CN211435385U - Filter device for etching back liquid recovery system - Google Patents
Filter device for etching back liquid recovery system Download PDFInfo
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- CN211435385U CN211435385U CN201921534737.6U CN201921534737U CN211435385U CN 211435385 U CN211435385 U CN 211435385U CN 201921534737 U CN201921534737 U CN 201921534737U CN 211435385 U CN211435385 U CN 211435385U
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Abstract
The utility model relates to a back liquid recovery technical field is used in the etching, especially a back liquid for etching recovery system uses filter equipment, be used for filtering the first filter of solid impurity in the back liquid for etching through setting up, be connected with the back liquid for etching recovery system that can retrieve back liquid for etching behind the first filter, make back liquid for etching get rid of the solid impurity in the back liquid for etching before letting in back liquid for etching recovery system, prevent that solid impurity from causing the jam to pipeline or nozzle wherein after letting in back liquid for etching recovery system, the filter equipment of this kind of structure, solid impurity in the back liquid for etching recovery system has solved easily causes the jam to pipeline or nozzle; through set up the transfer jar before first filter, and the hookup location is the lower part of transfer jar, after the back liquid for etching lets in the transfer jar, the solid impurity in the back liquid for etching will deposit in transfer jar bottom, and the solid impurity of being convenient for gets into first filter, increases solid impurity's filter effect.
Description
Technical Field
The utility model relates to an etching is with back liquid recovery technical field, especially a etching is with back liquid filter equipment for recovery system.
Background
The etching solution generates sludge-like solid impurities and copper salt precipitates when the original plate is etched. Therefore, when the post-etching solution is recovered by electrolysis, the post-etching solution also contains solid impurities.
Acidic copper chloride etching solutions are widely used in etching of etched plates, and include HCl, CuCl2And a NaCl component. The etching solution containing bivalent copper ions forms solution containing monovalent copper ions after etching, the recycling of the solution after etching is substantial to the recycling of copper, namely, the monovalent copper ions are oxidized into bivalent copper ions and are electrolyzed to generate copper, high-oxidizing gas or solution is introduced into the solution containing monovalent copper ions in the oxidation process, and pipelines and nozzles are often needed to be utilized in the oxidation process and the electrolysis process, namely, in the recycling process, the contact between the solution containing monovalent copper ions and the high-oxidizing gas or solution.
In the recovery system of the post-etching liquid, if solid impurities are not removed, the solid impurities are accumulated in a pipeline or a nozzle for a long time to cause blockage, thereby influencing the recovery of the post-etching liquid.
SUMMERY OF THE UTILITY MODEL
The invention of the utility model aims to: the filtering device for the post-etching liquid recovery system is provided for solving the problem that solid impurities in the post-etching liquid recovery system in the prior art easily block pipelines or nozzles and the problem that the solid impurities block the pipelines or the nozzles.
In order to realize the purpose, the utility model discloses a technical scheme be:
a filter device for a post-etching liquid recovery system comprises a first filter for filtering solid impurities in post-etching liquid, and a post-etching liquid recovery system which can recover the post-etching liquid is connected behind the first filter;
the first filter is also connected with a transfer cylinder used for precipitating solid impurities and storing the etching solution in front of the first filter, and the position of the first filter connected with the transfer cylinder is the lower part of the transfer cylinder.
The filtering device with the structure solves the problem that solid impurities in the post-etching liquid recovery system are easy to block pipelines or nozzles by arranging the first filter for filtering the solid impurities in the post-etching liquid, and the post-etching liquid recovery system capable of recovering the post-etching liquid is connected behind the first filter, so that the solid impurities in the post-etching liquid are removed before the post-etching liquid is introduced into the post-etching liquid recovery system, and the solid impurities in the post-etching liquid recovery system are prevented from blocking the pipelines or nozzles after the solid impurities are introduced into the post-etching liquid recovery system; the filter effect is not good when a filter that sets up simply filters be connected with before the first filter and be used for deposiing solid impurity and store the transit jar of back liquid for etching, through set up the transit jar before the first filter, and the hookup location is the lower part of transit jar, after back liquid for etching lets in the transit jar, the solid impurity in the back liquid for etching will deposit in transit jar bottom, and solid impurity concentrates the setting in the bottom, sets up the output position of transit jar in the lower part of transit jar, is convenient for solid impurity to get into first filter, increases solid impurity's filter effect.
Wherein before means before the post-etching solution is filtered by the filter.
In a preferred embodiment of the present invention, the inlet for introducing the post-etching solution is provided in the upper part of the transfer cylinder.
The etching solution is arranged at the input port of the transfer cylinder and is arranged at the upper part of the transfer cylinder, and the input port is staggered with the connecting position of the first filter and the transfer cylinder, so that the first filter and the transfer cylinder are prevented from forming convection, and solid impurities are convenient to precipitate.
As the preferred proposal of the utility model, a liquid storage tank is connected between the first filter and the etching back liquid recovery system.
The liquid storage pot through setting up can be stored the etching after-used liquid after filtering, when needs use the etching after-used liquid, need not to open first filter and carry out filtering work to the etching after-used liquid.
As a preferable aspect of the present invention, the first filter includes a carbon processor.
As the preferred scheme of the utility model, still be provided with the second filter before the transit jar.
As a preferable aspect of the present invention, the second filter includes a carbon processor.
As the preferred proposal of the utility model, the transfer cylinder and the liquid storage tank are wrapped with a warm-keeping layer.
Through setting up cold-proof layer, reduce the heat change of the back liquid for etching in transfer jar and the liquid storage pot, after the back liquid for etching that has suitable temperature inputs in transfer jar and the liquid storage pot, the back liquid for etching is difficult to absorb heat or release heat, has solved the problem of the precipitation of the back liquid for etching.
To sum up, owing to adopted above-mentioned technical scheme, the beneficial effects of the utility model are that:
1. the filtering device with the structure solves the problem that solid impurities in the post-etching liquid recovery system are easy to block pipelines or nozzles by arranging the first filter for filtering the solid impurities in the post-etching liquid, and the post-etching liquid recovery system capable of recovering the post-etching liquid is connected behind the first filter, so that the solid impurities in the post-etching liquid are removed before the post-etching liquid is introduced into the post-etching liquid recovery system, and the solid impurities in the post-etching liquid recovery system are prevented from blocking the pipelines or nozzles after the solid impurities are introduced into the post-etching liquid recovery system; the filter effect is not good when a filter that sets up simply filters be connected with before the first filter and be used for deposiing solid impurity and store the transit jar of back liquid for etching, through set up the transit jar before the first filter, and the hookup location is the lower part of transit jar, after back liquid for etching lets in the transit jar, the solid impurity in the back liquid for etching will deposit in transit jar bottom, and solid impurity concentrates the setting in the bottom, sets up the output position of transit jar in the lower part of transit jar, is convenient for solid impurity to get into first filter, increases solid impurity's filter effect.
2. The etching solution is arranged at the input port of the transfer cylinder and is arranged at the upper part of the transfer cylinder, and the input port is staggered with the connecting position of the first filter and the transfer cylinder, so that the first filter and the transfer cylinder are prevented from forming convection, and solid impurities are convenient to precipitate.
3. The liquid storage pot through setting up can be stored the etching after-used liquid after filtering, when needs use the etching after-used liquid, need not to open first filter and carry out filtering work to the etching after-used liquid.
4. Through setting up cold-proof layer, reduce the heat change of the back liquid for etching in transfer jar and the liquid storage pot, after the back liquid for etching that has suitable temperature inputs in transfer jar and the liquid storage pot, the back liquid for etching is difficult to absorb heat or release heat, has solved the problem of the precipitation of the back liquid for etching.
Drawings
FIG. 1 is a schematic view showing the connection of a filter device for an etching post-liquid recovery system.
The labels in the figure are: 1-etching solution, 2-first filter, 3-transfer cylinder, 4-liquid storage tank and 5-second filter.
Detailed Description
The present invention will be described in detail with reference to the accompanying drawings.
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
Examples
As shown in FIG. 1, FIG. 1 is a schematic view showing the connection relationship of a filtration apparatus for a post-etching solution recovery system, in which a post-etching solution 1 may be a post-etching solution 1 of an acidic copper chloride etching solution. The structures of the filtering device are respectively as follows according to the flow direction of the post-etching liquid 1: the second carbon processor, the transfer cylinder 3, the first carbon processor, the liquid storage cylinder and the post-etching liquid recovery system.
Wherein, this filter equipment includes the first filter 2 that is arranged in filtering the solid impurity in the postliquid 1 for the etching, and this first filter 2 is the carbon processor, and the carbon processor is including active carbon, adsorbs solid impurity through active carbon.
A post-etching solution recovery system capable of recovering the post-etching solution 1 is connected to the rear of the first filter 2, and a liquid storage tank 4 is connected between the first filter 2 and the post-etching solution recovery system, and the filtered post-etching solution 1 is stored in the liquid storage tank 4.
A transfer cylinder 3 for precipitating solid impurities and storing the etching solution 1 is connected in front of the first filter 2, the position of the transfer cylinder 3 where the first filter 2 is connected is the lower part of the transfer cylinder 3, and the lower part refers to the bottom of the transfer cylinder 3 or the lower half part of the side surface of the transfer cylinder 3.
A second filter 5 is arranged in front of the transfer cylinder 3, the second filter 5 is a carbon processor, the carbon processor comprises activated carbon, and the activated carbon is used for adsorbing solid impurities; wherein, an input port for inputting the post-etching liquid 1 on the transfer cylinder 3 is provided at the upper part of the transfer cylinder 3.
The solid impurities refer to sludge-like impurities generated by etching the original plate by the etching solution and copper salt precipitates.
The cylinder and the tank refer to containers for storing the post-etching liquid 1, and are not limited to containers in other forms than cylinders and tanks.
In addition, the transfer cylinder 3 and the liquid storage tank 4 are wrapped by thermal insulation layers, pipelines between the second filter 5 and the liquid storage tank 4 can be provided with thermal insulation layers, after the etching post-liquid 1 with a certain temperature is introduced into the filtering device for the etching liquid recovery system, the transfer cylinder 3, the liquid storage tank 4 and the pipelines are provided with thermal insulation layers, so that the rapid cooling or heating due to the environmental temperature can be avoided, and the problem that the etching post-liquid 1 is separated out, crystallized and precipitated is solved.
Wherein, the material of the warm-keeping layer can be polyurethane heat-insulating material or foam plastic.
The recovery system can be a recovery system of the acid etching after-liquid 1, and the common acid etching after-liquid 1 is acid copper chloride etching liquid, and then the recovery system comprises a regeneration cylinder for oxidizing monovalent copper ions into divalent copper ions, wherein the oxidation comprises introducing chlorine gas for oxidation, and the recovery system also comprises an acid etching after-liquid 1 electrolytic cylinder capable of electrically desorbing the divalent copper ions into copper.
Variation of copper ion contained in each solution: the acidic copper chloride etching solution comprises divalent copper ions, an acidic post-etching solution 1 is formed after etching, the acidic post-etching solution 1 comprises monovalent copper ions generated after etching, the monovalent copper ions are oxidized into divalent copper ions again in a regeneration cylinder, and the divalent copper ions are electrically desorbed to obtain copper in an electrolytic cylinder.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (7)
1. A filter device for a post-etching liquid recovery system is characterized by comprising a first filter (2) for filtering solid impurities in a post-etching liquid (1), wherein a post-etching liquid recovery system capable of recovering the post-etching liquid (1) is connected behind the first filter (2);
a transfer cylinder (3) used for precipitating solid impurities and storing the etching post-liquid (1) is connected in front of the first filter (2), and the position of the first filter (2) connected to the transfer cylinder (3) is the lower part of the transfer cylinder (3).
2. The filtration apparatus for a post-etching liquid recovery system according to claim 1, wherein an input port for inputting the post-etching liquid (1) on the transit cylinder (3) is provided at an upper portion of the transit cylinder (3).
3. The filtration apparatus for a post-etching liquid recovery system according to claim 2, wherein a liquid storage tank (4) is further connected between the first filter (2) and the post-etching liquid recovery system.
4. The filtration apparatus for a post-etching liquid recovery system according to any one of claims 1 to 3, wherein the first filter (2) comprises a carbon processor.
5. The filtration apparatus for a post-etching liquid recovery system according to claim 4, wherein a second filter (5) is further provided in front of the transit cylinder (3).
6. The filtration apparatus for a post-etching liquid recovery system according to claim 5, wherein the second filter (5) comprises a carbon processor.
7. The filtration device for the post-etching liquid recovery system according to claim 4, wherein the transfer cylinder (3) and the liquid storage tank (4) are wrapped with a thermal insulation layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921534737.6U CN211435385U (en) | 2019-09-16 | 2019-09-16 | Filter device for etching back liquid recovery system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921534737.6U CN211435385U (en) | 2019-09-16 | 2019-09-16 | Filter device for etching back liquid recovery system |
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| CN211435385U true CN211435385U (en) | 2020-09-08 |
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| CN201921534737.6U Active CN211435385U (en) | 2019-09-16 | 2019-09-16 | Filter device for etching back liquid recovery system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112522708A (en) * | 2020-12-21 | 2021-03-19 | 泰兴冶炼厂有限公司 | Alkaline etching solution treatment co-production process |
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2019
- 2019-09-16 CN CN201921534737.6U patent/CN211435385U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112522708A (en) * | 2020-12-21 | 2021-03-19 | 泰兴冶炼厂有限公司 | Alkaline etching solution treatment co-production process |
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