CN211528736U - Metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance - Google Patents
Metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance Download PDFInfo
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- CN211528736U CN211528736U CN202020391152.XU CN202020391152U CN211528736U CN 211528736 U CN211528736 U CN 211528736U CN 202020391152 U CN202020391152 U CN 202020391152U CN 211528736 U CN211528736 U CN 211528736U
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Abstract
The utility model discloses an optical device is received a little to metal based on multi-wavelength super narrow band resonance, when the device is received a little to the metal is incided to light, restrain mode and transmission mode can be aroused, produce the bandwidth and only a few nanometers many transmission peaks. The suppression mode can suppress light transmission and is a multi-order hybrid waveguide mode formed by the periodic thin metal grating, the high-refractive-index dielectric layer and the low-refractive-index dielectric layer, and the transmission mode can enhance light transmission and is a multi-order cavity mode generated by the high-refractive-index dielectric layer and the low-refractive-index dielectric layer. When the inhibition mode and the transmission mode interact, ultra-narrow-band multiple transmission peaks can be generated, and transmission peaks with two or more different central wavelengths in a visible spectrum can be obtained. The metal micro-nano device has wide application prospect in the aspects of filtering, sensing and detection.
Description
Technical Field
The utility model relates to an optical device field is received a little to the metal, especially relates to an optical device is received a little to metal based on multi-wavelength super narrowband resonance.
Background
The current Surface Plasmon device has the advantage of being capable of overcoming the limit of diffraction limit, because the incident light interacts with the metal, the free electrons on the metal Surface generate collective oscillation, and an electromagnetic Wave propagating along the metal Surface, namely a Surface Plasmon Wave (SP), is formed on the metal-medium interface. SP, which is a "combination" of photons and electrons, can confine the optical field to a sub-wavelength size range, enabling the manipulation of the interaction of light with matter in the nanoscale range. The surface plasmon can form resonance (SPR) in a metal micro-nano structure, can greatly enhance the intensity of a local optical field and improve the interaction between light and a substance, and is widely applied to the fields of sensing, nano laser, Raman enhancement, modulation, detection and the like. However, in the optical wave band, due to the existence of metal, the absorption and propagation losses are extremely large, and these losses can cause severe broadening of the half-peak width of the resonance mode, thereby severely limiting the application performance of the metal micro-nano optical device. Therefore, reducing the surface plasmon resonance bandwidth is important for realizing a high-performance metal micro-nano device.
At present, most of metal micro-nano devices developed by researchers only realize ultra-narrow band resonance of a certain specific wavelength, or realize multi-wavelength resonance but are difficult to realize ultra-narrow band resonance. In practical applications, however, the ultra-narrow band resonance of multiple wavelengths has wider application. Therefore, a metal micro-nano device capable of realizing multi-wavelength ultra-narrow band is needed at present.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide an optical device is received to metal micro-nano based on multi-wavelength super narrow band resonance aims at solving the present multi-wavelength among the prior art metal micro-nano optical device quality factor in the optical frequency low, and then influences the technical problem of sensing sensitivity.
In order to achieve the above object, the utility model discloses a metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance, including low refractive index dielectric layer substrate, dielectric structure and periodic thin metal strip grating; the medium structure is fixedly connected with the low-refractive-index medium layer substrate and is positioned on the surface of the low-refractive-index medium layer substrate, and the periodic thin metal strip grating is fixedly connected with the medium structure and is positioned on one side of the medium structure far away from the low-refractive-index medium layer substrate; the medium structure comprises a high-refractive-index medium layer and a low-refractive-index medium layer, the high-refractive-index medium layer is fixedly connected with the low-refractive-index medium layer substrate and is positioned on one side, close to the periodic thin metal strip grating, of the low-refractive-index medium layer substrate, and the low-refractive-index medium layer is fixedly connected with the high-refractive-index medium layer, is fixedly connected with the periodic thin metal strip grating and is positioned between the low-refractive-index medium layer and the periodic thin metal strip grating.
Wherein the material of the periodic thin metal strip grating is noble metal.
The duty ratio of the periodic thin metal strip grating is 0.5-0.8, the thickness is 20-100nm, the period is 400-600nm, the thickness of the high-refractive-index dielectric layer is 50-200nm, and the thickness of the low-refractive-index dielectric layer is 50-200 nm.
The refractive index of the low-refractive-index dielectric layer substrate is the same as that of the low-refractive-index dielectric layer.
Wherein the refractive index of the low-refractive-index medium layer is greater than 1, and the refractive index of the high-refractive-index medium layer is higher than that of the low-refractive-index medium layer by 0.2 or more.
The number of the medium structures is two, the medium structures are located between the low-refractive-index medium layer substrate and the periodic thin metal strip grating, and the low-refractive-index medium layer and the high-refractive-index medium layer are sequentially connected.
The number of the medium structures is three, the medium structures are positioned between the low-refractive-index medium layer substrate and the periodic thin metal strip grating, and the low-refractive-index medium layer and the high-refractive-index medium layer are sequentially connected.
The number of the medium structures is four, the medium structures are located between the low-refractive-index medium layer substrate and the periodic thin metal strip grating, and the low-refractive-index medium layer and the high-refractive-index medium layer are sequentially connected.
The utility model discloses an optical device is received a little to metal based on multi-wavelength super narrow band resonance, when the optical device is received a little to the metal based on multi-wavelength super narrow band resonance when light incides, restrain mode and transmission mode can be aroused, produce the bandwidth and only a few nanometers many transmission peaks. The suppression mode can suppress light transmission and is a multi-order hybrid waveguide mode formed by the periodic thin metal grating, the high-refractive-index dielectric layer and the low-refractive-index dielectric layer, and the transmission mode can enhance light transmission and is a multi-order cavity mode generated by the high-refractive-index dielectric layer and the low-refractive-index dielectric layer. When the inhibition mode and the transmission mode interact, ultra-narrow-band multiple transmission peaks can be generated, and transmission peaks with two or more different central wavelengths in a visible spectrum can be obtained. The metal micro-nano device has wide application prospect in the aspects of filtering, sensing and detection.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of the medium structure of the present invention in two layers.
Fig. 2 is a simulated transmission spectrum of the medium of the present invention having two layers.
Fig. 3 is a schematic structural diagram of the dielectric structure of the present invention in three layers.
Fig. 4 is a graph of a simulated transmission spectrum when the dielectric structure of the present invention is three layers.
Fig. 5 is a schematic structural view of the dielectric structure of the present invention having four layers.
Fig. 6 is a graph of a simulated transmission spectrum when the dielectric structure of the present invention has four layers.
In the figure: the optical fiber comprises a 1-low refractive index medium layer substrate, a 2-medium structure, a 3-periodic thin metal strip grating, a 21-high refractive index medium layer, a 22-low refractive index medium layer and a 100-metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary and intended to be used for explaining the present invention, and should not be construed as limiting the present invention.
In the description of the present invention, it is to be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are merely for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. In addition, in the description of the present invention, "a plurality" means two or more unless specifically limited otherwise.
In a first example of the present embodiment:
referring to fig. 1 and 2, the present invention provides a metal micro-nano optical device 100 based on multi-wavelength ultra-narrow band resonance, which includes a low refractive index dielectric layer substrate 1, a dielectric structure 2 and a periodic thin metal strip grating 3; the medium structure 2 is fixedly connected with the low-refractive-index medium layer substrate 1 and is positioned on the surface of the low-refractive-index medium layer substrate 1, and the periodic thin metal strip grating 3 is fixedly connected with the medium structure 2 and is positioned on one side of the medium structure 2, which is far away from the low-refractive-index medium layer substrate 1; the medium structure 2 comprises a high-refractive-index medium layer 21 and a low-refractive-index medium layer 22, the high-refractive-index medium layer 21 is fixedly connected with the low-refractive-index medium layer substrate 1 and is positioned on one side, close to the periodic thin metal strip grating 3, of the low-refractive-index medium layer substrate 1, and the low-refractive-index medium layer 22 is fixedly connected with the high-refractive-index medium layer 21, is fixedly connected with the periodic thin metal strip grating 3 and is positioned between the high-refractive-index medium layer 21 and the periodic thin metal strip grating 3.
Further, the material of the periodic thin metal strip grating 3 is a noble metal.
Further, the duty ratio of the periodic thin metal strip grating 3 is 0.5-0.8, the thickness is 20-100nm, the period is 400-600nm, the thickness of the high refractive index medium layer 21 is 50-200nm, and the thickness of the low refractive index medium layer 22 is 50-200 nm.
Further, the refractive index of the low-refractive-index dielectric layer substrate 1 is the same as that of the low-refractive-index dielectric layer 22.
Further, the refractive index of the low refractive index medium layer 22 is greater than 1, and the refractive index of the high refractive index medium layer 21 is higher than that of the low refractive index medium layer 22 by 0.2 or more.
Further, the number of the dielectric structures 2 is two, and the dielectric structures are located between the low refractive index dielectric layer substrate 1 and the periodic thin metal strip grating 3, and the low refractive index dielectric layer 22 and the high refractive index dielectric layer 21 are sequentially connected.
In this embodiment, a vacuum electron beam evaporation technology is used to prepare a structure formed by the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 on the low refractive index dielectric layer substrate 1, a vacuum electron beam evaporation technology is used to bombard a metal target source on the structure formed by the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 through a high-energy electron beam to form an ultra-thin metal layer, and then a photolithography technology is used to etch the ultra-thin metal layer to obtain the periodic thin metal strip grating 3, wherein the periodic thin metal grating is made of silver; the low-refractive-index medium layer substrate 1, the two high-refractive-index medium layers 21, the low-refractive-index medium layer 22 and the periodic thin metal strip grating 3 are sequentially connected from bottom to top, the refractive index of the low-refractive-index medium layer substrate 1 is 1.5, the refractive index of the high-refractive-index medium layer 21 is 2, the thickness of the high-refractive-index medium layer is 200nm, the refractive index of the low-refractive-index medium layer 22 is 1.5, the thickness of the low-refractive-index medium layer is 100nm, the period of the periodic thin metal strip grating 3 is 400nm, the duty ratio is 0.8, the metal thickness is 40nm, and when a structure formed by the two high-refractive-index medium layers 21 and the. The number of layers of the medium structure 2 is two or more, and 7 layers of the medium structure is achieved at present, but theoretically, two or more layers of the medium structure can be adopted, and more central wavelengths can be obtained by increasing the high-refractive-index medium layer 21 and the low-refractive-index medium layer 22; when light is incident to the metal micro-nano device, the inhibition mode and the transmission mode can be excited, and a multi-transmission peak with the bandwidth of only a few nanometers is generated. The suppression mode can suppress light transmission, is a multi-order hybrid waveguide mode formed by the periodic thin metal grating 3, the high-refractive-index dielectric layer 21 and the low-refractive-index dielectric layer 22, and the transmission mode can enhance light transmission, and is a multi-order cavity mode generated by the high-refractive-index dielectric layer 21 and the low-refractive-index dielectric layer 22. When the inhibition mode and the transmission mode interact, ultra-narrow band multiple transmission peaks can be generated, and transmission peaks with two or more central wavelengths in a visible spectrum can be obtained. The metal micro-nano device has wide application prospect in the aspects of filtering, sensing and detection.
In a second example of the present embodiment:
referring to fig. 1, fig. 3 and fig. 4, the present invention provides a metal micro-nano optical device 100 based on multi-wavelength ultra-narrow band resonance, which includes a low refractive index dielectric layer substrate 1, a dielectric structure 2 and a periodic thin metal strip grating 3; the medium structure 2 is fixedly connected with the low-refractive-index medium layer substrate 1 and is positioned on the surface of the low-refractive-index medium layer substrate 1, and the periodic thin metal strip grating 3 is fixedly connected with the medium structure 2 and is positioned on one side of the medium structure 2, which is far away from the low-refractive-index medium layer substrate 1; the medium structure 2 comprises a high-refractive-index medium layer 21 and a low-refractive-index medium layer 22, the high-refractive-index medium layer 21 is fixedly connected with the low-refractive-index medium layer substrate 1 and is positioned on one side, close to the periodic thin metal strip grating 3, of the low-refractive-index medium layer substrate 1, and the low-refractive-index medium layer 22 is fixedly connected with the high-refractive-index medium layer 21, is fixedly connected with the periodic thin metal strip grating 3 and is positioned between the low-refractive-index medium layer 22 and the periodic thin metal strip grating 3.
Further, the material of the periodic thin metal strip grating 3 is a noble metal.
Further, the duty ratio of the periodic thin metal strip grating 3 is 0.5-0.8, the thickness is 20-100nm, the period is 400-600nm, the thickness of the high refractive index medium layer 21 is 50-200nm, and the thickness of the low refractive index medium layer 22 is 50-200 nm.
Further, the refractive index of the low-refractive-index dielectric layer substrate 1 is the same as that of the low-refractive-index dielectric layer 22.
The refractive index of the low refractive index medium layer 22 is greater than 1, and the refractive index of the high refractive index medium layer 21 is higher than that of the low refractive index medium layer 22 by 0.2 or more.
Further, the number of the dielectric structures 2 is three, and the dielectric structures are located between the low refractive index dielectric layer substrate 1 and the periodic thin metal strip grating 3, and the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 are sequentially connected.
In this embodiment, the low-refractive-index medium layer substrate 1, the three high-refractive-index medium layers 21, the low-refractive-index medium layer 22 and the periodic thin metal strip grating 3 are sequentially connected from bottom to top, the refractive index of the low-refractive-index medium layer substrate 1 is 1.5, the refractive index of the high-refractive-index medium layer 21 is 2, the thickness of the high-refractive-index medium layer 21 is 200nm, the refractive index of the low-refractive-index medium layer 22 is 1.5, the thickness of the low-refractive-index medium layer 22 is 100nm, the period of the periodic thin metal strip grating 3 is 400nm, the duty ratio is 0.8, and the metal thickness is 40 nm.
In a third example of the present embodiment:
referring to fig. 1, 5 and 6, the present invention provides a metal micro-nano optical device 100 based on multi-wavelength ultra-narrow band resonance, which includes a low refractive index dielectric layer substrate 1, a dielectric structure 2 and a periodic thin metal strip grating 3; the medium structure 2 is fixedly connected with the low-refractive-index medium layer substrate 1 and is positioned on the surface of the low-refractive-index medium layer substrate 1, and the periodic thin metal strip grating 3 is fixedly connected with the medium structure 2 and is positioned on one side of the medium structure 2, which is far away from the low-refractive-index medium layer substrate 1; the medium structure 2 comprises a high-refractive-index medium layer 21 and a low-refractive-index medium layer 22, the high-refractive-index medium layer 21 is fixedly connected with the low-refractive-index medium layer substrate 1 and is positioned on one side, close to the periodic thin metal strip grating 3, of the low-refractive-index medium layer substrate 1, and the low-refractive-index medium layer 22 is fixedly connected with the high-refractive-index medium layer 21, is fixedly connected with the periodic thin metal strip grating 3 and is positioned between the high-refractive-index medium layer 21 and the periodic thin metal strip grating 3.
Further, the material of the periodic thin metal strip grating 3 is a noble metal.
Further, the duty ratio of the periodic thin metal strip grating 3 is 0.5-0.8, the thickness is 20-100nm, the period is 400-600nm, the thickness of the high refractive index medium layer 21 is 50-200nm, and the thickness of the low refractive index medium layer 22 is 50-200 nm.
Further, the refractive index of the low-refractive-index dielectric layer substrate 1 is the same as that of the low-refractive-index dielectric layer 22.
The refractive index of the low refractive index medium layer 22 is greater than 1, and the refractive index of the high refractive index medium layer 21 is higher than that of the low refractive index medium layer 22 by 0.2 or more.
Further, the number of the dielectric structures 2 is four, and the dielectric structures are located between the low refractive index dielectric layer substrate 1 and the periodic thin metal strip grating 3, and the low refractive index dielectric layer 22 and the high refractive index dielectric layer 21 are sequentially connected.
In this embodiment, the low refractive index medium layer substrate 1, four high refractive index medium layers 21, four low refractive index medium layers 22 and the periodic thin metal strip grating 3 are sequentially connected from bottom to top, the refractive index of the low refractive index medium layer substrate 1 is 1.5, the refractive index of the high refractive index medium layer 21 is 2, the thickness is 200nm, the refractive index of the low refractive index medium layer 22 is 1.5, the thickness is 100nm, the period of the periodic thin metal strip grating 3 is 400nm, the duty ratio is 0.8, and the metal thickness is 40nm, when there are four layers of the high refractive index medium layer 21 and the low refractive index medium layer 22, it can be observed that four lights with different central wavelengths in the visible spectrum penetrate through the metal micro-nano device, and the four transmitted wavelengths are 647nm, 676nm, 702nm and 720nm respectively, so that high-precision filtering data can be obtained, the filtering effect is better.
While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention.
Claims (8)
1. A metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance is characterized by comprising a low-refractive-index dielectric layer substrate, a dielectric structure and a periodic thin metal strip grating;
the medium structure is fixedly connected with the low-refractive-index medium layer substrate and is positioned on the surface of the low-refractive-index medium layer substrate, and the periodic thin metal strip grating is fixedly connected with the medium structure and is positioned on one side of the medium structure far away from the low-refractive-index medium layer substrate;
the medium structure comprises a high-refractive-index medium layer and a low-refractive-index medium layer, the high-refractive-index medium layer is fixedly connected with the low-refractive-index medium layer substrate and is positioned on one side, close to the periodic thin metal strip grating, of the low-refractive-index medium layer substrate, and the low-refractive-index medium layer is fixedly connected with the high-refractive-index medium layer, is fixedly connected with the periodic thin metal strip grating and is positioned between the high-refractive-index medium layer and the periodic thin metal strip grating.
2. A metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance according to claim 1,
the material of the periodic thin metal strip grating is noble metal.
3. A metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance according to claim 2,
the duty ratio of the periodic thin metal strip grating is 0.5-0.8, the thickness is 20-100nm, the period is 400-600nm, the thickness of the high refractive index medium layer is 50-200nm, and the thickness of the low refractive index medium layer is 50-200 nm.
4. A metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance according to claim 3,
the refractive index of the low-refractive-index dielectric layer substrate is the same as that of the low-refractive-index dielectric layer.
5. A metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance according to claim 4,
the refractive index of the low-refractive-index medium layer is greater than 1, and the refractive index of the high-refractive-index medium layer is 0.2 or more higher than that of the low-refractive-index medium layer.
6. A metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance according to claim 5,
the number of the medium structures is two, the medium structures are positioned between the low-refractive-index medium layer substrate and the periodic thin metal strip grating, and the high-refractive-index medium layer and the low-refractive-index medium layer are sequentially connected.
7. A metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance according to claim 5,
the number of the medium structures is three, the medium structures are positioned between the low-refractive-index medium layer substrate and the periodic thin metal strip grating, and the high-refractive-index medium layer and the low-refractive-index medium layer are sequentially connected.
8. A metal micro-nano optical device based on multi-wavelength ultra-narrow band resonance according to claim 5,
the number of the medium structures is four, the medium structures are positioned between the low-refractive-index medium layer substrate and the periodic thin metal strip grating, and the high-refractive-index medium layer and the low-refractive-index medium layer are sequentially connected.
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