CN211420307U - PECVD process chamber ion source diffuser plate loading attachment - Google Patents

Abstract

The utility model discloses a PECVD process chamber ion source diffusion plate feeding device, which comprises a deposition box cavity, a pushing device and a mounting device; during the use, start rotating motor and drive the rolling disc and rotate and make the dwang rotate, make the swinging arms swing and then drive connecting rod and pushing rod and carry out left and right promotion to the diffuser plate, place the diffuser plate and put into both sides at the bottom plate electrode, diffuse ionized gas to both sides and evenly to the extraction opening effectively, cause the plasma in two plate electrodes also to diffuse to both sides evenly, increase the plasma area, also increase the deposited area of film simultaneously, need not under the condition with the polar plate expansion, increase plasma deposition area effectively, there is considerable effect to the manufacturing cost and the energy saving of device.

Description

PECVD process chamber ion source diffuser plate loading attachment

Technical Field

The utility model relates to a coating film deposition technical field specifically is a PECVD processing procedure chamber ion source diffuser plate loading attachment.

Background

The existing PECVD plasma enhanced chemical vapor deposition equipment ionizes gas containing film constituent atoms by means of microwaves or radio frequency and the like to form plasma locally, and the plasma has strong chemical activity and is easy to react, so that a desired film is deposited on a substrate. In order to make the chemical reaction proceed at a lower temperature, the activity of the plasma is used to promote the reaction, and the effective area of the film deposition and the deposition uniformity in the film deposition have a considerable relationship with the plasma area, generally, in order to achieve a certain effect of the film deposition uniformity in the substrate area, an electrode plate 1-2 times larger than the substrate is fabricated to generate a considerable and effective plasma range for depositing the film, which not only increases the fabrication period of the part, but also increases the fabrication cost.

Accordingly, one skilled in the art provides a loading apparatus for an ion source diffusion plate in a PECVD process chamber to solve the above problems.

Disclosure of Invention

An object of the utility model is to provide a PECVD processing procedure chamber ion source diffuser plate loading attachment to solve the problem that proposes among the above-mentioned background art.

In order to achieve the above object, the utility model provides a following technical scheme:

a PECVD process chamber ion source diffusion plate feeding device comprises a deposition box cavity, a pushing device and a mounting device; both ends of the interior of the cavity of the deposition box are provided with pushing devices, and the middle position of the interior of the cavity of the deposition box is provided with a mounting device; the inside both ends of deposit case cavity all are equipped with the installation pole, and the upside tip of installation pole is equipped with the dead lever, the upper end of dead lever and installation pole all is equipped with the fixed block of slope form, and the dead lever all is equipped with the rolling disc with the installation department of installation pole, and the equal fixedly connected with dwang in surface of rolling disc, and the lower extreme of installation pole all rotates and is connected with the swinging arms, and the downside tip of dwang all rotates and installs a socket joint section of thick bamboo, and the upside tip of swinging arms all runs through the upside outer end that extends to a socket joint section of thick bamboo and socket joint section of thick bamboo sliding connection, and the downside tip of swinging arms all rotates and is connected with the connecting rod, and the inboard tip.

As a further aspect of the present invention: the mounting device comprises an upper electrode plate, a plasma, a lower electrode plate and a diffusion plate; the inside upper end of deposit case cavity is equipped with the last electrode plate, and the upside both ends of going up the electrode plate all are equipped with the installation pole, and the inside lower extreme of deposit case cavity is equipped with down the plate electrode, and the lower extreme both sides of plate electrode all are equipped with down the installation pole down, and go up and be equipped with plasma between the inboard of plate electrode and lower plate electrode, and the lower extreme intermediate position of deposit case cavity is equipped with the extraction opening, and the upside tip of extraction opening runs through the inside that extends to deposit case cavity, the both ends of plate electrode all are equipped with the diffuser plate down, and the outer end downside of diffuser plate all is equipped with the promotion post.

As a further aspect of the present invention: the other end of the pushing column is fixedly connected with the pushing rod.

As a further aspect of the present invention: the back of rolling disc is equipped with rotates the motor, and rotates motor and external power source and outside singlechip electric connection, and the model of outside singlechip is: SMC 62.

As a further aspect of the present invention: and sliding grooves which are arranged corresponding to the diffusion plates are formed in the two sides of the lower end in the cavity of the deposition box.

As a further aspect of the present invention: the lower electrode plate is smaller than the upper electrode plate.

Compared with the prior art, the beneficial effects of the utility model are that: this device is applicable to multiple diffuser plate material loading occasion, during the use, start rotating the motor and drive the rolling disc and rotate and make the dwang rotate, make the swinging arms swing and then drive the connecting rod and the promotion of pushing rod about the diffuser plate carries out, be convenient for the device body can change the plate electrode of different specifications size when using, place the diffuser plate under the plate electrode put into both sides, effectively with ionized gas to both sides diffusion and evenly to the extraction opening diffusion, cause the plasma in two plate electrodes also evenly to both sides diffusion, increase the plasma area, also increase the deposited area of film simultaneously, need not be with under the condition of polar plate expansion, increase plasma deposition area effectively, there is corresponding effect to the manufacturing cost of device and energy saving.

Drawings

FIG. 1 is a schematic diagram of a structure of a PECVD chamber ion source diffuser feeding device.

In the figure: 1-deposition box cavity, 2-installation rod, 3-push rod, 4-connecting rod, 5-push column, 6-diffusion plate, 7-swinging rod, 8-sleeve, 9-rotating rod, 10-rotating disk, 11-fixing rod, 12-fixing block, 13-plasma, 14-upper electrode plate, 15-lower installation rod, 16-upper installation rod, 17-lower electrode plate, 18-installation ring, 19-air extraction opening and 20-sliding groove.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-1, in an embodiment of the present invention, a PECVD process chamber ion source diffuser plate feeding device includes a deposition chamber body, a pushing device and an installation device; two ends of the interior of the cavity 1 of the deposition box are provided with pushing devices, and the middle position of the interior of the cavity 1 of the deposition box is provided with a mounting device; deposit case cavity 1's inside both ends all are equipped with installation pole 2, and the upside tip of installation pole 2 is equipped with dead lever 11, dead lever 11 and installation pole 2's upper end all is equipped with the fixed block 12 of slope form, and dead lever 11 all is equipped with rolling disc 10 with installation pole 2's installation department, and the equal fixedly connected with dwang 9 in surface of rolling disc 10, and the lower extreme of installation pole 2 all rotates and is connected with swinging arms 7, and the downside tip of dwang 9 all rotates and installs a socket 8, and the upside tip of swinging arms 7 all runs through the upside outer end that extends to socket 8 and socket 8 sliding connection, and the downside tip of swinging arms 7 all rotates and is connected with connecting rod 4, and the medial extremity of connecting rod 4 all rotates and is connected with catch bar 3.

The mounting device comprises an upper electrode plate 14, plasma 13, a lower electrode plate 17 and a diffusion plate 6; the inside upper end of deposit case cavity 1 is equipped with upper electrode plate 14, and the upside both ends of upper electrode plate 14 all are equipped with installation pole 16, and the inside lower extreme of deposit case cavity 1 is equipped with down plate electrode 17, and the lower extreme both sides of plate electrode 17 all are equipped with down installation pole 15 down, and be equipped with plasma 13 between the inboard of upper electrode plate 14 and lower plate electrode 17, and the lower extreme intermediate position of deposit case cavity 1 is equipped with extraction opening 19, and the upside tip of extraction opening 19 runs through the inside that extends to deposit case cavity 1, the both ends of lower plate electrode 17 all are equipped with diffuser plate 6, and the outer end downside of diffuser plate 6 all is equipped with and promotes post 5.

The other end of the pushing column 5 is fixedly connected with the pushing rod 3.

The back of rolling disc 10 is equipped with the rotation motor, and rotates motor and external power source and outside singlechip electric connection, and the model of outside singlechip is: SMC 62.

And sliding grooves 20 which correspond to the diffusion plate 6 are formed in the two sides of the lower end in the cavity 1 of the deposition box.

The lower electrode plate 17 is smaller than the upper electrode plate 14.

The utility model discloses a theory of operation is:

the utility model relates to a PECVD processing procedure chamber ion source diffuser plate loading attachment, this device is applicable to multiple diffuser plate material loading occasion, in use, start rotating the motor and drive rolling disc 10 and rotate and make dwang 9 rotate, make swinging arms 7 swing and then drive connecting rod 4 and catch bar 3 and carry out the promotion about diffuser plate 6, place diffuser plate 6 and put into both sides at bottom plate electrode 17, gas with the ionization is diffused to both sides and is diffused to extraction opening 19 evenly effectively, cause plasma 13 in two plate electrodes also can be diffused to both sides evenly, increase the plasma area, the sedimentary area of film is also increased simultaneously, need not be with under the condition of polar plate expansion, increase plasma deposition area effectively, there is corresponding effect to the manufacturing cost of device and energy saving.

It is obvious to a person skilled in the art that the invention is not restricted to details of the above-described exemplary embodiments, but that it can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.

Claims (6)

1. A PECVD process chamber ion source diffusion plate feeding device comprises a deposition box cavity, a pushing device and a mounting device; the device is characterized in that pushing devices are arranged at two ends of the interior of the cavity (1) of the deposition box, and a mounting device is arranged in the middle of the interior of the cavity (1) of the deposition box; the two ends in the deposition box cavity (1) are respectively provided with a mounting rod (2), the upper end part of the mounting rod (2) is provided with a fixed rod (11), the upper ends of the fixed rod (11) and the mounting rod (2) are respectively provided with an inclined fixed block (12), and the installation positions of the fixed rod (11) and the installation rod (2) are provided with rotating discs (10), the surfaces of the rotating discs (10) are fixedly connected with rotating rods (9), the lower ends of the mounting rods (2) are rotatably connected with swing rods (7), and the lower end part of the rotating rod (9) is rotatably provided with a sleeve joint barrel (8), the upper end part of the swinging rod (7) penetrates through and extends to the upper outer end of the sleeve joint barrel (8) to be connected with the sleeve joint barrel (8) in a sliding way, the lower end parts of the swing rods (7) are connected with connecting rods (4) in a rotating way, and the inner side ends of the connecting rods (4) are rotatably connected with pushing rods (3).

2. A PECVD process chamber ion source diffuser plate loading apparatus according to claim 1, wherein the mounting apparatus comprises an upper electrode plate (14), a plasma (13), a lower electrode plate (17) and a diffuser plate (6); the inside upper end of deposit case cavity (1) is equipped with up electrode plate (14), and the upside both ends of going up electrode plate (14) all are equipped with installation pole (16), and the inside lower extreme of deposit case cavity (1) is equipped with down electrode plate (17), and the lower extreme both sides of lower electrode plate (17) all are equipped with down installation pole (15), and go up and be equipped with plasma (13) between the inboard of electrode plate (14) and lower electrode plate (17), and the lower extreme intermediate position of deposit case cavity (1) is equipped with extraction opening (19), and the upside tip of extraction opening (19) runs through the inside that extends to deposit case cavity (1), the both ends of lower electrode plate (17) all are equipped with diffuser plate (6), and the outer end downside of diffuser plate (6) all is equipped with and promotes post (5).

3. The apparatus of claim 2, wherein the pushing rod (3) is fixedly connected to the other end of the pushing column (5).

4. The apparatus as claimed in claim 1, wherein a rotation motor is disposed on the back of the rotation plate (10), and the rotation motor is electrically connected to an external power source and an external single chip microcomputer, and the external single chip microcomputer is of a type: SMC 62.

5. The apparatus of claim 1, wherein the two sides of the inner bottom of the chamber body (1) of the deposition chamber are provided with sliding grooves (20) corresponding to the diffuser (6).

6. The apparatus of claim 2, wherein the lower electrode plate (17) is smaller than the upper electrode plate (14).

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