CN211332804U

CN211332804U - Precision polishing film with special structure

Info

Publication number: CN211332804U
Application number: CN201922152757.3U
Authority: CN
Inventors: 方红; 张航海; 卞振伟
Original assignee: DONGGUAN GOLDEN SUN ABRASIVES CO LTD
Current assignee: DONGGUAN GOLDEN SUN ABRASIVES CO LTD
Priority date: 2019-12-04
Filing date: 2019-12-04
Publication date: 2020-08-25
Anticipated expiration: 2029-12-04

Abstract

The utility model relates to a throw polishing membrane technical field, concretely relates to precision polishing membrane with special construction, this precision polishing membrane include the substrate layer with set up in the coating on substrate layer surface, the distribution has the abrasive material in the coating, the coating includes the dense line district that the interval set up and dredges the line district, the abrasive material distribution density in dense line district is greater than the abrasive material distribution density who dredges the line district. The utility model discloses an accurate polishing membrane, novel structure, through the dense line district with dredge the setting in line district, sparse and dense alternate line produces the vibrations of micron order when polishing, workpiece material's cracked and peeling off when can accelerating to polish, produce the process of abrasive dust promptly, thereby improve the efficiency of polishing, and the abrasive dust after polishing can derive through dredging the line district again, avoid polishing the end jam of grinding and influence polishing efficiency and effect on polishing membrane, make polishing membrane can effectively improve polishing membrane's polishing efficiency, and the interval setting of the strong and weak effect of polishing, avoid polishing the work piece and appear phenomenons such as fish tail, the indenture, the practicality is high.

Description

Precision polishing film with special structure

Technical Field

The utility model relates to a throw optical film technical field, concretely relates to precision polishing membrane with special construction.

Background

In the existing precision polishing products, a general precision polishing film in the industry is flat and abrasive materials are uniformly distributed, and the polishing film with a pure flat surface has a lower polishing Ra value, but has a lower polishing rate and is not suitable for a process with high requirements on the polishing rate.

Disclosure of Invention

In order to overcome the shortcoming and the not enough that exist among the prior art, the utility model aims to provide an accurate polishing membrane with special construction, novel structure through the setting in dense line district and sparse line district, can effectively improve the polishing efficiency who polishes the membrane, and the practicality is high.

The purpose of the utility model is realized through the following technical scheme: the precision polishing film with the special structure comprises a base material layer and a coating arranged on the surface of the base material layer, abrasive materials are distributed in the coating, the coating comprises a microgroove area and a sparse groove area which are arranged at intervals, and the abrasive material distribution density of the microgroove area is greater than that of the sparse groove area.

Furthermore, the spacing distance between the adjacent microgroove regions and the sparse groove regions is 20-200 μm.

Further, the ratio of the abrasive distribution density of the microgroove area to the abrasive distribution density of the sparse groove area is 10-50: 1.

Further, the dense-line area and the sparse-line area are both in a stripe shape.

Further, the abrasive is one of alumina, silicon carbide and diamond.

Further, the thickness of the substrate layer is 50-200 μm.

Further, the thickness a of the highest part of the dense grain area of the coating is 1.5-3 times of the grain size of the abrasive.

Further, the lowest thickness b of the sparse-grained region of the coating is 1-1.5 times of the grain size of the abrasive.

The beneficial effects of the utility model reside in that: the utility model discloses an accurate polishing membrane, novel structure, through the dense line district with dredge the setting in line district, sparse and dense alternate line produces the vibrations of micron order when polishing, workpiece material's cracked and peeling off when can accelerating to polish, produce the process of abrasive dust promptly, thereby improve the efficiency of polishing, and the work piece abrasive dust after polishing can derive through dredging the line district again, avoid polishing the end jam of grinding and influence polishing efficiency and effect on polishing membrane, make polishing membrane can effectively improve polishing membrane's polishing efficiency, and the interval setting of the strong and weak effect of polishing, avoid appearing phenomenons such as fish tail, the indenture, the practicality is high.

Drawings

FIG. 1 is a schematic structural view of a coating according to the present invention;

fig. 2 is a partial cross-sectional view of the present invention.

The reference signs are: 1-substrate layer, 2-coating, 21-microgroove area, 22-microgroove area.

Detailed Description

In order to facilitate the understanding of those skilled in the art, the present invention will be further described with reference to the following examples and accompanying fig. 1-2, which are not intended to limit the present invention.

Referring to fig. 1-2, a precision polishing film with a special structure comprises a substrate layer 1 and a coating 2 disposed on the surface of the substrate layer 1, wherein an abrasive is distributed in the coating 2, the coating 2 comprises a microgroove region 21 and a microgroove region 22 which are disposed at intervals, and the abrasive distribution density of the microgroove region 21 is greater than that of the microgroove region 22.

The accurate precision polishing membrane of this embodiment, novel structure, through the setting of dense line district 21 and sparse line district 22, sparse and dense alternative line produces the vibrations of micron order when polishing, workpiece material's fragmentation and peeling off when can accelerate to polish, produce the process of abrasive dust promptly, thereby improve the efficiency of polishing, and the work piece abrasive dust after polishing can be derived through sparse line district 22 again, avoid polishing the end jam of grinding and influence polishing efficiency and effect on polishing membrane, make polishing membrane can effectively improve polishing membrane's polishing efficiency, the practicality is high. Further, one surface (or the upper surface) of the coating layer, which is far away from the substrate layer 1, is wavy, the microgroove region 21 is located at a wave crest, and the microgroove region 22 is located at a wave trough.

In this embodiment, the spacing distance between the adjacent dense-grain regions 21 and the adjacent sparse-grain regions 22 is 20 to 200 μm, so that the spacing between the dense-grain regions 21 and the sparse-grain regions 22 is uniform, the section is wavy, the dense-grain regions 21 with relatively high section height can perform a relatively strong polishing effect on a workpiece, the sparse-grain regions 22 perform relatively weak polishing on the workpiece, the workpiece can be uniformly polished through strong and weak polishing settings, the scratch phenomenon on the surface of the workpiece is avoided, and the polishing efficiency is relatively high.

In this embodiment, the ratio of the distribution density of the abrasive in the dense grain region 21 to the distribution density of the abrasive in the sparse grain region 22 is 10-50:1, by strictly controlling the distribution densities of the abrasive in the dense grain region 21 and the sparse grain region 22, the dense grain region 21 with relatively high density can perform a relatively strong polishing effect on a workpiece, while the sparse grain region 22 performs a relatively weak polishing on the workpiece, and through the strong and weak polishing setting, the workpiece can be uniformly polished, the scratch phenomenon on the surface of the workpiece is avoided, and the polishing efficiency is high.

In this embodiment, the dense-grain region 21 and the sparse-grain region 22 are both stripe-shaped, and have a simple structure, so that the polishing film is easy to prepare and mold, the distribution density of the abrasive is easy to control, the density interval is easy to control, the polishing efficiency is higher, and the practicability is high.

In this embodiment, the abrasive is one of alumina, carborundum, diamond, and intensity is high, and the dispersibility is good, easily disperses in coating, easily forms density line structure, can carry out even polishing to the work piece, and the practicality is high.

In this embodiment, the thickness of the substrate layer 1 is 50 to 200 μm.

In this embodiment, the thickness a of the dense-grain region 21 of the coating layer 2 at the highest position is 1.5 to 3 times of the grain size of the abrasive.

In this embodiment, the lowest thickness of the sparse zone 22 of the coating 2 is 1-1.5 times the abrasive grain size.

This embodiment is through the thickness of strict control substrate layer 1, dense line district 21 and sparse line district 22, makes the cross-section of the 2 coating that makes be wavy, and the dense line district 21 that thickness is great carries out stronger polishing to the work piece, and the sparse line district 22 that thickness is less relatively carries out more weak polishing to the work piece, and the interval of polishing is gone on more strongly and weakly, can improve the polishing effect of polishing to the work piece surface, avoids appearing phenomenons such as fish tail, indenture, and the efficiency of polishing is high, and the practicality is high. Specifically, the thickness of the base material layer 1 is 50 μm, 100 μm, 120 μm, 150 μm, or 200 μm; the thickness a of the highest part of the dense grain region 21 of the coating 2 is 1.5 times, 2 times, 2.5 times or 3 times of the grain diameter of the abrasive; the thickness b of the lowest part of the sparse-grain area 22 of the coating 2 is 1 time, 1.2 times, 1.3 times or 1.5 times of the grain diameter of the abrasive. When the thickness a of the highest part of the fine-grained region 21 is 1.5 times of the abrasive grain size, the thickness b of the lowest part of the sparse-grained region 22 is not 1.5 times of the abrasive grain size, that is, the thickness a of the fine-grained region 21 is not equal to the thickness b of the sparse-grained region 22, so as to form a wave shape.

The above-mentioned embodiment is the utility model discloses the implementation of preferred, in addition, the utility model discloses can also realize by other modes, not deviating from the utility model discloses any obvious replacement is all within the protection scope under the prerequisite of design.

Claims

1. A precision polishing film with a special structure is characterized in that: the abrasive material distribution density of the microgroove area is larger than that of the sparse groove area.

2. The precision polishing film according to claim 1, wherein: the spacing distance between the adjacent microgroove regions and the sparse groove regions is 20-200 mu m.

3. The precision polishing film according to claim 1, wherein: the ratio of the abrasive distribution density of the microgroove area to the abrasive distribution density of the sparse grain area is 10-50: 1.

4. The precision polishing film according to claim 1, wherein: the dense-line area and the sparse-line area are both in a stripe shape.

5. The precision polishing film according to claim 1, wherein: the abrasive is one of alumina, silicon carbide and diamond.

6. The precision polishing film according to claim 1, wherein: the thickness of the substrate layer is 50-200 μm.

7. The precision polishing film according to claim 1, wherein: the thickness a of the highest part of the dense grain area of the coating is 1.5 to 3 times of the grain diameter of the abrasive.

8. The precision polishing film according to claim 1, wherein: the thickness b of the lowest part of the sparse-grain area of the coating is 1-1.5 times of the grain diameter of the abrasive.