CN211330497U - Bipolar plate cleaning rack - Google Patents
Bipolar plate cleaning rack Download PDFInfo
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- CN211330497U CN211330497U CN201922395548.1U CN201922395548U CN211330497U CN 211330497 U CN211330497 U CN 211330497U CN 201922395548 U CN201922395548 U CN 201922395548U CN 211330497 U CN211330497 U CN 211330497U
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- frame
- bipolar plate
- limiting frame
- limiting
- frame body
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Abstract
The utility model discloses a bipolar plate cleaning rack, a plurality of support frames which are evenly arranged and distributed are arranged at the bottom of a frame body, the frame body is hollowed out to be convenient for cleaning the bipolar plate, one side surface of the frame body is lower than other side surfaces, and the side surface is retracted relative to the adjacent two side surfaces, so that a tiltable limit frame is always positioned in the frame body, and the frame body is convenient to shift due to the arrangement of a hanging ring; the limiting frame is rotatably connected to the bottom plate, one end of the telescopic assembly is rotatably connected to the bottom plate, the other end of the telescopic assembly is fixedly connected with the limiting frame, the telescopic device limits the rotating range of the limiting frame, the limiting frame can be inclined, and the bottom of the limiting frame is arranged in an arc shape, so that the placed bipolar plate can stably slide down; through holes are uniformly formed in the outer surface of the limiting frame, so that the bipolar plate placed in the limiting frame is effectively washed, and holes are formed in the arc-shaped surface of the bottom of the limiting frame, so that water stains can flow out conveniently after washing; the design of the openings at the two sides of the limiting frame enables the limiting frame to adapt to bipolar plates with different widths, and the application range is wide.
Description
Technical Field
The utility model relates to a fuel cell bipolar plate processing field specifically is a bipolar plate wash rack.
Background
The bipolar plate is an important component constituting a fuel cell, and plays roles of conducting current, distributing gas, dissipating heat of reaction, and the like in the fuel cell. The bipolar plate is mostly in a cuboid structure, the front side and the back side of the bipolar plate are provided with gas distribution and water tight collecting channel structures, and the interior of the bipolar plate is provided with a cooling water tight collecting channel structure. The thickness of the bipolar plate is about 2mm generally, the reduction of the thickness of the bipolar plate causes the size of the flow channel to be reduced, the requirements on the precision and the uniformity of the flow channel are higher, and in order to avoid the flow channel from being blocked or polluted by fine impurities, the bipolar plate needs to be cleaned in the production and processing stage to keep a clean state. Traditional washing mode needs stack bipolar plate and washs together, if stack in disorder and overlap together, easily lead to bipolar plate's surface can't obtain effectual washing, and need many times dry for drying efficiency is low. Therefore, how to effectively clean the bipolar plate in the processing stage becomes an urgent problem to be solved.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model provides a bipolar plate wash rack has solved and has piled up in the current bipolar plate cleaning process in disorder, and its surface is difficult to obtain effective clear problem.
The utility model provides a scheme as follows of above-mentioned technical problem: a bipolar plate cleaning frame comprises a frame body and a plurality of supporting frames, wherein the frame body is arranged in a hollow manner, and the upper end of the frame body is provided with an opening; a plurality of the support frame parallel mount side by side in the bottom of framework, the support frame includes bottom plate, flexible subassembly and spacing frame, the upper end of spacing frame is the opening, the lower tip of spacing frame rotate connect in the bottom plate, the one end of flexible subassembly rotate connect in bottom plate, other end fixed connection in spacing frame, the adjustable in order to be used for the restriction of length of flexible subassembly the rotation angle of spacing frame.
Preferably, the two opposite side surfaces of the frame body are provided with hanging rings in parallel.
Preferably, the support frame further comprises a first column body, the first column body is rotatably connected to the bottom plate, and the lower end portion of the limiting frame is arc-shaped and is fixedly installed on the first column body.
Preferably, flexible subassembly includes the second cylinder, dead lever and telescopic link, the second cylinder rotate connect in the bottom plate and with first cylinder parallel arrangement, the inside cavity of dead lever, the telescopic link slip joint in the dead lever, the telescopic link is kept away from the one end fixed connection of dead lever the side of spacing frame.
Preferably, through holes are paved and arranged on the outer side surface and the lower end part of the limit frame.
The utility model provides a pair of bipolar plate wash rack has following beneficial effect: the bipolar plates to be cleaned are placed in the limiting frame, the supporting frames are arranged in the frame body side by side, and the bipolar plates are effectively separated; through holes are formed in the outer side surface and the bottom of the limiting frame, so that the exposed area of the bipolar plate in the cleaning process is increased, the bipolar plate is more fully cleaned, and water stains can conveniently flow out of the bottom of the bipolar plate after cleaning; the angle of spacing frame is adjustable and the arc setting of bottom for bipolar plate when placing is in the inclined plane landing in the bottom, the condition that the corner that easily appears collided with when effectively having avoided vertical placing.
Drawings
The accompanying drawings, which are described herein to provide a further understanding of the invention and constitute a part of this application, illustrate embodiments of the invention and together with the description serve to explain the invention without forming an undue limitation to the invention, in which:
fig. 1 is a schematic structural diagram of an embodiment of a bipolar plate cleaning frame provided by the present invention;
FIG. 2 is a schematic structural view of an embodiment of the middle support frame of the present invention;
fig. 3 is a schematic view of the state of an embodiment of the middle support frame of the present invention when the middle support frame is vertically placed.
Detailed Description
The principles and features of the present invention are described below in conjunction with the following drawings, the examples given are only intended to illustrate the present invention and are not intended to limit the scope of the present invention. The invention is described in more detail in the following paragraphs by way of example with reference to the accompanying drawings. The advantages and features of the present invention will become more fully apparent from the following description and appended claims. It should be noted that the drawings are in simplified form and are not to precise scale, and are provided for convenience and clarity in order to facilitate the description of the embodiments of the present invention.
As shown in fig. 1, fig. 1 is a schematic structural diagram of an embodiment of a bipolar plate cleaning frame provided by the present invention. The bipolar plate cleaning frame comprises a frame body 1 and a plurality of support frames 3, wherein the upper end of the frame body 1 is provided with an opening, the side surface of the frame body 1 is formed by welding a plurality of stainless steel wires and is hollow, one side surface of the frame body 1 is lower than other side surfaces, namely the right side surface of the frame body 1 is lower than the other 3 side surfaces in the embodiment, in addition, the right side surface of the frame body 1 slightly retracts relative to the two adjacent side surfaces, namely the two side surfaces adjacent to the right side surface of the frame body 1 extend out of the right side surface, and the top ends of the two opposite side surfaces of the frame body 1 are provided with hanging rings 2 in parallel so as; the support frame 3 comprises a bottom plate 31, a telescopic assembly 32 and a limiting frame 33, the limiting frame 33 is rotatably connected to the bottom plate 31, a plurality of limiting frames 33 are arranged on the upper surface of the same bottom plate 31 side by side, the length of the telescopic assembly 32 is adjustable, one end of the telescopic assembly 32 is rotatably connected to the bottom plate 31, the other end of the telescopic assembly is fixedly installed on the side surface of the limiting frame 33, the upper end of the limiting frame 33 is an opening, the inside of the limiting frame 33 is hollow, bipolar plates are placed into the upper opening of the limiting frame 33, the limiting frame 33 can rotate for a certain angle around the bottom plate 31, in the rotating process of the limiting frame 33, the telescopic assembly 32 rotates along with the rotation of the limiting frame 33, the extending length of the telescopic assembly 32 is changed, and particularly, when the limiting frame 33 rotates to. If need to wash the operation to bipolar plate, at first install bottom plate 31 in the bottom of framework 1, adjust spacing frame 33, make it slope for bottom plate 31, will treat that abluent bipolar plate places in spacing frame 33 one by one, the setting of bottom plate 31 slope is for vertical setting, has effectively slowed down the impact of bipolar plate when gliding in spacing frame 33, the condition of colliding with easily appears in the corner when effectively avoiding bipolar plate gliding, external machine shifts the framework to appointed washing station department through rings 2 and washs.
For a better illustration of the support frame 3, please continue to refer to fig. 2-3. The bottom of the limit frame 33 is arc-shaped and fixedly mounted on the first column body 35, the first column body 35 is rotatably connected to the upper surface of the bottom plate 31, the rotation of the first column body 35 drives the limit frame 33 to rotate, the arc-shaped bottom of the limit frame 33 is arranged for reducing the impact force when the bipolar plate 4 slides on the limit frame 33, the upper end of the limit frame 33 is open, and the left and right ends of the limit frame 33 can be arranged as openings and can also be arranged in a closed manner, in the embodiment, the left and right ends of the limit frame 33 are both open to adapt to bipolar plates 4 with different widths; the telescopic assembly 32 comprises a first column 321, a fixing rod 322 and a telescopic rod 323, the first column 321 is rotatably connected to the upper surface of the bottom plate 31, the fixing rod 322 is fixedly installed on the first column 321, the inside of the fixing rod 322 is hollow, the telescopic rod 323 is slidably connected to the fixing rod 322 in a clamping manner, it should be noted that the extension length of the telescopic rod 323 has a certain range, in this embodiment, when the limiting frame 33 is perpendicular to the bottom plate 31, the extension length of the telescopic rod 323 reaches the maximum, and particularly, the extension length of the telescopic rod 323 is the maximum and the minimum, the telescopic rod 323 is connected to the fixing rod 322 in a clamping manner, so that the limiting frame 33 can rotate and be fixed within a certain.
Furthermore, in order to better clean the bipolar plate 4, the outer surface of the limiting frame 33 is uniformly provided with through holes 34 to increase the exposed area of the bipolar plate 4, and the bottom arc-shaped surface of the limiting frame 33 is also provided with through holes 34 to facilitate the sliding of water stains on the bipolar plate 4 after cleaning.
During specific implementation, the plurality of limiting frames 3 are uniformly arranged in the frame body 1, the limiting frames 3 are adjusted to incline relative to the bottom plate 31, the inclined limiting frames 3 do not extend out of the frame body 1 all the time due to the arrangement of the indentation on one side surface of the frame body 1, the limiting frames 3 are effectively protected, the bipolar plate 4 to be cleaned slides into the limiting frames 3 from the upper end openings of the limiting frames 3, the bipolar plate 4 to be cleaned is placed in the corresponding limiting frames 3, an external machine is started, the bipolar plate is transferred to a specified cleaning station under the support of the hanging ring 3, and water washes the bipolar plate 4 from the through hole 34 and the two side openings of the limiting frames 3 in the cleaning process, so that the angle of the limiting frames 3 can be adjusted in the cleaning process, the bipolar plate can be vertically placed, the inclined state can be always kept, and the angle of the bipolar plate 4 is changed, so that the bipolar plate 4; after the cleaning is finished, the water on the bipolar plate 4 slides to the arc position at the bottom of the limiting frame 3 and flows out from the through hole 34 on the arc surface.
The utility model provides a pair of bipolar plate cleaning rack, a plurality of support frames that are evenly arranged and distributed are arranged at the bottom of the frame body, the frame body is hollowed out and arranged, the cleaning of the bipolar plate is convenient, one side surface of the frame body is lower than other side surfaces, and the side surface is retracted relative to the adjacent two side surfaces, so that the inclinable limiting frame is always positioned in the frame body, and the frame body is convenient to shift due to the arrangement of the hanging ring; the limiting frame is rotatably connected to the bottom plate, one end of the telescopic assembly is rotatably connected to the bottom plate, the other end of the telescopic assembly is fixedly connected with the limiting frame, the telescopic device limits the rotating range of the limiting frame, the limiting frame can be obliquely arranged, so that the placed bipolar plate can stably slide, the impact force on the bottom of the bipolar plate is relieved, and the bottom of the limiting frame is arc-shaped, so that the impact force is also effectively relieved; through holes are uniformly formed in the outer surface of the limiting frame, so that the bipolar plate placed in the limiting frame is effectively washed, and the through holes are also formed in the arc-shaped surface of the bottom of the limiting frame, so that water stains can flow out conveniently after cleaning; the design of the openings at the two sides of the limiting frame enables the limiting frame to adapt to bipolar plates with different widths, and the application range is wide.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way; the present invention can be smoothly implemented by those skilled in the art according to the drawings and the above description; however, those skilled in the art should understand that changes, modifications and variations made by the above-described technology can be made without departing from the scope of the present invention, and all such changes, modifications and variations are equivalent embodiments of the present invention; meanwhile, any changes, modifications, evolutions, etc. of the above embodiments, which are equivalent to the actual techniques of the present invention, still belong to the protection scope of the technical solution of the present invention.
Claims (5)
1. A bipolar plate cleaning frame is characterized in that: the frame body is arranged in a hollow manner, and the upper end of the frame body is provided with an opening; a plurality of the support frame parallel mount side by side in the bottom of framework, the support frame includes bottom plate, flexible subassembly and spacing frame, the upper end of spacing frame is the opening, the lower tip of spacing frame rotate connect in the bottom plate, the one end of flexible subassembly rotate connect in bottom plate, other end fixed connection in spacing frame, the adjustable in order to be used for the restriction of length of flexible subassembly the rotation angle of spacing frame.
2. The bipolar plate cleaning frame according to claim 1, wherein: and the two opposite side surfaces of the frame body are provided with hanging rings in parallel.
3. The bipolar plate cleaning frame according to claim 1, wherein: the support frame still includes first cylinder, first cylinder rotate connect in the bottom plate, the lower tip of spacing frame is arc and fixed mounting in first cylinder.
4. A bipolar plate cleaning frame as claimed in claim 3, wherein: the telescopic assembly comprises a second cylinder, a fixed rod and a telescopic rod, the second cylinder is rotatably connected with the bottom plate and the first cylinder in parallel, the inside of the fixed rod is hollow, the telescopic rod is slidably clamped on the fixed rod, and the telescopic rod is far away from one end of the fixed rod and fixedly connected with the side face of the limiting frame.
5. The bipolar plate cleaning frame according to claim 1, wherein: and through holes are paved and arranged on the outer side surface and the lower end part of the limiting frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922395548.1U CN211330497U (en) | 2019-12-27 | 2019-12-27 | Bipolar plate cleaning rack |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922395548.1U CN211330497U (en) | 2019-12-27 | 2019-12-27 | Bipolar plate cleaning rack |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211330497U true CN211330497U (en) | 2020-08-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922395548.1U Active CN211330497U (en) | 2019-12-27 | 2019-12-27 | Bipolar plate cleaning rack |
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| CN (1) | CN211330497U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114888022A (en) * | 2022-04-27 | 2022-08-12 | 安徽煜祺光学科技有限公司 | Glass backplate sprays cleaning machine |
-
2019
- 2019-12-27 CN CN201922395548.1U patent/CN211330497U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114888022A (en) * | 2022-04-27 | 2022-08-12 | 安徽煜祺光学科技有限公司 | Glass backplate sprays cleaning machine |
| CN114888022B (en) * | 2022-04-27 | 2024-03-15 | 安徽煜祺光学科技有限公司 | Spraying and cleaning machine for glass backboard |
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