanism and a medicament compensation pump, wherein the monitoring mechanism comprises one or more main salt ion concentration sensors arranged in the working solution of a surface treatment working area and main salt ions
The embedded processor is electrically connected with the concentration sensor and is connected with the medicament compensation pump.
The main salt ion concentration sensor is a copper ion concentration monitor.
The measurement range of the main salt ion concentration sensor is 0.006-6400ppm, and the response precision is +/-1% FS.
The embedded processor is an embedded single-chip microcomputer system, a programmable logic controller or a programmable gate array controller.
The medicament compensation pump is any one of a peristaltic pump, a quantitative pump or a metering pump.
The utility model has the advantages that:
the utility model provides a working solution owner salt concentration monitoring and compensation arrangement for surface treatment technology, to the main salt ion of working solution when surface treatment, measure through one or more sensor, carry out the level and smooth to the observed value through gaussian filter or mean value filtering, fuse and further correction through kalman filter and fall and make an uproar to obtain comparatively accurate current concentration. The relevant actuator is driven to release the medicament for compensation. Meanwhile, the sensors monitor the compensation effect in real time, adjust the compensation amount, finally achieve the purpose of closed-loop control and adjustment, and realize that the device automatically detects the concentration of main salt ions observed by the working solution through one or more sensors without depending on manual auxiliary operation, and drives related actuators, such as a peristaltic pump, a plunger pump, a metering pump and the like, so as to correct and compensate the ion deviation.
Drawings
Fig. 1 is a schematic structural diagram of the working solution main salt concentration monitoring and compensating device for the surface treatment process of the present invention.
Wherein:
1 main salt ion concentration sensor 2 embedded controller 3 medicament compensation pump.
Detailed Description
The working liquid main salt concentration monitoring device for the surface treatment process of the invention is combined with the attached drawings and the embodiment of the specification
The measuring and compensating device and method are explained in detail:
as shown in fig. 1, the working solution main salt concentration monitoring and compensating device for the surface treatment process comprises a monitoring mechanism and a medicament compensation pump 3, wherein the monitoring mechanism comprises one or more main salt ion concentration sensors 1 arranged in the working solution of a surface treatment working area and an embedded processor 2 electrically connected with the main salt ion concentration sensors 1, and the embedded processor 2 is connected with the medicament compensation pump 3.
The main salt ion concentration sensor 1 is a Shanghai Saint Banter931-Cu copper ion concentration monitor.
The measurement range of the main salt ion concentration sensor 1 is 0.006-6400ppm, and the response precision is +/-
1％FS。
The embedded processor 2 is an embedded single chip microcomputer system, a programmable logic controller or a programmable gate array controller.
The medicament compensation pump 3 is any one of a peristaltic pump, a quantitative pump or a metering pump.
The main salt ion concentration sensor 1 is a commercially available product, for example, Shanghai brand Banter931-Cu copper ion concentration monitor, and can monitor metal copper ions in the working solution, the measurement range is 0.006-6400ppm, and the response accuracy is + -1% FS.
The embedded controller 2 may be, but is not limited to, an embedded single chip microcomputer system, such as STM32F103C8T6, avratega 328, or a programmable logic controller, such as Siemens S7-200, S7-300, or a programmable gate array controller, such as FPGA or CPLD, etc. The operating speed of the controller has an effect on the measurement rate of the final result, thereby affecting the integration operation. Too low an operation speed will result in a loss of the number of effective calculation bits to lower the control accuracy and response time.
The drug compensation pump 3 may be, but is not limited to, a peristaltic pump, a quantitative pump, a metering pump, or other quantitative liquid supply system. The metering precision of the quantitative metering pump has certain influence on the final compensation result.
The utility model discloses the theory of operation of device:
the embedded controller 2 continuously and sequentially reads the measured values of the plurality of main salt ion concentration sensors 1, calculates to obtain the mean value and the variance within the moment, stores the mean value and the variance in an internal memory, updates iteration in real time, filters (such as the mean value) the observed result to obtain a primary observed result, constructs a correction function with information fusion compensation, completes the final noise reduction and compensation, obtains an output result, transmits the output result to a pump system, performs compensation action in real time, and continuously repeats the closed loop process of measurement-filtering-output-compensation-measurement
The utility model discloses be applied to the chemical nickel plating in-process, the nickel ion concentration in the device monitoring plating bath through the automatic nickel sulfate that adds of peristaltic pump, realizes the stability to chemical nickel plating operational environment to improve product quality, guarantee to execute the surface coating uniformity after plating.
Claims (5)
1. A device that is used for working solution owner's salt concentration monitoring and compensation of surface treatment technology which characterized in that: including monitoring mechanism and medicament compensating pump (3), monitoring mechanism is including setting up a plurality of main salt ion concentration sensor (1) in the surface treatment workspace working solution and embedded treater (2) of being connected with main salt ion concentration sensor (1) electricity, and embedded treater (2) are connected with medicament compensating pump (3).
2. The device for monitoring and compensating the main salt concentration of the working solution for the surface treatment process according to claim 1, wherein: the main salt ion concentration sensor (1) is a copper ion concentration monitor.
3. The device for monitoring and compensating the main salt concentration of the working solution for the surface treatment process according to claim 1, wherein: the measurement range of the main salt ion concentration sensor (1) is 0.006-6400ppm, and the response precision is +/-1% FS.
4. The device for monitoring and compensating the main salt concentration of the working solution for the surface treatment process according to claim 1, wherein: the embedded processor (2) is an embedded single-chip microcomputer system, a programmable logic controller or a programmable gate array controller.
5. The device for monitoring and compensating the main salt concentration of the working solution for the surface treatment process according to claim 1, wherein: the medicament compensation pump (3) is any one of a peristaltic pump, a quantitative pump or a metering pump.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821734166.6U CN211698641U (en) | 2018-10-25 | 2018-10-25 | Device for monitoring and compensating concentration of main salt in working solution for surface treatment process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821734166.6U CN211698641U (en) | 2018-10-25 | 2018-10-25 | Device for monitoring and compensating concentration of main salt in working solution for surface treatment process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211698641U true CN211698641U (en) | 2020-10-16 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821734166.6U Active CN211698641U (en) | 2018-10-25 | 2018-10-25 | Device for monitoring and compensating concentration of main salt in working solution for surface treatment process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211698641U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109240171A (en) * | 2018-10-25 | 2019-01-18 | 中核新科（天津） 精密机械制造有限公司 | The monitoring of working solution main salt concentration and compensation device and method for process of surface treatment |
-
2018
- 2018-10-25 CN CN201821734166.6U patent/CN211698641U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109240171A (en) * | 2018-10-25 | 2019-01-18 | 中核新科（天津） 精密机械制造有限公司 | The monitoring of working solution main salt concentration and compensation device and method for process of surface treatment |
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Legal Events
| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 300350 room 107-22, building 3, No. 3, Hong Kong Street, Jinnan Economic Development Zone (West District), Jinnan District, Tianjin Patentee after: CNNC Xinke (Tianjin) Technology Co.,Ltd. Address before: 300350 room 107-22, building 3, No. 3, Hong Kong Street, Jinnan Economic Development Zone (West District), Jinnan District, Tianjin Patentee before: CNNC XINKE (TIANJIN) PRECISION MACHINERY MANUFACTURING Co.,Ltd. |
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| CP01 | Change in the name or title of a patent holder | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20220725 Address after: 300180, No. 168 Jintang Road, Hedong District, Tianjin Patentee after: CHINA NUCLEAR (TIANJIN) TECHNOLOGY DEVELOPMENT Co.,Ltd. Address before: 300350 room 107-22, building 3, No. 3, Hong Kong Street, Jinnan Economic Development Zone (West District), Jinnan District, Tianjin Patentee before: CNNC Xinke (Tianjin) Technology Co.,Ltd. |
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| TR01 | Transfer of patent right |