CN211577663U - Device for quickly removing photoresist - Google Patents

Abstract

The utility model discloses a get rid of device of photoresist fast, the on-line screen storage device comprises a base, the left side fixedly connected with bracing piece at base top, the right side fixedly connected with diaphragm of bracing piece, the bottom fixedly connected with telescopic cylinder of diaphragm, telescopic cylinder's bottom fixedly connected with lithography machine, the fixedly connected with conveyer of center department at base top. The utility model discloses a driving motor, carousel, dust collector and cleaning device's cooperation, it is rotatory to drive the carousel through driving motor, be convenient for clear away the photoresist on semiconductor wafer surface on the production line, do not influence the photoetching machine normal operating, improve work efficiency, dust collector adsorbs the photoresist on semiconductor wafer surface, avoids secondary pollution, improves clean effect, guarantees the production quality of product to reach the effect that work efficiency is high, solved the problem that current work efficiency is low.

Description

Device for quickly removing photoresist

Technical Field

The utility model relates to a lithography machine technical field specifically is a device of quick removal photoresist.

Background

Photoetching is an important step in a semiconductor manufacturing process, a graph is carved on a photoresist layer by utilizing exposure and development, then the graph on a photomask is transferred onto a semiconductor wafer through an etching process, after the steps are completed, the wafer can be subjected to selective etching or ion implantation and other process processes, the photoresist which is not dissolved can protect the surface of the covered wafer from being changed in the processes, after the process is finished, the photoresist needs to be removed and the surface of the wafer needs to be cleaned, other steps of manufacturing a semiconductor device can be carried out, generally, the whole process of manufacturing the semiconductor device can be carried out for many times, dozens of steps of photoetching can be carried out in the process of producing a complex integrated circuit, the existing photoresist is removed, and useless metal and the photoresist need to be removed, only useful wires are left, the existing mode is to disassemble the semiconductor wafer manually and then remove the photoresist, so that the labor is consumed, the workload is huge, the working efficiency is greatly reduced, and the product yield cannot be guaranteed.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a get rid of device of photoresist fast, possess the advantage that work efficiency is high, solved the problem that current work efficiency is low.

In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a get rid of device of photoresist fast, includes the base, the left side fixedly connected with bracing piece at base top, the right side fixedly connected with diaphragm of bracing piece, the bottom fixedly connected with telescopic cylinder of diaphragm, telescopic cylinder's bottom fixedly connected with lithography machine, the center at base top department fixedly connected with conveyer, one side fixedly connected with driving motor that base top center was located, driving motor's output shaft fixedly connected with carousel, the center department of carousel bottom is provided with dust collector, the dust collector top has the containing box through the outlet duct intercommunication, the left side of containing box has the fan through the intake pipe intercommunication, the bottom of carousel is provided with the recess, the inner chamber of recess is provided with cleaning device, cleaning device's bottom is provided with the brush.

Preferably, the dust removing device comprises an air cavity and air suction pipes, the air cavity is fixedly connected to the center of the bottom of the turntable, the air suction pipes are arranged at the bottom of the air cavity, and the number of the air suction pipes is eight.

Preferably, the front of containing box articulates through the hinge has the turnover door, the inner chamber of intake pipe is provided with the filter screen, the diameter of filter screen mesh is three millimeters, the shape of carousel is half-circular arc.

Preferably, cleaning device includes connecting rod, spring and buffer board, the inner chamber of recess is provided with the connecting rod, the bottom fixedly connected with buffer board of connecting rod, the surface cover of connecting rod is equipped with the spring.

Preferably, one side of the spring is fixedly connected with the bottom of the turntable, and the other side of the spring is fixedly connected with the top of the buffer plate.

Preferably, the brush adopts flexible water absorption material to constitute, the quantity of brush is eight, and the length of brush is different, the brush evenly sets up the bottom at the carousel.

Preferably, the diameter of the inner cavity of the groove is larger than that of the connecting rod, and the length of the inner cavity of the groove is smaller than that of the connecting rod

Compared with the prior art, the beneficial effects of the utility model are as follows:

1. the utility model discloses a driving motor, carousel, dust collector and cleaning device's cooperation, it is rotatory to drive the carousel through driving motor, be convenient for clear away the photoresist on semiconductor wafer surface on the production line, do not influence the photoetching machine normal operating, improve work efficiency, dust collector adsorbs the photoresist on semiconductor wafer surface, avoids secondary pollution, improves clean effect, guarantees the production quality of product to reach the effect that work efficiency is high, solved the problem that current work efficiency is low.

2. The utility model discloses a shape of design carousel is half circular arc, avoid the carousel to influence lithography machine normal operating, improve work efficiency, through the cooperation of turnover door and filter screen, be convenient for store the photoresist, through the connecting rod, the cooperation of spring and buffer board, make brush and the laminating of semiconductor wafer surface, improve clean effect, guarantee the production quality of product, adopt the flexible material that absorbs water to constitute through the design brush, be convenient for adsorb the photoresist on semiconductor wafer surface, prevent to have the photoetching adhesive to adhere on the surface of semiconductor wafer.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is an enlarged view of a portion A of FIG. 1 according to the present invention;

FIG. 3 is a top view of the turntable structure of the present invention;

FIG. 4 is a left side view of the turntable structure of the present invention;

fig. 5 is a right side view of the structure of the present invention.

In the figure: 1. a base; 2. a support bar; 3. a transverse plate; 4. a telescopic cylinder; 5. a lithography machine; 6. a conveying device; 7. a drive motor; 8. a turntable; 9. a dust removal device; 91. an air cavity; 92. an air intake duct; 10. an air outlet pipe; 11. a storage box; 12. an air inlet pipe; 13. a fan; 14. a groove; 15. a cleaning device; 151. a connecting rod; 152. a spring; 153. a buffer plate; 16. a brush; 17. turning over the door; 18. and (4) a filter screen.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-5, an apparatus for rapidly removing photoresist comprises a base 1, and is characterized in that: the left side of the top of the base 1 is fixedly connected with a supporting rod 2, the right side of the supporting rod 2 is fixedly connected with a transverse plate 3, the bottom of the transverse plate 3 is fixedly connected with a telescopic cylinder 4, the bottom of the telescopic cylinder 4 is fixedly connected with a photoetching machine 5, the center of the top of the base 1 is fixedly connected with a conveying device 6, one side of the center of the top of the base 1 is fixedly connected with a driving motor 7, an output shaft of the driving motor 7 is fixedly connected with a turntable 8, the center of the bottom of the turntable 8 is provided with a dust removing device 9, the dust removing device 9 comprises an air cavity 91 and an air suction pipe 92, the air cavity 91 is fixedly connected with the center of the bottom of the turntable 8, the bottom of the air cavity 91 is provided with the air suction pipe 92, the number of the air suction pipe 92 is eight, the turntable 8 is, be convenient for store the photoresist, through connecting rod 151, spring 152 and buffer board 153's cooperation, make brush 16 and the laminating of semiconductor wafer surface, improve clean effect, guarantee the production quality of product, adopt flexible water-absorbing material to constitute through design brush 16, be convenient for adsorb the photoresist on semiconductor wafer surface, prevent that the photoresist from gluing on the surface of semiconductor wafer, dust collector 9 top has containing box 11 through outlet duct 10 intercommunication, the front of containing box 11 is articulated to have turnover door 17 through the door hinge, the inner chamber of intake pipe 12 is provided with filter screen 18, the diameter of filter screen 18 mesh is three millimeters, the shape of carousel 8 is half circular arc, the left side of containing box 11 is through intake pipe 12 intercommunication fan 13, the bottom of carousel 8 is provided with recess 14, the inner chamber of recess 14 is provided with cleaning device 15, cleaning device 15 includes connecting rod 151, Spring 152 and buffer board 153, the inner cavity of groove 14 is provided with connecting rod 151, the bottom of connecting rod 151 is fixedly connected with buffer board 153, the surface cover of connecting rod 151 is equipped with spring 152, one side of spring 152 is fixedly connected with the bottom of turntable 8, the other side of spring 152 is fixedly connected with the top of buffer board 153, the bottom of cleaning device 15 is provided with brush 16, brush 16 is made of flexible water-absorbing material, the number of brush 16 is eight, and the length of brush 16 is different, brush 16 is uniformly arranged at the bottom of turntable 8, the diameter of the inner cavity of groove 14 is larger than that of connecting rod 151, the length of the inner cavity of groove 14 is smaller than that of connecting rod 151, through the cooperation of driving motor 7, turntable 8, dust collector 9 and cleaning device 15, turntable 8 is driven to rotate through driving motor 7, and photoresist on the surface of semiconductor wafer on the production line is convenient to clean, the normal operation of the photoetching machine 5 is not influenced, the working efficiency is improved, the dust removal device 9 adsorbs the photoresist on the surface of the semiconductor wafer, the secondary pollution is avoided, the cleaning effect is improved, and the production quality of the product is ensured, so that the effect of high working efficiency is achieved, and the problem of low working efficiency is solved.

During the use, make driving motor 7 work through the peripheral hardware controller, driving motor 7's output shaft drives carousel 8 and rotates, make carousel 8 remove the top of semiconductor wafer, do not influence photoetching machine 5 normal operating, improve work efficiency, through spring 152 to buffer board 153 effect, make brush 16 and the laminating of semiconductor wafer surface, improve clean effect, guarantee the production quality of product, make fan 13 work through the peripheral hardware controller, fan 13 adsorbs the photoresist on semiconductor wafer surface through air cavity 91 and breathing pipe 92, avoid secondary pollution, guarantee the production quality of product, adopt flexible water absorption material to constitute through design brush 16, be convenient for adsorb the photoresist on semiconductor wafer surface, prevent that photoetching adhesive from attaching the surface of semiconductor wafer, thereby reach the effect that work efficiency is high.

In the description of this patent, it is to be understood that the terms "center," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the orientations and positional relationships indicated in the drawings for the convenience of describing the patent and for the simplicity of description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are not to be considered limiting of the patent. In the description of this patent, it is noted that unless otherwise specifically stated or limited, the terms "mounted," "connected," and "disposed" are to be construed broadly and can include, for example, fixedly connected, disposed, detachably connected, disposed, or integrally connected and disposed. The specific meaning of the above terms in this patent may be understood by those of ordinary skill in the art as appropriate.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (7)

1. An apparatus for rapidly removing photoresist comprises a base (1), and is characterized in that: the device comprises a base (1), a supporting rod (2) is fixedly connected to the left side of the top of the base (1), a transverse plate (3) is fixedly connected to the right side of the supporting rod (2), a telescopic cylinder (4) is fixedly connected to the bottom of the transverse plate (3), a photoetching machine (5) is fixedly connected to the bottom of the telescopic cylinder (4), a conveying device (6) is fixedly connected to the center of the top of the base (1), a driving motor (7) is fixedly connected to one side of the center of the top of the base (1), a rotary table (8) is fixedly connected to an output shaft of the driving motor (7), a dust removing device (9) is arranged at the center of the bottom of the rotary table (8), the top of the dust removing device (9) is communicated with a containing box (11) through an air outlet pipe (10), the left side of the containing box (11) is communicated with a fan (13, the inner cavity of the groove (14) is provided with a cleaning device (15), and the bottom of the cleaning device (15) is provided with a brush (16).

2. The apparatus for rapidly removing photoresist according to claim 1, wherein: the dust removal device (9) comprises an air cavity (91) and air suction pipes (92), the air cavity (91) is fixedly connected to the center of the bottom of the rotary disc (8), the air suction pipes (92) are arranged at the bottom of the air cavity (91), and the number of the air suction pipes (92) is eight.

3. The apparatus for rapidly removing photoresist according to claim 1, wherein: the front of containing box (11) is articulated through the hinge has turnover door (17), the inner chamber of intake pipe (12) is provided with filter screen (18), the diameter of filter screen (18) mesh is three millimeters, the shape of carousel (8) is half circular arc.

4. The apparatus for rapidly removing photoresist according to claim 1, wherein: cleaning device (15) are including connecting rod (151), spring (152) and buffer board (153), the inner chamber of recess (14) is provided with connecting rod (151), the bottom fixedly connected with buffer board (153) of connecting rod (151), the surface cover of connecting rod (151) is equipped with spring (152).

5. The apparatus for rapidly removing photoresist according to claim 4, wherein: one side of the spring (152) is fixedly connected with the bottom of the rotary disc (8), and the other side of the spring (152) is fixedly connected with the top of the buffer plate (153).

6. The apparatus for rapidly removing photoresist according to claim 1, wherein: the brush (16) is made of flexible water absorbing materials, the number of the brushes (16) is eight, the lengths of the brushes (16) are different, and the brushes (16) are uniformly arranged at the bottom of the rotary table (8).

7. The apparatus for rapidly removing photoresist according to claim 1 or 4, wherein: the diameter of the inner cavity of the groove (14) is larger than that of the connecting rod (151), and the length of the inner cavity of the groove (14) is smaller than that of the connecting rod (151).

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