CN109240171A - The monitoring of working solution main salt concentration and compensation device and method for process of surface treatment - Google Patents
The monitoring of working solution main salt concentration and compensation device and method for process of surface treatment Download PDFInfo
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- CN109240171A CN109240171A CN201811248390.9A CN201811248390A CN109240171A CN 109240171 A CN109240171 A CN 109240171A CN 201811248390 A CN201811248390 A CN 201811248390A CN 109240171 A CN109240171 A CN 109240171A
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- 238000000034 method Methods 0.000 title claims abstract description 82
- 239000012224 working solution Substances 0.000 title claims abstract description 38
- 230000008569 process Effects 0.000 title claims abstract description 37
- 238000012544 monitoring process Methods 0.000 title claims abstract description 33
- 238000004381 surface treatment Methods 0.000 title claims abstract description 27
- 150000003839 salts Chemical class 0.000 title claims abstract description 26
- 238000001914 filtration Methods 0.000 claims abstract description 21
- 239000003814 drug Substances 0.000 claims abstract description 20
- 230000007246 mechanism Effects 0.000 claims abstract description 8
- 230000004927 fusion Effects 0.000 claims abstract description 7
- 230000009467 reduction Effects 0.000 claims abstract description 7
- -1 salt ion Chemical class 0.000 claims description 30
- 230000009466 transformation Effects 0.000 claims description 20
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 11
- 229910001431 copper ion Inorganic materials 0.000 claims description 11
- 150000002500 ions Chemical class 0.000 claims description 10
- 238000005259 measurement Methods 0.000 claims description 10
- 230000003044 adaptive effect Effects 0.000 claims description 8
- 239000011159 matrix material Substances 0.000 claims description 7
- 230000004044 response Effects 0.000 claims description 6
- 238000012937 correction Methods 0.000 claims description 5
- 230000006870 function Effects 0.000 claims description 5
- 230000002572 peristaltic effect Effects 0.000 claims description 5
- 230000001133 acceleration Effects 0.000 claims description 4
- 238000004458 analytical method Methods 0.000 claims description 4
- 238000006073 displacement reaction Methods 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- 238000011946 reduction process Methods 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000007747 plating Methods 0.000 description 3
- 239000010949 copper Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
- G05B19/0423—Input/output
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/24—Pc safety
- G05B2219/24215—Scada supervisory control and data acquisition
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
The invention discloses a kind of working solution main salt concentration monitoring for process of surface treatment and compensation devices and method, including mechanism for monitoring and medicament compensation pump, mechanism for monitoring includes the one or more main salt ion concentration sensors being set in facing operation area working solution and the embeded processor being electrically connected with main salt ion concentration sensor, and embeded processor and medicament compensation pump connect.The main salt ion of working solution when the present invention is for surface treatment, it is measured by one or more sensors, observation is carried out smoothly by gaussian filtering or mean filter, fusion and further amendment noise reduction are carried out by Kalman filtering, to obtain accurate existing concentration.Relevant executing agency is driven, release medicament compensates.Meanwhile sensor monitors compensation effect in real time, and adjusts compensation rate, is finally reached the purpose of closed-loop control adjusting.
Description
Technical field
The invention belongs to the monitoring of working solution main salt concentration and compensation devices and method, and in particular to one kind is for being surface-treated
The working solution main salt concentration monitoring of technique and compensation device and method.
Background technique
Working solution main salt concentration for process of surface treatment is the great influence parameter of process of surface treatment, generally in table
Need to monitor at any time during surface treatment, and according to monitoring result for the working solution for process of surface treatment salinity into
Row supplement.
Similar patent exists in the prior art, it is as a kind of by water outlet survey in disclosed in 206741327 U of patent CN
The device of amount discharge Automatic Dosing；A kind of concentration for not detecting institute's target substance is disclosed in 106145208 A of CN directly to add
Method and apparatus.
In above-mentioned patent, for medicament to be added or to be compensated without or only simply measure, do not consider reality
Under operating condition, due to brings errors such as material mixing is uneven, sensor response drifts, often occur in practical application excessive
The situation of addition or deficiency.
Summary of the invention
The present invention is proposed to overcome disadvantage existing in the prior art, a kind of for surface the purpose is to provide
The working solution main salt concentration monitoring for the treatment of process and compensation device and method.
The technical scheme is that
A kind of monitoring of working solution main salt concentration and compensation device for process of surface treatment, including mechanism for monitoring and medicament compensation
Pump, mechanism for monitoring include the one or more main salt ion concentration sensors being set in facing operation area working solution and with
The embeded processor of main salt ion concentration sensor electrical connection, embeded processor and medicament compensation pump connection.
The main salt ion concentration sensor is copper ion concentration monitor.
The main salt ion concentration sensor measurement range is 0.006-6400ppm, and response accuracy is ± 1%FS.
The embeded processor is embedded single-chip computer system, programmable logic controller (PLC) or programmable gate array control
Device.
The medicament compensation pump is any one in peristaltic pump, constant displacement pump or metering pump.
A kind of monitoring of working solution main salt concentration and compensation method for process of surface treatment, comprising the following steps:
(I) device is arranged
Multiple main salt ion concentration sensors are respectively arranged at working solution different location, by main salt ion concentration sensor and medicine
Agent compensation pump is connect with embeded processor respectively；
(II) DATA REASONING
It is measured by main salt ion concentration of multiple main salt ion concentration sensors to different location；Observation window band is set
Width is N, and the sequence of measured value is YN；
(III) compensation process
According to offset, 1/10 multiplying power is taken, carries out compensation of walking unhurriedly, compensation process utilizes kalman filter method, thus it is speculated that after compensation
Concentration.
The noise reduction process method is small echo Kalman filtering mode, low-pass filtering, the filtering of adaptive Montella sieve, particle
Filtering or Gaussian mean in any one.
Observation window and measured value in the step (II) method particularly includes:
(I) carries out wavelet transformation A(Y in each bandwidth window, to the acceleration analysis sequence of acquisitionN)；
(II) carries out low-pass filtering in wavelet field, it is assumed that operator is set as B, and obtaining new sequence is B(A(YN))；
(III) carries out wavelet transformation inverse transformation to the sequence after thick noise reduction；
It is set as XN1=A-1 B(A(YN))
The statistical nature that (VI) obtains noise is V1N=YN – X N；
(V) utilizes operator C, inhibits normal signal, to YNSequence adds man made noise, obtains noise sequence C(A(YN))；
(VI) carries out wavelet transformation inverse transformation to noise sequence,
It is set as VN2=A-1 C(A(YN))
(VII) carries out obtaining single order, second order estimated value away from estimation；In this, as initial estimation, YNEstimated value, recycle this mistake
Journey obtains YN+1Estimation, thus iteration；
(VIII) merges correction course
Fusion Model are as follows: Δ F=a2Tn+a1T1+a0
Wherein: a0, a1, a2It is fitting coefficient；T1For the measured value of First ion concentration measurement instrument；TnIt is dense for n-th ion
Spend the measured value of measuring instrument；Δ F is the copper ion concentration for needing to compensate；
By least square method fitting function, offset is formed.
In the step (VII) is law of great number method away from estimation, and the law of great number method is Chebyshev's estimation.
Compensated concentration estimation method in the step (III) specifically:
(I) utilizes the state estimator of the Kalman filter equation solving system of standard；
The noise mean value of (II) computing system, system noise variance matrix, observation noise mean value, observation noise variance matrix；
(III) alternately calculates, and constructs adaptive Kalman filter.Complete the predictive estimation of concentration offsets.
The beneficial effects of the present invention are:
The monitoring of working solution main salt concentration and compensation device and method that the present invention provides a kind of for process of surface treatment, for
The main salt ion of working solution, is measured by one or more sensors when surface treatment, is filtered by gaussian filtering or mean value
Wave carries out smoothly observation, fusion and further amendment noise reduction is carried out by Kalman filtering, so that acquisition is more accurate
Existing concentration.Relevant executing agency is driven, release medicament compensates.Meanwhile sensor monitors compensation effect in real time,
And compensation rate is adjusted, it is finally reached the purpose of closed-loop control adjusting.Realization does not depend under artificial auxiliary operation, and device leads to automatically
It crosses one or more sensors and detects the main salt ion concentration of working solution observation automatically, and drive relevant actuator, such as wriggle
Pump, plunger pump, metering pump etc. are corrected and are compensated to ion deviation.
Detailed description of the invention
Fig. 1 is the monitoring of working solution main salt concentration and the structural representation of compensation device in the present invention for process of surface treatment
Figure.
Wherein:
1 main salt ion concentration sensor, 2 embedded controller
3 medicaments compensation pump.
Specific embodiment
With reference to the accompanying drawings of the specification and embodiment supervises the present invention for the working solution main salt concentration of process of surface treatment
Survey and compensation device and method are described in detail:
As shown in Figure 1, a kind of monitoring of working solution main salt concentration and compensation device for process of surface treatment, including mechanism for monitoring
With medicament compensation pump 3, mechanism for monitoring includes that one or more main salt ions for being set in facing operation area working solution are dense
Degree sensor 1 and the embeded processor 2 being electrically connected with main salt ion concentration sensor 1, embeded processor 2 and medicament compensate
3 connection of pump.
The main salt ion concentration sensor 1 is spy's Banter931-Cu copper ion concentration monitor as Shanghai.
1 measurement range of main salt ion concentration sensor is 0.006-6400ppm, and response accuracy is ± 1%FS.
The embeded processor 2 is embedded single-chip computer system, programmable logic controller (PLC) or programmable gate array control
Device processed.
The medicament compensation pump 3 is any one in peristaltic pump, constant displacement pump or metering pump.
Main salt ion concentration sensor 1 is commercially available product, such as spy's Banter931-Cu copper ion concentration as Shanghai is supervised
Instrument to be surveyed, the metal copper ion in working solution can be monitored, measurement range is 0.006-6400ppm, response accuracy is ±
1%FS。
It is embedded single-chip computer system that embedded controller 2, which can be but not limit, such as STM32F103C8T6, AVR
Atmega328 or programmable logic controller (PLC), such as Siemens S7-200, S7-300 or programmable gate array controller, such as
FPGA or CPLD etc..The arithmetic speed of controller has an impact the measurement rate of final result, to influence integral operation.It crosses
Low arithmetic speed will lead to loss and effectively calculate digit and reduce control precision and response time.
Medicament compensation pump 3 can make but do not limit be peristaltic pump, constant displacement pump, metering pump etc. can measuring fixed amount pump or other
Quantitative liquid feeding system.The measuring accuracy of measuring fixed amount pump generates certain influence to final compensation result.
The working principle of apparatus of the present invention:
Embedded controller 2 is continuously successively read the measured value of multiple main salt ion concentration sensors 1, obtains by calculating
Mean value and variance in moment are stored in internal memory, and real-time update iteration, and are filtered to the result of observation
(such as mean value) obtains preliminary observed result, reconstructs with by the correction function of information fusion compensation, completes final noise reduction
And compensation, it is exported as a result, output result is transferred to pumping system, and makes compensating movement in real time, constantly repeat
It states, measurement-filtering-output-compensation-measurement closed loop procedure
A kind of monitoring of working solution main salt concentration and compensation method for process of surface treatment, comprising the following steps:
(I) device is arranged
Multiple main salt ion concentration sensors 1 are respectively arranged at working solution different location, by 1 He of main salt ion concentration sensor
Medicament compensation pump 3 is connect with embeded processor 2 respectively；
(II) DATA REASONING
It is measured by main salt ion concentration of multiple main salt ion concentration sensors 1 to different location；Observation window is set
Bandwidth is N, and the sequence of measured value is YN；
(III) compensation process
According to offset, 1/10 multiplying power is taken, carries out compensation of walking unhurriedly, compensation process utilizes kalman filter method, thus it is speculated that after compensation
Concentration.
The noise reduction process method is small echo Kalman filtering mode, low-pass filtering, the filtering of adaptive Montella sieve, particle
Filtering or Gaussian mean in any one.
Observation window and measured value in the step (II) method particularly includes:
(I) carries out wavelet transformation A(Y in each bandwidth window, to the acceleration analysis sequence of acquisitionN)；
(II) carries out low-pass filtering in wavelet field, it is assumed that operator is set as B, and obtaining new sequence is B(A(YN))；
(III) carries out wavelet transformation inverse transformation to the sequence after thick noise reduction；
It is set as XN1=A-1 B(A(YN))
The statistical nature that (VI) obtains noise is V1N=YN – X N；
(V) utilizes operator C, inhibits normal signal, to YNSequence adds man made noise, obtains noise sequence C(A(YN))；
(VI) carries out wavelet transformation inverse transformation to noise sequence,
It is set as VN2=A-1 C(A(YN))
(VII) carries out obtaining single order, second order estimated value away from estimation；In this, as initial estimation, YNEstimated value, recycle this mistake
Journey obtains YN+1Estimation, thus iteration；
(VIII) merges correction course
Fusion Model are as follows: Δ F=a2Tn+a1T1+a0
Wherein: a0, a1, a2It is fitting coefficient；T1For the measured value of First ion concentration measurement instrument；TnIt is dense for n-th ion
Spend the measured value of measuring instrument；Δ F is the copper ion concentration for needing to compensate；
By least square method fitting function, offset is formed.
In the step (VII) is law of great number method away from estimation, and the law of great number method is Chebyshev's estimation.
Compensated concentration estimation method in the step (III) specifically:
(I) utilizes the state estimator of the Kalman filter equation solving system of standard；
The noise mean value of (II) computing system, system noise variance matrix, observation noise mean value, observation noise variance matrix；
(III) alternately calculates, and constructs adaptive Kalman filter.Complete the predictive estimation of concentration offsets.
Embodiment 1
A kind of monitoring of working solution main salt concentration and compensation method for process of surface treatment, it is characterised in that: including following step
It is rapid:
(I) device is arranged
Multiple main salt ion concentration sensors (1) are respectively arranged at working solution different location, by main salt ion concentration sensor
(1) it is connect respectively with embeded processor (2) with medicament compensation pump (3)；
(II) DATA REASONING
In this example, by four copper ion concentration measuring instruments, the copper ion concentration of different location is measured, uses small echo card
Kalman Filtering mode is merged and is filtered to result, and not limiting here is this processing method, and low-pass filtering also can be used,
Adaptive Montella sieve filtering, other noise reduction process methods such as particle filter or Gaussian mean.
If observation window bandwidth is N, the sequence of measured value is YN, process is as follows:
(I) carries out wavelet transformation A(Y in each bandwidth window, to the acceleration analysis sequence of acquisitionN)；
(II) carries out low-pass filtering in wavelet field, it is assumed that operator is set as B, and obtaining new sequence is B(A(YN))；
(III) carries out wavelet transformation inverse transformation to the sequence after thick noise reduction；
It is set as XN1=A-1 B(A(YN))
The statistical nature that (VI) obtains noise is V1N=YN – X N；
(V) utilizes operator C, inhibits normal signal, to YNSequence adds man made noise, obtains noise sequence C(A(YN))；
(VI) carries out wavelet transformation inverse transformation to noise sequence,
It is set as VN2=A-1 C(A(YN))
(VII) can be other law of great number methods, such as Chebyshev's estimation here away from estimation, obtain single order, second order
Estimated value；In this, as initial estimation, YNEstimated value, recycle this process obtain YN+1Estimation, thus iteration；
(VIII) merges correction course
Fusion Model are as follows: Δ F=a2Tn+a1T1+a0
Wherein: a0, a1, a2It is fitting coefficient；T1For the measured value of First ion concentration measurement instrument；TnIt is dense for n-th ion
Spend the measured value of measuring instrument；Δ F is the copper ion concentration for needing to compensate；
By least square method fitting function, offset is formed.
(III) compensation process
According to offset, 1/10 multiplying power is taken, carries out compensation of walking unhurriedly, compensation process utilizes kalman filter method, thus it is speculated that after compensation
Concentration.Supposition process is as follows:
(I) utilizes the state estimator of the Kalman filter equation solving system of standard.
The noise mean value of (II) computing system, system noise variance matrix, observation noise mean value, observation noise variance square
Battle array.
(III) alternately calculates, and constructs adaptive Kalman filter.Complete the predictive estimation of concentration offsets.
The present invention is applied in nickel process, and the nickel ion concentration in device monitoring plating solution is automatic by peristaltic pump
Nickel sulfate is added, realizes the stabilization to chemical nickel plating working environment, so that product quality is improved, the overlay coating after guaranteeing plating
Consistency.
Claims (10)
1. a kind of monitoring of working solution main salt concentration and compensation device for process of surface treatment, it is characterised in that: including monitoring
Mechanism and medicament compensation pump (3), mechanism for monitoring includes the one or more main salts being set in facing operation area working solution
Ion concentration sensor (1) and the embeded processor (2) being electrically connected with main salt ion concentration sensor (1), embedded processing
Device (2) compensates pump (3) with medicament and connect.
2. a kind of monitoring of working solution main salt concentration and compensation device for process of surface treatment according to claim 1,
It is characterized by: the main salt ion concentration sensor (1) is copper ion concentration monitor.
3. a kind of monitoring of working solution main salt concentration and compensation device for process of surface treatment according to claim 1,
It is characterized by: main salt ion concentration sensor (1) measurement range is 0.006-6400ppm, response accuracy is ± 1%FS.
4. a kind of monitoring of working solution main salt concentration and compensation device for process of surface treatment according to claim 1,
It is characterized by: the embeded processor (2) is embedded single-chip computer system, programmable logic controller (PLC) or programmable gate array
Column controller.
5. a kind of monitoring of working solution main salt concentration and compensation device for process of surface treatment according to claim 1,
It is characterized by: the medicament compensation pump (3) is any one in peristaltic pump, constant displacement pump or metering pump.
6. a kind of monitoring of working solution main salt concentration and compensation method for process of surface treatment, it is characterised in that: including following
Step:
(I) device is arranged
Multiple main salt ion concentration sensors (1) are respectively arranged at working solution different location, by main salt ion concentration sensor
(1) it is connect respectively with embeded processor (2) with medicament compensation pump (3)；
(II) DATA REASONING
The main salt ion concentration of different location is measured by multiple main salt ion concentration sensors (1)；Observation window is set
Port band width is N, and the sequence of measured value is YN；
(III) compensation process
According to offset, 1/10 multiplying power is taken, carries out compensation of walking unhurriedly, compensation process utilizes kalman filter method, thus it is speculated that after compensation
Concentration.
7. a kind of monitoring of working solution main salt concentration and compensation method for process of surface treatment according to claim 6,
It is characterized by: the noise reduction process method is small echo Kalman filtering mode, low-pass filtering, adaptive Montella sieve filter,
Any one in particle filter or Gaussian mean.
8. a kind of monitoring of working solution main salt concentration and compensation method for process of surface treatment according to claim 6,
It is characterized by: observation window and measured value in the step (II) method particularly includes:
(I) carries out wavelet transformation A(Y in each bandwidth window, to the acceleration analysis sequence of acquisitionN)；
(II) carries out low-pass filtering in wavelet field, it is assumed that operator is set as B, and obtaining new sequence is B(A(YN))；
(III) carries out wavelet transformation inverse transformation to the sequence after thick noise reduction；
It is set as XN1=A-1 B(A(YN))
The statistical nature that (VI) obtains noise is V1N=YN – X N；
(V) utilizes operator C, inhibits normal signal, to YNSequence adds man made noise, obtains noise sequence C(A(YN))；
(VI) carries out wavelet transformation inverse transformation to noise sequence,
It is set as VN2=A-1 C(A(YN))
(VII) carries out obtaining single order, second order estimated value away from estimation；In this, as initial estimation, YNEstimated value, recycle this mistake
Journey obtains YN+1Estimation, thus iteration；
(VIII) merges correction course
Fusion Model are as follows: Δ F=a2Tn+a1T1+a0
Wherein: a0, a1, a2It is fitting coefficient；T1For the measured value of First ion concentration measurement instrument；TnIt is dense for n-th ion
Spend the measured value of measuring instrument；Δ F is the copper ion concentration for needing to compensate；
By least square method fitting function, offset is formed.
9. a kind of monitoring of working solution main salt concentration and compensation method for process of surface treatment according to claim 8,
It is characterized by: in the step (VII) being law of great number method away from estimation, the law of great number method is estimated for Chebyshev
Meter.
10. a kind of monitoring of working solution main salt concentration and compensation method for process of surface treatment according to claim 6,
It is characterized by: compensated concentration estimation method in the step (III) specifically:
(I) utilizes the state estimator of the Kalman filter equation solving system of standard；
The noise mean value of (II) computing system, system noise variance matrix, observation noise mean value, observation noise variance matrix；
(III) alternately calculates, and constructs adaptive Kalman filter；Complete the predictive estimation of concentration offsets.
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